TWI527747B - Non-contact adsorbing disk - Google Patents

Non-contact adsorbing disk Download PDF

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Publication number
TWI527747B
TWI527747B TW102107177A TW102107177A TWI527747B TW I527747 B TWI527747 B TW I527747B TW 102107177 A TW102107177 A TW 102107177A TW 102107177 A TW102107177 A TW 102107177A TW I527747 B TWI527747 B TW I527747B
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porous
pad
contact
hole
sealed space
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TW102107177A
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TW201343514A (en
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藤平清隆
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炭研軸封精工股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
  • Jigs For Machine Tools (AREA)

Description

非接觸吸著盤 Non-contact suction plate

本發明係有關非接觸吸著盤,詳細而言,係有關在吸附面上同時進行因加壓空氣所引起之被加工物的浮起,及因吸引所引起之被加工物的吸附之非接觸吸著盤。 The present invention relates to a non-contact absorbing disk, and more particularly to a non-contact of the floating of the workpiece caused by the pressurized air on the adsorption surface and the adsorption of the workpiece due to the attraction. Suck the plate.

就處理半導體晶圓、FPD(flat panel display;平面顯示器)用玻璃基材等之厚度極薄的被加工物之裝置而言,所謂真空鑷子為一般人所熟知。但是,真空鑷子係在接觸被加工物之狀態下處理被加工物,因而有對被加工物施以應力等的問題。 A vacuum tweezers is well known in the art for an apparatus for processing an extremely thin workpiece such as a semiconductor wafer or a glass substrate for an FPD (flat panel display). However, the vacuum tweezers handles the workpiece in a state in which the workpiece is in contact with the workpiece, and thus there is a problem that stress or the like is applied to the workpiece.

此外,就不會對於FPD用玻璃器材等之厚度極薄的被加工物施以應力等,以非接觸之狀態進行處理之裝置而言,已提案有一種使加壓空氣從多孔質板的細孔噴出而使被加工物浮起,在多孔質板上進行搬送之裝置(例如,專利文獻1、2)。 In addition, it is not possible to apply a stress or the like to a workpiece having a very small thickness such as a glass material for FPD, and a device for treating it in a non-contact state has proposed a method of making pressurized air from a porous plate. A device in which a hole is ejected to float a workpiece and is transported on a porous plate (for example, Patent Documents 1 and 2).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2008-110852號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-110852

[專利文獻2]日本特開2011-084352號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2011-084352

專利文獻1及2的裝置係使空氣從多孔質材料的板狀體(基座)噴出,使被加工物在板狀體上浮起,另一方面,藉由從板狀體的一部分吸引空氣,使厚度極薄之被加工物一邊維持平面性,一邊以非接觸狀態於基座上搬送。 In the devices of Patent Documents 1 and 2, air is ejected from a plate-like body (base) of a porous material to float the workpiece on the plate-like body, and air is sucked from a part of the plate-like body. The workpiece having an extremely small thickness is conveyed to the susceptor in a non-contact state while maintaining planarity.

在上述半導體晶圓、FPD用玻璃基材等之厚度極薄之被加工物的處理製程中,除了在搬送路徑上搬送被加工物之外,會有必須將被加工物保持在基座上的預定位置;將被加工物在某個位置予以抬起而移動到其他的位置等的情況。 In the processing of the extremely thin workpiece such as the semiconductor wafer or the FPD glass substrate, in addition to transporting the workpiece on the transport path, it is necessary to hold the workpiece on the susceptor. a predetermined position; a case where the workpiece is lifted at a certain position and moved to another position or the like.

但是,專利文獻1及2之裝置無法回應此種需求。 However, the devices of Patent Documents 1 and 2 cannot respond to such a demand.

另一方面,就以非接觸之狀態且可朝下吸附保持薄的被加工物之裝置而言,已提案有利用所謂「白努利定律」之白努利吸盤。此白努利吸盤係使來自空氣壓縮機的加壓空氣,於吸盤的下面形成之凹部內一邊盤繞一邊沿著下面噴出,藉以在凹部之正下方的區域產生吸附力而在其周圍產生浮力,以非接觸之狀態將半導體晶圓等之薄的被加工物吸附保持在吸盤的下側面之裝置。 On the other hand, a device using a so-called "Binnuulli's law" has been proposed as a device in a non-contact state and capable of adsorbing and holding a thin workpiece downward. The white Nuo suction cup is such that the pressurized air from the air compressor is ejected along the lower side while being wound around the recess formed in the lower surface of the suction cup, thereby generating an adsorption force in a region directly under the concave portion to generate buoyancy around the concave portion. A device for adsorbing and holding a thin workpiece such as a semiconductor wafer on the lower side of the chuck in a non-contact state.

但是,此白努利吸盤中可形成凹部之數目受到限制,故吸引力、浮力的發生成為局部性,而無法在無翹曲、變形等之平坦的狀態下將尺寸較大且薄的被加工物予以吸附保持。 However, the number of recesses that can be formed in the white Nuclei suction cup is limited, so that the occurrence of attraction force and buoyancy becomes local, and it is impossible to process a large and thin size without being flattened, deformed, or the like. The substance is adsorbed and maintained.

本發明係為了解決此種問題點而研創者,其目的係提供一種非接觸吸著盤,俾將厚度薄的被加工物保持吸附在預定位置,或可將之朝下予以保持吸附。 The present invention has been made in order to solve such a problem, and an object thereof is to provide a non-contact absorbing disk which keeps a thin workpiece to be adsorbed at a predetermined position, or can be kept adsorbed downward.

依據本發明,提供一種非接觸吸著盤,其係以非接觸狀態將薄板狀的被吸附物予以吸附,其具備:板狀的多孔質墊,係於吸附固定區域形成貫穿厚度方向而延伸之複數個通氣孔;第1密閉空間,係鄰接配置於前述多孔質墊的背面;第2密閉空間,係與前述第1密閉空間隔離;以及相通手段,係使前述第2密閉空間與前述通氣孔相通。 According to the present invention, there is provided a non-contact absorbing disk for adsorbing a thin plate-shaped object to be adsorbed in a non-contact state, comprising: a plate-shaped porous pad extending in a thickness direction in the adsorption fixing region; a plurality of vent holes; the first sealed space is disposed adjacent to the back surface of the porous pad; the second sealed space is separated from the first sealed space; and the communication means is for the second sealed space and the vent hole The same.

依據此種構成,例如,使第1密閉空間與加壓空氣源相通,且使第2密閉空間與吸引減壓源相通,藉此而可一邊從多孔質墊的正面之細孔使加壓空氣噴出,一邊從多孔質墊的正面之通氣孔吸引空氣。結果,在多孔質墊的正面上,可一邊透過吸引將被加工物保持在預定位置且一邊利用加壓空氣使之浮起。結果,可將半導體晶圓等之厚度薄的被加工物,以非接觸之狀態予以保持吸附在朝上方之多孔質墊的正面上之預定位置,或以朝下且非接觸之狀態予以保持吸附在朝下方之多孔質墊的正面之下側。 According to this configuration, for example, the first sealed space is connected to the source of the pressurized air, and the second sealed space is communicated with the suction and pressure reducing source, whereby the pressurized air can be made from the pores on the front surface of the porous mat. When it is ejected, air is sucked from the vent hole on the front surface of the porous mat. As a result, on the front surface of the porous mat, the workpiece can be held at a predetermined position by suction and floated by the pressurized air. As a result, the workpiece having a small thickness such as a semiconductor wafer can be held in a non-contact state at a predetermined position on the front surface of the upward facing porous mat, or can be kept adsorbed in a downward-facing and non-contact state. On the lower side of the front side of the porous pad facing downward.

由於可單獨調整吸引壓力(減壓)與供氣壓力(加壓),故可控制把持力與浮起力。因此,亦可調整浮起間隙。 Since the suction pressure (decompression) and the supply pressure (pressure) can be individually adjusted, the holding force and the floating force can be controlled. Therefore, the floating gap can also be adjusted.

依據本發明其他理想的態樣,其具備:板狀的支持具,係正面積層在前述多孔質墊的背面側,且具備有凹處,該凹處係與該多孔質墊的背面之間構成前述第1密閉空間;以及底座,係積層在前述支持具的背面側,與該支持具 的背面之間形成第2密閉空間,前述支持具係具有相通孔,該相通孔係一端於前述積層時連接在前述多孔質墊的通氣孔,而另一端於該支持具的背面形成開口,以作為前述相通手段的功能。 According to still another preferred aspect of the present invention, there is provided a plate-shaped support member having a positive-area layer on a back side of the porous mat and having a recess, the recess being formed between the recess and the back surface of the porous mat The first sealed space; and the base, the laminated layer on the back side of the support member, and the support member A second sealed space is formed between the back surfaces, and the support member has a through hole, wherein one end of the through hole is connected to the vent hole of the porous pad at the time of stacking, and the other end forms an opening on the back surface of the support member to As a function of the aforementioned communication means.

依據本發明其他理想的態樣,前述支持具係具備複數個島狀的突出部,該些島狀的突出部係具備平坦的頂部,在前述複數個通氣孔之背面側開口端的位置,接抵於前述多孔質墊的背面,前述相通孔係貫穿前述突出部而延伸,前述突出部間之空間成為前述第1密閉空間。 According to another preferred aspect of the present invention, the support device includes a plurality of island-shaped projecting portions, and the island-shaped projecting portions have a flat top portion, and are connected to the open end side of the plurality of vent holes. In the back surface of the porous mat, the through hole extends through the protruding portion, and a space between the protruding portions becomes the first sealed space.

依據本發明其他理想的態樣,前述底座係在表面具備複數個島狀的突出部,該些島狀的突出部係具備平坦的頂部,於前述連結時接抵於前述支持具的背面,該突出部之間的空間成為減壓用流路,前述相通孔的另一端與該減壓用流路呈流體相通。 According to another preferred aspect of the present invention, the base includes a plurality of island-shaped projecting portions on the surface, and the island-shaped projecting portions have a flat top portion that is coupled to the back surface of the support member during the connecting. The space between the protruding portions serves as a pressure reducing flow path, and the other end of the through hole is in fluid communication with the pressure reducing flow path.

依據本發明其他理想的態樣,前述複數個突出部具有矩形的橫斷面形狀,且配置成圍棋盤的網目形狀,前述第1密閉空間係形成為格子狀之加壓空氣用流路。 According to another preferred aspect of the present invention, the plurality of protruding portions have a rectangular cross-sectional shape and are arranged in a mesh shape of a checkerboard, and the first sealed space is formed in a lattice-shaped flow path for pressurized air.

依據此種構成,可從多孔質墊的細孔均等地使加壓空氣噴出。 According to this configuration, the pressurized air can be uniformly discharged from the pores of the porous mat.

依據本發明其他理想的態樣, 前述減壓溝槽配置成格子狀。 According to other desirable aspects of the present invention, The pressure reducing grooves are arranged in a lattice shape.

依據此種構成,可從多孔質墊的通氣孔均等地使加壓空氣噴出。 According to this configuration, the pressurized air can be uniformly discharged from the vent holes of the porous mat.

依據本發明其他理想的態樣,前述相通孔之另一端係在前述格子狀之減壓用溝槽的交點與減壓用溝槽呈流體相通。 According to another preferred aspect of the present invention, the other end of the through hole is in fluid communication with the decompression groove at an intersection of the lattice-shaped decompression grooves.

依據此種構成,可有效地從相通孔進行吸引。 According to this configuration, the suction can be efficiently performed from the through hole.

依據本發明其他的態樣,其具備板狀的支持具,係積層在前述多孔質墊的背面側,且具備與前述多孔質墊的通氣孔對應的貫穿孔,更具備一底座,係積層在前述支持具之背面側,與該支持具的背面之間形成第2密閉空間,在前述多孔質墊之背面形成凹處,於該凹處與前述支持具之間構成前述第1密閉空間,前述多孔質墊之通氣孔係連結在前述支持具之貫穿孔,作為前述相通手段之功能。 According to another aspect of the present invention, a support member having a plate shape is provided on the back side of the porous pad, and a through hole corresponding to the vent hole of the porous pad is provided, and a base is further provided. a second sealed space is formed between the back surface side of the support member and the back surface of the support member, and a concave portion is formed on the back surface of the porous pad, and the first sealed space is formed between the concave portion and the support member. The vent hole of the porous pad is connected to the through hole of the support member, and functions as the communication means.

依據本發明其他理想的態樣,其具備框架構件,該框架構件係具有配置在前述支持具與前述底座之間的環狀部,前述第2密閉空間係由前述環狀部的內部空間形成。 According to another preferred aspect of the present invention, the frame member includes a ring portion disposed between the support member and the base, and the second sealed space is formed by an internal space of the annular portion.

在前述多孔質墊之凹處具備複數個島狀的突出部,該些島狀的突出部係具備接抵於前述支持具的正面之平坦的頂部, 前述多孔質墊的通氣孔係貫穿前述島狀的突出部。 a plurality of island-shaped protruding portions are provided in the recess of the porous pad, and the island-shaped protruding portions are provided with a flat top portion that is abutted against the front surface of the support device. The vent hole of the porous mat penetrates through the island-shaped projecting portion.

依據本發明其他理想的態樣,前述第1密閉空間為加壓空氣用空間部,前述第2閉空間為減壓用空間部。 According to another preferred aspect of the present invention, the first sealed space is a pressurized air space portion, and the second closed space is a reduced pressure space portion.

依據本發明其他理想的態樣,前述通氣孔係分散配置在前述多孔質墊之正面整體,依據此種構成,可將多孔質墊的正面整體作為吸附固定區域來使用。 According to another preferred aspect of the present invention, the vent hole is dispersedly disposed on the entire front surface of the porous mat, and according to such a configuration, the entire front surface of the porous mat can be used as an adsorption fixing region.

依據本發明其他理想的態樣,前述多孔質墊係由多孔碳所形成。 According to another preferred aspect of the invention, the porous mat is formed of porous carbon.

依據本發明,提供一種非接觸吸著盤,其係將厚度薄的被加工物保持吸附在預定位置,或可將之朝下予以保持吸附。 According to the present invention, there is provided a non-contact absorbing disk which keeps a thin workpiece to be adsorbed at a predetermined position or which can be kept adsorbed downward.

1‧‧‧非接觸吸著盤 1‧‧‧ Non-contact suction tray

2‧‧‧多孔質墊 2‧‧‧Porous mat

2a‧‧‧正面 2a‧‧‧ positive

2b‧‧‧背面 2b‧‧‧back

4‧‧‧襯墊支持具 4‧‧‧Cushion support

6‧‧‧底座 6‧‧‧Base

8‧‧‧吸引孔(通氣孔) 8‧‧‧Attraction hole (ventilation hole)

10‧‧‧連結孔 10‧‧‧Link hole

12‧‧‧隆起部 12‧‧‧ Uplift

14‧‧‧溝槽 14‧‧‧ trench

16‧‧‧突出部 16‧‧‧Protruding

18‧‧‧相通孔 18‧‧‧Contact holes

20‧‧‧加壓空氣入口 20‧‧‧ pressurized air inlet

22‧‧‧底座溝槽 22‧‧‧Base groove

24‧‧‧真空孔 24‧‧‧vacuum hole

第1圖係本發明的第1實施形態之非接觸吸著盤的分解立體圖。 Fig. 1 is an exploded perspective view of the non-contact suction disk according to the first embodiment of the present invention.

第2圖係第1圖的非接觸吸著盤之多孔質墊的頂視圖。 Figure 2 is a top plan view of the porous pad of the non-contact suction disk of Figure 1.

第3圖係第1圖的非接觸吸著盤之多孔質墊的底視圖。 Fig. 3 is a bottom view of the porous pad of the non-contact suction disk of Fig. 1.

第4圖係將沿著第3圖的Ⅳ-Ⅳ線之剖面的一部分予以擴大之圖。 Fig. 4 is an enlarged view of a portion of the cross section taken along line IV-IV of Fig. 3.

第5圖係第1圖的非接觸吸著盤之支持具的頂視圖。 Figure 5 is a top plan view of the support for the non-contact sorption plate of Figure 1.

第6圖係第1圖的非接觸吸著盤之支持具的底視圖。 Figure 6 is a bottom view of the support of the non-contact sorption plate of Figure 1.

第7圖係第1圖的非接觸吸著盤之底座的頂視圖。 Figure 7 is a top plan view of the base of the non-contact sorption plate of Figure 1.

第8圖係非接觸吸著盤之支持具的變化例之底視圖。 Figure 8 is a bottom view of a variation of the support for the non-contact sorption plate.

第9圖係非接觸吸著盤的支持具之另一變化例之底視圖。 Figure 9 is a bottom view of another variation of the support for the non-contact suction disk.

第10圖係用以說明以第1圖之非接觸吸著盤進行被加工物W之吸附固定(非接觸吸附)的狀態之示意剖面圖。 Fig. 10 is a schematic cross-sectional view showing a state in which adsorption/fixation (non-contact adsorption) of the workpiece W is performed by the non-contact suction disk of Fig. 1.

第11圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 11 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第12圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 12 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第13圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 13 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第14圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 14 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第15圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 15 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第16圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 16 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第17圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 17 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第18圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 18 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第19圖係顯示以使用第1圖之非接觸吸著盤的被加工物搬送裝置進行被加工物搬送的各步驟之圖。 Fig. 19 is a view showing the steps of carrying out the conveyance of the workpiece by the workpiece transporting apparatus using the non-contact suction disk of Fig. 1.

第20圖係本發明第2實施形態的非接觸吸著盤之從上方所見 的分解立體圖。 Figure 20 is a view showing the non-contact suction disk of the second embodiment of the present invention as seen from above An exploded perspective view.

第21圖係本發明第2實施形態的非接觸吸著盤之從下方所見的分解立體圖。 Fig. 21 is an exploded perspective view of the non-contact suction disk according to the second embodiment of the present invention as seen from below.

第22圖係具有其他的構成之多孔質墊的頂視圖。 Figure 22 is a top plan view of a porous pad having other configurations.

第23圖係具有其他的構成之多孔質墊的頂視圖。 Figure 23 is a top plan view of a porous pad having other configurations.

第24圖係具有其他的構成之多孔質墊的頂視圖。 Figure 24 is a top plan view of a porous pad having other configurations.

第25圖係具有其他的構成之底座的頂視圖。 Figure 25 is a top plan view of a base having other configurations.

以下,參照圖式,說明本發明的實施形態之非接觸吸著盤。 Hereinafter, a non-contact suction disk according to an embodiment of the present invention will be described with reference to the drawings.

首先,說明本發明第1實施形態之非接觸吸著盤的構成。第1圖係本發明第1實施形態的非接觸吸著盤1之分解立體圖。 First, the configuration of the non-contact suction disk according to the first embodiment of the present invention will be described. Fig. 1 is an exploded perspective view of the non-contact suction disk 1 according to the first embodiment of the present invention.

本實施形態的非接觸吸著盤1係以非接觸狀態將半導體晶圓、FPD用玻璃基材等之薄板狀的被吸附物(被加工物),例如,厚度100μm以下的半導體晶圓予以吸附之非接觸吸著盤。如第1圖所示,非接觸吸著盤1具備有:圓板狀的多孔質墊2,係在上面具備有被加工物的吸附區域;略圓板狀的襯墊支持具4,係從下側(背側)保持多孔質墊2;以及略圓板狀的底座6,係連結在支持具4的背側。 The non-contact suction disk 1 of the present embodiment adsorbs a thin plate-shaped object to be adsorbed (a workpiece) such as a semiconductor wafer or a glass substrate for FPD in a non-contact state, for example, a semiconductor wafer having a thickness of 100 μm or less. Non-contact suction plate. As shown in Fig. 1, the non-contact suction disk 1 is provided with a disk-shaped porous pad 2, which is provided with an adsorption region on the upper surface of the workpiece, and a substantially circular plate-shaped spacer support 4; The lower side (back side) holds the porous mat 2; and the slightly rounded base 6 is coupled to the back side of the holder 4.

多孔質墊2係由通氣性的多孔碳所形成。多孔質墊2的材料不限定於通氣性的多孔碳,亦可使用其他通氣性的多孔質材料,例如多孔SiC、多孔鋁等。 The porous mat 2 is formed of a gas permeable porous carbon. The material of the porous mat 2 is not limited to the air-permeable porous carbon, and other air-permeable porous materials such as porous SiC or porous aluminum may be used.

第2圖係多孔質墊2的頂視圖,第3圖係多孔質墊 2的底視圖。 Figure 2 is a top view of the porous pad 2, and Figure 3 is a porous pad. The bottom view of 2.

多孔質墊2中,形成有複數個吸引孔(通氣孔)8。如 第2圖及第3圖所示,吸引孔8幾乎遍及多孔質墊2的全面,排列成格子狀,亦即以配置在圍棋盤的網目之交點上之狀態而排列。本實施形態中,將吸引孔8的間隔設定為25mm左右。 In the porous mat 2, a plurality of suction holes (vent holes) 8 are formed. Such as As shown in FIGS. 2 and 3, the suction holes 8 are arranged in a lattice shape almost throughout the porous mat 2, that is, in a state of being disposed at the intersection of the meshes of the checkerboard. In the present embodiment, the interval between the suction holes 8 is set to about 25 mm.

第4圖係將沿著第3圖的Ⅵ-Ⅵ線之剖面的一部分予 以擴大之圖。如第4圖所示,吸引孔8係以於厚度方向分別貫穿多孔質墊2而延伸之方式形成。吸引孔8係於多孔質墊2的正面2a側成為直徑0.6mm左右之小徑部8a,而於多孔質墊2之背面2b側成為直徑4mm左右的大徑部8b,以朝向多孔質墊2的正面2a而尖端變細的錐狀部8c將小徑部8a與大徑部8b予以連結。 Figure 4 is a section along the line VI-VI of Figure 3 To expand the map. As shown in FIG. 4, the suction holes 8 are formed so as to extend through the porous mat 2 in the thickness direction. The suction hole 8 is a small-diameter portion 8a having a diameter of about 0.6 mm on the front surface 2a side of the porous mat 2, and a large-diameter portion 8b having a diameter of about 4 mm on the back surface 2b side of the porous mat 2 so as to face the porous mat 2 The tapered portion 8c whose front surface 2a is tapered and the tapered portion 8c connects the small diameter portion 8a and the large diameter portion 8b.

透過此種構成,若吸引孔8的大徑部8b受到減壓吸 引,則來自多孔質墊2的正面2a側開口之吸引孔8的小徑部8a之空氣受到吸引,使得吸引孔8形成之多孔質墊2的表面區域成為進行被加工物的吸附固定之吸附固定區域。 With such a configuration, if the large diameter portion 8b of the suction hole 8 is subjected to decompression suction In addition, the air from the small-diameter portion 8a of the suction hole 8 opened on the front surface 2a side of the porous mat 2 is attracted, and the surface area of the porous mat 2 formed by the suction hole 8 is adsorbed and fixed by the workpiece. Fixed area.

此外,在多孔質墊2之周緣部形成有連結孔10,該 連結孔10係可插通將多孔質墊連結在襯墊支持具4等之螺絲等的連結件。 Further, a connection hole 10 is formed in a peripheral portion of the porous pad 2, and the connection hole 10 is formed. The connection hole 10 is a connector that can be inserted into a screw or the like that connects the porous pad to the pad holder 4 or the like.

第5圖係襯墊支持具4的上視圖,第6圖係襯墊支 持具4之底視圖。 Figure 5 is a top view of the pad support 4, and Figure 6 is a pad support. Hold the bottom view of 4.

如上述,襯墊支持具4係從下側(背側)保持多孔質墊 2之略圓板狀的構件,例如,由鋁合金等的金屬材料所形成。襯墊支持具4亦可由碳纖維強化塑膠(carbon-fiber-reinforced plastic;CFRP)、聚醚醚酮(PolyetheretherKetone;PEEK)等之樹脂來形成。 As described above, the pad support 4 holds the porous pad from the lower side (back side) The member having a substantially round plate shape is formed of, for example, a metal material such as an aluminum alloy. The liner support 4 can also be formed of a resin such as carbon fiber-reinforced plastic (CFRP) or polyetheretherketone (PEEK).

如第1圖、第4圖及第5圖所示,於襯墊支持具4的上面,在外周緣形成有環狀的隆起部12。隆起部12係以內徑比多孔質墊2的外徑稍大,且高度比多孔質墊2的厚度稍低之方式所構成。 As shown in FIGS. 1 , 4 , and 5 , an annular ridge portion 12 is formed on the outer peripheral edge of the pad support 4 . The raised portion 12 is configured such that the inner diameter is slightly larger than the outer diameter of the porous mat 2 and the height is slightly lower than the thickness of the porous mat 2.

因此,多孔質墊2配置於襯墊支持具4之隆起部12的內側之空間(凹部)時,成為多孔質墊2的上面2a配置在比襯墊支持具4之隆起部12的頂面稍上方之狀態。 Therefore, when the porous mat 2 is disposed in the space (concave portion) inside the raised portion 12 of the spacer holder 4, the upper surface 2a of the porous mat 2 is disposed slightly above the top surface of the raised portion 12 of the spacer holder 4. The state above.

再者,在襯墊支持具4的上面(凹部的底面)之隆起部12的內側區域,格子狀(圍棋盤的網目狀)地形成截面呈矩形的溝槽14,由溝槽14區隔之部分成為橫斷面為正方形之島狀的突出部16。島狀的突出部16係與配置成格子狀(圍棋盤的網目狀)之溝槽14一起構成圍棋盤之網目狀的配置。 Further, in the inner region of the ridge portion 12 of the upper surface of the spacer holder 4 (the bottom surface of the concave portion), a groove 14 having a rectangular cross section is formed in a lattice shape (mesh shape of the checkerboard), and is partitioned by the groove 14. The portion is an island portion 16 having a square cross section. The island-shaped projecting portion 16 is formed in a mesh-like arrangement of the checkerboard together with the grooves 14 arranged in a lattice shape (mesh shape of the checkerboard).

各突出部16的頂面平坦,在中央穿孔有於厚度方向貫穿襯墊支持具4的相通孔18。 The top surface of each of the protruding portions 16 is flat, and a through hole 18 penetrating through the pad holder 4 in the thickness direction is formed in the center.

多孔質墊2與襯墊支持具4係在多孔質墊2配置於襯墊支持具4的隆起部12內側之空間內的狀態下,藉由接著劑接合而固定。復利用螺栓等之連結件將多孔質墊2與襯墊支持具4予以連結固定。 The porous pad 2 and the spacer support 4 are fixed by the adhesive bonding in a state in which the porous pad 2 is placed in the space inside the raised portion 12 of the pad holder 4. The porous pad 2 and the pad holder 4 are connected and fixed by a coupling member such as a bolt.

突出部16係於多孔質墊2配置在襯墊支持具4的隆起部12之內側的空間內時,其頂面以氣密狀態接抵於多孔質墊2背面2b的吸引孔8之大徑部8b的開口端周圍區域之方式而構成。 When the porous pad 2 is disposed in the space inside the raised portion 12 of the pad holder 4, the protruding portion 16 is in an airtight state and is in contact with the large diameter of the suction hole 8 on the back surface 2b of the porous pad 2. The portion around the open end of the portion 8b is configured.

結果,以接著劑將多孔質墊2固定在襯墊支持具4之隆起部12的內側之空間時,在多孔質墊2的背面與襯墊支持具4的上面之間,藉由配置成格子狀之溝槽14與覆蓋此溝槽14之 多孔質墊2,形成密閉空間(第1密閉空間)。 As a result, when the porous pad 2 is fixed by the adhesive to the space inside the ridge portion 12 of the pad holder 4, it is arranged in a lattice between the back surface of the porous pad 2 and the upper surface of the pad holder 4. a groove 14 and covering the groove 14 The porous mat 2 forms a sealed space (first sealed space).

相通孔18係具有與多孔質墊2之吸引孔8的大徑部8b略相同的直徑,且多孔質墊2以預定的角度位置收容在襯墊支持具4之隆起部12的內側之空間時,相通孔18係以與形成在多孔質墊2之各吸引口8於厚度方向對齊之方式而構成。 The through hole 18 has a diameter which is slightly the same as the large diameter portion 8b of the suction hole 8 of the porous pad 2, and the porous pad 2 is accommodated at a predetermined angular position in the space inside the ridge portion 12 of the pad holder 4. The through hole 18 is configured to be aligned with the respective suction ports 8 formed in the porous pad 2 in the thickness direction.

結果,多孔質墊2以預定的角度位置收容在襯墊支持具4之隆起部12的內側之空間時,多孔質墊2之吸引口8與襯墊支持具4之相通孔18呈流體相通。 As a result, when the porous pad 2 is housed in the space inside the ridge portion 12 of the pad holder 4 at a predetermined angular position, the suction port 8 of the porous pad 2 is in fluid communication with the through hole 18 of the pad holder 4.

於襯墊支持具4之外周形成有加壓空氣入口20,連通由溝槽14形成之密閉空間(第1密閉空間)與襯墊支持具4的外部空間,用以將加壓空氣導入到此密閉空間(第1密閉空間)。 A pressurized air inlet 20 is formed on the outer circumference of the pad support 4, and a sealed space (first sealed space) formed by the groove 14 and an outer space of the pad support 4 are connected to introduce pressurized air thereto. Confined space (first closed space).

結果,將多孔質墊2收容且接合固定在襯墊支持具4之隆起部12的內側之空間之狀態下,從加壓空氣入口20將加壓空氣導入到由溝槽14與多孔質墊2所形成之密閉空間(第1密閉空間)時,加壓空氣入侵到構成密閉空間(第1密閉空間)的上面之多孔質墊2的細孔,且穿透多孔質墊2,從多孔質墊2的正面整體噴出。 As a result, the porous pad 2 is housed and joined to the space inside the ridge portion 12 of the pad holder 4, and pressurized air is introduced from the pressurized air inlet 20 to the groove 14 and the porous pad 2 In the sealed space (first sealed space) formed, pressurized air invades into the pores of the porous mat 2 which constitutes the upper surface of the sealed space (first sealed space), and penetrates the porous mat 2 from the porous mat The front of 2 is squirted as a whole.

第7圖係底座6之上視圖。如上述,底座6係連結在襯墊支持具4的背側之略圓板狀的構件,例如,由鋁合金等之金屬材料所形成。底座6亦可由CFRP、PEEK等的樹脂形成。 Figure 7 is a top view of the base 6. As described above, the base 6 is a substantially disk-shaped member that is coupled to the back side of the pad holder 4, and is formed of, for example, a metal material such as aluminum alloy. The base 6 may also be formed of a resin such as CFRP or PEEK.

如第1圖及第7圖所示,底座6具有與襯墊支持具4略相同的直徑,且在平坦的上面,格子狀地形成有截面呈矩形的底座溝槽22。因此,將襯墊支持具4之平坦的背面與底座6的上面予以接合時,藉由格子狀的底座溝槽22與覆蓋此之襯墊支持 具4的背面,形成格子狀的密閉空間(第2密閉空間)。 As shown in FIGS. 1 and 7, the base 6 has a diameter slightly the same as that of the pad holder 4, and a flat groove 22 having a rectangular cross section is formed in a lattice shape on a flat upper surface. Therefore, when the flat back surface of the pad support 4 is joined to the upper surface of the base 6, the lattice-like base groove 22 and the pad covering the cover are supported. The back surface of the tool 4 has a lattice-shaped sealed space (second sealed space).

底座溝槽22係於襯墊支持具4與底座6以預定的角度位置接合時,格子狀的底座溝槽22係以與形成在襯墊支持具4之相通孔18於厚度方向對齊之方式所構成。 When the spacer groove 22 is engaged with the base 6 at a predetermined angular position, the lattice-shaped base groove 22 is aligned with the through hole 18 formed in the spacer support 4 in the thickness direction. Composition.

透過此種構成,將多孔質墊2、襯墊支持具4、以及底座6,以預定的角度位置連結時,多孔質墊2之吸引孔8,經由襯墊支持具4之相通孔18,而與形成在底座6與襯墊支持具4間之格子狀的密閉空間(第2密閉空間)之交點相通。 With such a configuration, when the porous pad 2, the pad holder 4, and the chassis 6 are connected at a predetermined angular position, the suction hole 8 of the porous pad 2 passes through the through hole 18 of the spacer holder 4, and It communicates with the intersection of the lattice-shaped sealed space (second closed space) formed between the base 6 and the spacer support 4.

此外,於底座6的外周,形成有用以使底座溝槽22與底座6的外部之真空源相通的貫穿孔即真空孔24。 Further, a vacuum hole 24, which is a through hole for allowing the base groove 22 to communicate with the external vacuum source of the base 6, is formed on the outer circumference of the base 6.

透過此種構成,將多孔質墊2、襯墊支持具4、以及底座6以預定的角度連結之狀態下,從真空孔24進行真空吸引時,經由襯墊支持具4之相通孔18,從多孔質墊2之各吸引口8進行吸引,而可將多孔質墊2上之被加工物朝多孔質墊2吸附。 With such a configuration, when the porous pad 2, the spacer holder 4, and the chassis 6 are connected at a predetermined angle, when the vacuum suction is performed from the vacuum hole 24, the through hole 18 of the spacer holder 4 is passed through the through hole 18. The suction ports 8 of the porous mat 2 are attracted, and the workpiece on the porous mat 2 can be adsorbed toward the porous mat 2.

襯墊支持具4與底座6係利用螺絲、螺栓等之連結件連結。可沿著底座6的上面之外周形成溝槽,且在此溝槽內配置成O環,藉以使得底座6的格子狀之底座溝槽22成為氣密狀態,而將襯墊支持具4與底座6連結。此外,且亦可為以接著劑將襯墊支持具4與底座6連結的構成。 The pad support 4 and the base 6 are coupled by a coupling such as a screw or a bolt. A groove may be formed along the outer circumference of the upper surface of the base 6, and an O-ring is disposed in the groove, so that the lattice-like base groove 22 of the base 6 is in an airtight state, and the pad support 4 and the base are provided. 6 links. Further, a configuration in which the pad holder 4 and the base 6 are coupled by an adhesive may be used.

具有此種構成之非接觸吸著盤,於使用時,在將多孔質墊2、襯墊支持具4、以及底座6以預定之角度位置連結之狀態下,藉由從加壓空氣入口20將加壓空氣導入到由溝槽14與多孔質墊2所形成之密閉空間(第1密閉空間),且從底座6之真空孔24進行真空吸引,藉以在多孔質墊2上以非接觸之方式吸附被加 工物。 The non-contact suction disk having such a configuration is used in a state where the porous pad 2, the pad holder 4, and the base 6 are connected at a predetermined angular position in use, by being pressurized from the air inlet 20 The pressurized air is introduced into a sealed space (first sealed space) formed by the groove 14 and the porous pad 2, and vacuum suction is performed from the vacuum hole 24 of the base 6, whereby the porous pad 2 is non-contacted. Adsorption is added Work.

並且,即使是彎曲的被加工物(被吸附物)亦可使之順應吸附面而使其平坦化。 Further, even a curved workpiece (adsorbed material) can be made to conform to the adsorption surface to be flattened.

上述實施形態係在底座6的上面形成格子狀的底座溝槽22,透過此底座溝槽22形成第2密閉空間的構成,但亦可使底座的上面成為平坦面,而在襯墊支持具的背面形成凹部或溝槽,藉以在襯墊支持具與底座之間形成第2密閉空間。 In the above embodiment, the lattice-shaped base groove 22 is formed on the upper surface of the base 6, and the second sealed space is formed through the base groove 22. However, the upper surface of the base may be a flat surface, and the spacer support may be used. A recess or groove is formed in the back surface to form a second sealed space between the pad holder and the base.

第8圖係用以作為此種構成之變化例的襯墊支持具4’之底視圖。如第8圖所示,在襯墊支持具4’的底面,形成有薄的圓柱狀之凹處22’。 Fig. 8 is a bottom view of the pad holder 4' used as a variation of such a configuration. As shown in Fig. 8, a thin cylindrical recess 22' is formed on the bottom surface of the spacer holder 4'.

此襯墊支持具4’係以下面與上面平坦的圓板狀的底座接合,藉由底座之平坦的上面與薄的圓柱狀的凹處22’形成襯墊支持具4’與底座之間之薄(高度低)的圓柱狀的第2密閉空間。在此襯墊支持具4’之側壁,形成有與凹處22’相通之真空孔(未圖示)。 The pad support 4' is joined to the upper flat disc-shaped base below, and is formed between the pad support 4' and the base by the flat upper surface of the base and the thin cylindrical recess 22' A thin (low height) cylindrical second closed space. Here, the side wall of the gasket supporting member 4' is formed with a vacuum hole (not shown) communicating with the recess 22'.

第9圖係用以作為此種構成之另一個變化例的襯墊支持具4”之底視圖。如第9圖所示,在襯墊支持具4”的底面,形成有格子狀的溝槽22”。 Fig. 9 is a bottom view of a spacer holder 4" used as another variation of the configuration. As shown in Fig. 9, a lattice-like groove is formed on the bottom surface of the spacer holder 4". twenty two".

此襯墊支持具4”亦以下面與上面平坦的圓板狀之底座接合,藉由底座之平坦的上面與格子狀的溝槽22”,在襯墊支持具4”與底座之間形成格子狀的溝槽之第2密閉空間。在此襯墊支持具4”的側壁,亦形成有與格子狀的溝槽22”相通之真空孔(未圖示)。 The pad support 4" is also joined to the upper flat disc-shaped base underneath, and a lattice is formed between the pad support 4" and the base by the flat upper surface of the base and the lattice-like groove 22" The second sealed space of the groove is formed by a side wall of the spacer support 4", and a vacuum hole (not shown) communicating with the lattice-like groove 22" is also formed.

第10圖係用以說明以非接觸吸著盤1進行被加工物 W之吸附固定(非接觸吸附)的狀態之示意剖面圖。 Figure 10 is a view for explaining the workpiece to be processed by the non-contact suction disk 1. Schematic cross-sectional view of the state of adsorption fixation (non-contact adsorption) of W.

如上述,使用時,從外部的壓縮空氣源將加壓空氣 導入到由襯墊支持具4的溝槽14與多孔質墊2所形成的密閉空間時,加壓空氣通過多孔質墊2的細孔入侵到多孔質墊2內,如第10圖中箭號P所示,從多孔質墊2的正面2a噴出。如第10圖中箭號P所示,藉由噴出之加壓空氣,使得被加工物W浮起於襯墊的正面(吸附面)8a上。 As mentioned above, when used, pressurized air is supplied from an external source of compressed air When introduced into the sealed space formed by the groove 14 of the spacer support 4 and the porous pad 2, pressurized air intrudes into the porous pad 2 through the pores of the porous pad 2, as shown in Fig. 10 As shown by P, it is ejected from the front surface 2a of the porous mat 2. As indicated by an arrow P in Fig. 10, the workpiece W is floated on the front surface (adsorption surface) 8a of the gasket by the pressurized air that is ejected.

另一方面,藉由與加壓空氣的導入同時從底座6的 真空孔24進行的真空吸引,使得浮起於襯墊的正面(吸附面)8a上之被加工物W係經由襯墊支持具4的相通孔18,如箭號V所示,受多孔質墊2的各吸引孔8所吸引,成為吸附固定在僅離加壓空氣所引起之浮力與真空吸引所引起之吸引力相抗衡之吸附面8a預定距離G之位置。 On the other hand, by the introduction of pressurized air from the base 6 simultaneously The vacuum suction by the vacuum hole 24 causes the workpiece W floating on the front surface (adsorption surface) 8a of the spacer to pass through the through hole 18 of the spacer holder 4, as shown by the arrow V, and is subjected to the porous pad. Each of the suction holes 8 of the second 2 is attracted to the suction target 8a at a predetermined distance G from the suction surface 8a which is adsorbed and fixed only by the buoyancy caused by the pressurized air and the suction force caused by the vacuum suction.

藉由調整加壓空氣(空氣量與空氣壓)所引起之浮力 與真空吸引所引起之吸引力,亦可在倒置非接觸吸著盤1之狀態,亦即多孔質墊2的吸附面2a朝下方之狀態下,以非接觸狀態使被加工物W吸附固定在吸附面2a的下側。 Buoyancy caused by adjusting pressurized air (air volume and air pressure) In the state in which the non-contact suction disk 1 is inverted, that is, the adsorption surface 2a of the porous pad 2 faces downward, the workpiece W is adsorbed and fixed in a non-contact state. The lower side of the adsorption surface 2a.

其次,說明以使用本實施形態的非接觸吸著盤1之 被加工物搬送裝置進行被加工物搬送。 Next, a description will be given of the use of the non-contact absorbing tray 1 of the present embodiment. The workpiece conveyance device conveys the workpiece.

第11圖至第19圖係顯示以使用非接觸吸著盤1之 被加工物搬送裝置50進行被加工物搬送之各步驟之圖。 Figures 11 through 19 show the use of non-contact absorbing tray 1 The workpiece conveyance device 50 performs a process of each workpiece conveyance.

如第11圖至第19圖所示,被加工物搬送裝置50係 所謂的水平多關節式之「物料搬運(material handling)」機器人。 As shown in Figs. 11 to 19, the workpiece conveying device 50 is The so-called horizontal multi-joint "material handling" robot.

被加工物搬送裝置50係具備:柱52;第1臂56, 係經由肩關節54而旋轉自如地將基端連結在柱52的上端;第2臂60,係經由肘關節58而旋轉自如地將基端連結在第1臂56的前端;以及手部64,係經由腕關節62而旋轉自如地將基端連結在第2臂60的前端。於手部64的下面,以吸附面2a朝下方之狀態,安裝上述實施形態的非接觸吸著盤1。 The workpiece conveyance device 50 includes a column 52 and a first arm 56. The base end is rotatably coupled to the upper end of the column 52 via the shoulder joint 54 , and the second arm 60 is rotatably coupled to the distal end of the first arm 56 via the elbow joint 58 and the hand 64 . The proximal end is rotatably coupled to the distal end of the second arm 60 via the wrist joint 62. The non-contact suction disk 1 of the above-described embodiment is attached to the lower surface of the hand 64 with the suction surface 2a facing downward.

其次,說明利用被加工物搬送裝置50,從第1處理 裝置66朝第2處理裝置68搬送被加工物W之動作。 Next, the first processing will be described using the workpiece conveying device 50. The device 66 transports the workpiece W to the second processing device 68.

如第11圖所示,被加工物W係透過第1處理裝置 66上的吸著裝置70吸附保持在第1處理裝置66上。在本實施形態之搬送步驟中,首先,使被加工物搬送裝置50的第1及第2臂56、60,伸張向第1處理裝置66方向,將安裝在手部64之非接觸吸著盤1,配置在第1處理裝置66上吸附保持之被加工物W上方(第12圖)。 As shown in Fig. 11, the workpiece W is transmitted through the first processing device. The absorbing device 70 on the 66 is adsorbed and held on the first processing device 66. In the transporting step of the present embodiment, first, the first and second arms 56 and 60 of the workpiece conveying device 50 are extended in the direction of the first processing device 66, and the non-contact suction disk attached to the hand 64 is placed. 1. The upper portion of the workpiece W adsorbed and held by the first processing device 66 is disposed (Fig. 12).

其次,將柱52縮短,使非接觸吸著盤1等降低到可 吸附被加工物W之高度位置(第13圖)。接著,開始對於非接觸吸著盤1施以加壓空氣與真空吸引,且使第1處理裝置66的吸著裝置70之吸附動作停止,將被加工物W吸附固定在非接觸吸著盤1側(第14圖)。 Secondly, the column 52 is shortened, so that the non-contact absorbing plate 1 and the like are lowered to the The height position of the workpiece W is adsorbed (Fig. 13). Then, pressurized air and vacuum suction are applied to the non-contact suction disk 1, and the adsorption operation of the absorbing device 70 of the first processing device 66 is stopped, and the workpiece W is adsorbed and fixed to the non-contact absorbing plate 1 Side (Fig. 14).

其次,使柱52伸長(第15圖),並且,以肩關節54 為中心使臂整體旋轉,使非接觸吸著盤1移動至第2處理裝置68的上方(第16圖)。 Next, the post 52 is elongated (Fig. 15), and the shoulder joint 54 is used. The arm is rotated as a whole, and the non-contact suction disk 1 is moved to the upper side of the second processing device 68 (Fig. 16).

再來,將柱52縮短,至第2處理裝置68的吸著裝 置72可吸附非接觸吸著盤1上吸附固定之被加工物W之高度位置為止,使非接觸吸著盤1等降低(第17圖)。接著,開始進行第 2處理裝置68的吸著裝置72之吸附動作,並且停止對於非接觸吸著盤1施以加壓空氣與真空吸引,使被加工物W吸附在第2處理裝置68的吸著裝置72(第18圖),然後,將臂送回到初始位置而結束搬送作業(第19圖)。 Then, the column 52 is shortened to the suction of the second processing device 68. The position 72 can adsorb the height position of the workpiece W adsorbed and fixed on the non-contact suction disk 1, and lower the non-contact suction disk 1 and the like (Fig. 17). Then, start the first (2) the adsorption operation of the absorbing device 72 of the processing device 68, and the application of the pressurized air and the vacuum suction to the non-contact absorbing disk 1 to stop the suction of the workpiece W on the absorbing device 72 of the second processing device 68 (the first) 18)), then return the arm to the initial position and end the transfer operation (Fig. 19).

依據上述之非接觸吸著盤,從吸附面整體噴出加壓 空氣而一邊使被加工物浮起,一邊從分布在吸附面整體之吸引孔吸引被加工物W,故不對被加工物施加過大的應力,而可在非接觸狀態下將被加工物吸附固定在預定位置。 According to the above non-contact suction disk, the entire pressure is discharged from the adsorption surface When the workpiece is floated, the workpiece W is sucked from the suction hole distributed over the entire adsorption surface, so that excessive stress is not applied to the workpiece, and the workpiece can be adsorbed and fixed in a non-contact state. Pre-determined location.

其次,說明本發明第2實施形態之非接觸吸著盤的 構成。第20圖係本發明第2實施形態的非接觸吸著盤100之從上方所見的分解立體圖,第21圖係本發明第2實施形態的非接觸吸著盤100之從下方所見的分解立體圖。 Next, a description will be given of a non-contact suction disk according to a second embodiment of the present invention. Composition. Fig. 20 is an exploded perspective view of the non-contact suction disk 100 according to the second embodiment of the present invention, and Fig. 21 is an exploded perspective view of the non-contact suction disk 100 according to the second embodiment of the present invention as seen from below.

本實施形態的非接觸吸著盤100係與第1實施形態 的非接觸吸著盤1相同地,以非接觸狀態將半導體晶圓、FPD用玻璃基材等之薄板狀的被吸附物(被加工物),例如,厚度100μm以下的半導體晶圓予以吸附之非接觸吸著盤。 The non-contact suction disk 100 of the present embodiment is the first embodiment Similarly, the non-contact absorbing disk 1 is affixed to a semiconductor wafer such as a semiconductor wafer or a FPD glass substrate, for example, a semiconductor wafer having a thickness of 100 μm or less in a non-contact state. Non-contact suction plate.

如第20圖及第21圖所示,非接觸吸著盤100具備 有:圓板狀的多孔質墊102,係在上面具備有被加工物的吸附區域;略圓板狀的襯墊支持具104,係從下側(背側)保持多孔質墊102;以及略圓板狀的底座106,係配置在襯墊支持具104的背側。 As shown in FIGS. 20 and 21, the non-contact absorbing disc 100 is provided The disk-shaped porous pad 102 is provided with an adsorption region on the upper surface of the workpiece; the substantially disk-shaped spacer support member 104 holds the porous pad 102 from the lower side (back side); The disc-shaped base 106 is disposed on the back side of the pad holder 104.

在非接觸吸著盤100中,於襯墊支持具104與底座 106之間,配置有具備有環狀部分108a之框架構件108。 In the non-contact squeegee 100, the pad support 104 and the base Between 106, a frame member 108 having an annular portion 108a is disposed.

多孔質墊102係與非接觸吸著盤1的多孔質墊2相 同地由通氣性的多孔碳所形成。多孔質墊102的材料亦不限定於 通氣性的多孔碳而亦可使用其他通氣性的多孔質材料,例如多孔SiC、多孔鋁等。 The porous mat 102 is in contact with the porous mat 2 of the non-contact absorbing tray 1 The same place is formed by a gas permeable porous carbon. The material of the porous pad 102 is not limited to As the porous porous carbon, other air-permeable porous materials such as porous SiC or porous aluminum may be used.

多孔質墊102、襯墊支持具104的圓盤部分104a、 框架構件108的環狀部分108a、以及底座106的圓盤部分106a具有略相同的外徑。並且,在本實施態樣中,將多孔質墊102、襯墊支持具104的圓盤部分104a、框架構件108的環狀部分108a、以及底座106的圓盤部分106a予以積層,並藉由接著劑固定來形成非接觸吸著盤100。 The porous pad 102, the disk portion 104a of the pad support 104, The annular portion 108a of the frame member 108, and the disk portion 106a of the base 106 have slightly the same outer diameter. Further, in the present embodiment, the porous pad 102, the disk portion 104a of the spacer holder 104, the annular portion 108a of the frame member 108, and the disk portion 106a of the base 106 are laminated, and then The agent is fixed to form the non-contact absorbing tray 100.

再者,襯墊支持具104、底座106、以及框架構件108 係各別具備有從圓盤部分或環狀部分朝外方延伸之略相同輪廓之矩形的把手部104b、106b、108b。 Furthermore, the pad support 104, the base 106, and the frame member 108 Each of the handle portions 104b, 106b, 108b having a substantially identical contour extending outward from the disk portion or the annular portion is provided.

襯墊支持具104、底座106、以及框架構件108係由 鋁合金的金屬材料、CFRP、PEEK等的樹脂等所形成。 The pad holder 104, the base 106, and the frame member 108 are A metal material of an aluminum alloy, a resin such as CFRP or PEEK, or the like is formed.

多孔質墊102形成有複數個吸引孔(通氣孔)109。吸 引孔109係遍及多孔質墊102之略整面而配置。 The porous mat 102 is formed with a plurality of suction holes (vent holes) 109. Suck The pilot hole 109 is disposed over the entire surface of the porous pad 102.

此外,於多孔質墊102的周緣部係形成有連結多孔 質墊於襯墊支持具4等時之定位孔110。 Further, a porous joint is formed on the peripheral portion of the porous mat 102. The pad is supported by the spacer hole 110 with a time of 4 or the like.

如第21圖所示,於多孔質墊102的下面,在外周緣 形成有環狀的垂下部112。垂下部112係以外徑與襯墊支持具104的圓盤部104b的外徑略相等之方式所構成。亦即,於多孔質墊102的下面形成有圓盤狀的凹處。結果,將多孔質墊102積層在襯墊支持具104上時,在襯墊支持具104的上面與多孔質墊102的下面之間,形成密閉空間(第1密閉空間)。 As shown in Fig. 21, under the porous pad 102, on the outer periphery An annular lower portion 112 is formed. The lower portion 112 is configured such that the outer diameter is slightly equal to the outer diameter of the disk portion 104b of the pad holder 104. That is, a disk-shaped recess is formed on the lower surface of the porous pad 102. As a result, when the porous pad 102 is laminated on the spacer support 104, a sealed space (first sealed space) is formed between the upper surface of the spacer support 104 and the lower surface of the porous pad 102.

在多孔質墊102的下面之垂下部112的內側區域, 形成截面呈矩形的溝槽114,由溝槽114所區隔之部分成為橫斷面為正方形之島狀的突出部116。島狀的突出部116係與配置成格子狀(圍棋盤的網目狀)之溝槽114一起構成圍棋盤的網目狀之配置。各突出部116的頂面平坦,在中央配置有於厚度方向貫穿多孔質墊102之吸引孔109。 In the inner region of the lower portion 112 of the lower surface of the porous pad 102, A groove 114 having a rectangular cross section is formed, and a portion partitioned by the groove 114 is an island-shaped projecting portion 116 having a square cross section. The island-shaped projections 116 are arranged in a mesh shape of the checkerboard together with the grooves 114 arranged in a lattice shape (mesh shape of the checkerboard). The top surface of each of the protruding portions 116 is flat, and a suction hole 109 penetrating the porous pad 102 in the thickness direction is disposed at the center.

島狀的突出部116之厚度與垂下部112的高度略相同,故形成在襯墊支持具104的上面與多孔質墊102的下面之間的密閉空間(第1密閉空間)成為由島狀的突出部116區隔之密閉空間。 Since the thickness of the island-shaped protruding portion 116 is slightly the same as the height of the hanging portion 112, the sealed space (first sealed space) formed between the upper surface of the spacer support 104 and the lower surface of the porous pad 102 is island-shaped. The constricted portion 116 is separated by a confined space.

此外,於襯墊支持具104穿孔有於厚度方向貫穿襯墊支持具104的貫通孔118。各貫通孔118係具有與多孔質墊102的吸引孔109略相同的直徑,以預定的角度位置將襯墊支持具104配置在多孔質墊102時,以與多孔質墊102的吸引孔109對齊之方式而配置。 Further, the spacer support 104 is perforated with a through hole 118 penetrating the spacer support 104 in the thickness direction. Each of the through holes 118 has a diameter slightly the same as that of the suction hole 109 of the porous pad 102, and is aligned with the suction hole 109 of the porous pad 102 when the spacer holder 104 is disposed at the predetermined position of the porous pad 102 at a predetermined angular position. Configured in a way.

結果,將多孔質墊102與襯墊支持具104積層時,多孔質墊102的吸引孔109與襯墊支持具104的貫通孔118呈流體相通。 As a result, when the porous pad 102 and the spacer support 104 are laminated, the suction hole 109 of the porous pad 102 is in fluid communication with the through hole 118 of the spacer holder 104.

如上述,襯墊支持具104的圓盤部分、框架構件108之環狀部分、以及底座106的圓盤部分係略相同的外徑,故將襯墊支持具104的圓盤部分、框架構件108的環狀部分、以及底座106的圓盤部分以對齊狀態積層成為非接觸吸著盤100時,在襯墊支持具104的圓盤部分與底座106的圓盤部分之間,形成具有與框架構件108的厚度略相等高度的密閉空間(第2密閉空間)。在此襯墊支持具104的圓盤部分與底座106的圓盤部分之間,密閉空 間(第2密閉空間)係經由襯墊支持具104的貫通孔118與多孔質墊102的吸引孔109相通。 As described above, the disk portion of the pad support 104, the annular portion of the frame member 108, and the disk portion of the base 106 have substantially the same outer diameter, so that the disk portion of the pad support 104, the frame member 108 When the annular portion and the disk portion of the base 106 are laminated in the aligned state to form the non-contact absorbing disk 100, between the disk portion of the pad holder 104 and the disk portion of the base 106, the frame member is formed. The sealed space of the thickness of 108 is slightly equal in height (second closed space). Between the disc portion of the pad support 104 and the disc portion of the base 106, the air is sealed The space (second sealed space) communicates with the suction hole 109 of the porous pad 102 via the through hole 118 of the spacer holder 104.

結果,對於襯墊支持具104的圓盤部分與底座106的圓盤部分之間,將密閉空間(第2密閉空間)進行真空吸引時,經由襯墊支持具104的貫通孔118,從多孔質墊102的各吸引孔109進行吸引,可將多孔質墊102上的被加工物吸附向多孔質墊102。 As a result, when the sealed space (second closed space) is vacuum-sucked between the disk portion of the spacer holder 104 and the disk portion of the base 106, the through hole 118 of the spacer support 104 is used to be porous. Each of the suction holes 109 of the pad 102 is sucked, and the workpiece on the porous pad 102 can be adsorbed to the porous pad 102.

此外,在本實施態樣的非接觸吸著盤100中,在框架構件108的把手部108b形成有略平行地延伸之吸引長孔120、122以及加壓長孔124。兩側部的吸引長孔120、122係內端側與由框架構件108的環狀部108a所包圍之內部空間相通。因此,在非接觸吸著盤100的組裝狀態下,吸引長孔120、122係相通於襯墊支持具104的圓盤部分與底座106的圓盤部分之間的密閉空間(第2密閉空間)。 Further, in the non-contact absorbing tray 100 of the present embodiment, the elongated portions 120, 122 and the pressurized long holes 124 which extend slightly in parallel are formed in the handle portion 108b of the frame member 108. The inner end sides of the suction long holes 120 and 122 on both side portions communicate with the inner space surrounded by the annular portion 108a of the frame member 108. Therefore, in the assembled state of the non-contact suction pad 100, the suction long holes 120, 122 are in a sealed space (second closed space) between the disk portion of the pad holder 104 and the disk portion of the base 106. .

並且,在本實施態樣之非接觸吸著盤100中,於襯墊支持具104的圓盤部分與底座106的圓盤部分之間的密閉空間(第2密閉空間),配置有複數個補強構件126。補強構件126具有與框架構件108略相同的厚度。結果,在非接觸吸著盤100之組裝狀態下,補強構件126係夾持於襯墊支持具104之圓盤部分104a的下面與底座106之圓盤部分106a的上面之間,將襯墊支持具104的圓盤部分104a與底座106的圓盤部分106a之間的密閉空間(第2密閉空間)減壓時,發揮作為抑制此密閉空間(第2密閉空間)於厚度方向潰縮之補強構件的功能。 Further, in the non-contact absorbing disk 100 of the present embodiment, a plurality of reinforcing members are disposed in a sealed space (second sealed space) between the disk portion of the spacer holder 104 and the disk portion of the base 106. Member 126. The reinforcing member 126 has a slightly the same thickness as the frame member 108. As a result, in the assembled state of the non-contact absorbing tray 100, the reinforcing member 126 is held between the lower surface of the disc portion 104a of the lining holder 104 and the upper surface of the disc portion 106a of the base 106, and the lining support When the sealed space (second closed space) between the disk portion 104a of the tool 104 and the disk portion 106a of the base 106 is decompressed, the reinforcing member that collapses in the thickness direction is suppressed as the sealed space (second sealed space). The function.

此外,本實施形態之非接觸吸著盤100具備有上板 128與下板130。上板128與下板130具有與襯墊支持具104、底座106、以及框架構件108之把手部104b、106b、以及108b略相同的矩形形狀,在非接觸吸著盤100之組裝狀態下,從上下夾持把手部104b、106b、以及108b。 Further, the non-contact absorbing disk 100 of the present embodiment is provided with an upper plate 128 and lower plate 130. The upper plate 128 and the lower plate 130 have a rectangular shape which is slightly the same as the pad support 104, the base 106, and the handle portions 104b, 106b, and 108b of the frame member 108. In the assembled state of the non-contact absorbing plate 100, The handle portions 104b, 106b, and 108b are sandwiched up and down.

上板128與下板130係在四角落具有螺絲孔132、 134。上述螺絲孔係在非接觸吸著盤100之組裝狀態下,與形成在襯墊支持具104、底座106、以及框架構件108的把手部104b、106b、以及108b的四角落之對應的螺絲孔136、138、140於上下方向對齊,將未圖示之螺絲插通在上述各螺絲孔132、136、138、140、及134,以藉由上板128與下板130來夾持積層狀態的把手部104b、106b、108b。 The upper plate 128 and the lower plate 130 have screw holes 132 at four corners. 134. The screw holes are screw holes 136 corresponding to the four corners of the handle portions 104b, 106b, and 108b of the pad holder 104, the base 106, and the frame member 108 in the assembled state of the non-contact suction pad 100. 138 and 140 are aligned in the up-and-down direction, and screws (not shown) are inserted into the screw holes 132, 136, 138, 140, and 134 to hold the laminated handle by the upper plate 128 and the lower plate 130. Portions 104b, 106b, and 108b.

於下板130形成有於厚度方向貫穿之2個吸引開口 142、144、以及加壓開口146。形成在側方之吸引開口142、144係在非接觸吸著盤100之組裝狀態下,經由貫穿底座106的把手部106b之吸引通路148、150,相通於框架構件108的把手部108b上形成之吸引長孔120、122,並且相通於襯墊支持具104的圓盤部分與底座106的圓盤部分之間的密閉空間(第2密閉空間)。 Two suction openings penetrating in the thickness direction are formed on the lower plate 130 142, 144, and a pressurized opening 146. The suction openings 142, 144 formed on the side are formed in the assembled state of the non-contact suction pad 100, and are formed on the handle portion 108b of the frame member 108 via the suction passages 148, 150 of the handle portion 106b penetrating the base 106. The long holes 120, 122 are attracted, and communicate with the closed space (second closed space) between the disk portion of the pad support 104 and the disk portion of the base 106.

另一方面,加壓開口146係在非接觸吸著盤100之 組裝狀態下,經由貫穿底座106的把手部106b之加壓通路152,相通於框架構件108的把手部108b上形成之加壓長孔124的外方側部。 On the other hand, the pressurized opening 146 is attached to the non-contact absorbing tray 100. In the assembled state, the outer side portion of the pressurizing long hole 124 formed in the handle portion 108b of the frame member 108 is communicated via the pressurizing passage 152 penetrating the handle portion 106b of the base 106.

並且,加壓長孔124的內方側(環狀部分側)部係在非 接觸吸著盤100的組裝狀態下,經由貫穿配置在上方之襯墊支持具104的把手部104b之加壓通路154,相通於襯墊支持具104的 上面與多孔質墊102的下面之間形成的密閉空間(第1密閉空間)。 Further, the inner side (annular portion side) of the pressurizing long hole 124 is not In the assembled state in contact with the suction pad 100, the pressure passage 154 of the handle portion 104b of the spacer support 104 is disposed through the pad support 104. A sealed space (first sealed space) formed between the upper surface and the lower surface of the porous pad 102.

使用時,從加壓開口146導入外部的壓縮空氣源的 加壓空氣時,加壓空氣係流入襯墊支持具104的上面與多孔質墊102的下面之間形成的密閉空間(第1密閉空間),通過多孔質墊102的細孔從正面噴出。 In use, the external compressed air source is introduced from the pressurized opening 146 In the case of pressurized air, the pressurized air flows into a sealed space (first sealed space) formed between the upper surface of the spacer support 104 and the lower surface of the porous pad 102, and is ejected from the front surface through the pores of the porous pad 102.

另一方面,藉由與加壓空氣的導入同時從吸引開口 142、144進行的真空吸引,使得浮起於多孔質墊102的正面(吸附面)之被加工物係受到多孔質墊102的各吸引孔109所吸引,成為吸附固定在僅離加壓空氣所引起之浮力與真空吸引所引起之吸引力相抗衡之吸附面8a預定距離G之位置。 On the other hand, from the suction opening by simultaneous introduction with pressurized air The vacuum suction by 142 and 144 causes the workpiece to be floated on the front surface (adsorption surface) of the porous mat 102 to be attracted by the respective suction holes 109 of the porous mat 102, and is adsorbed and fixed only to the pressurized air. The buoyancy caused by the buoyancy and the attraction caused by the vacuum suction are at a predetermined distance G from the adsorption surface 8a.

藉由調整加壓空氣(空氣量與空氣壓)所引起之浮力 與真空吸引所引起吸引力,亦可在倒置非接觸吸著盤100之狀態,亦即多孔質墊102的吸附面朝下方之狀態下,以非接觸狀態使被加工物吸附固定在吸附面的下側。 Buoyancy caused by adjusting pressurized air (air volume and air pressure) In addition to the attraction of the vacuum suction, the workpiece can be adsorbed and fixed to the adsorption surface in a non-contact state in a state where the non-contact suction disk 100 is inverted, that is, the adsorption surface of the porous pad 102 faces downward. Lower side.

此外,在襯墊支持具104的圓盤部分104a、框架構 件108的環狀部分108a、以及底座106的圓盤部分106a,各別形成有在非接觸吸著盤100之組裝狀態下,與多孔質墊102的定位孔110對齊之複數個定位孔156、158、160。 Further, in the disc portion 104a of the pad holder 104, the frame structure The annular portion 108a of the member 108 and the disk portion 106a of the base 106 are each formed with a plurality of positioning holes 156 aligned with the positioning holes 110 of the porous pad 102 in the assembled state of the non-contact suction pad 100, 158, 160.

於組裝非接觸吸著盤100時,以定位孔110、156、 158、160對齊之方式,將多孔質墊102、襯墊支持具104的圓盤部分104a、框架構件108的環狀部分108a、以及底座106的圓盤部分106a積層,將未圖示之插梢插通到已對齊之定位孔110、156、158、160,將多孔質墊102、襯墊支持具104、框架構件108、以及底座106相互定位,而將該等構件接合固定。 When assembling the non-contact absorbing plate 100, the positioning holes 110, 156, 158, 160 alignment, the porous pad 102, the disk portion 104a of the pad holder 104, the annular portion 108a of the frame member 108, and the disk portion 106a of the base 106 are laminated, and the insertion portion (not shown) The porous pad 102, the pad holder 104, the frame member 108, and the base 106 are inserted into each other to be aligned with the aligned positioning holes 110, 156, 158, and 160, and the members are joined and fixed.

再者,插梢係具有突出於多孔質墊102的正面上方 之長度,於組裝非接觸吸著盤100後亦不拆卸而成為止擋件,防止已吸附在多孔質墊102的正面之被加工物從多孔質墊的正面滑落。 Furthermore, the lancet has a protrusion above the front surface of the porous pad 102. The length is not removed after the non-contact suction cup 100 is assembled, and the workpiece that has been adsorbed on the front surface of the porous mat 102 is prevented from slipping from the front surface of the porous mat.

本發明不限定於前述實施形態,在申請專利範圍中 記載之技術性思想範圍內可作種種的變更、變化。 The present invention is not limited to the foregoing embodiment, and is in the scope of patent application. Changes and changes can be made within the scope of the technical ideas described.

上述第1實施形態之非接觸吸附盤係在圓板狀的多孔質墊2上格子狀地設置吸引孔8之構成,然而如第22圖所示,亦可使用在圓板狀之多孔質墊2’上環狀地配置吸引孔8之多孔質墊。 In the non-contact adsorption disk according to the first embodiment, the suction hole 8 is provided in a lattice shape on the disk-shaped porous pad 2. However, as shown in Fig. 22, a disk-shaped porous pad may be used. 2' is a porous pad in which the suction holes 8 are arranged annularly.

再者,如第23圖及第24圖所示,亦可為在矩形的多孔質墊2”上格子狀或環狀地配置複數個吸引孔8”之構成。此時,使用矩形的襯墊支持具4”等。 Further, as shown in Figs. 23 and 24, a plurality of suction holes 8" may be arranged in a lattice or a ring shape on the rectangular porous pad 2". At this time, a rectangular pad support 4" or the like is used.

在上述第22圖至第24圖的例中,對應多孔質墊的吸引孔之位置,亦適當變更多孔質墊的吸引孔(通氣孔)以及襯墊支持具的相通孔等的位置。 In the examples of the above-described Figs. 22 to 24, the positions of the suction holes (vent holes) of the porous mat and the through holes of the spacer support are appropriately changed in accordance with the positions of the suction holes of the porous mat.

並且,上述實施形態係第1密閉空間為加壓空間,第2密閉空間為減壓空間之構成,然而亦可為將加壓部分與減壓部分替換,以第1密閉空間作為減壓空間,以第2密閉空間作為加壓空間之構成。 Further, in the above embodiment, the first sealed space is a pressurized space, and the second sealed space is a reduced pressure space. However, the pressurized portion and the reduced pressure portion may be replaced, and the first sealed space may be used as a reduced pressure space. The second sealed space is configured as a pressurized space.

此外,在上述第1實施形態中,在底座6之平坦的上面格子狀地形成截面呈矩形的底座溝槽22,此底座溝槽22係成為第2密閉空間。亦即,在格子狀的底座溝槽22之間形成與襯墊支持具4的上面之島狀的突出部16相同的島狀的突出部之構 成。然而,如第25圖所示,亦可為以底座6’的上面整體作為凹處,成為未由島狀的突出部所區隔之整體的第2密閉空間22’之構成。 Further, in the first embodiment described above, the base groove 22 having a rectangular cross section is formed in a lattice shape on the flat upper surface of the chassis 6, and the base groove 22 is a second sealed space. That is, an island-like projecting portion which is the same as the island-like projecting portion 16 on the upper surface of the pad holder 4 is formed between the lattice-like base grooves 22. to make. However, as shown in Fig. 25, the entire upper surface of the base 6' may be a recess, and the second sealed space 22' which is not partitioned by the island-shaped projecting portion may be formed.

1‧‧‧非接觸吸著盤 1‧‧‧ Non-contact suction tray

2‧‧‧多孔質墊 2‧‧‧Porous mat

2a‧‧‧正面 2a‧‧‧ positive

4‧‧‧襯墊支持具 4‧‧‧Cushion support

6‧‧‧底座 6‧‧‧Base

8‧‧‧吸引孔(通氣孔) 8‧‧‧Attraction hole (ventilation hole)

10‧‧‧連結孔 10‧‧‧Link hole

12‧‧‧隆起部 12‧‧‧ Uplift

14‧‧‧溝槽 14‧‧‧ trench

16‧‧‧突出部 16‧‧‧Protruding

18‧‧‧相通孔 18‧‧‧Contact holes

20‧‧‧加壓空氣入口 20‧‧‧ pressurized air inlet

22‧‧‧底座溝槽 22‧‧‧Base groove

24‧‧‧真空孔 24‧‧‧vacuum hole

Claims (6)

一種非接觸吸著盤,其係以非接觸狀態將薄板狀的被吸附物予以吸附,其具備:板狀的多孔質墊,係於吸附固定區域形成貫穿厚度方向而延伸之複數個通氣孔;第1密閉空間,係鄰接配置於前述多孔質墊的背面之加壓空氣用空間部;第2密閉空間,係與前述第1密閉空間隔離之減壓用空間部;相通手段,係使前述第2密閉空間與前述通氣孔相通;板狀的支持具,係正面積層在前述多孔質墊的背面側,且具備有凹處,該凹處係與該多孔質墊的背面之間構成前述第1密閉空間;以及底座,係積層在前述支持具的背面側,與該支持具的背面之間形成前述第2密閉空間,前述支持具係具備:相通孔,該相通孔係一端於前述積層時連接在前述多孔質墊的通氣孔,而另一端於該支持具的背面形成開口,以作為前述相通手段的功能;以及複數個島狀的突出部,該些島狀的突出部係具備平坦的頂部,在前述複數個通氣孔之背面側開口端的位置,接抵於前述多孔質墊的背面,前述相通孔係貫穿前述突出部而延伸,前述突出部間之空間成為前述第1密閉空間。 A non-contact absorbing plate for adsorbing a thin plate-shaped adsorbate in a non-contact state, comprising: a plate-shaped porous pad, wherein a plurality of vent holes extending in a thickness direction are formed in the adsorption fixing region; The first sealed space is adjacent to a space for pressurizing air disposed on a back surface of the porous mat; the second sealed space is a space for decompression separated from the first sealed space; and the communication means is configured to a sealed space communicating with the vent hole; a plate-shaped support member having a positive-area layer on a back side of the porous mat and having a recess, the recess being formed between the recess and the back surface of the porous mat a sealed space; and a base, the laminated layer is formed on the back side of the support member, and the second sealed space is formed between the back surface of the support member, and the support member includes a through hole, and the through hole is connected at one end of the laminated layer a vent hole of the porous pad, and an opening formed at the other end of the support member as a function of the aforementioned communication means; and a plurality of island-shaped protrusions, the island-like The outlet portion has a flat top portion, and is connected to the back surface of the porous pad at a position on the back end side of the plurality of vent holes, and the through hole extends through the protruding portion, and the space between the protruding portions becomes the aforementioned The first confined space. 如申請專利範圍第1項所述之非接觸吸著盤,其具備板狀的支持具,係積層在前述多孔質墊的背面側,且具備與前述多孔質 墊的通氣孔對應的貫穿孔,更具備一底座,係積層在前述支持具之背面側,與該支持具的背面之間形成第2密閉空間,在前述多孔質墊之背面形成凹處,該凹處與前述支持具之間構成前述第1密閉空間,前述多孔質墊之通氣孔係連結在前述支持具之貫穿孔,作為前述相通手段之功能。 The non-contact suction disk according to claim 1, comprising a plate-shaped support member, the laminated layer being provided on the back side of the porous pad, and having the porous material The through hole corresponding to the vent hole of the pad further includes a base, and the laminated layer is formed on the back side of the support member, and a second sealed space is formed between the back surface of the support member, and a recess is formed on the back surface of the porous pad. The first sealing space is formed between the recess and the support member, and the vent hole of the porous pad is coupled to the through hole of the holder to function as the communication means. 如申請專利範圍第2項所述之非接觸吸著盤,其具備框架構件,該框架構件係具有配置在前述支持具與前述底座之間的環狀部,前述第2密閉空間係由前述環狀部的內部空間形成。 The non-contact suction disk according to claim 2, further comprising: a frame member having an annular portion disposed between the support member and the base, wherein the second sealed space is formed by the ring The internal space of the shape is formed. 如申請專利範圍第2項或第3項所述之非接觸吸著盤,其中在前述多孔質墊之凹處具備複數個島狀的突出部,該些島狀的突出部係具備接抵於前述支持具的正面之平坦的頂部,前述多孔質墊的通氣孔係貫穿前述島狀的突出部。 The non-contact absorbing plate according to the second or third aspect of the invention, wherein a plurality of island-shaped protruding portions are provided in the recess of the porous pad, and the island-shaped protruding portions are provided with The flat top of the front surface of the support member, the vent hole of the porous pad is inserted through the island-shaped protruding portion. 如申請專利範圍第1項至第3項之任一項所述之非接觸吸著盤,其中前述通氣孔係分散配置在前述多孔質墊之正面整體。 The non-contact suction disk according to any one of claims 1 to 3, wherein the vent hole is dispersedly disposed on the entire front surface of the porous pad. 如申請專利範圍第1項至第3項之任一項所述之非接觸吸著盤,其中前述多孔質墊係由多孔碳所形成。 The non-contact absorbing disk according to any one of claims 1 to 3, wherein the porous mat is formed of porous carbon.
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TW201343514A (en) 2013-11-01
KR20140129070A (en) 2014-11-06
KR101697839B1 (en) 2017-01-18
JP5512052B2 (en) 2014-06-04
JPWO2013129599A1 (en) 2015-07-30
CN104137247B (en) 2016-09-07
CN104137247A (en) 2014-11-05

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