TWI338605B - Substrate polishing apparatus - Google Patents

Substrate polishing apparatus Download PDF

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Publication number
TWI338605B
TWI338605B TW093113413A TW93113413A TWI338605B TW I338605 B TWI338605 B TW I338605B TW 093113413 A TW093113413 A TW 093113413A TW 93113413 A TW93113413 A TW 93113413A TW I338605 B TWI338605 B TW I338605B
Authority
TW
Taiwan
Prior art keywords
substrate
light
polishing
fluid
polishing pad
Prior art date
Application number
TW093113413A
Other languages
English (en)
Chinese (zh)
Other versions
TW200507984A (en
Inventor
Kazuto Hirokawa
Shunsuke Nakai
Shinrou Ohta
Yutaka Wada
Yoichi Kobayashi
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of TW200507984A publication Critical patent/TW200507984A/zh
Application granted granted Critical
Publication of TWI338605B publication Critical patent/TWI338605B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
TW093113413A 2003-05-16 2004-05-13 Substrate polishing apparatus TWI338605B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003138782 2003-05-16
JP2003138479 2003-05-16
JP2003138496 2003-05-16

Publications (2)

Publication Number Publication Date
TW200507984A TW200507984A (en) 2005-03-01
TWI338605B true TWI338605B (en) 2011-03-11

Family

ID=33458361

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113413A TWI338605B (en) 2003-05-16 2004-05-13 Substrate polishing apparatus

Country Status (7)

Country Link
US (3) US20040242121A1 (https=)
EP (1) EP1641597A4 (https=)
JP (1) JP2006525878A (https=)
KR (1) KR20060009327A (https=)
CN (1) CN1791490B (https=)
TW (1) TWI338605B (https=)
WO (1) WO2004101223A1 (https=)

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WO2018128093A1 (ja) 2017-01-05 2018-07-12 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法
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JP6948878B2 (ja) * 2017-08-22 2021-10-13 ラピスセミコンダクタ株式会社 半導体製造装置及び半導体基板の研磨方法
JP6974087B2 (ja) * 2017-09-14 2021-12-01 株式会社ディスコ 切削装置
CN107745330B (zh) * 2017-11-28 2024-07-05 合肥波林新材料股份有限公司 一种端面研磨装置
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CN110153872B (zh) * 2018-02-14 2021-03-26 台湾积体电路制造股份有限公司 研磨系统、晶片夹持装置及晶片的研磨方法
JP7022647B2 (ja) * 2018-05-08 2022-02-18 株式会社荏原製作所 光透過性部材、研磨パッドおよび基板研磨装置
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JP2020001162A (ja) * 2018-06-28 2020-01-09 株式会社荏原製作所 研磨パッド積層体、研磨パッド位置決め治具、および研磨パッドを研磨テーブルに貼り付ける方法
JP7316785B2 (ja) * 2018-12-26 2023-07-28 株式会社荏原製作所 光学式膜厚測定システムの洗浄方法
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Also Published As

Publication number Publication date
CN1791490B (zh) 2010-12-08
JP2006525878A (ja) 2006-11-16
WO2004101223A1 (en) 2004-11-25
US20070173177A1 (en) 2007-07-26
KR20060009327A (ko) 2006-01-31
EP1641597A1 (en) 2006-04-05
US20060105679A1 (en) 2006-05-18
US7214122B2 (en) 2007-05-08
EP1641597A4 (en) 2007-10-31
CN1791490A (zh) 2006-06-21
TW200507984A (en) 2005-03-01
US20040242121A1 (en) 2004-12-02
US7507144B2 (en) 2009-03-24

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