TWI424522B - Apparatus for processing a substrate - Google Patents

Description

Substrate processing device

This invention relates to a device for processing a substrate, and more particularly to a device for forming and drying a photoresist film on a flat panel display.

In general, an electronic circuit pattern is formed on a substrate of a flat panel display device such as a semiconductor substrate and flat glass. The electronic circuit pattern is typically subjected to a series of processes, such as deposition, photolithography, chemical etching, and cleaning, to form it step by step on the substrate.

In particular, the photo-etching process includes a coating process for applying a photoresist film on a substrate, a drying process for drying the photoresist film, and a soft baking process to harden the photoresist film, and the exposure process will be performed. The reticle pattern is transferred to the photoresist film, the development process causes the photoresist pattern to appear on the substrate, and the high temperature baking process completely hardens the photoresist film.

Each program unit in the photo-etching process is performed on a respective machine module, and the substrate is often transported by the robot to each machine module. For example, after the coating machine module is coated with the photoresist film, the substrate is sent to the drying machine module for drying process by the transport robot.

However, the substrate through the photo-etching process, once mass-produced, inevitably causes a high cost problem due to the high cost of transporting the robot. In addition, when the transport robot is used to transport the substrate modules of the respective substrates, the production speed of the substrates is difficult to increase, and the machine modules of the respective programs are also difficult to systematically operate with each other.

In view of the above, it is an object of the present invention to provide a processing apparatus for forming a photoresist film on a substrate and capable of horizontal transportation without the need to transport the robot.

According to an embodiment of the invention, a substrate processing apparatus is provided, comprising a coating module and a drying module, wherein the coating module is used to apply a photoresist film onto the substrate and horizontally move the substrate to the transport direction. The drying module is adjacent to the coating module for drying the photoresist film directly on the substrate of the coating module.

According to an embodiment of the invention, the coating module comprises a coating air supply, a transport unit, a nozzle, and a coating air supply for supplying air to the substrate, so that the substrate can float in the air, and the transport unit is used for The floating substrate is transported horizontally in the direction of transport, the nozzle being located above the coating air supply and extending in a nozzle direction substantially perpendicular to the transport direction. The photoresist film material will be supplied to the substrate as a nozzle.

According to an embodiment of the invention, the coating air supply comprises a perforated plate with a plurality of holes through which air passes. In addition, the coating air supply further includes a porous plate having a plurality of pores through which air passes, and a side barrier for enclosing the side of the porous sheet.

According to an embodiment of the invention, the transport unit includes a plurality of vacuum chucks that are secured to the edge portions of the substrate by vacuum pressure. In particular, the transport unit transports the substrate to the interior of the drying module.

According to an embodiment of the invention, the transport unit includes a plurality of rollers for supporting both side edge portions of the substrate and linearly aligned along the transport direction.

According to an embodiment of the invention, a drying module is provided, comprising a drying chamber comprising a drying space for receiving the substrate; a dry air supply in the drying chamber for supplying air to the substrate to float the substrate In the air; a bracket above the dry air supply for supporting the substrate in the drying chamber; and a vacuum unit for supplying a vacuum pressure to the interior of the drying chamber to dry the photoresist film on the substrate The inside of the room is vacuumed and dried.

According to an embodiment of the invention, the dry air supply comprises a perforated plate comprising a plurality of holes for passage of air; a porous sheet comprising a plurality of apertures for passage of air; A barrier that encloses the side of the porous sheet.

According to an embodiment of the invention, the drying module further includes a transport unit for horizontally transporting the floating substrate to the transport direction. The transport unit includes a plurality of vacuum chucks that are secured to the edge portions of the substrate by vacuum pressure. Further, the transport unit includes a plurality of rollers for supporting both side edge portions of the substrate and linearly aligned along the transport direction.

According to an embodiment of the invention, the drying chamber includes an inlet for passing the substrate in the conveying direction into the drying chamber, and an outlet for passing the substrate away from the drying chamber in the conveying direction. Wherein, the inlet and the outlet include a gate valve for isolating the drying space of the drying chamber from the outside.

In accordance with an embodiment of the present invention, a bracket is provided that includes a plurality of support pins located above the dry air supply, the support pins being movable up and down to avoid being supported when the substrate is transported into or out of the drying chamber Obstructed.

According to an embodiment of the invention, the processing device comprises a coating module and a drying module. The substrate is transported horizontally from the loader through the coating module and the drying module to the unloader. In particular, the substrate is transported directly from the coating module to the drying module. In the coating module and the drying module, the air supply and the dry air supply are respectively applied to the substrate to float the substrate in the air, and are also transported by the individual transport units in the transport direction. That is to say, the substrate is carried out in an in-line type in the processing apparatus, which reduces the processing time.

In addition, the processing device does not require a robot to be transported, which significantly reduces manufacturing and maintenance costs compared to conventional processing devices.

In order to provide a better understanding of the above and other aspects of the present invention, the following detailed description of the exemplary embodiments,

Various embodiments will be described in more detail below, please refer to the accompanying drawings. However, the invention may be embodied in many different forms and is not limited to the examples described herein. On the contrary, the embodiments are intended to be thorough and complete, and the scope thereof In these figures, the size and relative size of the layers and regions may be exaggerated to make them clearer.

