JPH065577A - Substrate cleaning device - Google Patents

Abstract

PURPOSE:To prevent the deterioration with age due to the pollution of a brush itself by moving a substrate between the opening parts of an overflow tank with the substrate in a clearing solvent, applying an ultrasonic wave to the clearing solvent to clean the substrate in the clearing solvent by brushing. CONSTITUTION:A substrate 12 is moved in a right direction along a pass line by a transfer roller 4 and dipped into the liquid of an overflow tank 1 by way of a shutter part 3 and an opening part 2, and the surface of a substrate 12 is cleaned by scrubbing with a cleaning brush 6 of a rotary brush part 5. The rear surface of the substrate 12 and the cleaning brush 6 are cleaned with the effect of an ultrasonic wave from an ultrasonic wave oscillator 7. A cleaning solvent overflowed from an overflow tank 1 is collected into a storage tank 8. Thereby, the lowering of cleaning ability due to the pollution of the cleaning brush itself may be prevented.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus, and more particularly to a single-wafer processing brush cleaning apparatus.

[0002]

2. Description of the Related Art In a conventional substrate cleaning apparatus, as shown in FIG. 2, a conveying roller 4 for supporting both ends of a substrate 12, which is an object to be cleaned, is linearly arranged at a predetermined pitch in an upper opening of a tank 13 for cleaning liquid 11. Are arranged in a line and form a pass line.

A pair of rotating brushes 5 which are orthogonal to and intersect with the path line are arranged in the substantially central portion of the receiving tank 13, and a liquid storage tank 8 is provided under the receiving tank 13, both of which are Piped to each other.

Further, the cleaning liquid 1 is provided near the tip of the cleaning brush 6.
A spray nozzle 14 for supplying 1 is disposed so as to face the pass line similarly to the rotary brush unit 5.

The spray nozzle 14 and the liquid storage tank 8
And are connected by piping through the circulation pump 9 and the filter 10.

Next, the cleaning operation will be described. As shown in FIG. 1, the substrate 12 is conveyed rightward along the path line by the conveying roller 4, while the cleaning brush 6 attached to the tip of the rotating brush unit 5 scrubs the front and back surfaces of the substrate 12 at the same time. To be washed.

At this time, the cleaning liquid 11 is supplied from the mouth of the spray nozzle 14 to the vicinity of the tip of the cleaning brush 6 by the pressure of the circulation pump 9.

[0008]

In this conventional substrate cleaning apparatus, impurities such as particles removed from the surface of the substrate enter the inside of the brush as the cleaning time elapses, and the brush itself is gradually contaminated. Phenomenon occurs.

As a result, the surface of the substrate is rubbed by a contaminated brush, resulting in a significant decrease in cleaning ability, which is a problem in terms of quality.

Further, there has been a problem that a large number of man-hours are required to replace the brush frequently.

An object of the present invention is to provide a substrate cleaning apparatus which prevents deterioration with time due to contamination of the brush itself.

[0012]

In order to achieve the above object, a substrate cleaning apparatus according to the present invention is a substrate having an overflow tank, a shutter section, a transfer section, an ultrasonic wave oscillating section, and a rotating brush section. In the cleaning device, the overflow tank contains a cleaning liquid and has a slit-shaped opening near the upper edge of the opposite side surface for loading and unloading the substrate, and the shutter part is provided in the opening. It is provided for opening and closing by loading and unloading the substrate, the transfer section is for immersing and transferring the substrate between the openings of the overflow tank, and the ultrasonic wave oscillating section is for the cleaning solution in the overflow tank. The rotating brush part is for cleaning the substrate with the cleaning brush in the cleaning liquid in the overflow tank.

[0013]

Function: The cleaning brush is constantly immersed in the cleaning liquid, and the cleaning brush is ultrasonically cleaned to prevent contamination by the brush itself.

[0014]

The present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing an embodiment of the present invention.

In FIG. 1, the overflow tank 1 of the cleaning liquid 11 has a slit-shaped opening 2 for loading and unloading the substrate 12 at the upper part of the opposite side surface, and is adjacent to the opening 2 and is synchronized with the passage of the substrate 12. Further, it has a roll-shaped shutter portion 3 which moves up and down by its own weight, and an ultrasonic oscillator 7 arranged at the bottom of the tank 1.

As a transfer section for the substrate 12, transfer rollers 4 for supporting both ends of the substrate 12 are arranged at a predetermined pitch on a straight line connecting the opposite openings 2 of the overflow tank 1.
The pass line of the substrate 12 is formed.

The rotating brush portion 5 is disposed in a substantially central portion of the overflow tank 1 with the cleaning brush 6 attached to the tip end facing downward and orthogonal to the pass line of the substrate 12.

A liquid storage tank 8 is arranged below the overflow tank 1, and the overflow tank 1 and the liquid storage tank 8 are
A piping system of a recovery system of the cleaning liquid 11 and a piping of a supply system including the circulation pump 9 and the filter 10 are connected to form a circulation system.

Next, the cleaning operation will be described. The substrate 1
2 is conveyed rightward along the path line by the conveying roller 4, is conveyed into the liquid of the overflow tank 1 via the shutter portion 3 and the opening portion 2, and is washed by the cleaning brush 6 of the rotating brush portion 5 to the substrate 12 Surface is scrubbed.

The back surface of the substrate 12 and the cleaning brush 6 are
Ultrasonic action by the ultrasonic oscillator 7 (that is, cavitation action when the oscillation frequency is in the 20-40 KHZ band,
It is washed by the action of vibration acceleration in the vicinity of the 1 MHZ band.

The cleaning liquid overflowing from the overflow tank 1 is collected in the liquid storage tank 8. The cleaning liquid in the liquid storage tank 8 is supplied by the circulation pump 9, passes through the filter 10, is filtered, and is supplied to the overflow tank 1.

[0022]

As described above, according to the present invention, the cleaning brush is immersed in the overflowing cleaning liquid and is cleaned by the ultrasonic action of the ultrasonic oscillator. As a result, it is possible to prevent the cleaning ability from being deteriorated due to the contamination of the cleaning brush itself, and it is possible to improve the quality in comparison with the related art.

Further, there is an effect that the frequency of replacement of the cleaning brush is reduced and the number of steps can be reduced.

[Brief description of drawings]

FIG. 1 is a sectional view showing an embodiment of the present invention.

FIG. 2 is a sectional view showing a conventional substrate cleaning apparatus.

[Explanation of symbols]

 1 Overflow tank 2 Opening part 3 Shutter part 4 Conveying roller 5 Rotating brush part 6 Cleaning brush 7 Ultrasonic oscillator 8 Liquid storage tank 9 Circulation pump 10 Filter 11 Cleaning liquid 12 Substrate 13 Receiving tank 14 Spray nozzle

Claims (1)

[Claims] 1. An overflow tank and a shutter section,
A substrate cleaning device having a transfer part, an ultrasonic wave oscillating part, and a rotating brush part, wherein the overflow tank contains a cleaning liquid and has a slit shape for carrying in / out the substrate near the upper edge of the opposite side surface. The shutter is provided in the opening and is opened / closed by loading / unloading the substrate. The transfer unit is immersed in the cleaning liquid between the openings of the overflow tank to transfer the substrate. The ultrasonic wave oscillating unit applies ultrasonic waves to the cleaning liquid in the overflow tank, and the rotating brush unit cleans the substrate with the cleaning brush in the cleaning liquid in the overflow tank. Substrate cleaning equipment.