TWI399236B - 從氣體混合物中回收惰性氣體之方法 - Google Patents

從氣體混合物中回收惰性氣體之方法 Download PDF

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Publication number
TWI399236B
TWI399236B TW094145911A TW94145911A TWI399236B TW I399236 B TWI399236 B TW I399236B TW 094145911 A TW094145911 A TW 094145911A TW 94145911 A TW94145911 A TW 94145911A TW I399236 B TWI399236 B TW I399236B
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TW
Taiwan
Prior art keywords
gas
column
inert
mixture
stream
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TW094145911A
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English (en)
Chinese (zh)
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TW200640555A (en
Inventor
Ravi Jain
Julian Richard Dean
Robert Bruce Grant
Paul Alan Stockman
Naum Perelman
Neil Condon
Andrew John Harpham
William Robert Gerristead
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Boc Group Plc
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Publication of TW200640555A publication Critical patent/TW200640555A/zh
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Publication of TWI399236B publication Critical patent/TWI399236B/zh

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • C01B23/0036—Physical processing only
    • C01B23/0042—Physical processing only by making use of membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08—Selective adsorption, e.g. chromatography
    • B01D15/10—Selective adsorption, e.g. chromatography characterised by constructional or operational features
    • B01D15/24—Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the treatment of the fractions to be distributed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/025—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with wetted adsorbents; Chromatography
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • C01B23/0036—Physical processing only
    • C01B23/0052—Physical processing only by adsorption in solids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0029—Obtaining noble gases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0029—Obtaining noble gases
    • C01B2210/0037—Xenon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Treating Waste Gases (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
TW094145911A 2004-12-22 2005-12-22 從氣體混合物中回收惰性氣體之方法 TWI399236B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/019,843 US7368000B2 (en) 2004-12-22 2004-12-22 Treatment of effluent gases

Publications (2)

Publication Number Publication Date
TW200640555A TW200640555A (en) 2006-12-01
TWI399236B true TWI399236B (zh) 2013-06-21

Family

ID=36051545

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094145911A TWI399236B (zh) 2004-12-22 2005-12-22 從氣體混合物中回收惰性氣體之方法

Country Status (6)

Country Link
US (1) US7368000B2 (cg-RX-API-DMAC10.html)
EP (1) EP1841690A1 (cg-RX-API-DMAC10.html)
JP (1) JP2008525779A (cg-RX-API-DMAC10.html)
KR (1) KR20070086519A (cg-RX-API-DMAC10.html)
TW (1) TWI399236B (cg-RX-API-DMAC10.html)
WO (1) WO2006067384A1 (cg-RX-API-DMAC10.html)

Cited By (3)

* Cited by examiner, † Cited by third party
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US10814251B2 (en) 2018-02-07 2020-10-27 SCREEN Holdings Co., Ltd. Substrate processing method and substrate processing apparatus
TWI790348B (zh) * 2018-02-09 2023-01-21 日商東京威力科創股份有限公司 電漿處理系統及電漿處理方法
TWI808870B (zh) * 2022-08-11 2023-07-11 印能科技股份有限公司 氣體回收設備

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US20050250347A1 (en) * 2003-12-31 2005-11-10 Bailey Christopher M Method and apparatus for maintaining by-product volatility in deposition process
KR100836094B1 (ko) * 2004-01-29 2008-06-09 다다히로 오미 배기가스 처리방법 및 배기가스 처리장치
GB0521944D0 (en) 2005-10-27 2005-12-07 Boc Group Plc Method of treating gas
DE102006034601B3 (de) * 2006-07-26 2008-02-07 Schmidt, Klaus, Prof. Dr. Rückhaltung von Edelgasen im Atemgas bei beatmeten Patienten mit Hilfe von Membranseparation
GB0618016D0 (en) * 2006-09-13 2006-10-18 Boc Group Plc Method of recycling hydrogen
WO2008039461A2 (en) * 2006-09-27 2008-04-03 Thinsilicon Corp. Back contact device for photovoltaic cells and method of manufacturing a back contact
JP5202836B2 (ja) * 2006-12-01 2013-06-05 日本エア・リキード株式会社 キセノンの回収システムおよび回収装置
WO2008150769A2 (en) * 2007-05-31 2008-12-11 Thinsilicon Corporation Photovoltaic device and method of manufacturing photovoltaic devices
WO2009055750A1 (en) * 2007-10-26 2009-04-30 Applied Materials, Inc. Methods and apparatus for smart abatement using an improved fuel circuit
US9387428B2 (en) * 2008-02-05 2016-07-12 Applied Materials, Inc. Systems and methods for treating flammable effluent gases from manufacturing processes
CN101939713B (zh) * 2008-02-05 2013-05-22 应用材料公司 运作电子装置制造系统的方法与设备
FR2932059A1 (fr) * 2008-05-28 2009-12-04 Air Liquide Systeme de traitement par plasma d'un fluide ou melange de fluides
US8340827B2 (en) * 2008-06-20 2012-12-25 Lam Research Corporation Methods for controlling time scale of gas delivery into a processing chamber
US8021468B2 (en) * 2008-06-23 2011-09-20 Siemens Medical Solutions Usa, Inc. Room temperature chemical trap for the purification of gaseous methane
US8042566B2 (en) 2008-07-23 2011-10-25 Atmel Corporation Ex-situ component recovery
JP2012504350A (ja) * 2008-09-29 2012-02-16 シンシリコン・コーポレーション 一体的に統合されたソーラーモジュール
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WO2010129163A2 (en) * 2009-05-06 2010-11-11 Thinsilicon Corporation Photovoltaic cells and methods to enhance light trapping in semiconductor layer stacks
US20110114156A1 (en) * 2009-06-10 2011-05-19 Thinsilicon Corporation Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode
WO2010144421A2 (en) * 2009-06-10 2010-12-16 Thinsilicon Corporation Photovoltaic modules and methods of manufacturing photovoltaic modules having multiple semiconductor layer stacks
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CN102832096B (zh) * 2012-09-20 2015-11-25 中微半导体设备(上海)有限公司 一种用于真空处理装置的气体供应装置及其气体供应及切换方法
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JP6368458B2 (ja) * 2013-05-24 2018-08-01 株式会社荏原製作所 除害機能付真空ポンプ
JP6472653B2 (ja) * 2014-03-17 2019-02-20 株式会社荏原製作所 除害機能付真空ポンプ
JP6441660B2 (ja) * 2014-03-17 2018-12-19 株式会社荏原製作所 除害機能付真空ポンプ
CN104383784B (zh) * 2014-11-27 2016-03-02 中国科学技术大学 从环境气体中分离提取惰性气体的系统和方法
TWI547305B (zh) * 2014-12-18 2016-09-01 財團法人工業技術研究院 中空纖維吸附壓縮空氣乾燥系統
JP6175471B2 (ja) * 2015-10-30 2017-08-02 日本エア・リキード株式会社 ネオン回収精製システムおよびネオン回収精製方法
JP6734061B2 (ja) * 2016-01-29 2020-08-05 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． プラズマ分光分析装置
US10677713B1 (en) * 2016-08-04 2020-06-09 Hrl Laboratories, Llc Adaptive gas analyzer
CN107632099A (zh) * 2017-08-31 2018-01-26 天津市鹏翔科技有限公司 一种智能在线连续取样自动分析系统及方法
US10773203B2 (en) * 2017-09-27 2020-09-15 U.S. Department Of Energy Transition group metals for the capture of radioactive xenon
US10824049B1 (en) 2017-10-06 2020-11-03 Hrl Laboratories, Llc Optical-frequency up-converting spectrometric imager
CN108899104B (zh) * 2018-07-26 2020-12-04 中国核动力研究设计院 一种用于制备85Kr标准源的方法
CN109665506B (zh) * 2018-12-21 2020-11-06 北京放射性核素实验室 大气氙富集纯化方法及装置
CN109665505B (zh) * 2018-12-21 2020-11-06 北京放射性核素实验室 一种大气氙富集纯化方法及装置
US11557462B2 (en) * 2019-03-13 2023-01-17 Kla Corporation Collecting and recycling rare gases in semiconductor processing equipment
WO2021167218A1 (ko) * 2020-02-19 2021-08-26 (주)한양기술공업 가스 포집 시스템 및 가스 포집 방법
KR102368202B1 (ko) * 2020-02-19 2022-03-02 (주)한양기술공업 가스 포집 시스템 및 가스 포집 방법
US12285715B2 (en) 2020-07-28 2025-04-29 Edwards Limited Noble gas recovery system
GB2597545A (en) * 2020-07-28 2022-02-02 Edwards Ltd A noble gas recovery system
JP7792206B2 (ja) * 2021-06-17 2025-12-25 エドワーズ株式会社 希ガス回収システム、及び、希ガス回収方法
KR102710551B1 (ko) * 2023-09-01 2024-09-26 주식회사 에프알디 흡착칼럼을 이용한 제논 및 크립톤 함유 미정제 혼합가스의 추출방법
KR20250082903A (ko) 2023-11-30 2025-06-09 (주)한양기술공업 희유가스 흡착제 및 이를 구비한 반도체 공정 후 희유가스 포집-정제 시스템
KR20250082914A (ko) 2023-11-30 2025-06-09 (주)한양기술공업 반도체 공정 후 희유가스 포집-정제 시스템

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10814251B2 (en) 2018-02-07 2020-10-27 SCREEN Holdings Co., Ltd. Substrate processing method and substrate processing apparatus
TWI733075B (zh) * 2018-02-07 2021-07-11 日商斯庫林集團股份有限公司 基板處理方法及基板處理裝置
TWI790348B (zh) * 2018-02-09 2023-01-21 日商東京威力科創股份有限公司 電漿處理系統及電漿處理方法
US11699573B2 (en) 2018-02-09 2023-07-11 Tokyo Electron Limited Plasma processing method
TWI808870B (zh) * 2022-08-11 2023-07-11 印能科技股份有限公司 氣體回收設備

Also Published As

Publication number Publication date
KR20070086519A (ko) 2007-08-27
WO2006067384A1 (en) 2006-06-29
JP2008525779A (ja) 2008-07-17
TW200640555A (en) 2006-12-01
US7368000B2 (en) 2008-05-06
US20060130649A1 (en) 2006-06-22
EP1841690A1 (en) 2007-10-10

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