1290738 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種具備有清洗單元之濕式處理裝置，該 清洗單元用於清洗半導體晶圓或玻璃基板等表面。 【先前技術】 半導體設備、半導體裝置或液晶顯示面板等電子設備製 造中，於其製造製程中必須包含對作為被清洗物之半導體 晶圓或玻璃基板進行清洗處理的工序。清洗工序中，為去 除製造工序中之各種去除對象物f，使用有超純水、電解 離子水、臭氧水、氫水等各種清洗液進行清洗，而此等清 洗液由清洗裝置之噴嘴供應至基板上。 然而’使用有先前通常之清洗用噴嘴之濕式處理裝置的 情形時’例如若使用電解離子水等清洗液清洗500 mm方形 基板，而藉由此清洗液進行清洗及藉由沖洗液進行沖洗 後，為使基板上異物（顆粒）殘存量達到〇5個^〇12位準 淨度，貝丨J必須使用2 5 5 1 n / /V ' Η更用25至30升/分鐘程度之清洗液及沖洗 徒出有如下裝置：其使用與先前型相比可大幅減 少清洗液使用量之省、冷剂从、太α ^ ^ ^ 〉月洗用喷嘴，此外併用超聲波 "，利用其振動波將去除對象物質去除。 圖4係說明包含先前清洗喷嘴之用於濕式處理之— 例的t面圖。如圖4所示，本結構之清洗用噴嘴ΗΜ之-端 設有導入通道（導入昝、^ ^ 、夜)Η)2之導 其包含用以導入清洗液(處理 ，夜）之導入口 ,;另一端設有排出通道（排出 104915.doc 1290738 盲）1 04 ’其包含用以將清洗後之清洗液（濕式處理後之處理 液之排出液）向外部排出的排出口丨〇4a。 再者’形成有分別連接此等導入通道103與排出通道1〇4 之他端，且含有對向於被處理基板（被清洗物）貨之對向面 l〇5a的連接部106，並且此連接部1〇6上設有開口有導入通 道1〇3之第1開口部（導入開口部）1〇3b，及開口有排出通道 104之第2開口部（排出開口部）1〇4b。如此之噴嘴係稱作推 挽式噴嘴（節流型噴嘴）。朝向被處理基板w開口有第^與第 ^邛1 、1 04b。連接部1 〇6與被處理基板w之間的空 間中’形成有進行濕式處理之處理區域丨〇7。 進而，連接部106上設有於清洗被處理基板貿時，用以 向處理區域107内之清洗液1G2賦予超聲波振動的超聲波振 f部分1〇8。此超聲波振子部分1〇8包含振動板（振動 部）1〇5，及設於振動板1〇5主面上之向振動板1〇5賦予超聲 波振動的超聲波振子丨09。超聲波振子109作為pZT (PieZ〇electnc Transducer壓電變壓器）等電伸縮元件，接受 由么振為發出之超聲波頻率電訊號並產生超聲波振動。藉 由以％氧樹脂為主要成分之用於接著超聲波振子等的接著 劑而將此起聲波振子1 09連接於振動板1 〇5。 至於構成振動板105之材料，可自高純度玻璃狀碳素、 :銹鋼、石央、藍寶石、氧化鋁等陶冑、或者鋁、及其合 至鈦、鎮等中選擇使用。設置振動板於使用於通常之清 洗處理之濕式處理用㈣的情料，❹不銹鋼作為該振 動板105之材料即已足夠，但若清洗液係相對較強之酸或 104915.doc 1290738 氫氟酸，則使用由趑寶 等材料對渴式處理； 等陶究構成之材料，此 k式處理液之耐腐姓性好’可防止劣化 進仃濕式處理方面較為理想。 因此在 考慮到進行濕式處理時之實用性，較好 振子109可輪、疋超聲波 動，尤苴. Ζ至10 ΜΗζ範圍内頻率數之超聲波振 出0.2 MHz以μ今此十 尺对的疋可輸 之頻率數。又，於振 (SUS316L)fi ^ 汉们為不銹鋼 清形時，由超聲波振子109所發出之超聲、皮 振動於振動板105内的.、古 t耳波 議範圍内。 ）波長λ長度"於約。.6 _至約3。。 關於振動板1 〇5，若將超聲波振 動於該振動板π)5内的波pm,卜^起耳波振 門曰]及長叹為λ，則設定圖4所示之1 度尺寸了為了吻过1)· λ/2(其中，η為2以上之整數）。^ η值’較好的是3至7 ’更好的是5，此處，較好的是如 λ土〇.3職、助追3職、5λ/2±〇 3麵、n㈣3咖般， 將厚度尺寸Τ設定於相對於各數值具有一定餘量之範圍 内。此乃考慮到溫度變化等條件。藉由如此設定厚度尺寸 Τ，可使來自超聲波振子1〇9之超聲波振動有效傳播，且當 使用包含超聲波振子部分1〇8之清洗用噴嘴1〇1進行濕式: 理時，超聲波振動（超聲波能量）可充分賦予至清洗液1〇2外 由此可進行高效之濕式處理。 又，排出通道1 04側設有壓力控制部（圖示中省略），此壓 力控制部（處理液回收機構）以如下方式得以設置··其使與 被處理基板W接觸之清洗液102，於清洗後流向排出通道 104915.doc 1290738 ⑽，並使第i開口部1〇31?之與大氣接觸之清洗液的壓力 (,、b έ α洗液之表面張力與被處理基板之被清洗面的表 面張力），與大氣麼獲得平衡。上述壓力控制部包含設於 排出口 104a側之減壓泵。 因此，排出通道104側之壓力控制部中設有減壓泵，使 用此減壓栗對抽吸連接部106中之清洗液的吸力進行控 制，以使第！開口部㈣之與大氣接觸之清洗液的麼力 .包含清洗液之表面張力與被處理基板|之被清洗面们的表 面張力），與大氣壓獲得平衡。 換言之，使第！開口部職之與大氣接觸之清洗液的壓 力Pw(亦包含清洗液之表面張力與基板w之被清洗面^的 表面張力）與大氣壓Pa的關係為1>对与1^，藉此，通過第^^ 口部103b供應給被處理基板w，且與被處理基板w接觸之 清洗液，將不會茂漏至清洗用噴嘴外部，而排出至排出通 道 104 〇 | 即，由清洗用喷嘴供應至被處理基板w上之清洗液，並 不會接觸被處理基板w上除供應清洗液部分（第丨與第2開口 部103b、104b)之外的部分，而自基板w上得到去除。再 者，至於揭示有與此種清洗用喷嘴相關之先前技術者，可 例舉專利文獻1。 [專利文獻1]曰本專利特開2003-1 58 110號公報 [發明所欲解決之問題] 然而，由於上述先前例之省液型清洗用噴嘴，一面使用 減壓泵而使清洗液之壓力與大氣壓獲得大致平衡一面進行 104915.doc 12^0738 清洗處理，故而其抽吸具有較高黏性之清洗液之抽吸能力 較差’則可能導致於通過清洗用喷嘴後，出現大量殘渣。 又，超聲波清洗裝置中，存在以下需要解決之問題：由 於組合使用有利用超聲波作用而將汙物物理性分散至液體 中之物理性清洗，以及藉由選擇清洗液而通過溶解、乳化 等化學作用進行清洗之化學性清洗的清洗方式，故而必須 對各清洗液之聲音傳播速度以及由液溫所造成之液深進行 控制，又，必須具有如根據汙物種類或顆粒粒徑、清洗物 種類或形狀、及清洗液種類而對超聲波頻率進行管理等之 =雜機構’因容易發生清洗物與清洗喷嘴間之接觸故 障或超聲波發信器故障，進而導致裝置成本增加等。 本發明之目的在於提供一種濕式處理裝置，其並不使用 超聲波H於抽吸高黏度流體，且包含可清除殘留殘渣 之清洗喷嘴。 /一 【發明内容】 本 為達上述目的，本發明之特徵為具有以下結構。即 發明之濕式處理裝置中 矣⑴具備清洗單元’其包含供應口，其具有靠近被清洗物 表面而配設，且用以將外部供應之清洗用流體以帶狀 育出至被清洗物表面的細縫狀噴出口；以及排出口 由噴出口所噴出之清洗用流體排出， 、 且將清洗單元配置於盥祐、、主 被α冼物之移動方向直交的 上，該清洗單元中，相斟认从 万向 相對於外部供應之清洗用流 口接收口部的開口截面積之仏應 貝ίΰ 口之截面積亦即用於將清 104915.doc 1290738 具有大於1之 洗用流體朝向被清洗物表面噴出的前端部 正數1倍的開口截面積。 (2)又’本發明之〉县式虛 …式處縣£包含2個线被清洗物表 面而左右對稱配設之上沭、、杳 上乩β冼早70，且上述2個清洗單元 之間具有共通之排出口，而相 而相對於清洗用流體之接收口之 開口截面積’排出口之開口截面積為大於!的正數倍。 夕⑺又’本發明之濕式處理裝置，將直交於上述被清洗物 向的排出口之與清洗用流體接觸之接觸面的截面形 狀’自喷出口前端部直至排出口之出口為止，形成為圓弧 狀，且具備長度對應於被清洗物橫寬之開口部，並由複數 個-端抵接於外部固定板之彈性體支持住清洗單元。彈性 體中合有可改變控制其彈性係數之可變控制機構。 W對應於事先輸人至彈性係數之可變控制機構中的清洗 =元重量，可以㈣之彈性係數對上述彈性體進行控制。 彈性係數之可&控制機構中，包含對由供應口所供應之清 洗用流體之流量進行檢測的流量感測器，由此可藉由輸入 有流量感須!J器檢測訊號的#性係數之可變控制機構，對彈 性體之彈性係數進行控制。 、又，彈性係數之可變控制機構中，包含對清洗單元與被 清洗物表面之間隙進行檢測的間隙感測器，由此可藉由輸 入有間隙感測器檢測訊號的彈性係數之可變控制機構，對 彈性體之彈性係數進行控制。 進而，彈性係數之可變控制機構中，包含對被清洗物之 有無進行檢測的被清洗物檢測感測器，由此可藉由輸入有 1049 丨 5.doc -10- 1290738 被〉月洗物感測益檢測旬辨> 的卩留丨 〇 饿列Λ就的弹性係數之可變控制機構，對 彈性體之彈性係數進行控制。 進而’本發明中’清洗單元包含播止器，此播止器於清 洗Γ凡！!被清洗物表面之間隙為特定間隔以下時運行，且 "月洗單7L包3對將要供應之清洗用流體加|後供應給供 應口之加星果，以及抽吸由排出口排出之清洗用流體之抽 吸泵中之任意一方，或其兩者。 [發明之效果] 根據本發明’噴出口之將清洗料體朝向被清洗物表面 而噴出之前端部’相料㈣供應之清洗料體之供應口 接收口部的開π面積，具有大於！之正數】倍的開口面積， 猎此相對於供應至供應口接收口部之清洗料體之流速， 度進而加快，由此可以高流速之帶狀清洗用流體直 接中中被清洗物表面之汙物’並將其去除，且，料由噴出 口:喷出^帶狀清洗用流體產生之高流速，而於清洗單元 2 ’因其作用’將產生使喷出口接近被清洗物表 被清洗物與喷出口之間距越接近零，此引力越 之間距鈿小’並且清洗用流 體之'机體贺射流速增大，因此作用於汗物等粒子上之流财 作用力進而加大，故可增強使 ^ 嗖果〇 于物4粒子脫離被清洗物的 政果。再者，此引力上亦施加有排出口之吸力。 ^根據本發明，2個清洗單元之相互對向㈣“， ;:Γ洗用流體朝向被清洗物表面喷出之前端部，相對於 Μ供應之清洗用流體之供應口接收口部的開口面積，呈 l_l5.doc 1290738 有大於1之正數】倍之開口面積，因此可利用2個喷出口所 喷出之高速流之帶狀清洗用流體，將直接命中並去除之被 清洗物表面之汙物，於中央排出口處高效地一舉抽吸並排 出，且設置為以2個喷出口包圍被清洗物之清洗區域而喷 出有清洗用流體，因此並不會使清洗用流體以及經去除之 汙物擴散至外部。 又，根據本發明，上述相互對向之噴出口，相對於排出 ·:而對稱配設，因此由2個噴出口所喷出之高速流之帶狀 /月洗用机體直接命中而去除之被清洗物表面的汗物，於位 <各自噴出口中央之排出口的中央附近匯合，由此可高效 $舉抽吸並排出，且設置以2個喷出口包圍被清洗物之 、月先區域而噴出有清洗用流體，因此並不會使清洗用流體 以及經去除之汙物擴散至外部。 根據本發明，排水口相對於清洗用流體之供應口接 收口部之 面積’具有大於1之正數倍開口面積，因此 藝^使勒度清洗用流體，亦可易於抽吸並排出，且相比供 2 排出口為同一截面積之先前方式，抽吸效果明顯提 向〇 之S口Γ據本發明，排出口具有長度對應於被清洗物橫寬 邻，且其與清洗用流體的接觸面之直交於被清洗物 移動方向沾# Τ , 、截面形狀，自噴出口前端部直至排出口出口為 止，形虑岌 _ . ’、、、圓狐狀’因此由長度對應於被清洗物橫寬之細 縫狀開D Αβ + $、， 。的贺出口所噴出之帶狀清洗用流體高速流之流 迷並不會才昌、士 貝戰’且可不留殘餘地抽吸並排出，由此相對供 104915.doc -12- 1290738 應口、排出口為同一截面積之先前方式，抽吸效果明顯提 高。 又，根據本發明，由複數個一端抵接於外部固定板之彈 ㈣支持住清洗單元，因此，藉由喷出口所噴出之清洗用 μ體所產生之③速流’而對清洗單元中所產生之負壓進行 補充且巧洗單％與被清洗物之間—直保持有適當間隙， 因此可於自動防止清洗單元與被清洗物間之接觸破損故障 的同時’使清洗效果穩定且使被清洗物搬運穩定。 又’根據本發日月’祕體包含其彈性係數之可變控制機 構’因此可檢測因清洗用流體品種選擇不同而變化之黏产 以及運轉時之液溫，並根據黏度以及液溫，藉由噴出口戶I 嘴出之清洗用流體之高速流，追縱清洗單元中產生之負壓 之變化’而使清洗單元與被清洗物之間一直保持於適當間 隙，故而可使用一直以適當角度與距離，由喷出口喷出至 被清洗物上之高速流的清洗用流體，直接命中被清洗物表 面之汙物並將其去除，且可白叙 了自動防止清洗單元與被清洗物 間之接觸破損故障。 又，根據本發明，依據事先輪入至彈性係數之 機構中的清洗單元重量’可以任意之彈性係數對彈性體進 仃控制’因，即使選擇因各種濕式處理裝置、或清洗用流 體種類而重Ϊ不同之清法显； /月冼早兀，亦可輸入其重量，而進行 控制以使上述清洗單元與被清洗物之間隙維持於特定間 隔。 又，根據本發明，彈性係數之可變控制機構包含對相互 104915.doc -13- 1290738 對向之供應口所供應之清洗用流體流量進行檢測的流量感 測裔’並可藉由輪入有流量感測器檢測訊號之上述可變控 制機構’對彈性體之彈性係數進行控制，因此可進行控制 以使指定流1值之清洗單元與被清洗物之間隙維持於特定 間隔，且即使清洗用流體之溫度、黏度或流動速度產生變 化，亦可對清洗用流體之流量（流速）進行適當控制。進BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wet processing apparatus equipped with a cleaning unit for cleaning a surface of a semiconductor wafer or a glass substrate. [Prior Art] In the manufacture of electronic equipment such as a semiconductor device, a semiconductor device, or a liquid crystal display panel, it is necessary to include a process of cleaning the semiconductor wafer or the glass substrate as the object to be cleaned in the manufacturing process. In the cleaning step, in order to remove various removal targets f in the manufacturing process, various cleaning liquids such as ultrapure water, electrolytic ionized water, ozone water, and hydrogen water are used for cleaning, and the cleaning liquid is supplied from the nozzle of the cleaning device to On the substrate. However, when using a wet processing apparatus having a conventional cleaning nozzle, for example, if a 500 mm square substrate is washed with a cleaning solution such as electrolytic ionized water, the cleaning liquid is washed and rinsed by the rinse liquid. In order to make the residual amount of foreign matter (particles) on the substrate reach 个5, 〇12, and 12-degree cleanliness, Bellow J must use 2 5 5 1 n / /V ' Η and use 25 to 30 liters / minute of cleaning solution And the flushing device has the following device: the use of the cleaning liquid can be greatly reduced compared with the previous type, the refrigerant is used, the refrigerant is too a ^ ^ ^ ^ > month, and the ultrasonic wave is used in combination with the vibration wave. The removed matter is removed. Figure 4 is a t-plane illustration of an example for wet processing including a previously cleaned nozzle. As shown in Fig. 4, the end of the cleaning nozzle of the present structure is provided with an introduction passage (introduction ^, ^^, night) 2) 2, which includes an introduction port for introducing a cleaning liquid (treatment, night), The other end is provided with a discharge passage (discharge 104915.doc 1290738 blind) 104" which includes a discharge port 4a for discharging the washed cleaning liquid (the discharge liquid of the wet treatment liquid) to the outside. Further, 'there is a connection portion 106 which is connected to the other end of the introduction passage 103 and the discharge passage 1〇4, and which has a facing surface l〇5a opposite to the substrate to be processed (the object to be cleaned), and this The connection portion 1〇6 is provided with a first opening (introduction opening) 1〇3b through which the introduction passage 1〇3 is opened, and a second opening (discharge opening) 1〇4b in which the discharge passage 104 is opened. Such a nozzle is called a push-pull nozzle (throttle nozzle). The first and the second ^1, 104b are opened toward the substrate to be processed w. A processing region 丨〇7 for performing wet processing is formed in the space between the connecting portion 1 〇6 and the substrate to be processed w. Further, the connecting portion 106 is provided with an ultrasonic vibration f portion 1〇8 for applying ultrasonic vibration to the cleaning liquid 1G2 in the processing region 107 at the time of cleaning the substrate to be processed. The ultrasonic transducer portion 1A8 includes a vibrating plate (vibration portion) 1〇5, and an ultrasonic vibrator 丨09 provided on the main surface of the vibrating plate 1〇5 to impart ultrasonic vibration to the vibrating plate 1〇5. The ultrasonic vibrator 109 is an electrostrictive element such as a pZT (PieZ〇electnc Transducer Piezoelectric Transformer), and receives an ultrasonic frequency signal emitted from a vibration source to generate ultrasonic vibration. The acoustic acoustic vibrator 109 is connected to the vibrating plate 1 〇5 by an adhesive for a subsequent ultrasonic vibrator or the like containing a % oxygen resin as a main component. The material constituting the vibrating plate 105 can be selected from high-purity glassy carbon, rust steel, sapphire, sapphire, alumina, or the like, or aluminum, and its combination to titanium, town, and the like. It is sufficient to set the vibrating plate for the wet processing (4) used in the usual cleaning treatment. Stainless steel is sufficient as the material of the vibrating plate 105, but if the cleaning liquid is relatively strong acid or 104915.doc 1290738 hydrofluoric For acid, it is treated with materials such as sapphire and thirst; if the material is composed of ceramics, the k-type treatment liquid has good resistance to corrosion, which is ideal for preventing deterioration and enthalpy treatment. Therefore, considering the practicality of the wet processing, it is better that the vibrator 109 can be rotated by the wheel or the cymbal. In particular, the ultrasonic frequency of the frequency range of Ζ to 10 ΜΗζ is 0.2 MHz to the present ten-dimensional pair. The number of frequencies lost. Further, when Yu Zhen (SUS316L) fi ^ is a stainless steel clear shape, the ultrasonic waves and the skin emitted by the ultrasonic vibrator 109 vibrate within the vibration plate 105. The wavelength λ length " is about. .6 _ to about 3. . Regarding the vibrating plate 1 〇5, if the ultrasonic wave is vibrated in the vibrating plate π) 5, the wave pm, the ear oscillating ring 曰, and the long sag are λ, the 1 degree dimension shown in Fig. 4 is set. Kissed 1)·λ/2 (where η is an integer of 2 or more). ^ η value 'better 3 to 7 ' is better 5, here, it is better, such as λ soil 〇.3 job, help chase 3 job, 5λ/2±〇3 face, n (four) 3 coffee, The thickness dimension Τ is set within a range having a certain margin with respect to each numerical value. This is in consideration of conditions such as temperature changes. By setting the thickness dimension 如此 in this way, the ultrasonic vibration from the ultrasonic vibrator 1〇9 can be effectively propagated, and when the cleaning nozzle 1〇1 including the ultrasonic vibrator portion 1〇8 is used for the wet type, the ultrasonic vibration (ultrasonic wave) The energy can be sufficiently applied to the cleaning liquid 1 to 2, thereby enabling efficient wet processing. Further, a pressure control unit (not shown) is provided on the discharge passage 104 side, and the pressure control unit (treatment liquid recovery mechanism) is provided in such a manner that the cleaning liquid 102 that is in contact with the substrate W to be processed is After cleaning, it flows to the discharge passage 104915.doc 1290738 (10), and the pressure of the cleaning liquid in contact with the atmosphere of the i-th opening portion 1〇31? (, the surface tension of the b έ α washing liquid and the surface to be cleaned of the substrate to be processed Surface tension), balance with the atmosphere. The pressure control unit includes a pressure reducing pump provided on the discharge port 104a side. Therefore, a pressure reducing pump is provided in the pressure control portion on the side of the discharge passage 104, and the suction force of the cleaning liquid in the suction connecting portion 106 is controlled by the pressure reducing pump to make the first! The force of the cleaning liquid in contact with the atmosphere in the opening (4), including the surface tension of the cleaning liquid and the surface tension of the surface to be cleaned of the substrate to be processed, is balanced with atmospheric pressure. In other words, make the first! The relationship between the pressure Pw of the cleaning liquid in contact with the atmosphere (including the surface tension of the cleaning liquid and the surface tension of the surface to be cleaned of the substrate w) and the atmospheric pressure Pa is 1 > The cleaning portion that is supplied to the substrate to be processed w and that is in contact with the substrate to be processed w is not leaked to the outside of the cleaning nozzle, but is discharged to the discharge channel 104 即 |that is, supplied by the cleaning nozzle The cleaning liquid on the substrate w to be processed does not come into contact with the portion of the substrate to be processed w other than the portion (the second and second openings 103b and 104b) for supplying the cleaning liquid, and is removed from the substrate w. Further, as disclosed in the prior art relating to such a cleaning nozzle, Patent Document 1 can be exemplified. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2003-1 58110 [Problems to be Solved by the Invention] However, the pressure-reducing nozzle of the above-described conventional example uses a pressure reducing pump to pressurize the cleaning liquid. When the atmospheric pressure is roughly balanced, the 104915.doc 12^0738 cleaning treatment is performed, so that the suctioning ability of the cleaning liquid having a higher viscosity is poor, which may result in a large amount of residue after passing through the cleaning nozzle. Further, in the ultrasonic cleaning device, there is a problem that needs to be solved: a combination of physical cleaning for physically dispersing dirt into a liquid by ultrasonic action, and chemical action such as dissolution and emulsification by selecting a cleaning liquid. Cleaning method for chemical cleaning of cleaning, therefore, it is necessary to control the sound propagation speed of each cleaning liquid and the liquid depth caused by the liquid temperature, and must have, for example, according to the type of dirt or particle size, the type of cleaning substance or The shape and the type of the cleaning liquid are used to manage the ultrasonic frequency, etc. The miscellaneous mechanism is likely to cause a contact failure between the cleaning object and the cleaning nozzle or an ultrasonic transmitter failure, thereby increasing the cost of the device. SUMMARY OF THE INVENTION An object of the present invention is to provide a wet processing apparatus which does not use ultrasonic waves H for pumping high viscosity fluids and which includes a cleaning nozzle which can remove residual residues. SUMMARY OF THE INVENTION In order to achieve the above object, the present invention is characterized by having the following structure. In the wet processing apparatus of the present invention, the crucible (1) is provided with a cleaning unit that includes a supply port that is disposed adjacent to the surface of the object to be cleaned, and that is used to grow the externally supplied cleaning fluid in a strip shape to the surface of the object to be cleaned. The fine slit-like discharge port; and the discharge port is discharged by the cleaning fluid sprayed from the discharge port, and the cleaning unit is disposed in the direction in which the main object is moved in the direction of movement of the α-object, and the cleaning unit斟 斟 从 相对 相对 相对 相对 相对 相对 104 104 104 104 104 104 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 915 The front end portion of the object surface is expelled by a factor of one opening cross-sectional area. (2) In addition to the 'invention of the invention', the county-style virtual county contains two lines of the object to be cleaned, and the upper and lower sides are symmetrically arranged on the upper side, the upper side is 乩β冼 early 70, and the above two cleaning units are There is a common discharge port, and the opening cross-sectional area of the discharge opening of the receiving port with respect to the cleaning fluid is greater than a positive multiple of ! In the wet processing apparatus of the present invention, the cross-sectional shape of the contact surface which is in contact with the cleaning fluid which is orthogonal to the discharge port of the object to be cleaned is formed from the tip end portion of the discharge port to the outlet of the discharge port. The arcuate shape has an opening corresponding to the width of the object to be cleaned, and the plurality of ends are in contact with the elastic body of the external fixing plate to support the cleaning unit. The elastomer incorporates a variable control mechanism that can change its modulus of elasticity. W corresponds to the cleaning = element weight in the variable control mechanism that is previously input to the elastic coefficient, and the elastic body can be controlled by the elastic coefficient of (4). The elastic coefficient can be used in the control mechanism to include a flow sensor for detecting the flow rate of the cleaning fluid supplied from the supply port, whereby the flow coefficient can be input by the input device. The variable control mechanism controls the elastic modulus of the elastomer. Further, the variable coefficient control mechanism includes a gap sensor for detecting a gap between the cleaning unit and the surface of the object to be cleaned, whereby the modulus of elasticity of the signal can be detected by inputting the gap sensor The control mechanism controls the elastic modulus of the elastomer. Further, the variable coefficient control means for elastic modulus includes a detected object detecting device for detecting the presence or absence of the object to be cleaned, whereby the input can be washed by 1049 丨 5.doc -10- 1290738 The variable control mechanism of the elastic coefficient of the 感 丨〇 & & & 丨〇 丨〇 丨〇 丨〇 , , , , , 。 。 。 。 。 。 可变 可变 可变 可变 可变 可变 可变 可变 可变 可变Further, in the "invention", the cleaning unit includes a stopper, and the stopper is used for cleaning! The operation is performed when the gap of the surface of the object to be cleaned is below a certain interval, and "month wash sheet 7L pack 3 adds the cleaning fluid to be supplied, and then supplies the star fruit to the supply port, and the suction is discharged from the discharge port. Any one of the suction pumps for cleaning fluid, or both. [Effect of the Invention] According to the present invention, the opening π area of the supply port of the cleaning body supplied from the cleaning material to the surface of the object to be cleaned before the front end portion (4) is supplied, is larger than! The positive number is the opening area of the double, and the flow rate of the cleaning material supplied to the receiving port of the supply port is further accelerated, so that the fluid of the strip-shaped cleaning fluid with a high flow rate can directly stain the surface of the object to be cleaned. And the material is removed, and the material is discharged from the discharge port: the high flow rate generated by the strip cleaning fluid, and the cleaning unit 2 'because of its action' will cause the discharge port to approach the object to be cleaned. The closer the distance from the discharge port is to zero, the smaller the distance between the gravitational forces is, and the flow velocity of the body of the cleaning fluid increases, so the flow of force acting on the particles such as sweat is further increased. Enhance the effect of the 嗖 嗖 物 物 物 。 。 。 。 。 。 。 。 。 。 Furthermore, the suction force of the discharge port is also applied to the gravitational force. According to the present invention, the two cleaning units are opposed to each other (4), ": the front end portion of the cleaning fluid is sprayed toward the surface of the object to be cleaned, and the opening area of the mouth is received with respect to the supply port of the cleaning fluid supplied from the crucible. , l_l5.doc 1290738 has a positive area greater than 1 times the opening area, so the strip-shaped cleaning fluid sprayed by the two spouts can directly hit and remove the dirt on the surface of the object to be cleaned. Efficiently sucking and discharging at the central discharge port, and providing a cleaning fluid that surrounds the cleaning area of the object to be cleaned by two discharge ports, so that the cleaning fluid and the removed dirt are not removed. Further, according to the present invention, the mutually opposite discharge ports are symmetrically arranged with respect to the discharge/discharge, so that the high-speed flow belt/month washing body is discharged from the two discharge ports. The sweat that has been directly hit and removed on the surface of the object to be cleaned is merged in the vicinity of the center of the discharge port in the center of each of the discharge ports, thereby efficiently sucking and discharging, and being installed by being surrounded by two discharge ports and being cleaned Moonlight Since the cleaning fluid is ejected in the region, the cleaning fluid and the removed contaminants are not diffused to the outside. According to the present invention, the outlet port has a larger than 1 area with respect to the supply port of the cleaning fluid. The positive opening times of the opening area, so the art cleaning fluid can be easily sucked and discharged, and the suction effect is obviously improved to the S-mouth of the same way as the previous method of providing the same cross-sectional area for the 2 outlets. According to the present invention, the discharge port has a length corresponding to the width of the object to be cleaned, and the contact surface with the cleaning fluid is perpendicular to the moving direction of the object to be cleaned, and the cross-sectional shape is from the front end portion of the discharge port to the outlet port. So far, the shape 岌 _ _ , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The flow of the fans will not be the only ones, and the war will be pumped out and can be sucked and discharged without leaving any residue. Therefore, the relative method of 104915.doc -12-1290738 should be the same way as the mouth and discharge port, the suction effect Obviously Further, according to the present invention, the plurality of springs (4) abutting against the external fixing plate support the cleaning unit, and therefore, the cleaning unit is cleaned by the 3-speed flow generated by the cleaning μ body sprayed from the discharge port. The generated negative pressure is replenished and the appropriate washing gap is maintained between the cleaned material and the object to be cleaned, so that the contact between the cleaning unit and the object to be cleaned can be automatically prevented from being broken, and the cleaning effect is stabilized and made The conveyance of the object to be cleaned is stable. The 'variable control mechanism including the elastic coefficient according to the date of the present month' can detect the viscosity of the adhesive which changes depending on the type of fluid used for cleaning and the liquid temperature during operation, and The viscosity and the liquid temperature are maintained at a proper gap between the cleaning unit and the object to be cleaned by the high-speed flow of the cleaning fluid discharged from the outlet port of the outlet port, so as to keep the gap between the cleaning unit and the object to be cleaned. It is possible to directly use the cleaning fluid that has been ejected from the discharge port to the high-speed flow on the object to be cleaned at an appropriate angle and distance, and directly hit the dirt on the surface of the object to be cleaned and remove it. White automatic classification and may prevent contact between the object to be cleaned and the cleaning unit breakage failure. Further, according to the present invention, the weight of the cleaning unit in the mechanism that is previously rotated into the elastic coefficient can be controlled by the elastic coefficient of any arbitrary coefficient of elasticity, even if various types of wet processing devices or cleaning fluids are selected. It is possible to change the weight of the clearing method; the weight of the cleaning unit can be controlled to maintain the gap between the cleaning unit and the object to be cleaned at a specific interval. Further, according to the present invention, the variable coefficient control means for the elastic coefficient includes flow sensing senses for detecting the flow rate of the cleaning fluid supplied from the supply ports facing each other 104915.doc - 13 - 1290738 and can be rotated by The variable control mechanism of the flow sensor detecting signal controls the elastic modulus of the elastic body, so that control can be performed to maintain the gap between the cleaning unit and the object to be cleaned at a specified flow rate at a specific interval, and even for cleaning The temperature, viscosity, or flow rate of the fluid changes, and the flow rate (flow rate) of the cleaning fluid can be appropriately controlled. Enter
