TW200719083A - Radiation sensitive composition for forming a colored layer and color filter - Google Patents

Radiation sensitive composition for forming a colored layer and color filter

Info

Publication number
TW200719083A
TW200719083A TW095121640A TW95121640A TW200719083A TW 200719083 A TW200719083 A TW 200719083A TW 095121640 A TW095121640 A TW 095121640A TW 95121640 A TW95121640 A TW 95121640A TW 200719083 A TW200719083 A TW 200719083A
Authority
TW
Taiwan
Prior art keywords
radiation sensitive
sensitive composition
colored layer
forming
color filter
Prior art date
Application number
TW095121640A
Other languages
Chinese (zh)
Other versions
TWI395055B (en
Inventor
Tatsuya Hattori
Tatsuyoshi Kawamoto
Masashi Arai
Kazuhiro Kobayashi
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200719083A publication Critical patent/TW200719083A/en
Application granted granted Critical
Publication of TWI395055B publication Critical patent/TWI395055B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Abstract

A radiation sensitive composition comprising a colorant, an alkali-soluble resin, a polyfunctional monomer, a photopolymerization initiator and a solvent, wherein the solvent contains 5 to 40 wt% of dipropylene glycol dimethyl ether and the composition is used to form a colored layer. A dried product of this radiation sensitive composition which is produced in a slit nozzle has high solvent re-solubility and the composition does not produce a bumping hole.
TW095121640A 2005-06-16 2006-06-16 Radiation sensitive composition, method of forming a color filter using said composition, color filter and color liquid crystal display panel TWI395055B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005175968A JP4661384B2 (en) 2005-06-16 2005-06-16 Radiation-sensitive composition for forming colored layer and color filter

Publications (2)

Publication Number Publication Date
TW200719083A true TW200719083A (en) 2007-05-16
TWI395055B TWI395055B (en) 2013-05-01

Family

ID=37519324

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121640A TWI395055B (en) 2005-06-16 2006-06-16 Radiation sensitive composition, method of forming a color filter using said composition, color filter and color liquid crystal display panel

Country Status (5)

Country Link
JP (1) JP4661384B2 (en)
KR (1) KR100900389B1 (en)
CN (1) CN1881081B (en)
SG (1) SG128605A1 (en)
TW (1) TWI395055B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI397768B (en) * 2008-02-13 2013-06-01 Fujifilm Corp Colored photosensitive composition, color filter and method of producing thereof

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JP4656025B2 (en) * 2006-08-31 2011-03-23 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer and color filter
JP4403174B2 (en) * 2006-12-25 2010-01-20 Ａｚエレクトロニックマテリアルズ株式会社 Pattern forming method and photosensitive resin composition used therefor
JP5135820B2 (en) * 2007-02-20 2013-02-06 Ｊｓｒ株式会社 Alkali-soluble polymer, radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device
CN101617001B (en) * 2007-03-09 2012-07-25 株式会社东进世美肯 Black paste composition having conductive property, filter for shielding electromagnetic interference and display device comprising the same
JP4949107B2 (en) * 2007-03-29 2012-06-06 富士フイルム株式会社 Colored curable resin composition, colored pattern forming method, colored pattern, method for producing color filter, color filter, and liquid crystal display element
JP4959411B2 (en) 2007-04-27 2012-06-20 富士フイルム株式会社 Colored photopolymerizable composition, color filter using the same, and method for producing color filter
JP5144971B2 (en) * 2007-06-14 2013-02-13 株式会社Ｄｎｐファインケミカル Photosensitive resin composition
JP5157522B2 (en) * 2008-02-28 2013-03-06 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP5448352B2 (en) * 2008-03-10 2014-03-19 富士フイルム株式会社 Colored curable composition, color filter, and solid-state imaging device
JP5020142B2 (en) * 2008-03-26 2012-09-05 凸版印刷株式会社 Color resist composition and color filter using the composition
JP5177914B2 (en) 2008-09-26 2013-04-10 エルジー ケム． エルティーディ． Black matrix photosensitive resin composition, method for producing black matrix photosensitive resin composition, black matrix and liquid crystal display device
KR20110083023A (en) * 2010-01-13 2011-07-20 주식회사 엘지화학 Binder resin and ink composition comprising the same for roll printing
US8962741B2 (en) 2010-08-12 2015-02-24 Lg Chem, Ltd. Thermally curable resin composition for protective film
JP5502038B2 (en) * 2010-08-12 2014-05-28 エルジー ケム． エルティーディ． Thermosetting protective film resin composition
JP6175754B2 (en) * 2011-11-07 2017-08-09 住友化学株式会社 Curable resin composition
JP2013195973A (en) * 2012-03-22 2013-09-30 Mitsubishi Chemicals Corp Coloring resin composition, color filter, liquid crystal display device, and organic el display device
CN104497204B (en) * 2014-11-18 2017-12-19 惠晶显示科技（苏州）有限公司 A kind of alkali soluble resins and the UV solidification hydrofluoric acid resistant protection glue compositions containing alkali soluble resins
JP6460836B2 (en) * 2015-02-26 2019-01-30 東京応化工業株式会社 Non-rotating coating composition and resin composition film forming method
KR102475604B1 (en) 2016-08-25 2022-12-08 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device produced using the same
KR20190071672A (en) * 2016-10-21 2019-06-24 제이에스알 가부시끼가이샤 Method for forming a cured film, a radiation sensitive resin composition, a display element and a sensor provided with a cured film
CN110358010B (en) * 2019-07-16 2021-11-23 儒芯微电子材料（上海）有限公司 Alkali soluble polymer resin and preparation method and application thereof

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JPH05113664A (en) * 1991-10-21 1993-05-07 Nippon Kayaku Co Ltd Material for color filter and hardened body thereof
JPH0836262A (en) * 1994-07-25 1996-02-06 Mitsubishi Chem Corp Radiation sensitive composition
JPH0915844A (en) * 1995-06-29 1997-01-17 Hitachi Chem Co Ltd Colored image forming photosensitive solution, manufacture of color filter using it, and color filter
JPH1010724A (en) * 1996-06-27 1998-01-16 Hitachi Chem Co Ltd Color image forming photosensitive liquid, production of color filter using that, and color filter
JP4116342B2 (en) * 2001-08-29 2008-07-09 関西ペイント株式会社 Positive photosensitive coating composition, method for producing positive photosensitive resin, and pattern forming method
DE10237576A1 (en) * 2002-08-16 2004-02-26 Bayer Ag Aqueous binder dispersions as coating agents
JP2004191472A (en) * 2002-12-09 2004-07-08 Konica Minolta Holdings Inc Photosensitive composition and photosensitive lithographic printing plate
JP2004225829A (en) * 2003-01-24 2004-08-12 Nok Corp Method of manufacturing torsional damper
JP4627617B2 (en) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 Coloring composition, method for producing color filter, and method for producing black matrix substrate
KR100560281B1 (en) * 2003-11-27 2006-03-10 가부시키가이샤 씽크. 라보라토리 Positive-type photosensitive composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI397768B (en) * 2008-02-13 2013-06-01 Fujifilm Corp Colored photosensitive composition, color filter and method of producing thereof

Also Published As

Publication number Publication date
KR100900389B1 (en) 2009-06-02
JP4661384B2 (en) 2011-03-30
CN1881081B (en) 2012-07-18
KR20060131669A (en) 2006-12-20
TWI395055B (en) 2013-05-01
JP2006349981A (en) 2006-12-28
SG128605A1 (en) 2007-01-30
CN1881081A (en) 2006-12-20

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