TWI292853B - - Google Patents

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Publication number
TWI292853B
TWI292853B TW090103790A TW90103790A TWI292853B TW I292853 B TWI292853 B TW I292853B TW 090103790 A TW090103790 A TW 090103790A TW 90103790 A TW90103790 A TW 90103790A TW I292853 B TWI292853 B TW I292853B
Authority
TW
Taiwan
Prior art keywords
resin
resist
compound
image
weight
Prior art date
Application number
TW090103790A
Other languages
English (en)
Chinese (zh)
Inventor
Kashiwagi Motofumi
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Application granted granted Critical
Publication of TWI292853B publication Critical patent/TWI292853B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/18Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
TW090103790A 2000-02-21 2001-02-20 TWI292853B (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000042167 2000-02-21

Publications (1)

Publication Number Publication Date
TWI292853B true TWI292853B (enExample) 2008-01-21

Family

ID=18565277

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090103790A TWI292853B (enExample) 2000-02-21 2001-02-20

Country Status (3)

Country Link
KR (1) KR100869458B1 (enExample)
TW (1) TWI292853B (enExample)
WO (1) WO2001061410A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8795943B2 (en) 2010-05-04 2014-08-05 Lg Chem, Ltd. Negative photoresist composition and patterning method for device
US10607856B2 (en) 2017-06-18 2020-03-31 Powertech Technology Inc. Manufacturing method of redistribution layer

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI314249B (en) * 2004-03-31 2009-09-01 Zeon Corp Radiation-sensitive resin composition
JP4513965B2 (ja) * 2004-03-31 2010-07-28 日本ゼオン株式会社 感放射線性樹脂組成物
KR101298940B1 (ko) * 2005-08-23 2013-08-22 주식회사 동진쎄미켐 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터기판의 제조방법
KR101357701B1 (ko) * 2006-02-08 2014-02-05 주식회사 동진쎄미켐 패턴 형성용 네거티브 포토레지스트 조성물 및 이를 이용한 표시장치 패턴 형성 방법
KR100833706B1 (ko) 2007-02-01 2008-05-29 삼성전자주식회사 감광성 폴리이미드 조성물, 폴리이미드 필름 및 이를 이용한 반도체 소자
KR101392291B1 (ko) * 2007-04-13 2014-05-07 주식회사 동진쎄미켐 포토레지스트 조성물 및 이를 이용한 박막트랜지스터기판의 제조방법
JP5334743B2 (ja) * 2009-08-12 2013-11-06 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、固体撮像素子、液晶ディスプレイ、有機elディスプレイ、並びに画像表示デバイス
JPWO2011102064A1 (ja) * 2010-02-19 2013-06-17 Jsr株式会社 n型半導体層上の電極の形成方法
KR101015613B1 (ko) * 2010-02-24 2011-02-17 한국기계연구원 투명기판상 금속박막 패턴 형성방법
CN110383172A (zh) 2017-03-29 2019-10-25 日本瑞翁株式会社 抗蚀剂图案形成方法
CN111512228B (zh) * 2017-12-28 2024-09-06 默克专利有限公司 包含碱溶性树脂和交联剂的负型剥离抗蚀剂组合物以及在衬底上制造金属膜图案的方法
WO2020234222A1 (en) 2019-05-20 2020-11-26 Merck Patent Gmbh A negative tone lift off resist composition comprising an alkali soluble resin and a photo acid generator, and a method for manufacturing metal film patterns on a substrate.

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2985351B2 (ja) * 1991-04-12 1999-11-29 住友化学工業株式会社 ネガ型フォトレジスト組成物
JP2989064B2 (ja) * 1991-12-16 1999-12-13 日本ゼオン株式会社 金属蒸着膜のパターン形成方法
JP3429852B2 (ja) * 1993-06-04 2003-07-28 シップレーカンパニー エル エル シー ネガ型感光性組成物
JPH1172913A (ja) * 1997-08-28 1999-03-16 Oki Electric Ind Co Ltd ネガ型レジストおよびレジストパターン形成方法
US6110641A (en) * 1997-12-04 2000-08-29 Shipley Company, L.L.C. Radiation sensitive composition containing novel dye
JP3028094B2 (ja) * 1998-01-09 2000-04-04 日本ゼオン株式会社 リフトオフ法によるパターン形成用ネガ型感光性組成物
JP2000194143A (ja) * 1998-10-23 2000-07-14 Nippon Zeon Co Ltd 発光体蒸着膜のパタ―ン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8795943B2 (en) 2010-05-04 2014-08-05 Lg Chem, Ltd. Negative photoresist composition and patterning method for device
US9104106B2 (en) 2010-05-04 2015-08-11 Lg Chem, Ltd. Negative photoresist composition and patterning method for device
US10607856B2 (en) 2017-06-18 2020-03-31 Powertech Technology Inc. Manufacturing method of redistribution layer

Also Published As

Publication number Publication date
KR20030008216A (ko) 2003-01-24
WO2001061410A1 (en) 2001-08-23
KR100869458B1 (ko) 2008-11-19

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MM4A Annulment or lapse of patent due to non-payment of fees