CN101277566B - 光源装置以及使用该光源装置的曝光装置 - Google Patents

光源装置以及使用该光源装置的曝光装置 Download PDF

Info

Publication number
CN101277566B
CN101277566B CN2007101489335A CN200710148933A CN101277566B CN 101277566 B CN101277566 B CN 101277566B CN 2007101489335 A CN2007101489335 A CN 2007101489335A CN 200710148933 A CN200710148933 A CN 200710148933A CN 101277566 B CN101277566 B CN 101277566B
Authority
CN
China
Prior art keywords
light
discharge lamp
illumination
mentioned
supply apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2007101489335A
Other languages
English (en)
Chinese (zh)
Other versions
CN101277566A (zh
Inventor
白井哲也
清木芳彦
中川敦二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Phoenix Electric Co Ltd
Original Assignee
Phoenix Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Phoenix Electric Co Ltd filed Critical Phoenix Electric Co Ltd
Publication of CN101277566A publication Critical patent/CN101277566A/zh
Application granted granted Critical
Publication of CN101277566B publication Critical patent/CN101277566B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/40—Control techniques providing energy savings, e.g. smart controller or presence detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2007101489335A 2007-03-26 2007-09-12 光源装置以及使用该光源装置的曝光装置 Active CN101277566B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-079179 2007-03-26
JP2007079179A JP4937808B2 (ja) 2007-03-26 2007-03-26 光源装置ならびにこれを用いた露光装置

Publications (2)

Publication Number Publication Date
CN101277566A CN101277566A (zh) 2008-10-01
CN101277566B true CN101277566B (zh) 2012-07-18

Family

ID=39913351

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007101489335A Active CN101277566B (zh) 2007-03-26 2007-09-12 光源装置以及使用该光源装置的曝光装置

Country Status (4)

Country Link
JP (1) JP4937808B2 (ko)
KR (1) KR101314559B1 (ko)
CN (1) CN101277566B (ko)
TW (1) TWI421643B (ko)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101725542B1 (ko) 2009-04-09 2017-04-10 가부시키가이샤 브이 테크놀로지 노광 장치용 광 조사 장치 및 그 점등 제어 방법, 그리고 노광 장치 및 기판
JP5355261B2 (ja) * 2009-07-07 2013-11-27 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の露光光形成方法、及び表示用パネル基板の製造方法
JP5281987B2 (ja) * 2009-08-26 2013-09-04 株式会社日立ハイテクノロジーズ 露光装置およびそれを用いた露光方法並びに表示用パネル基板の製造方法
JP5674195B2 (ja) * 2010-01-14 2015-02-25 Ｎｓｋテクノロジー株式会社 露光装置及び露光方法
CN102369484B (zh) * 2010-02-05 2015-05-20 恩斯克科技有限公司 曝光装置用照光装置及其亮灯控制方法、以及曝光装置、曝光方法及基板
KR101437210B1 (ko) * 2010-02-24 2014-11-03 엔에스케이 테쿠노로지 가부시키가이샤 노광 장치용 광조사 장치, 노광 장치, 노광 방법, 기판의 제조 방법, 마스크, 및 피노광 기판
JP5799306B2 (ja) * 2010-07-22 2015-10-21 株式会社ブイ・テクノロジー 露光装置用光照射装置の制御方法、及び露光方法
WO2012011497A1 (ja) * 2010-07-22 2012-01-26 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法
CN102483587B (zh) * 2010-07-22 2014-11-05 恩斯克科技有限公司 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法
US9041993B2 (en) 2010-07-26 2015-05-26 Lg Chem, Ltd. Mask
TWI463272B (zh) * 2010-11-30 2014-12-01 Ushio Electric Inc Light irradiation device
CN102098839B (zh) * 2010-12-29 2013-09-11 东北大学 机场航站楼照明节能控制系统
US20130207544A1 (en) * 2011-09-30 2013-08-15 Pinebrook Imaging Technology, Ltd. Illumination system
KR101260221B1 (ko) * 2011-12-01 2013-05-06 주식회사 엘지화학 마스크
US9140979B2 (en) 2011-12-01 2015-09-22 Lg Chem, Ltd. Mask
TWI609247B (zh) * 2013-04-09 2017-12-21 Orc Manufacturing Co Ltd Light source apparatus and exposure apparatus including the light source apparatus
CN105045043B (zh) * 2014-04-28 2018-01-05 株式会社V技术 曝光装置和曝光方法
JP5869713B1 (ja) * 2015-04-13 2016-02-24 フェニックス電機株式会社 光源装置及び露光装置とその検査方法
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
JP7141126B2 (ja) * 2017-08-23 2022-09-22 フェニックス電機株式会社 光源装置、露光装置、および光源装置の判定方法
CN111466011B (zh) * 2017-12-08 2023-05-23 凤凰电机公司 灯的点亮方法
JP7379036B2 (ja) * 2019-09-13 2023-11-14 キヤノン株式会社 シャッタ装置、光量制御方法、リソグラフィ装置及び物品の製造方法
CN111965946A (zh) * 2020-08-13 2020-11-20 Tcl华星光电技术有限公司 光刻用照光装置及自动调整其照度的方法
WO2022220229A1 (ja) * 2021-04-16 2022-10-20 フェニックス電機株式会社 露光用光源、光照射装置、露光装置、および露光方法
CN117157589A (zh) * 2021-04-16 2023-12-01 凤凰电机公司 曝光用光源、光照射装置、曝光装置、以及曝光方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1841204A (zh) * 2005-03-28 2006-10-04 东丽工程株式会社 外围曝光装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05127086A (ja) * 1991-11-01 1993-05-25 Matsushita Electric Ind Co Ltd 光強度の均一化方法およびそれを用いた露光装置
KR100205518B1 (ko) * 1996-08-31 1999-07-01 구자홍 노광장치 및 노광방법
KR20010068399A (ko) * 2000-01-05 2001-07-23 김영남 노광대 조도 제어장치
JP2002174551A (ja) 2000-12-05 2002-06-21 Oyo Denki Kk 照度校正システム
JP2004056086A (ja) * 2002-05-31 2004-02-19 Ushio Inc ランプ点灯制御装置および光照射装置
JP4391136B2 (ja) * 2003-06-05 2009-12-24 株式会社目白ゲノッセン 露光用照明装置
JP2005227465A (ja) * 2004-02-12 2005-08-25 Mejiro Genossen:Kk 照明光学系の使用方法及びフラットパネルディスプレイの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1841204A (zh) * 2005-03-28 2006-10-04 东丽工程株式会社 外围曝光装置

Also Published As

Publication number Publication date
TWI421643B (zh) 2014-01-01
JP4937808B2 (ja) 2012-05-23
CN101277566A (zh) 2008-10-01
KR20080087630A (ko) 2008-10-01
KR101314559B1 (ko) 2013-10-07
JP2008241877A (ja) 2008-10-09
TW200839454A (en) 2008-10-01

Similar Documents

Publication Publication Date Title
CN101277566B (zh) 光源装置以及使用该光源装置的曝光装置
CN101277567A (zh) 光源装置以及使用该光源装置的曝光装置
JP3500352B2 (ja) ソーラーシミュレータ
CN106206366B (zh) 热处理装置
MX9207339A (es) Aparato regulador de la iluminacion para lamparas de descarga de gas.
CN101603642B (zh) 光照射装置
US20050151471A1 (en) Light emitting apparatus and extra-high pressure mercury lamp therefor
CN204086811U (zh) 曝光设备的光源装置
KR101586062B1 (ko) 광 출력제어 기능을 구비한 led 노광 장치 및 그 제어 방법
TWI794352B (zh) 燈之點亮方法
US20090015176A1 (en) Laser assisted fluorescent lamp
US3783338A (en) Electronic flash lighting equipment
JPS61134680A (ja) 光起電力半導体の電圧電流特性の測定方法
CN103367096A (zh) 超高压汞灯及具有其的紫外线照射装置
CN208780986U (zh) 一种led平行光系统
KR102538972B1 (ko) 광원 장치, 그것을 구비하는 조사 장치, 및 광원 장치의 점등 방법
CN201345773Y (zh) 一种变功率金属卤化物灯系统
Buckingham et al. Characteristics and applications of concentrated-arc lamps
KR20010010746A (ko) 조명기구의 보호장치
KR100817412B1 (ko) 전면 노광기의 램프 제어장치
GB2161284A (en) Controlling light emission
CN201028334Y (zh) 高亮度投光器恒定光源装置
IT202100006113A1 (it) Dispositivo per la disinfezione di oggetti e relativo metodo di controllo
CN1993007B (zh) 短弧形放电灯点灯装置、紫外线照射装置以及紫外线照射方法
TW201921141A (zh) 光源裝置、曝光裝置及光源裝置之判定方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant