TWI248718B - Displacement device - Google Patents

Displacement device Download PDF

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Publication number
TWI248718B
TWI248718B TW089109578A TW89109578A TWI248718B TW I248718 B TWI248718 B TW I248718B TW 089109578 A TW089109578 A TW 089109578A TW 89109578 A TW89109578 A TW 89109578A TW I248718 B TWI248718 B TW I248718B
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Taiwan
Prior art keywords
magnet
type
displacement device
magnetic
magnets
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TW089109578A
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English (en)
Inventor
Petrus Carolus Maria Frissen
Johan Cornelia Compter
Antonius Theodorus Peijnenburg
Erik Roelof Loopstra
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Koninkl Philips Electronics Nv
Asml Netherlands Bv
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/004Measuring arrangements characterised by the use of electric or magnetic techniques for measuring coordinates of points
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70758Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K41/00Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02Linear motors; Sectional motors
    • H02K41/03Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K2201/00Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18Machines moving with multiple degrees of freedom
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Linear Motors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Reciprocating, Oscillating Or Vibrating Motors (AREA)

Description

1248718 A7 B7 五、發明說明 ♦、本二明關於一位移裝置,包含一第一部份及第二部份, / IW刀可彼此至少在垂直之父方向及y方向位移,第一部 訂 線 份含一載體與X方向及Y方向成平行延伸,在該載體上,一 鐵系、’先根據與X方向平行延伸之各行,及與丫方向平行 (伸=各列 < 圖案固定其上’各行與各列之間具有相等距 離第〃型式I磁鐵具有一與载體成直角延伸之磁向,並 (伸向第…第二型式之磁鐵具有一與載體成直角延 伸之磁向,並向離開第二部份延伸,並交互安排在每一行 及每一列中,及第三型式之磁鐵安排在第一及第二型式每 對並列磁鐵之間之每一列中,該第三型式磁鐵之磁向與Y 方向平行L伸,並向第一型式磁鐵延伸,第二部份備有一 ,¾冰圈系統,其含至少_第_型式之電線圈,其具有電流 導體位於磁鐵系統之磁場内,其包括一與χ方向成^度之 角度,並包含至少一第二型式之線圈,該線圈有一電流導 體,亦位於磁鐵系統之磁場内,其包括與χ方向成45度之 角度,該電流導體與第一電線圈之電流導體成垂直延伸。 該位移裝置曾揭示於美國專利號碼5,886,432,並可用於 供製造積體電路之晶圓分節器中。此裝置可使在又及丫方向 作極爲準確及迅速之位移。此外,在z方向,與Χ&γ方向 成垂直之方向亦可作小量位移。此等位移與流經線圈之電 流之相位與大小有關。在磁鐵系統中,利用一所謂Halbach 磁鐵結構。在此構型中,一系列磁鐵之磁鐵加以磁化,俾 每一對並列磁鐵之每一磁鐵之磁向,與其他磁鐵成90度旋 轉。利用此種磁鐵構型可導致在線圈之一側之較強磁場, -4 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 297公釐) 經濟部智慧財產局員工消費合作社印製 1248718 A7 ---________B7___ _ 五、發明說明(2 ) 因此’彼此間有一較大供位移之磁力。在美國專利號碼 5,886,432中’根據Halbach原理利用數個相鄰列磁鐵。磁鐵 列間之距離與磁鐵之寬度相等。結果在各列間有空氣。 本發明之一目的爲根據首段所提,利用磁鐵系統之最佳 化以改進位移裝置。 爲達此目的,本發明之位移裝置之特徵爲,在第一部份 之每一行磁鐵中,第一及第二型式之並列磁鐵之每對間安 排弟二型式之磁鐵’該第三型式磁鐵之磁向與X方向成 平行延伸,並延伸向第一型式磁鐵。 此種磁鐵構型,與美國專利號碼5,886,432中所利用之磁 鐵系統之磁場相比’可在每單位面積表面造成更較強之磁 場,因爲,根據本發明,在各列間之空間,根據某一圖案 亦安排磁鐵,因此導致更有效構型之磁鐵及較強磁場。事 實上,Halbach構型之磁鐵現在已在X方向及γ方向中獲 得。 位移裝置進一步改進可以達到,因爲第一及第二型式之 磁鐵爲具有相同之方形,及側表面,因爲苐三型式磁鐵爲 具有側表面之矩形,因此第三型式磁鐵之最長側表面與第 一型及第二型磁鐵之側表面交界,並與第一及第二型磁鐵 之側表面等長’第三型磁鐵之最短侧表面之尺寸與最長侧 表面尺寸間之比値,在0.25及0·50之間。吾人發現此一構 型之磁鐵可產生較強磁場。 當各部份被適當之通過線圈之前導電流所彼此位移時, 利用電流之變換即電流導體中之位置相關電流,吾人發 -5- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------------豐----l· — — 丨訂·--------線 (請先閱讀背面之注音心事項再填寫本頁> 1248718 A7 B7 、發明說明(3 現丄移動邵份在Χ_γ’面作微小之振盪移動。雖然此振盪 ^系小其可干擾利用位移裝置之應用中,如晶圓步進 咨,在組件放置機器中亦同’因其中需要高度準確性。此 結果係由於一項事實,即磁場在電流導體上之分布在線圈 〈位移期間已有改變,因此導致加在電流導體上之可變力 矩’並且加在第二部份上。 此等振盪運動可以降低,因為在本發明位移裝置中之線 圈::二組不同型式之線圈,其由相位電流系統所饋 =其tn^2,及,自位於有效磁場之電流導體之縱 ’一組線圈對另-組線圈移位_等於磁鐵之極節距之 其中之磁極節距之定義為二相鄰對角線間之距離 及Z型同型磁鐵之中 上 m^ 域炙宁〜點即位於其上。此點之解釋為,畤 圈中之勞倫兹力僅生一最小力矩。 ,、泉 之=於有效磁場中之線圈之電流導體之長度為磁鐵節矩 相鄰對角線間之距離,同型 為一 導體在縱向之移動可迭成磁:4即在其上。電流 動強度可降Γ &總計保持&定,結果,振 為=明之此等及其他特性將可參考以下之實施例,而 圖中: _ 口1為含磁鐵系統及電線圈系統之位移裝置之略圖, 圖2為圖1之詳圖, 消 五 頁 更 圖3為圖丨所示之位移裝置之剖面圖, t 0¾¾ (CNS)A4 (210^ 1248718 A7
經濟部智慧財產局員工消費合作社印製 第型Cl線圈之電流導體9成垂直延伸。”在有效磁場裝之 電流導體” 一詞之意義爲,該線圈部份,通常爲一束導體, 位於磁鐵之磁場内,一有效勞倫茲力加於其上而造成= 之移動。 以下將以圖2説明線圈在磁鐵系統中移動之方式。參考號 碼9!,92,及1〇1,1〇2分別代表線圈Ci&C2之電流^ 體,其係位於磁鐵之磁場内。電流導體91位於磁鐵之磁場 内,以N指示。此等N磁鐵之磁向以向上指之箭頭代表,即 以直角指向磁鐵系統,並指向電流導體9ι。磁場之方向由 箭頭h表示。如流經電流導體9ι之電流如箭頭“所示,一 力F〗將以有關箭頭指示之方向加在電流導體上,結果,電 流,體將在箭頭Fl之方向移動。電流導體t位於磁鐵Z = 磁場内。此等Z磁鐵之磁向由向下之箭頭I指示,即以直 角指向磁鐵系統並離開電流導體t。如電流以匕之方向流 經電流導體92,# t流1!相反,一以相g箭頭所指之力 F2,將加在電流導體92上,結果,電流導體將以箭頭匕之 万向移動,即與箭頭F i相同。同理,電流導體丨〇 1及丨, 與電流導體91及92成直角安排,在N及Z磁鐵磁場,以 前頭13及14万向之電流影響下,將受到在箭頭^,h方向 延伸之力。%電流導體《電流反向#,加在電流導體上之 力亦反向,電流導體之移動亦反向。圖3中,示出此一相 互作用力。 電流導體9及1〇之部份u亦存在於第三型1^磁鐵之上, 及/或無磁鐵部份之上’ #,在第—抑及第二以磁鐵之
本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X ! r ----訂---------線 (請先閱讀背面之注音?事項再填寫本頁) -8 - 1248718
(請先閱讀背面之注意事項再填寫本頁> 間(圖2之左下)1流導體之此等部份位於磁場时,其平 均方向與X-Y平面成平行延伸。#參考圖3之電流導體 91C。如一電流〗通過此電流導體,則電流導體之上述部份 會受到與X-Y平面成垂直方向之力,即2方向之力。视電 流之方向及電流導體與磁鐵之相對位置而定,此力將爲朝 向磁鐵或離開磁鐵。如此力自磁鐵離開,此力被稱爲懸浮 ,即此力將使電流導體離開磁鐵方向移動。此一力可 用以提供線圈段與磁鐵間之方向。 第二型N及第二型z磁鐵爲方形磁鐵。第三型11磁鐵爲矩 型或菱形(圖2),故Η型磁鐵之最長側面12與1^型及z型磁 鐵之側面13爲界,最短侧面14與11型磁鐵之最長側面12此 尺寸之比値在〇·25至0.50之間。此一結果,在優化分析上 發現,爲磁鐵系統之每一單位面積之磁場強度最強。 經濟部智慧財產局員工消費合作社印製 圖3顯三線圈之二組,即第一組c i i,其具有電流導體 9ia,9lb,9丨。及返回電流導體92a,92b,92c,及第二組 Csi ’其具有電流導體9Sa,93b,93。,及返回電流導體 9 4 a ’ 9 4 b ’ 9 4 c。各線圈組均由三相電流電流系統饋送。自 電流導體之縱向看,三電流導體之第一組移位一距離15, 此距離’對三電流導體之第二組C 2 i而言,爲磁鐵之磁極 節距16之半。磁鐵之磁極節距16此處之意義爲二相鄰對角 線之距離’同型磁鐵N及Z磁鐵之中心點1 7及1 8即在該線 上。如未採此方法,在位移期間,一可變力矩加在二組載 負電流之線圈,該力矩可使移動部份(線圈段或有磁鐵之載 體)對靜止部份言,繞Z軸振盪。以線圈組之相對位移,此 -9- 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公釐) 1248718 A7 B7 、發明說明( 3:,有-光源35,在罩固定器33上,罩以可置於其上, w ^ 木I焦早凡爲一影像或投 3=::備有—光軸38之光透鏡系統37。-識別單元 ^連接在框架30上。位移裝置31含載體5,其上備有磁 鐵系、·无4。載體5連接在框架3G上。位移裝置尚含第一及第 -線圈段6a及6b ’其各有—基體^器4()及41,基42及 43可分別置於較器上。具有基體固定器之線圈段可單獨 达至’磁鐵系統上方之χ·γ平面中之任何位置。其優點在 於,在移動基體固定器自及至一裝或卸位置(未示出)時, 至厂識^別位置(在識別單元39之下方),及至一照明位置 t聚焦單7C 3 2心下方)之作業時,可同時及獨立實施,故獲 知車义大t輸出。以此一構造,懸浮力可使基體固定器與磁 鐵表面成方向支撑。 i (請先閱讀背面之注意事項再填寫本頁 訂---------線. 經濟部智慧財產局員工消費合作社印製 11

Claims (1)

  1. 、申請專利範園 Κ Γ種位移裝置,包含第一部份⑴及第( 邵份彼此在至少之χ六,J此— -万向及γ_万向成垂直位移,第一鄯 ‘ C豊(5) ’其與χ_方向及Y-方向成平行延伸,磁 ^系=3)在其上,根據以方向平行延仲之行⑺圖 二,向平行延伸之列(8)圖案固定,行與列間之 士目 第一型(Ν)磁鐵具有之磁向與載體(5)成直角 k伸’並朝向第二部份⑺延伸,及第二型(ζ)磁鐵,其 =向與載體(5)成直角延仲,並離開第二部份⑺,磁鐵 父互安排於每一行⑺中及每一列(8)中,一第三型⑻ 磁鐵被安排於並列之每對第一⑻型及第二(ζ)型磁鐵對 <間之每一列(8)中,第三型磁鐵之磁向與Υ方向成平行 延伸,並朝向第一型(Ν)磁鐵延伸,而第二部份(2)備有 一電線圈系統(4),其含至少一第一型(Ci)之電線圈, :、有位於磁鐵系統之磁場並與X方向成4 5度角之電流 導把(9 ),及含至少一第二型(c 2 )電線圈,其電流導體 (1 〇)亦位於磁鐵系統之磁場中,並含一與X方向成4 5度 之角,及該電流導體與第一電線圈(Ci)之電流導體(9) 成垂直延伸,其特徵為第一部份(1)之每一行(7)中,一 弟一型(H)磁鐵安排在並列對之第一(n)型及第二(z)型 磁鐵之間,該第三型磁鐵之磁向與X方向成平行延伸, 並朝向第一(N)型磁鐵延伸。 2·如申請專利範圍第1項之位移裝置,其特徵為第一(N)型 及第二(Z)型磁鐵具有側面(丨3 )之相同之方形形狀,第 二(Η)型磁鐵為矩型,並有側面(丨2,! 4),第三(H)型 64364-941026.DOC 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) 1248718 、申請專利乾園 磁鐵之最長侧面(12)與第一(Ν)型及第二(ζ)型磁鐵之側 面(13)為界,並與第一及第二型磁鐵之侧面(13)等長, 第三(Η)型磁鐵之最短面(14)與最長面(12)之尺寸比值 在0.25及0·50之間。 3·如申請專利範圍第1項之位移裝置,其特徵為每一電線 圈(1,c2)含二組線圈(c",Ci2),其由〜相電流系 統饋迗,其中之n ^ 2,其中,自位於有效磁場中之電流 導m (9】a - 9 4 c)之縱向看,線圈之一組(c !〗)對線圈之另 一組(Cu)移位一等於磁鐵之磁極節距之半之距離,磁鐵 之磁極節距之定義為二相鄰對角線間之距離,同型(N) 及(Z)磁鐵之中心點(丨7 )及(丨8 )即位於該線上。 4 ·如申請專利範圍第2項之位移裝置,其特徵為每一電線 圈,c2)含二組線圈(Cli,Ci2),其由一η·相電流系 統饋送,其中,其中,自位於有效磁場中之電流 導體(9】a - 94 c)之縱向看,線圈之一組(c ")對線圈之另 一組(C !2)移位一等於磁鐵之磁極節距之半之距離,磁鐵 之磁板郎距之疋我為一相鄰對角線間之距離,同型(n ) 及(Z)磁鐵之中心點(17)及(18)即位於該線上。 5.如申請專利範圍第2項之位移裝置,其特徵為,位於有 效磁場内之線圈之電流導體(9,1〇)之長度(19),約等 於磁鐵之磁極節距(16)之K倍,κ為2,4,6,…,磁 鐵之磁極節距(16)之定義為二相鄰對角線間之距離,同 型(N)及(Z)磁鐵之中心點(17)及(18)分別位於其上。 6· —種組件布局機器,包含·· -2- 64364-941026.DOC 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) A BCD 1248718 、申请專利範園 一機器框架(2 0),包含一上部及下部; 一步局頭(2 3 ),用以以將組件(2 2)置於印刷電路板 (21)上,該印刷電路板(21)被該機器框架(20)之該下部 所支撐;及 如申請專利範圍第1、2、3、4或5項之位移裝置,其 中,該位移裝置之該第一部份(1)係固定在該機器框架 (2 0)之該上部,該布局頭(23)則固定於位移裝置之該第 二部份(2)。 7. —種用於製造積體電路之晶圓步進機,包含: 一框架(3 0 ); 一輻射源(3 4 ),其被該框架(30)所支撐,用以提供一 光源; 一光罩固定器(3 3),用以固定一光罩(3 5),該光罩提 供該積體電路之一圖樣; 基體固定器(4 0,4 1),用於置放一基體;及 如申請專利範圍第1、2、3、4或5項之位移裝置,其 中該位移裝置之該第一部份(1)之該載體(5)被固定在該 框架(3 0)上,該基體固定器(40,41)固定於具有線圈段 (6 a,6 b)之該位移裝置的該第二部份(2)。 64364-941026.DOC 3-
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US6531793B1 (en) 2003-03-11
EP1135846B1 (en) 2007-07-18
JP4562336B2 (ja) 2010-10-13
WO2001018944A1 (en) 2001-03-15
DE60035572T2 (de) 2008-04-10
US6879063B2 (en) 2005-04-12
US20030155821A1 (en) 2003-08-21
KR100673804B1 (ko) 2007-01-25
JP2003509992A (ja) 2003-03-11
EP1135846A1 (en) 2001-09-26
DE60035572D1 (de) 2007-08-30
KR20010085989A (ko) 2001-09-07

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