JP4476042B2 - 回転カップ式塗布装置 - Google Patents

回転カップ式塗布装置 Download PDF

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Publication number
JP4476042B2
JP4476042B2 JP2004190202A JP2004190202A JP4476042B2 JP 4476042 B2 JP4476042 B2 JP 4476042B2 JP 2004190202 A JP2004190202 A JP 2004190202A JP 2004190202 A JP2004190202 A JP 2004190202A JP 4476042 B2 JP4476042 B2 JP 4476042B2
Authority
JP
Japan
Prior art keywords
cup
inner cup
tray
drain
drain guide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2004190202A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006013243A (ja
Inventor
和伸 山口
勉 佐保田
芳明 升
夕記 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd, Tazmo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2004190202A priority Critical patent/JP4476042B2/ja
Priority to TW094121009A priority patent/TWI388377B/zh
Priority to KR1020050055582A priority patent/KR101204065B1/ko
Priority to CNA2005100810419A priority patent/CN1714944A/zh
Publication of JP2006013243A publication Critical patent/JP2006013243A/ja
Application granted granted Critical
Publication of JP4476042B2 publication Critical patent/JP4476042B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mathematical Physics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials For Photolithography (AREA)
  • Nozzles (AREA)
JP2004190202A 2004-06-28 2004-06-28 回転カップ式塗布装置 Active JP4476042B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004190202A JP4476042B2 (ja) 2004-06-28 2004-06-28 回転カップ式塗布装置
TW094121009A TWI388377B (zh) 2004-06-28 2005-06-23 旋轉杯式塗佈裝置
KR1020050055582A KR101204065B1 (ko) 2004-06-28 2005-06-27 회전컵식 도포장치
CNA2005100810419A CN1714944A (zh) 2004-06-28 2005-06-28 旋转杯式涂敷装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004190202A JP4476042B2 (ja) 2004-06-28 2004-06-28 回転カップ式塗布装置

Publications (2)

Publication Number Publication Date
JP2006013243A JP2006013243A (ja) 2006-01-12
JP4476042B2 true JP4476042B2 (ja) 2010-06-09

Family

ID=35780102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004190202A Active JP4476042B2 (ja) 2004-06-28 2004-06-28 回転カップ式塗布装置

Country Status (4)

Country Link
JP (1) JP4476042B2 (ko)
KR (1) KR101204065B1 (ko)
CN (1) CN1714944A (ko)
TW (1) TWI388377B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100450640C (zh) * 2006-07-17 2009-01-14 友达光电股份有限公司 旋涂系统
JP4750724B2 (ja) * 2007-01-25 2011-08-17 東京応化工業株式会社 重ね合わせユニット及び貼り合わせ装置
CN114472090B (zh) * 2022-02-10 2023-06-02 华能新能源股份有限公司 一种膜层生长设备及膜层生长方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3388628B2 (ja) 1994-03-24 2003-03-24 東京応化工業株式会社 回転式薬液処理装置

Also Published As

Publication number Publication date
KR20060048544A (ko) 2006-05-18
JP2006013243A (ja) 2006-01-12
TWI388377B (zh) 2013-03-11
TW200607574A (en) 2006-03-01
KR101204065B1 (ko) 2012-11-22
CN1714944A (zh) 2006-01-04

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