JP2002159922A - Ultrasonic cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To clean a substrate to be cleaned with a cleaning solution to which ultrasonic vibrations are added and to prevent fine particles removed from the cleaning surface of the substrate to be cleaned from resticking onto a cleaned surface without consuming a large amount of the cleaning solution. SOLUTION: A first spray nozzle 7 for spraying the cleaning solution onto one surface 5 of the substrate 3 to be cleaned is provided at a prescribed interval from the surface 5 of the substrate 3, and a second spray nozzle 10 for spraying the cleaning solution onto the other surface 4 of the substrate 3 is provided at a prescribed interval from the surface 4 of the substrate 3. Ultrasonic vibrations are added to the cleaning solution sprayed from the first spray nozzle 7 by an ultrasonic vibration generation means 8. The second spray nozzle 10 is provided on the downstream side of the first spray nozzle 7 in the conveying direction and sprays the cleaning solution toward the upstream side from the downstream side in the conveying direction so as to remove stuck particles from the surface 4 of the substrate 3.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic cleaning apparatus for cleaning fine particles adhering to a substrate to be cleaned with a cleaning liquid to which ultrasonic vibration is applied.

[0002]

2. Description of the Related Art Since a glass substrate for a liquid crystal used for manufacturing a liquid crystal display device needs to have a high degree of cleanliness, there is a process of cleaning the glass substrate for a liquid crystal in the manufacturing process of the liquid crystal display device. A method for cleaning a substrate to be cleaned, such as a glass substrate for liquid crystal, which requires a high degree of cleanliness, includes a dip method in which a plurality of substrates to be cleaned are immersed in a cleaning solution at a time, and a dip method. There is a single-wafer method in which a cleaning liquid is sprayed toward the substrate and the cleaning is performed one by one. In recent years, a substrate to be cleaned having a high degree of cleanliness can be obtained, and a single-wafer method which is advantageous in terms of cost when manufacturing a large-sized substrate tends to be frequently used.

[0003] As one of the single-wafer systems, for example, ultrasonic vibration is applied to a cleaning liquid sprayed onto a substrate to be cleaned,
The acceleration and straight flow of the cleaning solution by ultrasonic vibration
A cleaning method for removing fine particles from a substrate to be cleaned has been put to practical use. If the frequency is too low, it is difficult for the ultrasonic vibrator used in the ultrasonic cleaning apparatus utilizing ultrasonic waves to exert the effect of adding the ultrasonic wave to the cleaning liquid, and if the frequency is too high, the substrate to be cleaned by cavitation is removed. A frequency of about 1 MHz is used because of fear of damage.

FIG. 10 is a sectional view showing a simplified structure of a conventional ultrasonic cleaning apparatus 101. As shown in FIG. The ultrasonic cleaning apparatus 101 shown in FIG. 10 describes only the main part of the configuration, and omits detailed description. Conventional ultrasonic cleaning apparatus 101
The substrate to be cleaned 102 is transported in the direction of the arrow 103, and the cleaning surface 10
Cleaning nozzles 105 are provided at an interval from 4. The cleaning nozzle 105 includes an ultrasonic vibrator 106, and the ultrasonic vibrator 106 includes a cleaning liquid 108 in the cleaning nozzle 105.
In addition, ultrasonic vibration is applied to the cleaning liquid 109 sprayed from the nozzle hole 107 of the cleaning nozzle 105 toward the substrate to be cleaned 102. Further, the cleaning liquid 109 sprayed toward the substrate 102 to be cleaned contacts the cleaning surface 104 of the substrate 102 to be cleaned, and the ultrasonic wave propagates in the cleaning liquid 109 sprayed. Is added.

Since ultrasonic vibration is applied to the substrate to be cleaned 102, ultrasonic vibration is also applied to fine particles attached to the cleaning surface 104, and both the substrate to be cleaned 102 and the fine particles vibrate by ultrasonic waves. Fine particles are removed from the cleaning surface 104 by the acceleration and the straight flow of the cleaning liquid to which the ultrasonic vibration is applied. Further, the substrate to be cleaned 10
The fine particles removed from the cleaning surface 104 of the second cleaning surface 10
In some cases, functional water such as alkaline hydrogen water is used as the cleaning liquid in order to prevent redeposition on the cleaning liquid.

[0006]

Even if the fine particles are removed from the cleaning surface of the substrate to be cleaned by cleaning using a cleaning liquid to which ultrasonic vibrations are added, the fine particles are re-used on the cleaning surface using functional water. Even if the adhesion is prevented, it is not always possible to improve the cleanliness of the substrate to be cleaned.

That is, the used cleaning liquid containing fine particles used for cleaning the cleaning surface and containing fine particles removed from the cleaning surface does not entirely flow out of the cleaning surface but partially stays on the cleaning surface.
In particular, since the substrate to be cleaned moves in the transport direction, the used cleaning liquid tends to stay relatively upstream in the transport direction of the substrate to be cleaned. Therefore, the fine particles removed by the cleaning in the region where the cleaning liquid is sprayed move to the upstream side in the transport direction while being contained in the used cleaning liquid, and the chance of reattaching to the cleaning surface increases. As a result, the cleaning surface on the upstream side in the transport direction has a greater chance of adhering fine particles before being cleaned, and thus the cleanliness tends to deteriorate.

When the fine particles are prevented from re-adhering to the surface to be cleaned by using functional water such as alkaline hydrogen water as described above, a step of returning the substrate to be cleaned to neutral in the next step, for example, pure water Rinse is required. The pure water rinse that returns the substrate to be neutralized reduces the electrical repulsion between the fine particles and the substrate to be cleaned, and is removed from the cleaning surface by cleaning in the previous process. The fine particles brought up to the step may adhere again to the cleaning surface in the pure water rinsing step.

According to the investigation by the present inventors, as described above, even if the cleaning liquid is subjected to ultrasonic vibration to remove fine particles from the cleaning surface of the substrate to be cleaned, The fact that the cleaning liquid stays on the cleaning surface and the fine particles once removed adhere to the cleaning surface again is a factor that hinders improvement in cleanliness.

An object of the present invention is to clean a substrate to be cleaned with a cleaning liquid to which ultrasonic vibration has been applied, and to remove fine particles removed from the cleaning surface of the substrate to be cleaned without consuming a large amount of the cleaning liquid. It is an object of the present invention to provide an ultrasonic cleaning device capable of preventing adhesion and realizing improvement in cleanliness.

[0011]

SUMMARY OF THE INVENTION The present invention removes adhered fine particles from one surface of a substrate to be cleaned which is transported in a predetermined transport direction, using a cleaning liquid to which ultrasonic vibration is applied. In an ultrasonic cleaning apparatus, a first spray nozzle that is provided at a distance from the other surface of a substrate to be cleaned and sprays a cleaning solution onto the other surface; , An ultrasonic vibration generating means, and a second spray nozzle provided at a distance from one surface of the substrate to be cleaned and spraying a cleaning liquid onto one surface to be cleaned, the second spray nozzle comprising: It is arranged downstream of the first injection nozzle in the transport direction,
An ultrasonic cleaning apparatus provided so as to spray a cleaning liquid from a downstream side in a transport direction toward an upstream side.

According to the present invention, a first spray nozzle for spraying a cleaning liquid to which ultrasonic waves are applied is provided on the other surface of the substrate to be cleaned, and a second spray nozzle for spraying the cleaning liquid on one surface of the substrate to be cleaned is provided.
Since the ejection nozzles are provided, the two ejection nozzles can share the application of ultrasonic vibration to the cleaning liquid and the cleaning of one surface of the substrate to be cleaned. Thus, for the first injection nozzle, a cleaning liquid injection condition suitable for adding ultrasonic vibration is selected, and for the second injection nozzle, a cleaning liquid suitable for cleaning for removing fine particles from one surface of the substrate to be cleaned is selected. Since the conditions for spraying the cleaning liquid can be selected, the cleanliness of the substrate to be cleaned can be improved.

The second injection nozzle is provided downstream of the first injection nozzle in the transport direction and injects the cleaning liquid from the downstream side in the transport direction to the upstream side. The fine particles removed from the surface of the substrate are prevented from easily flowing out from one surface of the substrate to be cleaned and reattaching due to the flow of the cleaning liquid from the downstream side to the upstream side on the surface of the substrate to be cleaned. it can.

Further, according to the present invention, the gap formed by the nozzle member forming the nozzle hole of the second injection nozzle is smaller than the gap formed by the nozzle member forming the nozzle hole of the first injection nozzle. It is a cleaning device.

According to the present invention, the gap formed by the nozzle members forming the nozzle holes of the second injection nozzle is smaller than the gap formed by the nozzle members forming the nozzle holes of the first injection nozzle. As a result, the second spray nozzle can clean one surface of the substrate to be cleaned with a small amount of the cleaning liquid and obtain the flow velocity and the spray pressure necessary for removing the fine particles, thereby saving the consumption of the cleaning liquid. Cleaning efficiency can be ensured.

Further, the present invention is the ultrasonic cleaning apparatus wherein the cleaning liquid injection pressure of the second injection nozzle is higher than the cleaning liquid injection pressure of the first injection nozzle.

According to the present invention, the cleaning liquid injection pressure of the second injection nozzle is higher than the cleaning liquid injection pressure of the first injection nozzle. This ensures that the ultrasonic vibration is stably propagated to the substrate to be cleaned by the cleaning liquid of the first injection nozzle which is jetted at a low pressure, and the cleaning liquid of the second injection nozzle which is jetted at a high pressure. Since one of the surfaces is cleaned, the cleaning efficiency can be improved. Further, since the cleaning liquid of the second injection nozzle that is injected at a high pressure drives out the cleaning liquid of the first injection nozzle that is injected at a low pressure by a pressure difference, the cleaning liquid that is injected from the first injection nozzle becomes the second cleaning liquid. Mixing into the cleaning liquid injected by the injection nozzle can be suppressed.

The present invention also provides an ultrasonic cleaning apparatus for removing adhered fine particles from one surface of a substrate to be cleaned conveyed in a predetermined conveyance direction using a cleaning liquid to which ultrasonic vibration is applied. A first spray nozzle that is provided at a distance from the other surface of the substrate to be cleaned and sprays the cleaning liquid onto the other surface, and an ultrasonic wave that applies ultrasonic vibration to the cleaning liquid sprayed from the first spray nozzle A vibration generating means, and a second jet nozzle which is provided at an interval from one surface of the substrate to be cleaned and jets a cleaning liquid to one surface to be cleaned; A squeezing roller having an axis parallel to the surface of the substrate and having a length longer than the length in the direction perpendicular to the direction of transport of the substrate to be cleaned is rotatably provided around the axis at a predetermined interval from one surface. An ultrasonic cleaning device according to claim.

Further, the present invention is characterized in that the second injection nozzle is disposed downstream of the first injection nozzle in the transport direction, and is provided so as to inject the cleaning liquid from the downstream side in the transport direction to the upstream side. I do.

According to the present invention, on one surface side of the substrate to be cleaned, a squeezing roller is rotatably spaced from one surface of the substrate to be cleaned around an axis parallel to the surface of the substrate to be cleaned. Provided. The squeezing roller scrapes off the excess cleaning liquid jetted to one surface of the substrate to be cleaned by the second jet nozzle, so that the cleaning liquid does not stay excessively on one surface of the substrate to be cleaned. Further, the fine particles removed from one surface by the cleaning liquid jetted from the second jet nozzle easily flow out from the one surface by the flow of the cleaning liquid from the downstream side to the upstream side on the one surface. This can reduce the chance of the fine particles contained in the cleaning liquid once removed from one surface of the substrate to be cleaned re-adhering to the one surface of the substrate to be cleaned.

Further, the present invention provides a method in which the aperture roller is provided at one end of the aperture roller, including the axis of the aperture roller and parallel to the plate surface of the substrate to be cleaned, centering on the other end of the aperture roller. An ultrasonic cleaning apparatus characterized by including an angular displacement driving means for performing angular displacement.

According to the present invention, the aperture roller is provided with angular displacement driving means for angularly displacing the aperture roller around the other end of the aperture roller in a plane parallel to the plate surface of the substrate to be cleaned. Thus, the flow direction and the flow velocity of the cleaning liquid jetted to one surface of the substrate to be cleaned by the second jet nozzle can be adjusted by the squeezing roller, so that the cleaning liquid can be easily discharged from one surface of the substrate to be cleaned. The fine particles contained in the cleaning liquid after being discharged and once removed from one surface of the substrate to be cleaned can be prevented from reattaching to one surface of the substrate to be cleaned.

Further, the present invention is the ultrasonic cleaning device, wherein the squeezing roller is provided downstream of the second injection nozzle in the transport direction.

According to the present invention, since the squeezing roller is provided downstream of the second ejection nozzle in the transport direction, the cleaning liquid ejected from the second ejection nozzle to one surface of the substrate to be cleaned is downstream of the transport direction. The amount that stays on the side can be reduced.

According to the present invention, the squeezing roller is provided downstream of the second ejection nozzle in the conveyance direction, and is provided with a first squeezing roller movable in the conveyance direction and an upstream of the first ejection nozzle in the conveyance direction. And a second squeezing roller movable in the transport direction.

According to the present invention, the squeezing roller is provided downstream of the second injection nozzle in the transport direction of the substrate to be cleaned and upstream of the first injection nozzle in the transport direction of the substrate to be cleaned.
This makes it possible to reduce the amount of the cleaning liquid staying on the upstream side and the downstream side in the transport direction. Further, by adjusting the interval at which the squeezing rollers are arranged, the flow rate and flow rate of the cleaning liquid on one surface of the substrate to be cleaned can be adjusted, so that the cleaning liquid can easily flow out from one surface of the substrate to be cleaned.

[0027]

FIG. 1 is a simplified sectional view showing the structure of an ultrasonic cleaning apparatus 1 according to an embodiment of the present invention, and FIG. 2 is a plan view of FIG. The ultrasonic cleaning device 1
From the one surface 4 to be cleaned of the substrate 3 to be cleaned (hereinafter referred to as a cleaning surface) which is transported in a predetermined transport direction indicated by an arrow 2, the attached fine particles are removed by using a cleaning liquid to which ultrasonic vibration is applied. A cleaning liquid 6 (hereinafter, referred to as a first cleaning liquid) which is provided at an interval from the other surface 5 (hereinafter, referred to as a back surface) of the substrate 3 to be cleaned, and which is sprayed onto the back surface 5. First injection nozzle 7 and first injection nozzle 7
Ultrasonic vibration generating means 8 for applying ultrasonic vibration to the first cleaning liquid 6 sprayed from the surface, and the cleaning surface 4 of the substrate 3 to be cleaned.
A second spray nozzle 10 that is provided at an interval from the cleaning nozzle and that sprays a cleaning liquid 9 (hereinafter, referred to as a second cleaning liquid) onto the cleaning surface 4.
And

The first injection nozzle 7 extends in the direction perpendicular to the direction of transport of the substrate 3 to be cleaned, and has a substantially beak-shaped cross section perpendicular to the axis, and has a length in the direction perpendicular to the direction of transport of the substrate 3 to be cleaned. It is longer than the length in the direction perpendicular to the direction. First injection nozzle 7
Are the first to fifth nozzle members 11, 12, 13, 14, 1
5 and first to fourth leg members 16, 17, 18, 19. The first and second nozzle members 11 and 12 face the substrate 3 to be cleaned and are arranged to face each other, and the first tip 21 of the first nozzle member 11 and the second tip 22 of the second nozzle member 12 are arranged.
Thus, the first nozzle hole 20 having the gap D1 is formed. The first nozzle hole 20 is elongated in the direction perpendicular to the transport direction of the substrate 3 to be cleaned.

The first to fifth nozzle members 11, 12, 13,
In the section perpendicular to the axis, the first and fifth nozzle members 11 and 15 are provided in this order counterclockwise on the paper of FIG. 1 with the first nozzle member 11 facing the substrate 3 to be cleaned as a base point. The first storage unit 23 that stores the first cleaning liquid 6 therein is formed by 12, 13, 14, and 15. A first supply port 24 is formed between the fifth nozzle member 15 and the first nozzle member 11, and the first supply port 24 opens to the first storage section 23.

First to fourth leg members 16, 17, 18, 19
Is a member having an inverted L-shape, and one end thereof is connected to the first and second side surfaces 25 and 26 of the first injection nozzle 7.
And the other end is fixed to the first base 27,
The first spray nozzle 7 is held at an interval from the back surface 5 of the substrate 3 to be cleaned.

The ultrasonic vibration generating means 8 is included in the first injection nozzle 7, and includes an ultrasonic vibrator 31 and an absorption damper 32.
And a power supply circuit 34 for applying a voltage to the ultrasonic vibrator 31. The absorption damper 32 is provided on a surface opposite to a surface on which the ultrasonic transducer 31 oscillates ultrasonic waves toward the first storage unit 23, absorbs ultrasonic waves propagating in the opposite direction, and generates a resonance. Prevent occurrence. The sealing plate 33
The first cleaning liquid 6 is provided between the ultrasonic vibrator 31 and the first storage unit 23 that stores the first cleaning liquid 6, and the first cleaning liquid 6
Prevent from leaking to one. If the frequency of the ultrasonic vibrator 31 is too low as described above, the effect of vibration is not exhibited, and if the frequency is too high, the substrate 3 to be cleaned may be damaged by cavitation.
MHz is preferably used.

The first supply port 24 has a first supply line 3
5 is connected, and the first supply line 35 is connected to the first supply tank 3.
Lead to 6. Also, the first pump 3 is connected to the first supply line 35.
Since the first cleaning liquid 6 is provided, the first cleaning liquid 6 is supplied from the first supply tank 36 to the first spray nozzle 7 through the first supply pipe 35 by the first pump 37.

The first cleaning liquid 6 after being sprayed from the first spray nozzle 7 toward the back surface 5 of the substrate 3 to be cleaned
And is collected from the tray 38 into the first supply tank 36. The first cleaning liquid 6 collected in the first supply tank 36 from the tray 38 is supplied to the first injection nozzle 7 through the first supply pipe 35 by the first pump 37, and is reused. That is, the first cleaning liquid 6 is circulated and reused.

The second spray nozzle extends in a direction perpendicular to the direction of transport of the substrate 3 to be cleaned, and has a substantially beak-shaped cross section perpendicular to the axis.
The length in the direction perpendicular to the transport direction is longer than the length in the direction perpendicular to the transport direction of the substrate 3 to be cleaned. Second injection nozzle 10
Are the sixth to eighth nozzle members 41, 42, 43 and the fifth to fifth nozzle members 41, 42, 43.
Eighth leg members 44, 45, 46, 47 are included. The sixth and seventh nozzle members 41 and 42 face the substrate 3 to be cleaned,
The third distal end portion 4 of the sixth nozzle member 41
8 and the fourth tip 49 of the seventh nozzle member 42,
A second nozzle hole 50 having a gap D2 is formed. Second
The nozzle hole 50 is elongated in the direction perpendicular to the transport direction of the substrate 3 to be cleaned.

Sixth to eighth nozzle members 41, 42, 43
Are provided in this order in the section perpendicular to the axis, starting from the sixth nozzle member 41 facing the substrate 3 to be cleaned, in a counterclockwise direction on the paper surface of FIG.
The second storage part 51 for storing the second cleaning liquid 9 therein is formed by 42 and 43. The sixth nozzle member 41
A second supply port 52 is formed between the second supply port 52 and the eighth nozzle member 43, and the second supply port 52 opens to the second storage section 51.

Fifth to eighth leg members 44, 45, 46, 47
Is a member having an inverted L-shape, and one end thereof is connected to the third and fourth side surfaces 53 and 5 of the second injection nozzle 10.
4, the other end is fixed to the first base 27, and the second spray nozzle 10 is held at a distance from the cleaning surface 4 of the substrate 3 to be cleaned.

The second injection nozzle 10 is connected to the first injection nozzle 7
The members fixed to the first base 27 constituting the fifth and seventh leg members 44 and 46 are located on the downstream side in the transport direction, and the lengths of the members are the sixth and eighth leg members 45 and 47. Since it is shorter than the length of the member fixed to the first base 27 to be
Third forming the second nozzle hole 50 of the second injection nozzle 10
And the fourth tip portions 48 and 49 are closer to the eighth nozzle member 4.
3 is provided closer to the substrate 3 to be cleaned. Thus, the second spray nozzle 10 can spray the second cleaning liquid 9 from the downstream side in the transport direction to the upstream side.

The second supply port 52 is provided with a second supply line 5.
5 is connected, and the second supply pipe 55 is connected to the second supply tank 5.
Lead to 6. The second pump 5 is connected to the second supply line 55.
7, the second cleaning liquid 9 is supplied to the second spray nozzle 10 from the second supply tank 56 by the second pump 57 through the second supply pipe 55.

The second cleaning liquid 9 sprayed from the second spray nozzle 10 toward the cleaning surface 4 of the substrate 3 to be cleaned flows out from the cleaning surface 4 of the substrate 3 to be cleaned and falls on the tray 38,
It is collected from the tray 38 into the first supply tank 36. The second cleaning liquid 9 collected from the tray 38 into the first supply tank 36 is supplied to the first injection nozzle 7 through the first supply pipe 35 by the first pump 37, and is reused as the first cleaning liquid 6.

As described above, the ultrasonic cleaning apparatus 1 is provided with the two injection nozzles, so that each of the injection nozzles can share a role. This allows the first
For the injection nozzle 7, injection conditions of the first cleaning liquid 6 suitable for adding ultrasonic vibration are selected, and for the second injection nozzle 10, a second cleaning liquid 9 suitable for cleaning for removing fine particles from the cleaning surface 4.
Therefore, the cleanliness of the substrate 3 to be cleaned can be improved. In addition, the second injection nozzle 10
Since the second cleaning liquid 9 can be jetted from the downstream side in the transport direction to the upstream side, the fine particles removed from the cleaning surface 4 are caused by the flow of the second cleaning liquid 9 from the downstream side to the upstream side on the cleaning surface 4. It can be prevented from easily flowing out of the cleaning surface 4 and re-adhering to the cleaning surface 4.

The gap D2 formed by the sixth and seventh nozzle members 41 and 42 forming the second nozzle hole 50 of the second injection nozzle 10 is the first and the second forming the first nozzle hole 20 of the first injection nozzle 7. Gap D formed by second nozzle members 11 and 12
It is set smaller than 1. That is, D2 <D1 (1). As a result, the second spray nozzle 10 can clean the cleaning surface 4 with a small amount of the second cleaning solution 9 and obtain the flow velocity and the spray pressure necessary for removing fine particles. The amount can be saved and the cleaning efficiency can be ensured. For example,
In the present embodiment, the gap D1 between the first and second nozzle members 11, 12 forming the first nozzle hole 20 is approximately 10 mm, and the sixth and seventh nozzle members forming the second nozzle hole 50 are formed. The gap D2 formed by 41 and 42 is approximately 0.06 mm.

The thickness of the layer of the second cleaning liquid 9 sprayed from the second spray nozzle 10 and formed on the cleaning surface 4 is controlled by the ultrasonic oscillation generated by the ultrasonic vibration generating means 8 included in the first spray nozzle 7. Desirably, it is an integral multiple of the wavelength of the sound wave. In order to satisfy this, the position 69 at which the second cleaning liquid 9 is sprayed onto the cleaning surface 4 by the second spray nozzle 10.
And a distance D3 between a region where the first cleaning liquid 6 sprayed to the back surface 5 by the first spray nozzle 7 and the ultrasonic wave is irradiated onto the substrate 3 to be cleaned and a downstream boundary 70 in the transport direction. Is selected in the range of 5 to 10 mm.

In this embodiment, the cleaning liquid injection pressure of the second injection nozzle 10 is set to be higher than the cleaning liquid injection pressure of the first injection nozzle 7. As a result, the first cleaning liquid 6 of the first injection nozzle 7 that is injected at a low pressure,
The second cleaning liquid 9 of the second injection nozzle 10 which reliably and stably propagates the ultrasonic vibration to the substrate 3 to be cleaned and is injected at a high pressure.
Performs the cleaning of the cleaning surface 4, so that the cleaning efficiency can be improved. Also, the second injection nozzle 1 that is injected at a high pressure
Since the first cleaning liquid 6 of the first injection nozzle 7 in which the second cleaning liquid 9 of 0 is injected at a low pressure is driven by a pressure difference,
The first cleaning liquid 6 injected from the first injection nozzle 7 is
Mixing into the second cleaning liquid 9 injected by the injection nozzle 10 can be suppressed.

The substrate 3 to be cleaned is transported by the transport means 61.
As described above, the sheet is conveyed in the two arrow directions. Conveying means 61
Includes a plurality of transport rollers 62, an electric motor 63, and a belt 64 connecting the plurality of transport rollers 62. The transport roller 62 has an axis perpendicular to the transport direction and parallel to the surface of the substrate 3 to be cleaned, and is supported by the body of the ultrasonic cleaning apparatus 1 so as to be rotatable about the axis. The electric motor 63 is connected to one of the transport rollers 62 and drives the transport roller 62 to rotate about an axis. The electric motor 63 rotationally drives one of the conveying rollers 62 around the axis, and the plurality of conveying rollers 62 are connected by the belt 64, so that the rotational driving force of the electric motor 63 is transmitted to each conveying roller 62, and The transport roller 62 rotates around the axis, and the substrate to be cleaned 3 is transported in the direction indicated by the arrow 2. The substrate to be cleaned 3 is transported while being transported.
The cleaning is performed when passing through the area where the cleaning liquid of 0 is sprayed.

FIG. 3 is a view showing a state in which the fine particles 65 are removed from the cleaning surface 4 of the substrate 3 to be cleaned. The state in which the fine particles 65 on the cleaning surface 4 are removed will be described with reference to FIG. FIG. 3A shows a state in which the fine particles 65 attached to the cleaning surface 4 of the substrate 3 to be cleaned reach the area where the second cleaning liquid 9 is sprayed and are immersed in the second cleaning liquid 9. In the vicinity of the cleaning surface 4 side of the fine particles 65, there is a space 66 in which the second cleaning liquid 9 has not yet completely penetrated. FIG. 3B shows a state where the time has elapsed after the fine particles 65 were immersed in the second cleaning liquid 9. On the back surface 5 side of the substrate 3 to be cleaned, ultrasonic vibration propagates through the first cleaning liquid 6 sprayed from the first spray nozzle 7 to the substrate 3 to be cleaned, and further ultrasonically propagates through the substrate 3 to be cleaned to the second cleaning liquid 9. Is propagated. The second cleaning liquid 9 also penetrates around the fine particles 65 by the ultrasonic vibration transmitted to the second cleaning liquid 9. Due to the acceleration and straight flow of the second cleaning liquid 9 due to the ultrasonic vibration, and the vibration of the substrate 3 to be cleaned due to the ultrasonic vibration propagated to the substrate 3 through the first cleaning liquid 6, the fine particles 65 move in the direction indicated by the arrow 67. It is separated from the cleaning surface 4 and is removed.

In order to prevent the fine particles 65 removed from the cleaning surface 4 of the substrate 3 to be cleaned from re-adhering to the cleaning surface 3, functional water such as alkaline hydrogen water may be used as the cleaning liquid. FIG. 3C shows the substrate 3 to be cleaned and the fine particles 6.
5 shows a state in which repulsion is caused by having the same kind of potential and re-adhesion is prevented. By using functional water such as alkaline hydrogen water as the cleaning liquid, both the fine particles 65 and the substrate to be cleaned 3 are the same due to, for example, a ζ potential generated when the cleaning liquid and the particles 65 and the substrate to be cleaned 3 move relative to each other. It has various kinds of potentials, and a repulsive force in the direction of arrow 68 acts to prevent re-adhesion between the fine particles 65 and the substrate 3 to be cleaned.

FIG. 4 is a simplified sectional view showing the configuration of an ultrasonic cleaning apparatus 71 according to a second embodiment of the present invention, and FIG. 5 is a plan view of FIG. The ultrasonic cleaning device 71 of the present embodiment is similar to the ultrasonic cleaning device 1 of the first embodiment, and the corresponding portions are denoted by the same reference numerals and description thereof will be omitted.

The cleaning surface 4 of the ultrasonic cleaning apparatus 71 of this embodiment has an axis parallel to the surface of the substrate 3 to be cleaned.
A squeezing roller 72 that is longer than the length of the substrate 3 to be cleaned in a direction perpendicular to the transport direction is provided at a predetermined distance from the cleaning surface 4 so as to be rotatable around the axis. The squeezing roller 72 has a cylindrical shape, and includes first and second bearings 73 and 7.
4, it is rotatably supported around the axis, and is provided downstream of the second injection nozzle 10 in the transport direction.
First and second bearings 73, 7 for supporting the squeezing roller 72
4 is fixed to the second base 75,
The distance between the substrate and the cleaning surface 4 of the substrate 3 to be cleaned is approximately 1 mm.
Is set to

The interval between the squeezing roller 72 and the cleaning surface 4 is formed without contact with each other, and the squeezing roller 72 is rotatable around the axis for the following reasons. For example, when the substrate to be cleaned 3 is cleaned after undergoing a processing step by photolithography, if the substrate to be cleaned 3 is deformed such as warpage, the squeezing roller 72 contacts the warped substrate 3 to be cleaned. The substrate to be cleaned 3 may be damaged. When the substrate 3 to be cleaned is damaged, the ultrasonic cleaning device 71
Therefore, the ultrasonic cleaning device 71 itself needs to be repaired and cleaned, resulting in a long operation stoppage. Therefore, even if the warped substrate 3 to be cleaned is transported,
An interval is formed between the squeezing roller 72 and the cleaning surface 4 so as not to contact the squeezing roller 72, and even if the substrate 3 to be cleaned contacts the squeezing roller 72, the rotation of the squeezing roller 72 causes the substrate to be cleaned to rotate. The substrate 3 is conveyed without receiving resistance, thereby preventing the substrate 3 to be cleaned from being damaged.

The squeeze roller 72 scrapes off the excess second cleaning liquid 9 sprayed onto the cleaning surface 4 by the second injection nozzle 10 on the downstream side in the transport direction of the second injection nozzle 10 and causes it to flow out of the cleaning surface 4. Therefore, the surplus second cleaning liquid 9 does not stay on the cleaning surface 4, particularly on the cleaning surface 4 on the downstream side in the transport direction from the position where the squeezing roller 72 is disposed.
This makes it possible to remove the second
The chance of the fine particles 65 contained in the cleaning liquid 9 re-adhering to the cleaning surface 4 can be reduced.

As described above, the squeezing roller 72 and the cleaning surface 4
Is formed, the second cleaning liquid 9 remains on the cleaning surface 4 on the downstream side in the transport direction passing through the squeezing roller 72 as a thin layer that does not dry the cleaning surface 4. Since the second cleaning liquid 9 is not completely scraped off from the cleaning surface 4 by the squeezing roller 72, it is possible to prevent the occurrence of traces of drying or residual drying (remaining water droplets) on the cleaning surface 4.

If traces of drying or residue of drying occur on the cleaning surface 4, the trace of drying or residue of drying cannot be removed even by cleaning again with an ultrasonic cleaning device. If there is any trace of drying or residual drying on the cleaning surface 4, the adhesion of the film formed on the cleaning surface 4 will be deteriorated in the subsequent process, and the disconnection and short circuit of the electrode wiring will occur. In such a case, a cleaning liquid that does not dry the cleaning surface 4 must be left on the cleaning surface 4. The thin layer of the second cleaning liquid 9 left on the cleaning surface 4 of the substrate 3 to be cleaned is supplied to the substrate 3 after pure water is supplied to the cleaning surface 4 in the next step.
Is rotated at a high speed, or an air knife is sprayed on the cleaning surface 4 to blow off the second cleaning liquid 9 and pure water at once.

FIG. 6 is a sectional view showing a simplified structure of an ultrasonic cleaning apparatus 76 according to a third embodiment of the present invention, and FIG. 7 is a plan view of FIG. The ultrasonic cleaning device 76 of the present embodiment is the same as the ultrasonic cleaning device 71 of the second embodiment.
Similar to the above, corresponding portions are denoted by the same reference numerals and description thereof is omitted.

The ultrasonic cleaning device 76 of the present embodiment includes:
An aperture roller 72 is provided downstream of the second injection nozzle 10 in the transport direction. It should be noted that the one end 77 of the squeezing roller 72 is squeezed around the other end 78 of the squeezing roller 72 in a plane including the axis of the squeezing roller 72 and parallel to the plate surface of the substrate 3 to be cleaned. This is a point including an angular displacement driving means 79 for angularly displacing the roller 72.

The squeeze roller 72 is connected to the third and fourth bearings 9.
3, 94, it is supported rotatably around the axis. A third bearing 93 that supports one end 77 of the squeezing roller 72 is provided on an angular displacement trajectory 79 that is an angular displacement driving means 79, and can move on the angular displacement trajectory 79 in a direction indicated by an arrow 80. . The third bearing 93 is provided with an angular displacement track 79
The means for moving upward can be realized, for example, by providing a small roller or the like on the surface of the third bearing 93 facing the angular displacement track 79. The angular displacement track 79 is fixed on the second base 75.

A fourth bearing 94 for supporting the other end 78 of the squeezing roller 72 is mounted on the second base 75. The fourth bearing 94 is provided in a direction perpendicular to the transport direction and in
Has an axis 81 in a direction perpendicular to the axis, and can rotate around the axis 81. The rotation of the fourth bearing 94 about the axis 81 can be realized by providing a thrust bearing or the like between the fourth bearing 94 and the second base 75, for example.

Therefore, the third and fourth bearings 93, 9
The squeezing roller 72 supported by 4 includes an axis of the squeezing roller 72 and is parallel to a plate surface of the substrate 3 to be cleaned.
The one end 77 can be moved about the other end 78 in the direction of the arrow 80 on the angular displacement track 79 and can be angularly displaced with respect to the transport direction. Can be set to

Thus, the flow direction and the flow velocity of the second cleaning liquid 9 jetted to the cleaning surface 4 by the second jet nozzle 10 can be adjusted by the squeezing roller 72. It is possible to prevent the fine particles 65 contained in the second cleaning liquid 9 that has easily flowed out from the upper side and is once removed from the cleaning surface 4 from being reattached to the cleaning surface 4.

FIG. 8 is a simplified sectional view showing the structure of an ultrasonic cleaning apparatus 82 according to a fourth embodiment of the present invention, and FIG. 9 is a plan view of FIG. The ultrasonic cleaning device 82 according to the second embodiment is the same as the ultrasonic cleaning device 71 according to the second embodiment.
Similar to the above, corresponding portions are denoted by the same reference numerals and description thereof is omitted.

The ultrasonic cleaning device 82 of the present embodiment includes:
An aperture roller is provided. It should be noted that the squeezing roller is provided downstream of the second injection nozzle 10 in the conveyance direction, and is provided with a first squeezing roller 83 movable in the conveyance direction and a first squeezing roller 83.
This is a point including a second throttle roller 84 provided upstream of the ejection nozzle 7 in the transport direction and movable in the transport direction.

The first squeezing roller 83 is connected to the fifth and sixth rollers.
The bearings 85 and 86 rotatably support the axis. Fifth and sixth bearings 85 and 86 that support both ends of the first squeezing roller 83 are provided on first and second orbits 87 and 88, which are means for moving the first squeezing roller 83, respectively. It can move on the two tracks 87 and 88 in the transport direction and the direction opposite to the transport direction. The first and second tracks 87 and 88 are fixed on the second base 75. The second squeezing roller 84 includes a seventh and eighth bearings 89,
90 is rotatably supported, and the other configuration is the first configuration.
The description is omitted because it is the same as the aperture roller 83.

The first squeezing roller 83 is connected to the second injection nozzle 1
0, and is provided on the downstream side in the conveyance direction of the second throttle roller 84.
Is provided on the upstream side in the transport direction of the first injection nozzle 7, so that the amount of the second cleaning liquid 9 staying on the upstream side and the downstream side in the transport direction of the cleaning surface 4 can be reduced. By adjusting the distance D4 between the axis of the first squeezing roller 83 and the axis of the second squeezing roller 84, the flow rate and flow rate of the second cleaning liquid 9 on the cleaning surface 4 can be adjusted. (2) The cleaning solution 9 can be easily discharged. This can prevent the fine particles 65 contained in the second cleaning liquid 9 once removed from the cleaning surface 4 from re-adhering to the cleaning surface 4.

By preparing any one of the ultrasonic cleaning apparatuses described in the first to fourth embodiments, the substrate 3 to be cleaned can be cleaned using a cleaning liquid in any of the following combinations. Pure water is injected from the first injection nozzle 7 as the first cleaning liquid 6, and alkaline hydrogen water is injected as the second cleaning liquid 9 from the second injection nozzle 10. First and second injection nozzles 7,
From 10, alkaline hydrogen water is injected as the first and second cleaning liquids. Pure water is jetted from the first jet nozzle 7 as the first cleaning liquid 6, and ozone water is jetted from the second jet nozzle 10 as the second cleaning liquid 9. First and second injection nozzles 7,
From 10, ozone water is injected as the first and second cleaning liquids. As the alkaline hydrogen water, for example, one having an ammonia concentration of 0.1% and a hydrogen concentration of 1 ppm is suitably used.
Ozone water having an ozone concentration of 20 ppm is preferably used. In particular, when the fine particles 65 are metal particles, the cleanliness of the substrate 3 to be cleaned can be improved by using ozone water as the cleaning liquid.

By using functional water such as alkaline hydrogen water or ozone water as the cleaning liquid, for example, a な ど potential is generated due to relative motion between the functional water and the substrate 3 and the fine particles 65, and the fine particles 65 and the substrate 3 are cleaned. And
It is charged to the same kind of potential. Particles 65 and substrate 3 to be cleaned
Are charged to the same kind of potential, a repulsive force is generated between the two, and the fine particles 65 once removed from the cleaning surface 4 by the cleaning hardly reattach to the cleaning surface 4, and the fine particles 65 are removed. The effect is improved. (Embodiment) An embodiment of the present invention will be described below. The glass substrate for liquid crystal as the substrate 3 to be cleaned was cleaned using the ultrasonic cleaning device 71 shown in FIG. Table 1 shows the conditions of the embodiment of the present invention used in the ultrasonic cleaning device 71.
For comparison with the embodiment of the present invention, the liquid crystal glass substrate as the substrate 3 to be cleaned was cleaned using the conventional ultrasonic cleaning apparatus 101 shown in FIG. Ultrasonic cleaning device 101
Table 2 shows the conditions of the conventional example used in Example 1.

The effect of cleaning was evaluated by a removal rate indicating the degree to which fine particles were removed from the cleaned surface and decreased. That is, assuming that the number of attached fine particles per unit area before cleaning on the cleaning surface of the substrate to be cleaned is A and the number of attached fine particles per unit area after cleaning is B, the removal rate of the fine particles is obtained as follows. Fine particle removal rate (%) = 100 × (A−B) / A (2)

[0066]

[Table 1]

[0067]

[Table 2]

The removal rate of the fine particles by the conventional ultrasonic cleaning apparatus 101 was 95%. On the other hand, the removal rate of fine particles according to the example of the present invention was 98%, and the removal rate of fine particles was improved by 3% as compared with the conventional example, and a remarkable cleaning effect was obtained.

As described above, the first to fourth embodiments of the present invention
In the embodiment, the ultrasonic vibration generating means 8 is provided only in the first injection nozzle 7, but is not limited thereto.
And the second injection nozzle 10. The first and second nozzle holes 20 and 50 of the first and second injection nozzles 7 and 10 are formed to extend in a direction perpendicular to the transport direction, but are not limited thereto. May be formed at intervals in the direction perpendicular to the transport direction. The length of the first and second spray nozzles 7 and 10 in the direction perpendicular to the transport direction is longer than the length of the first and second spray nozzles 7 and 10 in the direction perpendicular to the transport direction, but is not limited thereto. The length of the first and second spray nozzles 7 and 10 in the direction perpendicular to the transport direction may be the same as, for example, the length in the direction perpendicular to the transport direction of the substrate 3 to be cleaned. Further, the number of aperture rollers provided is one or two, but is not limited to this, and more than two aperture rollers may be provided. In addition, although one aperture roller is provided and the angular displacement driving means 79 is provided, the invention is not limited to this, and a plurality of aperture rollers are provided, and the plurality of aperture rollers are connected to the angular displacement driving means 79. 79 may be provided.

[0070]

According to the present invention, a first jet nozzle for jetting a cleaning liquid to which ultrasonic waves have been applied is provided on the other surface of the substrate to be cleaned, and a second jet nozzle for jetting the cleaning liquid on one surface of the substrate to be cleaned. Since the nozzles are provided, the two spray nozzles can share the application of ultrasonic vibration to the cleaning liquid and the cleaning of one surface of the substrate to be cleaned. Thus, for the first injection nozzle, a cleaning liquid injection condition suitable for adding ultrasonic vibration is selected, and for the second injection nozzle, a cleaning liquid suitable for cleaning for removing fine particles from one surface of the substrate to be cleaned is selected. Since the conditions for spraying the cleaning liquid can be selected, the cleanliness of the substrate to be cleaned can be improved.

The second injection nozzle is provided downstream of the first injection nozzle in the transport direction and sprays the cleaning liquid from the downstream side in the transport direction toward the upstream side. The fine particles removed from the surface of the substrate are prevented from easily flowing out from one surface of the substrate to be cleaned and reattaching due to the flow of the cleaning liquid from the downstream side to the upstream side on the surface of the substrate to be cleaned. it can.

According to the present invention, the gap formed by the nozzle members forming the nozzle holes of the second injection nozzle is smaller than the gap formed by the nozzle members forming the nozzle holes of the first injection nozzle. As a result, the second spray nozzle can clean one surface of the substrate to be cleaned with a small amount of the cleaning liquid and obtain the flow velocity and the spray pressure necessary for removing the fine particles, thereby saving the consumption of the cleaning liquid. Cleaning efficiency can be ensured.

According to the present invention, the cleaning liquid injection pressure of the second injection nozzle is higher than the cleaning liquid injection pressure of the first injection nozzle. As a result, the first fuel injected at low pressure
Ultrasonic vibration is reliably and stably propagated to the substrate to be cleaned by the cleaning liquid of the injection nozzle, and one surface of the substrate to be cleaned is cleaned by the cleaning liquid of the second injection nozzle which is jetted at a high pressure. Can be increased. Further, since the cleaning liquid of the second injection nozzle that is injected at a high pressure drives out the cleaning liquid of the first injection nozzle that is injected at a low pressure by a pressure difference, the cleaning liquid that is injected from the first injection nozzle becomes the second cleaning liquid. Mixing into the cleaning liquid injected by the injection nozzle can be suppressed.

Further, according to the present invention, on one surface side of the substrate to be cleaned, a squeezing roller is rotatably spaced from one surface of the substrate to be cleaned about an axis parallel to the surface of the substrate to be cleaned. Provided. The squeezing roller scrapes off the excess cleaning liquid jetted to one surface of the substrate to be cleaned by the second jet nozzle, so that the cleaning liquid does not stay excessively on one surface of the substrate to be cleaned. Further, the fine particles removed from one surface by the cleaning liquid jetted from the second jet nozzle easily flow out from the one surface by the flow of the cleaning liquid from the downstream side to the upstream side on the one surface. This can reduce the chance of the fine particles contained in the cleaning liquid once removed from one surface of the substrate to be cleaned re-adhering to the one surface of the substrate to be cleaned.

According to the present invention, the aperture roller is provided with angular displacement driving means for angularly displacing the aperture roller around the other end of the aperture roller in a plane parallel to the plate surface of the substrate to be cleaned. . Thus, the flow direction and the flow velocity of the cleaning liquid jetted to one surface of the substrate to be cleaned by the second jet nozzle can be adjusted by the squeezing roller, so that the cleaning liquid can be easily discharged from one surface of the substrate to be cleaned. The fine particles contained in the cleaning liquid after being discharged and once removed from one surface of the substrate to be cleaned can be prevented from reattaching to one surface of the substrate to be cleaned.

According to the present invention, the squeezing roller is provided with the second
Since the cleaning liquid is provided on the downstream side in the transport direction from the injection nozzle, the amount of the cleaning liquid injected from the second injection nozzle onto one surface of the substrate to be cleaned staying on the downstream side in the transport direction can be reduced.

According to the present invention, the squeezing roller is provided with the second
It is provided on the downstream side in the transport direction of the substrate to be cleaned from the injection nozzle, and on the upstream side in the transport direction of the substrate to be cleaned than the first injection nozzle. This makes it possible to reduce the amount of the cleaning liquid staying on the upstream side and the downstream side in the transport direction. Further, by adjusting the interval at which the squeezing rollers are arranged, the flow rate and flow rate of the cleaning liquid on one surface of the substrate to be cleaned can be adjusted, so that the cleaning liquid can easily flow out from one surface of the substrate to be cleaned.

[Brief description of the drawings]

FIG. 1 is an ultrasonic cleaning apparatus 1 according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view showing a simplified configuration of FIG.

FIG. 2 is a plan view of FIG.

FIG. 3 is a view showing a state in which fine particles 6 are transferred from a cleaning surface 4 of a substrate 3 to be cleaned;
It is a figure showing the state where 5 is removed.

FIG. 4 is a cross-sectional view showing a simplified configuration of an ultrasonic cleaning apparatus 71 according to a second embodiment of the present invention.

FIG. 5 is a plan view of FIG. 4;

FIG. 6 is a cross-sectional view showing a simplified configuration of an ultrasonic cleaning apparatus 76 according to a third embodiment of the present invention.

FIG. 7 is a plan view of FIG. 6;

FIG. 8 is a cross-sectional view showing a simplified configuration of an ultrasonic cleaning apparatus 82 according to a fourth embodiment of the present invention.

FIG. 9 is a plan view of FIG.

FIG. 10 is a simplified cross-sectional view showing a configuration of a conventional ultrasonic cleaning apparatus 101.

[Explanation of symbols]

 1, 71, 76, 82 Ultrasonic cleaning device 3 Substrate to be cleaned 6 First cleaning liquid 7 First injection nozzle 8 Ultrasonic vibration generating means 9 Second cleaning liquid 10 Second injection nozzle 72 Squeezing roller 83 First squeezing roller 84 Second Aperture roller

Claims (8)

[Claims] 1. An ultrasonic cleaning apparatus for removing adhering fine particles from one surface of a substrate to be cleaned conveyed in a predetermined conveying direction to be cleaned using a cleaning liquid to which ultrasonic vibration is applied. A first spray nozzle that is provided at a distance from the other surface of the substrate and sprays the cleaning liquid onto the other surface; and an ultrasonic vibration generating unit that applies ultrasonic vibration to the cleaning liquid sprayed from the first spray nozzle. And a second spray nozzle provided at a distance from one surface of the substrate to be cleaned and spraying a cleaning liquid on one surface to be cleaned, wherein the second spray nozzle is more transported than the first spray nozzle. An ultrasonic cleaning apparatus, which is provided on a downstream side and is provided so as to spray a cleaning liquid from a downstream side in a transport direction toward an upstream side. 2. A gap formed by a nozzle member forming a nozzle hole of a second injection nozzle is smaller than a gap formed by a nozzle member forming a nozzle hole of a first injection nozzle. Ultrasonic cleaning equipment. 3. The ultrasonic cleaning apparatus according to claim 1, wherein the cleaning liquid injection pressure of the second injection nozzle is higher than the cleaning liquid injection pressure of the first injection nozzle. 4. An ultrasonic cleaning apparatus for removing adhering fine particles from one surface of a substrate to be cleaned conveyed in a predetermined conveying direction to be cleaned using a cleaning liquid to which ultrasonic vibration is applied. A first spray nozzle that is provided at a distance from the other surface of the substrate and sprays the cleaning liquid onto the other surface; and an ultrasonic vibration generating unit that applies ultrasonic vibration to the cleaning liquid sprayed from the first spray nozzle. And a second spray nozzle that is provided at an interval from one surface of the substrate to be cleaned, and that sprays a cleaning liquid onto one surface to be cleaned. A squeezing roller having a parallel axis and having a length longer than a length in a direction perpendicular to the transport direction of the substrate to be cleaned is provided at a predetermined interval rotatably around the axis from one surface. That ultrasonic cleaning equipment. 5. The apparatus according to claim 1, wherein the second injection nozzle is arranged downstream of the first injection nozzle in the transport direction, and is provided so as to inject the cleaning liquid from the downstream side in the transport direction to the upstream side. 5. The ultrasonic cleaning apparatus according to 4. 6. An aperture roller is provided at one end of the aperture roller, and includes an axis of the aperture roller and is angularly displaced about the other end of the aperture roller in a plane parallel to the plate surface of the substrate to be cleaned. The ultrasonic cleaning apparatus according to claim 4, further comprising an angular displacement driving unit. 7. The ultrasonic cleaning apparatus according to claim 4, wherein the squeezing roller is provided downstream of the second ejection nozzle in the transport direction. 8. A squeezing roller is provided downstream of the second ejection nozzle in the conveyance direction, and is provided with a first squeezing roller movable in the conveyance direction. The squeezing roller is provided upstream of the first ejection nozzle in the conveyance direction. The ultrasonic cleaning apparatus according to claim 4, further comprising a second squeezing roller movable in a direction.