TW200708893A - Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern - Google Patents
Pigment-dispersing type radiation-sensitive resin composition and method of forming colored patternInfo
- Publication number
- TW200708893A TW200708893A TW095119051A TW95119051A TW200708893A TW 200708893 A TW200708893 A TW 200708893A TW 095119051 A TW095119051 A TW 095119051A TW 95119051 A TW95119051 A TW 95119051A TW 200708893 A TW200708893 A TW 200708893A
- Authority
- TW
- Taiwan
- Prior art keywords
- pigment
- sensitive resin
- type radiation
- resin composition
- dispersing type
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
A method of forming a pigment-dispersing type radiation-sensitive resin compositionand a colored pattern using the same is provided that is high in durability, and in particularly, in moisture resistance, after the photocuring thereof. A pigment-dispersing type radiation-sensitive resin composition is used which includes a photopolymerizable compound, a photopolymerization initiator, a pigment, a solvent, and a hydrophorbic resin, which forms a hydrophorbic surface with a water drop contact angle of no less than 75 degrees, after application and photocouring.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005188893A JP4627224B2 (en) | 2005-06-28 | 2005-06-28 | Pigment-dispersed radiation-sensitive resin composition and method for forming colored pattern |
JP2005188894A JP2007010796A (en) | 2005-06-28 | 2005-06-28 | Pigment-dispersed radiation-sensitive resin composition and colored pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200708893A true TW200708893A (en) | 2007-03-01 |
TWI326800B TWI326800B (en) | 2010-07-01 |
Family
ID=37868681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095119051A TWI326800B (en) | 2005-06-28 | 2006-05-29 | Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern |
Country Status (4)
Country | Link |
---|---|
JP (2) | JP4627224B2 (en) |
KR (1) | KR100805862B1 (en) |
CN (1) | CN100439946C (en) |
TW (1) | TWI326800B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101386207B1 (en) * | 2007-06-01 | 2014-04-21 | 주식회사 케이씨씨 | Pigment dispersion and process for preparing the same |
JP2009300564A (en) * | 2008-06-11 | 2009-12-24 | Toppan Printing Co Ltd | Photosensitive colored composition, and color filter and liquid crystal display device using this |
WO2010070978A1 (en) * | 2008-12-18 | 2010-06-24 | 凸版印刷株式会社 | Color filter for liquid-crystal display device and liquid-crystal display device |
JP5740184B2 (en) * | 2010-03-25 | 2015-06-24 | 富士フイルム株式会社 | Pattern forming method and resist composition |
WO2015008596A1 (en) * | 2013-07-19 | 2015-01-22 | Dic株式会社 | Active energy ray-curable composition, active energy ray-curable printing ink comprising same, and printed matter |
JP6123620B2 (en) * | 2013-09-30 | 2017-05-10 | Jsr株式会社 | Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element |
KR102581926B1 (en) * | 2015-08-24 | 2023-09-22 | 삼성전자주식회사 | Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom |
KR102152600B1 (en) * | 2018-09-27 | 2020-09-07 | 한국세라믹기술원 | Ceramic ink composition having hydrophobicity |
JP7402034B2 (en) | 2019-12-16 | 2023-12-20 | 東京応化工業株式会社 | Colored photosensitive composition, colored film, method for producing colored film, and method for producing patterned colored film |
KR200497302Y1 (en) | 2021-02-18 | 2023-09-27 | 주식회사 다우기업 | A squeezing a tube tool |
TW202315897A (en) | 2021-10-06 | 2023-04-16 | 日商日本化藥股份有限公司 | Colored photosensitive composition, cured product, and image display apparatus including cured product |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69527840T2 (en) * | 1995-01-25 | 2003-05-28 | Mitsubishi Chem Corp | POLYMERIZABLE COMPOSITION FOR COLOR FILTERS |
JPH08220328A (en) * | 1995-02-09 | 1996-08-30 | Mitsubishi Chem Corp | Polymerizable composition for color filter |
US5908720A (en) * | 1995-10-13 | 1999-06-01 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof |
JPH1184125A (en) | 1997-09-12 | 1999-03-26 | Tokyo Ohka Kogyo Co Ltd | Photopolymerizable composition for color filter and production of color filter |
JP2002145999A (en) * | 2000-11-15 | 2002-05-22 | Nagase Kasei Kogyo Kk | Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin |
EP1560068B1 (en) * | 2002-11-06 | 2008-01-23 | Asahi Glass Company Ltd. | Barrier rib and its method of preparation |
JP2004219809A (en) * | 2003-01-16 | 2004-08-05 | Fuji Photo Film Co Ltd | Light-shielding photosensitive resin composition, light-shielding photosensitive resin transfer material, method for forming light-shielding picture and color filter |
-
2005
- 2005-06-28 JP JP2005188893A patent/JP4627224B2/en active Active
- 2005-06-28 JP JP2005188894A patent/JP2007010796A/en active Pending
-
2006
- 2006-05-29 TW TW095119051A patent/TWI326800B/en active
- 2006-06-26 KR KR1020060057305A patent/KR100805862B1/en active IP Right Grant
- 2006-06-26 CN CNB2006100946964A patent/CN100439946C/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20070000993A (en) | 2007-01-03 |
CN1892264A (en) | 2007-01-10 |
JP2007010796A (en) | 2007-01-18 |
KR100805862B1 (en) | 2008-02-21 |
JP2007010795A (en) | 2007-01-18 |
JP4627224B2 (en) | 2011-02-09 |
CN100439946C (en) | 2008-12-03 |
TWI326800B (en) | 2010-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200708893A (en) | Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern | |
TW200641523A (en) | Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter | |
WO2008111247A1 (en) | Photosensitive composition, photosensitive film, method for formation of permanent pattern, and print substrate | |
TW200801798A (en) | Photosensitive composition and color filter formed from the same | |
TW200700905A (en) | Color photosensitive resin composition and hardened product of the same | |
WO2006091648A3 (en) | Immersion topcoat materials with improved performance | |
WO2006057423A3 (en) | Photosensitive resin composition and photosensitive dry film by the use thereof | |
TW200628977A (en) | Photosensitive resin composition and photosensitive dry film by the use thereof | |
TW200704660A (en) | New organic bottom antireflective polymer compositions | |
EP2062950A3 (en) | Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same | |
TW200608144A (en) | Photoresist undercoat-forming material and patterning process | |
TW200734718A (en) | Method for forming pixel isolation wall for color filter, substrate having pixel isolation wall for color filter, color filter for display device, and display device | |
EP1975702A3 (en) | Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device | |
WO2008133312A1 (en) | Photosensitive composition, partition wall, black matrix, and method for producing color filter | |
TW200834231A (en) | Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter | |
EP1783551A3 (en) | Resist composition and patterning process | |
TW200627065A (en) | Compositions curable with actinic energy ray | |
TW200609674A (en) | Photoresist resin composition | |
TW200739265A (en) | Positive photoresist composition and method of forming photoresist pattern using the same | |
EP1731657A4 (en) | Composition for cord coating, cord for rubber reinforcement made with the same, and rubber product made with the same | |
WO2009034861A1 (en) | Resin composition for light diffusion plate, light diffusion plate and method for producing the same | |
WO2005036267A3 (en) | Photosensitive resin compositions and photosensitive dry films using the same | |
WO2008063374A3 (en) | Colorant compositions and their use as ph sensitive color indicators | |
WO2009078407A1 (en) | Color composition, method for producing color filter, and color filter | |
EP1403708A3 (en) | Photoresist |