CN1751813B - 湿处理装置 - Google Patents

湿处理装置 Download PDF

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Publication number
CN1751813B
CN1751813B CN2005101075025A CN200510107502A CN1751813B CN 1751813 B CN1751813 B CN 1751813B CN 2005101075025 A CN2005101075025 A CN 2005101075025A CN 200510107502 A CN200510107502 A CN 200510107502A CN 1751813 B CN1751813 B CN 1751813B
Authority
CN
China
Prior art keywords
mentioned
cleaned
thing
elasticity
coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2005101075025A
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English (en)
Chinese (zh)
Other versions
CN1751813A (zh
Inventor
富山宪世
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Future Vision Inc
Original Assignee
Future Vision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Future Vision Inc filed Critical Future Vision Inc
Publication of CN1751813A publication Critical patent/CN1751813A/zh
Application granted granted Critical
Publication of CN1751813B publication Critical patent/CN1751813B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Coating Apparatus (AREA)
CN2005101075025A 2004-09-24 2005-09-23 湿处理装置 Expired - Fee Related CN1751813B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004276505A JP2006088033A (ja) 2004-09-24 2004-09-24 ウェット処理装置
JP2004276505 2004-09-24
JP2004-276505 2004-09-24

Publications (2)

Publication Number Publication Date
CN1751813A CN1751813A (zh) 2006-03-29
CN1751813B true CN1751813B (zh) 2010-06-02

Family

ID=36229511

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005101075025A Expired - Fee Related CN1751813B (zh) 2004-09-24 2005-09-23 湿处理装置

Country Status (4)

Country Link
JP (1) JP2006088033A (ja)
KR (1) KR100852335B1 (ja)
CN (1) CN1751813B (ja)
TW (1) TWI290738B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006327198A (ja) * 2005-05-23 2006-12-07 Heidelberger Druckmas Ag 液体を塗布する装置
KR100834827B1 (ko) * 2006-11-16 2008-06-04 삼성전자주식회사 포토 마스크 세정장치 및 그의 세정방법
JP4810411B2 (ja) 2006-11-30 2011-11-09 東京応化工業株式会社 処理装置
KR100858427B1 (ko) 2007-02-27 2008-09-17 세메스 주식회사 기판 세정 장치 및 방법
JP5303741B1 (ja) * 2011-12-28 2013-10-02 コニカミノルタ株式会社 情報記録媒体用ガラス基板の製造方法
KR101468460B1 (ko) * 2013-06-12 2014-12-04 주식회사 에스케이테크놀러지 중앙 포집형 흡입구를 이용한 기판용 이물제거장치
CN106623237B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的转举式连续清洗系统及清洗方法
CN106670180B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的清洗装置及清洗方法
CN106623238B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板吸取转移式连续清洗系统及清洗方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6059919A (en) * 1995-08-23 2000-05-09 Atotech Deutschland Gmbh Film-stripping process
US6165267A (en) * 1998-10-07 2000-12-26 Sandia Corporation Spin coating apparatus
CN1340848A (zh) * 2000-08-30 2002-03-20 阿尔卑斯电气株式会社 湿式处理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100306155B1 (ko) * 1996-11-29 2001-11-30 이구택 자기차폐성이우수한기판의코팅방법
JP4189279B2 (ja) 2003-07-03 2008-12-03 株式会社東芝 基板処理装置
JP4451175B2 (ja) 2004-03-19 2010-04-14 大日本スクリーン製造株式会社 ノズル洗浄装置および基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6059919A (en) * 1995-08-23 2000-05-09 Atotech Deutschland Gmbh Film-stripping process
US6165267A (en) * 1998-10-07 2000-12-26 Sandia Corporation Spin coating apparatus
CN1340848A (zh) * 2000-08-30 2002-03-20 阿尔卑斯电气株式会社 湿式处理装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
全文.

Also Published As

Publication number Publication date
TW200616066A (en) 2006-05-16
TWI290738B (en) 2007-12-01
CN1751813A (zh) 2006-03-29
KR100852335B1 (ko) 2008-08-18
JP2006088033A (ja) 2006-04-06
KR20060051583A (ko) 2006-05-19

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100602

Termination date: 20110923