CN1751813A - Wet treater - Google Patents
Wet treater Download PDFInfo
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- CN1751813A CN1751813A CNA2005101075025A CN200510107502A CN1751813A CN 1751813 A CN1751813 A CN 1751813A CN A2005101075025 A CNA2005101075025 A CN A2005101075025A CN 200510107502 A CN200510107502 A CN 200510107502A CN 1751813 A CN1751813 A CN 1751813A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
Abstract
To provide a wet treatment apparatus provided with a washing nozzle which is easy in the suction of a high viscosity fluid without using any ultrasonic wave, and has no left-over residue. A washing unit 11 arranged in the vicinity of a surface of a material to be washed 8, and having a supply port 2 with a slit discharge port 10 to discharge a fluid for cleaning 9 supplied from the outside in a belt shape on the surface of the material to be washed 8, and an outlet 3 discharging the fluid for cleaning 9 discharged from the discharge port 10 is provided. The washing unit where the cross-sectional area of the discharge port 10, the opening cross-sectional area of a tip portion to discharge the fluid for cleaning 9 toward the surface of the material to be washed 8, to the opening cross-sectional area of a supply port socket portion of the fluid for cleaning 9 supplied from the outside is one time a positive number exceeding one is arranged in a direction perpendicular to the moving direction of the material to be washed 8.
Description
Technical field
The relevant wet treater of the present invention with cleaning assembly that surfaces such as semiconductor wafer and glass substrate are cleaned.
Background technology
In the manufacturing of electronic equipments such as semiconductor equipment, semiconductor device and LCD panel, must have in its manufacturing process conduct is cleaned the semiconductor wafer of thing and the operation that glass substrate carries out cleaning treatment.In matting, in order to remove the various removal object materials in the manufacturing process, use various cleaning fluids such as ultra-pure water, electrolytic ionic water, Ozone Water, hydrogen water to clean, these cleaning fluids supply on the substrate from the nozzle of cleaning device.
; for the general cleaning of present use for the wet treater of nozzle; for example; cleaning fluids such as use electrolytic ionic water clean the substrate of 500mm side, and the remaining quantity of the foreign matter (particulate) on the substrate after finishing when the cleaning of carrying out with this cleaning fluid with the flushing that the flushing rinse water is carried out wishes to reach 0.5/cm
2The cleannes of level must be used about 25～30 liters/minute cleaning fluid and flushing cleaning fluid so.
Therefore, there is scheme to propose, can significantly cuts down the method that nozzle is used in the cleaning cleaning fluid use amount, that use the liquid economizing type, also use ultrasonic generator simultaneously, utilize its vibration wave removing the device that the object material is removed than existing method.
Fig. 4 is the profile that the configuration example that the wet process with existing washer jet is used is described.As shown in Figure 4, the cleaning of this formation is with nozzle 101, is provided with to have for the importing path (ingress pipe) 103 of the introducing port 103a that at one end imports cleaning fluid (treatment fluid) 102 and have at one end the cleaning fluid (the discharge liquid of the treatment fluid after the wet process) after cleaning being discharged to the drain passageway (discharge pipe) 104 of outside outlet 104a.
These other ends separately that import path 103 and drain passageway 104 link, formed linking part 106, on this linking part 106, also be provided with the 1st peristome (inlet opening part) 103b of importing path 103 openings and the 2nd peristome (outlet opening portion) 104b of drain passageway 104 openings simultaneously with opposite face 105a relative with processed substrate (being cleaned thing) W.This nozzle is called as push-pull type nozzle (flow saving type nozzle).Its opening of peristome 103b104b of the 1st and the 2nd is towards processed substrate W.Space between linking part 106 and processed substrate W has formed the process field 107 of carrying out wet process.
And then, on linking part 106, be provided with at processed substrate W and be cleaned in the process, for the cleaning fluids 102 in the process field 107 being carried out the ultrasonic vibrator part 108 of ultrasonic vibration.This ultrasonic vibrator part 108 is arranged on the interarea of oscillating plate (vibration section) 105 and oscillating plate 105, and possesses the ultrasonic vibrator 109 that oscillating plate 105 is carried out ultrasonic vibration.Ultrasonic vibrator 109 is electrostriction elements such as PZT, receives the ultrasonic frequency electronic signal and ultrasonic vibration takes place from oscillator.This ultrasonic vibrator 109, utilizing with epoxy resin is that the adhesive of purposes such as the ultrasonic vibrator of main component is bonding is engaged with on the oscillating plate 105.
As the material that constitutes oscillating plate 105, can perhaps select for use in the materials such as aluminium and alloy thereof, titanium, magnesium from ceramic materials such as high purity glass shape carbon, stainless steel, quartz, sapphire, alumina.When the employed wet process of common cleaning treatment is provided with oscillating plate on nozzle, material as this oscillating plate 105, use stainless steel just enough, but when cleaning fluid is more intense acid and fluoric acid, constitute by ceramic materials such as sapphire or alumina, owing to wet process liquid is had excellent patience, and can prevent deterioration, so be more satisfactory for wet process.
In addition, ultrasonic vibrator 109, the ultrasonic vibration of exportable 20kHz～10MHz range frequencies, this is for wet process, aspect practical is more satisfactory, and particularly from the viewpoint of the thickness of retainable processing liquid layer, frequency reaches more than the 0.2MHz then better.In addition, the wavelength X of ultrasonic vibration in oscillating plate 105 that ultrasonic vibrator 109 takes place when using the oscillating plate 105 of stainless steel (SUS316L), is about 0.6mm to about 300mm scope.
If the wavelength of ultrasonic vibration in this oscillating plate 105 that ultrasonic vibrator 109 takes place is λ, the thickness of slab size T of oscillating plate 105 so shown in Figure 4 is: T=(n soil 0.1) λ/2 (n is the integer greater than 2 in the formula).The value of n is generally 3～7, and particularly 5 is best.Here, T is as λ ± 0.3mm, 3 λ/2 ± 0.3mm, 5 λ/2 ± 0.3mm, 7 λ/2 ± 0.3mm for the thickness of slab size, is set in the scope with certain amplitude for each numerical value.Conditions such as variations in temperature have been considered in this setting.Set thickness of slab size T like this, just can propagate ultrasonic vibration effectively from ultrasonic vibrator 109, carry out wet process if use the cleaning that has possessed ultrasonic vibrator part 108 with nozzle 101, ultrasonic vibration (ultrasonic energy) can fully append on the cleaning fluid 102 so, thereby can carry out wet process effectively.
Also have, in drain passageway 104 sides, be provided with pressure control part (omitting among the figure), the pressure of this pressure control part (treatment fluid recovering mechanism) by the cleaning fluid that makes the 1st peristome 103b and contact with atmosphere (surface tension that also comprises the face that is cleaned of the surface tension of cleaning fluid and processed substrate) and atmospheric pressure average out, so that the cleaning fluid 102 that contacts with processed substrate W flows to drain passageway 104 after cleaning.Above-mentioned pressure control part is made of the drawdown pump that is located at outlet 104a side.
Therefore, the pressure control part of drain passageway 104 sides uses drawdown pump, attract the power of the cleaning fluid of linking part 106 to control to this drawdown pump, thereby the pressure (surface tension that also comprises the face that the is cleaned W1 of the surface tension of cleaning fluid and processed substrate W) and the atmospheric pressure of the cleaning fluid that the 1st peristome 103b contacts with atmosphere are averaged out.
That is to say, pressure P w by cleaning fluid that the 1st peristome 103b is contacted with atmosphere (surface tension that also comprises the face that the is cleaned W1 of the surface tension of cleaning fluid and substrate W) and the relation of atmospheric pressure Pa are made as Pw Pa, the cleaning fluid that is fed into processed substrate W and contacts by the 1st peristome 103b so with processed substrate W, can not leak in the outside of cleaning with nozzle, be discharged to drain passageway 104.
Promptly supply to cleaning fluid on the processed substrate W, do not contact the part outside the part of having supplied with cleaning fluid (the 1st and the 2nd peristome 103b104b) on the processed substrate W, and remove from substrate W from cleaning with nozzle.In addition, the prior art of relevant this cleaning with nozzle disclosed, such as enumerating patent documentation 1.
[patent documentation 1] spy opens the 2003-158110 communique
Summary of the invention
The problem that needs solution
; the cleaning nozzle of above-mentioned existing liquid economizing type; owing to use drawdown pump roughly to keep balance to carry out cleaning treatment while pressure that makes cleaning fluid and atmospheric pressure; so the inhalation power to cleaning fluid with high viscosity is lower, by cleaning with often bringing a large amount of residues behind the nozzle.
In addition, in ultrasonic cleaning equipment, because what adopt is the combination cleaning way that utilizes the ultrasonic wave agent to make the physics cleaning in the dirt dispersing liquid reasoningly and carry out Chemical cleaning by chemical actions such as selected cleaning fluid utilization dissolving and emulsifications, so need control to the spread speed of sound wave in various cleaning fluids, and need control liquid depth by the liquid temperature, in addition, also need particle diameter according to dirt kind and particulate, clean the kind and the shape of thing, the kind of cleaning fluid is to the mechanism of complexity such as ultrasonic frequency manages, therefore, it exists the accident that contacts and the ultrasonic transmitter fault that thing and washer jet are cleaned in easy generation, and then the problem that causes installation cost rising etc. to solve.
The objective of the invention is to, provide one not use ultrasonic wave, also suck high viscosity fluid easily, and have the wet treater of the washer jet that the residue residue is removed.
Solve the means of problem
To achieve these goals, the present invention is with the following feature that constitutes.Being that wet treater of the present invention is following makes.
(1) possesses, set and have a supply port near the surface that is cleaned thing for the discharge opening of finedraw shape that the washing fluid of supplying with from the outside is spued to the surface that is cleaned thing with band shape, cleaning assembly with the outlet that the washing fluid that spues from discharge opening is discharged
The sectional area of discharge opening, the open profile of accepting oral area with respect to the supply port of the washing fluid of supplying with from the outside is long-pending, it is for to have an open profile that surpasses 1 positive number/one times long-pending to being cleaned leading section that the thing surface spues washing fluid, and the cleaning assembly of formation thus is configured on the direction vertical with the moving direction that is cleaned thing.
(2) in addition, wet treater of the present invention, there are 2 near being cleaned the above-mentioned cleaning assembly that thing surface and left-right symmetry set, has common outlet between above-mentioned 2 above-mentioned cleaning assemblies, the open profile of outlet is long-pending, be the open profile of birdsmouth of washing fluid long-pending surpass 1 positive several times.
(3) in addition, wet treater of the present invention, with the above-mentioned section shape that is cleaned the moving direction contact-making surface vertical, that contact with washing fluid of thing of outlet, from the leading section of discharge opening to outlet to go out interruption-forming circular-arc, and have length and the width corresponding opening portion that is cleaned thing, and cleaning assembly is supported on the external stability plate by a plurality of elastomers that an end joins.Elastomer has the adjustable mechanism of its coefficient of elasticity.
(4) above-mentioned elastomer is controlled with coefficient of elasticity arbitrarily according to the weight of the cleaning assembly in the adjustable mechanism that is prior-entered at coefficient of elasticity.The adjustable mechanism of coefficient of elasticity has the flow sensor that the flow to the washing fluid of supplying with from supply port detects, and the adjustable mechanism of coefficient of elasticity that elastomeric coefficient of elasticity utilization has been transfused to the detection signal of flow sensor controls.
In addition, the adjustable mechanism of coefficient of elasticity, have cleaning assembly and be cleaned the gap sensor that the gap on thing surface is detected, the adjustable mechanism of coefficient of elasticity that elastomeric coefficient of elasticity utilization has been transfused to the detection signal of gap sensor controls.
Have, the adjustable mechanism of coefficient of elasticity has for detection is cleaned the quality testing that is cleaned that thing has or not and surveys sensor again, and the adjustable mechanism that elastomeric coefficient of elasticity utilization has been transfused to the coefficient of elasticity of the detection signal that is cleaned the thing sensor controls.
And then, in the present invention, the block that cleaning assembly moves when having in cleaning assembly and the gap that is cleaned the thing surface less than specified gap, and this cleaning assembly, have that washing fluid that the subtend supply port supplies with pressurizes and the force (forcing) pump supplied with and suction pump that the washing fluid of discharging from outlet is attracted any one, perhaps both have both.
The invention effect
Utilize words of the present invention, discharge opening, accept the aperture area of oral area with respect to the supply port of the washing fluid of supplying with from the outside, washing fluid had the aperture area that surpasses 1 positive number/one times to being cleaned its leading section that the thing surface spues, accept the flow velocity of the washing fluid of oral area with respect to being fed into supply port like this, the speed that spues is further quickened, can directly impact the dirt that is cleaned the thing surface and remove with the banded washing fluid of the high velocity stream that is accelerated, and because of negative pressure takes place at cleaning assembly in the formed high velocity stream of washing fluid of the band shape that spues from discharge opening, under its effect, discharge opening is subjected to being cleaned by furthering the graviational interaction on thing surface.This gravitation with the distance that is cleaned thing and discharge opening approaching more zero big more.Here because along with the distance that is cleaned thing and discharge opening is dwindled, the flow velocity of the fluid hydrojet of washing fluid increases, further increase, break away from the effect that is cleaned thing thereby strengthen particles such as making foul so act on the fluid drag of particles such as foul.In addition, this gravitation also will add the attraction of outlet.
In addition, utilize words of the present invention, because 2 discharge openings that cleaning assembly is relative, accept the aperture area of oral area with respect to the supply port of the washing fluid of supplying with from the outside, washing fluid had the aperture area that surpasses 1 positive number/one times to being cleaned its leading section that the thing surface spues, so the dirt that is cleaned the thing surface that can directly impact the banded washing fluid of using the high velocity stream that spues from 2 discharge openings and remove sucks at one stroke effectively at the outlet of central authorities and discharges, and since can with 2 discharge openings surround be cleaned thing the cleaning field with the washing fluid that spues, so can not be diffused into the outside to the dirt of washing fluid and removal.
In addition, utilize words of the present invention, because the relative outlet symmetry of above-mentioned relative discharge opening sets, so the banded washing fluid of the high velocity stream that spues from 2 discharge openings directly impacts and the dirt that is cleaned the thing surface removed collaborates near being positioned at the central authorities of the outlet of discharge opening middle position separately, can suck discharge to them at one stroke effectively, and since can with above-mentioned 2 discharge openings surround be cleaned thing the cleaning field with the washing fluid that spues, so can not be diffused into the outside to the dirt of washing fluid and removal.
Also have, utilize words of the present invention, since its aperture area of outlet be washing fluid the supply port birdsmouth surpass 1 positive several times, even discharge so full-bodied washing fluid also can be easy to suck, and the existing mode identical with the outlet sectional area with supply port compared, and suction efficiency improves by leaps and bounds.
Have again, utilize words of the present invention, because outlet, vertical with the moving direction that is cleaned thing, the section shape of the contact-making surface that contacts with washing fluid, from the discharge opening leading section to above-mentioned outlet to go out interruption-forming circular-arc, and have length and the width corresponding opening portion that is cleaned thing, so the flow velocity of the banded washing fluid high velocity stream that spues from the discharge opening of the length finedraw shape peristome corresponding with the width that is cleaned thing can not lose, and can have no the ground of omission and suck discharge, the existing mode identical with the outlet sectional area with supply port compared, and suction efficiency is improved by leaps and bounds.
In addition, utilize words of the present invention, because cleaning assembly, the a plurality of elastomers that joined by an end are supported on the external stability plate, so can be to subsidizing in the negative pressure that cleaning assembly takes place because of the formed high velocity stream of the washing fluid that spues from discharge opening, and cleaning assembly and be cleaned between thing and can often keep suitable gap so can automatically prevent cleaning assembly and be cleaned the contact damage accident of thing, obtains cleaning performance simultaneously and is cleaned the stability of thing conveyance.
In addition, utilize words of the present invention, because elastomer, adjustable mechanism with its coefficient of elasticity, so the liquid temperature when viscosity that can change the kind because of the selection washing fluid and running detects, and to the negative pressure that takes place at cleaning assembly because of the formed high velocity stream of the washing fluid that spues from discharge opening because the variation that viscosity and liquid temperature produce follow, so that cleaning assembly and be cleaned and often remain on suitable gap between thing, thereby can be cleaned the normal washing fluid that keeps suitable angle and distance to use the high velocity stream that spues from discharge opening of thing and directly impact and be cleaned the dirt on thing surface and remove, and can prevent cleaning assembly automatically and be cleaned the contact damage accident of thing.
Also have, utilize words of the present invention, because elastomer, can control with coefficient of elasticity arbitrarily according to the weight of the cleaning assembly in the adjustable mechanism that is prior-entered at coefficient of elasticity, even so select the cleaning assembly of Different Weight according to the kind of various wet treaters and washing fluid, as long as its weight of input so just can maintain specified gap to above-mentioned cleaning assembly and the gap that is cleaned thing by control.
Have again, utilize words of the present invention, because the adjustable mechanism of coefficient of elasticity, possesses the flow sensor that the flow to the washing fluid supplied with from relative supply port detects, the above-mentioned adjustable mechanism that elastomeric coefficient of elasticity utilization has been transfused to the detection signal of flow sensor controls, so can make the cleaning assembly of target flow value and the gap that is cleaned thing maintain specified gap by control, even and the variations in temperature of flow of washing fluid (flow velocity) and washing fluid causes that viscosity changes, and the flowing velocity variation, also can suitably control.Even and then the supply of washing fluid stops, also can preventing cleaning assembly automatically and be cleaned the contact damage accident of thing.
In addition, utilize words of the present invention, because the adjustable mechanism of coefficient of elasticity, possesses the temperature sensor that the temperature to the washing fluid supplied with from above-mentioned relative supply port detects, the above-mentioned adjustable mechanism that elastomeric coefficient of elasticity utilization has been transfused to the detection signal of temperature sensor controls, even change so the variations in temperature of washing fluid causes viscosity, also can follow the variation of the negative pressure that takes place at cleaning assembly because of the formed high velocity stream of the washing fluid that spues from discharge opening, so that cleaning assembly and be cleaned and often remain on suitable gap between thing, thereby can be cleaned thing and keep suitable angle and distance to use the washing fluid of the high velocity stream that spues from discharge opening directly to impact being cleaned the dirt on thing surface and remove, and can prevent cleaning assembly automatically and be cleaned the contact damage accident of thing.
In addition, utilize words of the present invention, because the adjustable mechanism of coefficient of elasticity, possesses the gap sensor that cleaning assembly and the gap that is cleaned thing are detected, the adjustable mechanism that elastomeric coefficient of elasticity utilization has been transfused to the detection signal of the gap sensor that cleaning assembly and the gap that is cleaned thing are detected controls, even so for cleaning assembly and the transient change that is cleaned the gap of thing, also can keep suitable gap, and can prevent cleaning assembly automatically and be cleaned the contact damage accident of thing, simultaneously can be often be cleaned thing keep washing fluid that suitable angle uses the high velocity stream that spues from discharge opening directly impact be cleaned the dirt on thing surface and remove.
Also have, utilize words of the present invention, because the adjustable mechanism of coefficient of elasticity, possess for detection is cleaned the quality testing that is cleaned that thing has or not and survey sensor, elastomeric coefficient of elasticity is utilized as that the gap that makes cleaning assembly and be cleaned thing maintains specified gap and the adjustable mechanism that has been transfused to the detection signal that is cleaned the thing sensor controls, so whether can detect wet treater installs and is cleaned thing, when not being cleaned thing, cleaning assembly and the gap that is cleaned between the conveyance platform of thing maintain specified gap, thereby can prevent the contact damage accident automatically, can avoid simultaneously the feedway of washing fluid etc. casual action to occur.
Have again, utilize words of the present invention, because the block that cleaning assembly moves when possessing in cleaning assembly and the gap that is cleaned thing less than specified gap, even so mechanism or sensor that cleaning assembly and the gap that is cleaned thing are controlled take place also can keep by above-mentioned block and not make the gap that is cleaned the thing breakage unusually.
In addition, utilize words of the present invention, because cleaning assembly, possess that washing fluid that the subtend supply port supplies with pressurizes and the force (forcing) pump supplied with and suction pump that the washing fluid of discharging from outlet is attracted any one, perhaps both have both, so can be according to the viscosity of washing fluid, temperature, be cleaned thing size and shape the revolution of force (forcing) pump and suction pump etc. is controlled, the dirt that is cleaned the thing surface that can directly impact the banded washing fluid of using the high velocity stream that spues from discharge opening and remove sucks at one stroke effectively at outlet and discharges thus.
The accompanying drawing simple declaration
Fig. 1 is the cleaning assembly stereoscopic figure of the embodiment 1 of wet treater of the present invention.
Fig. 2 is the A-A ' profile of cleaning assembly shown in Figure 1.
Fig. 3 is the profile of cleaning assembly of the embodiment 2 of wet treater of the present invention.
Fig. 4 is the profile that the configuration example that the wet process with existing washer jet is used is described.
Symbol description
1: wet treater; 2: supply port; 3: outlet; 4: installing plate; 5: fixed head; 6: the supply port core; 77 ': the outlet core; 8: be cleaned thing; 9: washing fluid; 10: discharge opening; 1111 ': cleaning assembly; 12: elastomer; 13: the elastomer support plate; 14: the adjustable mechanism of coefficient of elasticity; 15; Block; 16: the fluid hydrojet; 101: ultrasonic cleaning equipment; 102: cleaning fluid; 103: import path; 103a: introducing port; 103b: the 1st peristome; 104: drain passageway; 104a: outlet; 104b: the 2nd peristome; 105: oscillating plate; 106: linking part; 107: process field; 108: the ultrasonic vibrator part; 109: ultrasonic vibrator; W: processed substrate; W1: be cleaned face.
The specific embodiment
Below, with reference to the accompanying drawing of embodiment concrete example of the present invention is elaborated.
Fig. 1 is the cleaning assembly stereoscopic figure of the embodiment 1 of wet treater of the present invention.In addition, Fig. 2 is the A-A ' profile of cleaning assembly shown in Figure 1.In Fig. 1 and Fig. 2, the wet treater 1 of embodiment 1 sets near the top that is cleaned thing 8, has to be the above-mentioned thing 8 lip-deep discharge openings 10 with finedraw shape peristome that are cleaned that banded washing fluid 9 is spued.Discharge opening about 10 configuration, and possess the cleaning assembly 11 that constitutes by the supply port 2 of 2 above-mentioned washing fluids 9 and the outlet 3 that the washing fluid 9 of the fluid hydrojet 16 that spues from above-mentioned relative discharge opening 10 is discharged with relative discharge opening 10 that relative outlet 3 symmetries set.
Above-mentioned symmetry sets and relative discharge opening 10 is characterised in that, accept the aperture area of oral area with respect to the supply port 2 of the washing fluid of supplying with from the outside 9, above-mentioned washing fluid 9 is reduced into above 1 positive number/one times to being cleaned its leading section that thing 8 surfaces spue.
In addition, cleaning assembly 11 is connected on fixed head 5 between elastomers 12 such as elastomer support plate 13 that stretches out the outside from supply port core 6 and helical springs and is supported.
And then, because to above-mentioned cleaning assembly 11 be cleaned the gap sensor that do not show among the figure that the gap of thing 8 detects and be cleaned the detection signal that quality testing is surveyed sensor that is cleaned that does not show among the figure that thing 8 has or not for detecting, the adjustable mechanism 14 of the coefficient of elasticity of above-mentioned elastomer 12 is provided on the above-mentioned elastomer support plate 13.
Have again, above-mentioned cleaning assembly 11, possess move during in this cleaning assembly 11 and the gap that is cleaned thing 8 less than specified gap, be fixed in elastomer support plate 13 or the fixed head 5 block 15 on any one.
In Fig. 2, the pump pressurization and the current that are not shown among the figure are supplied with to supply port 2 by the washing fluid 9 of growth trend, and the discharge opening 10 that constitutes from supply port core 6 and outlet core 7 is to being cleaned the thing 8 fluid hydrojet 16 that spues.From the steady flow that the big place of sectional area is supplied with to little sectional area, its flow velocity is accelerated, because the fluid hydrojet 16 that spues, huge fluid effect of elastic resistance is in attached to the particles such as foul that are cleaned on the thing 8, and particles such as foul are removed.
Here, above-mentioned discharge opening 10 because above-mentioned relatively outlet 3 symmetries set, passes through cleaning assembly 11 bottoms so be cleaned thing 8 by utilizing the carrying device that does not show among the figure, the fluid hydrojet 16 that is spued is round about respectively cleaned, and particles such as foul are removed completely.
And then, the above-mentioned outlet 3 that utilizes among the figure attraction that do not show washing fluid 9 to be discharged with pump, since made aperture area and be above-mentioned washing fluid 9 supply port 2 birdsmouths surpass wide mouthful of 1 positive several times, thereby to discharging at one stroke by the above-mentioned reverse respectively fluid hydrojet that spues 16 washing fluids 9 that cleaned, that comprised particles such as foul, even discharge so full-bodied washing fluid 9 also can be easy to suck, and the existing mode identical with the outlet sectional area with supply port compared, and suction efficiency improves by leaps and bounds.
And, its flow velocity of steady flow of supplying with to little sectional area from the big place of sectional area that the front that defines according to Bernoulli Jacob illustrated is accelerated the theorem that pressure reduces, near the discharge opening 10 that fluid hydrojet 16 spues, pressure reduces, and is cleaned thing 8 cleaning assemblies 11 relatively and is subjected to suction function.Under its effect, discharge opening 10 is subjected to being cleaned by furthering the graviational interaction on thing 8 surfaces.This gravitation with the distance that is cleaned thing 8 and discharge opening 10 approaching more zero big more.Here because along with the distance that is cleaned thing 8 and discharge opening 10 is dwindled, the flow velocity of the fluid hydrojet 16 of washing fluid 9 increases, further increase, break away from the effect that is cleaned thing 8 thereby strengthen particles such as making foul so act on the fluid drag of particles such as foul.
In addition, above-mentioned outlet 3, with the above-mentioned section shape that is cleaned the moving direction contact-making surface vertical, that contact with washing fluid 9 of thing 8, be discharged from 7 formation of mouthful core from above-mentioned discharge opening 10 leading sections to above-mentioned outlet 3 outlets circular-arc, and have length and the above-mentioned width corresponding opening portion that is cleaned thing 8.
For this reason, the band shape that spues from the discharge opening 10 of the length finedraw shape peristome corresponding with the above-mentioned width that is cleaned thing 8, can not lose the flow velocity of the washing fluid hydrojet 16 of high velocity stream, and can have no the ground of omission and suck discharge, the existing mode identical with the outlet sectional area with supply port compared, and suction efficiency is improved by leaps and bounds.
And then, because above-mentioned cleaning assembly 11, the a plurality of elastomers 12 that joined by an end are supported in to this cleaning assembly 11 and the gap that is cleaned thing 8 are maintained on the external stability plate 5 of specified gap, so can be to subsidizing in the negative pressure that cleaning assembly 11 takes place because of the washing fluid 8 formed high velocity stream that spue from discharge opening 10, and cleaning assembly 11 and be cleaned 8 of things and can often keep suitable gap, so can automatically prevent cleaning assembly 11 and be cleaned the contact damage accident of thing 8.
Have again, because above-mentioned elastomer 12, adjustable mechanism 14 with its coefficient of elasticity, so the liquid temperature when viscosity that can change the kind because of selection washing fluid 9 and running detects, and to the negative pressure that takes place at cleaning assembly 11 because of the fluid hydrojet 16 formed high velocity stream that spue from discharge opening 10 because the variation that viscosity and liquid temperature produce follow, so that cleaning assembly 11 and be cleaned 8 of things and often remain on suitable gap, thereby can be cleaned the normal fluid hydrojet 16 that keeps suitable angle to use the high velocity stream that spues from discharge opening 10 of thing 8 and directly impact and be cleaned the dirt on thing 8 surfaces and remove, and can prevent cleaning assembly 11 automatically and be cleaned the contact damage accident of thing 8.
Because above-mentioned elastomer 12, can control with coefficient of elasticity arbitrarily according to the weight of the above-mentioned cleaning assembly 11 in the adjustable mechanism 14 that is prior-entered at above-mentioned coefficient of elasticity, even so select the cleaning assembly 11 of Different Weight according to the kind of various wet treaters and washing fluid 9, as long as its weight of input so just can maintain specified gap to above-mentioned cleaning assembly 11 and the gap that is cleaned thing 8 by control.
Because the adjustable mechanism 14 of above-mentioned coefficient of elasticity, possess that flow to the washing fluid 9 supplied with from above-mentioned relative supply port 2 detects, the flow sensor that does not show among the figure, and the coefficient of elasticity of above-mentioned elastomer 12, can utilize the adjustable mechanism 14 of the above-mentioned coefficient of elasticity of the detection signal that has been transfused to above-mentioned flow sensor to control, so can make the above-mentioned cleaning assembly 11 of target flow value and the gap that is cleaned thing 8 maintain specified gap by control, thereby can be cleaned thing 8 and keep suitable angle and distance to use the washing fluid hydrojet 16 of the high velocity stream that spues from discharge opening 10 directly to impact being cleaned the dirt on thing 8 surfaces and remove, even and the flow of washing fluid 9 (flow velocity) changes, perhaps the supply of washing fluid 9 stops, and also can prevent cleaning assembly 11 and the contact damage accident that is cleaned thing 8 automatically.
Because the adjustable mechanism 14 of above-mentioned coefficient of elasticity, possess that temperature to the washing fluid supplied with from above-mentioned relative supply port 2 detects, temperature displayed sensor not among the figure, and the coefficient of elasticity of above-mentioned elastomer 12, the adjustable mechanism 14 of above-mentioned coefficient of elasticity that utilization has been transfused to the detection signal of said temperature sensor controls, even change so the variations in temperature of flow of washing fluid 9 (flow velocity) and washing fluid 9 causes viscosity, and flowing velocity changes, also can suitably control, and to following in the variation of the negative pressure of cleaning assembly 11 generations because of the washing fluid jet flow 16 formed high velocity stream that spue from discharge opening 10, so that cleaning assembly 11 and be cleaned 8 of things and often remain on suitable gap, thereby can be cleaned thing 8 and keep suitable angle and distance to use the washing fluid hydrojet 16 of the high velocity stream that spues from discharge opening 10 directly to impact being cleaned the dirt on thing 8 surfaces and remove, and can prevent cleaning assembly 11 automatically and be cleaned the contact damage accident of thing 8.
Because the adjustable mechanism 14 of above-mentioned coefficient of elasticity, possess above-mentioned cleaning assembly 11 and be cleaned that the gap of thing 8 detects, the gap sensor that does not show among the figure, and the coefficient of elasticity of above-mentioned elastomer 12, utilization has been transfused to be controlled the above-mentioned cleaning assembly 11 and the adjustable mechanism 14 of above-mentioned coefficient of elasticity that is cleaned the detection signal of the above-mentioned gap sensor that the gap of thing 8 detects, even so for cleaning assembly 11 and the transient change that is cleaned the gap of thing 8, also can keep suitable gap, and can prevent cleaning assembly 11 automatically and be cleaned the contact damage accident of thing 8, simultaneously can be often be cleaned thing 8 keep fluid hydrojet 16 that suitable angle uses the high velocity stream that spues from discharge opening 10 directly impacts be cleaned the dirt on thing 8 surfaces and remove.
Because the adjustable mechanism 14 of above-mentioned coefficient of elasticity, possess to detect and be cleaned the quality testing that is cleaned that does not show among the figure that thing 8 has or not and survey sensor, and above-mentioned elastomeric coefficient of elasticity, being utilized as the gap that makes above-mentioned cleaning assembly 11 and be cleaned thing 8 maintains specified gap and has been transfused to the above-mentioned above-mentioned adjustable mechanism 14 that is cleaned the detection signal of thing sensor and controls, so whether can detect wet treater 1 installs and is cleaned thing 8, when not being cleaned thing 8, above-mentioned cleaning assembly 11 and the gap that is cleaned between the conveyance platform that does not show among the figure of thing 8 maintain specified gap, so that can prevent the contact damage accident automatically, can avoid washing fluid 9 feedwaies such as grade casual action to occur by control simultaneously.
Be mounted block 15 on the elastomer support plate 13 because above-mentioned cleaning assembly 11 moves when possessing in above-mentioned cleaning assembly 11 and the gap that is cleaned thing 8 less than specified gap, even so mechanism or sensor that above-mentioned cleaning assembly 11 and the gap that is cleaned thing 8 are controlled take place unusual, also can join, not make the gap that is cleaned thing 8 breakages to keep by above-mentioned block 15 any one with elastomer support plate 13 or fixed head 5.
Because above-mentioned cleaning assembly 11, possess that above-mentioned washing fluid 9 that subtend supply port 2 supplies with pressurizes and the figure that supplies with in the suction pump that do not show the force (forcing) pump that do not show and the figure that the above-mentioned washing fluid 9 of discharging from outlet 3 is attracted any one, perhaps both have both, so can be according to the viscosity of above-mentioned washing fluid 9, temperature, be cleaned thing size and shape the revolution of force (forcing) pump and suction pump etc. is controlled, the dirts that are cleaned thing 8 surfaces that can directly impact the banded washing fluid hydrojet 16 of using the high velocity stream that spues from discharge opening 10 and remove suck at one stroke effectively at outlet 3 and discharge thus.
Fig. 3 is the profile of cleaning assembly of the embodiment 2 of wet treater of the present invention.In embodiment 2, about it does not have among the embodiment 1 configuration and supply port 2 with relative discharge opening 10 that relative outlet 3 symmetries set wherein any one, have each cleaning assembly 11 of 1 of supply port and outlet '.Above-mentioned cleaning assembly 11 ' be characterised in that, possess near the top that is cleaned thing 8 set and by to the cleaning assembly 11 that constituted from the outlet 3 of discharging for the above-mentioned washing fluid that is cleaned the fluid hydrojet 16 that thing 8 lip-deep discharge openings 10 with finedraw shape peristome spue that banded washing fluid 9 is spued ', above-mentioned discharge opening 10, open profile with respect to the supply port 2 of the washing fluid of supplying with from the outside 9 is long-pending, and above-mentioned washing fluid 9 is reduced into above 1 positive number/one times to being cleaned its leading section that thing 8 surfaces spue.
The pump pressurization and the current that are not shown among the figure are supplied with to supply port 2 by the washing fluid 9 of growth trend, and the discharge opening 10 that constitutes from supply port core 6 and outlet core 7 is to being cleaned the thing 8 fluid hydrojet 16 that spues.From the steady flow that the big place of sectional area is supplied with to little sectional area, its flow velocity is accelerated, because the fluid hydrojet 16 that spues, huge fluid effect of elastic resistance is in attached to the particles such as foul that are cleaned on the thing 8, and particles such as foul are removed.
Here, the above-mentioned outlet 3 that utilizes among the figure attraction that do not show washing fluid 9 to be discharged with pump, by outlet core 7 and outlet core 7 ' constitute, because that has made the long-pending supply port 2 for above-mentioned washing fluid 9 of open profile surpasses wide mouthful of 1 positive several times, so that discharge at one stroke the washing fluid 9 that the fluid hydrojet that spued from above-mentioned discharge opening 10 is 16 that cleaned, comprised particles such as foul, so discharge even full-bodied washing fluid 9 also can be easy to suck.
In addition, above-mentioned outlet 3, with the above-mentioned section shape that is cleaned the moving direction contact-making surface vertical, that contact with washing fluid 9 of thing 8, be discharged from 7 formation of mouthful core from above-mentioned discharge opening 10 leading sections to above-mentioned outlet 3 outlets circular-arc, and have length and the above-mentioned width corresponding opening portion that is cleaned thing 8.Other formations and effect are identical with embodiment 1.
The cleaning assembly 1111 of the wet treater of semiconductor chip of the present invention etc. ', in embodiment 1,2, though all be to set near the top that is cleaned thing 8, also can be opposite up and down with embodiment 1,2, cleaning assembly 1111 ' set near the below that is cleaned thing 8.
Here, as the supply port core 6 that constitutes cleaning assembly 11 and the material of outlet core 7, can perhaps select for use in the materials such as aluminium and alloy thereof, titanium, magnesium from ceramic materials such as high purity glass shape carbon, stainless steel, quartz, sapphire, alumina.As the employed material of common cleaning treatment, stainless steel is just enough, but when cleaning fluid is more intense acid and fluoric acid, constitute by ceramic materials such as sapphire or alumina, owing to wet process liquid is had excellent patience, and can prevent deterioration, so be more satisfactory for wet process.
Utilize possibility on the industry
Device provided by the invention owing to be not use ultrasonic unit, self form to clean and uses The high velocity stream of fluid is held thereby the outlet of the washing fluid after cleaning is made wide mouth-shaped Easily suck high viscosity liquid, dispose supply port at the central configuration outlet, in the both sides residual to prevent Slag is missed, thereby uses the elastomers such as the negative pressure of high velocity stream and spring can prevent that substrate etc. is by clear The succinct device that washing contacts with cleaning assembly is so have the possibility of industrially utilizing.
Claims (13)
1. wet treater, wherein, possess near the surface that is cleaned thing and set and have for the supply port of the discharge opening of finedraw shape that the washing fluid of supplying with from the outside is spued to the above-mentioned surface that is cleaned thing with band shape and have the cleaning assembly of the outlet that the above-mentioned washing fluid that spues from above-mentioned discharge opening is discharged, it is characterized in that
Above-mentioned discharge opening, open profile with respect to the supply port of the above-mentioned washing fluid of supplying with from the outside is long-pending, it is long-pending to have the open profile that surpasses 1 positive number/one times, and this cleaning assembly of formation thus is configured on the direction vertical with the above-mentioned moving direction that is cleaned thing.
2. wet treater as claimed in claim 1 is characterized in that, has 2 near the above-mentioned surface of thing and the above-mentioned cleaning assembly that left-right symmetry sets of being cleaned, and has common outlet between above-mentioned 2 above-mentioned cleaning assemblies.
3. wet treater as claimed in claim 1 or 2 is characterized in that, the open profile of above-mentioned outlet is long-pending, be the open profile of supply port of above-mentioned washing fluid long-pending surpass 1 positive several times.
4. as each described wet treater in the claim 1～3, it is characterized in that, with above-mentioned outlet above-mentioned be cleaned the moving direction of thing vertical, with the section shape of the contact-making surface of washing fluid, from the leading section of above-mentioned discharge opening to above-mentioned outlet to go out interruption-forming circular-arc, and have length and the above-mentioned width corresponding opening portion that is cleaned thing.
5. as each described wet treater in the claim 1～4, it is characterized in that above-mentioned cleaning assembly is supported on the external stability plate by a plurality of elastomers that an end joins.
6. wet treater as claimed in claim 5 is characterized in that, above-mentioned elastomer, the adjustable mechanism with its coefficient of elasticity.
7. as claim 5 or 6 described wet treaters, it is characterized in that above-mentioned elastomer is controlled with coefficient of elasticity arbitrarily according to the weight of the above-mentioned cleaning assembly in the adjustable mechanism that is prior-entered at above-mentioned coefficient of elasticity.
8. as each described wet treater in the claim 5～7, it is characterized in that the adjustable mechanism of above-mentioned coefficient of elasticity has the flow sensor that the flow to the washing fluid of supplying with from above-mentioned supply port detects,
Above-mentioned elastomeric coefficient of elasticity utilizes the adjustable mechanism of the above-mentioned coefficient of elasticity of the detection signal that has been transfused to above-mentioned flow sensor to control.
9. as each described wet treater in the claim 5～8, it is characterized in that the adjustable mechanism of above-mentioned coefficient of elasticity has the temperature sensor that the temperature to the washing fluid of supplying with from above-mentioned supply port detects,
Above-mentioned elastomeric coefficient of elasticity utilizes the adjustable mechanism of the above-mentioned coefficient of elasticity of the detection signal that has been transfused to the said temperature sensor to control.
10. as each described wet treater in the claim 5～9, it is characterized in that the adjustable mechanism of above-mentioned coefficient of elasticity has the gap sensor that above-mentioned cleaning assembly and the gap that is cleaned the thing surface are detected,
Above-mentioned elastomeric coefficient of elasticity utilizes the adjustable mechanism of the above-mentioned coefficient of elasticity of the detection signal that has been transfused to above-mentioned gap sensor to control.
11., it is characterized in that the adjustable mechanism of above-mentioned coefficient of elasticity has for detecting and above-mentionedly is cleaned the quality testing that is cleaned that thing has or not and surveys sensor as each described wet treater in the claim 5～10,
The adjustable mechanism that above-mentioned elastomeric coefficient of elasticity utilization has been transfused to the above-mentioned coefficient of elasticity of the detection signal that is cleaned the thing sensor controls.
12., it is characterized in that the block that above-mentioned cleaning assembly moves when having in above-mentioned cleaning assembly and the above-mentioned gap that is cleaned the thing surface less than specified gap as each described wet treater in the claim 1～11.
13. as each described wet treater in the claim 1～12, it is characterized in that, above-mentioned cleaning assembly, have that above-mentioned washing fluid that the above-mentioned supply port of subtend supplies with pressurizes and the force (forcing) pump supplied with and suction pump that the above-mentioned washing fluid of discharging from above-mentioned outlet is attracted any one, perhaps both have both.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004276505 | 2004-09-24 | ||
| JP2004-276505 | 2004-09-24 | ||
| JP2004276505A JP2006088033A (en) | 2004-09-24 | 2004-09-24 | Wet treatment apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1751813A true CN1751813A (en) | 2006-03-29 |
| CN1751813B CN1751813B (en) | 2010-06-02 |
Family
ID=36229511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005101075025A Expired - Fee Related CN1751813B (en) | 2004-09-24 | 2005-09-23 | Wet treater |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2006088033A (en) |
| KR (1) | KR100852335B1 (en) |
| CN (1) | CN1751813B (en) |
| TW (1) | TWI290738B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104137180A (en) * | 2011-12-28 | 2014-11-05 | Hoya株式会社 | Production method for glass substrate for information recording medium |
| CN106623238A (en) * | 2016-11-17 | 2017-05-10 | 天津滨海光热反射技术有限公司 | Suction-transfer type thin glass substrate continuous cleaning system and method |
| CN106623237A (en) * | 2016-11-17 | 2017-05-10 | 天津滨海光热反射技术有限公司 | Rotating lifting type continuous cleaning system and cleaning method for thin glass substrates |
| CN106670180A (en) * | 2016-11-17 | 2017-05-17 | 天津滨海光热反射技术有限公司 | Thin glass substrate cleaning device and cleaning method |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006327198A (en) * | 2005-05-23 | 2006-12-07 | Heidelberger Druckmas Ag | Apparatus for applying liquid |
| KR100834827B1 (en) * | 2006-11-16 | 2008-06-04 | 삼성전자주식회사 | Apparatus for cleaning photo-mask and methode for cleaning used the same |
| JP4810411B2 (en) * | 2006-11-30 | 2011-11-09 | 東京応化工業株式会社 | Processing equipment |
| KR100858427B1 (en) | 2007-02-27 | 2008-09-17 | 세메스 주식회사 | Apparatus and method for cleaning substrate |
| KR101468460B1 (en) * | 2013-06-12 | 2014-12-04 | 주식회사 에스케이테크놀러지 | Apparatus for removing particle of substrate using Center Collection Intake |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19530989C1 (en) * | 1995-08-23 | 1997-03-13 | Atotech Deutschland Gmbh | Film stripping process |
| KR100306155B1 (en) * | 1996-11-29 | 2001-11-30 | 이구택 | Method for coating substrate with superior magnetic shielding property |
| US6165267A (en) * | 1998-10-07 | 2000-12-26 | Sandia Corporation | Spin coating apparatus |
| JP2002075947A (en) * | 2000-08-30 | 2002-03-15 | Alps Electric Co Ltd | Wet processor |
| JP4189279B2 (en) | 2003-07-03 | 2008-12-03 | 株式会社東芝 | Substrate processing equipment |
| JP4451175B2 (en) | 2004-03-19 | 2010-04-14 | 大日本スクリーン製造株式会社 | Nozzle cleaning apparatus and substrate processing apparatus |
-
2004
- 2004-09-24 JP JP2004276505A patent/JP2006088033A/en active Pending
-
2005
- 2005-09-19 TW TW094132368A patent/TWI290738B/en not_active IP Right Cessation
- 2005-09-23 CN CN2005101075025A patent/CN1751813B/en not_active Expired - Fee Related
- 2005-09-23 KR KR1020050088729A patent/KR100852335B1/en not_active IP Right Cessation
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104137180A (en) * | 2011-12-28 | 2014-11-05 | Hoya株式会社 | Production method for glass substrate for information recording medium |
| CN104137180B (en) * | 2011-12-28 | 2017-04-05 | Hoya株式会社 | The manufacture method of glass substrate for information recording medium |
| CN106623238A (en) * | 2016-11-17 | 2017-05-10 | 天津滨海光热反射技术有限公司 | Suction-transfer type thin glass substrate continuous cleaning system and method |
| CN106623237A (en) * | 2016-11-17 | 2017-05-10 | 天津滨海光热反射技术有限公司 | Rotating lifting type continuous cleaning system and cleaning method for thin glass substrates |
| CN106670180A (en) * | 2016-11-17 | 2017-05-17 | 天津滨海光热反射技术有限公司 | Thin glass substrate cleaning device and cleaning method |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI290738B (en) | 2007-12-01 |
| TW200616066A (en) | 2006-05-16 |
| JP2006088033A (en) | 2006-04-06 |
| KR100852335B1 (en) | 2008-08-18 |
| KR20060051583A (en) | 2006-05-19 |
| CN1751813B (en) | 2010-06-02 |
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