TWI427735B - Electrostatic chuck and electrostatic chuck manufacturing method - Google Patents

Electrostatic chuck and electrostatic chuck manufacturing method Download PDF

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Publication number
TWI427735B
TWI427735B TW99100929A TW99100929A TWI427735B TW I427735 B TWI427735 B TW I427735B TW 99100929 A TW99100929 A TW 99100929A TW 99100929 A TW99100929 A TW 99100929A TW I427735 B TWI427735 B TW I427735B
Authority
TW
Taiwan
Prior art keywords
electrostatic chuck
resin
coating
protrusion
flat
Prior art date
Application number
TW99100929A
Other languages
English (en)
Chinese (zh)
Other versions
TW201034114A (en
Inventor
Hiroaki Hori
Takeshi Uchimura
Hiroki Matsui
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Publication of TW201034114A publication Critical patent/TW201034114A/zh
Application granted granted Critical
Publication of TWI427735B publication Critical patent/TWI427735B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW99100929A 2009-01-14 2010-01-14 Electrostatic chuck and electrostatic chuck manufacturing method TWI427735B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009006147A JP5293211B2 (ja) 2009-01-14 2009-01-14 静電チャックおよび静電チャックの製造方法

Publications (2)

Publication Number Publication Date
TW201034114A TW201034114A (en) 2010-09-16
TWI427735B true TWI427735B (zh) 2014-02-21

Family

ID=42339860

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99100929A TWI427735B (zh) 2009-01-14 2010-01-14 Electrostatic chuck and electrostatic chuck manufacturing method

Country Status (3)

Country Link
JP (1) JP5293211B2 (enExample)
TW (1) TWI427735B (enExample)
WO (1) WO2010082606A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5458050B2 (ja) 2011-03-30 2014-04-02 日本碍子株式会社 静電チャックの製法
US8573469B2 (en) 2011-11-18 2013-11-05 LuxVue Technology Corporation Method of forming a micro LED structure and array of micro LED structures with an electrically insulating layer
US8809875B2 (en) 2011-11-18 2014-08-19 LuxVue Technology Corporation Micro light emitting diode
US8333860B1 (en) 2011-11-18 2012-12-18 LuxVue Technology Corporation Method of transferring a micro device
US8349116B1 (en) 2011-11-18 2013-01-08 LuxVue Technology Corporation Micro device transfer head heater assembly and method of transferring a micro device
CN102799064B (zh) * 2012-08-21 2014-03-26 郑州大学 一种金属图形直接压印转移掩模板基板静电场力分离装置
US9460950B2 (en) 2013-12-06 2016-10-04 Applied Materials, Inc. Wafer carrier for smaller wafers and wafer pieces
WO2015084487A1 (en) * 2013-12-06 2015-06-11 Applied Materials, Inc. Apparatus for self centering preheat member
KR101994006B1 (ko) * 2014-06-23 2019-06-27 니혼도꾸슈도교 가부시키가이샤 정전 척
JP2018206993A (ja) * 2017-06-06 2018-12-27 日本特殊陶業株式会社 基板保持部材およびその製造方法
JP7083080B2 (ja) * 2018-01-11 2022-06-10 株式会社日立ハイテク プラズマ処理装置
JP7308254B2 (ja) * 2018-02-19 2023-07-13 日本特殊陶業株式会社 保持装置
US11742781B2 (en) * 2018-11-19 2023-08-29 Entegris, Inc. Electrostatic chuck with charge dissipation coating
US11911863B2 (en) 2019-09-11 2024-02-27 Creative Technology Corporation Attachment and detachment device
JP7606917B2 (ja) * 2021-04-16 2024-12-26 日本特殊陶業株式会社 保持装置
JP7718902B2 (ja) * 2021-08-06 2025-08-05 株式会社フェローテックマテリアルテクノロジーズ ウエハ支持体
JP2025103535A (ja) 2023-12-27 2025-07-09 新東工業株式会社 ブラシ研磨装置、及びウエハ保持装置の製造方法
JP2025150530A (ja) * 2024-03-27 2025-10-09 住友大阪セメント株式会社 静電チャック装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001060618A (ja) * 1999-08-20 2001-03-06 Canon Inc 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
US20030090070A1 (en) * 2001-09-13 2003-05-15 Sumitomo Osaka Cement Co., Ltd. Chucking apparatus and production method for the same
CN101030550A (zh) * 2006-03-03 2007-09-05 日本碍子株式会社 静电吸盘及其制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0643629B2 (ja) * 1987-01-22 1994-06-08 日本真空技術株式会社 静電チャック部品の製造方法
JP3847198B2 (ja) * 2002-03-27 2006-11-15 京セラ株式会社 静電チャック
JP2006287210A (ja) * 2005-03-07 2006-10-19 Ngk Insulators Ltd 静電チャック及びその製造方法
JP4987682B2 (ja) * 2007-04-16 2012-07-25 ソニー株式会社 音声チャットシステム、情報処理装置、音声認識方法およびプログラム
US7944677B2 (en) * 2007-09-11 2011-05-17 Canon Anelva Corporation Electrostatic chuck

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001060618A (ja) * 1999-08-20 2001-03-06 Canon Inc 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
US20030090070A1 (en) * 2001-09-13 2003-05-15 Sumitomo Osaka Cement Co., Ltd. Chucking apparatus and production method for the same
CN101030550A (zh) * 2006-03-03 2007-09-05 日本碍子株式会社 静电吸盘及其制造方法

Also Published As

Publication number Publication date
JP5293211B2 (ja) 2013-09-18
JP2010165805A (ja) 2010-07-29
TW201034114A (en) 2010-09-16
WO2010082606A1 (ja) 2010-07-22

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Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees