TWI290738B - Wet treatment apparatus - Google Patents

Wet treatment apparatus Download PDF

Info

Publication number
TWI290738B
TWI290738B TW094132368A TW94132368A TWI290738B TW I290738 B TWI290738 B TW I290738B TW 094132368 A TW094132368 A TW 094132368A TW 94132368 A TW94132368 A TW 94132368A TW I290738 B TWI290738 B TW I290738B
Authority
TW
Taiwan
Prior art keywords
cleaning
cleaned
discharge port
processing apparatus
wet processing
Prior art date
Application number
TW094132368A
Other languages
English (en)
Chinese (zh)
Other versions
TW200616066A (en
Inventor
Noriyo Tomiyama
Original Assignee
Future Vision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Future Vision Inc filed Critical Future Vision Inc
Publication of TW200616066A publication Critical patent/TW200616066A/zh
Application granted granted Critical
Publication of TWI290738B publication Critical patent/TWI290738B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Coating Apparatus (AREA)
TW094132368A 2004-09-24 2005-09-19 Wet treatment apparatus TWI290738B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004276505A JP2006088033A (ja) 2004-09-24 2004-09-24 ウェット処理装置

Publications (2)

Publication Number Publication Date
TW200616066A TW200616066A (en) 2006-05-16
TWI290738B true TWI290738B (en) 2007-12-01

Family

ID=36229511

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094132368A TWI290738B (en) 2004-09-24 2005-09-19 Wet treatment apparatus

Country Status (4)

Country Link
JP (1) JP2006088033A (ja)
KR (1) KR100852335B1 (ja)
CN (1) CN1751813B (ja)
TW (1) TWI290738B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006327198A (ja) * 2005-05-23 2006-12-07 Heidelberger Druckmas Ag 液体を塗布する装置
KR100834827B1 (ko) * 2006-11-16 2008-06-04 삼성전자주식회사 포토 마스크 세정장치 및 그의 세정방법
JP4810411B2 (ja) * 2006-11-30 2011-11-09 東京応化工業株式会社 処理装置
KR100858427B1 (ko) 2007-02-27 2008-09-17 세메스 주식회사 기판 세정 장치 및 방법
CN104137180B (zh) * 2011-12-28 2017-04-05 Hoya株式会社 信息记录介质用玻璃基板的制造方法
KR101468460B1 (ko) * 2013-06-12 2014-12-04 주식회사 에스케이테크놀러지 중앙 포집형 흡입구를 이용한 기판용 이물제거장치
CN106670180B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的清洗装置及清洗方法
CN106623238B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板吸取转移式连续清洗系统及清洗方法
CN106623237B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的转举式连续清洗系统及清洗方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19530989C1 (de) * 1995-08-23 1997-03-13 Atotech Deutschland Gmbh Verfahren zum Filmstrippen
KR100306155B1 (ko) * 1996-11-29 2001-11-30 이구택 자기차폐성이우수한기판의코팅방법
US6165267A (en) * 1998-10-07 2000-12-26 Sandia Corporation Spin coating apparatus
JP2002075947A (ja) * 2000-08-30 2002-03-15 Alps Electric Co Ltd ウェット処理装置
JP4189279B2 (ja) 2003-07-03 2008-12-03 株式会社東芝 基板処理装置
JP4451175B2 (ja) 2004-03-19 2010-04-14 大日本スクリーン製造株式会社 ノズル洗浄装置および基板処理装置

Also Published As

Publication number Publication date
KR20060051583A (ko) 2006-05-19
KR100852335B1 (ko) 2008-08-18
CN1751813B (zh) 2010-06-02
JP2006088033A (ja) 2006-04-06
CN1751813A (zh) 2006-03-29
TW200616066A (en) 2006-05-16

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Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees