JP2007201186A - Substrate cleaning device and substrate cleaning method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning device which is capable of sufficiently removing foreign objects attached to the surface of a substrate with a small consumption of cleaning liquid. <P>SOLUTION: The substrate cleaning device 1 is equipped with a cleaning liquid supply unit 4 provided facing the cleaned surface 2a that is one of the main surfaces possessed by a substrate 2, and a cleaning roller 5 which is provided facing the cleaned surface 2a and located nearly in parallel with the cleaning liquid supply unit 4. The cleaning liquid supply unit 4 supplies cleaning liquid 3 onto the cleaned surface 2a, the roller 5 is rotated in the direction of an arrow 17 so as to send the supplied cleaning liquid 3 into a gap 6 formed between the cleaned surface 2a and the cleaning roller 5, and to form a shearing flow of the cleaning liquid 3 in the gap 6 to clean up the cleaned surface 2a. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a substrate cleaning apparatus and a substrate cleaning method.

  In the manufacture of an electronic device using a semiconductor or the like, the presence of foreign matter on the surface of the semiconductor substrate leads to defective operation of the electronic device, and thus the cleaning of the semiconductor substrate is indispensable. Also in the manufacture of flat panel displays such as liquid crystal display elements and plasma display panels (PDPs), dirt on the substrate affects display performance, so that cleaning of glass substrates and the like is indispensable. Therefore, in the manufacturing process of electronic devices and flat panel displays, a wide variety of substrate cleaning apparatuses and methods have been developed and put into practical use.

  As a conventional technique related to a substrate cleaning apparatus, pure water is supplied from a nozzle having a slit-like outlet to the substrate and rotated at a constant speed while lightly pressing a cylindrical nylon brush against the surface of the substrate. Scrub cleaning that removes foreign matter adhering to the surface has been developed (see Patent Document 1).

  In the cleaning method using the substrate cleaning apparatus disclosed in Patent Document 1, since the brush is brought into mechanical contact with the surface of the substrate, the surface of the substrate may be damaged. For example, in the recent increase in the degree of integration and the cleaning of the substrate surface having a fine structure, it is considered that the mechanical contact of the brush causes a problem that the yield rate of the device product decreases.

  In the cleaning of the substrate at the stage where the surface structure has not yet been miniaturized, the brush cleaning is a technology that has a very effective cleaning effect. However, the foreign matter removed from the substrate is taken into the brush and the brush itself When the substrate is cleaned with a contaminated brush, the foreign material in the brush may recontaminate the substrate. Therefore, the substrate cleaning apparatus of Patent Document 1 requires a configuration for self-cleaning the brush.

  However, even if the brush is self-cleaned, the brush will be worn out due to contact with the substrate for a long time, and the hair of the brush may be cut off. There is a problem of contaminating the substrate.

  Unlike conventional scrub cleaning using a brush, as a conventional technique for dealing with such a problem, a cleaning liquid is jetted from a nozzle to the surface to be cleaned of the substrate, and the surface opposite to the surface to be cleaned of the substrate is super-exposed. There has been proposed a cleaning apparatus that performs cleaning without causing mechanical contact with a substrate by ejecting a liquid to which ultrasonic waves are applied from a sonic nozzle (see Patent Document 2).

  In the prior art of Patent Document 2, foreign matter adhering to the substrate is lifted off by ultrasonic waves, and then the flow of the cleaning liquid is applied to the lifted foreign matter, so that the substrate is not mechanically contacted. Cleaning is possible.

  However, since it is necessary to always eject the cleaning liquid used for cleaning from the nozzle, there is a problem that a large amount of cleaning liquid is required. Also, in order to exert the effect of lifting off foreign matter by applying ultrasonic waves from the back surface of the substrate, a clean liquid such as ultrapure water must always be supplied from the ultrasonic nozzle to the substrate as an ultrasonic propagation medium. Therefore, there is a problem in that a large amount of cleaning liquid is required as in the case of the cleaning liquid ejected from the nozzle. Furthermore, when ultrapure water is ejected from the nozzle as a cleaning liquid at high speed, the ultrapure water is charged by static electricity generated by the flowing frictional force, and in the worst case, the structure of fine electrical wiring formed on the substrate surface There is a risk of being destroyed.

JP-A-6-13359 JP-A-2005-33092

  The present invention has been made in view of the above-described problems, and its purpose is to sufficiently remove foreign substances present on the substrate surface without mechanical contact with the substrate and with a small amount of cleaning liquid used. The present invention provides a substrate cleaning apparatus and a substrate cleaning method that can be removed.

The present invention provides a substrate cleaning apparatus for supplying a cleaning liquid to a surface to be cleaned, which is one surface of a substrate, and cleaning the substrate,
A cleaning liquid supply unit that faces the surface to be cleaned of the substrate and supplies a cleaning liquid to the surface to be cleaned of the substrate;
A cleaning roller provided so as to face the surface to be cleaned of the substrate so as to be substantially parallel to the cleaning liquid supply unit, and the cleaning roller that rotates to send the cleaning liquid to a gap formed between the surface to be cleaned and the substrate; A substrate cleaning apparatus comprising:

  In addition, the present invention is characterized in that it includes roller raising / lowering means for bringing the cleaning roller closer to and away from the surface to be cleaned.

In addition, the present invention is characterized in that it includes transport means for transporting the substrate in a substantially horizontal direction.
The present invention is also characterized in that the cleaning roller has a hydrophilic outer peripheral surface.

  In addition, the present invention is characterized by including a recovery means for recovering the cleaning liquid that is supplied to the surface to be cleaned of the substrate and separates from the surface to be cleaned.

  Further, the present invention is characterized in that the distance between the portion where the cleaning roller is closest to the surface to be cleaned and the surface to be cleaned is 3 mm or less.

The present invention provides a substrate cleaning method for supplying a cleaning liquid to a surface to be cleaned, which is one surface of a substrate, and cleaning the substrate.
Supplying a cleaning liquid to a surface to be cleaned from a cleaning liquid supply unit provided facing the surface to be cleaned of the substrate;
A step of feeding a cleaning liquid into a gap formed between the surface to be cleaned and the cleaning roller by rotation of a cleaning roller provided so as to face the surface to be cleaned of the substrate and to be substantially parallel to the cleaning liquid supply unit. This is a substrate cleaning method.

Further, the present invention is characterized in that the substrate to be cleaned is maintained in a substantially horizontal posture.
Further, the present invention is characterized in that pure water having a specific resistance of 10 MΩ · cm or more is used for the cleaning liquid.

  According to the present invention, the cleaning liquid supply unit that supplies the cleaning liquid to the surface to be cleaned of the substrate and the cleaning roller that faces the surface to be cleaned of the substrate and is provided to be substantially parallel to the cleaning liquid supply unit are provided. The supplied cleaning liquid is fed into the gap formed between the substrate and the surface to be cleaned by the rotation of the cleaning roller, and the surface to be cleaned is cleaned. There is provided a substrate cleaning apparatus capable of sufficiently removing foreign substances present on the substrate surface with the amount of liquid used.

  In addition, according to the present invention, the cleaning roller can be moved up and down according to the thickness of the substrate, including roller lifting means for moving the cleaning roller toward and away from the surface to be cleaned. The gap formed by the surface to be cleaned of the substrate can be easily set to an optimum distance.

  Further, according to the present invention, it is possible to include a transport unit that transports the substrate in a substantially horizontal direction, and the substrate can be cleaned while being transported by the transport unit. .

  Further, according to the present invention, since the outer peripheral surface of the cleaning roller is hydrophilic, the viscous friction between the surface of the cleaning roller and the cleaning liquid can be increased. This increases the force that is transmitted from the rotating cleaning roller and acts to move the cleaning liquid in contact with the outer peripheral surface of the cleaning roller, so that the surface to be cleaned of the cleaning liquid fed into the gap by the rotation of the cleaning roller The cleaning effect can be improved by increasing the flow velocity in the vicinity.

  In addition, according to the present invention, since the recovery means for recovering the cleaning liquid supplied to the surface to be cleaned of the substrate and separated from the surface to be cleaned is included, unnecessary scattering and retention of the cleaning liquid in the apparatus can be prevented. Further, by providing, for example, a circulation means including a purification device together with the recovery means, the recovered cleaning liquid can be repeatedly used without waste.

  Further, according to the present invention, the distance between the cleaning roller closest to the surface to be cleaned and the surface to be cleaned is set to 3 mm or less. Thus, the cleaning effect can be improved by increasing the flow rate of the cleaning liquid fed into the gap by the rotation of the cleaning roller in the vicinity of the surface to be cleaned.

  According to the present invention, the cleaning liquid is supplied to the surface to be cleaned from the cleaning liquid supply unit provided facing the surface to be cleaned of the substrate, and the supplied cleaning liquid is exposed to the surface to be cleaned and the cleaning liquid supply unit. By rotating the cleaning roller provided so as to be substantially parallel, it is sent to the gap formed between the surface to be cleaned and the cleaning roller to clean the surface to be cleaned. In addition, a substrate cleaning method that can sufficiently remove foreign substances present on the substrate surface with a small amount of cleaning liquid used is realized.

  Further, according to the present invention, the substrate to be cleaned is maintained in a substantially horizontal posture, so that the surface to be cleaned can be cleaned in a substantially uniform and sufficiently clean state.

  According to the present invention, since pure water having a specific resistance of 10 MΩ · cm or more is used as the cleaning liquid, a high cleaning effect can be realized with an easily available cleaning liquid.

  FIG. 1 is a top view showing a simplified configuration of a substrate cleaning apparatus 1 according to a first embodiment of the present invention, and FIG. 2 is a side view of the substrate cleaning apparatus 1 shown in FIG.

  The substrate cleaning apparatus 1 is provided so as to face the surface to be cleaned 2a, which is one surface of the substrate 2, and supplies cleaning liquid 3 to the surface 2a to be cleaned (hereinafter simply referred to as surface 2a to be cleaned). A cleaning roller 5 provided so as to face the surface 4a to be cleaned and to be substantially parallel to the cleaning liquid supply unit 4, and a gap 6 formed between the cleaning liquid 2 and the surface 2a to be cleaned by rotating. And the cleaning roller 5 fed to the The substrate cleaning apparatus 1 is used for supplying a cleaning liquid 3 to the surface to be cleaned 2a and removing and cleaning fine foreign matters such as particles adhering to the surface to be cleaned 2a.

  Examples of the substrate 2 to be cleaned by the substrate cleaning apparatus 1 include a glass substrate, a semiconductor substrate, and a silicon wafer. The substrate 2 is placed substantially horizontally on a transport means (not shown), and the surface to be cleaned 2a is cleaned while being transported in one predetermined direction (the arrow S direction shown in FIGS. 1 and 2). Is done. In the present embodiment, the planar shape of the substrate 2 is a rectangle, but is not limited to this, and may be a further polygonal shape or a contour formed by a curve.

  In this embodiment, the cleaning liquid supply unit 4 includes a supply main body 11 made of a straight metal pipe and a cleaning liquid supply port 12 provided on the side of the supply main body 11 facing the surface to be cleaned 2a. The cleaning liquid supply unit 4 extends in a direction orthogonal to the S direction, which is the conveyance direction of the substrate 2 (hereinafter, this direction is referred to as the width direction), and is parallel to the surface to be cleaned 2a, that is, horizontal. It is provided as follows. The length L3 of the cleaning liquid supply unit 4 in the width direction is formed to be at least longer than the width dimension L2 of the substrate 2. Accordingly, the cleaning liquid 3 can be supplied from the cleaning liquid supply unit 4 to the entire width direction of the substrate 2.

  A pipe (not shown) is connected to the cleaning liquid supply unit 4, and the pipe is further connected to a cleaning liquid supply source. The cleaning liquid supply source includes, for example, a cleaning liquid storage tank, a pump that pumps the cleaning liquid stored in the cleaning liquid storage tank to the pipe, and a power source that drives the pump. The cleaning liquid supply unit 4, the piping, and the cleaning liquid supply source constitute a cleaning liquid supply unit. The cleaning liquid 3 pumped from the cleaning liquid supply source to the pipe passes through the hollow supply main body 11 and is discharged from the cleaning liquid supply port 12 and supplied to the surface to be cleaned 2a.

  In this embodiment, the cleaning liquid 3 supplied from the cleaning liquid supply unit 4 to the surface to be cleaned 2a is pure water having a specific resistance of 10 MΩ · cm or more, more preferably ultrapure water having a specific resistance of 18 MΩ · cm or more. Used.

  Note that the cleaning liquid is not limited to pure water, and liquid obtained by adding carbon dioxide and / or ammonia to pure water or ultrapure water, so-called functional water, may be used. By using such a clean cleaning liquid or a clean cleaning liquid having a chemical action, it is possible to exert a good cleaning effect.

  The cleaning roller 5 includes a roller body 13 and a rotational power unit 14 that rotationally drives the roller body 13. The cleaning roller 5 is rotatably supported by the arm unit 15. The arm portion 15 is a kind of bearing member, and the cleaning roller 5 is rotatably supported by the bearing portion, and an end opposite to the bearing portion is attached to a frame member (not shown) or the like in the substrate cleaning apparatus 1. . The rotational power unit 14 includes, for example, an electric motor and a pinch roller, and rotates the rotational axis (not shown) of the cleaning roller 5 supported by the arm unit 15 by pressing the pinch roller rotated by the electric motor. The rotational power unit 14 is not limited to the above example, and other rotational driving means may be used.

  The roller body 13 is made of a metal such as stainless steel, and may have a columnar shape. Alternatively, the roller body 13 may be cylindrical and closed at both ends in the axial direction to provide a rotating shaft member in order to reduce the weight. Good.

  It should be noted in the roller main body 13 of the present embodiment that the hydrophilic treatment layer 16 is formed so that the outer peripheral surface thereof has hydrophilicity. The method of forming the hydrophilic treatment layer 16 on the outer peripheral surface of the roller main body 13 is not particularly limited, and may be a method of forming a silica-based hydrophilic film or a treatment of roughening by laser irradiation. . Examples of the silica-based hydrophilic film include those obtained by applying a paint obtained by adding polyacrylic acid to sodium silicate, and those obtained by applying a paint obtained by adding titanium oxide as a photocatalyst to a silicone resin. In addition, the resin film which added the titanium oxide expresses hydrophilicity by receiving an ultraviolet-ray.

  The cleaning roller 5 is provided on the upstream side of the cleaning liquid supply unit 4 with respect to the transport direction S of the substrate 2 so as to face the surface to be cleaned 2 a and be substantially parallel to the cleaning liquid supply unit 4. The width L of the roller body 13 in the cleaning roller 5, that is, the dimension L1 in the axial direction is formed to be at least longer than the width L2 of the substrate 2. Accordingly, the cleaning roller 5 can clean the entire width direction of the substrate 2.

  FIG. 3 is a diagram for explaining the state of the flow of the cleaning liquid in the gap formed by the surface to be cleaned and the cleaning roller. Hereinafter, the cleaning of the surface 2a to be cleaned with the cleaning liquid 3 will be described with reference to FIGS.

  The board | substrate 2 is conveyed by the conveyance part not shown in the direction of arrow S, maintaining a substantially horizontal attitude | position. In a state where the substrate 2 is conveyed in the S direction, the cleaning liquid 3 is supplied from the cleaning liquid supply unit 4 to the surface 2a to be cleaned, and the roller main body 13 of the cleaning roller 5 is rotated in the direction of arrow 17. As a result, due to the viscous friction between the outer peripheral surface of the roller main body 13 and the cleaning liquid 3, the roller main body 13 sends the cleaning liquid 3 into the gap 6 formed between the surface to be cleaned 2a and the roller main body 13. Therefore, the arrows 18 and 19 reverse to the substrate transport direction S on the downstream side and the upstream side in the substrate transport direction S at the closest position to the surface to be cleaned 2a of the roller body 13 of the gap 6 The flow of the cleaning liquid 3 shown in FIG.

  At this time, the shearing force applied to the cleaning liquid 3 in the gap 6 by the movement of the surface 2a to be cleaned 2 conveyed in the direction of the arrow S and the rotation in the direction of the arrow 17 of the roller body 13 is applied. As a result, a shear flow 20 is formed. Since the shearing flow 20 is formed, a flow 20a of the cleaning liquid 3 in the very vicinity of the surface to be cleaned 2a is generated. Therefore, fine foreign matter adhering to the surface to be cleaned 2a receives a force from the flow 20a, and the surface to be cleaned. Removed from 2a.

  In the substrate cleaning apparatus 1, the cleaning effect can be further improved by the following method. One method is to increase the rotational speed of the roller body 13 in the direction of the arrow 17. By increasing the rotational speed of the roller body 13 in the direction of the arrow 17, the speed of the flow 20 b of the cleaning liquid 3 formed in the vicinity of the outer peripheral surface of the roller body 13 is further increased, and the velocity gradient of the shear flow 20 is increased. Become.

  The velocity gradient qualitatively represents the difference in velocity between the flow 20b of the cleaning liquid 3 formed near the outer peripheral surface of the roller body 13 and the flow 20a of the cleaning liquid 3 formed near the surface 2a to be cleaned. This is considered to be divided by the distance formed between the cleaning surface 2a and the roller body 13 closest to the surface to be cleaned 2a, that is, the distance h of the shortest portion of the gap 6 (hereinafter referred to as the gap distance h). Here, a case where the speed difference between the flow 20b of the cleaning liquid 3 and the flow 20a of the cleaning liquid 3 is large is called a speed gradient, and a case where the speed difference between the flow 20b of the cleaning liquid 3 and the flow 20a of the cleaning liquid 3 is small is a speed gradient. Let's call it small.

  Since the velocity gradient of the shear flow 20 is increased, that is, the velocity of the flow 20b of the cleaning liquid 3 is increased, the velocity of the flow 20a of the cleaning liquid 3 in the vicinity of the surface to be cleaned 2a is also increased. The removal effect can be improved by increasing the force that the fine foreign matter adhering to the surface 2a receives from the flow.

  Another method for further improving the cleaning effect is to reduce the gap distance h. By reducing the gap distance h, the force that forms the shear flow 20 of the cleaning liquid 3 by the viscous friction between the outer peripheral surface of the roller body 13 and the cleaning liquid 3 is exerted on the cleaning liquid 3 closer to the surface to be cleaned 2a. Therefore, the speed of the flow 20a of the cleaning liquid 3 in the vicinity of the surface to be cleaned 2a can be increased, and the fine foreign matter adhering to the surface to be cleaned 2a can increase the force received from the flow to improve the removal effect. .

  Thus, the gap distance h contributing to the cleaning effect is preferably set to be 3 mm or less, and more preferably 1 mm or less. If the gap distance h exceeds 3 mm, the force that forms the shear flow 20 of the cleaning liquid 3 due to the viscous friction between the roller body 13 and the cleaning liquid 3 does not reach the vicinity of the surface to be cleaned 2a. The speed of the shearing flow 20a formed in the vicinity of is low, and fine foreign matters cannot be sufficiently removed.

  The smaller the gap distance h, the better because the force that forms the shear flow 20 of the cleaning liquid 3 due to viscous friction between the roller body 13 and the cleaning liquid 3 easily reaches the vicinity of the surface to be cleaned 2a. However, if the gap distance h is too small, the outer peripheral surface of the roller body 13 may come into contact with the surface to be cleaned 2a.

  In this embodiment, pure water or ultrapure water is used as the cleaning liquid 3, and the hydrophilic treatment layer 16 is formed on the roller main body 13 of the cleaning roller 5, so that the outer peripheral surface of the roller main body 13 and the cleaning liquid 3 The viscous friction can be increased. Therefore, the viscous friction between the outer peripheral surface of the roller body 13 and the cleaning liquid 3 is increased without increasing the rotational speed of the roller body 13 in the direction of the arrow 17 and without reducing the gap distance h. As a result, the speed of the flow 20b of the cleaning liquid 3 in the vicinity of the outer peripheral surface of the roller main body 13 can be increased, and the speed gradient can be increased. Therefore, the speed of the flow 20a of the cleaning liquid 3 in the vicinity of the surface to be cleaned 2a is also increased. The removal effect can be improved by increasing the force received from the flow by the fine foreign matter that is accelerated and adheres to the surface to be cleaned 2a.

  Further, in the substrate cleaning apparatus 1 of the present invention, the cleaning liquid 3 flowing to the upstream side in the transport direction of the substrate 2 by the rotation of the cleaning roller 5 in the direction of the arrow 17 causes the surface to be cleaned of the substrate 2 transported in the arrow S direction. It is returned to the cleaning roller 5 by the action of the surface tension with 2a. The cleaning liquid 3 returning to the direction of the cleaning roller 5 acts as a kind of weir so that the cleaning liquid 3 supplied from the cleaning liquid supply unit 4 is stored in the gap 6, and is supplied from the cleaning liquid supply unit 4. It is possible to keep the amount of the cleaning liquid 3 that contributes to a small amount.

