TW200616066A - Wet treatment apparatus - Google Patents

Wet treatment apparatus

Info

Publication number
TW200616066A
TW200616066A TW094132368A TW94132368A TW200616066A TW 200616066 A TW200616066 A TW 200616066A TW 094132368 A TW094132368 A TW 094132368A TW 94132368 A TW94132368 A TW 94132368A TW 200616066 A TW200616066 A TW 200616066A
Authority
TW
Taiwan
Prior art keywords
fluid
washed
cleaning
sectional area
discharge
Prior art date
Application number
TW094132368A
Other languages
Chinese (zh)
Other versions
TWI290738B (en
Inventor
Noriyo Tomiyama
Original Assignee
Future Vision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Future Vision Inc filed Critical Future Vision Inc
Publication of TW200616066A publication Critical patent/TW200616066A/en
Application granted granted Critical
Publication of TWI290738B publication Critical patent/TWI290738B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Abstract

To provide a wet treatment apparatus provided with a washing nozzle which is easy in the suction of a high viscosity fluid without using any ultrasonic wave, and has no left-over residue. A washing unit 11 arranged in the vicinity of a surface of a material to be washed 8, and having a supply port 2 with a slit discharge port 10 to discharge a fluid for cleaning 9 supplied from the outside in a belt shape on the surface of the material to be washed 8, and an outlet 3 discharging the fluid for cleaning 9 discharged from the discharge port 10 is provided. The washing unit where the cross-sectional area of the discharge port 10, the opening cross-sectional area of a tip portion to discharge the fluid for cleaning 9 toward the surface of the material to be washed 8, to the opening cross-sectional area of a supply port socket portion of the fluid for cleaning 9 supplied from the outside is one time a positive number exceeding one is arranged in a direction perpendicular to the moving direction of the material to be washed 8.
TW094132368A 2004-09-24 2005-09-19 Wet treatment apparatus TWI290738B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004276505A JP2006088033A (en) 2004-09-24 2004-09-24 Wet treatment apparatus

Publications (2)

Publication Number Publication Date
TW200616066A true TW200616066A (en) 2006-05-16
TWI290738B TWI290738B (en) 2007-12-01

Family

ID=36229511

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094132368A TWI290738B (en) 2004-09-24 2005-09-19 Wet treatment apparatus

Country Status (4)

Country Link
JP (1) JP2006088033A (en)
KR (1) KR100852335B1 (en)
CN (1) CN1751813B (en)
TW (1) TWI290738B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006327198A (en) * 2005-05-23 2006-12-07 Heidelberger Druckmas Ag Apparatus for applying liquid
KR100834827B1 (en) * 2006-11-16 2008-06-04 삼성전자주식회사 Apparatus for cleaning photo-mask and methode for cleaning used the same
JP4810411B2 (en) * 2006-11-30 2011-11-09 東京応化工業株式会社 Processing equipment
KR100858427B1 (en) 2007-02-27 2008-09-17 세메스 주식회사 Apparatus and method for cleaning substrate
JP5303741B1 (en) * 2011-12-28 2013-10-02 コニカミノルタ株式会社 Manufacturing method of glass substrate for information recording medium
KR101468460B1 (en) * 2013-06-12 2014-12-04 주식회사 에스케이테크놀러지 Apparatus for removing particle of substrate using Center Collection Intake
CN106623238B (en) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 Suction transfer type continuous cleaning system and method applied to thin glass substrate with thickness of 1-4mm
CN106623237B (en) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 Lifting type continuous cleaning system and cleaning method applied to thin glass substrate with thickness of 1-4mm
CN106670180B (en) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 Cleaning device and cleaning method applied to thin glass substrate with thickness of 1-4mm

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19530989C1 (en) * 1995-08-23 1997-03-13 Atotech Deutschland Gmbh Film stripping process
KR100306155B1 (en) * 1996-11-29 2001-11-30 이구택 Method for coating substrate with superior magnetic shielding property
US6165267A (en) * 1998-10-07 2000-12-26 Sandia Corporation Spin coating apparatus
JP2002075947A (en) * 2000-08-30 2002-03-15 Alps Electric Co Ltd Wet processor
JP4189279B2 (en) 2003-07-03 2008-12-03 株式会社東芝 Substrate processing equipment
JP4451175B2 (en) 2004-03-19 2010-04-14 大日本スクリーン製造株式会社 Nozzle cleaning apparatus and substrate processing apparatus

Also Published As

Publication number Publication date
CN1751813A (en) 2006-03-29
KR100852335B1 (en) 2008-08-18
TWI290738B (en) 2007-12-01
CN1751813B (en) 2010-06-02
JP2006088033A (en) 2006-04-06
KR20060051583A (en) 2006-05-19

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees