WO2008078676A1 - パターン形成方法およびそれに用いる感光性樹脂組成物 - Google Patents

パターン形成方法およびそれに用いる感光性樹脂組成物 Download PDF

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Publication number
WO2008078676A1
WO2008078676A1 PCT/JP2007/074643 JP2007074643W WO2008078676A1 WO 2008078676 A1 WO2008078676 A1 WO 2008078676A1 JP 2007074643 W JP2007074643 W JP 2007074643W WO 2008078676 A1 WO2008078676 A1 WO 2008078676A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
forming method
pattern forming
composition used
Prior art date
Application number
PCT/JP2007/074643
Other languages
English (en)
French (fr)
Inventor
Shunji Kawato
Yoshisuke Toyama
Katsuto Taniguchi
Original Assignee
Az Electronic Materials (Japan) K.K.
Az Electronic Materials Usa Corp.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials (Japan) K.K., Az Electronic Materials Usa Corp. filed Critical Az Electronic Materials (Japan) K.K.
Priority to KR1020097005873A priority Critical patent/KR101330558B1/ko
Priority to CN2007800394213A priority patent/CN101553758B/zh
Publication of WO2008078676A1 publication Critical patent/WO2008078676A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

　本発明は、塗布性および形成されるパターン形状を改良することができる感光性樹脂組成物と、それを用いたパターン形成方法を提供するものである。その感光性樹脂組成物は、アルカリ可溶性樹脂、感光剤、および混合溶媒を含んでなり、前記混合溶媒がプロピレングリコールモノメチルエーテルアセテートと２０°Cにおける蒸気圧が１５０Ｐａ以下の共溶媒とを含んでなるものである。この組成物はスリットコーティング法により塗布する場合に好ましく用いられる。
PCT/JP2007/074643 2006-12-25 2007-12-21 パターン形成方法およびそれに用いる感光性樹脂組成物 WO2008078676A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020097005873A KR101330558B1 (ko) 2006-12-25 2007-12-21 패턴 형성 방법 및 이것에 사용하는 감광성 수지 조성물
CN2007800394213A CN101553758B (zh) 2006-12-25 2007-12-21 图案的形成方法及其所使用的感光性树脂组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-347323 2006-12-25
JP2006347323A JP4403174B2 (ja) 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物

Publications (1)

Publication Number Publication Date
WO2008078676A1 true WO2008078676A1 (ja) 2008-07-03

Family

ID=39562466

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/074643 WO2008078676A1 (ja) 2006-12-25 2007-12-21 パターン形成方法およびそれに用いる感光性樹脂組成物

Country Status (5)

Country Link
JP (1) JP4403174B2 (ja)
KR (1) KR101330558B1 (ja)
CN (1) CN101553758B (ja)
TW (1) TWI447782B (ja)
WO (1) WO2008078676A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010175828A (ja) * 2009-01-29 2010-08-12 Az Electronic Materials Kk 感光性樹脂組成物およびパターン形成方法
JP2013120238A (ja) * 2011-12-06 2013-06-17 Tokyo Ohka Kogyo Co Ltd スピンレスコーティング用レジストの製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8257901B2 (en) 2009-03-10 2012-09-04 Lg Chem, Ltd. Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
KR101227280B1 (ko) * 2009-09-10 2013-01-28 도레이 카부시키가이샤 감광성 수지 조성물 및 감광성 수지막의 제조방법
KR101729599B1 (ko) * 2012-09-28 2017-04-24 후지필름 가부시키가이샤 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법
JPWO2014126034A1 (ja) * 2013-02-14 2017-02-02 富士フイルム株式会社 インクジェット塗布用感光性樹脂組成物、熱処理物及びその製造方法、樹脂パターン製造方法、液晶表示装置、有機ｅｌ表示装置、タッチパネル及びその製造方法、並びに、タッチパネル表示装置
TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08110634A (ja) * 1994-10-07 1996-04-30 Fuji Photo Film Co Ltd フォトレジスト塗布液
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2002267833A (ja) * 2001-03-14 2002-09-18 Toray Ind Inc 液晶ディスプレイ用カラーフィルタの製造方法。
JP2004213013A (ja) * 2003-01-03 2004-07-29 Samsung Electronics Co Ltd フォトレジスト組成物
WO2004095142A1 (en) * 2003-04-24 2004-11-04 Az Electronic Materials(Japan)K.K. Resist composition and organic solvent for removing resist
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005257884A (ja) * 2004-03-10 2005-09-22 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びパターン形成方法
JP2006023734A (ja) * 2004-07-05 2006-01-26 Dongjin Semichem Co Ltd フォトレジスト組成物及びこれを利用する液晶表示装置又は半導体素子の製造方法
JP2006349981A (ja) * 2005-06-16 2006-12-28 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007025645A (ja) * 2005-06-15 2007-02-01 Jsr Corp 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP2007219499A (ja) * 2006-01-18 2007-08-30 Fujifilm Electronic Materials Co Ltd 光硬化性組成物並びにそれを用いたカラーフィルタ及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI411877B (zh) * 2005-06-15 2013-10-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08110634A (ja) * 1994-10-07 1996-04-30 Fuji Photo Film Co Ltd フォトレジスト塗布液
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2002267833A (ja) * 2001-03-14 2002-09-18 Toray Ind Inc 液晶ディスプレイ用カラーフィルタの製造方法。
JP2004213013A (ja) * 2003-01-03 2004-07-29 Samsung Electronics Co Ltd フォトレジスト組成物
WO2004095142A1 (en) * 2003-04-24 2004-11-04 Az Electronic Materials(Japan)K.K. Resist composition and organic solvent for removing resist
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005257884A (ja) * 2004-03-10 2005-09-22 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びパターン形成方法
JP2006023734A (ja) * 2004-07-05 2006-01-26 Dongjin Semichem Co Ltd フォトレジスト組成物及びこれを利用する液晶表示装置又は半導体素子の製造方法
JP2007025645A (ja) * 2005-06-15 2007-02-01 Jsr Corp 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP2006349981A (ja) * 2005-06-16 2006-12-28 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007219499A (ja) * 2006-01-18 2007-08-30 Fujifilm Electronic Materials Co Ltd 光硬化性組成物並びにそれを用いたカラーフィルタ及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010175828A (ja) * 2009-01-29 2010-08-12 Az Electronic Materials Kk 感光性樹脂組成物およびパターン形成方法
JP2013120238A (ja) * 2011-12-06 2013-06-17 Tokyo Ohka Kogyo Co Ltd スピンレスコーティング用レジストの製造方法

Also Published As

Publication number Publication date
JP4403174B2 (ja) 2010-01-20
KR20090094216A (ko) 2009-09-04
CN101553758B (zh) 2012-04-04
TW200849329A (en) 2008-12-16
TWI447782B (zh) 2014-08-01
CN101553758A (zh) 2009-10-07
KR101330558B1 (ko) 2013-11-18
JP2008158281A (ja) 2008-07-10

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