TWI402152B - 光照射裝置之光照射方法以及光照射裝置 - Google Patents

光照射裝置之光照射方法以及光照射裝置 Download PDF

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Publication number
TWI402152B
TWI402152B TW099105211A TW99105211A TWI402152B TW I402152 B TWI402152 B TW I402152B TW 099105211 A TW099105211 A TW 099105211A TW 99105211 A TW99105211 A TW 99105211A TW I402152 B TWI402152 B TW I402152B
Authority
TW
Taiwan
Prior art keywords
linear
light
light irradiation
illuminance
ultraviolet
Prior art date
Application number
TW099105211A
Other languages
English (en)
Chinese (zh)
Other versions
TW201038384A (en
Inventor
Shigeru Endou
Norihiko Hatano
Tetsuji Kadowaki
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW201038384A publication Critical patent/TW201038384A/zh
Application granted granted Critical
Publication of TWI402152B publication Critical patent/TWI402152B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
TW099105211A 2009-04-28 2010-02-23 光照射裝置之光照射方法以及光照射裝置 TWI402152B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009110135 2009-04-28
JP2009110136 2009-04-28

Publications (2)

Publication Number Publication Date
TW201038384A TW201038384A (en) 2010-11-01
TWI402152B true TWI402152B (zh) 2013-07-21

Family

ID=43031992

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099105211A TWI402152B (zh) 2009-04-28 2010-02-23 光照射裝置之光照射方法以及光照射裝置

Country Status (5)

Country Link
JP (1) JP5230875B2 (ja)
KR (1) KR101240367B1 (ja)
CN (1) CN101978308B (ja)
TW (1) TWI402152B (ja)
WO (1) WO2010125836A1 (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5771776B2 (ja) * 2010-12-21 2015-09-02 パナソニックＩｐマネジメント株式会社 紫外線照射装置
JP5732971B2 (ja) * 2011-03-31 2015-06-10 東芝ライテック株式会社 紫外線照射装置
CN102435307B (zh) * 2011-11-09 2013-09-18 深圳市华星光电技术有限公司 Tft-lcd制程中多层uv烘烤炉的uv照度的检测方法及用于实施该方法的取片组合装置
JP2013219205A (ja) * 2012-04-10 2013-10-24 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 光照射装置
JP6206945B2 (ja) * 2013-03-07 2017-10-04 株式会社ブイ・テクノロジー 走査露光装置及び走査露光方法
JP5884776B2 (ja) * 2013-06-22 2016-03-15 ウシオ電機株式会社 光配向用偏光光照射装置
JP2015165546A (ja) * 2014-02-07 2015-09-17 株式会社ミマキエンジニアリング 紫外線発光ダイオードユニット、紫外線発光ダイオードユニットのセット、インクジェット装置および三次元造形物製造装置
JP6394317B2 (ja) * 2014-11-21 2018-09-26 東芝ライテック株式会社 光照射装置
JP6984228B2 (ja) * 2016-11-17 2021-12-17 東京エレクトロン株式会社 露光装置、露光装置の調整方法及び記憶媒体
JP6809188B2 (ja) * 2016-12-13 2021-01-06 東京エレクトロン株式会社 光照射装置
CN108681211A (zh) * 2018-04-20 2018-10-19 佛山市鑫东陶陶瓷有限公司 一种点光源曝光装置
JPWO2020217288A1 (ja) * 2019-04-22 2020-10-29
DE102022128497A1 (de) 2022-10-27 2024-05-02 Forschungszentrum Jülich GmbH Vorrichtung und verfahren zur thermischen behandlung von werkstücken

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005099783A (ja) * 2003-08-28 2005-04-14 Shibaura Mechatronics Corp 紫外光照射装置及び照射方法
TW200613862A (en) * 2004-06-18 2006-05-01 Shinetsu Chemical Co Substrate surface sealing method and ultraviolet-ray irradiation device for liquid crystal display cell substrate
JP2006235617A (ja) * 2005-01-28 2006-09-07 Shibaura Mechatronics Corp 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法
JP2007334039A (ja) * 2006-06-15 2007-12-27 Ulvac Japan Ltd 光源装置及びこれを用いた基板の貼り合わせ方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007057861A (ja) * 2005-08-25 2007-03-08 Harison Toshiba Lighting Corp 角形状集光用光学系および液晶パネル用紫外線照射装置
JP5060748B2 (ja) * 2006-07-28 2012-10-31 芝浦メカトロニクス株式会社 シール剤硬化装置及び基板製造装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005099783A (ja) * 2003-08-28 2005-04-14 Shibaura Mechatronics Corp 紫外光照射装置及び照射方法
TW200613862A (en) * 2004-06-18 2006-05-01 Shinetsu Chemical Co Substrate surface sealing method and ultraviolet-ray irradiation device for liquid crystal display cell substrate
JP2006235617A (ja) * 2005-01-28 2006-09-07 Shibaura Mechatronics Corp 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法
JP2007334039A (ja) * 2006-06-15 2007-12-27 Ulvac Japan Ltd 光源装置及びこれを用いた基板の貼り合わせ方法

Also Published As

Publication number Publication date
CN101978308B (zh) 2012-09-19
KR101240367B1 (ko) 2013-03-11
TW201038384A (en) 2010-11-01
JPWO2010125836A1 (ja) 2012-10-25
CN101978308A (zh) 2011-02-16
WO2010125836A1 (ja) 2010-11-04
JP5230875B2 (ja) 2013-07-10
KR20100132024A (ko) 2010-12-16

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