TW200731006A - Radiation-sensitive composition for forming colored layer, and color filter - Google Patents

Radiation-sensitive composition for forming colored layer, and color filter

Info

Publication number
TW200731006A
TW200731006A TW095134969A TW95134969A TW200731006A TW 200731006 A TW200731006 A TW 200731006A TW 095134969 A TW095134969 A TW 095134969A TW 95134969 A TW95134969 A TW 95134969A TW 200731006 A TW200731006 A TW 200731006A
Authority
TW
Taiwan
Prior art keywords
radiation
colored layer
sensitive composition
color filter
forming colored
Prior art date
Application number
TW095134969A
Other languages
Chinese (zh)
Other versions
TWI400561B (en
Inventor
Hiroki Ohara
Koji Hirano
Tatsuya Hattori
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200731006A publication Critical patent/TW200731006A/en
Application granted granted Critical
Publication of TWI400561B publication Critical patent/TWI400561B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C09D201/06—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
    • C09D201/08—Carboxyl groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)

Abstract

The radiation-sensitive composition for forming a colored layer comprises (A) a coloring agent, (B) an alkali soluble resin, (C) a polyfunctional monomer, (D) a photopolymerization initiator, and (E) a solvent which comprises 3-8.5% by weight of dipropylene glycol methyl ether acetate. The composition has the characteristic that the dried substance occurred at the narrow nozzle portion has high solvent redissolution property, and will not generate bumping holes at the dried layer.
TW095134969A 2005-09-22 2006-09-21 The colored layer is formed with a sensitive radiation linear composition and a color filter TWI400561B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005275992 2005-09-22
JP2006075062A JP4752556B2 (en) 2005-09-22 2006-03-17 Radiation-sensitive composition for forming colored layer and color filter

Publications (2)

Publication Number Publication Date
TW200731006A true TW200731006A (en) 2007-08-16
TWI400561B TWI400561B (en) 2013-07-01

Family

ID=38096924

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095134969A TWI400561B (en) 2005-09-22 2006-09-21 The colored layer is formed with a sensitive radiation linear composition and a color filter

Country Status (4)

Country Link
JP (1) JP4752556B2 (en)
KR (1) KR100874329B1 (en)
CN (1) CN1936704B (en)
TW (1) TWI400561B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895646B2 (en) 2010-03-24 2014-11-25 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Pigment dispersion and method for producing resin-treated pigment in the pigment dispersion

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007163911A (en) * 2005-12-15 2007-06-28 Toyo Ink Mfg Co Ltd Colored composition and color filter
JP5122168B2 (en) * 2007-03-29 2013-01-16 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP5546734B2 (en) * 2007-03-29 2014-07-09 東京応化工業株式会社 Colored photosensitive resin composition, black matrix, color filter, and liquid crystal display
JP4959411B2 (en) * 2007-04-27 2012-06-20 富士フイルム株式会社 Colored photopolymerizable composition, color filter using the same, and method for producing color filter
JP5224762B2 (en) * 2007-09-27 2013-07-03 富士フイルム株式会社 Pigment dispersion composition and photocurable composition for color filter obtained thereby
JP5156442B2 (en) * 2008-03-13 2013-03-06 東京応化工業株式会社 Colored photosensitive resin composition, black matrix, color filter, and liquid crystal display
JP5291405B2 (en) * 2008-07-31 2013-09-18 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP5177914B2 (en) * 2008-09-26 2013-04-10 エルジー ケム． エルティーディ． Black matrix photosensitive resin composition, method for producing black matrix photosensitive resin composition, black matrix and liquid crystal display device
JP5919830B2 (en) * 2011-02-08 2016-05-18 住友化学株式会社 Colored photosensitive resin composition
JP2013195973A (en) * 2012-03-22 2013-09-30 Mitsubishi Chemicals Corp Coloring resin composition, color filter, liquid crystal display device, and organic el display device
JP5485433B2 (en) * 2013-02-08 2014-05-07 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP6216133B2 (en) * 2013-03-25 2017-10-18 互応化学工業株式会社 Two-component mixed type main agent and curing agent, and method for producing printed wiring board
TWI674477B (en) * 2014-12-25 2019-10-11 日商富士軟片股份有限公司 Coloring curable composition, color filter, pattern forming method, method of manufacturing color filter, solid-state imaging element, and image display device
KR20170039560A (en) * 2015-10-01 2017-04-11 롬엔드하스전자재료코리아유한회사 Photosensitive resin composition and organic insulating film using same
JP7131089B2 (en) * 2018-06-01 2022-09-06 東洋インキＳｃホールディングス株式会社 Coloring composition for color filter and color filter
US20230185190A1 (en) * 2021-12-10 2023-06-15 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same and color filter

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186638A (en) * 1996-12-26 1998-07-14 Clariant Internatl Ltd Radiations sensitive composition for roll coating
US6379865B1 (en) * 2000-04-11 2002-04-30 3M Innovative Properties Company Photoimageable, aqueous acid soluble polyimide polymers
KR20030011480A (en) * 2001-08-03 2003-02-11 주식회사 덕성 Stripper composition for photoresist
JP4108303B2 (en) * 2001-08-23 2008-06-25 三菱化学株式会社 Curable resin composition, color filter, method for producing color filter, and liquid crystal display device
JP2005514661A (en) * 2002-01-11 2005-05-19 クラリアント インターナショナル リミテッド Cleaning composition for positive or negative photoresist
JP2004110019A (en) * 2002-08-30 2004-04-08 Toray Ind Inc Positive photosensitive paste, method for forming pattern using same, method for manufacturing plasma display
JP4627617B2 (en) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 Coloring composition, method for producing color filter, and method for producing black matrix substrate
JP4322609B2 (en) * 2003-09-19 2009-09-02 富士フイルム株式会社 Dye-containing negative curable composition, color filter, and method for producing the same
JP2005234045A (en) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd Color resin composition
JP4558443B2 (en) * 2004-03-15 2010-10-06 ダイセル化学工業株式会社 Resist composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895646B2 (en) 2010-03-24 2014-11-25 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Pigment dispersion and method for producing resin-treated pigment in the pigment dispersion
TWI480340B (en) * 2010-03-24 2015-04-11 Dainichiseika Color Chem A pigment dispersion, and a resin-treated pigment using the pigment dispersion

Also Published As

Publication number Publication date
JP4752556B2 (en) 2011-08-17
TWI400561B (en) 2013-07-01
KR20070033904A (en) 2007-03-27
KR100874329B1 (en) 2008-12-18
JP2007114723A (en) 2007-05-10
CN1936704A (en) 2007-03-28
CN1936704B (en) 2011-04-13

Similar Documents

Publication Publication Date Title
TW200731006A (en) Radiation-sensitive composition for forming colored layer, and color filter
TW200719083A (en) Radiation sensitive composition for forming a colored layer and color filter
TW200621908A (en) Ink composition and color filter including the same
EP2372456A3 (en) Novel polymers and photoresist compositions
EP1596251A4 (en) Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method
WO2011002247A3 (en) Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
MY163409A (en) Photosensitive resin composition,laminate utilizing same and solid-state imaging device
WO2008123601A3 (en) Pigment-dispersed composition, curable composition, and color filter and production method thereof
WO2006083284A3 (en) A material composition for nano- and micro-lithography
WO2008111247A1 (en) Photosensitive composition, photosensitive film, method for formation of permanent pattern, and print substrate
TW200639586A (en) Photoresist compositions comprising resin blends
TW200641523A (en) Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter
WO2006057423A3 (en) Photosensitive resin composition and photosensitive dry film by the use thereof
WO2007027224A3 (en) Water-soluble composition and structures, and methods of making and using the same
WO2008039902A9 (en) Inkjet ink composition
WO2011101364A3 (en) Composition of pigments soluble in water and/or in organic solvents
WO2009034177A3 (en) Diagnostic substances for optical imaging testing on the basis of nanoparticular formulations
EP1777700A4 (en) Non-solvent type photocurable resin composition for protection film
EP1507170A3 (en) Polymerizable composition and image-recording material using the same
TW201612630A (en) Photosensitive resin composition and color filter using the same
TW200643115A (en) Green pigment preparations based on C.I. pigment green 36
EP2470957A4 (en) Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
TW200516273A (en) Plastic lens and process for preparing the lens
EP1628159A3 (en) Chemical amplification resist composition and pattern-forming method using the same
PL362552A1 (en) Aqueous dispersion and the use thereof in the production of coating agents, adhesives and sealing agents that can cured by heat or by actinic radiation