KR100852335B1 - Wet processing device - Google Patents

Abstract

Provided is a wet processing apparatus having a cleaning nozzle which does not use ultrasonic waves, facilitates suction of a high viscosity fluid, and leaves no residue. A supply having a slit-shaped discharge port 10 for discharging the cleaning fluid 9 supplied from the outside and disposed in close proximity to the surface of the object to be cleaned 8 in a band shape on the surface of the object to be cleaned 8. For cleaning in which the cleaning unit 11 has a sphere 2 and a discharge port 3 for discharging the cleaning fluid 9 discharged from the discharge port 10, and the cross-sectional area of the discharge port 10 is supplied from the outside. With respect to the opening cross-sectional area of the supply port inlet port of the fluid 9, the tip end portion for discharging the cleaning fluid 9 toward the surface of the object to be cleaned 8 has an opening cross-sectional area of one-time greater than one positive number. The washing unit formed was arranged in a direction orthogonal to the moving direction of the object to be cleaned 8.

High viscosity fluid, cleaning nozzle, discharge port, supply port, discharge port, cleaning unit, wet processing device

Description

Wet processing device {WET PROCESSING DEVICE}

BRIEF DESCRIPTION OF THE DRAWINGS The external appearance perspective view of the cleaning unit of Example 1 of the wet processing apparatus which concerns on this invention.

FIG. 2 is a sectional view taken along line A-A 'of the cleaning unit shown in FIG. 1; FIG.

3 is a sectional view of a cleaning unit of a second embodiment of a wet processing apparatus according to the present invention;

4 is a cross-sectional view illustrating a configuration example for a wet process provided with a conventional cleaning nozzle.

<Explanation of symbols for the main parts of the drawings>

1: wet processing device

2: supply port

3: outlet

4: attachment plate

5: fixed plate

6: supply port core

7, 7 ': outlet core

8: object to be cleaned

9: cleaning fluid

10: discharge port

11, 11 ': cleaning unit

12: elastic body

13: elastic support plate

14: variable control mechanism of elastic modulus

15: stopper

16: fluid jet

101: ultrasonic cleaning device

102: washing liquid

103: introduction passage

103a: inlet

103b: first opening

104: discharge passage

104a: discharge

104b: second opening

105: diaphragm

106: connection part

107 processing area

108: ultrasonic vibrator part

109: ultrasonic vibrator

W: substrate to be processed

W1: Surface to be cleaned

Patent Document 1: Japanese Patent Application Laid-Open No. 2003-158110

This invention relates to the wet processing apparatus provided with the cleaning unit which wash | cleans the surface of a semiconductor wafer, a glass substrate, etc.

In the manufacture of electronic devices, such as a semiconductor device, a semiconductor device, and a liquid crystal display panel, the process of carrying out the washing process of the semiconductor wafer and glass substrate which are the to-be-cleaned object is essential during the manufacturing process. In the washing step, washing is performed using various washing liquids such as ultrapure water, electrolytic ionized water, ozone water, hydrogen water, etc. in order to remove various substances to be removed in the manufacturing process, and these washing liquids are supplied onto the substrate from the nozzle of the washing apparatus. do.

However, in the case of a wet processing apparatus using a conventional general cleaning nozzle, for example, a substrate of 500 mm angle is cleaned using a cleaning liquid such as electrolytic ion water, and the cleaning with such a cleaning liquid and the rinse with rinse cleaning water. To achieve a degree of cleanness of 0.5 particles / cm 2 level as the residual amount of foreign matter (particles) on the substrate after performing the step, a cleaning liquid and a rinse cleaning liquid of about 25 to 30 liters / minute had to be used.

Therefore, in addition to the method of using the liquid-liquid washing | cleaning nozzle which can reduce the usage-amount of a washing | cleaning liquid significantly compared with the conventional type, the apparatus which removes the removal target substance using the ultrasonic wave in combination with the ultrasonic wave generator is proposed.

It is sectional drawing explaining one structural example for wet processing provided with the conventional washing | cleaning nozzle. As shown in FIG. 4, the cleaning nozzle 101 of this configuration includes an introduction passage (introduction pipe) 103 having an introduction port 103a for introducing the cleaning liquid (processing liquid) 102 at one end thereof. At one end, a discharge passage (discharge tube) 104 having a discharge port 104a for discharging the cleaning liquid after the cleaning (the discharge liquid of the processing liquid after the wet processing) to the outside is formed.

The other end of each of the introduction passage 103 and the discharge passage 104 is connected to form a connecting portion 106 having an opposing surface 105a facing the substrate to be processed (to-be-cleaned object) W. A first opening (introduction opening) 103b in which the introduction passage 103 opens in the connecting portion 106 and a second opening (outlet opening) 104b in which the discharge passage 104 opens are formed. Such a nozzle is called a push-pull nozzle (bioflow nozzle). The first and second openings 103b and 104b open toward the substrate W to be processed. In the space between the connecting portion 106 and the substrate W to be processed, a processing region 107 for performing wet processing is formed.

In addition, the connecting portion 106 is provided with an ultrasonic vibrator portion 108 for imparting ultrasonic vibration to the cleaning liquid 102 in the processing region 107 while the substrate W is being cleaned. The ultrasonic vibrator portion 108 is provided on a diaphragm (vibration part) 105 and an ultrasonic vibrator 109 which is provided on the main surface of the diaphragm 105 to impart ultrasonic vibration to the diaphragm 105. The ultrasonic vibrator 109 is made of an electrostrictive element such as PZT, and receives ultrasonic frequency electric signals from the oscillator to generate ultrasonic vibrations. The ultrasonic vibrator 109 is connected to the diaphragm 105 by an adhesive such as an ultrasonic vibrator bonding mainly composed of an epoxy resin.

The material constituting the diaphragm 105 is selected from ceramics such as high-purity glass carbon, stainless steel, quartz, sapphire, alumina, or aluminum, alloys thereof, titanium, magnesium, and the like. When the diaphragm is provided in the wet processing nozzle used for the normal cleaning treatment, stainless steel is sufficient as the material of the diaphragm 105. However, when the cleaning liquid is a relatively strong acid or hydrofluoric acid, ceramics such as sapphire or alumina may be used. It is said that it is preferable to perform a wet process because it is excellent in resistance to a wet process liquid and can prevent deterioration.

In addition, the ultrasonic vibrator 109 is preferably capable of outputting ultrasonic vibrations in the range of 20 kHz to 10 MHz in terms of practical use in the case of performing wet processing, and in particular, 0.2 MHz or more in view of the thickness of the process liquid layer that can be held. Frequency is more preferred. The length of the wavelength λ in the diaphragm 105 of the ultrasonic vibration generated from the ultrasonic vibrator 109 is in the range of about 0.6 mm to about 300 mm when the diaphragm 105 is made of stainless steel (SUS316L).

The diaphragm 105 has a thickness dimension T shown in FIG. 4 when T is a wavelength in the diaphragm 105 of the ultrasonic vibration generated from the ultrasonic vibrator 109 as lambda. / 2 (where n is an integer of 2 or more). As a value of n, 3-7, especially 5 are preferable. Here, it is preferable that thickness dimension T is set in the range which has a width with respect to each numerical value like (lambda) +/- 0.3mm, 3 (lambda) / 2 +/- 0.3mm, 5 (lambda) / 2 +/- 0.3mm, and 7 (lambda) / 2 +/- 0.3mm. This takes into account conditions such as temperature change. By setting the thickness dimension T in this way, the ultrasonic vibration from the ultrasonic vibrator 109 can be effectively propagated, and when the wet process is performed using the cleaning nozzle 101 provided with the ultrasonic vibrator portion 108, the ultrasonic wave is used. Vibration (ultrasound energy) can be sufficiently applied to the cleaning liquid 102, and the wet treatment can be performed efficiently.

Moreover, a pressure control part (not shown) is provided in the discharge path 104 side, and this pressure control part (process liquid collection | recovery means) flows into the discharge path 104 after the washing | cleaning liquid 102 which contacted the to-be-processed substrate W was wash | cleaned. The pressure of the cleaning liquid (including the surface tension of the cleaning liquid and the surface tension of the surface to be cleaned of the substrate to be treated) and the atmospheric pressure of the cleaning liquid in contact with the atmosphere of the first opening 103b are provided so as to be balanced. The pressure control section is composed of a pressure reducing pump provided on the discharge port 104a side.

Therefore, by using a decompression pump in the pressure control unit on the discharge passage 104 side, the force for sucking the cleaning liquid of the connecting portion 106 by the pressure reducing pump is controlled to obtain the cleaning liquid in contact with the atmosphere of the first opening 103b. The pressure (including the surface tension of the cleaning liquid and the surface tension of the surface to be cleaned W1 of the substrate W) and the atmospheric pressure are balanced.

That is, the relationship between the pressure Pw (including the surface tension of the cleaning liquid and the surface tension of the surface to be cleaned W1 of the substrate W) of the cleaning liquid in contact with the atmosphere of the first opening 103b and the atmospheric pressure Pa is defined as Pw ≒ Pa. The cleaning liquid supplied to the substrate W through the one opening 103b and in contact with the substrate W is discharged to the discharge passage 104 without leaking to the outside of the nozzle for cleaning.

Therefore, the cleaning liquid supplied from the cleaning nozzle onto the substrate W is not in contact with portions other than the portions (first and second openings 103b and 104b) supplied with the cleaning liquid on the substrate W to be processed. Removed from phase. Moreover, patent document 1 is mentioned as having disclosed the prior art regarding this kind of washing nozzle.

However, the conventional liquid-liquid cleaning nozzle of the prior art uses a pressure reducing pump to perform the cleaning treatment while roughly equilibrating the pressure and atmospheric pressure of the cleaning liquid, so that the suction ability of the cleaning liquid having high viscosity is low, so that a large amount after the passage of the cleaning nozzle is passed. Was likely to bring residue.

In addition, in the ultrasonic cleaning apparatus, for the cleaning method by a combination of physical cleaning that physically disperses dirt in a liquid by the action of ultrasonic waves and chemical cleaning by chemical action such as dissolution and emulsification, depending on the selection of the cleaning liquid, It is necessary to control the propagation speed of the sound by the cleaning liquid and the liquid core by the liquid temperature. In addition, complicated mechanisms are required, such as managing ultrasonic frequencies depending on the type of dirt, the particle size of the particles, the type and shape of the cleaning material, and the type of the cleaning solution. Accordingly, there is a problem to be solved, such as a problem of contact between the cleaning material and the cleaning nozzle, a problem of the ultrasonic transmitter, and an increase in the device cost.

SUMMARY OF THE INVENTION An object of the present invention is to provide a wet processing apparatus having a cleaning nozzle which does not use ultrasonic waves, facilitates suction of a high viscosity fluid, and leaves no residue.

In order to achieve the above object, the present invention is characterized by the following configuration. That is, the wet processing apparatus of the present invention,

(1) A supply port disposed close to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. And a cleaning unit having an outlet for

The cross-sectional area of the discharge port is an opening cross-sectional area of 1 time greater than the amount of positive water in which the distal end portion for discharging the cleaning fluid toward the surface of the object to be cleaned with respect to the opening cross-sectional area of the supply port receiving port of the cleaning fluid supplied from the outside. The washing unit which has a structure is arrange | positioned in the direction orthogonal to the moving direction of the to-be-cleaned object.

(2) In addition, the wet processing apparatus of the present invention has two cleaning units disposed symmetrically in close proximity to the surface of the object to be cleaned, and has a common discharge port between the two cleaning units, The opening cross-sectional area was a positive multiple of 1 or more with respect to the opening cross-sectional area of the receiving port of the cleaning fluid.

(3) In addition, the wet processing apparatus of the present invention forms a cross-sectional shape of the contact surface with the cleaning fluid orthogonal to the moving direction of the object to be cleaned in an arc shape from the distal end of the discharge port to the outlet of the discharge port, An opening having a length corresponding to the width of the object to be cleaned was further provided, and the cleaning unit was supported by a plurality of elastic bodies whose one end abuts on the external fixing plate. The elastic body was provided with the variable control mechanism of the elastic coefficient.

(4) The said elastic body is controlled by arbitrary elastic modulus according to the weight of the washing unit previously input to the variable control mechanism of an elastic modulus. A variable control mechanism of elastic modulus was provided with a flow sensor which detects the flow rate of the washing | cleaning fluid supplied from a supply port, and the elastic modulus of an elastic body was controlled by the variable control mechanism of the elastic modulus to which the detection signal of the flow sensor was input. .

Further, the variable control mechanism of the elastic modulus is provided with a gap sensor for detecting a gap between the cleaning unit and the surface of the object to be cleaned, and the elastic modulus of the elastic body is controlled by the variable control mechanism of the elastic modulus to which the detection signal of the gap sensor is input. To do so.

In addition, the variable control mechanism of the elastic modulus is provided with a to-be-detected sensor for detecting the presence or absence of the object to be cleaned, and the elastic modulus of the elastic body is controlled by the variable control mechanism of the elastic modulus to which the detection signal of the object to be cleaned is input. It was.

In addition, in the present invention, the cleaning unit includes a stopper that operates when the clearance between the cleaning unit and the surface of the object to be cleaned is equal to or less than a predetermined interval, and presses the cleaning fluid supplied to the supply port to the cleaning unit. One or both of the pressure pump to supply and the suction pump which sucks the washing | cleaning fluid discharged | emitted from a discharge port were provided.

<Example>

Best Mode for Carrying Out the Invention The best mode for carrying out the present invention will now be described in detail with reference to the accompanying drawings.

(Example 1)

BRIEF DESCRIPTION OF THE DRAWINGS The external appearance perspective view of the cleaning unit of Example 1 of the wet processing apparatus which concerns on this invention. 2 is a sectional view taken along the line A-A 'of the cleaning unit shown in FIG. 1 and 2, the wet processing apparatus 1 of the first embodiment is disposed close to the upper side of the object to be cleaned 8, and a strip-shaped cleaning fluid 9 is disposed in the object to be cleaned 8. A discharge port 10 having a slit-shaped opening for discharging to the surface is provided. The discharge ports 10 are disposed on the left and right sides, and two supply ports 2 of the cleaning fluid 9 having opposite discharge ports 10 disposed symmetrically with respect to the discharge port 3 and discharge ports facing each other ( The cleaning unit 11 which consists of the discharge port 3 which discharges the cleaning fluid 9 of the fluid jet 16 discharged from the 10 is provided.

The discharge port 10 which is disposed symmetrically and facing each other, the cleaning fluid 9 with respect to the opening area of the supply port 2 receiving port portion of the cleaning fluid 9 supplied from the outside to be cleaned 8 The tip portion discharged toward the surface is reduced in shape by one-times more than one amniotic fluid.

The discharge port 10 includes a supply port core 6 which guides the cleaning fluid 9 supplied from the supply port 2 to the discharge port 10, and a cleaning fluid 9 discharged from the discharge port 10. It is formed of an outlet core 7 leading to an outlet 3 to be discharged to the outside.

In addition, the cleaning unit 11 is abutted and supported by the fixing plate 5 via an elastic support plate 13 extending outward from the supply port core 6 and an elastic body 12 such as a coil spring.

Further, a detection signal of a gap sensor (not shown) that detects a gap between the cleaning unit 11 and the object to be cleaned 8 and a to-be-detected object detection sensor (not shown) that detects the presence or absence of the object to be cleaned 8. By this, the variable control mechanism 14 of the elastic modulus of the elastic body 12 is disposed on the elastic support plate 13.

In addition, the cleaning unit 11 is fixed to any one of the elastic support plate 13 and the fixed plate 5 which operate when the clearance between the cleaning unit 11 and the object to be cleaned 8 is equal to or less than a predetermined interval. Provided stopper 15.

In FIG. 2, a discharge fluid 10 composed of a supply port core 6 and an outlet core 7 is supplied to the supply port 2 with a cleaning fluid 9 pressurized by a pump (not shown) to which water flow is added. From this, the fluid jet 16 is discharged toward the object to be cleaned 8. In the steady flow supplied from a large cross-sectional area to a small cross-sectional area, the flow velocity becomes large, and a large fluid drag acts on the dust and the like adhering to the object to be cleaned 8 by the discharged fluid jet 16, thereby causing the particles such as dust and the like. Is removed.

Here, since the discharge port 10 is disposed symmetrically with respect to the discharge port 3, the object to be cleaned 8 is discharged in the opposite direction by passing through the lower part of the cleaning unit 11 with a conveying device (not shown). The fluid jet 16 is cleaned, and particles such as dust are completely removed.

Further, the discharge port 3 which discharges the cleaning fluid 9 by the suction pump (not shown) exceeds 1 with respect to the opening area of the supply port 2 receiving port of the cleaning fluid 9. The cleaning fluid 9 containing particles such as dust and the like washed with the fluid jets 16 discharged in the opposite directions as a photosphere serving as the opening area of the pumping vessel is discharged in one step. 9), it is possible to easily discharge the suction, and the suction efficiency is further improved significantly compared with the conventional method of the same cross-sectional area of the supply port and the discharge port.

In addition, according to Bernoulli's theorem that the flow velocity increases and the pressure decreases in the steady flow fed from the large cross-sectional area to the small cross-section described above, the pressure decreases near the discharge port 10 discharged from the fluid jet 16. Thus, a negative pressure acts on the cleaning unit 11 with respect to the object to be cleaned 8. By this action, an attraction force for causing the discharge port 10 to approach the surface of the object to be cleaned 8 acts. This attraction increases as the distance between the object to be cleaned 8 and the discharge port 10 approaches zero. Here, since the distance between the object to be cleaned 8 and the discharge port 10 decreases and the flow velocity of the fluid jet 16 of the cleaning fluid 9 increases, the fluid drag acting on the particles such as dust becomes larger. The effect of separating particles such as dust and the like from the object to be cleaned 8 is enhanced.

Further, the cross-sectional shape of the contact surface of the discharge port 3 with the cleaning fluid 9 orthogonal to the moving direction of the object 8 is discharged from the distal end of the discharge port 10 to the outlet of the discharge port 3. It is formed in circular arc shape by the core 7, and has the opening part of the length corresponding to the width of the to-be-cleaned object 8 further.

For this reason, without losing the flow velocity of the strip | belt-shaped and high speed flow cleaning fluid jet 16 discharged from the discharge port 10 of the slit-shaped opening of the length corresponding to the width of the to-be-cleaned object 8, Inhalation and discharge can be carried out, and the suction efficiency is further improved compared with the conventional method of the same cross-sectional area of the supply port and the discharge port.

In addition, the cleaning unit 11 is supported by a plurality of elastic bodies 12, one end of which is in contact with the external fixing plate 5 for maintaining a gap between the cleaning unit 11 and the object to be cleaned 8 at a predetermined interval. Therefore, the negative pressure generated in the cleaning unit 11 by the high speed flow by the cleaning fluid 9 discharged from the discharge port 10 is supported, and further, between the cleaning unit 11 and the object to be cleaned 8. Is always maintained at an appropriate gap, so that an accidental contact break between the cleaning unit 11 and the object to be cleaned 8 is automatically prevented.

Moreover, since the said elastic body 12 is equipped with the variable control mechanism 14 of the elasticity modulus, the viscosity which changes according to selection of the varieties of the washing | cleaning fluid 9, and the liquid temperature at the time of operation are detected, and the viscosity And a change in the negative pressure generated in the cleaning unit 11 due to the high speed flow by the fluid jet 16 discharged from the discharge port 10 in accordance with the liquid temperature, so that the cleaning unit 11 and the object to be cleaned 8 are separated. Since a proper clearance is always maintained, dirt on the surface of the object to be cleaned 8 can be directly removed by the high-speed fluid jet 16 discharged from the discharge port 10 at an angle appropriate to the object to be cleaned 8. Moreover, the contact breakage accident of the cleaning unit 11 and the to-be-cleaned object 8 can be prevented automatically.

Since the elastic body 12 is controlled by an arbitrary elastic modulus according to the weight of the said washing unit 11 previously input to the variable control mechanism 14 of the said elastic modulus, various wet processing apparatuses and the cleaning fluid 9 Even if the cleaning unit 11 having a different weight is selected according to the type of), if the weight is inputted, the clearance between the cleaning unit 11 and the object to be cleaned 8 can be controlled to be maintained at a predetermined interval. .

The elasticity control coefficient 14 of the elastic modulus is provided with a flow sensor (not shown) which detects the flow rate of the cleaning fluid 9 supplied from the opposing supply port 2, and the elastic modulus of the elastic body is Since the detection signal of the flow sensor can be controlled by the variable control mechanism 14 of the elastic modulus input thereto, the clearance between the cleaning unit 11 and the object to be cleaned 8 at a predetermined flow rate is determined. It can be controlled to maintain the interval, so that the dirt on the surface of the object to be cleaned 8 is directly directed by the high speed flow cleaning fluid jet 16 discharged from the discharge port 10 at an angle and distance appropriate to the object to be cleaned 8. Can be removed, and even if the flow rate (flow rate) of the cleaning fluid 9 is changed or the supply of the cleaning fluid 9 is stopped, the breakage of the contact between the cleaning unit 11 and the object to be cleaned 8 occurs. Can be prevented automatically.

The variable control mechanism 14 of the elastic modulus is provided with a temperature sensor (not shown) which detects the temperature of the cleaning fluid supplied from the opposing supply port 2, and the elastic modulus of the elastic body 12 is Since the detection signal of the said temperature sensor is controlled by the variable control mechanism 14 of the said elasticity modulus, the flow volume (flow rate) of the washing | cleaning fluid 9 changes the temperature of a washing | cleaning fluid, and a viscosity changes. Therefore, even if the flow velocity changes, it is properly controlled, and the cleaning unit (following the change in the negative pressure generated in the cleaning unit 11 by the high speed flow by the cleaning fluid jet 16 discharged from the discharge port 10) 11) and the object to be cleaned 8 at a proper clearance at all times, so that the object can be cleaned by the high speed flow cleaning fluid jet 16 discharged from the discharge port 10 at an angle and distance appropriate to the object to be cleaned 8. Remove dirt directly on the surface of water (8) In addition, an accidental breakage of contact between the cleaning unit 11 and the object to be cleaned 8 is automatically prevented.

The elasticity modulus variable control mechanism 14 is provided with the clearance sensor which is not shown in figure which detects the clearance gap between the said washing | cleaning unit 11 and the to-be-cleaned object 8, The elasticity modulus of the said elastic body 12 is said, Since the clearance between the cleaning unit 11 and the object to be cleaned 8 is controlled by the variable control mechanism 14 of the elastic modulus in which the detection signal of the gap sensor is input, the cleaning unit 11 and the object to be cleaned are cleaned. An appropriate gap can also be maintained with respect to the instantaneous change of the gap with the water 8, and an accidental breakage of contact between the cleaning unit 11 and the object to be cleaned 8 is automatically prevented, and the object to be cleaned 8 always remains. The dirt on the surface of the object to be cleaned 8 can be removed by directing the fluid jet 16 of the high velocity flow discharged from the discharge port 10 at an angle appropriate to.

The variable control mechanism 14 of the elastic modulus is provided with a to-be-detected object detection sensor (not shown) which detects the presence or absence of the object to be cleaned 8, and the elastic modulus of the elastic body is the cleaning unit 11 and the object to be cleaned. Since the detection signal of the object to be cleaned is controlled by the variable control mechanism 14 inputted so as to maintain the gap with the water 8 at a predetermined interval, the object to be cleaned 8 is transferred to the wet processing apparatus 1. ), And when the object to be cleaned 8 is not attached, the gap between the cleaning unit 11 and the carrier table (not shown) of the object to be cleaned is maintained at a predetermined interval. Thus, contact breakage is automatically prevented and at the same time, it is possible to control the supply device such as the cleaning fluid 9 to be inadvertently operated.

Since the cleaning unit 11 includes a stopper 15 mounted on the elastic support plate 13 that operates when the clearance between the cleaning unit 11 and the object to be cleaned 8 becomes smaller than a predetermined interval. Even if an abnormality occurs in a mechanism or a sensor for controlling the clearance between the cleaning unit 11 and the object to be cleaned 8, the stopper 15 abuts on one of the elastic support plate 13 and the fixing plate 5. The gap which does not damage the to-be-cleaned object 8 can be maintained.

The cleaning unit 11 supplies a pressurization pump (not shown) for pressurizing and supplying the cleaning fluid 9 supplied to the supply port 2, and the cleaning fluid 9 discharged from the discharge port 3. Since any one or both of the suction pumps which are not shown in the drawing which are suctioned are provided, or both of them, according to the viscosity and temperature of the said washing | cleaning fluid 9, the magnitude | size and shape of a to-be-cleaned body, the number of rotations of a pressure pump, a suction pump, etc. By controlling the flow rate, the dirt on the surface of the object to be cleaned 8, which is directly removed by the high-speed band-shaped cleaning fluid jet 16 discharged from the discharge port 10, can be efficiently sucked and discharged from the discharge port 3 at once. have.

(Example 2)

3 is a cross-sectional view of the cleaning unit of Embodiment 2 of the wet processing apparatus according to the present invention. In Example 2, in the said Example 1, there is no any of the supply ports 2 which are arrange | positioned at the left and right, and have the opposite discharge port 10 arrange | positioned symmetrically with respect to the discharge port 3, Each has one cleaning unit 11 '. The cleaning unit 11 'is disposed close to the upper side of the object to be cleaned 8, and has a slit-shaped opening for discharging a strip-shaped cleaning fluid 9 to the surface of the object to be cleaned 8. A cleaning unit 11 'composed of a discharge port 3 for discharging the cleaning fluid 9 of the fluid jet 16 discharged from the discharge port 10, wherein the discharge port 10 is supplied from the outside. With respect to the opening cross-sectional area of the supply port 2 of the cleaning fluid 9, the distal end portion for discharging the cleaning fluid 9 toward the surface of the object to be cleaned 8 is reduced to one-time more than one amniotic fluid. It is characterized by the shape.

A cleaning fluid 9 pressurized by a pump (not shown) to which water flow is added is supplied to the supply port 2, and is cleaned from the discharge port 10 composed of the supply port core 6 and the discharge port core 7. The fluid jet 16 is discharged towards the water 8. In a steady flow supplied from a large cross-sectional area to a small cross-sectional area, the flow velocity becomes large, and a large fluid drag acts on the dust and the like attached to the object to be cleaned 8 by the ejected fluid jet 16, thereby removing the particles such as the dust. do.

Here, the outlet 3 for discharging the cleaning fluid 9 by the suction pump (not shown) is composed of an outlet core 7 and an outlet core 7 ′, and supplies the cleaning fluid 9. The cleaning fluid 9 containing particles such as dust and the like washed with the fluid jet 16 discharged from the discharge port 10 as a photosphere having an opening cross-sectional area of more than one multiple of the opening cross-sectional area of the sphere 2. Since it discharges at once, even if it is the high viscosity washing fluid 9, it can suction and discharge easily.

Further, the discharge port 3 has a cross-sectional shape of a contact surface with the cleaning fluid 9 orthogonal to the moving direction of the object to be cleaned 8, from the distal end of the discharge port 10 to the outlet of the discharge port 3. It is formed in circular arc shape by the core 7, and has the opening part of the length corresponding to the width of the to-be-cleaned object 8 further. Other configurations and operations are the same as those in the first embodiment.

In the first and second embodiments, the cleaning units 11 and 11 'of the wet processing apparatus such as the semiconductor wafer according to the present invention are disposed close to the upper side of the object to be cleaned 8, but the first and second embodiments are the upper and lower sides. The cleaning units 11 and 11 ', which are reversed, may be disposed close to the bottom of the object to be cleaned 8.

Here, as the material of the supply core 6 and the outlet core 7 constituting the cleaning unit 11, ceramics such as high purity glassy carbon, stainless steel, quartz, sapphire, alumina, aluminum, alloys thereof, titanium And magnesium are used. Stainless steel is sufficient as a material used for a normal cleaning treatment. However, when the cleaning liquid is a relatively strong acid or hydrofluoric acid, it is preferable to use ceramics such as sapphire or alumina to prevent deterioration due to excellent resistance to the wet treatment liquid. It is said that it is preferable to perform wet processing.

Without using an ultrasonic device, the high-speed flow of the cleaning fluid is self-formed, the outlet of the cleaning fluid after cleaning is formed as a photosphere, so that high viscosity liquids can be easily sucked in. Since it is a simple device which can prevent the leftover and prevents contact between the object to be cleaned such as a substrate and the cleaning unit by using a high-pressure negative pressure and an elastic body such as a spring, there is an industrial applicability.

According to the present invention, the tip portion for discharging the cleaning fluid toward the surface of the object to be cleaned has an opening area of 1 time greater than 1, with respect to the opening area of the supply port receiving port of the cleaning fluid supplied from the outside. By using the discharge port, dirt on the surface of the object to be cleaned can be directly removed by a high-speed strip-shaped cleaning fluid having a further accelerated discharge rate with respect to the flow rate of the cleaning fluid supplied to the supply port receiving port. Negative pressure is generated in the cleaning unit by the high speed flow by the strip-shaped cleaning fluid discharged from the discharge port, and the attraction force acts to allow the discharge port to approach the surface of the object to be cleaned. This attraction increases as the distance between the object to be cleaned and the discharge port approaches zero. Here, the distance between the object to be cleaned and the discharge port decreases, and the flow velocity of the fluid jet of the cleaning fluid increases, so that the fluid drag acting on the particles such as dust becomes larger, thereby allowing the particles such as dust to escape from the object to be cleaned. Enhance the effect. In addition, the attraction force of the discharge port is added to this attraction force.

Further, according to the present invention, the discharge ports facing each other of the two cleaning units have a tip portion for discharging the cleaning fluid toward the surface of the object to be cleaned with respect to the opening area of the supply port receiving port of the cleaning fluid supplied from the outside. Since the opening area is more than 1 times the amount of amniotic fluid, the dirt on the surface of the to-be-cleaned object which is removed by direct flow with the stripe-like cleaning fluid discharged from the two discharge ports is efficiently suctioned at a central discharge port. Since the cleaning fluid can be discharged and the cleaning fluid is discharged by enclosing the cleaning area of the object to be cleaned with two discharge ports, the cleaning fluid and the removed dirt are not diffused to the outside.

Further, according to the present invention, since the discharge ports facing each other are disposed symmetrically with respect to the discharge ports, the dirt on the surface of the object to be removed which is removed from the two discharge ports by being discharged by the high-speed strip-shaped cleaning fluid discharged from each of the discharge ports is discharged from each discharge port. The cleaning fluid is discharged by joining at the central vicinity of the outlet located in the center of the outlet, efficiently suctioning and discharging at once, and discharging the cleaning fluid by enclosing the cleaning area of the object to be cleaned with the two discharge ports. And the removed dirt is not spread outside.

Further, according to the present invention, since the discharge port has an opening area more than one in proportion to the opening area of the supply port receiving port portion of the cleaning fluid, even the high viscosity cleaning fluid can be easily sucked out and discharged, Compared with the conventional method of the same cross-sectional area of the supply port and the discharge port, the suction efficiency is further improved.

Further, according to the present invention, the cross-sectional shape of the contact surface with the cleaning fluid orthogonal to the moving direction of the object to be cleaned is formed in an arc shape from the distal end of the discharge port to the outlet outlet, and the length corresponding to the width of the object to be cleaned. Since the opening is further provided, the suction and discharge of the strip-shaped cleaning fluid high-speed flow discharged from the discharge port of the slit-shaped opening of the length corresponding to the width of the object to be cleaned can be sucked out without leaving. As a result, the suction efficiency is significantly improved compared to the conventional method of the same cross-sectional area of the supply port and the discharge port.

Further, according to the present invention, since the cleaning unit is supported by a plurality of elastic bodies whose one end is in contact with the external fixing plate, it assists the negative pressure generated in the cleaning unit by the high speed flow by the cleaning fluid discharged from the discharge port, Since the gap between the cleaning unit and the object to be cleaned is always maintained at an appropriate gap, the contact breakage of the cleaning unit and the object to be cleaned is automatically prevented, and the stability of the cleaning effect and the stability of the object to be cleaned are obtained.

In addition, according to the present invention, since the elastic body is provided with a variable control mechanism of the elastic modulus, the viscosity that changes according to the selection of the variety of the cleaning fluid and the liquid temperature at the time of operation are detected, and the discharge port according to the viscosity and the liquid temperature. In order to keep track of the negative pressure generated in the cleaning unit due to the high speed flow of the cleaning fluid discharged from the cleaning unit, the gap between the cleaning unit and the object to be cleaned is always maintained at an appropriate gap. With the discharged high speed cleaning fluid, dirt on the surface of the object to be cleaned can be removed directly, and an accidental contact failure of the cleaning unit and the object to be cleaned is automatically prevented.

Further, according to the present invention, since the elastic body is controlled by an arbitrary elastic modulus in accordance with the weight of the washing unit previously inputted into the variable control mechanism of the elastic modulus, the weight of the weight varies depending on the various wet processing apparatuses and the type of the cleaning fluid. Even when the cleaning unit is selected, the weight can be input to control the gap between the cleaning unit and the object to be cleaned at predetermined intervals.

According to the present invention, there is also provided a flow rate sensor for detecting the flow rate of the cleaning fluid supplied from the supply port facing the variable control mechanism of the elastic modulus, wherein the elastic modulus of the elastic body is the variable in which the detection signal of the flow sensor is input. Since it can be controlled by a control mechanism, it can control so that the clearance gap between the washing | cleaning unit and the to-be-cleaned substance at a predetermined flow volume may be maintained at predetermined intervals, and the flow volume (flow rate) of the washing | cleaning fluid is a washing | cleaning fluid Even if the temperature changes, the viscosity changes, and the flow rate changes, it is appropriately controlled. In addition, even if the supply of the cleaning fluid is stopped, an accidental breakage of contact between the cleaning unit and the object to be cleaned can be prevented automatically.

Moreover, according to this invention, the variable control mechanism of elasticity modulus is provided with the temperature sensor which detects the temperature of the washing | cleaning fluid supplied from the opposing supply port, The elasticity modulus of an elastic body is the input signal which the detection signal of the temperature sensor inputs. Since it is controlled by the variable control mechanism, even if the temperature of the cleaning fluid changes and the viscosity changes, the cleaning unit and the cleaning unit follow the change in the negative pressure generated in the cleaning unit by the high speed flow by the cleaning fluid discharged from the discharge port. Since a proper clearance is always maintained between the objects to be cleaned, dirt on the surface of the object to be cleaned can be removed directly by a high-speed cleaning fluid discharged from the discharge port at an angle and distance appropriate to the object to be cleaned at all times. Contact breakage of the object and the object to be cleaned is automatically prevented.

Further, according to the present invention, the variable control mechanism of the elastic modulus includes a gap sensor for detecting a gap between the cleaning unit and the object to be cleaned, and the elastic modulus of the elastic body is used to determine the gap between the cleaning unit and the object to be cleaned. Since the detection signal is controlled by an input variable control mechanism, an appropriate gap can be maintained even with respect to an instantaneous change in the gap between the cleaning unit and the object to be cleaned, and an accidental breakage of contact between the cleaning unit and the object to be cleaned is automatically performed. At the same time, the dirt on the surface of the object to be cleaned can be removed directly by the high speed flow cleaning fluid discharged from the discharge port at an angle appropriate to the object to be cleaned.

Further, according to the present invention, the variable control mechanism of the elastic modulus is provided with a to-be-detected sensor for detecting the presence or absence of the object to be cleaned, and the elastic modulus of the elastic body is such that the clearance between the cleaning unit and the object to be kept at a predetermined interval. Since the detection signal of the object to be cleaned is controlled by an input variable control mechanism, the presence or absence of the object to be cleaned is detected in the wet processing apparatus, and when the object to be cleaned is not mounted, the cleaning unit and the object to be cleaned are By maintaining the gap with the carrier of the water at a predetermined interval, contact breakage can be prevented automatically, and the supply device such as the cleaning fluid can be inadvertently operated.

Further, according to the present invention, since the cleaning unit includes a stopper that operates when the clearance between the cleaning unit and the object to be cleaned is less than or equal to a predetermined interval, a mechanism or a sensor for controlling the gap between the cleaning unit and the object to be cleaned. Even if an abnormality occurs, the gap that does not damage the object to be cleaned can be maintained by the stopper.

Moreover, according to this invention, the washing | cleaning unit is equipped with any one or both of the pressure pump which pressurizes and supplies the washing | cleaning fluid supplied to a supply port, and the suction pump which sucks the washing | cleaning fluid discharged | emitted from a discharge port. Therefore, by controlling the pressure, the number of rotations of the suction pump, and the like, depending on the viscosity, the temperature of the cleaning fluid, the size of the object to be cleaned, and the like, the blood is removed directly from the discharge port by the high speed flow strip cleaning fluid. Dirt on the surface of the cleaning water can be suctioned and discharged efficiently at a single outlet.

Claims (18)

delete delete A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; And an opening cross-sectional area of said outlet port is a multiple of more than 1 with respect to the opening cross-sectional area of the supply port of said cleaning fluid. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; Having two cleaning units disposed symmetrically close to the surface of the object to be cleaned, and having a common discharge port between the two cleaning units, And an opening cross-sectional area of said outlet port is a multiple of more than 1 with respect to the opening cross-sectional area of the supply port of said cleaning fluid. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; The cross-sectional shape of the contact surface with the cleaning fluid orthogonal to the movement direction of the object to be cleaned of the discharge port is formed in an arc shape from the distal end of the discharge port to the outlet of the discharge port, and has a length corresponding to the width of the object to be cleaned. Wet processing apparatus further comprising an opening. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; Having two cleaning units disposed symmetrically close to the surface of the object to be cleaned, and having a common discharge port between the two cleaning units, The cross-sectional shape of the contact surface with the cleaning fluid orthogonal to the movement direction of the object to be cleaned of the discharge port is formed in an arc shape from the distal end of the discharge port to the outlet of the discharge port, and has a length corresponding to the width of the object to be cleaned. Wet processing apparatus further comprising an opening. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; And the cleaning unit is supported by a plurality of elastic bodies, one end of which is in contact with the external fixing plate. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; Having two cleaning units disposed symmetrically close to the surface of the object to be cleaned, and having a common discharge port between the two cleaning units, And the cleaning unit is supported by a plurality of elastic bodies, one end of which is in contact with the external fixing plate. The wet processing device according to claim 7 or 8, wherein the elastic body is provided with a variable control mechanism of the elastic modulus. The wet processing apparatus according to claim 9, wherein the elastic body is controlled to an arbitrary elastic modulus in accordance with a weight of the cleaning unit previously input to the variable control mechanism of the elastic modulus. The said variable control mechanism of the elasticity modulus is provided with the flow rate sensor which detects the flow volume of the washing | cleaning fluid supplied from the said supply port, The elasticity modulus of the said elastic body is the said which the detection signal of the said flow sensor was inputted. The wet processing apparatus characterized by being controlled by the variable control mechanism of the elastic modulus. The said variable control mechanism of the elasticity modulus is provided with the temperature sensor which detects the temperature of the washing | cleaning fluid supplied from the said supply port, The elasticity modulus of the said elastic body is the said which the detection signal of the said temperature sensor was inputted. The wet processing apparatus characterized by being controlled by the variable control mechanism of the elastic modulus. The said variable control mechanism of the elasticity modulus is provided with the clearance sensor which detects the clearance gap between the said washing | cleaning unit and the surface of the to-be-cleaned object, The elasticity modulus of the said elastic body is the said which the detection signal of the said clearance sensor was input. The wet processing apparatus characterized by being controlled by the variable control mechanism of the elastic modulus. The said elasticity control element of Claim 9 with which the variable control mechanism of the elasticity modulus is equipped with the to-be-detected object sensor which detects the presence or absence of the to-be-cleaned object, and whose elasticity modulus of the said elastic body inputs the detection signal of the to-be-cleaned object sensor. The wet processing apparatus controlled by the variable control mechanism of the coefficient. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; And the cleaning unit includes a stopper that operates when the clearance between the cleaning unit and the surface of the object to be cleaned is equal to or less than a predetermined interval. A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; Having two cleaning units disposed symmetrically close to the surface of the object to be cleaned, and having a common discharge port between the two cleaning units, And the cleaning unit includes a stopper that operates when the clearance between the cleaning unit and the surface of the object to be cleaned is equal to or less than a predetermined interval. delete A supply port disposed in close proximity to the surface of the object to be cleaned and having a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside in a band shape to the surface of the object to be cleaned, and the cleaning fluid discharged from the discharge port are discharged. A wet processing apparatus having a cleaning unit having an outlet to be provided, A cleaning unit having an opening cross-sectional area of one time greater than 1 with respect to the opening cross-sectional area of the supply port of the cleaning fluid supplied from the outside, wherein the discharge port is arranged in a direction orthogonal to the moving direction of the object to be cleaned; Having two cleaning units disposed symmetrically close to the surface of the object to be cleaned, and having a common discharge port between the two cleaning units, And one or both of the pressure pump for pressurizing and supplying the cleaning fluid supplied to the supply port, and the suction pump for sucking the cleaning fluid discharged from the discharge port. Wet processing device.

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