TWI414010B - Crystalline crystal / sticky ribbon and semiconductor wafer manufacturing method - Google Patents

Crystalline crystal / sticky ribbon and semiconductor wafer manufacturing method Download PDF

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Publication number
TWI414010B
TWI414010B TW097102094A TW97102094A TWI414010B TW I414010 B TWI414010 B TW I414010B TW 097102094 A TW097102094 A TW 097102094A TW 97102094 A TW97102094 A TW 97102094A TW I414010 B TWI414010 B TW I414010B
Authority
TW
Taiwan
Prior art keywords
film
dicing
adhesive
adhesive film
semiconductor wafer
Prior art date
Application number
TW097102094A
Other languages
English (en)
Chinese (zh)
Other versions
TW200842957A (en
Inventor
渡部功治
福岡正輝
松田匠太
竹部義之
Original Assignee
積水化學工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 積水化學工業股份有限公司 filed Critical 積水化學工業股份有限公司
Publication of TW200842957A publication Critical patent/TW200842957A/zh
Application granted granted Critical
Publication of TWI414010B publication Critical patent/TWI414010B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001—Core members of the layer connector
    • H01L2224/29099—Material
    • H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06—Polymers
    • H01L2924/0665—Epoxy resin

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesive Tapes (AREA)
  • Dicing (AREA)
  • Die Bonding (AREA)
  • Adhesives Or Adhesive Processes (AREA)
TW097102094A 2007-04-19 2008-01-18 Crystalline crystal / sticky ribbon and semiconductor wafer manufacturing method TWI414010B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007110270 2007-04-19
JP2007188004 2007-07-19

Publications (2)

Publication Number Publication Date
TW200842957A TW200842957A (en) 2008-11-01
TWI414010B true TWI414010B (zh) 2013-11-01

Family

ID=39925323

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097102094A TWI414010B (zh) 2007-04-19 2008-01-18 Crystalline crystal / sticky ribbon and semiconductor wafer manufacturing method

Country Status (4)

Country Link
JP (3) JPWO2008132852A1 (enExample)
KR (1) KR101273871B1 (enExample)
TW (1) TWI414010B (enExample)
WO (1) WO2008132852A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010192856A (ja) * 2009-02-20 2010-09-02 Furukawa Electric Co Ltd:The ウエハ加工用フィルム
US8871609B2 (en) 2009-06-30 2014-10-28 Taiwan Semiconductor Manufacturing Company, Ltd. Thin wafer handling structure and method
US9305769B2 (en) 2009-06-30 2016-04-05 Taiwan Semiconductor Manufacturing Company, Ltd. Thin wafer handling method
JP5512262B2 (ja) * 2009-12-26 2014-06-04 株式会社朝日ラバー レンズアレイシート及びそれのダイシング方法
JP5566141B2 (ja) * 2010-03-15 2014-08-06 リンテック株式会社 粘接着剤組成物、粘接着シートおよび半導体装置の製造方法
JP2012129473A (ja) * 2010-12-17 2012-07-05 Sekisui Chem Co Ltd ダイシング−ダイボンディングテープ
JP5946650B2 (ja) * 2012-02-21 2016-07-06 積水化学工業株式会社 ダイシング−ダイボンディングテープ及び粘接着剤層付き半導体チップの製造方法
JP6107230B2 (ja) * 2013-02-28 2017-04-05 住友ベークライト株式会社 ダイシングフィルム
PT2980835T (pt) 2013-03-27 2021-01-27 Lintec Corp Folha compósita para formar película protetora
WO2016022528A1 (en) 2014-08-05 2016-02-11 Uniqarta, Inc. Setting up ultra-small or ultra-thin discrete components for easy assembly
KR20160095526A (ko) 2015-02-03 2016-08-11 도레이첨단소재 주식회사 반도체용 다이싱 다이본딩 필름
WO2017170021A1 (ja) * 2016-03-30 2017-10-05 リンテック株式会社 半導体加工用シート
CN108886023B (zh) * 2016-04-28 2023-09-08 琳得科株式会社 保护膜形成用膜及保护膜形成用复合片
JP7280661B2 (ja) * 2017-12-28 2023-05-24 日東電工株式会社 ダイシングダイボンドフィルム
JP6719489B2 (ja) * 2018-01-31 2020-07-08 古河電気工業株式会社 マスク一体型表面保護テープおよびマスク一体型表面保護テープを用いる半導体チップの製造方法
KR102898634B1 (ko) * 2021-05-25 2025-12-09 삼성전자주식회사 디본딩 테이프 및 이를 이용한 반도체 웨이퍼의 가공 방법
WO2025075176A1 (ja) * 2023-10-04 2025-04-10 株式会社レゾナック 重合体、硬化性樹脂組成物、樹脂硬化物、接着剤組成物、フィルム状接着剤、及び接着シート

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203816A (ja) * 2000-12-28 2002-07-19 Nitto Denko Corp ダイシング用粘着シート
JP2005303275A (ja) * 2004-03-15 2005-10-27 Hitachi Chem Co Ltd ダイシングダイボンドシート
WO2005103180A1 (ja) * 2004-04-20 2005-11-03 Hitachi Chemical Co., Ltd. 接着シート、半導体装置、及び半導体装置の製造方法
JP2006203000A (ja) * 2005-01-20 2006-08-03 Sekisui Chem Co Ltd ダイシング用粘着テープおよび半導体チップの製造方法
JP2007012670A (ja) * 2005-06-28 2007-01-18 Furukawa Electric Co Ltd:The 粘接着テープ

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3280876B2 (ja) * 1996-01-22 2002-05-13 日本テキサス・インスツルメンツ株式会社 ウェハダイシング・接着用シートおよび半導体装置の製造方法
JP2003142505A (ja) * 2001-10-31 2003-05-16 Lintec Corp ウエハダイシング・接着用シートおよび半導体装置の製造方法
JP4107417B2 (ja) * 2002-10-15 2008-06-25 日東電工株式会社 チップ状ワークの固定方法
JP2005019841A (ja) * 2003-06-27 2005-01-20 Nitto Denko Corp 紫外線硬化型粘着テープの貼付け方法およびその装置並びにそれを用いて形成した物品
JP4443962B2 (ja) * 2004-03-17 2010-03-31 日東電工株式会社 ダイシング・ダイボンドフィルム
JP2006165074A (ja) 2004-12-03 2006-06-22 Sumitomo Bakelite Co Ltd ダイシングシート機能付きダイアタッチフィルム及びそれを用いた半導体装置の製造方法
JP2006216773A (ja) * 2005-02-03 2006-08-17 Lintec Corp ダイシングシートおよび電子部品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203816A (ja) * 2000-12-28 2002-07-19 Nitto Denko Corp ダイシング用粘着シート
JP2005303275A (ja) * 2004-03-15 2005-10-27 Hitachi Chem Co Ltd ダイシングダイボンドシート
WO2005103180A1 (ja) * 2004-04-20 2005-11-03 Hitachi Chemical Co., Ltd. 接着シート、半導体装置、及び半導体装置の製造方法
JP2006203000A (ja) * 2005-01-20 2006-08-03 Sekisui Chem Co Ltd ダイシング用粘着テープおよび半導体チップの製造方法
JP2007012670A (ja) * 2005-06-28 2007-01-18 Furukawa Electric Co Ltd:The 粘接着テープ

Also Published As

Publication number Publication date
KR101273871B1 (ko) 2013-06-11
WO2008132852A1 (ja) 2008-11-06
JPWO2008132852A1 (ja) 2010-07-22
JP2011176327A (ja) 2011-09-08
KR20100015636A (ko) 2010-02-12
TW200842957A (en) 2008-11-01
JP2009065191A (ja) 2009-03-26
JP5268575B2 (ja) 2013-08-21

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