TWI318723B - Photosensitive resin composition for black resist and light-shielding film made by using such photosensitive resin composition for black resisit - Google Patents

Photosensitive resin composition for black resist and light-shielding film made by using such photosensitive resin composition for black resisit

Info

Publication number
TWI318723B
TWI318723B TW093114893A TW93114893A TWI318723B TW I318723 B TWI318723 B TW I318723B TW 093114893 A TW093114893 A TW 093114893A TW 93114893 A TW93114893 A TW 93114893A TW I318723 B TWI318723 B TW I318723B
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
black
resisit
light
Prior art date
Application number
TW093114893A
Other languages
English (en)
Other versions
TW200506518A (en
Inventor
Manabu Higashi
Masanori Kono
Original Assignee
Nippon Steel Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical Co filed Critical Nippon Steel Chemical Co
Publication of TW200506518A publication Critical patent/TW200506518A/zh
Application granted granted Critical
Publication of TWI318723B publication Critical patent/TWI318723B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
TW093114893A 2003-06-05 2004-05-26 Photosensitive resin composition for black resist and light-shielding film made by using such photosensitive resin composition for black resisit TWI318723B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003160954A JP4290483B2 (ja) 2003-06-05 2003-06-05 ブラックレジスト用感光性樹脂組成物並びにこれを用いて形成された遮光膜

Publications (2)

Publication Number Publication Date
TW200506518A TW200506518A (en) 2005-02-16
TWI318723B true TWI318723B (en) 2009-12-21

Family

ID=34053578

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093114893A TWI318723B (en) 2003-06-05 2004-05-26 Photosensitive resin composition for black resist and light-shielding film made by using such photosensitive resin composition for black resisit

Country Status (3)

Country Link
JP (1) JP4290483B2 (zh)
KR (1) KR101051398B1 (zh)
TW (1) TWI318723B (zh)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
JP2006251495A (ja) * 2005-03-11 2006-09-21 Adeka Corp アルカリ現像性感光性樹脂組成物
JP4508924B2 (ja) * 2005-03-29 2010-07-21 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
JP5044893B2 (ja) * 2005-03-31 2012-10-10 凸版印刷株式会社 カラーフィルタ
JP5070682B2 (ja) * 2005-04-08 2012-11-14 大日本印刷株式会社 Ｉｐｓ用カラーフィルタ
JP2007071994A (ja) * 2005-09-05 2007-03-22 Tokyo Ohka Kogyo Co Ltd 黒色感光性樹脂組成物
KR100655047B1 (ko) * 2005-12-30 2006-12-06 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙매트릭스
KR100740550B1 (ko) * 2006-02-10 2007-07-18 주식회사 코오롱 수지 블랙 매트릭스용 감광성 수지 조성물
JP5073342B2 (ja) * 2006-03-31 2012-11-14 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
JP4745110B2 (ja) * 2006-04-19 2011-08-10 東京応化工業株式会社 感光性組成物及びこの感光性組成物により形成されたカラーフィルタ
JP4949809B2 (ja) * 2006-11-14 2012-06-13 東京応化工業株式会社 着色感光性樹脂組成物
JP4890314B2 (ja) * 2007-03-29 2012-03-07 新日鐵化学株式会社 ブラックレジスト用感光性樹脂組成物
JP5270113B2 (ja) * 2007-06-06 2013-08-21 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びこれを用いた遮光膜並びにカラーフィルター
WO2008153000A1 (ja) * 2007-06-11 2008-12-18 Mitsubishi Chemical Corporation カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
KR101237613B1 (ko) * 2008-02-18 2013-02-26 주식회사 엘지화학 안정성이 개선된 알칼리 가용성 에폭시 수지 조성물 및이를 포함하는 감광성 수지 조성물
JP5180765B2 (ja) * 2008-10-02 2013-04-10 新日鉄住金化学株式会社 アルカリ現像感光性樹脂組成物及びこれを用いて形成した表示素子隔壁並びに表示素子
KR101225955B1 (ko) 2008-12-22 2013-01-24 제일모직주식회사 잉크젯용 수지 조성물
KR101068622B1 (ko) * 2009-12-22 2011-09-28 주식회사 엘지화학 기판접착력이 향상된 고차광성 블랙매트릭스 조성물
KR101445906B1 (ko) * 2011-02-01 2014-10-01 주식회사 엘지화학 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
JP2013134263A (ja) * 2011-12-22 2013-07-08 Tokyo Ohka Kogyo Co Ltd ブラックカラムスペーサ用感光性樹脂組成物、ブラックカラムスペーサ、表示装置、及びブラックカラムスペーサの形成方法
JP2014209172A (ja) * 2013-03-25 2014-11-06 太陽インキ製造株式会社 感光性樹脂組成物、その硬化被膜およびプリント配線板
JP6307237B2 (ja) * 2013-09-30 2018-04-04 新日鉄住金化学株式会社 黒色感光性樹脂組成物及びその硬化膜、並びに当該硬化膜を有するカラーフィルター及びタッチパネル
JP6708367B2 (ja) * 2014-03-31 2020-06-10 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物、これを硬化した遮光膜及びカラーフィルター
JP5916939B2 (ja) * 2015-12-24 2016-05-11 東京応化工業株式会社 ブラックカラムスペーサの形成方法
CN110546180A (zh) 2017-05-19 2019-12-06 长濑化成株式会社 碱溶性树脂
KR102565582B1 (ko) * 2017-06-12 2023-08-11 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002040225A (ja) * 2000-07-27 2002-02-06 Jsr Corp カラー液晶表示装置用感放射線性組成物およびカラー液晶表示装置
JP2002121258A (ja) * 2000-08-10 2002-04-23 Dainippon Ink & Chem Inc エネルギー線硬化型樹脂の製造方法およびレジスト用エネルギー線硬化型樹脂組成物
JP4404330B2 (ja) * 2001-01-09 2010-01-27 東京応化工業株式会社 光重合性組成物および該組成物を用いたカラーフィルタの製造方法
JP2003066597A (ja) * 2001-08-29 2003-03-05 Sumitomo Chem Co Ltd ブラックマトリックスを形成するための黒色感光性樹脂組成物

Also Published As

Publication number Publication date
KR101051398B1 (ko) 2011-07-22
JP2004361736A (ja) 2004-12-24
TW200506518A (en) 2005-02-16
KR20040105575A (ko) 2004-12-16
JP4290483B2 (ja) 2009-07-08

Similar Documents

Publication Publication Date Title
TWI318723B (en) Photosensitive resin composition for black resist and light-shielding film made by using such photosensitive resin composition for black resisit
EP1560068A4 (en) PHOTOSENSITIVE RESIN COMPOSITION OF NEGATIVE TYPE
TWI347491B (en) Photosensitive resin composition and dry film resist using the same
EP1596251A4 (en) IMERSION EXPOSURE USE RESEARCH FILM EDUCATION MATERIAL, COMPILED FILM AND RESISTMAT EDUCATION PROCESS
AU2003208975A8 (en) Image sensor with photosensitive thin film transistors
SG122901A1 (en) Positive type photo-sensitive siloxane composition, curing film formed by the composition and devicewith the curing film
SG122900A1 (en) Photosensitive resin composition
EP1630605A4 (en) LENS-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT AND DISPLAY THEREWITH
EP1560070A4 (en) COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY
EP1609024A4 (en) NEW LIGHT-SENSITIVE RESIN COMPOSITIONS
TW200641523A (en) Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter
EP1610177A4 (en) PHOTOSENSITIVE RESIN FILM AND POLYMERIZED FILM MADE FROM THE PHOTOSENSITIVE RESIN FILM
EP1636648A4 (en) NEW POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS
EP1602009A4 (en) NOVEL LIGHT-SENSITIVE RESIN COMPOSITIONS
TWI341438B (en) Novel photosensitive resin compositions
EP1653281A4 (en) NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
TWI368822B (en) Photosensitive resin composition for forming organic insulating film and device using the same
AU2001222286A1 (en) Photosensitive resin composition
AU2411702A (en) Improved water-developable photosensitive resin for flexography
EP1508837A4 (en) PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PREPARING THIN FILM OF THERMORESISTANT RESIN
EP1615074A4 (en) LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE LAYER THEREOF, AND PRINTING ORIGINAL PLATE WITH LIGHT-SENSITIVE RESIN
EP1777700A4 (en) NON-SOLVENT PHOTORETICULAR RESIN COMPOSITION FOR PROTECTIVE FILMS
TWI341439B (en) Photoresist composition for imaging thick films
AU2003281404A1 (en) Photosensitive resin composition and photosensitive element using the same
EP1757982A4 (en) NEGATIVE LIGHT-SENSITIVE COMPOSITION AND NEGATIVELY LIGHT-SENSITIVE LITHOGRAPHY PLATE