TWI388377B - 旋轉杯式塗佈裝置 - Google Patents

旋轉杯式塗佈裝置 Download PDF

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Publication number
TWI388377B
TWI388377B TW094121009A TW94121009A TWI388377B TW I388377 B TWI388377 B TW I388377B TW 094121009 A TW094121009 A TW 094121009A TW 94121009 A TW94121009 A TW 94121009A TW I388377 B TWI388377 B TW I388377B
Authority
TW
Taiwan
Prior art keywords
cup
inner cup
tray
coating apparatus
discharge
Prior art date
Application number
TW094121009A
Other languages
English (en)
Chinese (zh)
Other versions
TW200607574A (en
Inventor
Kazunobu Yamaguchi
Tsutomu Sahoda
Yoshiaki Masu
Yuki Yamamoto
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd, Tazmo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200607574A publication Critical patent/TW200607574A/zh
Application granted granted Critical
Publication of TWI388377B publication Critical patent/TWI388377B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mathematical Physics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials For Photolithography (AREA)
  • Nozzles (AREA)
TW094121009A 2004-06-28 2005-06-23 旋轉杯式塗佈裝置 TWI388377B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004190202A JP4476042B2 (ja) 2004-06-28 2004-06-28 回転カップ式塗布装置

Publications (2)

Publication Number Publication Date
TW200607574A TW200607574A (en) 2006-03-01
TWI388377B true TWI388377B (zh) 2013-03-11

Family

ID=35780102

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094121009A TWI388377B (zh) 2004-06-28 2005-06-23 旋轉杯式塗佈裝置

Country Status (4)

Country Link
JP (1) JP4476042B2 (ko)
KR (1) KR101204065B1 (ko)
CN (1) CN1714944A (ko)
TW (1) TWI388377B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100450640C (zh) * 2006-07-17 2009-01-14 友达光电股份有限公司 旋涂系统
JP4750724B2 (ja) * 2007-01-25 2011-08-17 東京応化工業株式会社 重ね合わせユニット及び貼り合わせ装置
CN114472090B (zh) * 2022-02-10 2023-06-02 华能新能源股份有限公司 一种膜层生长设备及膜层生长方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3388628B2 (ja) 1994-03-24 2003-03-24 東京応化工業株式会社 回転式薬液処理装置

Also Published As

Publication number Publication date
JP4476042B2 (ja) 2010-06-09
KR20060048544A (ko) 2006-05-18
JP2006013243A (ja) 2006-01-12
TW200607574A (en) 2006-03-01
KR101204065B1 (ko) 2012-11-22
CN1714944A (zh) 2006-01-04

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