TWI424270B - 正型感光性樹脂組成物及所得層間絕緣膜以及微透鏡 - Google Patents

正型感光性樹脂組成物及所得層間絕緣膜以及微透鏡 Download PDF

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Publication number
TWI424270B
TWI424270B TW94116954A TW94116954A TWI424270B TW I424270 B TWI424270 B TW I424270B TW 94116954 A TW94116954 A TW 94116954A TW 94116954 A TW94116954 A TW 94116954A TW I424270 B TWI424270 B TW I424270B
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
ethyl
positive photosensitive
component
Prior art date
Application number
TW94116954A
Other languages
English (en)
Chinese (zh)
Other versions
TW200604738A (en
Inventor
Yosuke Iinuma
Shinsuke Tuji
Tadashi Hatanaka
Original Assignee
Nissan Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Ind Ltd filed Critical Nissan Chemical Ind Ltd
Publication of TW200604738A publication Critical patent/TW200604738A/zh
Application granted granted Critical
Publication of TWI424270B publication Critical patent/TWI424270B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW94116954A 2004-05-26 2005-05-24 正型感光性樹脂組成物及所得層間絕緣膜以及微透鏡 TWI424270B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004155586 2004-05-26
JP2005124897 2005-04-22

Publications (2)

Publication Number Publication Date
TW200604738A TW200604738A (en) 2006-02-01
TWI424270B true TWI424270B (zh) 2014-01-21

Family

ID=35451029

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94116954A TWI424270B (zh) 2004-05-26 2005-05-24 正型感光性樹脂組成物及所得層間絕緣膜以及微透鏡

Country Status (5)

Country Link
JP (1) JP4509107B2 (ja)
KR (1) KR101229381B1 (ja)
CN (1) CN1954264B (ja)
TW (1) TWI424270B (ja)
WO (1) WO2005116764A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8828651B2 (en) 2005-07-25 2014-09-09 Nissan Chemical Industries, Ltd. Positive-type photosensitive resin composition and cured film manufactured therefrom
KR101401564B1 (ko) 2007-01-22 2014-06-03 닛산 가가쿠 고교 가부시키 가이샤 포지티브형 감광성 수지조성물
CN101669069B (zh) * 2007-05-17 2013-03-20 日产化学工业株式会社 感光性树脂和微透镜的制造方法
EP2302456B1 (en) * 2008-07-16 2015-09-02 Nissan Chemical Industries, Ltd. Positive resist composition;patttern forming method; microlens and planarization film therefrom; solid-state imaging device, liquid crystal display device and led display device comprising the same
US8993699B2 (en) 2009-08-24 2015-03-31 Nissan Chemical Industries, Ltd. Photosensitive resin composition for microlens
US8674043B2 (en) 2009-09-14 2014-03-18 Nissan Chemical Industries, Ltd. Photosensitive resin composition containing copolymer
JP6397697B2 (ja) * 2014-08-27 2018-09-26 東京応化工業株式会社 層間絶縁膜形成用感光性樹脂組成物、層間絶縁膜及び層間絶縁膜の形成方法
WO2016088757A1 (ja) * 2014-12-04 2016-06-09 日産化学工業株式会社 ポジ型感光性樹脂組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003195501A (ja) * 2001-12-26 2003-07-09 Fujifilm Arch Co Ltd ポジ型感光性樹脂組成物
TW574615B (en) * 2001-09-27 2004-02-01 Clariant Int Ltd Photosensitive resin composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3209754B2 (ja) * 1991-02-28 2001-09-17 ジェイエスアール株式会社 感放射線性樹脂組成物
JP2811663B2 (ja) * 1991-06-12 1998-10-15 ジェイエスアール株式会社 感放射線性樹脂組成物
JP3271378B2 (ja) * 1993-07-07 2002-04-02 ジェイエスアール株式会社 感放射線性樹脂組成物
JPH07281428A (ja) * 1994-04-07 1995-10-27 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP3966282B2 (ja) * 2002-04-18 2007-08-29 日産化学工業株式会社 ポジ型感光性樹脂組成物およびパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW574615B (en) * 2001-09-27 2004-02-01 Clariant Int Ltd Photosensitive resin composition
JP2003195501A (ja) * 2001-12-26 2003-07-09 Fujifilm Arch Co Ltd ポジ型感光性樹脂組成物

Also Published As

Publication number Publication date
KR101229381B1 (ko) 2013-02-05
JPWO2005116764A1 (ja) 2008-04-03
CN1954264A (zh) 2007-04-25
CN1954264B (zh) 2012-03-21
KR20070022108A (ko) 2007-02-23
JP4509107B2 (ja) 2010-07-21
TW200604738A (en) 2006-02-01
WO2005116764A1 (ja) 2005-12-08

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