KR100852335B1 - 웨트 처리 장치 - Google Patents

웨트 처리 장치 Download PDF

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Publication number
KR100852335B1
KR100852335B1 KR1020050088729A KR20050088729A KR100852335B1 KR 100852335 B1 KR100852335 B1 KR 100852335B1 KR 1020050088729 A KR1020050088729 A KR 1020050088729A KR 20050088729 A KR20050088729 A KR 20050088729A KR 100852335 B1 KR100852335 B1 KR 100852335B1
Authority
KR
South Korea
Prior art keywords
cleaned
discharge port
cleaning
cleaning fluid
cleaning unit
Prior art date
Application number
KR1020050088729A
Other languages
English (en)
Korean (ko)
Other versions
KR20060051583A (ko
Inventor
노리요 도미야마
Original Assignee
가부시끼가이샤 퓨처 비전
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 퓨처 비전 filed Critical 가부시끼가이샤 퓨처 비전
Publication of KR20060051583A publication Critical patent/KR20060051583A/ko
Application granted granted Critical
Publication of KR100852335B1 publication Critical patent/KR100852335B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Coating Apparatus (AREA)
KR1020050088729A 2004-09-24 2005-09-23 웨트 처리 장치 KR100852335B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004276505A JP2006088033A (ja) 2004-09-24 2004-09-24 ウェット処理装置
JPJP-P-2004-00276505 2004-09-24

Publications (2)

Publication Number Publication Date
KR20060051583A KR20060051583A (ko) 2006-05-19
KR100852335B1 true KR100852335B1 (ko) 2008-08-18

Family

ID=36229511

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050088729A KR100852335B1 (ko) 2004-09-24 2005-09-23 웨트 처리 장치

Country Status (4)

Country Link
JP (1) JP2006088033A (ja)
KR (1) KR100852335B1 (ja)
CN (1) CN1751813B (ja)
TW (1) TWI290738B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006327198A (ja) * 2005-05-23 2006-12-07 Heidelberger Druckmas Ag 液体を塗布する装置
KR100834827B1 (ko) * 2006-11-16 2008-06-04 삼성전자주식회사 포토 마스크 세정장치 및 그의 세정방법
JP4810411B2 (ja) * 2006-11-30 2011-11-09 東京応化工業株式会社 処理装置
KR100858427B1 (ko) 2007-02-27 2008-09-17 세메스 주식회사 기판 세정 장치 및 방법
JP5303741B1 (ja) * 2011-12-28 2013-10-02 コニカミノルタ株式会社 情報記録媒体用ガラス基板の製造方法
KR101468460B1 (ko) * 2013-06-12 2014-12-04 주식회사 에스케이테크놀러지 중앙 포집형 흡입구를 이용한 기판용 이물제거장치
CN106623238B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板吸取转移式连续清洗系统及清洗方法
CN106623237B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的转举式连续清洗系统及清洗方法
CN106670180B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的清洗装置及清洗方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980040103A (ko) * 1996-11-29 1998-08-17 김종진 자기 차폐성이 우수한 기판의 코팅방법
US6059919A (en) * 1995-08-23 2000-05-09 Atotech Deutschland Gmbh Film-stripping process
JP2005026512A (ja) 2003-07-03 2005-01-27 Toshiba Corp 基板処理装置
JP2005262127A (ja) 2004-03-19 2005-09-29 Dainippon Screen Mfg Co Ltd ノズル洗浄装置および基板処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6165267A (en) * 1998-10-07 2000-12-26 Sandia Corporation Spin coating apparatus
JP2002075947A (ja) * 2000-08-30 2002-03-15 Alps Electric Co Ltd ウェット処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6059919A (en) * 1995-08-23 2000-05-09 Atotech Deutschland Gmbh Film-stripping process
KR19980040103A (ko) * 1996-11-29 1998-08-17 김종진 자기 차폐성이 우수한 기판의 코팅방법
JP2005026512A (ja) 2003-07-03 2005-01-27 Toshiba Corp 基板処理装置
JP2005262127A (ja) 2004-03-19 2005-09-29 Dainippon Screen Mfg Co Ltd ノズル洗浄装置および基板処理装置

Also Published As

Publication number Publication date
TWI290738B (en) 2007-12-01
CN1751813B (zh) 2010-06-02
JP2006088033A (ja) 2006-04-06
CN1751813A (zh) 2006-03-29
TW200616066A (en) 2006-05-16
KR20060051583A (ko) 2006-05-19

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A201 Request for examination
E902 Notification of reason for refusal
E90F Notification of reason for final refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee