CN106444299B - A kind of DMD structures multiaxis may move light path direct write exposure machine - Google Patents
A kind of DMD structures multiaxis may move light path direct write exposure machine Download PDFInfo
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- CN106444299B CN106444299B CN201611025071.2A CN201611025071A CN106444299B CN 106444299 B CN106444299 B CN 106444299B CN 201611025071 A CN201611025071 A CN 201611025071A CN 106444299 B CN106444299 B CN 106444299B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of DMD structures multiaxis may move light path direct write exposure machine, belong to direct write exposure technique field.The DMD structures multiaxis of the present invention may move light path direct write exposure machine, and mainly vacuum cup structure is improved, when solve thing problems, such as to produce platelet due to gas leakage and caused by suction deficiency.Further, the gas cell distribution on sucker for it is middle dredge, it is four careful, effectively prevented the problem of board edge tilts, saved stomata quantity, reduce cost.The DMD structures multiaxis of the present invention may move light path direct write exposure machine, can produce 55 inches of super large plate；And multigroup moving parts are connected below sucker, the kinematic axis of multigroup moving parts is synchronized with the movement, and improves exposure accuracy and the stability of operation.Meanwhile subregion contraposition focus method improves and may insure that image exposure position is accurate, image exposure understands.
Description
Technical field
The present invention relates to a kind of DMD structures multiaxis may move light path direct write exposure machine, belong to direct write exposure technique field.
Background technology
PCB (printed circuit board (PCB)) is the supporter of electronic component, while is also the carrier of electronic component electrical connection.
Common PCB production equipments have traditional exposure machine, polygon prism structure laser direct-writing exposure machine, the exposure of DMD structures laser direct-writing
Machine etc..Image directly can be imaged by laser direct-writing exposure machine on pcb board, relative to traditional exposure machine, it is not necessary to use
The film, the image of formation are apparent.
With functional requirement more and more higher of the market to pcb board, pcb board also becomes to become increasingly complex, and system compatibility is got over
It is high, it is sometimes necessary to the very big substrate of size, still, 48 inches of super large plate to be more than for width, is not had also in the prior art
The technology and equipment that can be processed with high quality.Traditional exposure machine can produce super large plate, but its machining accuracy is poor, does not reach
The requirement of high density, thin space；Polygon prism structure laser direct-writing exposure machine can not realize the movement of light path, whole plate necessary one at present
Secondary shaping, when processing is more than 48 inches of super large plates, its equipment complete machine width is up to more than 3m, and equipment size is excessively huge,
It is difficult to the door by general workshop, it is very heavy；Therefore polygon prism structure LDI can not produce the pcb board of more than 48 inches of width.
Conventional DMD structure laser direct-writing exposure machines, because the size Breadth Maximum that its sucker can expose is only 24 inches, therefore also without
Super large plate of the method production more than 48 inches.
If the method for the size that can be exposed by increasing sucker prepares DMD structure laser direct-writing exposure machines, by institute
The vacuum cup size needed is bigger, and sometimes more than 55 inches, there are the following problems for meeting：(1) when the pcb board exposed
When actual size is smaller, and sucker structure supports larger vacuum range, the region for being not covered with plank, can produce Lou
Gas, influence absorption of the sucker to substrate；(2) tilted due to might have corner during substrate transport, if pull of vacuum is inadequate,
Sucker, which can not inhale plank, puts down, and influences whether to expose the quality of pcb board, substrate can be caused to scrap.To solve this problem, at present
Method have three kinds：
Method one：Directly ignore the problem, but can require very high to client factory pcb board, plank not usually, can back and forth
Return and plank is bent manually, have a strong impact on production efficiency.
Method two：For various sizes of plank, different sucker backing plates is designed.The hole covering model of vacuum is inhaled on backing plate
Enclose, it is in the same size with plank.This method is simple, and operation is somewhat troublesome, but when producing 55 inches of plank, it is necessary to change
55 inches of backing plate, difficulty are multiplied, and change the time of backing plate, can increase by 150%~200%, have a strong impact on production efficiency.
Method three：Do not covered for plank and vacuumize region, blocked with article, conventional is to cut the used film.
This method very economical material benefit, but it is pretty troublesome, and different size of pcb board is, it is necessary to the film be cut into different sizes, for a long time
Get off, the film accumulation after the cutting of board producing region can be caused, the size for finding needs also bothers.
As can be seen here, generally use changes the suitable sucker of size in the prior art or searching shape size is suitably useless
The film is abandoned to block the mode of air leakage point, can all substantially reduce production efficiency.
In addition, in PCB factories, large-sized plank such as 52*40 inches is very big, carries trouble, it is possible to cause plank
Generation partial loop variation；When plank is very thin, plank can typically be broken manually flat；Plank is thicker, such as more than 3mm, after deformation
Recover relatively difficult.In addition, when actual exposure produces, substrate is to be positioned over by artificial dragging on sucker, during this not
It may accomplish completely accurately, more or less all can have an anglec of rotation with electronics shelves image, can so be made in actual exposure
The problems such as into image offset；3rd, in conventional exposure, CCD camera crawl sub- 4 hole positions in periphery of pcb board, according to 4 hole positions, lead to
Cross CCD camera and find most clear focal plane, determine optimal focal plane and exposure focal length, complete to focus on, will be burnt with this in exposure process
It is exposed on the basis of face, still, in practical situations both, plank will not be in preferable horizontal plane state, can in some regions
It is able to can produce raised or recessed, whole substrate is in placement process it is possible that tilting, these situations can cause some regions
Focused during exposure inaccurate, have a strong impact on the quality of production.
To sum up, current DMD structure laser direct-writing exposure machine presence can not produce super large plate, vacuum cup gas leakage, exposure
During focusing and the problems such as position inaccurate it is urgently to be resolved hurrily.
The content of the invention
For problem above, the DMD structure multiaxises the invention provides vacuum cup and containing the vacuum cup may move
Light path direct write exposure machine, focusing and positioning in super large plate, vacuum cup gas leakage, exposure process can not be produced to solve prior art
The problems such as inaccurate.
First purpose of the present invention is to provide a kind of vacuum cup, the vacuum cup, including suction cup main body and vacuum
Generating means；A number of stomata, each each one relay of correspondence in promoting the circulation of qi hole are distributed in suction cup main body in terms of rows and columns
Device, each row stomata also each one relay of correspondence；Air vent switch is each connected between stomata and vacuum generating device；Stomata
The relay and the relay of the stomata column that switch is expert at the stomata simultaneously are connected.
In one embodiment of the invention, the air vent switch is located at the vacuum that stomata is connected with vacuum generating device
On pipeline.
In one embodiment of the invention, the relay is electromagnetic switch.
In one embodiment of the invention, the air vent switch is connected with master control device.
In one embodiment of the invention, the stomata is in middle thin, four careful distribution shapes in suction cup main body
Formula.
In one embodiment of the invention, the line space of the stomata and column pitch are by suction cup main body centre to both sides
In the form of uniformly successively decreasing.
In one embodiment of the invention, positioned at suction cup main body central region stomata line space or column pitch most
Greatly 1-3 inches, positioned at the minimum 5-8mm of line space or column pitch of the stomata of suction cup main body fringe region.
In one embodiment of the invention, positioned at suction cup main body central region stomata line space or column pitch most
Greatly 0.5-3.5 inches, positioned at the minimum 3-6mm of line space or column pitch of the stomata of suction cup main body fringe region.
In one embodiment of the invention, opening shape of the stomata in suction cup main body can be circular, ellipse
The arbitrary shape such as circle, square, rectangle, for example, it is circular.Using square or rectangular opening shape, its opening edge
The linear shape of edge, it is easier to being equally that the substrate edges that edge is linear agree with.
In one embodiment of the invention, aperture area of the stomata in suction cup main body is 10mm2~
500mm2。
In one embodiment of the invention, the Breadth Maximum of the suction cup main body is 55 inches.
In one embodiment of the invention, the card of the suction cup main body is integral card or by polylith card group
Conjunction forms.
