TWI297521B - Laser thermal annealing of lightly doped silicon substrates - Google Patents
Laser thermal annealing of lightly doped silicon substrates Download PDFInfo
- Publication number
- TWI297521B TWI297521B TW094101533A TW94101533A TWI297521B TW I297521 B TWI297521 B TW I297521B TW 094101533 A TW094101533 A TW 094101533A TW 94101533 A TW94101533 A TW 94101533A TW I297521 B TWI297521 B TW I297521B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- radiation
- preheating
- annealed
- preheated
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims description 308
- 238000000137 annealing Methods 0.000 title claims description 85
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 230000005855 radiation Effects 0.000 claims description 199
- 230000003287 optical effect Effects 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 25
- 238000010521 absorption reaction Methods 0.000 claims description 24
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000002835 absorbance Methods 0.000 claims 2
- 238000004064 recycling Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 43
- 238000009792 diffusion process Methods 0.000 description 11
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 229910052732 germanium Inorganic materials 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 9
- 230000010287 polarization Effects 0.000 description 7
- 238000002310 reflectometry Methods 0.000 description 6
- 230000004913 activation Effects 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 238000010408 sweeping Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 241000282326 Felis catus Species 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 208000004680 Rectal Fistula Diseases 0.000 description 1
- 244000007853 Sarothamnus scoparius Species 0.000 description 1
- 206010002156 anal fistula Diseases 0.000 description 1
- 229910001570 bauxite Inorganic materials 0.000 description 1
- 210000000746 body region Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000009528 severe injury Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 210000003813 thumb Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11C—FATTY ACIDS FROM FATS, OILS OR WAXES; CANDLES; FATS, OILS OR FATTY ACIDS BY CHEMICAL MODIFICATION OF FATS, OILS, OR FATTY ACIDS OBTAINED THEREFROM
- C11C5/00—Candles
- C11C5/006—Candles wicks, related accessories
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11C—FATTY ACIDS FROM FATS, OILS OR WAXES; CANDLES; FATS, OILS OR FATTY ACIDS BY CHEMICAL MODIFICATION OF FATS, OILS, OR FATTY ACIDS OBTAINED THEREFROM
- C11C5/00—Candles
- C11C5/002—Ingredients
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/762,861 US7098155B2 (en) | 2003-09-29 | 2004-01-22 | Laser thermal annealing of lightly doped silicon substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200529327A TW200529327A (en) | 2005-09-01 |
| TWI297521B true TWI297521B (en) | 2008-06-01 |
Family
ID=34911265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094101533A TWI297521B (en) | 2004-01-22 | 2005-01-19 | Laser thermal annealing of lightly doped silicon substrates |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP4843225B2 (enExample) |
| KR (1) | KR100699211B1 (enExample) |
| TW (1) | TWI297521B (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5073260B2 (ja) * | 2006-09-29 | 2012-11-14 | 日立コンピュータ機器株式会社 | レーザアニール装置及びレーザアニール方法 |
| US20080206897A1 (en) * | 2007-02-27 | 2008-08-28 | Woo Sik Yoo | Selective Depth Optical Processing |
| US20090114630A1 (en) * | 2007-11-05 | 2009-05-07 | Hawryluk Andrew M | Minimization of surface reflectivity variations |
| WO2010033389A1 (en) * | 2008-09-17 | 2010-03-25 | Applied Materials, Inc. | Managing thermal budget in annealing of substrates |
| US20100068898A1 (en) | 2008-09-17 | 2010-03-18 | Stephen Moffatt | Managing thermal budget in annealing of substrates |
| US20100084744A1 (en) * | 2008-10-06 | 2010-04-08 | Zafiropoulo Arthur W | Thermal processing of substrates with pre- and post-spike temperature control |
| JP5541693B2 (ja) * | 2010-03-25 | 2014-07-09 | 株式会社日本製鋼所 | レーザアニール装置 |
| JP5614768B2 (ja) * | 2010-03-25 | 2014-10-29 | 株式会社日本製鋼所 | レーザ処理装置およびレーザ処理方法 |
| US8014427B1 (en) | 2010-05-11 | 2011-09-06 | Ultratech, Inc. | Line imaging systems and methods for laser annealing |
| JP5617421B2 (ja) * | 2010-08-06 | 2014-11-05 | Ｊｆｅスチール株式会社 | 電子ビーム照射装置 |
| US8026519B1 (en) * | 2010-10-22 | 2011-09-27 | Ultratech, Inc. | Systems and methods for forming a time-averaged line image |
| JP5786557B2 (ja) * | 2011-08-25 | 2015-09-30 | 株式会社Sumco | シミュレーションによるレーザースパイクアニールを施す際に生じる酸素析出物からの発生転位予測方法 |
| US8546805B2 (en) * | 2012-01-27 | 2013-10-01 | Ultratech, Inc. | Two-beam laser annealing with improved temperature performance |
| SG195515A1 (en) * | 2012-06-11 | 2013-12-30 | Ultratech Inc | Laser annealing systems and methods with ultra-short dwell times |
| US9823121B2 (en) * | 2014-10-14 | 2017-11-21 | Kla-Tencor Corporation | Method and system for measuring radiation and temperature exposure of wafers along a fabrication process line |
| JP6452564B2 (ja) * | 2015-07-15 | 2019-01-16 | 住友重機械工業株式会社 | レーザアニール装置及びレーザアニール方法 |
| SG10201605683WA (en) * | 2015-07-22 | 2017-02-27 | Ultratech Inc | High-efficiency line-forming optical systems and methods using a serrated spatial filter |
| EP3329510B1 (en) * | 2015-07-29 | 2022-04-13 | Applied Materials, Inc. | Rotating substrate laser anneal |
| KR102772310B1 (ko) * | 2019-09-09 | 2025-02-26 | 삼성디스플레이 주식회사 | 레이저 열처리 장치 및 레이저 빔 모니터링 시스템 |
| WO2023282587A1 (ko) * | 2021-07-06 | 2023-01-12 | 에이피에스리서치 주식회사 | 레이저 열처리장치 및 레이저 열처리방법 |
| KR102753522B1 (ko) * | 2021-12-02 | 2025-01-14 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5629323A (en) * | 1979-08-17 | 1981-03-24 | Nec Corp | Two-wavelength laser surface treating apparatus |
| JPS57104217A (en) * | 1980-12-22 | 1982-06-29 | Toshiba Corp | Surface heat treatment |
| JPS57183024A (en) * | 1981-05-02 | 1982-11-11 | Fujitsu Ltd | Laser annealing |
| JPS57183023A (en) * | 1981-05-02 | 1982-11-11 | Fujitsu Ltd | Laser annealing |
| JPS57111020A (en) * | 1981-11-16 | 1982-07-10 | Hitachi Ltd | Manufacture of semiconductor device |
| JPS60117617A (ja) * | 1983-11-30 | 1985-06-25 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPH01173707A (ja) * | 1987-12-28 | 1989-07-10 | Matsushita Electric Ind Co Ltd | レーザアニール方法 |
| JPH03266424A (ja) * | 1990-03-16 | 1991-11-27 | Sony Corp | 半導体基板のアニール方法 |
| JPH0521340A (ja) * | 1991-07-10 | 1993-01-29 | Ricoh Co Ltd | 薄膜半導体装置、その製法および製造装置 |
| JPH0883765A (ja) * | 1994-07-14 | 1996-03-26 | Sanyo Electric Co Ltd | 多結晶半導体膜の製造方法 |
| JP2000012461A (ja) * | 1998-06-17 | 2000-01-14 | Matsushita Electric Ind Co Ltd | 結晶質半導体薄膜の作製方法 |
| JP2000012484A (ja) * | 1998-06-25 | 2000-01-14 | Mitsubishi Electric Corp | レーザアニール装置 |
| JP3185881B2 (ja) * | 1998-10-28 | 2001-07-11 | 日本電気株式会社 | レーザ照射装置およびレーザ照射方法 |
| JP2001156017A (ja) * | 1999-11-29 | 2001-06-08 | Semiconductor Energy Lab Co Ltd | レーザー装置及びレーザー光を用いた熱処理方法並びに半導体装置の作製方法 |
| US7015422B2 (en) * | 2000-12-21 | 2006-03-21 | Mattson Technology, Inc. | System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
| JP2002217125A (ja) * | 2001-01-23 | 2002-08-02 | Sumitomo Heavy Ind Ltd | 表面処理装置及び方法 |
| JP2003347237A (ja) * | 2002-05-30 | 2003-12-05 | Mitsubishi Electric Corp | 半導体装置の製造方法およびその製造装置 |
| JP2004128421A (ja) * | 2002-10-07 | 2004-04-22 | Semiconductor Energy Lab Co Ltd | レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法 |
-
2005
- 2005-01-19 TW TW094101533A patent/TWI297521B/zh not_active IP Right Cessation
- 2005-01-20 JP JP2005013255A patent/JP4843225B2/ja not_active Expired - Fee Related
- 2005-01-21 KR KR1020050005988A patent/KR100699211B1/ko not_active Expired - Fee Related
-
2009
- 2009-12-04 JP JP2009276412A patent/JP5094825B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005210129A (ja) | 2005-08-04 |
| JP2010109375A (ja) | 2010-05-13 |
| TW200529327A (en) | 2005-09-01 |
| JP4843225B2 (ja) | 2011-12-21 |
| KR100699211B1 (ko) | 2007-03-27 |
| KR20050076768A (ko) | 2005-07-27 |
| JP5094825B2 (ja) | 2012-12-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |