TWI248718B - Displacement device - Google Patents
Displacement device Download PDFInfo
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- TWI248718B TWI248718B TW089109578A TW89109578A TWI248718B TW I248718 B TWI248718 B TW I248718B TW 089109578 A TW089109578 A TW 089109578A TW 89109578 A TW89109578 A TW 89109578A TW I248718 B TWI248718 B TW I248718B
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- magnet
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- displacement device
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/004—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring coordinates of points
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Linear Motors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Reciprocating, Oscillating Or Vibrating Motors (AREA)
Description
1248718 A7 B7 五、發明說明 ♦、本二明關於一位移裝置,包含一第一部份及第二部份, / IW刀可彼此至少在垂直之父方向及y方向位移,第一部 訂 線 份含一載體與X方向及Y方向成平行延伸,在該載體上,一 鐵系、’先根據與X方向平行延伸之各行,及與丫方向平行 (伸=各列 < 圖案固定其上’各行與各列之間具有相等距 離第〃型式I磁鐵具有一與载體成直角延伸之磁向,並 (伸向第…第二型式之磁鐵具有一與載體成直角延 伸之磁向,並向離開第二部份延伸,並交互安排在每一行 及每一列中,及第三型式之磁鐵安排在第一及第二型式每 對並列磁鐵之間之每一列中,該第三型式磁鐵之磁向與Y 方向平行L伸,並向第一型式磁鐵延伸,第二部份備有一 ,¾冰圈系統,其含至少_第_型式之電線圈,其具有電流 導體位於磁鐵系統之磁場内,其包括一與χ方向成^度之 角度,並包含至少一第二型式之線圈,該線圈有一電流導 體,亦位於磁鐵系統之磁場内,其包括與χ方向成45度之 角度,該電流導體與第一電線圈之電流導體成垂直延伸。 該位移裝置曾揭示於美國專利號碼5,886,432,並可用於 供製造積體電路之晶圓分節器中。此裝置可使在又及丫方向 作極爲準確及迅速之位移。此外,在z方向,與Χ&γ方向 成垂直之方向亦可作小量位移。此等位移與流經線圈之電 流之相位與大小有關。在磁鐵系統中,利用一所謂Halbach 磁鐵結構。在此構型中,一系列磁鐵之磁鐵加以磁化,俾 每一對並列磁鐵之每一磁鐵之磁向,與其他磁鐵成90度旋 轉。利用此種磁鐵構型可導致在線圈之一側之較強磁場, -4 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 297公釐) 經濟部智慧財產局員工消費合作社印製 1248718 A7 ---________B7___ _ 五、發明說明(2 ) 因此’彼此間有一較大供位移之磁力。在美國專利號碼 5,886,432中’根據Halbach原理利用數個相鄰列磁鐵。磁鐵 列間之距離與磁鐵之寬度相等。結果在各列間有空氣。 本發明之一目的爲根據首段所提,利用磁鐵系統之最佳 化以改進位移裝置。 爲達此目的,本發明之位移裝置之特徵爲,在第一部份 之每一行磁鐵中,第一及第二型式之並列磁鐵之每對間安 排弟二型式之磁鐵’該第三型式磁鐵之磁向與X方向成 平行延伸,並延伸向第一型式磁鐵。 此種磁鐵構型,與美國專利號碼5,886,432中所利用之磁 鐵系統之磁場相比’可在每單位面積表面造成更較強之磁 場,因爲,根據本發明,在各列間之空間,根據某一圖案 亦安排磁鐵,因此導致更有效構型之磁鐵及較強磁場。事 實上,Halbach構型之磁鐵現在已在X方向及γ方向中獲 得。 位移裝置進一步改進可以達到,因爲第一及第二型式之 磁鐵爲具有相同之方形,及側表面,因爲苐三型式磁鐵爲 具有側表面之矩形,因此第三型式磁鐵之最長側表面與第 一型及第二型磁鐵之側表面交界,並與第一及第二型磁鐵 之側表面等長’第三型磁鐵之最短侧表面之尺寸與最長侧 表面尺寸間之比値,在0.25及0·50之間。吾人發現此一構 型之磁鐵可產生較強磁場。 當各部份被適當之通過線圈之前導電流所彼此位移時, 利用電流之變換即電流導體中之位置相關電流,吾人發 -5- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------------豐----l· — — 丨訂·--------線 (請先閱讀背面之注音心事項再填寫本頁> 1248718 A7 B7 、發明說明(3 現丄移動邵份在Χ_γ’面作微小之振盪移動。雖然此振盪 ^系小其可干擾利用位移裝置之應用中,如晶圓步進 咨,在組件放置機器中亦同’因其中需要高度準確性。此 結果係由於一項事實,即磁場在電流導體上之分布在線圈 〈位移期間已有改變,因此導致加在電流導體上之可變力 矩’並且加在第二部份上。 此等振盪運動可以降低,因為在本發明位移裝置中之線 圈::二組不同型式之線圈,其由相位電流系統所饋 =其tn^2,及,自位於有效磁場之電流導體之縱 ’一組線圈對另-組線圈移位_等於磁鐵之極節距之 其中之磁極節距之定義為二相鄰對角線間之距離 及Z型同型磁鐵之中 上 m^ 域炙宁〜點即位於其上。此點之解釋為,畤 圈中之勞倫兹力僅生一最小力矩。 ,、泉 之=於有效磁場中之線圈之電流導體之長度為磁鐵節矩 相鄰對角線間之距離,同型 為一 導體在縱向之移動可迭成磁:4即在其上。電流 動強度可降Γ &總計保持&定,結果,振 為=明之此等及其他特性將可參考以下之實施例,而 圖中: _ 口1為含磁鐵系統及電線圈系統之位移裝置之略圖, 圖2為圖1之詳圖, 消 五 頁 更 圖3為圖丨所示之位移裝置之剖面圖, t 0¾¾ (CNS)A4 (210^ 1248718 A7
經濟部智慧財產局員工消費合作社印製 第型Cl線圈之電流導體9成垂直延伸。”在有效磁場裝之 電流導體” 一詞之意義爲,該線圈部份,通常爲一束導體, 位於磁鐵之磁場内,一有效勞倫茲力加於其上而造成= 之移動。 以下將以圖2説明線圈在磁鐵系統中移動之方式。參考號 碼9!,92,及1〇1,1〇2分別代表線圈Ci&C2之電流^ 體,其係位於磁鐵之磁場内。電流導體91位於磁鐵之磁場 内,以N指示。此等N磁鐵之磁向以向上指之箭頭代表,即 以直角指向磁鐵系統,並指向電流導體9ι。磁場之方向由 箭頭h表示。如流經電流導體9ι之電流如箭頭“所示,一 力F〗將以有關箭頭指示之方向加在電流導體上,結果,電 流,體將在箭頭Fl之方向移動。電流導體t位於磁鐵Z = 磁場内。此等Z磁鐵之磁向由向下之箭頭I指示,即以直 角指向磁鐵系統並離開電流導體t。如電流以匕之方向流 經電流導體92,# t流1!相反,一以相g箭頭所指之力 F2,將加在電流導體92上,結果,電流導體將以箭頭匕之 万向移動,即與箭頭F i相同。同理,電流導體丨〇 1及丨, 與電流導體91及92成直角安排,在N及Z磁鐵磁場,以 前頭13及14万向之電流影響下,將受到在箭頭^,h方向 延伸之力。%電流導體《電流反向#,加在電流導體上之 力亦反向,電流導體之移動亦反向。圖3中,示出此一相 互作用力。 電流導體9及1〇之部份u亦存在於第三型1^磁鐵之上, 及/或無磁鐵部份之上’ #,在第—抑及第二以磁鐵之
本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X ! r ----訂---------線 (請先閱讀背面之注音?事項再填寫本頁) -8 - 1248718
(請先閱讀背面之注意事項再填寫本頁> 間(圖2之左下)1流導體之此等部份位於磁場时,其平 均方向與X-Y平面成平行延伸。#參考圖3之電流導體 91C。如一電流〗通過此電流導體,則電流導體之上述部份 會受到與X-Y平面成垂直方向之力,即2方向之力。视電 流之方向及電流導體與磁鐵之相對位置而定,此力將爲朝 向磁鐵或離開磁鐵。如此力自磁鐵離開,此力被稱爲懸浮 ,即此力將使電流導體離開磁鐵方向移動。此一力可 用以提供線圈段與磁鐵間之方向。 第二型N及第二型z磁鐵爲方形磁鐵。第三型11磁鐵爲矩 型或菱形(圖2),故Η型磁鐵之最長側面12與1^型及z型磁 鐵之側面13爲界,最短侧面14與11型磁鐵之最長側面12此 尺寸之比値在〇·25至0.50之間。此一結果,在優化分析上 發現,爲磁鐵系統之每一單位面積之磁場強度最強。 經濟部智慧財產局員工消費合作社印製 圖3顯三線圈之二組,即第一組c i i,其具有電流導體 9ia,9lb,9丨。及返回電流導體92a,92b,92c,及第二組 Csi ’其具有電流導體9Sa,93b,93。,及返回電流導體 9 4 a ’ 9 4 b ’ 9 4 c。各線圈組均由三相電流電流系統饋送。自 電流導體之縱向看,三電流導體之第一組移位一距離15, 此距離’對三電流導體之第二組C 2 i而言,爲磁鐵之磁極 節距16之半。磁鐵之磁極節距16此處之意義爲二相鄰對角 線之距離’同型磁鐵N及Z磁鐵之中心點1 7及1 8即在該線 上。如未採此方法,在位移期間,一可變力矩加在二組載 負電流之線圈,該力矩可使移動部份(線圈段或有磁鐵之載 體)對靜止部份言,繞Z軸振盪。以線圈組之相對位移,此 -9- 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公釐) 1248718 A7 B7 、發明說明( 3:,有-光源35,在罩固定器33上,罩以可置於其上, w ^ 木I焦早凡爲一影像或投 3=::備有—光軸38之光透鏡系統37。-識別單元 ^連接在框架30上。位移裝置31含載體5,其上備有磁 鐵系、·无4。載體5連接在框架3G上。位移裝置尚含第一及第 -線圈段6a及6b ’其各有—基體^器4()及41,基42及 43可分別置於較器上。具有基體固定器之線圈段可單獨 达至’磁鐵系統上方之χ·γ平面中之任何位置。其優點在 於,在移動基體固定器自及至一裝或卸位置(未示出)時, 至厂識^別位置(在識別單元39之下方),及至一照明位置 t聚焦單7C 3 2心下方)之作業時,可同時及獨立實施,故獲 知車义大t輸出。以此一構造,懸浮力可使基體固定器與磁 鐵表面成方向支撑。 i (請先閱讀背面之注意事項再填寫本頁 訂---------線. 經濟部智慧財產局員工消費合作社印製 11
Claims (1)
- 、申請專利範園 Κ Γ種位移裝置,包含第一部份⑴及第( 邵份彼此在至少之χ六,J此— -万向及γ_万向成垂直位移,第一鄯 ‘ C豊(5) ’其與χ_方向及Y-方向成平行延伸,磁 ^系=3)在其上,根據以方向平行延仲之行⑺圖 二,向平行延伸之列(8)圖案固定,行與列間之 士目 第一型(Ν)磁鐵具有之磁向與載體(5)成直角 k伸’並朝向第二部份⑺延伸,及第二型(ζ)磁鐵,其 =向與載體(5)成直角延仲,並離開第二部份⑺,磁鐵 父互安排於每一行⑺中及每一列(8)中,一第三型⑻ 磁鐵被安排於並列之每對第一⑻型及第二(ζ)型磁鐵對 <間之每一列(8)中,第三型磁鐵之磁向與Υ方向成平行 延伸,並朝向第一型(Ν)磁鐵延伸,而第二部份(2)備有 一電線圈系統(4),其含至少一第一型(Ci)之電線圈, :、有位於磁鐵系統之磁場並與X方向成4 5度角之電流 導把(9 ),及含至少一第二型(c 2 )電線圈,其電流導體 (1 〇)亦位於磁鐵系統之磁場中,並含一與X方向成4 5度 之角,及該電流導體與第一電線圈(Ci)之電流導體(9) 成垂直延伸,其特徵為第一部份(1)之每一行(7)中,一 弟一型(H)磁鐵安排在並列對之第一(n)型及第二(z)型 磁鐵之間,該第三型磁鐵之磁向與X方向成平行延伸, 並朝向第一(N)型磁鐵延伸。 2·如申請專利範圍第1項之位移裝置,其特徵為第一(N)型 及第二(Z)型磁鐵具有側面(丨3 )之相同之方形形狀,第 二(Η)型磁鐵為矩型,並有側面(丨2,! 4),第三(H)型 64364-941026.DOC 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) 1248718 、申請專利乾園 磁鐵之最長侧面(12)與第一(Ν)型及第二(ζ)型磁鐵之側 面(13)為界,並與第一及第二型磁鐵之侧面(13)等長, 第三(Η)型磁鐵之最短面(14)與最長面(12)之尺寸比值 在0.25及0·50之間。 3·如申請專利範圍第1項之位移裝置,其特徵為每一電線 圈(1,c2)含二組線圈(c",Ci2),其由〜相電流系 統饋迗,其中之n ^ 2,其中,自位於有效磁場中之電流 導m (9】a - 9 4 c)之縱向看,線圈之一組(c !〗)對線圈之另 一組(Cu)移位一等於磁鐵之磁極節距之半之距離,磁鐵 之磁極節距之定義為二相鄰對角線間之距離,同型(N) 及(Z)磁鐵之中心點(丨7 )及(丨8 )即位於該線上。 4 ·如申請專利範圍第2項之位移裝置,其特徵為每一電線 圈,c2)含二組線圈(Cli,Ci2),其由一η·相電流系 統饋送,其中,其中,自位於有效磁場中之電流 導體(9】a - 94 c)之縱向看,線圈之一組(c ")對線圈之另 一組(C !2)移位一等於磁鐵之磁極節距之半之距離,磁鐵 之磁板郎距之疋我為一相鄰對角線間之距離,同型(n ) 及(Z)磁鐵之中心點(17)及(18)即位於該線上。 5.如申請專利範圍第2項之位移裝置,其特徵為,位於有 效磁場内之線圈之電流導體(9,1〇)之長度(19),約等 於磁鐵之磁極節距(16)之K倍,κ為2,4,6,…,磁 鐵之磁極節距(16)之定義為二相鄰對角線間之距離,同 型(N)及(Z)磁鐵之中心點(17)及(18)分別位於其上。 6· —種組件布局機器,包含·· -2- 64364-941026.DOC 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) A BCD 1248718 、申请專利範園 一機器框架(2 0),包含一上部及下部; 一步局頭(2 3 ),用以以將組件(2 2)置於印刷電路板 (21)上,該印刷電路板(21)被該機器框架(20)之該下部 所支撐;及 如申請專利範圍第1、2、3、4或5項之位移裝置,其 中,該位移裝置之該第一部份(1)係固定在該機器框架 (2 0)之該上部,該布局頭(23)則固定於位移裝置之該第 二部份(2)。 7. —種用於製造積體電路之晶圓步進機,包含: 一框架(3 0 ); 一輻射源(3 4 ),其被該框架(30)所支撐,用以提供一 光源; 一光罩固定器(3 3),用以固定一光罩(3 5),該光罩提 供該積體電路之一圖樣; 基體固定器(4 0,4 1),用於置放一基體;及 如申請專利範圍第1、2、3、4或5項之位移裝置,其 中該位移裝置之該第一部份(1)之該載體(5)被固定在該 框架(3 0)上,該基體固定器(40,41)固定於具有線圈段 (6 a,6 b)之該位移裝置的該第二部份(2)。 64364-941026.DOC 3-
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Families Citing this family (67)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI248718B (en) * | 1999-09-02 | 2006-02-01 | Koninkl Philips Electronics Nv | Displacement device |
TW498368B (en) | 2000-05-23 | 2002-08-11 | Koninkl Philips Electronics Nv | Displacement device |
TW591342B (en) | 2000-11-30 | 2004-06-11 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit manufacturing method using a lithographic projection apparatus |
JP3749882B2 (ja) | 2001-08-22 | 2006-03-01 | エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ | リソグラフィ装置および前記装置で用いるモータ |
EP1286222A1 (en) * | 2001-08-22 | 2003-02-26 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US6927505B2 (en) | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
US20040247787A1 (en) * | 2002-04-19 | 2004-12-09 | Mackie Neil M. | Effluent pressure control for use in a processing system |
JP2004085440A (ja) * | 2002-08-28 | 2004-03-18 | Yaskawa Electric Corp | Dna自動増幅解析装置 |
WO2004075268A1 (ja) * | 2003-02-19 | 2004-09-02 | Nikon Corporation | 移動方法、露光方法及び露光装置、並びにデバイス製造方法 |
JP2005253179A (ja) * | 2004-03-03 | 2005-09-15 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
US7534395B2 (en) * | 2004-04-27 | 2009-05-19 | Beckman Coulter, Inc. | Hysteresis compensation system |
US7368838B2 (en) * | 2004-11-02 | 2008-05-06 | Nikon Corporation | High efficiency voice coil motor |
WO2006075291A2 (en) | 2005-01-17 | 2006-07-20 | Koninklijke Philips Electronics N.V. | Displacement device |
US7459808B2 (en) * | 2005-11-15 | 2008-12-02 | Asml Netherlands B.V. | Lithographic apparatus and motor |
US7541699B2 (en) * | 2005-12-27 | 2009-06-02 | Asml Netherlands B.V. | Magnet assembly, linear actuator, planar motor and lithographic apparatus |
US7675201B2 (en) * | 2006-07-25 | 2010-03-09 | Asml Netherlands B.V. | Lithographic apparatus with planar motor driven support |
US7592760B2 (en) * | 2006-09-11 | 2009-09-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7348752B1 (en) * | 2006-09-20 | 2008-03-25 | Asml Netherlands B.V. | Stage apparatus and lithographic apparatus |
US20080148875A1 (en) * | 2006-12-20 | 2008-06-26 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
US20080252151A1 (en) * | 2007-04-03 | 2008-10-16 | Nikon Corporation | Two degree of freedom movers with overlapping coils |
DE102007024602A1 (de) * | 2007-05-25 | 2008-11-27 | Etel S.A. | Planarmotor |
US8283813B2 (en) | 2007-06-27 | 2012-10-09 | Brooks Automation, Inc. | Robot drive with magnetic spindle bearings |
US8823294B2 (en) | 2007-06-27 | 2014-09-02 | Brooks Automation, Inc. | Commutation of an electromagnetic propulsion and guidance system |
US8659205B2 (en) | 2007-06-27 | 2014-02-25 | Brooks Automation, Inc. | Motor stator with lift capability and reduced cogging characteristics |
JP5663304B2 (ja) | 2007-06-27 | 2015-02-04 | ブルックス オートメーション インコーポレイテッド | 多次元位置センサ |
US9752615B2 (en) * | 2007-06-27 | 2017-09-05 | Brooks Automation, Inc. | Reduced-complexity self-bearing brushless DC motor |
US7834618B2 (en) | 2007-06-27 | 2010-11-16 | Brooks Automation, Inc. | Position sensor system |
WO2009003303A2 (en) * | 2007-07-02 | 2009-01-08 | ETH Zürich | Wireless resonant magnetic actuation for untethered microrobots |
KR20100056468A (ko) | 2007-07-17 | 2010-05-27 | 브룩스 오토메이션 인코퍼레이티드 | 챔버 벽들에 일체화된 모터들을 갖는 기판 처리 장치 |
JP2009136136A (ja) | 2007-09-26 | 2009-06-18 | Asml Netherlands Bv | 合成キャリヤを有するローレンツアクチュエータを有するリソグラフィ装置 |
NL1036516A1 (nl) * | 2008-03-05 | 2009-09-08 | Asml Netherlands Bv | Lithographic apparatus and method. |
TWI359344B (en) * | 2008-03-25 | 2012-03-01 | Univ Nat Taiwan | A six degree of freedom precise positioning system |
NL1036860A1 (nl) * | 2008-04-23 | 2009-10-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
US20100090545A1 (en) * | 2008-10-09 | 2010-04-15 | Binnard Michael B | Planar motor with wedge shaped magnets and diagonal magnetization directions |
US8492934B2 (en) * | 2009-03-23 | 2013-07-23 | Nikon Corporation | Coil variations for an oval coil planar motor |
US9048717B2 (en) * | 2009-09-16 | 2015-06-02 | Ecoharvester, Inc. | Multipolar electromagnetic generator |
US8324998B2 (en) * | 2009-09-16 | 2012-12-04 | Ecoharvester, Inc. | Wireless switch with multipolar electromagnetic generator |
US9647523B2 (en) | 2010-12-03 | 2017-05-09 | Sri International | Levitated-micro manipulator system |
US8593016B2 (en) | 2010-12-03 | 2013-11-26 | Sri International | Levitated micro-manipulator system |
NL2008379A (en) * | 2011-03-30 | 2012-10-02 | Asml Netherlands Bv | Planar motor and lithographic apparatus comprising such planar motor. |
US9030057B2 (en) * | 2011-06-24 | 2015-05-12 | Nikon Corporation | Method and apparatus to allow a plurality of stages to operate in close proximity |
KR101829030B1 (ko) | 2011-10-27 | 2018-03-29 | 더 유니버시티 오브 브리티쉬 콜롬비아 | 변위 장치 및 변위 장치의 제조, 사용 그리고 제어를 위한 방법 |
WO2013143777A2 (en) | 2012-03-27 | 2013-10-03 | Asml Netherlands B.V. | Substrate table system, lithographic apparatus and substrate table swapping method |
NL2008935C2 (nl) * | 2012-06-04 | 2013-12-05 | Mi Partners B V | Positioneerinrichting voor een waferchuck. |
DE102012014812A1 (de) | 2012-07-26 | 2014-01-30 | Etel S.A. | Vorrichtung zum Testen von Wafern |
ITMI20121546A1 (it) | 2012-09-18 | 2014-03-19 | Medacta Int Sa | Piano adattatore per tavolo chirurgico, in particolare per operazioni di sostituzione dell¿anca con approccio anteriore |
CN103066894B (zh) * | 2012-12-12 | 2015-05-20 | 清华大学 | 一种六自由度磁悬浮工件台 |
CN105452812B (zh) | 2013-08-06 | 2019-04-30 | 不列颠哥伦比亚大学 | 移位装置以及用于检测和估计与其相关联的运动的方法和设备 |
CN105684108A (zh) * | 2013-09-04 | 2016-06-15 | Ckd株式会社 | 电磁致动器用电枢线圈、电磁致动器、曝光装置及器件制造方法 |
WO2015179962A1 (en) | 2014-05-30 | 2015-12-03 | The University Of British Columbia | Displacement devices and methods for fabrication, use and control of same |
EP3152822B1 (en) | 2014-06-07 | 2019-08-07 | The University Of British Columbia | Methods and systems for controllably moving multiple moveable stages in a displacement device |
EP3155712A4 (en) | 2014-06-14 | 2018-02-21 | The University Of British Columbia | Displacement devices, moveable stages for displacement devices and methods for fabrication, use and control of same |
EP2963497B1 (en) | 2014-06-30 | 2019-10-16 | Dr. Johannes Heidenhain GmbH | Drive for an XY-Table and XY-Table |
EP2963790B1 (en) | 2014-06-30 | 2019-06-26 | Dr. Johannes Heidenhain GmbH | XY-Table |
CN105811730B (zh) * | 2014-12-30 | 2018-06-29 | 上海微电子装备(集团)股份有限公司 | 一种六自由度直线电机 |
WO2016172217A1 (en) | 2015-04-20 | 2016-10-27 | Sri International | Microrobot and microrobotic train self-assembly with end-effectors |
CA2988803C (en) | 2015-07-06 | 2024-01-30 | The University Of British Columbia | Methods and systems for controllably moving one or more moveable stages in a displacement device |
US11368060B2 (en) * | 2015-07-29 | 2022-06-21 | Chevron U.S.A. Inc. | Motors including tessellating semi-Halbach stators |
NL2017573A (en) * | 2015-11-05 | 2017-05-24 | Asml Netherlands Bv | Magnet array, electric coil device, displacement system, lithographic apparatus and device manufacturing method |
WO2017109013A1 (en) * | 2015-12-22 | 2017-06-29 | Koninklijke Philips N.V. | Method and apparatus for manufacturing 1d and 2d multipole magnet array's |
CN109789977B (zh) | 2016-10-05 | 2021-07-23 | 莱特拉姆有限责任公司 | 线性电机输送机系统 |
CN110612260B (zh) | 2017-05-02 | 2021-12-24 | 莱特拉姆有限责任公司 | 由无刷直流电机驱动的托盘输送机 |
WO2018236469A1 (en) | 2017-06-19 | 2018-12-27 | Laitram, L.L.C. | TRANSPORTER MONORAIL WITH TRAYS |
AU2018331269B2 (en) | 2017-09-13 | 2024-01-04 | Laitram, L.L.C. | Monorail tray conveyor with passive guide rails |
CN109991814B (zh) * | 2017-12-29 | 2020-07-21 | 广东极迅精密仪器有限公司 | 一种位移装置 |
US10807803B2 (en) | 2018-01-31 | 2020-10-20 | Laitram, L.L.C. | Hygienic low-friction magnetic tray and conveyor |
US10654660B2 (en) | 2018-01-31 | 2020-05-19 | Laitram, L.L.C. | Hygienic magnetic tray and conveyor |
Family Cites Families (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20684A (en) * | 1858-06-22 | Improvement in sewing-machines | ||
US23927A (en) * | 1859-05-10 | Photo-litho | ||
JPS58175020A (ja) * | 1982-04-05 | 1983-10-14 | Telmec Co Ltd | 二次元精密位置決め装置 |
US4518918A (en) * | 1982-09-28 | 1985-05-21 | Sprague Electric Company | Ferromagnetic article detector with dual Hall-sensors |
JPS61109637A (ja) * | 1984-10-31 | 1986-05-28 | Hitachi Ltd | テ−ブル装置 |
US4647802A (en) * | 1985-06-13 | 1987-03-03 | Hewlett-Packard Company | Variable reluctance motor with reduced torque ripple |
JPS61288769A (ja) * | 1985-06-13 | 1986-12-18 | Amada Co Ltd | 平面形リニア直流モ−タ |
US4654571A (en) * | 1985-09-16 | 1987-03-31 | Hinds Walter E | Single plane orthogonally movable drive system |
US4949043A (en) * | 1988-04-18 | 1990-08-14 | Resonance Research Inc. | Apparatus for rendering a static magnetic field uniform |
US4893071A (en) * | 1988-05-24 | 1990-01-09 | American Telephone And Telegraph Company, At&T Bell Laboratories | Capacitive incremental position measurement and motion control |
JP2803221B2 (ja) * | 1989-09-19 | 1998-09-24 | 松下電器産業株式会社 | Ic実装装置及びその方法 |
US5157296A (en) * | 1990-12-20 | 1992-10-20 | Massachusetts Institute Of Technology | Bearing for use in high resolution precision control device |
JP2716884B2 (ja) | 1991-07-12 | 1998-02-18 | 住友重機械工業株式会社 | 平面モータ装置 |
US5196745A (en) * | 1991-08-16 | 1993-03-23 | Massachusetts Institute Of Technology | Magnetic positioning device |
JP3216157B2 (ja) | 1991-08-29 | 2001-10-09 | 松下電器産業株式会社 | 精密1段6自由度ステージ |
US5334892A (en) * | 1992-12-22 | 1994-08-02 | Anorad Corporation | Positioning device for planar positioning |
JPH0767284A (ja) | 1993-08-27 | 1995-03-10 | Sanyo Electric Co Ltd | モータの軸受装置 |
JP2908249B2 (ja) | 1994-08-10 | 1999-06-21 | 住友重機械工業株式会社 | 平面モータ装置 |
US5631618A (en) * | 1994-09-30 | 1997-05-20 | Massachusetts Institute Of Technology | Magnetic arrays |
DE4436865A1 (de) * | 1994-10-17 | 1996-08-08 | Pasim Mikrosystemtechnik Gmbh | Modularer Planarläufer und Verfahren zu seiner Herstellung |
US5723917A (en) * | 1994-11-30 | 1998-03-03 | Anorad Corporation | Flat linear motor |
TW318255B (zh) * | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
US5925956A (en) * | 1995-06-30 | 1999-07-20 | Nikon Corporation | Stage construction incorporating magnetically levitated movable stage |
US5847480A (en) * | 1995-11-03 | 1998-12-08 | The Regents Of The University Of California | Passive magnetic bearing element with minimal power losses |
US5699621A (en) * | 1996-02-21 | 1997-12-23 | Massachusetts Institute Of Technology | Positioner with long travel in two dimensions |
US5777402A (en) * | 1996-06-24 | 1998-07-07 | Anorad Corporation | Two-axis motor with high density magnetic platen |
JPH09308218A (ja) * | 1996-05-10 | 1997-11-28 | Canon Inc | リニアモータ及びこれを用いたステージ装置や露光装置 |
DE19631106A1 (de) | 1996-08-01 | 1998-02-05 | Heinz Peter Brandstetter | Statorplatte oder Statorelement |
US6066998A (en) * | 1996-09-12 | 2000-05-23 | Massachusetts Institute Of Technology | Magnetic actuator with long travel in one direction |
US6222614B1 (en) * | 1996-12-06 | 2001-04-24 | Nikon Corporation | Exposure elements with a cable-relaying support |
EP0866375A3 (en) * | 1997-03-17 | 2000-05-24 | Nikon Corporation | Article positioning apparatus and exposing apparatus having the same |
FR2761518B1 (fr) * | 1997-04-01 | 1999-05-28 | Suisse Electronique Microtech | Moteur planaire magnetique et micro-actionneur magnetique comportant un tel moteur |
US6441514B1 (en) * | 1997-04-28 | 2002-08-27 | Ultratech Stepper, Inc. | Magnetically positioned X-Y stage having six degrees of freedom |
US5886432A (en) * | 1997-04-28 | 1999-03-23 | Ultratech Stepper, Inc. | Magnetically-positioned X-Y stage having six-degrees of freedom |
JP3155936B2 (ja) * | 1997-06-26 | 2001-04-16 | キヤノン株式会社 | リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法 |
WO1999004481A1 (fr) * | 1997-07-18 | 1999-01-28 | Nikon Corporation | Unite d'excitation, moteur lineaire ou plan utilisant l'unite, dispositif a etage utilisant le moteur et dispositif d'alignement utilisant le dispositif |
AU8747698A (en) * | 1997-08-21 | 1999-03-16 | Nikon Corporation | Positioning device, driving unit, and aligner equipped with the device |
US6114119A (en) * | 1997-08-29 | 2000-09-05 | Wisconsin Alumni Research Foundation | Transglutaminase and gene encoding same |
JP4164905B2 (ja) * | 1997-09-25 | 2008-10-15 | 株式会社ニコン | 電磁力モータ、ステージ装置および露光装置 |
US6003230A (en) * | 1997-10-03 | 1999-12-21 | Massachusetts Institute Of Technology | Magnetic positioner having a single moving part |
JP4042073B2 (ja) | 1997-12-26 | 2008-02-06 | 株式会社ニコン | 平面型モータ、ステージ装置、及び露光装置 |
AU2852899A (en) * | 1998-03-19 | 1999-10-11 | Nikon Corporation | Flat motor, stage, exposure apparatus and method of producing the same, and device and method for manufacturing the same |
AU3168499A (en) * | 1998-04-10 | 1999-11-01 | Nikon Corporation | Linear motor having polygonal coil unit |
JP4088728B2 (ja) | 1998-07-09 | 2008-05-21 | 株式会社ニコン | 平面モータ装置、駆動装置及び露光装置 |
US6252234B1 (en) | 1998-08-14 | 2001-06-26 | Nikon Corporation | Reaction force isolation system for a planar motor |
US6097114A (en) * | 1998-08-17 | 2000-08-01 | Nikon Corporation | Compact planar motor having multiple degrees of freedom |
US6215260B1 (en) * | 1998-08-28 | 2001-04-10 | Northern Magnetics, Inc. | Controlling movement of linear induction motor |
US6188147B1 (en) * | 1998-10-02 | 2001-02-13 | Nikon Corporation | Wedge and transverse magnet arrays |
US6262503B1 (en) * | 1998-10-15 | 2001-07-17 | Massachusetts Institute Of Technology | Method and apparatus for cooling current carrying coil |
JP2000138279A (ja) | 1998-10-29 | 2000-05-16 | Nikon Corp | ステージ装置及び露光装置 |
US6147421A (en) * | 1998-11-16 | 2000-11-14 | Nikon Corporation | Platform positionable in at least three degrees of freedom by interaction with coils |
US6208045B1 (en) * | 1998-11-16 | 2001-03-27 | Nikon Corporation | Electric motors and positioning devices having moving magnet arrays and six degrees of freedom |
JP4134406B2 (ja) | 1998-12-04 | 2008-08-20 | 株式会社ニコン | 平面モータ装置及び露光装置 |
TW439116B (en) | 1998-12-16 | 2001-06-07 | Nippon Kogaku Kk | Platen motor device and assembly method thereof, platen motor device driving method, stage device and driving method thereof, exposure device and method thereof, and device and production method thereof |
US6104108A (en) * | 1998-12-22 | 2000-08-15 | Nikon Corporation | Wedge magnet array for linear motor |
KR100855921B1 (ko) | 1999-02-04 | 2008-09-02 | 가부시키가이샤 니콘 | 평면모터장치 및 그 구동방법, 스테이지장치 및 그구동방법, 노광장치 및 노광방법, 그리고 디바이스 및 그제조방법 |
US6127749A (en) * | 1999-02-10 | 2000-10-03 | Nikon Corporation Of Japan | Two-dimensional electric motor |
TW466542B (en) * | 1999-02-26 | 2001-12-01 | Nippon Kogaku Kk | A stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same |
US6114781A (en) * | 1999-02-26 | 2000-09-05 | Nikon Corporation | Cooling system for a linear or planar motor |
JP4407774B2 (ja) * | 1999-04-26 | 2010-02-03 | 株式会社ニコン | モータ装置及びモータ装置の組み立て方法、並びに露光装置 |
US6175169B1 (en) * | 1999-05-03 | 2001-01-16 | Ralph L. Hollis, Jr. | Closed-loop planar linear motor with integral monolithic three-degree-of-freedom AC-magnetic position/orientation sensor |
US6285097B1 (en) * | 1999-05-11 | 2001-09-04 | Nikon Corporation | Planar electric motor and positioning device having transverse magnets |
US6144119A (en) * | 1999-06-18 | 2000-11-07 | Nikon Corporation | Planar electric motor with dual coil and magnet arrays |
US6351041B1 (en) * | 1999-07-29 | 2002-02-26 | Nikon Corporation | Stage apparatus and inspection apparatus having stage apparatus |
TWI248718B (en) * | 1999-09-02 | 2006-02-01 | Koninkl Philips Electronics Nv | Displacement device |
US6271606B1 (en) * | 1999-12-23 | 2001-08-07 | Nikon Corporation | Driving motors attached to a stage that are magnetically coupled through a chamber |
US6313550B1 (en) * | 2000-02-02 | 2001-11-06 | Nikon Corporation | Coil mounting and cooling system for an electric motor |
US6316849B1 (en) * | 2000-02-22 | 2001-11-13 | Paul Konkola | Methods and apparatus involving selectively tailored electromagnetic fields |
US6437463B1 (en) * | 2000-04-24 | 2002-08-20 | Nikon Corporation | Wafer positioner with planar motor and mag-lev fine stage |
US6445093B1 (en) * | 2000-06-26 | 2002-09-03 | Nikon Corporation | Planar motor with linear coil arrays |
US6452292B1 (en) * | 2000-06-26 | 2002-09-17 | Nikon Corporation | Planar motor with linear coil arrays |
-
2000
- 2000-05-18 TW TW089109578A patent/TWI248718B/zh not_active IP Right Cessation
- 2000-08-15 WO PCT/EP2000/007970 patent/WO2001018944A1/en active IP Right Grant
- 2000-08-15 JP JP2001522649A patent/JP4562336B2/ja not_active Expired - Fee Related
- 2000-08-15 KR KR1020017005525A patent/KR100673804B1/ko active IP Right Grant
- 2000-08-15 DE DE60035572T patent/DE60035572T2/de not_active Expired - Lifetime
- 2000-08-15 EP EP00958454A patent/EP1135846B1/en not_active Expired - Lifetime
- 2000-08-31 US US09/652,966 patent/US6531793B1/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
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US6531793B1 (en) | 2003-03-11 |
EP1135846B1 (en) | 2007-07-18 |
JP4562336B2 (ja) | 2010-10-13 |
WO2001018944A1 (en) | 2001-03-15 |
DE60035572T2 (de) | 2008-04-10 |
US6879063B2 (en) | 2005-04-12 |
US20030155821A1 (en) | 2003-08-21 |
KR100673804B1 (ko) | 2007-01-25 |
JP2003509992A (ja) | 2003-03-11 |
EP1135846A1 (en) | 2001-09-26 |
DE60035572D1 (de) | 2007-08-30 |
KR20010085989A (ko) | 2001-09-07 |
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