而，即使停止供應清洗用流體，亦可自動防止清洗單元與 被清洗物間之接觸破損故障。 又，根據本發明，彈性係數之可變控制機構包含對上述 相互對向之供應口供應之清洗用流體溫度進行檢測的溫度 感測器，可藉由輸入有溫度感測器檢測訊號之上述可變控 制機構’對彈性體之彈性係數進行控制，因此，即使清： 用流體之溫度、#度產生變化，亦可藉由噴出口所喷出之 清洗用流體之高速流’追蹤清洗單元中產生之負壓之變 化，而使清洗單元與被清洗物之間一直保持於適當間隙^ 由此可使用一直以適當之角度與距離，由噴出口噴出至被 清洗物之高速流的清洗用流體，直接命中被清洗物表面之 ’于物亚將其去除’且可自動防止清洗單元與被清洗物間之 接觸破損故障。 ▼，人1工丨㈧仍^ >r得巴❺、對滑 單元與被清洗物之間隙進行檢測的間隙感測器，並 輸入有間隙感測器檢測訊號之可變控制機構，對彈性體 彈性係數進行控制，因此即使清洗單元與被清洗物間之I 隙瞬時改變’亦可維持於適當間隙，且可自動防止清洗」 I049l5.doc 1290738 元吳被清洗物間之接觸破損故障，同時可一直以適者角 j ’使用由喷出口所喷出至被清洗物之高速流的清二流 體，直接命中被清洗物表面之汙物並將其去除。 又，根據本發明，彈性係數之可變控制機構包含對被清 洗物之有無進行檢測的被清洗物檢測感測器，並藉由輸= 有被巧洗物感測器檢測訊號之可變控制機構，對彈性體之 彈性係數進行控制，以使清洗單元與被清洗物之間隙維持 於特定間隔’因此檢測濕式處理裝置中是否安裝有被清洗 物而並未安裝被清洗物之情形時，可維持清洗單元盥被 清洗物搬運台之間隙於特定間隔，由此自動防止接觸破損 故障，同時不會使供應清洗用流體等之供應裝置因不慎而 運行。 又，根據本發明，清洗單元具備有於清洗單元與被产 物間，間隙為特定間隔以下時運行之播止器，因此即^對 清洗單元與被清洗物之間隙進行控制之機構或感測器發生 異常情況’亦可藉由上述擋止器而維持不會使被清洗物破 損之間隙。 又’根據本發明’清洗單元包含對將要供應之清洗用流 體加塵後供應給供應口之加壓录，以及抽吸排出口所排出 之清洗用流體之抽吸系中的任一方或其雙方，因此根據清 洗用流體之黏度或溫度、被清洗物大小及形狀，而對加麼 泵或抽吸系之旋轉數等進行控制，藉此可將以噴出口所噴 出之高流速之帶狀清洗用流體直接命中而去除的被清洗物 表面之汙物，於排出口處高效地一舉抽吸排出。 104915.doc 15 1290738 持住。 再者，檢測上述清洗單元n與被清洗物8之間隙之未圖 示的間隙感測器及依據檢測被清洗物8之有無之未圖示的 被清洗物檢測感測器的檢測訊號，可改變上述彈性體。之 彈性係數之控制機構14配設於上述彈性體支持板13上。 _再者，上述清洗單元u具備有擋止，其於該清洗單 元11與被清洗物8之間隙為特定間隔以下時動作，且固著 φ 於彈性體支持板13或固定板5之任何一方上。 圖2中’由未圖示之系㈣後幫助水流之清洗用流體9供 應至供應口 2，自由供應口核心6與排出口核心7所構成之 喷出口 1〇朝向被清洗物8噴出流體喷射16。自大截面積處 供應至小截面積處之怪定流流速增大，藉由所喷出之流體 喷射16，較大之流體阻力對被清洗物8上附著之汙物等粒 子發揮作用，而將汙物等粒子去除。 此處上述喷出口 10相對於上述排出口 3而對稱配設， 驗因此被清洗物8由未圖示之搬運裝置而通過清洗單元11下 邛，藉此由分別向相反方向喷出之流體喷射Η所清洗，可 完全去除汙物等粒子。 再者，利用未圖示之抽吸泵將清洗用流體9排出之上述 排出3相對於上述清洗用流體9之供應口 2接收口之開 口口面積’係具有超過!之正數倍之開口面積的廣口者，因 此I由將上述分別向相反方向喷出之流體喷射1 6所清洗後 之含：汙物等粒子的清洗用流體9一舉排出，故即使高黏 、用机體9亦可容易地抽吸排出，且相較於供應 104915.doc 1290738 ’抽吸效果明顯提 口、排出口為同一截面積之先前方式 馬0 、☆且，根據上述之自大截面積處供應至小截面積處之怪定 ^机速增大而壓力減小的定義，即伯努利定理，喷出流體 噴：16之噴出口10附近壓力減小，相對於被清洗物8,清 洗單元11上作用有負壓。因此作用，使噴出口1〇靠近被清 洗物8表面之引力發揮作用。被清洗物8與噴出口⑺之間距 • 越接近零，此引力越大。此處，被清洗物8與噴出口 10之 ^距％小，並且清洗用流體9之流體噴射丨6流速增大，因 此作用於汙物等粒子上之流體作用力進一步加大，則將使 汙物等粒子自被清洗物8上脫離的效果增強。 又，上述排出口3，包含長度對應於上述被清洗物8寬度 之開口部，且其與清洗用流體9接觸之直交於上述被清洗 :勿8移動方向之接觸面的截面形狀，自上述喷出口⑺前端 P直至上述排出口 3出口為止，藉由排出口核心7而形成 • 圓弧狀。 因此，由長度對應於上述被清洗物8橫寬之細縫狀開口 部的噴出口 1〇所噴出之帶狀高速流清洗用流體噴射“之流 速亚不會損減，且可不留殘餘地抽吸並排出，並相比供應 :二排出口為同一截面積之先前方式，抽吸效果進而明顯 提高。 進而，由複數個彈性體12支持住上述清洗單元u，此彈 =體12用以使該清洗單元11與被清洗物8之間隙維持於特 定間隔，且一端抵接於外部固定板5上，因此，藉由噴出 104915.doc 18· 1290738 口 10所喷出之清洗用流體9產生之离、击 厓玍之阿速流，對清洗單元u 中產生之負壓進行補充，且清洗單元u與被清洗物8之間 -直保持有適當間隙’故而可自動防止清洗單元n與被清 洗物8間之接觸破損故障。 再者，上述彈性體12包含其彈性係數之可變控制機構 Η ’因此’可檢測因清洗用流體9品種的選擇而變化之黏 度以及運轉時之液溫，並根據黏度以及液溫，藉由 10所噴出之流體噴射16之高速流，追縱清洗單心中產生 之負壓之變化，而可使清洗單元η與被清洗物8之間一直 保持於適當_，因此可使用—直以適當角度，由喷出口 10喷出至破清洗物8之高速流的流體噴射16，直接命中被 清洗物8表面之汙物並將其去除’且可自動防止清洗單元 11與被清洗物8間之接觸破損故障。 對應於事先輸入至上述彈性係數之可變控制機構14中的 上述清洗單元11重量，可以任意之彈性係數對上述彈性體 12進行控制，因此即使選擇因各種濕式處理裝置、或清洗 用流體9種類而重量不同之清洗單元η，亦可輸入其重 畺而進行控制以使上述清洗單元11與被清洗物8之間隙 維持於特定間隔。 上述彈性係數之可變控制機構14，包含對上述相互對向 之供應口 2所供應之清洗用流體9的流量進行檢測之未圖示 的肌里感測器，並可藉由輸入有上述流量感測器檢測訊號 之上述彈性係數之可變控制機構14，對上述彈性體之彈性 係數進行控制，因此可進行控制以使指定流量值之上述清 104915.doc •19- 1290738 …u與被清洗物8之間隙維持於特定間隔，由此可以 f當角度與距離’㈣由噴出口 ίο噴出至被清洗物8之高 速^的清洗用流體噴射16，直接命中被清洗物8表面之汗 :字，、去除’且即使清洗用流體9之流量（流速）變化，戋 即使停止供騎洗料體9,村自動防止清洗單元⑽ 被清洗物8間之接觸破損故障。Further, even if the supply of the cleaning fluid is stopped, the contact failure between the cleaning unit and the object to be cleaned can be automatically prevented. Moreover, according to the present invention, the variable coefficient control means for elastic modulus includes a temperature sensor for detecting the temperature of the cleaning fluid supplied to the supply ports facing each other, and the above-mentioned variable can be detected by inputting a temperature sensor. The variable control mechanism 'controls the elastic coefficient of the elastic body, so even if it is clear: the temperature of the fluid and the change of the degree of #, the high-speed flow of the cleaning fluid sprayed by the discharge port can be traced to the cleaning unit. The change in the negative pressure keeps the cleaning unit and the object to be cleaned at an appropriate gap. Therefore, it is possible to use a cleaning fluid that is ejected from the discharge port to the high-speed flow of the object to be cleaned at an appropriate angle and distance. It directly hits the surface of the object to be cleaned and removes it from the object and automatically prevents contact failure between the cleaning unit and the object to be cleaned. ▼, person 1 work 八 (8) still ^ > r ❺ ❺, the gap sensor for detecting the gap between the sliding unit and the object to be cleaned, and input the variable control mechanism with the gap sensor detection signal, the elasticity The body elasticity coefficient is controlled, so even if the I gap between the cleaning unit and the object to be cleaned is instantaneously changed, 'the gap can be maintained at an appropriate gap, and the cleaning can be automatically prevented." I049l5.doc 1290738 The clear fluid discharged from the discharge port to the high-speed flow of the object to be cleaned can be used at the appropriate angle j ' to directly hit the dirt on the surface of the object to be cleaned and remove it. Further, according to the present invention, the variable coefficient control means for the elastic coefficient includes the object detecting sensor for detecting the presence or absence of the object to be cleaned, and is controlled by the variable control of the signal detected by the sensor sensor. The mechanism controls the elastic modulus of the elastic body so that the gap between the cleaning unit and the object to be cleaned is maintained at a specific interval. Therefore, when detecting whether the object to be cleaned is installed in the wet processing apparatus without installing the object to be cleaned, The gap between the cleaning unit and the object transporting table can be maintained at a specific interval, thereby automatically preventing the contact damage and the supply device for supplying the cleaning fluid or the like from being inadvertently operated. Further, according to the present invention, the cleaning unit is provided with a stopper that operates between the cleaning unit and the product, and the gap is a certain interval or less, so that the mechanism or sensor that controls the gap between the cleaning unit and the object to be cleaned is provided. The occurrence of an abnormality can also be maintained by the stopper to maintain a gap that does not damage the object to be cleaned. Further, according to the present invention, the cleaning unit includes one or both of the pressurization recordings for supplying the cleaning fluid to be supplied to the supply port, and the suction system for the cleaning fluid discharged from the suction discharge port. Therefore, according to the viscosity or temperature of the cleaning fluid, the size and shape of the object to be cleaned, the number of rotations of the pump or the suction system is controlled, thereby cleaning the strip at a high flow rate discharged from the discharge port. The dirt on the surface of the object to be cleaned which is directly hit by the fluid is efficiently sucked and discharged at the discharge port. 104915.doc 15 1290738 Hold. Further, a gap sensor (not shown) that detects a gap between the cleaning unit n and the object to be cleaned 8 and a detection signal of the object detection sensor that is not shown according to the presence or absence of the detected object 8 can be detected. Change the above elastomer. The elastic coefficient control mechanism 14 is disposed on the above-described elastic body supporting plate 13. Further, the cleaning unit u is provided with a stopper that operates when the gap between the cleaning unit 11 and the object to be cleaned 8 is equal to or smaller than a predetermined interval, and fixes φ to either the elastic support plate 13 or the fixed plate 5 on. In Fig. 2, the cleaning fluid 9 for assisting the flow of water is supplied to the supply port 2 by a system (four) not shown, and the discharge port 1 of the free supply port core 6 and the discharge port core 7 is ejected toward the object to be cleaned 8 to eject a fluid jet. 16. The flow rate of the strange constant flow supplied from the large cross-sectional area to the small cross-sectional area is increased, and by the fluid jet 16 ejected, the larger fluid resistance acts on particles such as dirt adhering to the object to be cleaned 8, and Remove particles such as dirt. Here, the discharge port 10 is disposed symmetrically with respect to the discharge port 3, and therefore, the object to be cleaned 8 is slid by the cleaning unit 11 by a conveyance device (not shown), thereby ejecting the fluids respectively ejected in opposite directions. It is cleaned and completely removes particles such as dirt. Further, the discharge port 3 through which the cleaning fluid 9 is discharged by a suction pump (not shown) has an opening area larger than the positive opening area of the receiving port 2 of the cleaning fluid 9 Therefore, I can discharge the cleaning fluid 9 containing particles such as dirt after the fluid jets 16 which are respectively ejected in the opposite directions are discharged, so that the body 9 can be used even if it is highly viscous. Easily pumped out, and compared to the supply of 104915.doc 1290738 'the suction effect is obviously lifting, the discharge port is the same way as the previous section of the horse 0, ☆ and, according to the above-mentioned self-large cross-sectional area supply to the small section The definition of the area is determined by the increase in the speed of the machine and the decrease in pressure, that is, Bernoulli's theorem, the pressure near the discharge port 10 of the discharge fluid spray: 16 is reduced, and the action is performed on the cleaning unit 11 with respect to the object to be cleaned 8. There is negative pressure. Therefore, the action is such that the discharge port 1 is brought close to the gravitational force of the surface of the object 8 to be cleaned. The distance between the object to be cleaned 8 and the discharge port (7) is closer to zero, and the gravitational force is larger. Here, the distance % between the object to be cleaned 8 and the discharge port 10 is small, and the flow rate of the fluid injection port 6 of the cleaning fluid 9 is increased, so that the fluid force acting on the particles such as dirt is further increased, which will cause The effect of particles such as dirt being detached from the object 8 to be cleaned is enhanced. Further, the discharge port 3 includes an opening portion having a length corresponding to the width of the object to be cleaned 8, and is in contact with the cleaning fluid 9 in a cross-sectional shape orthogonal to the contact surface of the cleaning direction: The front end P of the outlet (7) is formed in an arc shape by the discharge port core 7 up to the outlet of the discharge port 3. Therefore, the flow rate of the strip-shaped high-speed flow cleaning fluid which is ejected from the discharge port 1〇 whose length corresponds to the slit-shaped opening portion whose width is widened by the object to be cleaned 8 is not lost, and can be left without leaving residue. Suction and discharge, and the suction effect is further improved compared to the previous method of supplying the second discharge port to the same cross-sectional area. Further, the cleaning unit u is supported by a plurality of elastic bodies 12 for making the body 12 The gap between the cleaning unit 11 and the object to be cleaned 8 is maintained at a specific interval, and one end abuts against the external fixing plate 5, and thus is generated by discharging the cleaning fluid 9 discharged from the port 104915.doc 18· 1290738 10 The A-speed flow from the cliff is supplemented, and the negative pressure generated in the cleaning unit u is supplemented, and the cleaning unit u and the object to be cleaned 8 are kept in a proper gap, so that the cleaning unit n can be automatically prevented from being cleaned. The contact damage of the object 8 is broken. Further, the elastic body 12 includes a variable control mechanism of the elastic coefficient 因此 'so' can detect the viscosity which changes due to the selection of the cleaning fluid 9 and the liquid temperature during operation, and according to Degree and liquid temperature, by the high-speed flow of the fluid jet 16 discharged by 10, the change of the negative pressure generated in the cleaning single core is traced, so that the cleaning unit η and the object to be cleaned 8 can be kept at an appropriate level, so It is possible to use a fluid jet 16 which is ejected from the discharge port 10 to the high-speed flow of the washing material 8 at an appropriate angle, directly hits the dirt on the surface of the object to be cleaned 8 and removes it, and automatically prevents the washing unit 11 from The contact damage between the objects to be cleaned 8 is broken. The elastic body 12 can be controlled by an arbitrary elastic coefficient in accordance with the weight of the cleaning unit 11 which is previously input to the variable control mechanism 14 of the elastic coefficient, so that even if various types are selected The wet processing apparatus or the cleaning fluid η having a different weight and a different type of cleaning fluid may be input and controlled so that the gap between the cleaning unit 11 and the object to be cleaned 8 is maintained at a specific interval. The variable control unit 14 includes a muscle sensor (not shown) that detects the flow rate of the cleaning fluid 9 supplied from the supply port 2 facing each other, and can be borrowed. The variable control mechanism 14 having the above-mentioned elastic coefficient of the flow sensor detecting signal is input, and the elastic coefficient of the elastic body is controlled, so that the control can be performed to clear the specified flow value 104915.doc •19-12890738 ... The gap between the u and the object to be cleaned 8 is maintained at a specific interval, so that the surface of the object to be cleaned 8 can be directly hit by the cleaning fluid jet 16 which is ejected from the ejection port ίο to the object to be cleaned 8 by the angle and the distance '(4). Khan: word, and removal' and even if the flow rate (flow rate) of the cleaning fluid 9 changes, even if the washing body 9 is stopped, the village automatically prevents the cleaning unit (10) from being damaged by the contact between the cleaning objects 8.
上述彈性係數之可變控構14，包含對上述相互對向 ^共應π 2所供應之清洗用流體溫度進行檢測之未圖示的 的並可藉由輸人有上述溫度感測器檢測訊號之 上述彈性係數之可變控制機構14，對上述彈性體12之彈性 係數進行控制，因此即使清洗用流體之溫度、黏度或流動 速度f生變化，亦可對洗用流體9之流量（流速}進行適當控 藉由噴出口 1 〇所喷出之清洗用流體喷射i 6的高速流， k ‘/月洗單70 1丨中產生之負壓之變化，而可使清洗單元1 1 與被清洗物8之間一直保持於適當間隙，由此可以適當角The variability control 14 of the elastic coefficient includes a non-illustration for detecting the temperature of the cleaning fluid supplied by the mutual π 2 and can be detected by the input temperature sensor. The elastic coefficient variable control mechanism 14 controls the elastic coefficient of the elastic body 12, so that the flow rate (flow rate) of the washing fluid 9 can be changed even if the temperature, viscosity, or flow velocity f of the cleaning fluid changes. Proper control of the high-speed flow of the cleaning fluid jet i 6 ejected from the discharge port 1 ,, the change in the negative pressure generated in the k '/month wash sheet 70 1丨, so that the cleaning unit 1 1 can be cleaned The object 8 is kept at an appropriate gap, so that the angle can be appropriate
=與距離，使用由噴出口 10喷出至被清洗物8之高速流的 2洗用流體噴射16，直接命中被清洗物8表面之汙物並將 八厅、且了自動防止清洗單元11與被清洗物8間之接觸 破損故障。 上述彈性係數之可變控制機構14,包含對上述清洗單元 11 /、被α洗物8之間隙進行檢測之未圖示的間隙感測器， 並可藉由輸入有上述間隙感測器檢測訊號之上述彈性係數 之可變控制機構14，對上述彈性體12之彈性係數進行控 制因此即使清洗單元11與被清洗物8之間隙瞬時改變， 104915.doc * 20 - 1290738 亦可維持於適當„:，且可自動防止清洗單元_被清洗 物8間之接觸破損故障’同時可一直以適當角纟，使用由 :、 喷出至被清洗物8之高速流的流體噴射16，直接 咋中被清洗物8表面之汙物並將其去除。= and the distance, using the 2 washing fluid spray 16 discharged from the discharge port 10 to the high speed flow of the object to be cleaned 8, directly hitting the dirt on the surface of the object to be cleaned 8 and the eight halls, and the automatic cleaning unit 11 and The contact between the objects to be cleaned 8 is broken. The elastic coefficient variable control unit 14 includes a gap sensor (not shown) that detects the gap between the cleaning unit 11 and the α-washing material 8, and can detect the signal by inputting the gap sensor. The elastic coefficient variable control mechanism 14 controls the elastic modulus of the elastic body 12 so that even if the gap between the cleaning unit 11 and the object to be cleaned 8 is instantaneously changed, 104915.doc * 20 - 1290738 can be maintained at appropriate „: And the cleaning unit _ the contact damage between the cleaning unit 8 can be automatically prevented. At the same time, the fluid jet 16 discharged from the high-speed stream discharged to the object to be cleaned 8 can be used at a proper angle. The dirt on the surface of the object 8 is removed.
述彈f生係數之可變控制機構14，包含對被清洗物8之 有無進行檢測之未圖示的被清洗物檢測感測器，由此藉由 輸入有上述被清洗物感測器檢測訊號之上述可變控制機構 M’對上述彈性體之彈性係數進行控制，以使上述清洗單 元U與被清洗物8之間隙維持於特定間隔，因此檢測濕式 處理農置1中是否安裝有被清洗物8，而並未安裝被清洗物 ί月I時可維持上述清洗單元11與被清洗物8之未圖示 :搬運台之間隙於特定間隔’由此自動防止接觸破損故 Ρ早’同時不會使供應清洗用流體9等之供應裝置因不慎而 上述清洗單元11包含安裝於彈性體支持板13上之播止器 15 ’此彈㈣支持板13於上述清洗單元U與被清洗物k 間隙未特Μ隔以下時運行，因此即使對上述清洗單元Η 與被清洗：8之間隙進行控制之機構或感測器發生異常情 兄亦可藉由上述心止器ls抵接於彈性體支持板^或固定 板5之任意一方而維持不會使被清洗物_損之間隙。 上述清洗單元11包合盤Μ Φ & 、士 子將要ί、應之清洗用流體9加壓後 供應給供應口 2之未圖示 口不之加壓泵，以及抽吸排出口 3所排 出之清洗用流體9之未s + 4丄n e丄 衣圖不之抽吸泵中的任意一方，或其 兩者，因此根據上述清洗 …、 无用/爪體9之黏度或溫度、被清洗 104915.doc -21 - 1290738 物大小及形狀，而對加麼栗或抽吸果之旋轉數等進行控 制，藉此可將以噴出口 1 〇所嗜ψ 古、去 所噴出之咼流速之帶狀清洗用流 體噴射16直接命中而去除的被清洗物8表面之汗物，於排 出口 3處高效地一舉抽吸並排出。 [實施例2 ] 圖3係本發明之濕式處理裝置實施例。之清洗單元截面 圖0實施例2中，包含浩咮留& , f ^ 3 /月洗早兀11，此清洗單元11，並無上 述實施例!中配置於其左右’且含有相對排出口3而對稱配 设之相互對向的噴出口 1〇之供應口2的任意一方，而存在 有供應:及排出口各一個。上述清洗單元11，之特徵在於 〇 3將嘴出口 10所贺出之流體噴射16之清洗用流體9排出 的排出口 3 ’此噴出口1〇靠近被清洗物8之上方而配設，且 具有用以將帶狀清洗用流體9喷出至上述被清洗物8表面的 細縫狀開口部，且相剩_ JL^ »1 . 才對於外邛供應之清洗用流體9 口 2的開口截面積，ρ什皓山ιλ " 、 述贺出口 10之將上述清洗用流體9朝 ⑴倍的形狀。 其❹部’具有縮小為大於1之正 應至果加廢後’水流得以加速之清洗用流體9供 二二ϋ，繼而由供應口核心6與排出口核心7所構成 面Γ〇 ’將流體喷射16朝向被清洗物8噴出。自大截 出之=應至小截面積處之定常流流速增大，則藉由所喷 出之流體射〗& & 、 、 較大之流體作用力對被清洗物8上附著 之汗物等粒子發揮作用，由此將汗物等粒子去除。 於此，使用去- 用未圖不之抽吸泵將清洗用流體9排出之上述 104915.doc -22· 1290738 排出口 3，由排出口核心7與排出口核心7，構成，其相對於 上述清洗用流體9之供應口2之開口截面積，係具有大於i 之正數倍之開口截面積的廣口者，由此可將以上述噴出口 10所噴出之流體噴射16清洗後之含有汙物等粒子的清洗用 流體9—舉排出’因此即使高黏度之清洗用流體9，亦可容 易地抽吸並排出。 再者，上述排出口3，包含長度對The variable control means 14 for describing the coefficient of the fuse includes a detected object detecting sensor (not shown) for detecting the presence or absence of the object to be cleaned, thereby detecting the signal by inputting the object to be cleaned. The variable control mechanism M' controls the elastic coefficient of the elastic body so that the gap between the cleaning unit U and the object to be cleaned 8 is maintained at a specific interval. Therefore, it is detected whether or not the wet processing farm 1 is installed with the cleaning. The object 8 is not installed with the object to be cleaned. The cleaning unit 11 and the object to be cleaned 8 are not shown in the figure. The gap between the table and the object to be cleaned 8 is at a certain interval 'to thereby automatically prevent the contact from being damaged. The cleaning unit 11 for supplying the cleaning fluid 9 or the like may be inadvertently included in the cleaning unit 11 including the stopper 15 attached to the elastic body supporting plate 13. The elastic (four) supporting plate 13 is attached to the cleaning unit U and the object to be cleaned k When the gap is not below the interval, the mechanism or the sensor that controls the gap between the cleaning unit 被 and the cleaning unit 8 can be abutted by the elastic body support by the above-mentioned heart stopper ls. Board ^ or Either fixed plate 5 so that the gap is maintained without loss of _ cleaned. The cleaning unit 11 includes a pressure pump (not shown) that is supplied to the supply port 2 and a suction pump outlet 3 that is pressurized by the cleaning fluid 9 Any one of the suction fluids 9 of the cleaning fluid 9 or the suction pump, or both thereof, is cleaned according to the above-mentioned cleaning, uselessness/viscosity or temperature of the claws 9, 104915. Doc -21 - 1290738 The size and shape of the object, and the number of rotations of the chestnut or the sucking fruit are controlled, so that the strip can be cleaned by the ejecting port 1 The sweat on the surface of the object to be cleaned 8 which is directly hit by the fluid jet 16 is efficiently sucked and discharged at the discharge port 3 in one shot. [Embodiment 2] Fig. 3 is an embodiment of a wet processing apparatus of the present invention. FIG. 2 is a cross-sectional view of the cleaning unit. In the second embodiment, the cleaning unit 11 is included, and the cleaning unit 11 is not disposed in the above-mentioned embodiment! 3, and one of the supply ports 2 of the discharge ports 1 that are symmetrically disposed to each other is provided, and there is one supply and one discharge port. The cleaning unit 11 is characterized in that the sputum 3 is disposed at a discharge port 3 that discharges the cleaning fluid 9 of the fluid injection 16 from which the nozzle outlet 10 is ejected, and the discharge port 1 is disposed above the object to be cleaned 8 and has The slit-shaped opening portion for ejecting the strip-shaped cleaning fluid 9 onto the surface of the object to be cleaned 8 and having _ JL^ »1 is the opening cross-sectional area of the cleaning fluid 9 for the outer crucible , 什什皓山 ιλ " , and the outlet 10 is in the shape of (1) times the cleaning fluid 9 described above. The crotch portion 'has reduced to more than 1 and should be added to the waste water after the water flow is accelerated. The cleaning fluid 9 is supplied to the second and second, and then the supply port core 6 and the discharge port core 7 constitute a surface. The jet 16 is ejected toward the object 8 to be cleaned. From the large cutout = the flow rate of the constant flow at the small cross-sectional area is increased, and the sweat adhered to the object to be cleaned 8 by the fluid sprayed by the sprayed fluid && Particles such as particles act to remove particles such as sweat. Here, the above-mentioned 104915.doc -22· 1290738 discharge port 3 for discharging the cleaning fluid 9 by a suction pump, which is not shown, is constituted by the discharge port core 7 and the discharge port core 7, which are opposite to the above The opening cross-sectional area of the supply port 2 of the cleaning fluid 9 is a wide mouth having an opening cross-sectional area larger than a positive multiple of i, whereby the fluid spray 16 discharged from the discharge port 10 can be cleaned and contaminated. The cleaning fluid 9 for particles such as particles is discharged. Therefore, even the high-viscosity cleaning fluid 9 can be easily sucked and discharged. Furthermore, the above discharge port 3 includes a length pair
度之開口部，且其與清洗用流體9接觸之直交於上述被清 ，物8移動方向之接觸面的截面形狀，自上述噴出口㈣ 端部直至上述排出口 3出口為止，藉由排出口核心7而形成 為圓弧狀。其他結構以及作用與實施例1相同》 :施:U、2中’本發明之半導體晶圓等之濕式處理裝置 的/月洗單7L 1 1、i i，，皆靠近被清洗物8之上方而配設，但 亦可上下與貫施例1、2相反，將清洗單元丨丨 清洗之下方而配設。 11靠近被 此處’至於構成清洗單元11之供應口核心6以及排出口 :心7的材料’可自高純度玻璃狀碳素、不銹鋼、石英、 用氧化銘等陶究，或者紹、及其合金、#、鎮等中 k擇使用°使用不錄鋼作為通f之清洗處理中所用 :已：夠’但若清洗液係相對較強之酸或氯敦用 由監寶石或氧化紹等陶㈣成之材料，此等 渴吏： 理液之耐腐蝕性好， ”、、式處 面較為理想。了防“化’因此在進行濕式處理方 [產業上之可利用性] 104915.doc -23- 1290738 本發明之〉蟲式τ田 …、穴處理裝置係簡化裝置者，其並不使用超磬 波裝置，且自身开…“ ^ 曰荠形成凊洗用流體之高速流，而將清洗後清 洗用机體之排出口設為廣口形狀，由此易於抽吸高黏度液 胆且中央叹有拼出口、兩側設有供應口，由此防止殘邊 殘留’並利用高速流之負壓與彈簧等彈性體而防止基板等 被清洗物與清洗單元接觸，故而具有產業上可利用性。 【圖式簡單說明】 圖1係本發明 體圖。 之濕式處理裝置實施例丨之清洗單元外 觀立 圖 圖2係圖丨所示之清洗單元之Α_Α，截面圖。 圖3係本發明之濕式處理裝置實施例2之清洗單 元截面 結構 圖4係說明具備先前清洗喷嘴之用於濕式處理之 例的截面圖。 【主要元件符號說明】 1 2 3 4 5 6 7 8 9 濕式處理裝置 供應口 排出口 安裝板 固定板 供給口核心 排出口核心 被清洗物 清洗用流體 104915.doc 1290738a portion of the opening that is in contact with the cleaning fluid 9 and intersects with the cleaning surface, and the cross-sectional shape of the contact surface in the direction in which the object 8 moves, from the end of the discharge port (four) to the outlet of the discharge port 3, through the discharge port The core 7 is formed in an arc shape. Other structures and operations are the same as those in the first embodiment: In the U:2, the monthly washing table 7L 1 1 and ii of the wet processing apparatus of the semiconductor wafer of the present invention are both above the object to be cleaned 8 In addition, it may be arranged in the opposite direction to the first and second embodiments, and the cleaning unit is disposed below the cleaning unit. 11 is close to the material of the supply port core 6 and the discharge port of the cleaning unit 11: the material of the heart 7 can be obtained from high-purity glassy carbon, stainless steel, quartz, oxidized, etc., or Alloy, #, town, etc. in the use of ° ° use of non-recorded steel as used in the cleaning process: already: enough 'but if the cleaning liquid is relatively strong acid or chlorine used by the gemstone or oxidized Shao pottery (4) Materials, such as thirst: The corrosion resistance of the chemical liquid is good, and the "," type is ideal. The anti-"chemical" is therefore in the wet processing method [industrial availability] 104915.doc -23- 1290738 The worm-type τ field..., the hole treatment device of the present invention is a simplified device, which does not use a super-chopper device, and opens itself... "^ 曰荠 forms a high-speed flow of the rinsing fluid, and After the cleaning, the discharge body of the cleaning body is set to have a wide mouth shape, thereby facilitating the suction of the high-viscosity liquid bladder and the center sighing with the outlet, and the supply ports on both sides, thereby preventing the residual edge from remaining and using the high-speed flow. An elastic body such as a negative pressure and a spring prevents the substrate and the like from being washed and cleaned Fig. 1 is a perspective view of the present invention. Fig. 2 is a schematic view of the cleaning unit of the embodiment of the wet processing apparatus. Fig. 2 is a cleaning unit shown in Fig. Fig. 3 is a cross-sectional view showing a cleaning unit of a wet processing apparatus according to a second embodiment of the present invention. Fig. 4 is a cross-sectional view showing an example of a wet cleaning apparatus having a conventional cleaning nozzle. 2 3 4 5 6 7 8 9 Wet treatment device supply port discharge port mounting plate fixing plate supply port core discharge port core cleaning fluid cleaning fluid 104915.doc 1290738
ίο 11、1Γ 12 13 14 15 16 101 102 103 103a 103b 104 104a 104b 105 106 107 108 109 W W1 噴出口 清洗單元 彈性體 彈性體支持板 彈性係數之可變控制機構 擋止器 流體喷射 超聲波清洗裝置 清洗液 導入通道 導入口 第1開口部 排出通道 排出口 第2開口部 振動板 連接部 處理區域 超聲波振子部分 超聲波振子 被處理基板 被清洗面 104915.doc -25 -Ίο 11,1Γ 12 13 14 15 16 101 102 103 103a 103b 104 104a 104b 105 106 107 108 109 W W1 Outlet cleaning unit Elastomer Elastomer support plate Elastic coefficient variable control mechanism Stopper Fluid jet Ultrasonic cleaning device cleaning Liquid introduction channel introduction port 1st opening part discharge channel discharge port 2nd opening part Vibrating plate connection part Processing area Ultrasonic vibrator part Ultrasonic vibrator to be processed substrate to be cleaned surface 104915.doc -25 -