  FIG. 4 is a side view showing a simplified configuration of the substrate cleaning apparatus 21 according to the second embodiment of the present invention. The substrate cleaning apparatus 21 of the present embodiment is similar to the substrate cleaning apparatus 1 of the first embodiment, and corresponding portions are denoted by the same reference numerals and description thereof is omitted.

  What should be noted in the substrate cleaning apparatus 21 is that the cleaning roller 5 is moved closer to and away from the surface 2a to be cleaned, a roller lifting and lowering means 22, a transport means 23 for transporting the substrate 2 in a substantially horizontal direction, and a target to be cleaned. And a recovery means 24 that recovers the cleaning liquid 3 that is supplied to the surface 2a and leaves the surface 2a to be cleaned.

  The roller lifting / lowering means 22 includes, for example, a ball screw and an electric motor that rotationally drives the screw shaft of the ball screw, and is mounted on a frame (not shown) of the substrate cleaning apparatus 21. The nut of the ball screw of the roller lifting / lowering means 22 is attached to the arm portion 15. A screw shaft of a ball screw that is screwed onto the nut is rotatably mounted on the frame of the device.

  When the screw shaft that is screwed into the nut of the ball screw is driven to rotate, the nut reciprocates relative to the screw shaft. In accordance with the reciprocating motion of the nut of the ball screw, the cleaning roller 5 supported by the arm portion 15 to which the nut is attached moves toward the cleaned surface 2a and moves away from the cleaned surface 2a, that is, moves up and down. be able to.

  The gap distance h can be set to a desired size of 3 mm or less by moving the cleaning roller 5 up and down by the roller lifting means 22 according to the thickness of the substrate 2 to be cleaned.

  The conveyance means 23 includes a plurality of conveyance rollers 25 that are rotatably provided with a rotation axis extending in the width direction, and conveyance roller drive means (not shown) that rotationally drives the conveyance rollers 25 in the direction of the arrow 26. The The conveying roller driving means may be configured such that a driving source is provided for each individual conveying roller, and the driving force of one or several driving sources is transmitted to a plurality of conveying rollers 25 by a chain or a belt. It may be configured.

  The plurality of transport rollers 25 are arranged below the cleaning roller 5 and the cleaning liquid supply unit 4 so that a virtual plane 27 connecting the rotation tops is substantially parallel to a horizontal plane, and the virtual plane 27 connecting the rotation tops is the substrate 2. Configure the pass line. The board | substrate 2 is mounted on the some conveyance roller 25, and when the conveyance roller 25 is rotationally driven, it is conveyed in the direction shown by the arrow S which is a predetermined one direction, maintaining a horizontal attitude | position.

  The recovery means 24 includes a cleaning liquid recovery tank 28 provided below the plurality of transport rollers 25, a recovery pipe 29 connected to the cleaning liquid recovery tank 28, and a used cleaning liquid storage tank (not shown) connected to the recovery pipe. Consists of including. The cleaning liquid recovery tank 28 is a pallet-shaped tank made of, for example, stainless steel, and a drain port 30 is formed in a portion located below the cleaning roller 5 through the bottom wall of the cleaning liquid recovery tank 28. The recovery pipe 29 is connected to the drain port 30.

  When a certain amount of the cleaning liquid 3 supplied to the surface to be cleaned 2a from the cleaning liquid supply unit 4 stays on the surface to be cleaned 2a, the excess liquid starts to detach from the substrate 2, that is, spills. It is recovered in the cleaning liquid recovery tank 28. The cleaning liquid 3 recovered in the cleaning liquid recovery tank 28 flows from the drain port 30 formed in the bottom wall portion of the cleaning liquid recovery tank 28 to the recovery pipe 29, and passes through the recovery pipe 29 to the outside of the main body of the substrate cleaning apparatus 21. Is stored in a used cleaning liquid storage tank.

  A cleaning liquid purification device including a filter or the like may be provided in the middle of the recovery pipe 29 or adjacent to the used cleaning liquid storage tank. By providing the purification device and returning the purified cleaning liquid to the cleaning liquid storage tank of the cleaning liquid supply means, the cleaning liquid can be used repeatedly, and the cost of the cleaning liquid can be reduced.

  In the substrate cleaning apparatus 21, the substrate 2 to be cleaned is transported by the transport roller 25 while maintaining a horizontal posture in the arrow S direction, and moves so as to pass below the cleaning roller 5 and the cleaning liquid supply unit 4. When the substrate 2 is conveyed and positioned below the cleaning roller 5 and the cleaning liquid supply unit 4, the cleaning liquid 3 supplied from the cleaning liquid supply unit 4 to the surface 2 a to be cleaned is separated by the rotation of the roller body 13 of the cleaning roller 5. 6 is sent.

  The cleaning liquid 3 fed into the gap 6 forms a shear flow 20 by viscous friction with the outer peripheral surface of the roller main body 13. By the shear flow 20a formed in the vicinity of the surface to be cleaned 2a, fine foreign substances adhering to the surface to be cleaned 2a are removed and cleaned. Further, the substrate 2 is transported in the direction of the arrow S, and the entire surface to be cleaned 2a passes below the cleaning roller 5, whereby the entire surface is cleaned.

  As described above, the present embodiment exemplifies the case where pure water is used as the cleaning liquid, but is not limited thereto, and functional water, alkaline hydrogen water, ozone water, hydrogen peroxide water, An acid or the like may be used.

It is a top view which simplifies and shows the structure of the board | substrate cleaning apparatus 1 which is 1st Embodiment of this invention. It is a side view of the substrate cleaning apparatus 1 shown in FIG. It is a figure explaining the state of the flow of the cleaning liquid in the gap formed by the surface to be cleaned and the cleaning roller. It is a side view which simplifies and shows the structure of the board | substrate cleaning apparatus 21 which is 2nd Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1,21 Substrate cleaning apparatus 2 Substrate 3 Cleaning liquid 4 Cleaning liquid supply part 5 Cleaning roller 6 Gap 22 Roller raising / lowering means 23 Conveying means 24 Recovery means

Claims (9)

In a substrate cleaning apparatus for supplying a cleaning liquid to a surface to be cleaned which is one surface of a substrate and cleaning it,
A cleaning liquid supply unit that faces the surface to be cleaned of the substrate and supplies a cleaning liquid to the surface to be cleaned of the substrate;
A cleaning roller provided so as to face the surface to be cleaned of the substrate so as to be substantially parallel to the cleaning liquid supply unit, and the cleaning roller that rotates to send the cleaning liquid to a gap formed between the surface to be cleaned and the substrate; A substrate cleaning apparatus comprising:   2. The substrate cleaning apparatus according to claim 1, further comprising roller lifting / lowering means for moving the cleaning roller toward and away from the surface to be cleaned.   The substrate cleaning apparatus according to claim 1, further comprising a transport unit configured to transport the substrate in a substantially horizontal direction.   The substrate cleaning apparatus according to claim 1, wherein an outer peripheral surface of the cleaning roller is hydrophilic.   The substrate cleaning apparatus according to claim 1, further comprising a recovery unit that recovers a cleaning liquid that is supplied to the surface to be cleaned of the substrate and leaves the surface to be cleaned.   The substrate cleaning apparatus according to claim 1, wherein a distance between a portion where the cleaning roller is closest to the surface to be cleaned and the surface to be cleaned is 3 mm or less. In the substrate cleaning method of cleaning by supplying a cleaning liquid to the surface to be cleaned, which is one surface of the substrate,
Supplying a cleaning liquid to a surface to be cleaned from a cleaning liquid supply unit provided facing the surface to be cleaned of the substrate;
A step of feeding a cleaning liquid into a gap formed between the surface to be cleaned and the cleaning roller by rotation of a cleaning roller provided so as to face the surface to be cleaned of the substrate and to be substantially parallel to the cleaning liquid supply unit. And a substrate cleaning method.   8. The substrate cleaning method according to claim 7, wherein the substrate to be cleaned is maintained in a substantially horizontal posture. 9. The substrate cleaning method according to claim 7, wherein pure water having a specific resistance of 10 MΩ · cm or more is used as the cleaning liquid.

Images