TWI421643B - A light source device and an exposure device using the same - Google Patents

A light source device and an exposure device using the same Download PDF

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Publication number
TWI421643B
TWI421643B TW096130174A TW96130174A TWI421643B TW I421643 B TWI421643 B TW I421643B TW 096130174 A TW096130174 A TW 096130174A TW 96130174 A TW96130174 A TW 96130174A TW I421643 B TWI421643 B TW I421643B
Authority
TW
Taiwan
Prior art keywords
illuminance
light
light source
source device
discharge lamp
Prior art date
Application number
TW096130174A
Other languages
English (en)
Chinese (zh)
Other versions
TW200839454A (en
Inventor
Tetsuya Shirai
Yoshihiko Seiki
Atsuji Nakagawa
Original Assignee
Phoenix Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Phoenix Electric Co Ltd filed Critical Phoenix Electric Co Ltd
Publication of TW200839454A publication Critical patent/TW200839454A/zh
Application granted granted Critical
Publication of TWI421643B publication Critical patent/TWI421643B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/40—Control techniques providing energy savings, e.g. smart controller or presence detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096130174A 2007-03-26 2007-08-15 A light source device and an exposure device using the same TWI421643B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007079179A JP4937808B2 (ja) 2007-03-26 2007-03-26 光源装置ならびにこれを用いた露光装置

Publications (2)

Publication Number Publication Date
TW200839454A TW200839454A (en) 2008-10-01
TWI421643B true TWI421643B (zh) 2014-01-01

Family

ID=39913351

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096130174A TWI421643B (zh) 2007-03-26 2007-08-15 A light source device and an exposure device using the same

Country Status (4)

Country Link
JP (1) JP4937808B2 (ko)
KR (1) KR101314559B1 (ko)
CN (1) CN101277566B (ko)
TW (1) TWI421643B (ko)

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KR101725542B1 (ko) * 2009-04-09 2017-04-10 가부시키가이샤 브이 테크놀로지 노광 장치용 광 조사 장치 및 그 점등 제어 방법, 그리고 노광 장치 및 기판
JP5355261B2 (ja) * 2009-07-07 2013-11-27 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の露光光形成方法、及び表示用パネル基板の製造方法
JP5281987B2 (ja) * 2009-08-26 2013-09-04 株式会社日立ハイテクノロジーズ 露光装置およびそれを用いた露光方法並びに表示用パネル基板の製造方法
JP5674195B2 (ja) * 2010-01-14 2015-02-25 Ｎｓｋテクノロジー株式会社 露光装置及び露光方法
CN102369484B (zh) * 2010-02-05 2015-05-20 恩斯克科技有限公司 曝光装置用照光装置及其亮灯控制方法、以及曝光装置、曝光方法及基板
JPWO2011105461A1 (ja) * 2010-02-24 2013-06-20 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、露光装置、露光方法、基板の製造方法、マスク、及び被露光基板
WO2012011497A1 (ja) * 2010-07-22 2012-01-26 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法
JP5799306B2 (ja) * 2010-07-22 2015-10-21 株式会社ブイ・テクノロジー 露光装置用光照射装置の制御方法、及び露光方法
CN102483587B (zh) * 2010-07-22 2014-11-05 恩斯克科技有限公司 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法
US9041993B2 (en) 2010-07-26 2015-05-26 Lg Chem, Ltd. Mask
TWI463272B (zh) * 2010-11-30 2014-12-01 Ushio Electric Inc Light irradiation device
CN102098839B (zh) * 2010-12-29 2013-09-11 东北大学 机场航站楼照明节能控制系统
US20130207544A1 (en) 2011-09-30 2013-08-15 Pinebrook Imaging Technology, Ltd. Illumination system
US9140979B2 (en) 2011-12-01 2015-09-22 Lg Chem, Ltd. Mask
KR101260221B1 (ko) * 2011-12-01 2013-05-06 주식회사 엘지화학 마스크
TWI609247B (zh) * 2013-04-09 2017-12-21 Orc Manufacturing Co Ltd Light source apparatus and exposure apparatus including the light source apparatus
CN105045043B (zh) * 2014-04-28 2018-01-05 株式会社V技术 曝光装置和曝光方法
JP5869713B1 (ja) * 2015-04-13 2016-02-24 フェニックス電機株式会社 光源装置及び露光装置とその検査方法
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
CN111033385B (zh) * 2017-08-23 2022-09-13 凤凰电机公司 光源装置、曝光装置以及光源装置的判定方法
WO2019111769A1 (ja) * 2017-12-08 2019-06-13 フェニックス電機株式会社 ランプの点灯方法
CN111965946A (zh) * 2020-08-13 2020-11-20 Tcl华星光电技术有限公司 光刻用照光装置及自动调整其照度的方法
CN117157589A (zh) * 2021-04-16 2023-12-01 凤凰电机公司 曝光用光源、光照射装置、曝光装置、以及曝光方法
WO2022220229A1 (ja) * 2021-04-16 2022-10-20 フェニックス電機株式会社 露光用光源、光照射装置、露光装置、および露光方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200307855A (en) * 2002-05-31 2003-12-16 Ushio Electric Inc Lamp lighting controlling apparatus and light emitting apparatus
JP2004361746A (ja) * 2003-06-05 2004-12-24 Mejiro Genossen:Kk 露光用照明装置

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JPH05127086A (ja) * 1991-11-01 1993-05-25 Matsushita Electric Ind Co Ltd 光強度の均一化方法およびそれを用いた露光装置
KR100205518B1 (ko) * 1996-08-31 1999-07-01 구자홍 노광장치 및 노광방법
KR20010068399A (ko) * 2000-01-05 2001-07-23 김영남 노광대 조도 제어장치
JP2002174551A (ja) 2000-12-05 2002-06-21 Oyo Denki Kk 照度校正システム
JP2005227465A (ja) * 2004-02-12 2005-08-25 Mejiro Genossen:Kk 照明光学系の使用方法及びフラットパネルディスプレイの製造方法
JP4495019B2 (ja) * 2005-03-28 2010-06-30 東レエンジニアリング株式会社 周辺露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200307855A (en) * 2002-05-31 2003-12-16 Ushio Electric Inc Lamp lighting controlling apparatus and light emitting apparatus
JP2004361746A (ja) * 2003-06-05 2004-12-24 Mejiro Genossen:Kk 露光用照明装置

Also Published As

Publication number Publication date
CN101277566B (zh) 2012-07-18
JP4937808B2 (ja) 2012-05-23
KR101314559B1 (ko) 2013-10-07
CN101277566A (zh) 2008-10-01
JP2008241877A (ja) 2008-10-09
TW200839454A (en) 2008-10-01
KR20080087630A (ko) 2008-10-01

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