In one embodiment of the invention, the card of the suction cup main body is formed by two pieces of big disk assembleds of grade.
In one embodiment of the invention, the suction cup main body can be divided into chuck support structure and backing plate, also may be used
With the integral structure that to be backing plate be integrated with chuck support structure.When suction cup main body is that chuck support structure and backing plate separate
Structure when, backing plate is arranged on chuck support structure surface, and pad surfaces are designed with equally distributed stomata, be below backing plate with
The vacuum air-channel of stomata connection.
Second object of the present invention is to provide the device of the vacuum cup containing the present invention.
In one embodiment of the invention, described device can be various types of exposure machines.
The removable light path of DMD structures multiaxis that third object of the present invention is to provide the vacuum cup containing the present invention is straight
Write exposure machine.
In one embodiment of the invention, the DMD structures multiaxis, which may move light path direct write exposure machine, also includes branch
Support structure, DMD structures, DMD structure steppings axle, multiple moving parts；Each moving parts include a scanning Y-axis and one rises
Z axis drops；Vacuum cup is located above moving parts.
In the present invention, multiaxis refers to there are two or more moving parts, and moving parts are by a scanning Y-axis and a lifting Z
Axle forms；It is removable, refer to that DMD structures can move with the sliding block of DMD structure stepping axles along guide rail；It is the multiple, refer to
Two or more, including two.
In one embodiment of the invention, it is DMD structures that the DMD structures multiaxis, which may move light path direct write exposure machine,
Twin shaft may move light path direct write exposure machine, contain two moving parts.
In one embodiment of the invention, the scanning Y-axis is below lifting Z axis；
In one embodiment of the invention, the lifting Z axis connection of the vacuum cup and moving parts.
In one embodiment of the invention, it is set up in parallel between the multiple moving parts along X-direction.
In one embodiment of the invention, the number of the multiple moving parts is two.
In one embodiment of the invention, the card of the suction cup main body of the vacuum cup be integral card or by
Polylith disk assembled forms.When being formed by polylith disk assembled, every piece of card corresponds to one or more moving parts.
In one embodiment of the invention, the suction cup main body of the vacuum cup is by the size identical disk of left and right two
Face, which merges, to be formed；Each corresponding moving parts of card.
In one embodiment of the invention, any connection is not taken between described two cards, or using ball pivot
Chain structure connects, or using Hard link.
In one embodiment of the invention, the supporting construction is gantry structure.
In one embodiment of the invention, the DMD structures are arranged on DMD structure stepping axles, can be tied with DMD
The sliding block of structure stepping axle moves along guide rail.
Fourth object of the present invention is to provide a kind of subregion contraposition focus method, especially vacuum cup of the invention
DMD structures multiaxis may move a kind of subregion contraposition focus method of light path direct write exposure machine, to solve in production process due to putting
The problem of positioning caused by the inaccurate deformation with plank of plate is forbidden and focusing is forbidden.
The subregion contraposition focus method of the present invention, i.e. 4 subregions focus on automatically and localization method, comprise the following steps：
(1) before exposure, after the coordinate of the positioning hole at four angles of CCD camera crawl pcb board, with electronics shelves graphic file
In corresponding positioning hole coordinate be compared, establish the actual corresponding relation of electronics shelves figure and pcb board；If CCD camera
The positioning hole coordinate of crawl is consistent with corresponding coordinate in electronics shelves graphic file, then carries out step (2)；If CCD camera
The positioning hole coordinate of crawl and corresponding coordinate in electronics shelves graphic file are inconsistent, then are adjusted electronics shelves graphic file
Whole to be allowed to be consistent with the positioning hole coordinate of CCD camera crawl, the original position of light path exposure also determines therewith, continues
Step (2)；
(2) before exposure, it is M × N number of subregion by region division to be exposed；
(3) the optimal focal plane distance per four summits of sub-regions is calculated respectively；If the optimal focal plane on this four summits
The maximum difference of distance is then used as this within the error range of permission using the average value of the optimal focal plane distance on this four summits
The focal plane distance of subregion exposure；If the maximum difference of the optimal focal plane distance on this four summits is not in the error range of permission
Within, then the subregion is further subdivided into A × B two level subregion, calculates the optimal of each four summits of two level subregion
Focal plane distance, repeats this step, until the optimal focal plane distance in per sub-regions is in error range.
In one embodiment of the invention, light path exposes since original position, into different subregions at different levels
When, if optimal focal plane distance is different, the optimum exposure focal plane of the subregion will be arrived by lifting Z axis adjustment height, so as to protect
Demonstrate,prove all exposure areas to expose in optimal focal plane, ensure that the line width uniformity of whole plate, and exposure quality.
In one embodiment of the invention, the determination method of the optimal focal plane is：PCB is identified using CCD camera
The aperture in the hole on plate, if the aperture recognized and the aperture of reality are inconsistent, by changing the height of lifting Z axis, phase up and down
The diameter of machine ceaselessly identifying hole, find out after lifting Z axis moves complete stroke, it is high closest to the lifting shaft corresponding to actual diameter
Degree, this height is exactly optimal focal plane corresponding to the hole.
Advantages of the present invention and effect：
(1) DMD structures multiaxis of the invention may move light path direct write exposure machine, and mainly vacuum cup structure is changed
Enter.The vacuum cup of the present invention is the vacuum cup of automation, and chuck surface is distributed with a series of stomata, had above stomata
When pcb board covers, stomata closed-circuit working, when there is no pcb board covering above stomata, stomata closure, it is small to efficiently solve production
During plate, caused by due to gas leakage the problem of suction deficiency.Further, the gas cell distribution on sucker for it is middle dredge, it is four careful,
Both so that different size of pcb board is when placing, there is stomata marginal portion all the time, effectively prevents the problem of board edge tilts,
The place of too many stomata can not be needed to save stomata quantity in centre again, reduce cost, improve efficiency.
(2) DMD structures multiaxis of the invention may move light path direct write exposure machine, and exposure machine sucker width can be arranged to 55
Inch, can produce 55 inches of super large plate, at the same and can ensure high accuracy, high density, fine rule away from etc. demand；And connect below sucker
Multigroup moving parts are connect, the kinematic axis of multigroup moving parts is synchronized with the movement, and improves exposure accuracy and the stability of operation, exposure
For line spacing up to less than 30 microns, ill-exposed rate drops to less than 0.1%.
(3) subregion contraposition focus method provided by the invention, before pcb board exposure, 4 subregions is carried out and focuses on and determines
Position, it can be ensured that image exposure position is accurate, can control bit errors below 12 microns, image exposure understands.
(4) DMD structures multiaxis of the invention may move light path direct write exposure machine, drive of the DMD structures in DMD structure stepping axles
Under dynamic, it can in transverse direction move freely, extend horizontal exposure range, the flexible property of exposure be increased, not by stepping
On the moving parts that axle is arranged below, avoid when doing more physical exercises component while moving, the motion being likely to occur in transverse direction is not
Stationary problem, avoiding may bring exposure inaccurate, or even the situation of product rejection occurs；Using doing more physical exercises, component designs,
Vacuum cup is possessed multiple strong points, sucker is had more preferable stability in motion process, while avoid unimodule from supporting
The unstable problem of connection being likely to occur during larger sucker.
Brief description of the drawings
Fig. 1 is the vacuum cup structural representation of the present invention；Wherein, 1 suction cup main body, 3 stomatas, 4 relays, 6 master controls
Device；
Fig. 2 is the vacuum generating device and stomata connection diagram of the vacuum cup of the present invention；Wherein, 2 vacuum fill
Put, 5 air vent switch；
Fig. 3 is that traditional vacuum cup places the structural representation after substrate；Wherein, 14 substrate；
Fig. 4 is that the vacuum cup of the present invention places a kind of structural representation after substrate；
Fig. 5 is a kind of structural representation after the substrate position on the vacuum cup of the adjustment present invention；
Fig. 6 is that the DMD structures twin shaft of the vacuum cup containing the present invention may move light path direct write exposure machine；Wherein, 7 support
Structure, 8DMD structures, 9DMD structure steppings axle, 10 vacuum cups；12 scanning Y-axis, 13 lifting Z axis；
Fig. 7 is image corresponding relation schematic diagram before contraposition；
Fig. 8 is image corresponding relation schematic diagram after contraposition；
Fig. 9 is subregion Focus Exposure region division schematic diagram；
Figure 10 is to repartition to divide schematic diagram behind exposure area.
Specific embodiment
DMD structures：A whole set of complete light path system using DMD as core devices, including LASER Light Source, DMD, optical frames
The parts such as piece form.
PCB：Printed Circuit Board, printed circuit board (PCB), are important electronic units, are electronic components
Supporter, it is the carrier of electronic component electrical connection.
Stepping axle：Light path is arranged on the motion parts of motor, for doing step motion.
Scan Y-axis：Also scan axis or Y-axis are, for doing the continuous scanning motion of constant speed.
Lift Z axis：Also lifting shaft or Z axis are, for controlling the lifting of sucker.
Sucker：For adsorbing, the objective table of fixed pcb board.
Here is that the present invention is specifically described.
Embodiment 1：Vacuum cup
The vacuum cup structure of the present invention is as shown in Figure 1-2.
Vacuum cup of the present invention, including suction cup main body 1 and vacuum generating device 2；In suction cup main body 1 in terms of rows and columns
It is distributed a number of stomata 3, each each one relay 4 of correspondence in promoting the circulation of qi hole 3, each row stomata also each one relay of correspondence
Device；Air vent switch 5 is each connected between stomata 3 and vacuum generating device 2；What air vent switch 5 was expert at the stomata simultaneously
Relay connects with the relay of the stomata column.
Each relay is connected with master control device 6.Air vent switch is located at the vacuum tube that stomata is connected with vacuum generating device
Lu Shang.The air vent switch can be electromagnetic switch.The stomata, can be uniformly distributed in suction cup main body.
Using such structure and connected mode, when vacuum cup works, a certain size substrate is placed on vacuum suction
On disk, for the stomata row or stomata row for thering is substrate to cover, the relay path corresponding to the row or column；For certain stomata
Speech, only when it is expert at and column corresponding to relay all make for path, the air vent switch of the stomata is just opened, and then
Vacuum generating device and stomata UNICOM, stomata work.It is not closing by the air vent switch of substrate covering in the case of this
State, so as to solve it is larger produce PCB using vacuum cup when existing leakage problem.
Embodiment 2：Vacuum cup
The vacuum cup of the present embodiment, it is made that and changes on the basis of the vacuum cup as shown in Figure 1-2 of embodiment 1
Enter.
The stomata 3 is in suction cup main body 1 in middle thin, four careful distribution forms.
Traditional vacuum cup, stomata is usually to use equally distributed form, may when producing less pcb board
After substrate 14 is placed in suction cup main body, the lucky position in certain edge where substrate far from both sides stomata farther out (as shown in Figure 3) so that
Cause the marginal portion to be tilted because there is no pull of vacuum, production is impacted.Dredged using this centre of the present invention, four
After careful distribution form, as illustrated in figures 4-5, when smaller substrate is placed on vacuum cup, select substrate close to sucker
Body rim is placed, now if the substrate edges of intermediate region are just from both sides stomata farther out in the suction cup main body, then
It can select the substrate edges being moved in nearest a line or a row stomata and be allowed to cover just；Due to suction cup main body
Surrounding stomata is closeer, and this movement will not cause phenomenon of another lateral edges of substrate from stomata farther out.
Alternatively, the line space of the stomata and column pitch by among suction cup main body to both sides in the form of uniformly successively decreasing.
Alternatively, positioned at suction cup main body central region stomata line space or column pitch be up to 1-3 inches, positioned at suction
The minimum 5-8mm of line space or column pitch of the stomata of disc main body fringe region.Opening shape of the stomata in suction cup main body can
To be the arbitrary shapes such as circle, ellipse, square, rectangle, for example, it is circular.Opening surface of the stomata in suction cup main body
Product can be arbitrary, such as 10mm2~500mm2。
Alternatively, the card of the suction cup main body is integral card or formed by polylith disk assembled.
Embodiment 3：DMD structures twin shaft may move light path direct write exposure machine
It is illustrated so that the DMD structures twin shaft containing two moving parts may move light path direct write exposure machine as an example.
As shown in fig. 6, it may move light path direct write exposure machine for the DMD structures twin shaft of the vacuum cup containing the present invention.
The DMD structures twin shaft, which may move light path direct write exposure machine, includes supporting construction 7, DMD structures 8, DMD structure steppings
9, one, axle or moving parts, vacuum cup 10；Each moving parts are by a scanning Y-axis 12 and 13 groups of a Z axis of lifting
Into；Vacuum cup 10 is located above moving parts.
The DMD structures 8 are arranged on DMD structure steppings axle 9, can be as the sliding block of DMD structure steppings axle 9 is along guide rail
Motion.The scanning Y-axis 12 is positioned at the lower section of lifting Z axis 13；The vacuum cup 10 is connected with the lifting Z axis 13 of moving parts.
Vacuum cup, with scan Y-axis, lift Z axis 13 movement and corresponding change in location occurs.
Alternatively, the card of the suction cup main body of the vacuum cup is integral card.
Alternatively, it is set up in parallel between the multiple moving parts along X-direction, is uniformly distributed and is installed on vacuum cup 10
Lower section.By setting multiple moving parts, when producing larger pcb board, run simultaneously between each component, with single moving parts
Compare, it is ensured that more preferable stability.
Alternatively, the multiple moving parts have 2.
Alternatively, the supporting construction is gantry structure.Framework for whole system supports, marble gantry structure
Design feature can be very good to keep the stability of platform motion, and have good isolation property.
Embodiment 4：DMD structures twin shaft may move light path direct write exposure machine
It is illustrated so that the DMD structures twin shaft containing two moving parts may move light path direct write exposure machine as an example.
The DMD structures twin shaft of the present embodiment may move light path direct write exposure machine, is made that and changes on the basis of embodiment 3
Enter.
The card of the suction cup main body of the vacuum cup is formed by polylith disk assembled；Corresponding one or more of every piece of card
Individual moving parts.
Alternatively, the suction cup main body of the vacuum cup is merged by the size identical card of left and right two and formed；Each disk
The corresponding moving parts in face.
Any connection is not taken between two cards of the composition suction cup main body, or is connected using ball pivot chain structure,
Or using Hard link.
To produce the pcb board of 55*40 inches, limited because domestic processing technology is horizontal, can not produce that precision is high, area is big
Sucker, therefore can only take the mode of two pieces of sucker card splicings.In the present invention, two pieces of left and right sucker, respectively with some numbers
The screw of amount is fixed on corresponding Z axis mounting surface, and then the connected mode between two pieces of suckers, can there is following 3 kinds：
(1) any connection is not taken between sucker, the simple precision for relying on the Y-axis of platform courses two.Advantage be it is simple in construction,
It is economical and practical, when producing less than 24 inches of plank, it is only necessary to expose a sucker scope, it is not necessary to which two suckers are all
It is exposed, production plank size is more flexible, closer to client's use demand.
(2) connected between sucker using ball pivot chain structure, two sucker Z-directions can have the inconsistent situation of slight height, Y
Uniformity is realized by platform courses in the motion process of direction.Advantage is unlocked once there is some Y-axis, passes through the company of two suckers
Connect, another Y-axis can be driven to unlock, effectively avoid the damage of plank.Because two Z axis difference in height conventional methods can not be surveyed accurately
It is poor more or less all to have certain altitude to micron level for amount.This method can effectively reduce that Z axis is highly inconsistent to be caused
Situations such as stuck during existing Z axis motion；
(3) Hard link is used between sucker, i.e., is fixed two suckers with modes such as screws.Advantage is that whether Y-axis is dashed forward
So power-off, or Z axis are highly inconsistent, are scrapped all without plank is caused.
Above-mentioned three kinds of connection methods, according to actual conditions one way in which can be selected to be attached.
