TWI286871B - EUV light source optical elements - Google Patents
EUV light source optical elements Download PDFInfo
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- TWI286871B TWI286871B TW094105587A TW94105587A TWI286871B TW I286871 B TWI286871 B TW I286871B TW 094105587 A TW094105587 A TW 094105587A TW 94105587 A TW94105587 A TW 94105587A TW I286871 B TWI286871 B TW I286871B
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- 230000003287 optical effect Effects 0.000 title abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 183
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- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 32
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- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 11
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/798,740 US7217940B2 (en) | 2003-04-08 | 2004-03-10 | Collector for EUV light source |
| US10/803,526 US7087914B2 (en) | 2004-03-17 | 2004-03-17 | High repetition rate laser produced plasma EUV light source |
| US10/900,839 US7164144B2 (en) | 2004-03-10 | 2004-07-27 | EUV light source |
| US10/979,945 US8075732B2 (en) | 2004-11-01 | 2004-11-01 | EUV collector debris management |
| US11/021,261 US7193228B2 (en) | 2004-03-10 | 2004-12-22 | EUV light source optical elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200536218A TW200536218A (en) | 2005-11-01 |
| TWI286871B true TWI286871B (en) | 2007-09-11 |
Family
ID=35056666
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094105587A TWI286871B (en) | 2004-03-10 | 2005-02-24 | EUV light source optical elements |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7193228B2 (enExample) |
| EP (1) | EP1723472A4 (enExample) |
| JP (1) | JP2007528608A (enExample) |
| KR (1) | KR20070006805A (enExample) |
| TW (1) | TWI286871B (enExample) |
| WO (1) | WO2005091887A2 (enExample) |
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-
2004
- 2004-12-22 US US11/021,261 patent/US7193228B2/en not_active Expired - Lifetime
-
2005
- 2005-02-24 TW TW094105587A patent/TWI286871B/zh not_active IP Right Cessation
- 2005-02-24 WO PCT/US2005/006199 patent/WO2005091887A2/en not_active Ceased
- 2005-02-24 JP JP2007502841A patent/JP2007528608A/ja not_active Abandoned
- 2005-02-24 EP EP05723880A patent/EP1723472A4/en not_active Withdrawn
- 2005-02-24 KR KR1020067020110A patent/KR20070006805A/ko not_active Ceased
-
2007
- 2007-03-19 US US11/725,940 patent/US20070170378A1/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| US20070170378A1 (en) | 2007-07-26 |
| US7193228B2 (en) | 2007-03-20 |
| EP1723472A4 (en) | 2010-08-18 |
| TW200536218A (en) | 2005-11-01 |
| WO2005091887A2 (en) | 2005-10-06 |
| US20050199830A1 (en) | 2005-09-15 |
| KR20070006805A (ko) | 2007-01-11 |
| WO2005091887A3 (en) | 2005-12-29 |
| JP2007528608A (ja) | 2007-10-11 |
| EP1723472A2 (en) | 2006-11-22 |
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