When an element or layer is referred to as "on," "connected to" or "coupled to" to another element or layer, the element or layer It is directly or indirectly (with elements or layers in between) connected to another element or layer. Conversely, when an element or layer is referred to as "directly on", "directly connected to" or "directly coupled to" to another element or layer, Any component or layer is between. Like numbers are indicated on like elements. As used herein, "and/or" includes a combination of any and all of the elements.

We will also understand that although the first, second, third, etc. words are used in this specification to describe different elements, components, regions, layers, and/or sections. ), however, they should not be limited by these words, these words are only used to distinguish each other. Thus, a first element, component, region, layer and/or portion may be replaced by a second element, component, region, layer and/or portion, and does not affect the understanding of the present invention.

Describe the spatial relationship, such as "under", "below", "above", "above" and other vocabulary, to facilitate us to understand the elements or features in the schema Relationship. We also use these spatial relationship vocabulary to describe the devices in the schema and the different directions of operation. For example, if the device in the drawings is turned over 180 degrees, the device may be described as "under" or "under" another element or feature, and may be described as "above" another element or feature. Therefore, the typical "below" vocabulary now includes both "upper" and "lower" orientations. The device may also turn to other orientations (rotated 90 degrees or other orientations), and these spatially related terms will be interpreted differently.

The specific terms used in the specification are for the purpose of distinguishing the particular embodiments. In this document, singular forms of vocabulary such as "a or an" and "the" also have a meaning of a majority unless clearly indicated. It needs to be further understood that when "comprises or including" appears in this specification, it is intended to clearly indicate the stated features, the integraters, the steps, the operations, the elements. And/or components, but do not exclude other features, integers, steps, modes of operation, components, and/or components.

The cross-sectional views of the embodiments of the present specification are idealized embodiments (and intermediate structures). That is, results that are different from the state of the drawing, such as manufacturing techniques and/or tolerances, may occur. Therefore, the examples should not be construed as limiting the invention in the particular state or region, but should include the s For example, a pattern is a rectangular implanted region that typically has a circular or curved feature and/or has an implant concentration gradient at the border instead of directly distinguishing the implanted region from the non-implanted region. Two blocks. Similarly, implants formed by implantation may result in some implantation between the buried region and the implanted surface. Therefore, the shapes in the drawings are drawn naturally and intuitively, and these shapes are not intended to indicate the true shape of an area, nor are they intended to limit the scope of the invention.

Unless otherwise defined, all vocabulary (including technical and scientific terms) referred to in the present invention have the same meaning as common general knowledge and prior art. Furthermore, vocabulary as defined in a general dictionary should be interpreted as conforming to the relevant technical background, and unless the specification is explicitly defined, the vocabulary will not be interpreted as an idealized or overly formal meaning.

The following examples will explain the meaning of the additional drawings in detail.

FIG. 1 is a diagram showing a substrate processing apparatus according to an embodiment of the present invention. Hereinafter, this substrate processing apparatus will be simply referred to as a processing apparatus.

Referring to Fig. 1, the processing apparatus 10 is identical to the embodiment of the present invention and includes a coating module 100, a drying module 200, a loader 20, and an unloader 30. The coating module 100 is used to apply a photoresist film to the substrate 2, the drying module 200 is used to dry the photoresist film on the substrate 2, and the loader 20 is used to load the substrate 2 into the coating module 100. The unloader 30 is used to carry the substrate 2 from the drying module 200. For example, the substrate may include a semiconductor substrate such as a wafer in a semiconductor device and a glass substrate of a flat display panel.

For example, the substrate 2 may undergo a coating process in the coating module 100, and then directly transported from the coating module 100 to the drying module 200 without using any additional components such as a transport robot.

The coating module 100 horizontally moves the substrate 2 to the transport direction and supplies the photoresist film composition on the moving substrate 2, so that a photoresist film is formed on the substrate 2.

2 and 3 are schematic views showing a coating module of a processing apparatus according to a first embodiment of the first embodiment of the present invention. Fig. 2 is a plan view schematically showing a coating module of the processing apparatus in Fig. 1, and Fig. 3 is a schematic cross-sectional view showing a coating module of the processing apparatus in Fig. 1.

Referring to FIGS. 2 and 3, the coating module 100 of the first embodiment includes a coating air supply 102, a first transport unit 104, and a nozzle 106. The coating air supply 102 is for supplying air to the substrate 2 so that the substrate 2 can float in the air, the first transport unit 104 is for holding and transporting the substrate 2 in the transport direction, and the nozzle 106 is for supplying the photoresist film. The material is placed on the substrate 2 in transit.

The nozzle 106 is positioned above the coating air supply 102 and extends in a nozzle direction substantially perpendicular to the direction of transport. The nozzle direction and the transport direction define a plane parallel to the substrate 2. The nozzle 106 has a slit (not shown) to which the photoresist film material is supplied to the substrate 2. A plurality of slits are arranged in the nozzle direction, and when the substrate 2 is transported by the first transport unit 104 in the transport direction, the photoresist film material is supplied onto the substrate 2.

The coating air supply 102 includes a perforated plate 108 having a plurality of holes 108a. The perforated plate 108 is located below the nozzle 106 and is connected to an air source 110. For example, the perforated plate 108 can be coupled to an air manifold 112 and define a buffer space 112a that is coupled to the air source 110. Therefore, the hole 108a communicates with the buffer space 112a, and air can flow from the air source 110 through the buffer space 112a and the hole 108a to the back surface of the substrate 2. For example, the air source 110 can include a pneumatic pump and an air tank connected to the air source 110 via an air tube 110a. A control valve (not shown) is attached to the air tube 110a for controlling air flux through the perforated plate 108.

The perforated plate 108 can comprise a metal such as aluminum. The hole 108a has a diameter of about 0.1 mm to 2.3 mm. Adjacent holes 108a can be separated by a gap distance of about 10 mm to 150 mm. When the diameter of the hole 108a is larger than 2.3 mm, the temperature of the substrate 2 close to the hole 108a may be changed due to the passage of air through the hole 108a. The temperature change of the substrate 2 reduces the uniformity of the photoresist film 4 on the substrate 2, so the diameter of the first holes 142a is less than 2.3 mm.

The first transport unit 104 can fix the edge portion of the substrate 2 floating in the air and horizontally transport the substrate 2 in the transport direction. The width of the perforated plate 108 is smaller than that of the substrate 2, so that the side portions of the substrate 2 are not covered by the perforated plate 108.

For example, the first transport unit 104 can include a plurality of vacuum chucks 114 that adsorb the sides of the substrate 2 by vacuum pressure. The vacuum chuck 114 is fixed to a pair of linear motors 116 located on both sides of the perforated plate 108, so that the vacuum chuck 114 can be moved in the conveying direction by the linear motor 116. In a modified example, the vacuum chuck 114 is moved by a driving mechanism that includes a linear motion guide, a ball screw, and a ball block (a ball screw). a ball block). Although not shown in the drawings, the first transport unit may be fixed to the frame 100a.

In particular, the first transport unit 104 can transport the substrate 2 from the coating module 100 to the interior of the drying module 200. For example, the linear motor 116 includes a two-stepped linear mechanism such that the vacuum chuck 114 can be moved into the interior of the drying module 200 in the transport direction. The linear motor 116 includes a first linear mechanism and a second linear mechanism. The first linear mechanism is used for the substrate 2 in the coating module 100, and the second linear mechanism is used to continuously move the substrate 2 from the coating module 100 to the drying module 200.

The nozzle 106 is fixed to the cohesion 100b above the coating air supply 102, and the nozzle 106 extends in the nozzle direction. The gantry 100b is horizontally movable with respect to the frame 100a. In particular, the gantry 100b includes a retracting arm 100c that is positioned above the coating gas supply 102 and extends in the direction of the nozzle, while the nozzle 106 is secured to a lower portion of the gantry arm 100c. Therefore, when the hoisting arm 100c of the hoisting frame 100b is moved in the conveying direction, the nozzle 106 is also moved. The gantry arm 100c and the nozzle 106 are movable in a transport direction by a motor and a ball screw.

A cleaning unit (not labeled) may be further disposed over the coating air supply 106 for cleaning the nozzles 106. The gantry 106b can move the nozzle 106 in a horizontal or vertical direction for cleaning purposes.

The photoresist film material is sprayed to the substrate 2 through the nozzle 106, and the coating air supplier 102 floats the substrate 2 to the air and transports the substrate 2 by the first transport unit 104 in the transport direction.

Fig. 4 is a cross-sectional view showing a coating air supply device according to a first modified embodiment of Figs. 2 and 3 of the present invention.

Referring to Fig. 4, the first modified coating air supply 120 includes a porous sheet 122 and a side barrier 124 surrounding the porous sheet 122. The porous sheet 122 includes a porous material. Therefore, air is prevented from leaking from the side of the porous thin plate 122 by the side barrier 124.

The porous sheet 122 is composed of carbon and stainless steel and is formed by a sintering process. The porous thin plate 122 includes a plurality of fine pores having a diameter of 10 μm to 100 μm.

The porous sheet 122 is connected to the air source 110 by an air manifold 112. The air manifold 112 has the same structure as the air source 110, as shown in Figs. 2 and 3, so a more detailed description of the air manifold 112 and the air source 110 will be omitted.

Fig. 5 is a cross-sectional view showing a coating air supply device according to a second modified embodiment of Figs. 2 and 3 of the present invention.

Referring to Fig. 5, the second modified coating air supply 130 includes a perforated plate 132 having a plurality of holes 132a for allowing air to pass therethrough for supplying air to the substrate 2. The perforated plate 132 includes a plurality of slits 134, each having an idle roller disposed therein. The idler 136 can support the substrate 2 to prevent the substrate 2 from being deflected. In addition, a transport wheel placed in the slit 134 can be driven by an additional drive mechanism so that the substrate 2 can also be transported by transport in a round-robin transport direction, as is known in the prior art.

The perforated plate 132 can also be replaced by a porous sheet 122 located in the second modified air supply 130 in FIG. In this example, an inner barrier prevents leakage of air from the inner side of the slit 134. An outer barrier may also be provided to surround the side of the porous sheet 122 to prevent air from leaking from the pores of the porous sheet 122.

Fig. 6 and Fig. 7 show a third modified embodiment of the coating air supply in Figs. 2 and 3 of the present invention. Fig. 6 is a plan view schematically showing a third modified embodiment of the coating air supply, and Fig. 7 is a schematic sectional view showing a third modified embodiment of the coating air supply.

Referring to Figures 6 and 7, the third modified coating air supply 140 includes a perforated plate 142 having a plurality of first and second holes 142a, 142b. The first hole 142a allows air to pass through to supply air to the substrate 2, and the second hole 142b allows air to pass therethrough to discharge air from a gap region between the substrate 2 and the perforated plate 142.

The first aperture 142a of the perforated plate 142 is coupled to an air source 144. For example, the perforated plate 142 can be coupled to an air manifold 146 and define a buffer space 146a that is coupled to the air source 144 by an air tube 144a. The air source 144 can include a pneumatic pump, an air slot, and a first control valve to control air flow through the first aperture 142a of the perforated plate 142.

The perforated plate 142 may comprise a metal such as aluminum. The first hole 142a has a diameter of about 0.1 mm to 2.3 mm. If the first hole 142a has a diameter greater than 2.3 mm, the temperature of the substrate 2 near the hole 142a may be changed due to the passage of air through the first hole 142a. The temperature change of the substrate 2 reduces the uniformity of the photoresist film 4 on the substrate 2, so the diameter of the first holes 142a is less than 2.3 mm.

The second hole 142b can be connected to an exhaust manifold 148, so that air interposed between the gap between the substrate 2 and the perforated plate 142 can be discharged to the exhaust manifold 148. The exhaust manifold 148 is connected to the exhaust unit 149 by an exhaust pipe 149a. A second control valve (not shown) is disposed on the exhaust pipe 149a for controlling the exhaust air flux. The air discharge through the second holes 142b can increase the transfer reliability of the substrate 2.

Fig. 8 and Fig. 9 show a fourth modified embodiment of the coating air supply in Figs. 2 and 3 of the present invention. Fig. 8 is a plan view schematically showing a fourth modified embodiment of the coating air supply, and Fig. 9 is a schematic sectional view showing a fourth modified embodiment of the coating air supply.

Referring to Figures 8 and 9, the fourth modified coating air supply 150 includes a porous sheet 151 and a plurality of side barriers 152 enclosing the porous sheet 151. The porous sheet 151 includes a porous material. Therefore, air is prevented from leaking from the side of the porous sheet 151 by the side barrier 152.

The porous sheet 151 may be composed of carbon and stainless steel and formed by a sintering process. The porous sheet 151 includes a plurality of fine pores having a diameter of 10 μm to 100 μm.

The porous sheet 151 can be connected to an air branch pipe 156 and define a buffer space 156a. The air branch pipe 156 is connected to the air source 154 by an air pipe 154a.

Further, the porous thin plate 151 includes a plurality of exhaust holes 151a, so that air interposed between the gaps between the substrate 2 and the porous thin plate 151 can be discharged through the exhaust holes 151a. The exhaust hole 151a is connected to the exhaust manifold 158, and the exhaust manifold 158 is connected to the exhaust unit 159 by the exhaust pipe 159a. Discharging air through the exhaust holes 151a increases the transfer reliability of the substrate 2.

10 and 11 illustrate a second modified embodiment of the coating module of the processing apparatus according to Fig. 1 of the present invention. Fig. 10 is a plan view schematically showing a coating module of the processing apparatus in Fig. 1, and Fig. 11 is a schematic cross-sectional view showing a coating module of the processing apparatus in Fig. 1.

Referring to FIGS. 10 and 11, the coating module 300 of the second embodiment includes a coating air supply 302, a transport unit 304, and a nozzle 306. The coating air supply 302 is used to supply air to the substrate 2 to float the substrate 2 in the air, the transport unit 304 is used to fix and transport the floating substrate 2 in the transport direction, and the nozzle 306 is used to supply the photoresist film material. On the substrate 2 in transit.

Referring to Figures 2 through 10, the coating air supply 302 has the same structure and appearance, so a more detailed description of the coating air supply 302 will be omitted. In particular, the transport direction and the nozzle direction are directly the same as in FIGS. 2 and 3 .

The nozzle 306 is fixed to the re-frame 300b above the coating air supply 302 and extends in the nozzle direction, and the gantry 300b is horizontally movable with respect to the frame 300a. In particular, the gantry 300b includes a retracting arm 300c that is positioned above the coating gas supply 302 and extends in the direction of the nozzle, while the nozzle 306 is secured to a lower portion of the gantry arm 300c. Therefore, when the gantry arm 300c of the gantry 300b is moved in the conveying direction, the nozzle 306 also moves. The gantry arm 300c and the nozzle 106 are movable in a transport direction by a motor and a ball screw.

A cleaning unit (not shown) may be further disposed over the coating air supply 306 for cleaning the nozzle 306. The gantry 306b can move the nozzle 306 in a horizontal or vertical direction for cleaning purposes.

The photoresist film material is sprayed to the substrate 2 through the nozzle 306, and the coating air supply 302 floats the substrate 2 in the air, and transports the substrate 2 in a transport direction by a transport unit 304.

For example, the transport unit 304 includes a plurality of rollers 312 that are in partial contact with the substrate 2, and the rollers 312 are linearly aligned in the transport direction. The roller 312 can be in contact with the lower surface edge portion of the substrate 2, so that the substrate 2 can be carried with the rolling of the roller 312.

The roller 312 is disposed on a frame 300a and rotated by a drive motor 314. The rollers 312 may be coupled to each other by a belt 316 and form a roller chain in the conveying direction. For example, a plurality of belt pulleys 318 are adjacent to the rollers 312 and are in contact with the belt 316. In particular, an idler pulley 319 is adjacent to each other and placed between the rollers 312 for controlling the tension of the belt 316. In a preset embodiment, a pair of roller chains are disposed on both sides of the substrate 2.

Although this embodiment only discloses a pair of drive motors 314 located on either side of the substrate, a single motor can be used to drive the roller chain, as is known in the prior art. For example, a rotating shaft of the drive motor can be coupled to the two roller chains that pass through the coating air supply 302.

Referring again to FIG. 1, the photoresist film 4 on the substrate 2 can be dried in the drying module 200.

A drying process is performed in the drying module 200 to dry the photoresist film 4. The solvent in the photoresist film is dried while the drying process is performed in the drying module 200. For example, the photoresist film 4 can be dried in a drying process by vacuum pressing.

12 and 13 are schematic views showing a drying module of a second embodiment of the processing apparatus in the first embodiment of the present invention. Figure 12 is a plan view of the drying module of the processing apparatus of Figure 1, and Figure 13 is a schematic cross-sectional view of the drying module of the processing apparatus of Figure 1.

Referring to Figures 12 and 13, the drying module 200 of the first embodiment includes a drying chamber 202, a dry air supply 204 located in the drying chamber 202, a bracket 206 above the dry air supply 204, and a connection. A vacuum unit 208 and a second transport unit 210 in the drying chamber 202. The photoresist film 4 on the substrate 2 is dried in the drying chamber 202, the dry air supply 204 is used to supply air to the substrate 2, the substrate 2 is floated in the air, the carrier 206 is used to support the substrate 2, and the vacuum unit 208 The photoresist film 4 is dried on the substrate 2, and the second transport unit 210 is used to transport the dried substrate 2 away from the drying module 200. The substrate 2 is transported by the coating module 100 to the drying module 200 by the second transport unit, and is transported away from the drying module 200 in the same direction.

The drying chamber 202 has a dry space therein, and the photoresist film 4 on the substrate 2 is dried in a dry space. The drying chamber 202 includes an inlet 202a and an outlet 202b opposite each other. The substrate 2 having the photoresist film 4 is transported into the drying chamber 202 through the inlet 202a and transported away from the drying chamber 202 through the outlet 202b in the same transport direction. That is, the inlet 202a and the outlet 202b are arranged on the same straight line in the conveying direction. When the inlet 202a is located at a first side portion of the drying chamber 202, the outlet 202b is located at a second side portion of the drying chamber 202, and the second side portion is positioned opposite the first side portion. The inlet 202a and the outlet 202b have a width sufficient for the substrate 2 to pass and perpendicular to the conveying direction (nozzle direction). That is, the width of the inlet 202a and the outlet 202b is larger than the width of the substrate 2. In addition, when the first transport unit 104 of the coating module 100 transports the substrate 2 into the interior of the drying module 200, the inlet 202a and the outlet 202b provide a sufficient space to operate the first transport unit 104.

A vacuum pressure is applied to the drying chamber 202 to cause the photoresist film 4 on the substrate 2 to be dried, so that when the substrate 2 is sent to the drying chamber 202, the drying chamber 202 is closed. That is to say, the inlet 202a and the outlet 202b are closed, so that the dry space is isolated from the outside. To this end, the inlet 202a and the outlet 202b can have a sliding door member, such as a gate valve. The inlet 202a and the outlet 202b can be semi-rotated at a base point for closing or opening.

The drying chamber 202 includes a lower portion, such as a bottom panel having a plurality of bottom holes 202c. The bottom plate is connected to a vacuum unit 208 through a branch pipe 212. In particular, the bottom hole 202c is connected to the vacuum unit through the lower branch pipe 212. 208. For example, vacuum unit 208 includes a vacuum pump (not labeled) and a control valve (not labeled) for controlling internal pressure within drying chamber 202.

The drying chamber 202 may further include an upper portion, such as a top panel having a plurality of top holes 202d. The top plate is connected to a vacuum unit 208 through an upper branch pipe 214. In particular, the top hole 202d is connected to the upper branch pipe 214 through the upper branch pipe 214. Vacuum unit 208. When the internal pressure of the drying chamber 202 becomes inconsistent due to the vacuum pressure applied only to the lower portion of the drying chamber 202, the vacuum pressure is also applied to the upper portion of the drying chamber 202 to increase the consistency of the internal pressure of the drying chamber 202. Further, an additional porous sheet 215 is disposed above the substrate 2 in the drying chamber 202.

Dry air supply 204 includes a perforated plate 216 having a plurality of holes 216a. For example, the perforated plate 216 can be coupled to an air manifold 218 and define a buffer space 218a that is coupled to the air source 220.

The perforated plate 216 can comprise a metal such as aluminum. The hole 216a has a diameter of about 0.1 mm to 2.3 mm. Adjacent holes 216a can be separated by a gap distance of about 10 mm to 150 mm.

When the drying process is performed in the drying chamber 202, the cradle 206 supports the substrate 2 such that the substrate 2 is positioned above the dry air supply 204. Once the substrate 2 coated with the photoresist film 4 is transported to the inside of the drying chamber 202, the inlet 202a and the outlet 202b are closed, and the air supplied from the dry air supply 204 is stopped, so that the drying space in the drying chamber 202 is dried. It is isolated from the outside world and forms a vacuum. In this example, the substrate 2 is supported by the cradle 206, that is, the substrate 2 coated with the photoresist film 4 is stably placed in the cradle 206. The drying process of the photoresist film 4 is carried out in the drying chamber 202 under the vacuum atmosphere.

For example, the bracket 206 includes a plurality of support pins that are positioned above the dry air supply 204. The support pins are evenly arranged above the dry air supply to prevent the substrate 2 from being defective. In particular, the support pins can be moved up and down, and when the substrate 2 is transported into or out of the drying chamber 202, the substrate 2 can be prevented from being obstructed by the support pins. Thus, as the substrate 2 is transported into or out of the drying chamber 202, the support pins move downward and the substrate 2 is carried into the drying chamber 202 without any obstruction by the support pins. When the drying process starts under vacuum pressure, the support pins are moved upward to support the substrate 2.

For example, the second transport unit 210 fixes the edge portion of the substrate 2 floating in the air and horizontally transports the substrate 2 in the transport direction. The width of the perforated plate 216 is smaller than that of the substrate 2, and the both side portions of the substrate 2 are not covered by the perforated plate 216. Therefore, the second transport unit 210 can be used to fix the lateral edge portion of the substrate 2.

For example, the second transport unit 210 may include a plurality of vacuum chucks 222 that adsorb both sides of the substrate 2 by vacuum pressure. The vacuum chuck 222 is fixed to a pair of linear motors 224 located on both sides of the perforated plate 216, so that the vacuum chuck 222 is moved in the transport direction by the linear motor 224. In a modified example, the vacuum chuck 222 can be moved by a driving mechanism including a linear motion guide, a ball screw, and a ball. A ball block. Although not shown in the drawings, the second transport unit may be fixed to the frame 200a.

Figure 14 is a cross-sectional view showing a modified embodiment of a dry air supplier in Figures 12 and 13 of the present invention.

Referring to Fig. 14, the modified dry air supply 230 includes a porous sheet 232 and a plurality of side barriers 234 enclosing the porous sheet 232. The porous sheet 232 includes a porous material. Therefore, air is prevented from leaking from the side of the porous sheet 232 by the side barrier 234.

The porous sheet 232 may be composed of carbon and stainless steel and formed by a sintering process. The porous sheet 232 includes a plurality of fine pores having a diameter of 10 μm to 100 μm.

The dry air supply 204 in the drying module 200 can be replaced with the second to fourth modified coating air supplies 130, 140 and 150, the details of which are described with reference to Figures 5 to 9, as is known prior art. .

15 and 16 are schematic views showing a drying module of a second embodiment of the processing apparatus in the first embodiment of the present invention. Figure 15 is a plan view of the drying module of the processing apparatus of Figure 1, and Figure 16 is a schematic cross-sectional view of the drying module of the processing apparatus of Figure 1.

Referring to Figures 15 and 16, the drying module 400 of the second embodiment includes a drying chamber 402, a dry air supply 404 located in the drying chamber 402, a bracket 406 above the dry air supply 404, and a connection. A vacuum unit 408 and a second transport unit 410 in the drying chamber 402. The photoresist film 4 on the substrate 2 is dried in the drying chamber 402. A dry air supply 404 is used to supply air to the substrate 2, and the substrate 2 is floated in the air. The carrier 406 is used to support the substrate 2, and the vacuum unit 408 is used. The photoresist film 4 on the substrate 2 is dried, and the second transport unit 410 is used to transport the dried substrate 2 away from the drying module 400. The second transport unit 410 self-coats the substrate 2 The module 100 is transported to the drying module 400 and transports the substrate 2 away from the drying module 400 in the same direction.

The drying chamber 402 has a dry space therein, and the photoresist film 4 on the substrate 2 is dried in a dry space. The drying chamber 402 includes an inlet 402a and an outlet 402b, and the inlet 402a and the outlet 402b are opposed to each other. The substrate 2 having the photoresist film 4 passes through the inlet 402a, is transported into the drying chamber 402, and is transported away from the drying chamber 402 through the outlet 402b in the same conveying direction. The drying chamber 402 in this embodiment has the same structure as the drying chamber 202 in FIGS. 12 and 13 , and thus a detailed description about the drying chamber 402 will be omitted.

The dry air supply 404 supplies air to the substrate 2 so that the substrate 2 can float in the air. A dry air supply 430 is connected to the dry air supply 404. In Figures 12 through 14, the dry air supply 204 and the modified dry air supply 230 are also suitable for use in a second embodiment of a drying module, such as dry air supply 404. Further, the dry air air supply 404 in the drying module 400 may be replaced with the second to fourth modified coating air supplies 130, 140 and 150, and thus a detailed description about the dry air supplier 404 will be omitted.

When the drying process is performed in the drying chamber 402, the carrier 406 supports the substrate 2 such that the substrate 2 is positioned above the dry air supply 404. The bracket 406 has the same structure as the gantry 206 of the drying module 200 in Fig. 12, and thus a detailed description about the drying chamber 402 will be omitted.

The second transport unit 410 includes a plurality of rollers 422 that are in partial contact with the substrate 2, and the rollers 422 are linearly arranged in the transport direction. For example, the roller 422 can be in contact with the edge portion of the lower surface of the substrate 2, so that the substrate 2 can follow The roller 422 is rolled and transported.

The roller 422 is disposed on a side wall of the drying chamber 402 and is rotated by a drive motor 424. The rollers 422 can be connected to each other by a belt 426 and form a roller chain in the conveying direction. For example, a plurality of belt pulleys 428 are adjacent to the rollers 422 and are in contact with the belt 426. In particular, an idler pulley 429 is adjacent to each other and disposed between the rollers 422 for controlling the tension of the belt 426. In a preset embodiment, a pair of roller chains are disposed on both sides of the substrate 2.

Although this embodiment only discloses a pair of drive motors 424 located on either side of the substrate, a single motor can also be used to drive the roller chain, as is known in the prior art. For example, the rotating shaft of the drive motor can be coupled to two roller chains that are passed through the coating air supply 404.

Referring to FIG. 1, a loader 20 is disposed adjacent to the coating module 100, and an unloader 30 is disposed adjacent to the drying module 200. Both the loader 20 and the unloader 30 include rollers for transporting the substrate 2 in the transport direction.

According to an embodiment of the invention, the processing device comprises a coating module and a drying module. When the substrate is transported horizontally, it enters from the loader, passes through the coating module and the drying module, and is transported to the unloader. In particular, the substrate is transported directly to the drying module after passing through the coating module. In the coating module and the drying module, the coating air supply and the dry air supply respectively supply air to the substrate, so that the substrate floats in the air, and the individual transport units of the coating module and the drying module are transported in the transport direction. Substrate. That is, the substrate is transported in an in-line type in the processing device, reducing process time.

In addition, the processing device does not need to transport the robot, compared to the traditional The device will significantly reduce manufacturing and maintenance costs.

In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

2‧‧‧Substrate

4‧‧‧ photoresist film

10‧‧‧Processing device

20‧‧‧Loader

30‧‧‧Unloader

100, 300‧‧‧ coating module

100a, 200a, 300a‧‧‧ frame

100b, 300b‧‧‧ lifting frame

100c, 300c‧‧‧ lifting arm

102, 302‧‧‧ coated air supply

104‧‧‧First shipping unit

106, 306‧‧‧ nozzle

108, 132, 142, 216‧‧ ‧ multiwell plates

108a, 132a, 216a‧‧ holes

110, 144, 154, 220, 420‧‧ air source

110a, 144a, 154a, 220a‧‧‧ air tubes

112, 146, 156, 218‧‧‧ air manifold

112a, 146a, 156a, 218a‧‧‧ buffer space

120‧‧‧First modified coating air supply

122, 151, 215, 232‧‧‧ porous sheets

124, 152, 234‧‧‧ side barriers

130‧‧‧Second modified coating air supply

134‧‧‧ slit

136, 429‧‧‧ idler

140‧‧‧ Third modified coating air supply

142a‧‧‧First hole

142b‧‧‧Second hole

148, 158‧‧‧Exhaust manifold

149, 159‧‧‧ exhaust unit

149a, 159a‧‧‧ exhaust pipe

150‧‧‧Fourth modified coating air supply

151a‧‧‧ Venting holes

200, 400‧‧‧ dry module

202, 402‧‧‧ drying room

202a, 402a‧‧‧ entrance

202b, 402b‧‧‧Export

202c‧‧‧ bottom hole

202d‧‧‧Top hole

204, 230, 404‧‧ dry air supply

206, 406‧‧‧ bracket

208, 408‧‧‧vacuum unit

210, 410‧‧‧Second transport unit

212‧‧‧Under the manifold

214‧‧‧Upper branch

222‧‧‧vacuum chuck

224‧‧‧Linear motor

304‧‧‧Transportation unit

312, 422‧‧‧ Wheels

314, 424‧‧‧ drive motor

316, 426‧‧‧ belt

318, 428‧‧‧ Pulley

1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention; and FIG. 2 is a plan view showing a coating module of a processing apparatus according to a first embodiment of the first embodiment of the present invention; A schematic cross-sectional view of a coating module of a processing apparatus according to a first embodiment of the present invention; and a fourth embodiment of the coating air supply of the first modified embodiment of the second and third aspects of the present invention. FIG. 5 is a schematic cross-sectional view showing a coating air supply device according to a second modified embodiment of the second and third embodiments of the present invention; and FIG. 6 is a second and third drawing of the present invention; FIG. 7 is a schematic cross-sectional view showing a third modified embodiment of the coating air supply device according to the second and third embodiments of the present invention; 2 is a plan view showing a fourth modified embodiment of the coated air supply device in the second and third embodiments of the present invention; and FIG. 9 is a view showing the coated air supply in the second and third embodiments of the present invention; A schematic cross-sectional view of a fourth modified embodiment; 10 is a plan view showing a second modified embodiment of a coating module of the processing apparatus according to the first embodiment of the present invention; and FIG. 11 is a view showing a coating module of the processing apparatus according to the first embodiment of the present invention. 2 is a schematic cross-sectional view of the modified embodiment; FIG. 12 is a plan view showing the drying module of the first embodiment of the processing apparatus of the first embodiment of the present invention; and FIG. 13 is a view showing the processing apparatus of the first embodiment of the present invention. 1 is a schematic cross-sectional view of a dry module of the first embodiment; FIG. 14 is a cross-sectional view showing a modified embodiment of the dry air supply of the 12th and 13th embodiments of the present invention; and FIG. 15 is a first view of the present invention. FIG. 16 is a schematic cross-sectional view showing a drying module of a second embodiment of the processing apparatus according to the first embodiment of the present invention.

2. . . Substrate

10. . . Processing device

20. . . Loader

30. . . Unloader

100. . . Coating module

200. . . Drying module

Claims (16)

An apparatus for processing a substrate, comprising: a coating module for coating a photoresist film on a substrate, wherein the substrate is transported horizontally in a transport direction; and a drying module, the drying The module is adjacent to the coating module for drying the photoresist film on the substrate directly transported from the coating module, wherein the drying module comprises: a drying chamber, the drying chamber includes Receiving a drying space of the substrate, the drying chamber comprises a bottom plate and a top plate, the bottom plate has a plurality of bottom holes, the top plate has a plurality of top holes, and a vacuum unit for supplying a vacuum pressure to the inside of the drying chamber The photoresist film on the substrate is dried by the vacuum inside the drying chamber, wherein the bottom holes of the bottom plate are connected to the vacuum unit through a branch pipe, and the top holes of the top plate pass through an upper manifold Connected to the vacuum unit. The device of claim 1, wherein the coating module comprises: a coating air supply for providing an air to float the substrate in the air; and a transport unit for following the transport direction Horizontally transporting the floating substrate; and a nozzle positioned above the coating air supply and extending substantially in a direction perpendicular to the one of the conveying directions for supplying the photoresist material to the substrate. The device of claim 2, wherein the coating is empty The gas supply includes: a perforated plate including a plurality of holes for allowing air to pass therethrough. The apparatus of claim 2, wherein the coating air supply comprises: a porous sheet comprising a plurality of holes for allowing air to pass; and a side barrier for The side of the porous sheet is enclosed. The apparatus of claim 2, wherein the transport unit comprises: a plurality of vacuum chucks that utilize vacuum pressure to secure an edge portion of the substrate. The device of claim 5, wherein the transport unit transports the substrate to the interior of the drying module. The device of claim 2, wherein the transport unit comprises: a plurality of rollers for supporting both side edge portions of the substrate and linearly arranged along the transport direction. The device of claim 1, wherein the drying module further comprises: a dry air supply, the dry air supply is located in the drying chamber for supplying air to the substrate, and floating the substrate in the air And a bracket above the dry air supply for supporting the substrate in the drying chamber. The device of claim 8, wherein the drying The air supply includes: a perforated plate including a plurality of holes for allowing air to pass therethrough. The apparatus of claim 8, wherein the dry air supply comprises: a porous sheet comprising a plurality of pores for allowing air to pass; and a side barrier for surrounding The side of the porous sheet is used. The equipment of claim 8, wherein the drying module further comprises: a transport unit for horizontally transporting the floating substrate in the transport direction. The apparatus of claim 11, wherein the transport unit comprises: a plurality of vacuum chucks that fix the edge portions of the substrate by vacuum pressure. The device of claim 11, wherein the transport unit comprises: a plurality of rollers arranged linearly along the transport direction for supporting both side edge portions of the substrate. The apparatus of claim 8, wherein the drying chamber comprises: an inlet for passing the substrate along the conveying direction and entering the drying chamber; and an outlet for causing the substrate to be transported along the same Direction through and leave the Drying room. The device of claim 14, wherein the inlet and the outlet comprise: a gate valve for isolating the drying space of the drying chamber from the outside. The device of claim 8, wherein the bracket comprises: a plurality of support pins located above the dry air supply and movable upward and downward to avoid when the substrate is transported When entering or leaving the drying chamber, it is blocked by the support pins.