TWI344392B - - Google Patents

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Publication number
TWI344392B
TWI344392B TW097121584A TW97121584A TWI344392B TW I344392 B TWI344392 B TW I344392B TW 097121584 A TW097121584 A TW 097121584A TW 97121584 A TW97121584 A TW 97121584A TW I344392 B TWI344392 B TW I344392B
Authority
TW
Taiwan
Prior art keywords
chamber
substrate
opening
processing
processing chamber
Prior art date
Application number
TW097121584A
Other languages
English (en)
Chinese (zh)
Other versions
TW200916199A (en
Inventor
Kazuo Jodai
Hisaaki Matsui
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008046223A external-priority patent/JP2009202088A/ja
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200916199A publication Critical patent/TW200916199A/zh
Application granted granted Critical
Publication of TWI344392B publication Critical patent/TWI344392B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
TW097121584A 2007-08-28 2008-06-10 Substrate processing apparatus TW200916199A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007221246 2007-08-28
JP2008046223A JP2009202088A (ja) 2008-02-27 2008-02-27 基板処理装置

Publications (2)

Publication Number Publication Date
TW200916199A TW200916199A (en) 2009-04-16
TWI344392B true TWI344392B (ja) 2011-07-01

Family

ID=40692804

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097121584A TW200916199A (en) 2007-08-28 2008-06-10 Substrate processing apparatus

Country Status (2)

Country Link
KR (1) KR100933125B1 (ja)
TW (1) TW200916199A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013191779A (ja) * 2012-03-14 2013-09-26 Toshiba Corp 処理装置および処理方法
KR102618629B1 (ko) * 2021-08-24 2023-12-27 세메스 주식회사 기판 처리 장치 및 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156035A (ja) 1999-11-25 2001-06-08 Hitachi Ltd 基板処理装置及びその隣接処理槽への飛沫の浸入防止方法
JP2007073649A (ja) 2005-09-06 2007-03-22 Sharp Corp レジスト剥離洗浄装置、レジスト剥離洗浄方法および基板製造方法

Also Published As

Publication number Publication date
KR20090023057A (ko) 2009-03-04
TW200916199A (en) 2009-04-16
KR100933125B1 (ko) 2009-12-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees