TWI440988B - Projection optical systems and exposure devices - Google Patents

Projection optical systems and exposure devices Download PDF

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Publication number
TWI440988B
TWI440988B TW097116652A TW97116652A TWI440988B TW I440988 B TWI440988 B TW I440988B TW 097116652 A TW097116652 A TW 097116652A TW 97116652 A TW97116652 A TW 97116652A TW I440988 B TWI440988 B TW I440988B
Authority
TW
Taiwan
Prior art keywords
reflecting surface
optical system
concave reflecting
projection optical
concave
Prior art date
Application number
TW097116652A
Other languages
English (en)
Chinese (zh)
Other versions
TW200903187A (en
Inventor
Ryousuke Fukuoka
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200903187A publication Critical patent/TW200903187A/zh
Application granted granted Critical
Publication of TWI440988B publication Critical patent/TWI440988B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097116652A 2007-05-15 2008-05-06 Projection optical systems and exposure devices TWI440988B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007129797A JP5196869B2 (ja) 2007-05-15 2007-05-15 投影光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
TW200903187A TW200903187A (en) 2009-01-16
TWI440988B true TWI440988B (zh) 2014-06-11

Family

ID=40146698

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097116652A TWI440988B (zh) 2007-05-15 2008-05-06 Projection optical systems and exposure devices

Country Status (3)

Country Link
JP (1) JP5196869B2 (enrdf_load_stackoverflow)
KR (1) KR100966190B1 (enrdf_load_stackoverflow)
TW (1) TWI440988B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6635904B2 (ja) 2016-10-14 2020-01-29 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP7167417B2 (ja) * 2017-03-30 2022-11-09 株式会社ニデック 眼底撮影装置および眼科装置
JP7357488B2 (ja) * 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
JP7614962B2 (ja) * 2021-07-08 2025-01-16 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1103498A (en) * 1977-02-11 1981-06-23 Abe Offner Wide annulus unit power optical system
JPS5890610A (ja) * 1981-11-24 1983-05-30 Matsushita Electric Ind Co Ltd カタデイオプトリツク光学系
JPS60168116A (ja) * 1984-02-13 1985-08-31 Canon Inc 反射光学系
JPS60201316A (ja) * 1984-03-26 1985-10-11 Canon Inc 反射光学系
JPH0553057A (ja) * 1991-08-26 1993-03-05 Nikon Corp 反射光学系
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
JPH09180985A (ja) * 1995-12-25 1997-07-11 Nikon Corp 投影露光装置
US7158215B2 (en) 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2006078592A (ja) * 2004-09-07 2006-03-23 Canon Inc 投影光学系及びそれを有する露光装置
JP2008089832A (ja) * 2006-09-29 2008-04-17 Canon Inc 露光装置

Also Published As

Publication number Publication date
TW200903187A (en) 2009-01-16
KR100966190B1 (ko) 2010-06-25
JP5196869B2 (ja) 2013-05-15
JP2008286888A (ja) 2008-11-27
KR20080101695A (ko) 2008-11-21

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