Embodiment 5：Picture portion aligns and focus method
In traditional exposure process, position is there may be when PCB substrate is placed on vacuum cup and puts not positive ask
Topic, if as shown in fig. 7, directly the actual figure being exposed in PCB substrate on electronics shelves graph exposure to substrate, will be may result in
Shape and electronics shelves figure are inconsistent, so as to cause plank quality bad or scrap.In addition, in traditional exposure process, entirely
Substrate is exposed using same focal plane distance, is adjusted without focusing；But in practical situations both, substrate will not
In preferable horizontal plane state, raised or recessed, whole substrate possibility in placement process may be produced in some regions
Inclination occurs, it is inaccurate that these situations can cause some regions to be focused when exposing, and has a strong impact on the quality of production.
The subregion contraposition focus method of the present invention, i.e. 4 subregions focus on automatically and localization method, as is seen in figs 7-10, bag
Include following steps：
(1) before exposure, after the coordinate of the positioning hole at four angles of CCD camera crawl pcb board, with electronics shelves graphic file
In corresponding positioning hole coordinate be compared, establish the actual corresponding relation of electronics shelves figure and pcb board；If CCD camera
The positioning hole coordinate of crawl is consistent with corresponding coordinate in electronics shelves graphic file, then carries out step (2)；If CCD camera
The positioning hole coordinate of crawl and corresponding coordinate in electronics shelves graphic file are inconsistent, then are adjusted electronics shelves graphic file
Whole to be allowed to be consistent with the positioning hole coordinate of CCD camera crawl, the original position of light path exposure also determines therewith, continues
Step (2)；
(2) before exposure, it is M × N number of subregion by region division to be exposed；
(3) the optimal focal plane distance per four summits of sub-regions is calculated respectively；If the optimal focal plane on this four summits
The maximum difference of distance is then used as this within the error range of permission using the average value of the optimal focal plane distance on this four summits
The focal plane distance of subregion exposure；If the maximum difference of the optimal focal plane distance on this four summits is not in the error range of permission
Within, then the subregion is further subdivided into A × B two level subregion, calculates the optimal of each four summits of two level subregion
Focal plane distance, repeats this step, until the optimal focal plane distance in per sub-regions is in error range.
Light path exposes since original position,, will if optimal focal plane distance is different during into different subregions at different levels
The optimum exposure focal plane of the subregion is arrived by lifting Z axis adjustment height, so as to ensure all exposure areas in optimal focal plane
Exposure, ensure that the line width uniformity of whole plate, and exposure quality.
The determination method of the optimal focal plane is：Using the aperture in the hole on CCD camera identification pcb board, if recognize
Aperture and the aperture of reality are inconsistent, by changing the height of lifting Z axis up and down, the diameter of camera ceaselessly identifying hole, find out
Lift after Z axis moves complete stroke, closest to the lifting shaft height corresponding to actual diameter, this height be exactly corresponding to the hole most
Good focal plane.
Although the present invention is disclosed as above with preferred embodiment, it is not limited to the present invention, any to be familiar with this skill
The people of art, without departing from the spirit and scope of the present invention, it can all do various change and modification, therefore the protection model of the present invention
Enclose being defined of being defined by claims.
Claims (6)
1. a kind of DMD structures multiaxis may move light path direct write exposure machine, it is characterised in that the DMD structures multiaxis may move light
Road direct write exposure machine includes supporting construction, DMD structures, DMD structure steppings axle, multiple moving parts, vacuum cup；Each motion
Component includes a scanning Y-axis and a lifting Z axis；Vacuum cup is located above moving parts；
The vacuum cup includes suction cup main body and vacuum generating device；A fixed number is distributed in suction cup main body in terms of rows and columns
The stomata of amount, each each one relay of correspondence in promoting the circulation of qi hole, each row stomata also each one relay of correspondence；Each stomata with it is true
Air vent switch is connected between empty generating means；The relay and the stomata column that air vent switch is expert at the stomata simultaneously
Relay connection, the air vent switch is located on the vacuum line that stomata is connected with vacuum generating device；
For the stomata in middle thin, four careful distribution forms in suction cup main body, the opening shape of stomata is square or long
Square, the card of the suction cup main body is integral card or formed by polylith disk assembled.
2. DMD structures multiaxis according to claim 1 may move light path direct write exposure machine, it is characterised in that positioned at sucker
The line space or column pitch of the stomata of main body central region are up to 0.5-3.5 inches, positioned at the gas of suction cup main body fringe region
The minimum 3-6mm of line space or column pitch in hole.
3. DMD structures multiaxis according to claim 1 may move light path direct write exposure machine, it is characterised in that the multiple
It is set up in parallel between moving parts along X-direction.
4. DMD structures multiaxis according to claim 1 may move light path direct write exposure machine, it is characterised in that the vacuum
The suction cup main body of sucker is merged by the size identical card of left and right two to be formed；Each corresponding moving parts of card.
5. DMD structures multiaxis according to claim 4 may move light path direct write exposure machine, it is characterised in that described two
Any connection is not taken between card, either using the connection of ball pivot chain structure or using Hard link.
6. the subregion contraposition that a kind of any described DMD structures multiaxises of claim 1-5 may move light path direct write exposure machine focuses on
Method, it is characterised in that the described method comprises the following steps：
(1) before exposure, after the coordinate of the positioning hole at four angles of CCD camera crawl pcb board, with phase in electronics shelves graphic file
Corresponding positioning hole coordinate is compared, and establishes the actual corresponding relation of electronics shelves figure and pcb board；If CCD camera captures
Positioning hole coordinate it is consistent with corresponding coordinate in electronics shelves graphic file, then carry out step (2)；If CCD camera captures
Positioning hole coordinate and corresponding coordinate in electronics shelves graphic file it is inconsistent, then being adjusted electronics shelves graphic file makes
With CCD camera crawl positioning hole coordinate be consistent, light path exposure original position also determine therewith, continue step
(2)；
(2) before exposure, it is M × N number of subregion by region division to be exposed；
(3) the optimal focal plane distance per four summits of sub-regions is calculated respectively；If the optimal focal plane distance on this four summits
Maximum difference within the error range of permission, then the sub-district is used as using the average value of the optimal focal plane distance on this four summits
The focal plane distance of domain exposure；If the maximum difference of the optimal focal plane distance on this four summits not permission error range it
It is interior, then the subregion is further subdivided into A × B two level subregion, calculates optimal Jiao on each four summits of two level subregion
Identity distance is from repeating this step, until per the optimal focal plane distance in sub-regions in error range.
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| CN107024842B (en) * | 2017-06-16 | 2018-11-13 | 深圳市前海野马自动化设备有限公司 | A kind of automatic contraposition device and exposure sources and its exposure method |
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| CN206331230U (en) * | 2016-11-22 | 2017-07-14 | 江苏影速光电技术有限公司 | A kind of DMD structures multiaxis may move light path direct write exposure machine |
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| US20060032037A1 (en) * | 2004-08-13 | 2006-02-16 | Dar-Wen Lo | [assembling method and device thereof] |
| KR20140127438A (en) * | 2013-04-24 | 2014-11-04 | 삼성디스플레이 주식회사 | Substrate absorption device |
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| CN104137247A (en) * | 2012-02-28 | 2014-11-05 | 炭研轴封精工有限公司 | Non-contact suction plate |
| CN103545174A (en) * | 2012-07-16 | 2014-01-29 | 无锡华润上华科技有限公司 | Photoetching focusing parameter testing method and system |
| CN103869627A (en) * | 2012-12-11 | 2014-06-18 | 上海微电子装备有限公司 | Focusing and leveling method used for projection photoetching machine |
| CN105182699A (en) * | 2015-09-30 | 2015-12-23 | 合肥芯碁微电子装备有限公司 | Double-mesa laser direct writing exposure machine and control method therefor |
| CN206331230U (en) * | 2016-11-22 | 2017-07-14 | 江苏影速光电技术有限公司 | A kind of DMD structures multiaxis may move light path direct write exposure machine |
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Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221300 Huashan Road, Pizhou Economic Development Zone, Jiangsu, China, Xuzhou Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |