1 ^ 1 ^ 經濟部智慧財產局具工消f合作杜印製 A7 _-___ B7 五、發明說明（ί ) [技術領域] i 本發明係關於平面馬達裝置及其組裝方法、平面馬達 裝置之驅動方法、平台裝置及其驅動方法'曝光裝置及曝 光方法、以及元件及其製造方法，詳言之，係關於具備有 形成移動面之固定構件，及浮動支撐於移動面上以非接觸 方式沿移動面移動之可動構件之平面馬達裝置及其組裝方 法’前述平面馬達裝置之驅動方法，包含將前述平面馬達 裝置作爲移動體之驅動裝置的平台裝置及其驅動方法，使 用於構成前述平台裝置之移動體上搭載光罩及基板之一方 的曝光裝置及前述平台裝置之驅動方法的曝光方法，以及 使用前述曝光裝置所製造之元件及其製造方法。 [習知技術] 以往’用以製造半導體元件、液晶顯示元件等之微影 製程中，係使用將形成於光罩或標線板(以下，通稱爲「標 線板」）之圖案，透過投影光學系統複製於塗佈有光阻劑等 之晶圓或玻璃板等之基板上的曝光裝置。 此曝光裝置，由於須高精密度地將晶圓定位於曝光位 置，因此係使用將保持晶圓之晶圓台驅動於2維方向之平 台裝置=此種平台裝置，一直以來，由於係採用於XY各 軸分別二個總計四個線性馬達及線性空氣導軌之組合系統 ，因此重量、體積皆較大。 最近，爲了更爲高速地、不受機械性之導引面之精度 的影響進行高精密度之定位，同時避免機械性之摩擦而延 4 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ； ， f--------訂---------線 I (請先閱讀背面之注意事項再填窝本頁) A7 _________Β7___ 五、發明說明（L) 長晶圓之壽命，開發了將裝載晶圓之平台h非接觸之方式 驅動於2維方向，據以定位晶圓之平台裝置。作爲此種非 接觸驅動之平台裝置之驅動源，以將例如可變磁性阻尼驅 動方式之線性脈衝馬達結合2軸份之構造的平面馬達較爲 人知。 然而，在使用上述之可變磁性阻尼驅動方式之平面馬 達以構成精密之定位平台時，雖需要用以使該平台浮起之 空氣軸承等之軸承，但由於可變磁性阻尼驅動方式之平面 馬達係以磁性吸引力作爲其驅動原理，因此可動構件與固 定構件之間隔設定的非常小，兩者間之磁性吸力成爲藉空 氣軸承以使平台浮起之力量的抵抗力，因此用以使平台浮 起之空氣供給量以及供給該空氣之空氣幫浦之消耗電力增 加。 除此之外，亦開發有藉將線性馬達展開於2維方向之 羅倫茲電磁力驅動之平面馬達（參照例如美國專利(USP)第 5196745號公報）。此種羅倫茲電磁力式之平面馬達，由於 具有優異之控制性、推力線形及定位性，因此被認爲將來 會是非常好的平台驅動源。然而，對此種羅倫茲電磁力驅 動之平面馬達來說，於作爲平台之驅動源時，亦需要開發 減少用以使平台浮起之消耗電力的新技術。 此外，隨著晶圓之大型化，用以保持晶圓之晶圓台亦 大型化、重量化，因此爲其驅動源之平面馬達亦被要求具 備高推力，進而產生馬達大型化且其消耗電力增加之不宜 狀況。又，包含馬達之晶圓台之重量化，將導致定位性的 5 本紙張尺度適用中國國家標準（CNS)A4規格（210 >«297公釐） <謗先間讀背面之注意事項再填寫本頁) j. 裝--------訂---------線 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消费合作社印製 A7 B7 五、發明說明（> ) 惡化、增加定位所需時間等之位置控制性的惡化。更進 一步來說，晶圓台之大型化，將限制設計之自由度。 本發明有鑑於上述情形，其第1目的，在於提供一能 提升可動構件之位置控制性，且能減少消耗電力之平面馬 達裝置及其組裝方法以及平面馬達裝置之驅動方法。 又，本發明之第2目的，在提供一能提升移動體之位 置控制性的平台裝置及其驅動方法。 又，本發明之第3目的，在提供一能持續維持高生產 率進行高精密度之曝光的曝光裝置及曝光方法。 又，本發明之第4目的，在提供一高集積度之元件及 其製造方法。 [發明之揭示] 一般來說，羅倫茲電磁力驅動方式之平面馬達，於其 可動構件上，對向於移動面、沿該移動面以既定之位置關 係，於既定面積之範圍內，配置有複數個驅動力產生構件 ，亦即磁石或電樞線圈。此驅動力產生構件之相互的空間 中，除了不允許磁性體之存在外並無任何其他限制，因此 如能有效的利用此空間，於此空間配置浮起力產生構件的 話’可在不使可動構件大型化之情形下，相對於移動面浮 起支撐移動子。 本發明乃著眼於此點而成，其係採用以下之構成。亦 即， 本案之第1發明，係一種平面馬達裝置，具有形成移 6 本紙張尺度適用令國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝 ------訂-11!!.線 43 91 16 A7 B7 五、發明說明（4) 動面（21a)之固定構件（60)，及沿前述移動移動之可動構 件(51)，其特徵在於： 前述可動構件，具備有互以滿足既定之位置關係的方 式配置之複數個驅動力產生構件（5411〜54nn) ’及配置於前 述驅動力產生裝置中之鄰接的驅動力產生裝置間，且以前 述位置關係之關係配置’對前述移動面噴出流體之複數的 軸承(56)。 據此，由於可動構件，具備有互以滿足既定之位置關 係的方式配置之複數個驅動力產生構件及配置於前述驅動 力產生裝置中之鄰接的驅動力產生裝置間，且以前述位置 關係之關係配置’對前述移動面噴出流體之複數的軸承， 故能藉由自該複數個軸承對移動面所噴出之流體的靜壓， 將可動構件浮起支撐於移動面上3因此，能實現與複數個 驅動力產生構件之配置區域大致相等大小面積之小型、輕 量的可動構件，據以減低用以驅動及使可動構件浮起之消 耗電力，並可提升可動構件之位置控制性。 此情形中，亦可將前述複數個驅動力產生構件，於2 維方向以既定間隔配置於前述可動構件之前述移動面之對 向側之面上，而將前述複數個軸承，配置於前述複數個驅 動力產生構件中既定之鄰接的前述驅動力產生構件間。 此情形中，前述軸承，亦可是對前述移動面噴出加壓 氣體之氣體靜壓軸承。此時，能藉由自該氣體靜壓軸承所 噴出之加壓氣體的靜壓而使可動構件浮起支撐於移動面上 〇 · 7 本紙張尺度適用中國國家標準（CNS)A4視格（210x 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝---- 訂---------線 經濟部智慧財產局員工消費合作社印製 A7 B7____ 五、發明說明（$ ) 此情形中，前述可動構件（51)，係具_前述複數個驅 動力產生構件(54u〜54mi)爲配置在對向於前述移動面(21a) 之面側的矩形支撐構件(52)時，最好是能在位於該支撐構 件之4角的前述鄰接之驅動力產生構件間配置前述氣體靜 壓軸承。此係由於平面馬達裝置中，如上述般藉加壓氣體 之靜壓使可動構件浮起支撐於移動面之上時，可動構件， 正確來說，氣體靜壓軸承之軸承面與移動面間之間隙(所謂 之軸承間隙）的尺寸於可動構件之沿移動面之移動中不應有 預期外之變化，亦即要求對交差於對抗可動構件之加速的 移動面之方向的姿勢位置變化的剛性較高，然而於矩形之 支撐構件上於2維方向以既定間隔配置複數個驅動力產生 構件、亦即成矩陣狀時，在位於其4角之鄰接的驅動力產 生構件間配置氣體靜壓軸承時，能使前述剛性非常高之故 〇 此種情形中，氣體靜壓軸承，可在位於支撐構件4角 之鄰接的驅動力產生構件間各配置1個，亦可在位於前述 支撐構件(52)4角部份之鄰接的驅動力產生構件間分別配置 複數個前述氣體靜壓軸承。 本發明之平面馬達裝置，當使用氣體靜壓軸承作爲配 置於鄰接的驅動力產生構件之軸承時，可自外部之氣體供 給源直接、個別的供給加壓氣體，但前述支撐構件（52)， 亦可於其內部具有儲藏供給至前述各氣體靜壓軸承（56)之 加壓氣體之氣體儲藏空間（70)。此時，由於能於支撐構件 內部之氣體儲藏空間內透過1個或少數之氣體供給管供給 8 本纸張尺度適j t國國家標準（CNS)A4規格（210 X 297公爱) ' (請先閱讀背面之注意事項再填寫本頁) 裝------ 訂---------線 經濟部智慧財產局MC工消費合作社印製 43 91 1 6 A7 _____B7 五、發明說明（^ ) 氣體，且能將暫時儲藏於該氣體儲藏空間I之加壓氣體供給 至各氣體靜壓軸承，因此能大致均一地將加壓氣體分配供 給至各氣體靜壓軸承。 本發明之平面馬達裝置，當使用氣體靜壓軸承作爲配 置於鄰接的驅動力產生構件之軸承時，前述各氣體靜壓軸 承（56)之軸承面，最好是具有剛性較高、衰減較大形狀之 溝。此時，由於作爲各氣體靜壓軸承係使用其軸承面具有 剛性較高、衰減較大形狀之溝者，因此設置複數個該氣體 靜壓軸承之可動構件之靜特性當然好之外，移動時之動特 性亦良好。特別是，由於衰減、亦即振動衰減特性會對可 動構件移動時之制動特性（定位特性)造成影響，因此對可 動構件之定位完成時間之縮短，是非常重要的。 經濟部智慧財產局員工消费合作社印製 <請先閱讀背面之注意事項再填寫本頁) 線 此時，前述軸承面最好是呈正方形，而前述溝形狀爲 包含沿前述軸承面4邊分別形成之第1溝(57a)及將此4個 第1溝互相連接之十字形之第2溝(57B)的形狀者較佳。此 係因氣體靜壓軸承之包含振動衰減特性的動特性，其性質 無法從理論上進行推測，因此除實際進行測定以求出外別 無他法，發明者針對溝形狀進行種種實驗後之結果，上述 溝形狀之氣體靜壓軸承之剛性最高且衰減較大之故。 本發明之平面馬達裝置，使用氣體靜壓軸承作爲前述 軸承時，亦可於前述各氣體靜壓軸承（56)上設置用以調整 前述加壓氣體之噴出流量的流量調整機構(5k、59)。此時 1即使在氣體靜壓軸承之製造、加工時產生特性之不均現 象’亦能藉使用流量調整機構進行各氣體靜壓軸承之加壓 9 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 五、發明說明（7 ) 氣體之噴出流量的調整，以使複數個氣體#壓軸承之特性 均一化。 本發明之平面馬達裝置中，前述複數個驅動力產生構 件可以是電樞線圈或電磁鐵，當前述複數個驅動力產生構 件係永久磁石(54)時，前述各氣體靜壓軸承(56)之軸承面’ 最好是較前述各永久磁石之磁極面更凸出於前述移動面 (21a)側。此時，能更容易的進行設置於可動構件之複數的 氣體靜壓軸承之軸承面之平坦度的管理。 本發明之平面馬達裝置，使用氣體靜壓軸承作爲前述 軸承時，將前述各氣體靜壓軸承(56)之軸承面硏磨爲同一 平面亦可。此時，由於複數個氣體靜壓軸承(56)之軸承面 ，係被硏磨爲同一平面，因此能確保以各軸承面所形成之 可動構件側導引面之均一的平坦度。 本發明之平面馬達裝置中，前述複數個驅動力產生構 件可以是電樞線圈或電磁鐵，但亦可以是永久磁石。此情 形中，於固定構件上設置電樞線圈。 本案之第2發明，係本發明平面馬達裝置之組裝方法 ，其特徵在於，包含：於保持平坦之基盤上、將構成前述 可動構件（51)之前述複數個軸承以既定之位置關係排列的 第1步驟，以及將以第1步驟排列於基盤上之前述複數個 軸承與前述複數個驅動力產生構件(54Μ〜54ηη)之相對位置 關係調整爲所期望之狀態、並固定此兩者之位置關係的第 2步驟。 根據上述方法，第1步驟中，於保持平坦之基盤上， 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝--------訂---------線 經濟部智慧財產局貝工消费合作社印製 A7 " 43 9116 ___B7__ 五、發明說明（？） 將構成可動構件之複數個軸承以既定之位會關係排列，於 第2步驟中，將排列於基盤上之複數個軸承與複數個驅動 力產生構件之相對位置關係調整爲所期望之狀態，並固定 此兩者之位置關係。亦即，根據本發明，於第2步驟中， 由於排列於基盤上軸承面爲同一面之複數個軸承與複數個 驅動力產生構件之相對位置關係調整爲所期望之狀態，並 固定此兩者，因此即使於各個軸承間產生製造或加工時之 不均現象，亦不致受此影響，而能確保由各軸承面所形成 之可動構件側導引面之均一的平坦度。此外，可提昇以此 方式組裝之平面馬達之可動構件的位置控制性。 此情形中，當更進一步包含於前述第2步驟之前，將 前述複數個驅動力產生構件安裝於支撐構件(52)之第3步 驟時，前述第2步驟可於排列在前述基盤上之前述複數個 軸承上透過密封構件(66)裝載前述支撐構件，將前述複數 個軸承與前述支撐構件之相對位置關係調整爲期望之狀態 ，且能固定前述複數個軸承與前述支撐構件。此時，第2 步驟中，由於在排列於基盤上之複數個軸承上透過密封構 件裝載預先安裝有複數個驅動力產生構件之支撐構件，將 前述複數個軸承與前述支撐構件之相對位置關係調整爲期 望之狀態以固定兩者，因此排列於基盤上之複數個軸承與 支撐構件之相對位置關係透過密封構件進行調整，其結果 即爲能一次的對複數個軸承與複數個驅動力產生構件之相 對位置關係進行調整。是以，即使各個軸承間在製造、力口 工時產生特性之不均現象’亦不致受此影響’而能確保以 本紙張尺度適用+國國家標準（CNS>A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝·---- -訂·!------線 經濟部智慧財產局員工消費合作社印製 A7 B7 43 9丨丨6 五、發明說明（q ) 各軸承面所形成之可動構件側導引面之均二的平坦度’旦 其組裝變的非常簡單。 此情形中，前述第2步驟之前述複數個軸承(56)與# 述支撐構件（52)之固定’在以黏著劑暫時固定後’藉連結 構件(57f、64)而牢固的進行固定亦可。此時，爲了不受各 個軸承間之製造、加工時產生特性之不均現象的影饗’前 述連結構件，最好是具有流量調整機能者。 本案之第3發明，係一平面馬達裝置之驅動方法’具 備形成有移動面(2la)之固定構件，以及具有與前述移動面 對向配置之複數個驅動力產生構件(54ιι〜54πη)、沿前述移 動面移動之坷動構件(5υ，其特徵在於：係藉由自前述複 數個驅動力產生構件中鄰接之前述驅動力產生構件間，且 爲前述複數個驅動力產生構件之位置關係所定之位置對前 述移動面噴出流體，以將前述可動構件與前述移動面間距 離維持於既定値。 根據上述方法，由於係藉自前述複數個驅動力產生構 件中鄰接之述驅動力產生構件間’且爲前述複數個驅動 力產生構件之位置關係所定之位置對前述移動面[]賁出流體 ，以將前述可動構件與前述移動面間距離維持於·既定値， 因此能實現相當於與複數個驅動力產生構件之 乎相同面積大小之小型、輕量的可動構件，進而能降低用 以驅動及使可動構件浮起之消耗電力’提昇可動構丨牛之^立 置控制性。 此情形中，亦可將前述複數個驅動力產生構件，以既 本紙張尺度適用中國困家標準（CNS)A4規格（210 X 297公釐） , I — — Jit---訂· —----11 I (請先閒讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消费合作社印製 經濟部智慧財產局員工消費合作杜印製 A7 ___B7_ 五、發明說明（/0 ) 定間隔於2維方向配置於前述可動構件之^述移動面之對 向側之面，自前述複數個驅動力產生構件中既定之鄰接的 前述驅動力產生構件間，向前述移動面噴出前述流體。 此情形中’當使用加壓氣體作爲前述流體時，採用氣 體靜壓軸承（56)將該加壓氣體噴向前述移動面亦可。此時 ，能藉由自該氣體靜壓軸承所噴出之加壓氣體的靜壓而使 可動構件浮起支撐於移動面上。 此情形中’前述可動構件，係具有前述複數個驅動力 產生構件爲配置在對向於前述移動面之面側的矩形支撐構 件(52)時，自配置於在位於該支撐構件之4角的前述鄰接 之驅動力產生構件間之前述氣體靜壓軸承向前述移動面噴 出前述加壓氣體。此時，可使對交差於對抗可動構件之加 速的移動面之方向的姿勢位置變化的剛性非常的高。 此情形中，自配置於在位於前述支撐構件之4角的鄰 接之驅動力產生構件間之複數個前述氣體靜壓軸承向前述 移動面噴出前述加壓氣體亦可。 此情形中，亦可對前述各氣體靜壓軸承之前述加壓氣 體的噴出流量進行個別的調整。此時，即使在氣體靜壓軸 承之製造、加工時產生特性之不均現象，亦能藉對各氣體 靜壓軸承之加壓氣體的噴出流量進行個別的調整，以使複 數個氣體靜壓軸承之特性均一化。 本發明之平面馬達裝置的驅動方法，在使用加壓氣體 作爲前述流體，使用氣體靜壓軸承將該氣體噴向移動面時 ，若前述驅動力產生構件爲永久磁石時，使前述永久磁石 13 本紙張尺度適用+國國家標準（CNS)A4規格（210 X 297公釐） 1 --------^:·--I----訂·------— · I (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 A7 ------Β7___ 五、發明說明（I丨） 所產生之前述可動構件與前述固定構件間|之磁性吸引力， 以及自前述氣體靜壓軸承所噴出之前述加壓氣體之前述可 動構件與前述移動面間之靜壓，成爲期望之關係狀態亦可 。此時，由於永久磁石所產生之可動構件與固定構件間之 磁性吸引力，以及自氣體靜壓軸承所噴出之加壓氣體之可 動構件與移動面間之靜壓，係設定爲期望之關係狀態，因 此’結果可使得可動構件與移動面間之距離(亦即，軸承間 隙)維持於既定値。 本發明之平面馬達裝置的驅動方法，當可動構件爲前 述複數個驅動力產生構件具有配置於與前述移動面對向之 側之面的矩形支撐構件時，於前述支撐構件內部之儲存空 間暫時儲存前述加壓氣體，自前述儲存空間將前述加壓氣 體供應至前述氣體靜壓軸承亦可。此時，由於不僅能透過 支撐構件內部之氣體儲存空間內一個或少量之氣體供給配 管以供給氣體，且能將暫時儲藏於該氣體儲藏空間之加壓 氣體供給至各氣體靜壓軸承，因此能大致均一地將加壓氣 體分配供給至各氣體靜壓軸承。 本案之第4發明，係一平台裝置，具備有本發明之平 面馬達裝置，與前述可動體一起移動之移動體，以及控制 前述可動構件之移動的控制裝置。 若使用此裝置，如前所述的，藉本發明之平面馬達裝 置，由於除了可降低用以驅動及浮起之消耗電力’亦可圖 謀提昇可動構件之位置控制性，因此藉使用控制裝置控制 可動構件之移動，能提昇移動體之位置控制性。 14 — —•I — t-— — — — - — — — ( — I— > I I I I I ---I (請先閱讀背面之注意ί項再填寫本頁) 本紙張尺度適用令困國家標準（CNS>A4規格<210 * 297公釐） A7 B7 五、發明說明（G) 本案之第5發明，係一平台裝置之驅方法，該平台 裝置具備有包含形成有移動面之固定構件、及沿前述移動 面移動之可動構件的平面馬達裝置，以及與前述可動構件 一體移動之移動体，其特徵在於：使前述移動體移動時， 係使用本發明之平面馬達裝置之驅動方法。 若使用此方式’如前所述的’藉本發明之平面馬達裝 置之驅動方法，由於除了可降低用以驅動及浮起之消耗電 力’亦可圖謀提昇可動構件之位置控制性，因此藉使用該 驅動方法使移動體移動，能提昇移動體之位置控制性。 本案之第6發明’係一曝光裝置，其特徵在於，具備 有：射出曝光用之照明光的照明系統（10)，及將配置於前 述照明光之路徑上之物體搭載於前述移動體的本發明之平 台裝置。 若使用此裝置，如前所述的，由於能藉本發明之平台 裝置提昇移動體之位置控制性，因此能提昇搭載於該移動 體上之物體的位置控制性。例如，爲靜止型曝光裝置時， 該物體例如係配置於照明光之路徑上的基板時，藉提昇該 基板之位置控制性，即能因該基板之定位精密度的提昇而 提昇曝光精密度（圖案形成精密度），及因定位恢復時間的 縮短而提昇生產率。又，例如，爲掃瞄型曝光裝置時，該 物體例如係配置於照明光之路徑上的光罩或基板中之一方 時，藉提昇該光罩或基板中一方之位置控制性，而能縮短 光罩及基板之同步恢復時間，進而提昇生產率進行高精密 度之曝光(重疊精密度）。 本紙張尺度適用中國國家標準（CNS>A4規格（210 X 297公釐） <请先閱讀背面之沒意事項再填寫本頁) 裝--------訂---------線 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（6) 本案之第7發明，係一種曝光方法，|其特徵在於，包 含有： 將曝光用之照明光照射於物體之步驟； 驅動搭載前述物體之移動體，使前述物體對前述照明 光之路徑相對移動之步驟； 驅動前述移動體時，係使用本發明之平台裝置的移動 方法。 若使用此裝置，如前所述的，由於能藉本發明之平台 裝置的驅動方法，提昇移動體之位置控制性，因此能提昇 搭載於該移動體上之物體的位置控制性。例如，進行靜止 曝光時，該物體例如係配置於照明光之路徑上的基板時， 藉提昇該基板之位置控制性，即能因該基板之定位精密度 的提昇而提昇曝光精密度（圖案形成精密度），及因定位時 間的縮短而提昇生產率。又，例如，爲掃瞄型曝光裝置時 ，該物體例如係配置於照明光之路徑上的光罩或基板中之 一方時’藉提昇該光罩或基板中一方之位置控制性，而能 縮短光罩及基板之同步恢復時間，進而提昇生產率進行高 精密度之曝光(重疊精密度）。 再者’於微影步驟中，藉使用本發明之曝光方法進行 曝光’不僅能以良好的重疊精密度於基板上形成複數層之 圖案’亦能提昇其生產率，進而提昇更高積體度之微元件 的生產性。同樣的，於微影步驟中，藉使用本發明之曝光 方法進行曝光，能以良好的重疊精密度於基板上形成複數 層之圖案，進而提昇其生產率。因此，本發明自另一觀點 16 本紙張尺度適用中®國家標準（CNS>A4規格<210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝------ 訂---------線 經濟部智慧財產局貝工消#合作社印製 439116 5-- 正 修 A7B7 五、發骑說胡() (請先閱讀背面之注意事項再填寫本頁) 觀之，係一使用本發明之曝光方法及本發明之曝光裝置的 元件製造方法，此外，亦可說是一藉該製造方法以良好之 生產性所製造之高積體度元件。 [圖式之簡單說明] 第1圖係顯示本發明之一實施形態之曝光裝置的槪略 構成。 第2圖係第1圖之平台裝置之俯視圖。 第3圖係第1圖之平台裝置基座部份的槪略剖斷前視 圖。 第4圖係擴大顯示第3圖之圓A內附近之圖。 第5圖係顯示第4圖中外殼36的立體圖。 第6圖係顯示第3圖中可動構件組裝中途之狀態的立 體圖。 第7圖係沿第6圖A-A線之可動構件之截面圖。 第8圖係擴大顯示第7圖之圓A內附近之圖。 第9A〜9D圖係顯示實驗對象之氣墊墊槽之圖。 第10圖係用以說明可動構件組裝方法之圖。 經濟部智慧財產局員工消费合作社印製 第11圖係顯示氣墊之安裝構造的另一實施例之圖。 第12圖係用以說明本發明之元件製造方法之實施形態 的流程圖。 第13圖係顯示第12圖之步驟102之處理的流程圖。 [實施例] 本紙張尺度適用中國國家標準（CNS)A4規格mo X 297公釐）1 ^ 1 ^ Intellectual Property Bureau of the Ministry of Economic Affairs, Industrial Cooperation, Du Du printed A7 _-___ B7 V. Description of invention (ί) [Technical Field] i The present invention relates to a planar motor device, an assembly method thereof, and a planar motor device. Driving method, platform device, and driving method of the 'exposure device and exposure method, and element and manufacturing method thereof, in detail, it is about a fixed member provided with a moving surface, and floating support is provided on the moving surface in a non-contact manner. Plane motor device of movable member moving on moving surface and assembly method thereof The driving method of the aforementioned planar motor device includes a platform device using the aforementioned planar motor device as a driving device of a moving body and a driving method thereof, and is used for constituting the aforementioned platform device A moving body is equipped with an exposure device that is one of a photomask and a substrate, and an exposure method using the aforementioned driving method of a platform device, and an element manufactured using the aforementioned exposure device and a method for manufacturing the same. [Known Technology] In the past, in the lithography process used to manufacture semiconductor elements, liquid crystal display elements, etc., a pattern formed on a photomask or a reticle (hereinafter referred to as "the reticle") was used to project through The optical system is an exposure device copied on a wafer coated with a photoresist or a substrate such as a glass plate. This exposure device requires a high-precision positioning of the wafer at the exposure position, so it uses a platform device that drives the wafer stage holding the wafer in a two-dimensional direction = this type of platform device has been used for XY Each axis is a combined system of two linear motors and four linear air guides, so the weight and volume are large. Recently, in order to perform high-precision positioning at a higher speed and without being affected by the accuracy of the mechanical guide surface, while avoiding mechanical friction, the paper size is extended to 4 national paper standards (CNS) A4 (210 X 297 mm);, f -------- Order --------- Line I (Please read the notes on the back before filling in this page) A7 _________ Β7 ___ V. Description of the invention (L ) Long wafer life. Developed a platform device that drives the wafer loading platform h in a non-contact way in two dimensions to position the wafer. As a driving source of such a non-contact driving platform device, a planar motor having a structure of combining a linear pulse motor of a variable magnetic damping driving method with a two-axis portion is known. However, when a flat motor using the variable magnetic damping driving method described above is used to form a precise positioning platform, although a bearing such as an air bearing for floating the platform is required, the flat motor using the variable magnetic damping driving method The magnetic attraction is used as its driving principle, so the interval between the movable member and the fixed member is set very small. The magnetic attraction between the two becomes the resistance of the force that causes the platform to float by air bearings, so it is used to make the platform float The amount of air supplied and the power consumption of the air pump supplying the air increase. In addition, a plane motor driven by a Lorentz electromagnetic force that expands a linear motor in a two-dimensional direction has also been developed (see, for example, United States Patent (USP) No. 5196745). This type of Lorentz electromagnetic force type planar motor is considered to be a very good platform drive source in the future due to its excellent controllability, thrust linearity and positioning. However, for this type of Lorentz electromagnet-driven planar motor, when it is used as the driving source of the platform, it is also necessary to develop new technologies to reduce the power consumption for floating the platform. In addition, with the increase in the size of wafers, the wafer tables used to maintain wafers have also become larger and heavier. Therefore, the planar motors that drive them are also required to have high thrust, which in turn results in larger motors and power consumption. Increased unfavorable conditions. In addition, the weight of the wafer stage including the motor will lead to the positioning of 5 paper sizes that apply the Chinese National Standard (CNS) A4 specification (210 > «297 mm) < Read the precautions on the back first (Fill in this page) j. Packing -------- Order --------- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed A7 B7 V. DESCRIPTION OF THE INVENTION (>) Deterioration of positional controllability such as deterioration, increase in time required for positioning, and the like. Furthermore, the size of the wafer table will limit the freedom of design. In view of the above circumstances, a first object of the present invention is to provide a planar motor device, a method of assembling the planar motor device, and a method of driving a planar motor device that can improve the position controllability of a movable member and reduce power consumption. Furthermore, a second object of the present invention is to provide a platform device capable of improving the position controllability of a moving body and a driving method thereof. In addition, a third object of the present invention is to provide an exposure apparatus and an exposure method which can maintain high productivity and perform high-precision exposure. A fourth object of the present invention is to provide a device with a high degree of integration and a method for manufacturing the same. [Disclosure of the invention] Generally, a Lorentz electromagnetic force-driven planar motor is arranged on a movable member of the movable member facing the moving surface and along the moving surface in a predetermined positional relationship within a predetermined area. There are a plurality of driving force generating members, that is, magnets or armature coils. In the mutual space of this driving force generating member, there is no other limitation except that the existence of magnetic body is not allowed. Therefore, if this space can be effectively used, the floating force generating member can be arranged in this space without moving. In the case of a large-sized component, the moving body is supported by floating with respect to the moving surface. The present invention has been made focusing on this point, and has the following constitution. That is, the first invention of this case is a flat motor device, which has the capacity to form 6 papers to apply the national standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling in this Page) Installation ------ Order-11 !!. Line 43 91 16 A7 B7 V. Description of the invention (4) Fixed member (60) of moving surface (21a), and movable member (51) moving along the aforementioned movement ), Characterized in that the movable member includes a plurality of driving force generating members (5411 to 54nn) arranged in such a manner as to satisfy a predetermined positional relationship with each other, and an adjacent driving force generating member arranged in the driving force generating device. A plurality of bearings (56) for ejecting fluid to the moving surface are arranged between the devices and in a positional relationship. According to this, the movable member is provided with a plurality of driving force generating members arranged so as to satisfy a predetermined positional relationship with each other, and an adjacent driving force generating device disposed in the driving force generating device, and in the positional relationship. The relationship configuration is that a plurality of bearings ejecting fluid on the moving surface, so that the movable member can be floated and supported on the moving surface by the static pressure of the fluid ejected from the plurality of bearings on the moving surface. The arrangement area of the plurality of driving force generating members is a small, lightweight movable member having a substantially equal size and area, thereby reducing the power consumption for driving and floating the movable member, and improving the position controllability of the movable member. In this case, the plurality of driving force generating members may be arranged on a surface opposite to the moving surface of the movable member at a predetermined interval in a two-dimensional direction, and the plurality of bearings may be arranged in the plurality. Among the driving force generating members, the driving force generating members are adjacent to each other. In this case, the bearing may be a gas static pressure bearing that ejects a pressurized gas to the moving surface. At this time, the movable member can be floated and supported on the moving surface by the static pressure of the pressurized gas ejected from the gas static pressure bearing. This paper size is applicable to the Chinese National Standard (CNS) A4 sight (210x 297 mm) (Please read the precautions on the back before filling out this page) Packing ---- Ordering --------- Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7____ V. Description of the invention ( $) In this case, the aforementioned movable member (51), the rig__ the plurality of driving force generating members (54u ~ 54mi) are rectangular supporting members (52) arranged on the side opposite to the aforementioned moving surface (21a) In this case, it is preferable that the aerostatic bearing be disposed between the adjacent driving force generating members located at the four corners of the supporting member. This is because in the planar motor device, when the movable member is floated and supported on the moving surface by the static pressure of the pressurized gas as described above, the movable member, correctly speaking, between the bearing surface and the moving surface of the aerostatic bearing The size of the gap (so-called bearing gap) should not be unexpectedly changed during the movement of the movable member along the moving surface, that is, the rigidity of the change in attitude and position that intersects the direction of the moving surface that opposes the acceleration of the movable member is required. It is high, but when a plurality of driving force generating members are arranged at predetermined intervals in a two-dimensional direction on a rectangular supporting member, that is, in a matrix form, when aerostatic bearings are arranged between adjacent driving force generating members located at the four corners thereof In this case, the aforesaid rigidity can be made very high. In this case, the aerostatic bearing can be arranged one by one between the adjacent driving force generating members located at the four corners of the support member, or it can be located at the support member (52). A plurality of the aforementioned aerostatic bearings are respectively arranged between adjacent driving force generating members of the four corner portions. The planar motor device of the present invention can directly and individually supply pressurized gas from an external gas supply source when a gas hydrostatic bearing is used as a bearing arranged on an adjacent driving force generating member, but the aforementioned support member (52), A gas storage space (70) for storing pressurized gas supplied to each of the aforementioned aerostatic bearings (56) may also be provided in the inside. At this time, because the gas storage space inside the support member can supply 8 papers through one or a few gas supply pipes, the paper size is in line with the national standard (CNS) A4 specification (210 X 297 public love) of jt '(please first Read the notes on the back and fill in this page) Packing ------ Ordering --------- Printed by the MC Industrial Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 43 91 1 6 A7 _____B7 V. Description of the invention ( ^), And the pressurized gas temporarily stored in the gas storage space I can be supplied to each aerostatic bearing, so the pressurized gas can be distributed and supplied to each aerostatic bearing approximately uniformly. In the planar motor device of the present invention, when a hydrostatic bearing is used as a bearing arranged on an adjacent driving force generating member, the bearing surface of each of the aforementioned hydrostatic bearings (56) preferably has high rigidity and large attenuation. Shape groove. At this time, since each of the aerostatic bearings uses a groove having a high rigidity and a large attenuation on the bearing surface, the static characteristics of a plurality of movable members of the aerostatic bearing are naturally good. When moving, The dynamic characteristics are also good. In particular, since damping, that is, vibration damping characteristics, affects braking characteristics (positioning characteristics) when the movable member moves, it is very important to shorten the positioning completion time of the movable member. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs < Please read the notes on the back before filling this page). At this time, the bearing surface is preferably square, and the groove shape includes four sides along the bearing surface. The shape of the first groove (57a) formed and the cross-shaped second groove (57B) connecting the four first grooves to each other are preferred. This is because the dynamic characteristics of the hydrostatic bearing include vibration attenuation characteristics, and its properties cannot be speculated theoretically. Therefore, there is no other way than to actually measure to find out. The inventor has performed various experiments on the shape of the groove. The reason why the groove-shaped gas static pressure bearing has the highest rigidity and large attenuation. In the planar motor device of the present invention, when a hydrostatic bearing is used as the aforementioned bearing, a flow adjustment mechanism (5k, 59) for adjusting the ejection flow of the pressurized gas may be provided on each of the aforementioned hydrostatic bearings (56). . At this time 1 Even if the unevenness of characteristics occurs during the manufacture and processing of the aerostatic bearing, the pressure of each aerostatic bearing can be pressurized by using a flow adjustment mechanism. 9 This paper size applies to the Chinese National Standard (CNS) A4 specification. (210 X 297 mm) A7 B7 V. Description of the invention (7) The gas flow rate is adjusted to make the characteristics of the multiple gas #pressure bearings uniform. In the planar motor device of the present invention, the plurality of driving force generating members may be armature coils or electromagnets. When the plurality of driving force generating members are permanent magnets (54), It is preferable that the bearing surface is more protruded from the moving surface (21a) side than the magnetic pole surface of each permanent magnet. In this case, it is easier to manage the flatness of the bearing surfaces of a plurality of aerostatic bearings provided on the movable member. In the planar motor device of the present invention, when a hydrostatic bearing is used as the aforementioned bearing, the bearing surfaces of each of the aforementioned hydrostatic bearings (56) may be honed to the same plane. At this time, since the bearing surfaces of the plurality of aerostatic bearings (56) are honed to the same plane, it is possible to ensure uniform flatness of the movable member-side guide surface formed by each bearing surface. In the planar motor device of the present invention, the aforementioned plurality of driving force generating members may be armature coils or electromagnets, but may also be permanent magnets. In this case, an armature coil is provided on the fixed member. The second invention of the present case is a method for assembling a planar motor device according to the present invention, and comprises a first base plate on which a plurality of bearings constituting the movable member (51) are arranged in a predetermined positional relationship on a flat base plate. 1 step, and adjusting the relative positional relationship between the plurality of bearings and the plurality of driving force generating members (54M ~ 54ηη) arranged on the base plate in the first step to a desired state, and fixing the positional relationship between the two Step 2. According to the above method, in the first step, the paper size applies the Chinese National Standard (CNS) A4 (210 x 297 mm) on a flat substrate (please read the precautions on the back before filling this page). ------- Order --------- Printed by A7 " 43 9116 _B7__ of the Intellectual Property Bureau of the Ministry of Economic Affairs Bureau of the Ministry of Economic Affairs V. Description of the invention (?) Will form a plurality of bearings of the movable member According to the predetermined positional relationship, in the second step, the relative positional relationship between the plurality of bearings and the plurality of driving force generating members arranged on the base plate is adjusted to a desired state, and the positional relationship between the two is fixed. That is, according to the present invention, in the second step, the relative positional relationship between the plurality of bearings and the plurality of driving force generating members arranged on the same bearing surface on the base plate is adjusted to a desired state, and the two are fixed. Therefore, even if unevenness in manufacturing or processing occurs between each bearing, it will not be affected by this, and uniform flatness of the movable member-side guide surface formed by each bearing surface can be ensured. In addition, the position controllability of the movable member of the planar motor assembled in this manner can be improved. In this case, when it is further included in the third step of mounting the plurality of driving force generating members on the supporting member (52) before the second step, the second step may be performed on the plurality of the substrates arranged on the base plate. The bearings are loaded on the bearings through the sealing member (66), the relative positional relationship between the plurality of bearings and the support members is adjusted to a desired state, and the plurality of bearings and the support members can be fixed. At this time, in the second step, since a plurality of bearings arranged on the base plate are loaded with a support member in which a plurality of driving force generating members are mounted in advance through a sealing member, the relative positional relationship between the plurality of bearings and the support member is adjusted. The two are fixed in a desired state, so the relative positional relationship between the plurality of bearings and the support member arranged on the base plate is adjusted through the sealing member, and the result is that the plurality of bearings and the plurality of driving force generating members can be adjusted at one time. Adjust the relative position relationship. Therefore, even if the characteristics of the bearings are not uniform during the manufacturing process, they will not be affected by this. This ensures that the paper size + the national standard (CNS > A4 specification (210 X 297 mm) ) (Please read the precautions on the back before filling out this page) Installation · ---- -Order ·! ------ Printed by A7 B7 43 9 丨 丨 6 DESCRIPTION OF THE INVENTION (q) The flatness of the movable member-side guide surface formed by each bearing surface is even, and its assembly becomes very simple. In this case, the aforementioned plurality of bearings (56) and # in the second step are described above. The fixing of the supporting member (52) may be fixed firmly by the connecting members (57f, 64) after being temporarily fixed with an adhesive. At this time, in order not to be affected by the characteristics produced during the manufacturing and processing between the bearings The effect of unevenness is that the aforementioned connection member is preferably a person having a flow rate adjustment function. The third invention of the present case is a method for driving a planar motor device, which includes a fixed member formed with a moving surface (2la), and A plurality of drives of the aforementioned moving face configuration The power generating member (54ι ~ 54πη) and the moving member (5υ) moving along the moving surface are characterized in that the driving force generating member is adjacent to the driving force generating member from among the plurality of driving force generating members, and is the aforementioned plurality. The position determined by the positional relationship of the driving force generating members ejects fluid to the moving surface to maintain the distance between the movable member and the moving surface at a predetermined level. According to the above method, since the driving force generating members are borrowed from the plurality of driving force generating members, The adjacent driving force generating members are positioned at positions determined by the positional relationship of the plurality of driving force generating members, and the fluid is flowed to the moving surface [] to maintain the distance between the movable member and the moving surface at a predetermined value. Therefore, it is possible to realize a small and lightweight movable member equivalent to the same area as the plurality of driving force generating members, thereby reducing the power consumption to drive and float the movable member, and to improve the movable structure. Standing control. In this case, the aforementioned plurality of driving force generating members can also be adapted to the current paper size. China Standards for Households (CNS) A4 (210 X 297 mm), I — — Jit — — Ordered — — 11 I (Please read the precautions on the back before filling this page) Wisdom of the Ministry of Economic Affairs Printed by the Consumer Cooperative of the Property Bureau Employee Cooperative of the Ministry of Economic Affairs and printed by the Intellectual Property Bureau of the Ministry of Economy Du Printed A7 ___B7_ V. Description of the Invention (/ 0) It is arranged at two intervals in the direction of the opposite side of the moving surface of the movable member The fluid is sprayed toward the moving surface from the predetermined adjacent driving force generating members among the plurality of driving force generating members. In this case, when a pressurized gas is used as the fluid, a gas hydrostatic bearing (56 ) The pressurized gas may be sprayed onto the moving surface. At this time, the movable member can be floated and supported on the moving surface by the static pressure of the pressurized gas ejected from the gas static pressure bearing. In this case, the 'movable member' mentioned above has a plurality of driving force generating members which are rectangular supporting members (52) disposed on the side facing the moving surface, and are self-arranged at the four corners of the supporting member. The aerostatic bearing between the adjacent driving force generating members ejects the pressurized gas toward the moving surface. In this case, the rigidity can be made very high for the change of the posture position in the direction of the moving surface which intersects with the acceleration of the movable member. In this case, the pressurized gas may be ejected toward the moving surface from a plurality of the aerostatic bearings arranged between the driving force generating members adjacent to the four corners of the support member. In this case, it is also possible to individually adjust the discharge flow rate of the aforementioned pressurized gas of each of the aforementioned aerostatic bearings. At this time, even if the characteristic unevenness occurs during the manufacturing and processing of the aerostatic bearing, the ejection flow rate of the pressurized gas of each aerostatic bearing can be individually adjusted to make a plurality of aerostatic bearings. Uniform characteristics. According to the driving method of the planar motor device of the present invention, when a pressurized gas is used as the fluid and a gas static pressure bearing is used to spray the gas toward a moving surface, if the driving force generating member is a permanent magnet, the permanent magnet is made of 13 pieces. Paper size applies + National Standard (CNS) A4 specification (210 X 297 mm) 1 -------- ^: · --I ---- Order · ------- · I ( Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ------ B7___ V. Description of the Invention (I 丨) Between the aforementioned movable member and the aforementioned fixed member | The magnetic attraction force and the static pressure between the movable member and the moving surface of the pressurized gas ejected from the gas static pressure bearing may be in a desired relationship. At this time, the magnetic attraction between the movable member and the fixed member generated by the permanent magnet, and the static pressure between the movable member and the moving surface of the pressurized gas ejected from the gas static pressure bearing are set to the desired relationship state. Therefore, 'as a result, the distance between the movable member and the moving surface (that is, the bearing clearance) can be maintained at a predetermined value. In the driving method of the planar motor device of the present invention, when the movable member is the plurality of driving force generating members and has a rectangular supporting member disposed on a side facing the moving face, the storage space inside the supporting member is temporarily stored. The pressurized gas may be supplied from the storage space to the gas static pressure bearing. At this time, not only can one or a small amount of gas supply piping in the gas storage space inside the support member be supplied to supply gas, but also pressurized gas temporarily stored in the gas storage space can be supplied to each of the gas static pressure bearings, so that The pressurized gas is distributed and supplied to each of the aerostatic bearings approximately uniformly. The fourth invention of the present case is a platform device including the planar motor device of the present invention, a moving body that moves with the movable body, and a control device that controls the movement of the movable member. If this device is used, as described above, the planar motor device of the present invention can reduce the power consumption for driving and floating. It can also attempt to improve the position controllability of the movable member, so it is controlled by using the control device. The movement of the movable member can improve the position controllability of the moving body. 14 — — • I — t-— — — — — — — — (— I— > IIIII --- I (please read the note on the back before filling this page) This paper applies the national standard for trapping ( CNS > A4 specifications < 210 * 297 mm) A7 B7 V. Description of the invention (G) The fifth invention of the present case is a driving method for a platform device provided with a fixed member including a moving surface, and The planar motor device of the movable member that moves along the aforementioned moving surface, and the movable body that moves integrally with the aforementioned movable member are characterized in that when the aforementioned movable body is moved, the driving method of the planar motor device of the present invention is used. Method "As described above," by using the driving method of the planar motor device of the present invention, in addition to reducing the power consumption for driving and floating ", it is also possible to improve the position controllability of the movable member. Therefore, this driving method is used. Moving the moving body can improve the position controllability of the moving body. The sixth invention of the present invention is an exposure device, which is characterized in that it includes illumination for emitting illumination light for exposure. System (10), and the platform device of the present invention that mounts objects arranged on the path of the aforementioned illumination light to the aforementioned moving body. If this device is used, as mentioned above, since the platform device of the present invention can be used to enhance movement The positional controllability of the body can improve the positional controllability of the object mounted on the moving body. For example, in the case of a stationary exposure device, the object is, for example, a substrate disposed on the path of the illumination light, by lifting the substrate. The position controllability can improve the exposure precision (pattern formation precision) due to the improvement of the positioning precision of the substrate, and improve the productivity due to the shortened positioning recovery time. For example, when it is a scanning exposure device When the object is, for example, one of the mask or the substrate arranged on the path of the illumination light, by improving the position controllability of one of the mask or the substrate, the synchronous recovery time of the mask and the substrate can be shortened, thereby improving High-precision exposure (overlapping precision) for productivity. This paper size applies Chinese National Standards (CNS > A4 (210 X 297 mm)) < Please Read the unintentional matter on the back and fill in this page) -------- Order --------- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (6) The seventh invention of the present case is an exposure method, characterized in that it includes: a step of irradiating an illumination light for exposure to an object; and driving a moving body carrying the object to relatively move the object to a path of the illumination light Steps: When the aforementioned moving body is driven, the moving method of the platform device of the present invention is used. If this device is used, as described above, since the driving method of the platform device of the present invention can be used to improve the position controllability of the moving body Therefore, the position controllability of an object mounted on the moving body can be improved. For example, when performing static exposure, for example, when the object is a substrate arranged on the path of the illumination light, by improving the position controllability of the substrate, the exposure precision (pattern formation) can be improved due to the improvement of the positioning precision of the substrate. Precision), and increased productivity due to shorter positioning times. For example, in the case of a scanning exposure device, when the object is one of a mask or a substrate arranged on the path of the illumination light, it can be shortened by improving the position controllability of one of the mask or the substrate. The synchronous recovery time of the photomask and the substrate improves the productivity for high-precision exposure (overlapping precision). Furthermore, 'in the lithography step, exposure using the exposure method of the present invention' can not only form a pattern of multiple layers on a substrate with good overlap precision, 'but also increase its productivity, and then increase the higher integration. Productivity of micro-components. Similarly, in the lithography step, by using the exposure method of the present invention for exposure, a pattern of a plurality of layers can be formed on the substrate with good overlap precision, thereby improving its productivity. Therefore, the present invention is from another point of view. 16 This paper size is applicable ® National Standard (CNS > A4 size < 210 X 297 mm) (Please read the precautions on the back before filling this page) Order --------- Bei Gong Xiao, Bureau of Intellectual Property of the Ministry of Economic Affairs # Cooperative Society Printing 439116 5-- Zheng Xiu A7B7 V. Talking Nonsense () (Please read the notes on the back before filling this page) In view of this, it is a device manufacturing method using the exposure method of the present invention and the exposure device of the present invention. In addition, it can also be said to be a high-integrity component manufactured by the manufacturing method with good productivity. [Brief description of the drawings] Fig. 1 shows a schematic configuration of an exposure apparatus according to an embodiment of the present invention. Figure 2 is a top view of the platform device of Figure 1. FIG. 3 is a front view of the base unit of the platform device in FIG. FIG. 4 is an enlarged view of the vicinity of the circle A in FIG. 3. FIG. 5 is a perspective view showing the casing 36 in FIG. 4. Fig. 6 is a perspective view showing a state in which the movable member is assembled in Fig. 3; Fig. 7 is a cross-sectional view of the movable member along line A-A in Fig. 6. FIG. 8 is an enlarged view of the vicinity of the circle A in FIG. 7. Figures 9A to 9D are diagrams showing the air cushion cushion of the test subject. Fig. 10 is a diagram for explaining a method of assembling a movable member. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Figure 11 is a diagram showing another embodiment of the installation structure of the air cushion. Fig. 12 is a flowchart for explaining an embodiment of a method for manufacturing a device according to the present invention. Fig. 13 is a flowchart showing the processing of step 102 of Fig. 12. [Example] This paper size applies Chinese National Standard (CNS) A4 specification mo X 297 mm)
43 9MS 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（) 以下，依據第1圖〜第10圖說明本發"明之一實施形態 。第1圖中，槪略的顯示此實施形態之曝光裝置100的全 體構成。此曝光裝置1〇〇，係所謂步進掃瞄(Step & Scan)曝 光方式之曝光裝置。 此曝光裝置1〇〇，具備有：照明系統10，用以保持作 爲光罩之標線板R的標線板平台RST，投影光學系統PL， 用以將作爲基板之晶圓W於XY平面內驅動於XY2維方 向之平台裝置，以及該等之控制系統。 前述照明系統10，係例如日本專利特開平9-320956 號公報、特開平4-196513號公報以及與此對應之美國專利 第5473410好中所揭示般，由光源單元、快門、2次光源 形成光學系統、分束器、集光透鏡系統、標線板遮光板、 以及成像透鏡系統等(皆未圖示)所構成，向第1圖之鏡子 Μ射出照度分佈大致均等之曝光用照明光。然後，此照明 光藉鏡子Μ使其光路向鉛直下方彎曲，以均等之照度照明 標線板R上之矩形(或圓弧狀）之照明區域IAR。 此處，作爲照明光，係使用發自超高壓水銀燈之紫外 線帶的明線(g線、i線)或KrF準分子雷射光等之遠紫外 (DUV)光。 此外，在本案所指定之指定國或所選擇之選擇國之國 內法令許可下，援用前述公報之揭示作爲本說明書記載之 一部份。 前述標線板平台RST上，以例如真空吸附等方式，固 定有標線板R。又，此標線板平台RST，係在未圖示之標 18 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公 -----------^---- (請先閱讀背面之;i意事項再填寫本頁) 訂---------線 A7 B7 五、發明說明（4) 線板基座上，藉由以線性馬達等所構想之^線板驅動部（圖 示省略），而能以指定之掃瞄速度移動於既定之掃瞄方向( 此處爲Y軸方向）。 標線板平台RST上，固定有用以反射來自位置檢測裝 置之標線板雷射干擾儀(以下，稱「標線板干擾儀」）16之 雷射光束的移動鏡15，而標線板平台RST之平台移動面內 的位置，即藉標線板干擾儀16，以例如0.5〜lnm左右的 分解能隨時進行檢測。 發自標線板干擾儀16之標線板平台RST之位置資訊 ，被送至平台控制系統19、及透過此平台控制系統19送 至主控制裝置20，平台控制系統19即因應發自主控制裝 置20之指示，依據標線板平台RST之位置資訊、透過標 線板驅動部（未圖示），控制標線板平台RST。 前述投影光學系統PL，配置於標線板平台RST之第1 圖中的下方，以其光軸AX(與照明系統10之光軸一致)之 方向爲Z軸方向’使用此處爲兩側速心之縮小系統’沿光 軸AX方向以既定間隔配置之複數片透鏡要件所構成之折 射光學系統。此投影光學系統PL之投影倍率，例如爲1/5( 或1/4)。因此，當以發自照明系統1〇之照明光照明標線板 R上之照明區域丨AR時’藉通過此標線板R之照明光’透 過投影光學系統PL，於表面塗佈有光阻劑之晶圓W上的 曝光區域IA ’形成標線板R之照明區域1AR內之電路圖 案的縮小像(部份倒立像）° 前述平台裝置30 ’具備有：基座21 ’藉後述複數個 19 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） (請先閱讀背面之ii意事項再填寫本頁) 裝----I ---訂· ---I 1 I 線 經濟部智慧財產局員工消费合作社印製 經濟部智慧財產局員工消費合作社印製 A7 ____B7_____ 五、發明說明（) 氣墊56(參照第3圖）、相隔幾/zm左右时空隙浮起支撐於 此基座21上面上方之基板台18，以及將此基板台18於 XY平面內驅動於2維方向之驅動裝置50。作爲驅動裝置 50，此處係使用由設於基座21上部(埋設）之固定構件60， 以及固定於基板台18底部（基座對向面側）之可動構件51 所構成的平面馬達裝置。以下之說明中，爲方便起見，將 此驅動裝置50稱爲平面馬達裝置50。 於前述基板台18上，以例如真空吸附方式固定有晶圓 W。此外，於此基板台18上，固定有用以反射來自位置檢 測裝置之晶圓雷射干擾儀(以下，稱「晶圓干擾儀」）31之 雷射光束的移動鏡27，藉由外部配置之前述晶圓干擾儀31 ，基板台18之XY面內的位置，即以例如0.5〜lnm左右 的分解能隨時進行檢測。此處，實際上，如第2圖所示， 於基板台18上，設置有具備與掃瞄方向之X軸方向直交 之反射面的移動鏡27Y、以及具備與非掃瞄方向之Y軸方 向直交之反射面的移動鏡27Χ，晶圓干擾儀31雖於掃瞄方 向設有一軸，於非掃暗方向設有二軸，第1圖中該等係代 表性的以移動鏡2 7、晶圓干擾儀3 1加以顯示。基板台18 之位置資訊(及速度資訊），係被送至平台控制系統19，以 及透過此平台控制系統19送至主控制裝置20，平台控制 系統19即因應發自主控制裝置20之指示，依據前述位置 資訊(及速度資訊）、透過平面馬達裝置5〇，控制基板台18 之ΧΥ面內的移動。 接著，以前述平面馬達裝置50及其附近之構成部份爲 20 本紙張尺度適用+國Η家標準（CNS)A4規格（210 X 297公爱） -I J· I I I. I ----- I - I-- (請先閱讀背面之注意事項再填寫本頁) tr---------線: A7 _B7_ 五、發明說明（fi) 中心，針對平台裝置30之各部構成，依據2〜第9圖進 一步詳細說明。第2圖係顯示此平台裝置之俯視圖，第3 圖係顯示剖視基座部份之第2圖的槪略前視圖。 綜合前述第2、第3圖即可知，基座21，具備有：俯 視呈正方形上面開口、厚度較薄之中空箱型容器35，以及 埋設於此容器35內之內部空間之固定構件60。此基座21 的上面（可動構件51對向側之面），形成有可動構件5〖之 導引面，亦即移動面2U。此移動面2U，於本實施形態中 ，如第2圖所示的，係由在容器35內之內部空間，以矩陣 狀，此處爲8行8列緊密配置、俯視呈具有正方形狀之8χ 8=64個低熱膨脹之陶瓷製之外殼36的上面所構成。 各外殼36係底面開口之中空箱型，其內部收納有既定 厚度之電樞線圏38。作爲此電樞線圈38，如第2圖所示的 ，係使用與各外殼36之內面幾乎接觸之中空正方形線圏。 又，第2圖中，雖只圖示一個電樞線圈38，實際上於各外 殼36內皆收納有一個(參照第3圖）。 容器35底面，如第3圖所示，於其中央部連接有一個 (或複數個)冷媒排出用接頭39 ’且對應各電樞線圈38分別 連接有一個冷媒注入用接頭40 °冷媒排出用接頭39 ’透過 冷媒排出管93連接於設置在第1圖之冷卻裝置79內部之 冷凍機，而冷媒注入用接頭40 ’透過冷媒供給管92連接 於設置在冷卻裝置79內部之冷媒供給機。亦即’本實施形 態中，自冷卻裝置79透過冷媒注入用接頭4〇供給至基座 21內之冷媒在冷卻基座21內部後’透過冷媒排出用接頭 本紙張尺度適用中國國家標準（CNS)A4規格（21〇x 297公釐） <請先M讀背面之注意事項再填寫本頁) ^-------"訂---------線 ！ 經濟部智慧財產局員工消费合作社印製 經濟部智慧財產局員工消费合作社印製 A7 B7 五、發明說明（j) 39回到冷卻裝置79，於該處冷卻後再度供'給至基座21內 ，以此方式循環使用冷媒。作爲冷媒，此處係使用氟羅麗 那(製造商：住友3M株式會社，氟系非活性液體）° 第4圖係擴大顯示第3圖之圓A內附近。如此圖所示 的，於基座21內部，配置有將其內部空間區劃爲上側之第 1室41及下側之第2室42的固定構件軛43 ’此固定構件 軛43係由板狀之磁性體所構成。此固定構件軛43 ’係自 上方裝載於容器35內壁所形成之梯部上，與容器35底面 相隔既定空隙、與該底面平行之方式配置。於此固定構件 範43上面，配置有於內部收納電樞線圈38之前述陶瓷製 外殼36。於各外殼36之內底面(第4圖之上壁內面），如第 5圖所示，一體的設置有自其側壁內面向外殼36之中心呈 放射狀延伸之16根L形構件所構成的整流鰭46。 固定構件軛43上’於對應各電樞線圏38之中央空間 部位置，分別形成有由圓孔所構成之冷媒的流入口 43a， 此冷媒流入口 43a之底面側形成有既定深度之鑽頭孔。 冷媒注入用接頭40，係在螺旋部4〇d螺合於容器35 底壁形成之螺合孔35a的狀態下，安裝於容器35。此安裝 狀態中，冷媒注入用接頭40之軸部前端係插入形成於固定 構件軛43之流入口 43a ’前述鑽頭孔內部則插入〇環47 。此0環47，係由形成於冷媒注入用接頭40軸部之梯部 所按壓。又，此第4圖之安裝狀態中，於固定構件軛a底 面(下面）’緊密的接合有由高熱傳導率材料所構成之2次 冷卻鰭48。此2次冷卻鰭48 ’係由冷媒注入用接頭4〇之 22 本紙張尺度適用中國國家標準（CNS〉A4規格（210 * 297公釐） _ , I ----I - -------- I 1 (請先閱讀背面之注意事項再填寫本頁) A7 A7 經濟部智慧財產局員工消費合作社印製 B7 五、發明說明（％ ) 另一梯部與固定構件軛43所包夾。 ’ 本實施形態中，由於基座21係以上述方式構成’因此 於各外殼36與固定構件軛43所形成之小室(外殼36內空 間）內，自第1圖之冷卻裝置79所供給之冷媒’透過形成 於冷媒注入用接頭4〇軸部之冷媒通路’自基座21之底面 側供給至各電樞線圏38中央之空間，此冷媒即透過此中央 空間通過電樞線圈38與外殼36間，沿電樞線圏38的上面 流向外周部。然後，此冷媒，透過流出口 43b流至固定構 件軛43與容器35間所形成之第2室42內，前述流出口 43b係形成於外殼36之4個角部份的外殼36內周面與電 樞線圈38外周間之空間部所對應之固定構件軛43部份。 此處，當外殼36內沒有整流鰭46時，冷媒係自電樞線圈 38中央通過最短距離流向各流出口 43b。但如此一來，電 樞線圏38上面有一部份無法冷卻。是以，爲了強制的製作 出放射狀的冷媒路徑，以極力均等的冷卻電樞線圈38的上 面，因此設置了前述16隻整流鰭46。 如上述般，由於本實施形態中，於分別收納電樞線圈 38之小室內’自電樞線圏38的下面側供給冷媒，該冷媒 自電樞線圈38中央之空間接觸電樞線圏38的上面進而流 向周圍’此時，藉一體設置於外殼36之整流鰭46，使冷 媒均等的流動於電樞線圈表面，因此能以良好的效率冷卻 電樞線圈38的上面及側面^此外，由於冷媒亦流入固定構 件軛43下方之第2處理室u內’且固定構件軛43下面設 置有由高熱傳導率材料所構成之2次冷卻鰭48，因此自電 本紙張尺度適用中國a冢標準（CNS)A4規格（210 χ 297公釐） I I> I ----------I -------—訂----In — 1^- , T ί諝先閱讀背面之注意事項再填寫本頁) A7 43 91 1 6 _ B7 ___ 五、發明說明（ >丨） 樞線圈38下面所放出之熱透過固定構件軛43傳至2次冷 卻鰭48，於此2次冷卻鰭48與冷媒間進行熱交換而除熱 。據此，自電樞線圏38全面所放出之熱藉能藉冷媒有效率 的加以去除。 前述基板平台18，如第2、圖3所示，係由設置於可 動子51上面(基座對向面及相反側之面)以包含音圈（Voice coil)馬達等之支撐機構32a、32b、32c於不同的3點進行 支撐，能相對XY面進行傾斜及Z軸方向之驅動。支撐機 構32a〜32c，雖省略於第1圖中之圖不，貫際上係透過未 圖示之驅動機構、藉由第i圖之平台控制系統19獨立的進 行驅動控制。構成前述平面馬達裝置50之可動構件51 ’ 如第3圖所示，具備有：由鐵等之磁性材料所構成之作爲 支撐構件的容器52，於此容器52底面以既定間隔沿XY2 維方向所配置之作爲驅動力產生構件之複數的永久磁石54 ，以及於容器52底面特定之鄰接的永久磁石54相互間所 配置之作爲複數個軸承(及氣體靜壓軸承）的氣墊（空氣軸承 )56。 進一步詳加說明的話，容器52，如第2圖所示，具有 俯視呈約略之正方形，其底面，如顯示可動構件51之仰視 圖的第6圖所示，以一定間隔於作爲驅動力產生構件之Z 軸方向、以XY2維方向之正方矩陣狀配置有ηχη個(第3 、6圖中η=8)磁化之永久磁石54η〜54ηη，並以黏著劑等 固定。此情形中’行方向、列方向相鄰之永久磁石54之磁 極面的極性，係交互爲相反極性。此處，永久磁石54Μ〜 24 — l·---- ----Int---- ---—訂-- - ------I {請先閱讀背面之沒意事項再填寫本頁) 經濟部智慧財產局員工消费合作社印製 本紙張尺度適用中國圉家標準（CNS)A4規格（210 X 297公爱） 43911 6 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（π) 54nl1之排列間隔，係滿足與前述電樞線圈之排列間隔的 既定關係。 位於前述容器52底面4角之特定的鄰接之永久磁石 54相互間之位置，具體來說，係沿容器52底面之對角線 方向鄰接之永久磁石54η與永久磁石5422間（亦即，永久 磁石5412與永久磁石5421間），永久磁石5413與永久磁石 5424間（亦即，永久磁石5414與永久磁石5423間），永久磁 石5422與永久磁石5433間（亦即，永久磁石5423與永久磁 石5432間），永久fe石5431與永久磁石5442間（亦即，永久 磁石5432與永久磁石5441間），以及永久磁石5433與永久 磁石5444間(亦即，永久磁石5434與永久磁石5443間）之5 個位置，及此5位置與對通過容器52底面之X軸、Y軸 成線對稱之各5個位置(共計10個位置），以及相對於容器 52底面之中心點成點對稱之5個位置，總計20個位置各 配置有一個氣墊56。 此處，氣墊56之如第6圖般之配置，係本發明人依據 實驗之結果，而採用於可動構件之Z方向、0x方向(繞X 軸之旋轉方向）及6>y方向（繞Y軸之旋轉方向）之3自由度 方向其剛性爲最高之配置。亦即，發明人在假設將氣墊配 置於各種位置之可動構件，進行模擬之結果，將氣墊配置 於可動構件之4個角部份時，較均等的將氣墊配置於可動 構件之面全體，發現於可動構件之移動中各氣墊之軸承間 隙尺寸之變化較少，亦即發現可動構件之Z方向、βχ方 向及方向之剛性較高。又，在針對僅於可動構件之4 25 本紙張尺度適用中囲a家標準（CNS)A4規格<210 X 297公釐） -11 ^ ----^·---------訂·-------1 t {請先閱讀背面之注意事項再填寫本I) 43 43 經濟部智慧財產局員工消费合作社印數 A7 B7 五、發明說明（z) 個角部份等間隔的配置氣墊之情形中，於各角只配置1個 氣墊，於各角配置4個氣墊，於各角配置5個氣墊，以及 於各角配置配9個氣墊之各種情形進行模擬之結果，與第 6圖相同的，以等間隔分別於4個角配置5個氣墊時，發 現可動構件之Z方向、θχ方向及方向之剛性最高。 第7圖中，係顯示省略部份且上下反轉之沿第6圖A-A線所視之可動構件5丨之截面圖。如此第7圖所示般，容 器52 ’具備有：上面開□、俯視呈正方形之由鐵等之磁性 体材料所構成之容器本體53，及構成該容器本體S3之蓋 的蓋構件55。容器本體53之上部開口端面上，於整個周 圍形成有既定深度之凹槽，該凹槽內裝有墊片58。 前述容器本體53之內底面，於第7圖之紙面深度方向 .以既定之間隔設有突起部53a，該等突起部53a上形成有 螺絲孔’藉螺合於此螺絲孔之螺栓將蓋構件55螺固於容器 本體53。 前述複數個氣墊56，如第7圖所示，係透過形成於容 器本體53底壁之前述第6圖中25處氣墊56安裝位置的圓 孔53b ’以螺固等方式固定於容器本體53底壁。第8圖， 係顯示擴大相當於第7圖中圓B內之部的截面圖。如此第 8圖所示般，氣墊56係由低熱膨漲之陶瓷等非慈性體材料 所構成’具有截面呈反T字形之軸承本體57，及安裝於此 軸承本體57之流量調整構件59。 更進-步詳言之，軸承本體57，具有既定厚度之正方 形板狀部之墊部5k，以及延伸設於此墊部57a上面側(與 26 衣紙張尺度適用中國國家標準（C㈣A4規格⑵Q x 297公爱） ------~ I ------^--------訂----------線 (請先閱讀背面之注意事項再填寫本頁)43 9MS Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention () The following describes one of the implementation forms of the present invention based on Figures 1 to 10. In Fig. 1, the overall configuration of the exposure apparatus 100 according to this embodiment is schematically shown. This exposure device 100 is an exposure device of the so-called Step & Scan exposure method. This exposure device 100 is provided with an illumination system 10 for holding a reticle platform RST as a reticle R as a photomask, and a projection optical system PL for placing a wafer W as a substrate in the XY plane. A platform device driven in the XY2-dimensional direction, and the control system of these. The aforementioned lighting system 10 is disclosed in, for example, Japanese Patent Laid-Open No. 9-320956, Japanese Patent Laid-Open No. 4-196513, and corresponding US Patent No. 5473410. The light source unit, shutter, and secondary light source form an optical system. It consists of a system, a beam splitter, a light collecting lens system, a reticle shading plate, and an imaging lens system (none of which are shown), and emits illumination light for exposure with a substantially uniform illuminance distribution to the mirror M in FIG. 1. Then, this illumination light bends its optical path vertically downward by the mirror M, and illuminates the rectangular (or arc-shaped) illumination area IAR on the reticle R with equal illuminance. Here, as the illumination light, far-ultraviolet (DUV) light such as bright lines (g-line, i-line) or KrF excimer laser light emitted from the ultra-high pressure mercury lamp ultraviolet band is used. In addition, as permitted by the domestic laws of the designated country or the selected selected country in this case, the disclosure of the aforementioned bulletin is used as part of the description in this specification. The reticle plate RST is fixed with a reticle R in a manner such as vacuum suction. In addition, the reticle platform RST is a standard (not shown). The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297) .----------- ^ ---- (Please read the back of the page; I will fill in this page before filling in this page) Order --------- Line A7 B7 V. Description of the invention (4) On the base of the line board, by using a linear motor, etc. ^ The line plate driving unit (not shown) can move in the predetermined scanning direction (here the Y-axis direction) at the specified scanning speed. The line plate platform RST is fixed to reflect from the position detection device. The moving plate 15 of the laser beam of the reticle laser jammer (hereinafter referred to as "the reticle jammer"), and the position in the moving surface of the reticle platform RST is the interference of the reticle. The instrument 16 can be detected at any time with a resolution of, for example, about 0.5 to 1 nm. The position information of the reticle platform RST from the reticle interference instrument 16 is sent to the platform control system 19, and sent to the platform control system 19 through this platform control system 19 The main control device 20 and the platform control system 19 respond to the instructions of the autonomous control device 20, and according to the position information of the reticle platform RST, Passing the marking plate driving unit (not shown), the marking plate platform RST is controlled. The aforementioned projection optical system PL is arranged below the first plate of the marking plate platform RST, and its optical axis AX (and the lighting system 10) The direction of the optical axis is the direction of the Z-axis. A refractive optical system composed of a plurality of lens elements arranged at predetermined intervals along the optical axis AX direction. The projection magnification is, for example, 1/5 (or 1/4). Therefore, when the illumination area AR on the graticule R is illuminated by the illumination light sent from the lighting system 10, the 'by passing through the graticule R The illumination light 'passes through the projection optical system PL, and forms a reduced image (partial inverted image) of the circuit pattern in the illumination region 1AR of the reticle R on the exposure area IA on the wafer W coated with a photoresist on the surface ° The above-mentioned platform device 30 'is provided with: a base 21' borrowed from a plurality of 19 mentioned later This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public love) (please read the intention on the back before filling this page) Equipment ---- I --- Order · --- I 1 Staff of Intellectual Property Bureau of the Ministry of Economics Cooperative printed by the cooperative, printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the consumer co-operative A7 ____B7_____ V. Description of the invention () Air cushion 56 (refer to Figure 3), the gap floats on the base 21 above and above the base 21 The stage 18, and a driving device 50 for driving the substrate table 18 in the two-dimensional direction in the XY plane. As the driving device 50, a fixing member 60 provided on the upper part (embedded) of the base 21 is used here, and is fixed to A planar motor device constituted by a movable member 51 at the bottom of the substrate table 18 (on the side facing the base). In the following description, this driving device 50 is referred to as a planar motor device 50 for convenience. A wafer W is fixed on the substrate stage 18 by, for example, a vacuum suction method. In addition, on this substrate table 18, a moving mirror 27 for reflecting a laser beam from a wafer laser jammer (hereinafter referred to as a "wafer jammer") 31 from a position detection device is fixed, and an externally arranged mirror 27 The position of the wafer interferometer 31 on the XY plane of the substrate table 18 can be detected at any time by a resolution of about 0.5 to 1 nm, for example. Here, actually, as shown in FIG. 2, on the substrate stage 18, a moving mirror 27Y having a reflecting surface orthogonal to the X-axis direction of the scanning direction, and a Y-axis direction having a non-scanning direction are provided. The moving mirror 27X of the orthogonal reflecting surface, although the wafer jammer 31 is provided with one axis in the scanning direction and two axes in the non-scanning direction, these are representatively shown in Figure 1. The circular interference meter 31 is displayed. The position information (and speed information) of the substrate table 18 is sent to the platform control system 19 and through this platform control system 19 to the main control device 20. The platform control system 19 responds to the instructions of the autonomous control device 20 according to The aforementioned position information (and speed information) controls the movement in the XY plane of the substrate table 18 through the planar motor device 50. Next, the above-mentioned plane motor device 50 and its nearby components are 20 paper standards applicable + National Standard (CNS) A4 specification (210 X 297 public love) -IJ · II I. I ----- I-I-- (Please read the precautions on the back before filling this page) tr --------- line: A7 _B7_ V. Description of Invention (fi) Center, for the components of the platform device 30, based on 2 to 9 are described in more detail. Fig. 2 is a plan view showing the platform device, and Fig. 3 is a schematic front view showing the second part of the base section. It can be seen from the above-mentioned second and third figures that the base 21 includes a hollow box-type container 35 which is open in a square shape when viewed from above, and has a thin thickness, and a fixing member 60 embedded in the inner space of the container 35. On the upper surface of the base 21 (the side facing the movable member 51), a guide surface of the movable member 5 is formed, that is, the moving surface 2U. This moving surface 2U, in this embodiment, as shown in FIG. 2, is composed of the internal space in the container 35 in a matrix shape, here 8 rows and 8 columns are closely arranged, and the square shape has a square shape of 8 × in plan view. 8 = 64 low-thermal-expansion ceramic casings 36 are formed on the upper surface. Each case 36 is a hollow box type with an open bottom surface, and an armature wire 38 having a predetermined thickness is housed inside. As this armature coil 38, as shown in FIG. 2, a hollow square wire coil is used, which is almost in contact with the inner surface of each case 36. In addition, although only one armature coil 38 is shown in Fig. 2, one is actually housed in each case 36 (see Fig. 3). As shown in FIG. 3, the bottom surface of the container 35 is connected to one (or a plurality of) refrigerant discharge joints 39 'at its central portion, and one refrigerant injection joint 40 ° refrigerant discharge joints are connected to each armature coil 38. 39 ′ is connected to the refrigerator provided inside the cooling device 79 in FIG. 1 through the refrigerant discharge pipe 93, and the refrigerant injection joint 40 ′ is connected to the refrigerant supply device provided inside the cooling device 79 through the refrigerant supply pipe 92. In other words, “in this embodiment, the refrigerant supplied from the cooling device 79 through the refrigerant injection connector 40 to the base 21 is inside the cooling base 21 and after passing through the refrigerant discharge connector, this paper size applies the Chinese National Standard (CNS) A4 specification (21〇x 297 mm) < Please read the notes on the back before filling in this page) ^ ------- " Order --------- line! Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by A7 B7 V. Invention Description (j) 39 Return to the cooling device 79, and then supply it to the base 21 after cooling down In this way, the refrigerant is recycled. As the refrigerant, Florin was used here (manufacturer: Sumitomo 3M Co., Ltd., fluorine-based inactive liquid). Figure 4 is an enlarged view of the vicinity of circle A in Figure 3. As shown in the figure, inside the base 21, a fixing member yoke 43 which partitions its internal space into the first chamber 41 on the upper side and the second chamber 42 on the lower side is arranged. Made of magnetic body. The fixing member yoke 43 'is mounted on a ladder portion formed on the inner wall of the container 35 from above, and is arranged so as to be spaced from the bottom surface of the container 35 and parallel to the bottom surface. On the fixing member 43, the aforementioned ceramic case 36 for accommodating the armature coil 38 is arranged. As shown in FIG. 5, the inner bottom surface of each casing 36 (the upper surface of the upper wall in FIG. 4) is integrally provided with 16 L-shaped members extending radially from the inner side of the side wall to the center of the casing 36. Rectifying fin 46. The fixing member yoke 43 is formed with a refrigerant inlet 43a formed of a circular hole at a position corresponding to a central space portion of each armature line 38. A drill hole of a predetermined depth is formed on the bottom side of the refrigerant inlet 43a. . The refrigerant injection joint 40 is attached to the container 35 in a state where the screw portion 40d is screwed to the screw hole 35a formed in the bottom wall of the container 35. In this mounting state, the front end of the shaft portion of the refrigerant injection joint 40 is inserted into the inflow port 43a formed in the fixing member yoke 43 ', and the ring 47 is inserted inside the drill hole. The 0 ring 47 is pressed by a step portion formed on the shaft portion of the refrigerant injection joint 40. Further, in the mounting state of this figure 4, a secondary cooling fin 48 made of a high thermal conductivity material is tightly bonded to the bottom surface (lower surface) 'of the fixing member yoke a. The secondary cooling fins 48 'are made by the refrigerant injection joint 40-22. The paper size is applicable to the Chinese national standard (CNS> A4 specification (210 * 297 mm) _, I ---- I------ --- I 1 (Please read the notes on the back before filling out this page) A7 A7 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs B7 V. Description of the invention (%) The other ladder and the fixed member yoke 43 are sandwiched ”In this embodiment, since the base 21 is configured in the manner described above, it is supplied from the cooling device 79 in FIG. 1 in a small chamber (the space inside the casing 36) formed by each of the casing 36 and the fixing member yoke 43. The refrigerant is supplied through the refrigerant passage formed in the shaft portion of the refrigerant injection connector 40 from the bottom surface side of the base 21 to the space in the center of each armature line 38, and this refrigerant passes through the central space through the armature coil 38 and the housing. Thirty-six rooms flow along the upper surface of the armature line 38. Then, the refrigerant flows through the outlet 43b into the second chamber 42 formed between the fixing member yoke 43 and the container 35. The outlet 43b is formed in The inner peripheral surface of the casing 36 at the four corners of the casing 36 and the armature coil 38 The yoke 43 portion of the fixed member corresponding to the space portion around the circumference. Here, when there is no rectifying fin 46 in the casing 36, the refrigerant flows from the center of the armature coil 38 to each of the outlets 43b through the shortest distance. But in this case, The upper part of the armature line 38 cannot be cooled. Therefore, in order to forcibly produce a radial refrigerant path, the upper surface of the armature coil 38 is evenly cooled as much as possible, so the aforementioned 16 rectifying fins 46 are provided. Generally, in the present embodiment, the refrigerant is supplied from the lower side of the armature coil 圏 38 in the small rooms respectively housing the armature coil 38, and the refrigerant contacts the upper surface of the armature coil 圏 38 from the space in the center of the armature coil 38 and further Flow around 'At this time, the rectifying fins 46 integrally provided in the housing 36 allow the refrigerant to flow uniformly on the surface of the armature coil, so the upper and side surfaces of the armature coil 38 can be cooled with good efficiency ^ In addition, the refrigerant also flows into Inside the second processing chamber u below the fixed member yoke 43 and the secondary cooling fin 48 made of a high thermal conductivity material is provided under the fixed member yoke 43, so the paper size is suitable for China a Standard (CNS) A4 specification (210 x 297 mm) I I > I ---------- I --------- Order ---- In — 1 ^-, T ί 谞(Please read the precautions on the back before filling this page) A7 43 91 1 6 _ B7 ___ 5. Description of the invention (> 丨) The heat released under the pivot coil 38 is transmitted to the secondary cooling fin 48 through the fixing member yoke 43. This secondary cooling fin 48 performs heat exchange with the refrigerant to remove heat. Accordingly, the heat released from the entire armature line 38 can be efficiently removed by the refrigerant. The substrate platform 18 is, as shown in FIGS. 2 and 3, a support mechanism 32 a, 32 b provided on the movable member 51 (the opposite surface of the base and the opposite surface of the base) to include a voice coil motor. , 32c supports at three different points, can be tilted relative to the XY plane and driven in the Z axis direction. Although the supporting mechanisms 32a to 32c are omitted in the first figure, they are driven and controlled independently by a drive mechanism (not shown) and the platform control system 19 in the i-th figure. As shown in FIG. 3, the movable member 51 'constituting the aforementioned planar motor device 50 is provided with a container 52 made of a magnetic material such as iron as a supporting member, and the bottom surface of the container 52 is arranged at a predetermined interval in the XY 2-dimensional direction. A plurality of permanent magnets 54 as driving force generating members are arranged, and an air cushion (air bearing) 56 as a plurality of bearings (and aerostatic bearings) is arranged between the adjacent permanent magnets 54 specified on the bottom surface of the container 52. To explain in more detail, as shown in FIG. 2, the container 52 has an approximately square shape in plan view, and the bottom surface thereof is, as shown in FIG. 6 showing a bottom view of the movable member 51, at a certain interval as a driving force generating member. In the Z-axis direction and in a square matrix of the XY2-dimensional direction, there are ηχη permanent magnets 54η to 54ηη (η = 8 in the third and sixth figures), which are fixed with an adhesive or the like. In this case, the polarities of the magnetic pole faces of the permanent magnets 54 adjacent in the row and column directions are opposite polarities. Here, the permanent magnet 54M ~ 24 — l · ---- ---- Int ---- ----- Order-------- I {Please read the unintentional matter on the back before filling (This page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives This paper is printed to the Chinese Family Standard (CNS) A4 (210 X 297 public love) 43911 6 A7 B7 Explanation The arrangement interval of (π) 54nl1 satisfies the predetermined relationship with the arrangement interval of the aforementioned armature coil. The positions of the specific adjacent permanent magnets 54 located at the four corners of the bottom surface of the foregoing container 52 are specifically between the permanent magnets 54η and the permanent magnet 5422 adjacent to each other along the diagonal direction of the bottom surface of the container 52 (that is, the permanent magnets). 5412 and permanent magnet 5421), permanent magnet 5413 and permanent magnet 5424 (that is, permanent magnet 5414 and permanent magnet 5423), permanent magnet 5422 and permanent magnet 5433 (that is, permanent magnet 5423 and permanent magnet 5432) ), 5 of permanent fe 5431 and permanent magnet 5442 (ie, permanent magnet 5432 and permanent magnet 5441), and 5 of permanent magnet 5433 and permanent magnet 5444 (ie, permanent magnet 5434 and permanent magnet 5443) Position, and these 5 positions are 5 positions (a total of 10 positions) that are line symmetrical with respect to the X and Y axes passing through the bottom surface of the container 52, and 5 positions that are point symmetrical with respect to the center point of the bottom surface of the container 52, Each of the 20 positions is provided with an air cushion 56. Here, the arrangement of the air cushion 56 as shown in FIG. 6 is based on the results of experiments by the inventors to adopt the Z direction of the movable member, the 0x direction (the rotation direction around the X axis), and the 6> y direction (around the Y The direction of rotation of the axis) is the highest rigidity in the 3 degrees of freedom. That is, the inventor assumed that the air cushion was arranged at various positions of the movable member, and performed simulation results. When the air cushion was disposed at the four corner portions of the movable member, the air cushion was more evenly disposed on the entire surface of the movable member, and found that During the movement of the movable member, there is less change in the bearing clearance size of each air cushion, that is to say, the rigidity of the Z direction, βχ direction and direction of the movable member is high. In addition, in the application of 4 25 paper sizes only for movable members, a standard (CNS) A4 specification < 210 X 297 mm) -11 ^ ---- ^ · -------- -Order · ------- 1 t {Please read the notes on the back before filling in this I) 43 43 Employee Cooperative Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs printed A7 B7 V. Description of invention (z) Corner section In the case of air cushions arranged at equal intervals, only 1 air cushion is arranged at each corner, 4 air cushions are arranged at each corner, 5 air cushions are arranged at each corner, and 9 air cushions are arranged at each corner. As shown in Fig. 6, when the five air cushions are arranged at four corners at equal intervals, it is found that the rigidity in the Z direction, θχ direction and direction of the movable member is the highest. FIG. 7 is a cross-sectional view of the movable member 5 丨 viewed along the line A-A in FIG. 6 with the part omitted and reversed up and down. As shown in Fig. 7, the container 52 'includes a container body 53 made of a magnetic material such as iron, which is opened on the top and square in plan view, and a cover member 55 which constitutes a lid of the container body S3. On the open end surface of the upper portion of the container body 53, a groove having a predetermined depth is formed around the entire circumference, and a gasket 58 is installed in the groove. The inner bottom surface of the aforementioned container body 53 is in the paper surface depth direction of FIG. 7. Protrusions 53 a are provided at predetermined intervals, and screw holes are formed in the protrusions 53 a to cover members by bolts screwed into the screw holes. 55 Bolt to the container body 53. As shown in FIG. 7, the plurality of air cushions 56 are fixed to the bottom of the container body 53 by means of screw holes or the like through the circular holes 53 b ′ at 25 installation positions of the air cushions 56 at the bottom of the sixth body in the sixth image. wall. FIG. 8 is a cross-sectional view showing an enlarged portion corresponding to a portion inside a circle B in FIG. 7. As shown in Fig. 8, the air cushion 56 is composed of a non-philite body material such as low-heat-expanding ceramics, and has a bearing body 57 having an inverse T-shaped cross section, and a flow adjustment member 59 mounted on the bearing body 57. Going one step further, in detail, the bearing body 57 has a pad portion 5k of a square plate-like portion with a predetermined thickness, and is extended on the upper side of this pad portion 57a (and the Chinese paper standard applies to the Chinese standard (C㈣A4 size⑵Q x 297 public love) ------ ~ I ------ ^ -------- Order ---------- line (Please read the notes on the back before filling in this page)
Η L Η L 經濟部智慧財產局員工消費合作社印製 Α7 Β7 五、發明說明（4) 移動面21a相反側之面)之軸部Wb的兩部份。於此軸承本 體57之軸部57b，如第8圖所示，沿上下方向形成有構成 加壓氣體(本實施形態中係加壓氣體)之通路的小孔57c°此 小孔57c的上端部，形成有母螺紋，又’小孔57c的 下端，係連通於形成在軸承本體57之墊部57a底面(軸承 面）的槽(墊槽)57e。 接著，說明墊部57a之墊槽形狀。此墊槽形狀’係依 據發明人實驗的結果，採用剛性最強 '減振效果良好的槽 形狀。亦即，本實施形態，係使用在軸承面（墊面）具有如 第9圖B所示形狀之墊槽57e的氣墊56。此墊槽57e ’包 含有沿正方形軸承面之4邊分別形成的4個第1槽57g及 將此等4個第I槽57g相互連接之十字形的第2槽57h。 第2槽57h之十字的中心，形成有較墊槽57e略深一點的 圓形凹部，而此圓形的中心，設有前述小孔57c之一開口 端的噴出口。 由於包含氣墊等氣體靜壓軸承之振動衰減特性的動特 性，並非理論上可推斷其性質之物，因此發明人試作出第 9圖A〜第9圖D所示之具備有包含墊槽形狀之正方形墊 部的氣墊，針對此等氣墊進行振動衰減特性之測定的結果 ，發現如第9圖B所示之本實施形態的氣墊56，考慮剛性 等之靜特性及振動衰減特性之動特性（包含傳達函數特性) 等之綜合特性最佳。又，第9圖A之氣墊，由於須設置4 個噴出口故較不理想外，採用第9圖C '第9圖D之氣墊 形狀亦可。 27 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）Η L Η L Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy Α7 Β7 V. Description of the invention (4) The two parts of the shaft portion Wb of the moving surface 21a). As shown in FIG. 8, the shaft portion 57 b of the bearing body 57 has a small hole 57 c forming a passage for pressurized gas (pressurized gas in this embodiment) in the up-down direction. The upper end of this small hole 57 c is formed. A female thread is formed, and the lower end of the small hole 57c is connected to a groove (pad groove) 57e formed on the bottom surface (bearing surface) of the pad portion 57a of the bearing body 57. Next, a pad groove shape of the pad portion 57a will be described. According to the results of the inventor's experiments, this pad groove shape is the groove shape having the strongest rigidity and excellent vibration damping effect. That is, in this embodiment, an air cushion 56 having a cushion groove 57e having a shape as shown in Fig. 9B on the bearing surface (pad surface) is used. The pad groove 57e 'includes four first grooves 57g formed along the four sides of the square bearing surface, and a cross-shaped second groove 57h connecting the four first grooves 57g to each other. The center of the cross of the second groove 57h is formed with a circular recess slightly deeper than the cushion groove 57e, and the center of the circle is provided with an ejection port of one of the openings of the small hole 57c. Since the dynamic characteristics of the vibration attenuation characteristics of a gas static pressure bearing including an air cushion are not theoretically inferable, the inventors tried to produce a structure including a cushion groove shape as shown in Figs. 9A to 9D. As a result of the measurement of the vibration damping characteristics of the air cushion of the square cushion portion, it is found that the air cushion 56 of this embodiment as shown in FIG. 9B considers the static characteristics such as rigidity and the dynamic characteristics of the vibration attenuation characteristics (including Transfer function characteristics) and other comprehensive characteristics. In addition, the air cushion in FIG. 9A is not ideal because it has to be provided with four ejection outlets. Alternatively, the shape of the air cushion in FIG. 9C ′ to FIG. 9D may be used. 27 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)
It---r-------t--------訂---------線 I (請先閱讀背面之注意事項再填寫本頁) 43 - a7 ____B7____ 五、發明說明（v〇 (請先閱讀背面之注意ί項再填寫本頁) 回到第8圖，於前述軸承本體57之鈾部57b上端部 外周，形成有公螺紋部57f。而軸部57b，自下方插入形成 於容器本體53底壁之圓孔53b的內部，藉將螺帽64螺合 於公螺紋部57f，將氣墊56螺固於容器本體53。又，容器 本體53底面，形成有環狀凹槽53d，此環狀凹槽53d與墊 部57a上面之間，安裝有作爲密封構件之〇環66。再者’ 本實施形態中，如第8圖所示，於容器本體53底壁之圓孔 53b附近形成有連通於該圓孔53b之注入口 53c，透過此注 入口 53c注入一種環氧樹脂之黏著劑。 前述流量調整構件59，具有下列二部份：其外周面形 成有螺合於前述母螺紋57d之公螺紋的圓板部59a，及延 伸設置於此圓板部59a下端面之針閥部59b。於圓板部59a ，形成有例如以約120°間隔的3個開口 59c。針閥部59b 與小孔57c內周面間之空隙尺寸，能隨流量調整構件59之 調整量而變化。亦即，本實施形態中，係藉由小孔57c與 流量調整構件59,構成用以調整自氣墊56之軸承面噴出 至移動面21a之加壓空氣之流量的流量調整機構。 經濟部智慧財產局員工消费合作社印製 回到第7圖，於容器52的內部，透過各氣墊56形成 有暫時儲藏噴出至移動面2U之加壓空氣的氣體儲藏空間 70。區劃此氣體儲藏空間70之容器本體53的一側壁上， 透過氣體注入用接頭72連接有管33之一端，此管33之另 一端，係連接於空氣幫浦99(參照第1圖）。因此，透過管 33及氣體注入用接頭72，於氣體儲藏空間70送入作爲流 體的加壓空氣，此加壓空氣透過複數個氣墊56之各個軸承 28 本紙張尺度適用十國國家標準<CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消費合作社印製 A7 -------B7 _ 五、發明說明（仳） 面’噴出至移動面21a。 ^ 其次，參照第10圖，說明前述可動構件51之組裝方 法°此處，係針對在作爲已進行平坦控制之基盤的基座21 之移動面2ia上，組裝可動構件51之情形加以說明。 首先，在基座21之移動面21a上，將複數個（此處爲 2〇個）氣墊56以對應前述第6圖之位置關係排列。 其次，在前述排列於移動面21a上之各氣墊56之墊部 57a上面，裝載非磁性構件且爲彈性構件之例如橡膠製〇 圈66。 接著，將預先安裝有永久磁石54n〜54nn及氣體注入 用接頭72之容器本體53，自排列於移動面21a上之各氣 墊56上方加以組裝。組裝時，將各氣墊56之軸部57b分 別插入容器本體53之對應的圓孔53b，且將各個Ο圈66 嵌合於對應之環狀凹槽53d。此時，即使因製造加工時之 誤差而在各個氣墊56之墊部57a產生厚度尺寸上之不同， 亦因0圈66具有彈性，而能以大致均等的力量將容器本 體53之全體壓向下方，而得以抵消將〇圈66嵌合於環狀 凹槽53d時之不平均的狀態，進而將容器本體53與各氣墊 56之相對位置關係調整至期望的狀態。此外，亦能據此將 固定於容器本體53之永久磁石54n〜54^與各氣墊56之 相對位置關係調整至期望的狀態。 又，爲了使各氣墊56之噴出流量大致均等，最好是於 組裝開始前，預先將流量調整構件59之扭轉量調整至適當 位置。但，亦能在組裝後調整流量調整構件59之扭轉量。 29 本紙張尺度適用中國國家標準（CNS)A4規格<210 X 297公爱〉 I ί ^ I i 1 1 I II. ^ --------^7·—-----^ . (請先閱讀背面之泫意事項再填寫本頁) 經濟部智慧財產局員工消費合作杜印製 439116’ A7 _B7__ 五、發明說明（4 ) 於此狀態下，透過前述注入口 53c於部57b與圓孔 53b之空隙間注入環氧樹脂，將氣墊56與容器本體53加 以黏著以進行固定。然後，當黏著劑固化後，爲防止氣墊 56之脫落、環氧樹脂(黏著劑）之劣化，將螺帽64螺合於公 螺紋部57f，牢牢的將氣墊56與容器本體53加以固定。 亦即，本實施形態中，係以公螺紋部57f與螺帽64構成連 結構件。 其次，於墊片58上面壓接蓋構件55，將螺栓62螺合 於突起部53a，進一步將螺栓鎖緊至既定量，完成可動構 件514之組合。 以上述方式，完成可動構件51之組裝後，於容器52 之蓋構件55的上面搭載驅動機構32a〜32c，再於此驅動 機構32a〜32c賞面安裝基板台18(預先固定有移動鏡27Y 、27X)，至此完成平台裝置30之可動部的組裝。然後，以 主控制裝置20使空氣幫浦99動作，透過管33將加壓空氣 供給至氣體儲藏室70內，此加壓空氣漸漸充塡於氣體儲藏 室70內，既定壓力之加壓空氣即透過各氣墊56之軸承面 噴出至基座21上面(移動面21a)，藉移動面21a與各氣墊 56間之加壓空氣的靜壓，可動体，亦即基板台18、驅動機 構32a〜32c及可動構件51之全體，即透過例如5 μιη左右 的空隙，被浮起支撐於移動面21a上方(參照第1、第3圖) 〇 此時，由於在可動構件51之永久磁石54n〜54nn與基 座21內之固固定構件軛43之間，有磁性吸引力的作用， 30 I ΐ--------- I I ----- I I t ----- (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公f ) 經濟部智慧財產居員工消費合作社印製 4391 t6 A7 _ B7 五、發明說明（J) 因此即產生與此磁性吸引力與可動體本身k量之合的向下 的力量相當之向上的力量(浮力）。 亦即’藉由和可動構件51及基板台18等之全體重量 及前述磁性吸引力之合相當之向下的力量，與由空氣幫浦 99所供給、透過氣墊56向移動面21a所吹出之加壓空氣 的壓力之向上的力量，即可動構件51底面與移動面21a間 之空氣層之靜壓（所謂空隙內壓力）的平衡，維持該空氣層 之厚度，亦即將軸承空隙維持於期望値。如上所述的，本 實施形態，藉可動構件51之永久磁石54與氣墊56，構成 一種磁氣預壓型之空氣靜壓軸承裝置。 其次，簡單說明包含前述平台裝置30之曝光裝置100 之曝光動作的流程。 首先，在主控制裝置20之管理下，藉平台控制系統 19等進行標線板供料、晶圓供料，又，使用未圖示之標線 板顯微鏡、基板台18上未圖示之基準標誌板及未圖示之校 準檢測系統，依既定的順序進行標線板校準、基線測量等 之準備作業。 之後，藉主控制裝置20，使用未圖示之校準檢測系統 實行EGA(Enhanced global alignment)等之校準測量。此種 動作中，當需要移動晶圓W時，主控制裝置20即透過平 台控制系統19,藉控制供給至對向於永久磁石54n〜54nil 之電樞線圏38的電流値及電流方向中至少一方，使保持晶 圓W之基板台18與可動構件51 —體的移向期望的方向。 又，有關前述標線板校準、基線測量等之準備作業， 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------------裝-----1 !丨訂·-------- (諳先閲讀背面之it意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 _B7_ 五、發明說明（>1 ) 於例如特開平第4-324923號公報及與此對^'應之美國專利第 5243 195號中有詳細之揭示，此外，有關其後之EGA，亦 在特開昭第61-44429號公報及與此對應之美國專利第 4780617號中有詳細之揭示。在本案國際申請之指定國或 選擇國國內法令允許之範圍內，援用上述各公報以及與各 該公報對應之美國專利之揭示作爲本說明書內容的一部份 。校準測量結束後，以下述方式進行步進掃瞄方式之曝光 動作。 此曝光動作，首先，移動基板台18，以使晶圓W之 XY位置到達用以進行晶圓W最初之攝像區域(First shot) 之曝光的掃瞄開始位置。同時移動標線板平台RST，以使 標線板R之XY位置到達掃瞄開始位置。又，依據來自主 控制裝置20之指示，平台控制系統19即依據以標線板千 擾儀16所測量之標線板R的XY位置資訊、以晶圓干擾儀 31所測量之晶圓W的XY位置資訊，透過未圖示之標線板 驅動部及平面馬達裝置50，以相應於投影光學系統PL之 投影倍率的速度比，使標線板R及晶圖W互爲反方向的沿 X軸方向同步移動，據以進行掃瞄曝光。此時晶圓之移動 ，係由主控制裝20透過平台控制系統19，藉控制供給至 對向於永久磁石54M〜54nn之電樞線圈38的電流値及電流 方向中至少一方之方式加以進行。 以上述之方式，當對1個攝像區域之標線板圖案之複 製結束後，基板台18即步進1個攝像區域份，以進行對下 1個攝像區域之掃瞄曝光。如此般，依序重複進行步進及 (請先閲讀背面之注意事項再填窝本頁) 裝 Μδ_ --------線 本紙張尺度適用中國國家標準（CNS>A4規格（210 X 297公釐） V < .... β b Α7 ______Β7___ 一 五、發明說明（4。） 掃瞄曝光，於晶圓上複製需要之攝像數。/ 如上述之詳細說明般，根據本實施形態，由於係採用 電磁力驅動之平面馬達裝置50作爲基板台1S的驅動裝置 ，且此平面馬達裝置50之可動構件51具備有複數個氣塾 56，藉該氣墊56將基板台18與可動構件5 1 —體的浮起支 撐於移動面2U上，因此沒有摩擦等機械性的損失，具有 優異的耐久性，相較於使用可變磁氣阻抗方式之平面馬達 時，可減少爲了浮起支撐基板台18而將加壓空氣供給至氣 墊之空氣幫浦的消耗電力。 又，前述氣墊56，由於係配置在永久磁石54n〜54nn 中既定之永久磁石間(前述永久磁石54u〜54nn係構成在可 動構件51之容器52底面(對向於移動面21a之面)以既定 間隔配置於2維方向的驅動力產生構件群），因此藉有效利 用永久磁石間的空間，能實現大致相等於與永久磁石54u 〜54nn2配置區域面積(容器52之底面積)相當大小的小型 輕量之可動構件51，進而減少用以驅動可動構件51之消 耗電力以及提昇可動構件51與基板台18上晶圓W之位置 控制性。 又，如前述般，本實施形態中固定於容器52底面之氣 墊56之配置，係採用與對抗可動構件51之加速的移動面 交差方向的位置姿勢變化，亦即Z、、6»y方向之剛性 最高的配置，此外’由於氣墊56於軸承面具有剛性較高、 衰減較大之形成的槽57e ’因此氣墊56之軸承面與移動面 21a間之空隙(所謂之軸承空隙)尺寸幾乎不會產生意外的變 33 本紙張尺度適用中國國家標準<CNS)A4規格（210 X 297公釐〉 ί請先閱讀背面之注意事項再填寫本頁) 裝---------訂---------線 經濟部智慧財產局員工消費合作社印製 A7 ——_______B7____ 五、發明說明（w) 化，此外不僅設有複數個氣墊56之可動件51的靜特性 良好，其移動時的動特性亦良好。此結果，可動構件51之 振動衰減特性變佳，而能提昇制動特性（定位特性），縮短 定位恢復時間。 又，由於各氣墊56 ’係以能調整加壓空氣之噴出流量 之方式構成，因此即使加工製造時在特性上有若干誤差， 亦能藉由調整加壓空氣之噴出流量，使複數個氣墊之特性 均一化。 又，作爲支撐構件之容器52，由於其內部具有將供給 至各氣墊56之加壓空氣暫時儲藏之氣體儲藏空間70,因 此能藉1條或少數之管(氣體供給配管)將加壓空氣供給至 氣體儲藏空間70內。此外，由於係將暫時儲藏於前述氣體 儲藏空間70之加壓空氣供給至各氣墊56，因此能大致均 一的將加壓空氣分配供給至各氣墊56，在此點上，亦能使 複數個氣墊之特性均一化。 又，本實施形態中，由於前述氣墊56之軸承面，係較 構成永久磁石群之永久磁石54H〜54nn之磁極面更突出於 移動面21a側，因此能容易的對設於可動構件51之複數個 氣墊之軸承面的平坦度進行管理。 又，於可動構件之組裝時，在施有平坦管理之基盤(前 述實施形態中爲基座21)上，以既定之位置關係排列各氣 墊56，在排列於此基座21上之各氣墊56上透過Ο圈裝載 預先安裝有永久磁石54Μ〜54ηη之容器本體53，將氣墊56 與容器本體53之相對位置關係調整至期望狀態，再固定兩 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閲讀背面之注意事項再填寫本頁) 裝------- -訂---------線 經濟部智慧財產局MC工消费合作杜印製 43 91 1 6 A7 _____ B7 五、發明說明（π) 者。因此，根據本實施形態，即使各個氣_ 56間有若干加 工製造之誤差’亦能不受其影響，而確保以各軸承面形成 之可動構件側引導面之均一的平坦度。 由於保持晶圓W之基板台18的驅動裝置，係使用包 含具有上述種種特徵之可動構件51的平面馬達裝置50, 因此能提昇基板台18之位置控制性，而能進行高速且高精 密度之晶圖W的定位。因此，能提昇生產率、以較高的曝 光精密度進行曝光。 又’前述校準時或掃瞄曝光時，雖於構成平面馬達裝 置50之固定構件60的各電樞線圏38供給有適當之電流， 爲防止此電樞線圏38產生之熱度造成溫度上昇，主控制裝 置2〇係透過冷卻裝置79實施上述各電樞線圏38之冷卻， 因此能抑制因電樞線圏產生之熱所引起之溫度變化所造成 的干擾儀測量値之空氣波動等。 針對此點，若根據本實施形態之曝光裝置100，能對 晶圓W進行更爲精密之高速的位置控制，而能提昇生產率 '以較高的曝光精密度進行曝光。 又，前述實施形態中所說明之平面馬達裝置的構成僅 係一例，本發明並不受限於此。例如，與前述實施形態相 同的構成活動磁石型(Moving magnet)之平面馬達時，亦可 採用電磁石作爲驅動力產生構件。或者，採用電樞線圈作 爲構成平面馬達裝置之_動力產生構件，以構成活動磁石 型之平面馬達。 又’亦可採用如第11圖所示之氣墊的安裝構造，以作 35 本紙張尺度適用中國囷家標準（CNS)A4規格（2〗〇 x 297公釐） (請先閱讀背面之>i意事項再填寫本頁) 裝--------訂---------線 經濟部智慧財產局員工消费合作社印製 經濟部智慧財產局員X消費合作社印製 43 91 1 6 A7 ____B7__ 五、發明說明（灼） 爲安裝於容器52之氣墊的安裝構造。此處'與前述實施形 態相同部份，爲避免重複說明，係使用相同符號。第11圖 中，於容器本體53之底壁，在各氣墊56之安裝位置設有 其內周部形成有母螺紋之螺孔53e。氣墊56,透過螺合於 此螺孔、由既定厚度之圚筒狀構件所構成之調整構件80， 藉螺帽64螺止於容器本體53之底壁。又，螺孔53e的周 圍，以例如120°間隔形成有3個螺栓安裝用的螺孔53f， 於此3個螺孔53f分別插入有3隻螺栓82，此3隻螺栓82 ，係分別螺合於與螺孔53f對應之氣墊S6之墊部57a上面 所設之3個螺孔57h。 於氣墊56之軸承本體57之軸部57b的下端部，形成 有球狀凸部57g，與此球狀凸部57g對應之調整構件80的 部份，形成有球狀凹部80a。 此第11圖之安裝構造，於組裝時，可將對應於氣墊 56之容器本體53底面之Z方向、θχ、方向的位置， 以下述之方式進行調整。亦即，首先’將調整構件80螺合 於容器本體53底壁之螺孔53e後，調整其鬆緊(螺合量）。 因此，於調整構件之上端面’形成有螺絲起子等可卡合之 槽（圖示省略）。 其次，自下方將氣墊56之軸部5几插入調整構件80 的內部空間，將螺帽64螺合於軸部57b輕輕的加以固定。 其次，將3隻螺栓82分別螺合於容器本體53底壁所 設的3個螺孔53f，將各個頂端分別螺合於墊部5*7a上面所 設的3個螺孔57h中。此時’藉適當的調整各螺栓82之鬆 36 1C 111 I I ---I ! I ^---------. <請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 X 297公釐） 439! 1 G ^ A7 B7 經濟部智慧財產局員工消费合作杜印製 五、發明說明（w) 緊(螺合量），以進行氣墊56軸承面之傾斜調整。 最後，藉鎖緊螺帽64，氣墊56即以既定之位置關係 固定於容器本體53之底壁。 如上述般，此第11圖之安裝構造中，能藉調整構件 80之螺合量進行氣墊56之Z位置的調整，而藉3隻螺栓 82之螺合量進行氣墊56之βχ、（9y方向傾斜的調整。 此外，設置板狀的磁性體材料以作爲支撐構件，於此 磁性體材料上和前述實施形態同樣的安裝複數個永久磁石 及複數個氣墊，而自外部的幫浦直接、個別的將加壓空氣 供給至各該複數個氣墊上亦可。此種情形中，可採用與前 述可動構件51之組裝方法相同的組裝方法。 又，前述實施形態中*不僅僅是固定構件60側之移動 面2U，亦可將以低熱膨脹之陶瓷形成、與此移動面21a 對向之氣墊56的軸承面，在組裝之最後步驟中以硏磨片 (Lapping)等加以硏磨，以使各氣墊56之軸承面成爲同一 面。此種情形中，可確保由複數個氣墊之軸承面所形成之 可動構件側之引導面之均等的平坦度。 再者，前述實施形態中，係針對使用加壓空氣作爲流 體之情形加以說明，但本發明並不受限於此。例如以ArF 準分子雷射作爲曝光光源，在曝光裝置之處理室內充塡氮 氣之環境下，使用氮氣、或氦氣等對真空紫外光之吸收較 少的非活性氣體（低吸收性氣體）作爲加壓氣體，且使用與 此相應之氣體靜壓軸承即可。又’前述實施形態中，係針 對使用氣墊（空氣靜壓軸承）之情形加以說明，但不受限於 (靖先閱讀背面之ii意事項再填寫本頁)It --- r ------- t -------- Order --------- Line I (Please read the notes on the back before filling this page) 43-a7 ____B7____ V. Description of the invention (v〇 (please read the note on the back and fill in this page first) Return to Fig. 8. On the outer periphery of the upper end of the uranium portion 57b of the bearing body 57 described above, a male thread portion 57f is formed. And the shaft portion 57b is inserted into the circular hole 53b formed in the bottom wall of the container body 53 from below, and the air cushion 56 is screwed to the container body 53 by screwing the nut 64 to the male screw portion 57f. The bottom surface of the container body 53 is formed There is an annular groove 53d, and between this annular groove 53d and the upper surface of the pad portion 57a, a ring 66 serving as a sealing member is attached. Furthermore, in this embodiment, as shown in FIG. An injection port 53c communicating with the circular hole 53b is formed near the circular hole 53b of the bottom wall, and an epoxy resin adhesive is injected through the injection port 53c. The flow adjustment member 59 has the following two parts: the outer peripheral surface is formed A circular plate portion 59a having a male thread screwed onto the female thread 57d, and a needle valve portion 59b extending from the lower end surface of the circular plate portion 59a. 9a, for example, three openings 59c are formed at intervals of about 120 °. The size of the gap between the needle valve portion 59b and the inner peripheral surface of the small hole 57c can be changed according to the adjustment amount of the flow adjustment member 59. That is, this embodiment In the middle, the small hole 57c and the flow adjustment member 59 constitute a flow adjustment mechanism for adjusting the flow of pressurized air ejected from the bearing surface of the air cushion 56 to the moving surface 21a. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Returning to FIG. 7, inside the container 52, a gas storage space 70 for temporarily storing pressurized air ejected to the moving surface 2U is formed through each of the air cushions 56. A side wall of the container body 53 that partitions the gas storage space 70, One end of the pipe 33 is connected to the transmission gas injection joint 72, and the other end of the pipe 33 is connected to the air pump 99 (see FIG. 1). Therefore, the transmission pipe 33 and the gas injection joint 72 are used in the gas storage space. 70 Pressurized air is sent as fluid, and the pressurized air passes through the bearings of a plurality of air cushions. 56 The paper size applies to the national standards of the ten countries < CNS) A4 specification (210 X 297 mm). Intellectual Property Bureau, Ministry of Economic Affairs Consumer cooperative work printed A7 ------- B7 _ V. Description of the Invention (Pi) plane 'to move the ejection surface 21a. ^ Next, the method of assembling the movable member 51 described above will be described with reference to FIG. 10. Here, the case where the movable member 51 is assembled on the moving surface 2ia of the base 21 as the base plate for which flat control is performed will be described. First, a plurality of (here, 20) air cushions 56 are arranged on the moving surface 21a of the base 21 in a positional relationship corresponding to the aforementioned FIG. 6. Next, a non-magnetic member, such as a rubber ring 66, is mounted on the pad portion 57a of each of the air cushions 56 arranged on the moving surface 21a. Next, the container body 53 in which the permanent magnets 54n to 54nn and the gas injection joint 72 are installed in advance is assembled from the air cushions 56 arranged on the moving surface 21a. At the time of assembly, the shaft portions 57b of each air cushion 56 are respectively inserted into the corresponding circular holes 53b of the container body 53, and each O-ring 66 is fitted into the corresponding annular groove 53d. At this time, even if there is a difference in thickness and dimensions between the pad portions 57a of the respective air cushions 56 due to errors in manufacturing and processing, the 0 ring 66 has elasticity, so that the entire container body 53 can be pressed downward with a substantially uniform force. In order to offset the uneven state when the O-ring 66 is fitted into the annular groove 53d, the relative positional relationship between the container body 53 and each air cushion 56 can be adjusted to a desired state. In addition, the relative positional relationship between the permanent magnets 54n to 54 ^ fixed to the container body 53 and the air cushions 56 can be adjusted to a desired state accordingly. In addition, in order to make the discharge flow rates of the air cushions 56 approximately equal, it is preferable to adjust the amount of twist of the flow rate adjusting member 59 to an appropriate position before the start of assembly. However, it is also possible to adjust the twist amount of the flow rate adjusting member 59 after assembly. 29 This paper size applies to China National Standard (CNS) A4 specifications < 210 X 297 Public Love> I ί ^ I i 1 1 I II. ^ -------- ^ 7 · ------- ^ (Please read the notice on the back before filling in this page.) Consumer cooperation of the Intellectual Property Bureau of the Ministry of Economic Affairs Du printed 439116 'A7 _B7__ V. Description of the invention (4) In this state, through the above-mentioned injection port 53c on the part 57b An epoxy resin is injected into the gap between the circular hole 53b, and the air cushion 56 and the container body 53 are adhered to be fixed. Then, after the adhesive is cured, in order to prevent the air cushion 56 from falling off and the epoxy resin (adhesive) from deteriorating, the nut 64 is screwed onto the male screw portion 57f, and the air cushion 56 and the container body 53 are firmly fixed. That is, in this embodiment, the male screw portion 57f and the nut 64 constitute a connecting member. Next, the cover member 55 is crimped onto the washer 58 and the bolt 62 is screwed to the protruding portion 53a, and the bolt is further locked to a predetermined amount to complete the combination of the movable member 514. In the manner described above, after the assembly of the movable member 51 is completed, the driving mechanisms 32a to 32c are mounted on the cover member 55 of the container 52, and the driving mechanisms 32a to 32c are mounted on the substrate stage 18 (moving mirrors 27Y, 27X), and the assembly of the movable part of the platform device 30 is completed. Then, the main control device 20 is used to operate the air pump 99, and the pressurized air is supplied into the gas storage chamber 70 through the pipe 33. This pressurized air is gradually filled in the gas storage chamber 70. The pressurized air at a predetermined pressure is It is sprayed onto the base 21 (moving surface 21a) through the bearing surface of each air cushion 56. By the static pressure of the pressurized air between the moving surface 21a and each air cushion 56, the movable body, that is, the substrate table 18, the driving mechanism 32a ~ 32c And the entire movable member 51, that is, supported by a floating space above the moving surface 21a through a gap of about 5 μm, for example (see FIGS. 1 and 3). At this time, the permanent magnets 54n to 54nn of the movable member 51 and There is a magnetic attractive force between the yoke 43 of the fixed member in the base 21, 30 I ΐ --------- II ----- II t ----- (Please read the back first Please pay attention to this page, please fill in this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297gf) Printed by the Intellectual Property Residence Staff Consumer Cooperative of the Ministry of Economic Affairs 4391 t6 A7 _ B7 V. Description of Invention (J) Therefore That is, a downward force equivalent to the magnetic attraction and the k amount of the movable body itself is generated. Upward force (buoyancy). That is, 'the downward force corresponding to the total weight of the movable member 51, the substrate stage 18, and the like and the magnetic attraction described above is equivalent to the force supplied from the air pump 99 and blown out to the moving surface 21a through the air cushion 56. The upward force of the pressure of the pressurized air can balance the static pressure of the air layer between the bottom surface of the movable member 51 and the moving surface 21a (the so-called inter-gap pressure), maintaining the thickness of the air layer, that is, maintaining the bearing gap at the desired level. . As described above, in this embodiment, a permanent magnet 54 and an air cushion 56 of the movable member 51 constitute a magnetic preloading type air static pressure bearing device. Next, the flow of the exposure operation of the exposure device 100 including the platform device 30 will be briefly described. First, under the management of the main control device 20, the reticle feeding and wafer feeding are performed by the platform control system 19 and the like, and a reticle microscope (not shown) and a reference not shown on the substrate table 18 are used. The sign board and the calibration and detection system (not shown) perform the preparation of the reticle calibration and baseline measurement in a predetermined order. Thereafter, the main control device 20 is used to perform calibration measurement such as EGA (Enhanced global alignment) using a calibration detection system (not shown). In this kind of operation, when it is necessary to move the wafer W, the main control device 20 controls the current supplied to the armature line 38 facing the permanent magnet 54n to 54nil through the platform control system 19 and at least one of the current directions. On the other hand, the substrate stage 18 holding the wafer W and the movable member 51 are moved in a desired direction. In addition, for the preparation of the aforementioned reticle calibration, baseline measurement, etc., this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------------ installation- --- 1! 丨 Order · -------- (谙 Please read the Italian notice on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs_B7_ V. Description of the invention (> 1 ) For example, it is disclosed in Japanese Unexamined Patent Publication No. 4-324923 and US Patent No. 5243 195 corresponding thereto. In addition, the subsequent EGA is also disclosed in Japanese Unexamined Patent Publication No. 61-44429. It is disclosed in detail in US Patent No. 4,780,617. To the extent permitted by the domestic laws of the designated or selected country of the international application in this case, the disclosures of the above-mentioned bulletins and the corresponding U.S. patents corresponding to those bulletins are used as part of the contents of this specification. After the calibration measurement is completed, perform the exposure in the step-and-scan mode in the following manner. In this exposure operation, first, the substrate table 18 is moved so that the XY position of the wafer W reaches the scanning start position for exposing the first imaging area (First shot) of the wafer W. At the same time, move the reticle platform RST so that the XY position of the reticle R reaches the scanning start position. In addition, according to the instructions from the main control device 20, the platform control system 19 is based on the XY position information of the reticle R measured by the reticle perturbation meter 16, and the wafer W measured by the wafer interference meter 31. The XY position information passes through the graticule plate driving unit and the planar motor device 50 (not shown) to make the graticule plate R and the crystal image W in opposite directions along X in a speed ratio corresponding to the projection magnification of the projection optical system PL. The axis moves synchronously for scanning exposure. At this time, the movement of the wafer is performed by the main control device 20 through the platform control system 19 by controlling at least one of the current supplied to the armature coil 38 to the permanent magnets 54M to 54nn and the direction of the current. In the manner described above, when the copying of the reticle pattern of one imaging area is completed, the substrate stage 18 steps one imaging area to perform scanning exposure to the next imaging area. In this way, repeat the steps in sequence and (please read the precautions on the back before filling in this page). Loading Mδ_ -------- The size of the paper is applicable to the Chinese national standard (CNS > A4 size (210 X 297 mm) V < .... β b Α7 ______ Β7 ___ One or five, the description of the invention (4.) Scan exposure, the number of cameras required to copy on the wafer. / As described in detail above, according to this embodiment Since the planar motor device 50 driven by electromagnetic force is used as the driving device of the substrate table 1S, and the movable member 51 of the planar motor device 50 is provided with a plurality of air pockets 56, the substrate table 18 and the movable member 51 are connected by the air cushion 56. -The floating support of the body is supported on the moving surface 2U, so there is no mechanical loss such as friction, and it has excellent durability. Compared with the use of a planar motor with a variable magnetic impedance method, it is possible to reduce the support of the substrate stage. The power consumption of the air pump that supplies pressurized air to the air cushion is 18. The air cushion 56 is disposed between the predetermined permanent magnets of the permanent magnets 54n to 54nn (the permanent magnets 54u to 54nn are configured in a movable structure). The bottom surface of the container 52 of the piece 51 (the surface facing the moving surface 21a) is arranged at a predetermined interval in a two-dimensional driving force generating member group). Therefore, by effectively using the space between the permanent magnets, it can achieve approximately the same as the permanent magnets. 54u ~ 54nn2 The area of the arrangement area (the bottom area of the container 52) is relatively small and light, and the movable member 51 is relatively small, thereby reducing the power consumption for driving the movable member 51 and increasing the position of the movable member 51 and the wafer W on the substrate table 18. In addition, as described above, the configuration of the air cushion 56 fixed to the bottom surface of the container 52 in this embodiment adopts the position and posture changes in the direction of intersection with the moving surface that opposes the acceleration of the movable member 51, that is, Z, 6 » The arrangement with the highest rigidity in the y direction. In addition, 'the air cushion 56 has a groove 57e formed on the bearing surface with higher rigidity and greater attenuation.' Therefore, the size of the gap between the bearing surface of the air cushion 56 and the moving surface 21a (the so-called bearing gap) is Few accidental changes will occur 33 The paper size applies to the Chinese National Standard < CNS) A4 specification (210 X 297 mm> ί Please read the precautions on the back before filling this page) --------- Order --------- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ——_______ B7____ V. Description of the invention (w), in addition to a number of air cushions The movable member 51 of 56 has a good static characteristic and a good dynamic characteristic when it moves. As a result, the vibration attenuation characteristics of the movable member 51 are improved, the braking characteristics (positioning characteristics) can be improved, and the positioning recovery time can be shortened. In addition, since each air cushion 56 ′ is configured in such a manner that the discharge flow rate of pressurized air can be adjusted, even if there are some errors in characteristics during processing, it is possible to adjust the discharge flow rate of pressurized air to make a plurality of air cushions Uniform characteristics. In addition, the container 52 as a supporting member has a gas storage space 70 for temporarily storing the pressurized air supplied to each of the air cushions 56, so that the pressurized air can be supplied by one or a few tubes (gas supply piping). Into the gas storage space 70. In addition, since the pressurized air temporarily stored in the gas storage space 70 is supplied to each air cushion 56, the pressurized air can be distributed and supplied to each air cushion 56 substantially uniformly. At this point, a plurality of air cushions can also be provided. Uniform characteristics. In addition, in this embodiment, since the bearing surface of the air cushion 56 is more protruded than the magnetic pole surface of the permanent magnets 54H to 54nn constituting the permanent magnet group, the moving surface 21a can be easily aligned. The flatness of the bearing surface of each air cushion is managed. When assembling the movable member, the air cushions 56 are arranged on a base plate (the base 21 in the foregoing embodiment) provided with flat management in a predetermined positional relationship, and the air cushions 56 arranged on the base 21 are arranged. A container body 53 pre-installed with permanent magnets 54M ~ 54ηη is loaded through 0 circles, the relative positional relationship between the air cushion 56 and the container body 53 is adjusted to the desired state, and the two paper sizes are fixed to apply Chinese National Standard (CNS) A4 specifications ( 210 X 297 mm) (Please read the precautions on the back before filling out this page) ------------ Order --------- MC Industrial and Consumer Affairs Department Intellectual Property Cooperation Du Yin System 43 91 1 6 A7 _____ B7 5. Inventor (π). Therefore, according to this embodiment, even if there are some processing errors between each gas_56, the uniform flatness of the movable member-side guide surface formed by each bearing surface can be ensured without being affected by it. Since the driving device for the substrate table 18 holding the wafer W is a planar motor device 50 including the movable member 51 having the various characteristics described above, the position controllability of the substrate table 18 can be improved, and high-speed and high-precision Positioning of the crystal map W. Therefore, productivity can be improved and exposure can be performed with high exposure precision. Also, during the aforementioned calibration or scanning exposure, although an appropriate current is supplied to each armature line 圏 38 constituting the fixing member 60 of the planar motor device 50, in order to prevent the heat generated by the armature line 圏 38 from causing a temperature rise, The main control device 20 performs the above-mentioned cooling of each armature line 38 through the cooling device 79, so that it can suppress the air fluctuation of the interference meter measurement of the armature caused by the temperature change caused by the heat generated by the armature line. In view of this, according to the exposure apparatus 100 of this embodiment, it is possible to perform more precise and high-speed position control on the wafer W, and it is possible to improve productivity and perform exposure with high exposure precision. The configuration of the planar motor device described in the foregoing embodiment is only an example, and the present invention is not limited thereto. For example, in the case of a planar motor constituting a moving magnet type similar to that of the aforementioned embodiment, an electromagnet may be used as a driving force generating member. Alternatively, an armature coil is used as a power generating member constituting the planar motor device to constitute a movable magnet type planar motor. You can also use the installation structure of air cushion as shown in Figure 11 to make 35 paper sizes applicable to the Chinese standard (CNS) A4 (2) 0x297 mm (please read the > on the back first) (I will fill in this page again if necessary)) Packing -------- Order --------- Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs X Printed by Consumer Cooperatives 1 6 A7 ____B7__ V. Description of the Invention (Burning) The installation structure of the air cushion installed on the container 52. Here, the same parts as in the previous embodiment are used. To avoid repetitive description, the same symbols are used. In Fig. 11, a screw hole 53e is formed on the bottom wall of the container body 53 at the mounting position of each air cushion 56 and a female thread is formed on the inner peripheral portion thereof. The air cushion 56 is screwed to the bottom of the container body 53 by a nut 64 through an adjusting member 80 screwed into the screw hole and made of a cylindrical member of a predetermined thickness. In addition, three screw holes 53f for mounting bolts are formed around the screw holes 53e at, for example, 120 ° intervals. Here, three bolts 82 are respectively inserted into the three screw holes 53f, and the three bolts 82 are screwed respectively. Three screw holes 57h are provided on the pad portion 57a of the air cushion S6 corresponding to the screw holes 53f. A spherical convex portion 57g is formed at the lower end portion of the shaft portion 57b of the bearing body 57 of the air cushion 56, and a spherical concave portion 80a is formed at a portion of the adjusting member 80 corresponding to the spherical convex portion 57g. In the mounting structure of FIG. 11, during assembly, the positions corresponding to the Z direction, θχ, and direction of the bottom surface of the container body 53 of the air cushion 56 can be adjusted in the following manner. That is, first, the adjustment member 80 is screwed into the screw hole 53e of the bottom wall of the container body 53, and then the tension (screw amount) is adjusted. Therefore, an engaging groove such as a screwdriver (not shown) is formed in the upper end surface 'of the adjustment member. Next, the shaft portion 5 of the air cushion 56 is inserted into the inner space of the adjustment member 80 from below, and the nut 64 is screwed onto the shaft portion 57b to be gently fixed. Next, the three bolts 82 are screwed into the three screw holes 53f provided in the bottom wall of the container body 53, and the respective top ends are screwed into the three screw holes 57h provided on the pad portion 5 * 7a. At this time, 'By properly adjusting the looseness of each bolt 82 36 1C 111 II --- I! I ^ ---------. ≪ Please read the precautions on the back before filling this page) Applicable to China National Standard (CNS) A4 specification (21 × 297 mm) 439! 1 G ^ A7 B7 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs on consumer cooperation Du V. Invention Description (w) Tight (screw volume) The tilting of the bearing surface of the air cushion 56 is performed. Finally, by locking the nut 64, the air cushion 56 is fixed to the bottom wall of the container body 53 in a predetermined positional relationship. As described above, in the installation structure of FIG. 11, the Z position of the air cushion 56 can be adjusted by adjusting the screwing amount of the member 80, and the βχ and (9y directions) of the air cushion 56 can be adjusted by the screwing amount of the three bolts 82. Inclination adjustment In addition, a plate-shaped magnetic material is provided as a supporting member, and a plurality of permanent magnets and a plurality of air cushions are mounted on the magnetic material in the same manner as in the previous embodiment, and the external pumps directly and individually It is also possible to supply pressurized air to each of the plurality of air cushions. In this case, the same assembling method as the aforementioned assembling method of the movable member 51 may be adopted. In addition, in the aforementioned embodiment, * is not limited to the fixed member 60 side. The moving surface 2U can also be formed by a ceramic having a low thermal expansion and the bearing surface of the air cushion 56 facing the moving surface 21a. The bearing surface of the air cushion 56 is honed in the final step of assembly to make each air cushion The bearing surfaces of 56 become the same surface. In this case, it is possible to ensure an even flatness of the guide surface on the movable member side formed by the bearing surfaces of the plurality of air cushions. Furthermore, in the foregoing embodiment, the needles are tied. The case where pressurized air is used as a fluid is described, but the present invention is not limited thereto. For example, an ArF excimer laser is used as an exposure light source, and nitrogen is used in an environment filled with nitrogen in a processing chamber of an exposure device, or Inert gas (low-absorptive gas), such as helium, which has less absorption of vacuum ultraviolet light, can be used as a pressurized gas, and a corresponding gas hydrostatic bearing can be used. Also, in the aforementioned embodiment, the use of an air cushion (Air static pressure bearing) The situation will be explained, but it is not limited (Jing first read the intention on the back and then fill out this page)
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I 線 本紙張尺度適用中國國家標準（CNS)A4規格（210 297公釐）I-line This paper is sized for China National Standard (CNS) A4 (210 297 mm)
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五、發明說明（W 此’除可使用其他的氣體靜壓軸承外，亦可使用將液體噴 出至移動面21a的軸承。 ' 再者，則述實施形態中，係針對本發明之平面馬達裝 置及平台裝置使用於掃猫型之DUV曝光裝置之基板的驅動 裝置之情形加以說明，但本發明並不受限於此，例如亦可 於標線板之驅動裝置使用本發明之平面馬達裝置。此外， 本發明之平面馬達裝置及平台裝置，並不限於掃猫步進等 之掃瞄型曝光裝置’除可使用於步進重複方式之步進器等 靜止曝光型之曝光裝置外，亦非常適合使用於不使用投影 光學系統、而使光罩與基板密接以將光罩之圖案複製於基 板的近接型曝光裝置。 又’本發明並不限定於半導體製造用曝光裝置，例如 亦可廣泛的適用於將液晶顯示元件圖案複製於角型玻璃板 之液晶用曝光裝置，或用以製造薄膜磁頭之曝光裝置。 更進一步的’本發明之馬達裝置及平台裝置，亦非常 適合使用於曝光裝置以外之裝置，例如檢查裝置或基板搬 送裝置等。 又’本發明不限於使用g線（波長436nm)、i線(波長 365nm)、KrF準分子雷射光（波長248nm)等DUV光之曝光 裝置，除能適用於使用ArF準分子雷射光(波長1963nm)、 F2雷射光(波長157nm)、Kr2雷射光(波長H6nm)、Ar2雷 射光(波長126nm)等真空紫外(VUV)光之曝光裝置外，亦非 常適合使用於使用波長爲5〜15mn左右之軟X光區域之光 (所謂EUV光）' 或X光、電子束等帶電粒子線的曝光裝置 38 本紙張尺度適用中困國家標準（CNS)A4規格（210 X 297公釐） f請先閱讀背面之注意事項再填寫本頁} 裝！ 11-!--線 經濟部智慧財產局員工洧費合作社印製V. Description of the invention (W This 'in addition to other aerostatic bearings, bearings that eject liquid to the moving surface 21a can also be used.' Furthermore, in the described embodiment, the planar motor device according to the present invention is directed to the present invention. The case where the platform device is used as a driving device for a substrate of a cat-type DUV exposure device will be described, but the present invention is not limited thereto. For example, the planar motor device of the present invention can also be used as a driving device for a marking board. In addition, the planar motor device and the platform device of the present invention are not limited to a scanning type exposure device such as a cat-scanning stepper. In addition to a stationary exposure type exposure device such as a stepper that can be used in a step-and-repeat mode, It is suitable to be used in a proximity exposure device that does not use a projection optical system and closely contacts the photomask to the substrate to copy the pattern of the photomask to the substrate. The invention is not limited to an exposure device for semiconductor manufacturing. It is suitable for the liquid crystal exposure device that reproduces the pattern of the liquid crystal display element on the corner glass plate, or the exposure device used to manufacture the thin film magnetic head. The motor device and platform device of the invention are also very suitable for use in devices other than exposure devices, such as inspection devices or substrate transfer devices. Also, the present invention is not limited to the use of g-line (wavelength 436nm), i-line (wavelength 365nm), KrF Exposed devices for DUV light, such as excimer laser light (wavelength 248nm), are applicable to the use of ArF excimer laser light (wavelength 1963nm), F2 laser light (wavelength 157nm), Kr2 laser light (wavelength H6nm), Ar2 laser light ( In addition to the exposure device of vacuum ultraviolet (VUV) light such as wavelength (126nm), it is also very suitable for using light in the soft X-ray region with a wavelength of about 5 ~ 15mn (so-called EUV light), or X-rays, electron beams and other charged particle beams Exposure device 38 This paper size is applicable to the National Standard (CNS) A4 specification (210 X 297 mm) f Please read the precautions on the back before filling out this page} Pack! 11-!-The Intellectual Property Bureau of the Ministry of Economic Affairs Printed by employee co-operatives
經濟部智慧財產局員工消t合作社印製 五、發明說明（讳） 。例如’使用電子束時，可使用熱電子輻'射型之六硼化鑭 (LaB6)、姐(Ta)以作爲電子槍。 進一步的，使用電子束時，採使用光罩之構成、或不 使用光罩而以電子束藉直接描繪將圖案形成於基板上之構 成皆可。亦即’只要是使用電子光學系統作爲曝光用光學 系統之電子束曝光裝置的話，無論其爲集束性光束(Pencil beam)式、可變成形光束式、單元投射(Cell projection)式、 消隱光圏（Blanking aperture)式或 EBPS(Electron beam paramatic)式之任一者，皆可使用本發明。 作爲真空紫外光，係使用ArF準分子雷射光、F2雷射 光等，但不限於此，亦可使用自DFB半導體雷射或光纖雷 射所發出之紅外線區域、或可視區域之單一波長的雷射光 ，藉例如摻雜餌(Er)(或餌及鏡二者)之光纖增幅器加以增幅 ，並使用非線形光學結晶變換爲紫外光波長之高次諧波。 例如，將單一波長雷射之振盪波長設定在1.51〜1.59 的範圍內時，即輸出發生波長爲189〜199nm範圍內 之8倍高次諧波、或發生波長爲151〜159nm範圍內之10 倍高次諧波。特別是當振盪波長設定在1.544〜1.553 /zm 的範圍內時，即能獲得發生波長爲193〜194nm範圍內之8 倍高次諧波，亦即與ArF準分子雷射光大致相同波長之紫 外光，若將振盪波長設定在1.57〜1.58^m的範圍內時， 即能獲得备生波長爲157〜158nm範圍內之10倍高次諧波 ，亦即亦即與雷射光大致相同波長之紫外光。 又，若將振盪波長設定在1.03〜1.12/zm的範圍內時 39 本紙張尺度適用中3國家標準（CNS)A4規格（21〇 X 297公釐） 1111 J ---11111 訂 — I — 一 I I I - I (請先閱讀背面之注意事項再填寫本頁) A7 B7 五、發明說明ΟΊ) ’即輸出發生波長爲147〜範圍內7倍高次諧波 ，特別是當振盪波長設定在1.099〜1.106"m的範圍內時 ，即能獲得發生波長爲157〜158nm範圍內之7倍高次諧 波，亦即與F2雷射光大致相同波長之紫外光。此時，例如 可使用鏡摻雜光纖雷射來作爲單一波長振盪雷射。 又，前述實施形態所說明之照明光學系統及投影光學 系統之構成僅爲一例，本發明並不限定於此。例如，投影 光學系統之倍率不一定要是縮小系統，等倍或擴大系統之 任一者亦可。作爲投影光學系統，若係使用準分子雷射等 之遠紫外線時，可使用石英或螢石等能讓遠紫外線穿透之 材料作爲玻璃材，若係使用F2雷射或X光時，即採用反射 折射系統或反射系統之光學系統(標線板亦使用反射型之物 )’再者，若係使用電子束時，採用由電子透鏡及偏轉器所 構成之電子光學系統即可。又，電子束通過之光路當然須 設爲真空狀態。 又，使用波長爲200ηηι以下之真空紫外光(VUV光)的 曝光裝置中，亦可考慮使用反射折射系來作爲投影光學系 統。作爲此反射折射型之投影光學系統，可使用揭示於例 如曰本專利特開平8-171054號公告及與此對應之美國專利 第5668672號，以及特開平10-20195號公告及與此對應之 美國專利第5835275號之具有分光器與凹面鏡以作爲反射 光學元件之反射折射系統。此外，亦可使用揭示於例如日 本專利特開平8-334695號公告及與此對應之美國專利第 5689377號，以及特開平1〇-3〇39號公告及與此對應之美 40 本紙張尺度適用中國理家標準（CNS>A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝·------訂---------線 經濟部智慧財產局員工消费合作社印製 A7 B7 4391 1 6 五、發明說明（β) 國專利申請第873605號（申請日：1997年6月12日）之不 使用分光器而具有凹面鏡來作爲反射光學元件之反射折射 系統。在本案國際申請之指定國或選擇國國內法令允許之 範圍內，援用上述各公報以及與各該公報對應之美國專利 及美國專利申請案之揭示作爲本說明書內容的一部份。 此外，亦可使用揭示於美國專利第5031976號、第 5488229號及第5717518號中，將複數個折射光學元件與2 片鏡子(爲凹面鏡的主鏡、及在折射元件或平行平面板之入 射面的相反側形成反射面之背面鏡的副鏡）配置於同一軸上 ，將由該複數個折射光學元件所形成之標線板圖案之中間 像，藉主鏡及副鏡使之再成像於晶圓上之反射折射系統。 此反射折射系統，係在複數個折射光學元件後接著配置主 鏡及副鏡，照明光通過主鏡的一部份依副鏡、主鏡之順序 反射，進一步的通過副鏡的一部份到達晶圓上。在本案國 際申請之指定國或選擇國國內法令允許之範圍內，援用上 述美國專利之揭示作爲本說明書內容的一部份。 再者，作爲反射折射型之投影光學系統，亦可使用例 如具有圓形像場(Image field)、且物體面側及像面側皆爲遠 心、同時其投影倍率爲1M倍或1/5倍的縮小系統。又， 若爲具備此反射折射型之投影光學系統的掃瞄型曝光裝置 時’亦可是照明光之照射區域在投影光學系統之視野內大 致以其光軸爲中心，且規定爲沿與標線板或晶圓之掃瞄方 向大致成直交方向延伸之矩形槽狀者。根據該種具備反射 折射型之投影光學系統的掃瞄型曝光裝置 > 例如即使使用 41 本紙張尺度適用令國國家標準（CNS)A4規格（210 X 297公S ) — 1. '1------^----1---訂—-------線. (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局負工消费合作杜印盟 4 經濟部智慧財產局員工消費合作社印製 4391】S Α7 ___— Β7__ 五、發明說明（4) 波長爲157nm左右之F2雷射光作爲曝光用〔照明光，亦能將 100nmL/S圖案左右的微細圖案，高精度的複製於晶圓上 〇 又，作爲晶圓平台或標線板平台中一方之驅動系統， 可使用揭示於美國專利第5623853號或美國專利第 55281 18號等之線性馬達，此時，無論採用使用空氣軸承 之空氣浮上型、或使用羅侖茲力或反作用力之磁氣浮上型 中何者皆可。在本案國際申請之指定國或選擇國國內法令 允許之範圍內，援用上述美國專利之揭示作爲本說明書內 容的一部份。 又，前述平台，可以是沿軌道移動之者，亦可以是不 設置軌道之無軌道式者。 因標線板平台之移動所產生的反作用力，例如可使用 揭示於特開平8-330224號公告及與此對應之美國專利第 5874820號之框架構件，以機械性之方式釋放至地板(地面) 。在本案國際申請之指定國或選擇國國內法令允許之範圍 內，援用上述日本專利公告及美國專利之揭示作爲本說明 書內容的一部份。 此外’本發明之曝光裝置，如前述實施形態中之說明 般’係將構成該裝置之各個構成要素以電氣的、機械的或 光學的方式連結組成，進而能以高精密度、高速的對基板 進行位置控制’提昇生產率以高精密度進行曝光。再者， 曝光裝置之組裝’最近是能在溫度及潔淨度皆受到管理之 無塵室內進行。 42 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公3 ) mil I I^---- - -訂·! — 1!1_ 線' {請先閱讀背面之注意事項再填寫本頁) 6 A7 6 A7 經濟部智慧財產局員工消費合作社印製 B7 五、發明說明（y) -tf· 《元件製造方法》 接著，說明在微影製程中使用上述曝光裝置及其曝光 方法之元件製造方法的實施形態° 第12圖，係顯示元件(1C或LSI等的半導體晶片、液 晶面板、CCD、薄膜磁頭、微元件等）之製造例的流程圖。 如該第12圖所示’首先’於步驟301(設計步驟）中，進行 元件之功能性能設計(例如’半導體元件之電路設計等）， 進行用以實現該機能之圖案設計。接著，於步驟302(光罩 製作步驟）中，製作形成有所設計之電路圖案的光罩(標線 板）。另一方面，於步驟3〇3(晶圓製造步驟）中，使用矽等 材料製造晶圓。 其次，於步驟304(晶圓處理步驟）中，使用於步驟301 〜303中所準備之光罩(標線板)及晶圓，如後述般，使用微 影技術等於晶圓上形成實際的電路。接著，於步驟305(元 件組裝步驟）中，使用在步驟304中處理過的晶圓進行元件 組裝。此步驟305中，視需要包含切割步驟、打線步驟、 及封裝步驟(晶片封入)等之步驟。 最後，於步驟3〇6(檢查步驟)中，進行以步驟305所製 作之元件的動作確認測試、耐久性測試等之檢查。經過上 述步驟後完成一兀件，始得出貨。 第Π圖，係顯示爲半導體元件時，前述步驟304之 詳細的流程圖。第13圖中，步驟311(氧化步驟)係使晶圓 之表面氧化。步驟312(化學汽相沉積(CVD)步驟)係在晶圓 43 本紙張尺度適用t國國家標準（CNS)A4規格（210 X 297公釐） —. . I 裝--------訂---------線 . (請先閲讀背面之注意事項再填寫本頁) …卜 A7 ______B7______ 五、發明說明（w) 表面形成絕緣膜。步驟313(電極形成步驟/係在晶圓上藉蒸 鍍形成電極。步驟314(離子植入步驟)係將離子打入晶圓。 上述步驟311〜步驟314之各個步驟，構成晶圓處理之各 階段的前處理製程，於各階段中視需要加以選擇實施。 晶圓處理之各階段中，結束上述前處理製程後，即如 下述般實行後處理製程。此後處理製程中，首先，於步驟 315(光阻形成步驟）中，於晶圓上塗佈感光劑。接著，於步 驟316(曝光步驟）中，使用前述曝光裝置100及其曝光方法 將光罩之電路圖案複製於晶圓上。其次，於步驟317(顯像 步驟)中，使已進行曝光之晶圓顯像，於步驟318(蝕刻步驟 )中，將殘存光阻劑之部份以外的部份藉蝕刻加以去除。然 後，於步驟319(光阻劑去除步驟)中，將已完成蝕刻而不需 要之光阻劑加以去除。 藉重複此等前處理製程及後處理製程，於晶圓上形成 多層的電路圖案。 根據以上所說明之本實施形態的元件製造方法，由於 曝光製程(步驟316)係使用前述實施形態之曝光裝置1(30及 其曝光方法進行曝光，是以能因曝光精密度的提昇，而意 良好之良率生產高積體度的元件。 [產業上可利用性] 如上述之說明般，本發明之平面馬達裝置及其驅動方 法、以及其組裝方法，適於謀求提昇可動構件之位置控制 性及減少消耗電力。此外，本發明之平台裝置及其驅動方 44 本紙張尺度適堉中國國家標準（CNS)A4規格（210 X 297公釐） <靖先閱讀背面之注意事項再填寫本頁) 裝------ 訂---------線 經濟部智慧財產局員工消费合作杜印製 43 9116 A7 B7 五、發明說明（ 法，適於提昇移動体之位置控制性。再者，本發明之曝光 裝置及曝光方法，適於在製造積體電路等之微元件的微影 製程中，以良好的精密度將微細圖案重疊複數層形成於晶 圓等之基板上。又，本發明之元件製造方法，適於製造具 有微細圖案之元件。 ------ ------3R---) 1---訂- ------- -線 (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消费合作社印製 45 本紙張尺度適用中國圉家標準（CNS)A4規格（210 X 297公蹵）Printed by the cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. For example, when an electron beam is used, lanthanum hexaboride (LaB6) and sister (Ta) can be used as the electron gun. Furthermore, when an electron beam is used, a configuration using a photomask or a configuration in which a pattern is formed on a substrate by direct drawing with an electron beam without using a photomask may be used. That is, as long as it is an electron beam exposure device using an electron optical system as the exposure optical system, it does not matter whether it is a beam beam type, a variable beam type, a cell projection type, or a blanking light. Either a blanking aperture (Blanking aperture) type or an EBPS (Electron beam paramatic) type, the present invention can be used. As the vacuum ultraviolet light, ArF excimer laser light, F2 laser light, etc. are used, but it is not limited to this. Laser light of a single wavelength in an infrared region or a visible region emitted from a DFB semiconductor laser or an optical fiber laser may also be used. For example, an optical fiber amplifier such as Er (or both bait and mirror) is used to increase the amplitude, and a non-linear optical crystal is used to transform the harmonics of the wavelength of ultraviolet light. For example, if the oscillation wavelength of a single-wavelength laser is set in the range of 1.51 to 1.59, the output will generate 8 times higher harmonics in the range of 189 to 199 nm, or 10 times in the range of 151 to 159 nm. Higher harmonics. Especially when the oscillation wavelength is set in the range of 1.544 ~ 1.553 / zm, it can obtain 8 times higher harmonics with a wavelength in the range of 193 ~ 194nm, that is, ultraviolet light with approximately the same wavelength as the ArF excimer laser light. If the oscillation wavelength is set in the range of 1.57 ~ 1.58 ^ m, 10 times higher harmonics in the range of 157 ~ 158nm can be obtained, that is, ultraviolet light with the same wavelength as the laser light . In addition, if the oscillation wavelength is set in the range of 1.03 to 1.12 / zm, 39 paper standards are applicable to 3 national standards (CNS) A4 specifications (21 × X 297 mm) 1111 J --- 11111 Order — I — One III-I (Please read the precautions on the back before filling this page) A7 B7 V. Description of the invention 〇Ί) 'That is, the output wavelength is 7 times higher harmonics within the range of 147 ~, especially when the oscillation wavelength is set to 1.099 ~ When it is within the range of 1.106 " m, it can obtain 7 times higher harmonics with a wavelength in the range of 157 ~ 158nm, that is, ultraviolet light with approximately the same wavelength as F2 laser light. At this time, for example, a mirror-doped fiber laser can be used as the single-wavelength laser. The configurations of the illumination optical system and the projection optical system described in the foregoing embodiments are merely examples, and the present invention is not limited thereto. For example, the magnification of a projection optical system does not have to be a reduction system, but any of an equal magnification or an expansion system may be used. As a projection optical system, if far-ultraviolet rays such as excimer lasers are used, materials such as quartz or fluorite that can penetrate far-ultraviolet rays can be used as glass materials. If F2 lasers or X-rays are used, they are used. The optical system of the reflective refracting system or the reflective system (the reflective plate also uses reflective objects). Furthermore, if an electron beam is used, an electronic optical system composed of an electronic lens and a deflector may be used. It is needless to say that the light path through which the electron beam passes must be in a vacuum state. Further, in an exposure apparatus using vacuum ultraviolet light (VUV light) having a wavelength of 200 nm or less, it is also possible to consider using a reflective refractive system as a projection optical system. As this reflection-refraction type projection optical system, for example, Japanese Patent Application Laid-Open No. 8-171054 and US Patent No. 5686672, and Japanese Patent Application Laid-Open No. 10-20195 and corresponding US can be used. Patent No. 5835275 has a refracting system with a beam splitter and a concave mirror as reflective optical elements. In addition, it can also be disclosed in, for example, Japanese Patent Laid-Open No. 8-334695 and corresponding US Patent No. 5689377, and Japanese Patent Laid-Open No. 10-3039 and corresponding US 40 paper standards applicable to China Lijia Standard (CNS > A4 specification (210 X 297 mm) (Please read the precautions on the back before filling out this page).) Printed by A7 B7 4391 1 6 of the Property Cooperative Consumers Co., Ltd. 5. Description of Invention (β) National Patent Application No. 873605 (application date: June 12, 1997) without concave beam as a reflective optical element Reflective refraction system. To the extent permitted by the domestic ordinances of the designated or selected country of the international application in this case, the disclosures of the above-mentioned gazettes and the corresponding U.S. patents and U.S. patent applications corresponding to each of these gazettes are used as part of the content of this specification. In addition, it is also possible to use a plurality of refractive optical elements and two mirrors (the main mirror of a concave mirror, and the refractive element or a parallel plane plate) disclosed in U.S. Patent Nos. 5031976, 5488229, and 5717518. The secondary mirror of the rear mirror forming the reflective surface on the opposite side of the incident surface is arranged on the same axis, and the intermediate image of the reticle pattern formed by the plurality of refractive optical elements is re-imaged by the primary mirror and the secondary mirror. Reflective refraction system on the wafer. This deflective refraction system is configured by a plurality of refractive optical elements and then a main mirror and a secondary mirror. Illumination light is reflected in the order of the secondary mirror and the main mirror through a part of the main mirror, further Reached on the wafer through a part of the secondary mirror. To the extent allowed by the domestic laws of the designated or selected country of the international application in this case, the disclosure of the above-mentioned U.S. patent is used as part of the contents of this specification. A type of projection optical system can also be used, for example, a reduction system that has a circular image field, the object side and the image side are telecentric, and the projection magnification is 1M or 1/5 times. In the case of a scanning exposure device provided with such a reflection-refraction-type projection optical system, 'the illumination area of the illumination light may be approximately centered on its optical axis within the field of view of the projection optical system, and It is defined as a rectangular groove shape extending in a direction substantially orthogonal to the scanning direction of the reticle or wafer. According to this scanning-type exposure apparatus equipped with a reflective optical system of a reflection-refraction type, for example, even if 41 sheets of paper are used The standard applies to the national standard (CNS) A4 specification (210 X 297 male S) — 1. '1 ------ ^ ---- 1 --- order --------- line. ( Please read the notes on the back before filling out this page) Duplicated work cooperation of the Intellectual Property Bureau of the Ministry of Economic Affairs Du Yinmeng 4 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 4391] S Α7 ___— Β7__ 5. Description of the invention (4) Wavelength F2 laser light of about 157nm is used as exposure light (illumination light, and can also copy fine patterns of about 100nmL / S pattern on the wafer with high accuracy.It also drives one of the wafer platform or reticle platform. The system can use linear motors disclosed in US Patent No. 5,623,853 or US Patent No. 55281 18, etc. At this time, regardless of whether an air bearing type using air bearings or a magnetic air bearing type using Lorentz force or reaction force is used Anyone can do it. To the extent permitted by the domestic laws of the designated or selected country of the international application in this case, the disclosure of the aforementioned U.S. patent is incorporated as part of the contents of this specification. In addition, the aforementioned platform may be a person moving along a track, or a non-track type without a track. The reaction force caused by the movement of the reticle platform can be mechanically released to the floor (ground) using, for example, the frame member disclosed in JP-A-8-330224 and the corresponding U.S. Patent No. 5,878,420. . To the extent permitted by the domestic laws of the designated or selected country of the international application in this case, the disclosures of the aforementioned Japanese Patent Publications and U.S. Patents are incorporated as part of the contents of this specification. In addition, the "exposure device of the present invention is as described in the foregoing embodiment" is that the constituent elements constituting the device are electrically, mechanically, or optically connected to each other, so that the substrate can be aligned with high precision and speed. Perform position control to increase productivity and perform exposure with high precision. Furthermore, the assembly of the exposure device has recently been performed in a clean room in which both temperature and cleanliness are managed. 42 This paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 male 3) mil II ^ ------Order ·! — 1! 1_ Line '{Please read the precautions on the back before filling this page ) 6 A7 6 A7 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs B7 V. Description of the Invention (y) -tf" Element Manufacturing Method "Next, the component manufacturing using the above exposure device and exposure method in the lithography process will be explained Embodiment of the method ° FIG. 12 is a flowchart of a manufacturing example of a display element (a semiconductor wafer such as 1C or LSI, a liquid crystal panel, a CCD, a thin film magnetic head, and a micro-device). As shown in FIG. 12, “first” in step 301 (design step), the functional performance design of the device (for example, the circuit design of a semiconductor device, etc.) is performed, and a pattern design for realizing the function is performed. Next, in step 302 (photomask making step), a photomask (reticle) is formed to form a designed circuit pattern. On the other hand, in step 303 (wafer manufacturing step), a wafer is manufactured using a material such as silicon. Next, in step 304 (wafer processing step), the photomask (reticle plate) and wafer prepared in steps 301 to 303 are used. As described later, the lithography technique is used to form an actual circuit on the wafer. . Next, in step 305 (component assembly step), the wafer processed in step 304 is used for component assembly. This step 305 includes steps such as a dicing step, a wire bonding step, and a packaging step (wafer encapsulation) as needed. Finally, in step 306 (inspection step), inspections such as an operation confirmation test and an endurance test of the element prepared in step 305 are performed. After the completion of the above steps, a unit is completed and shipped. Figure Π is a detailed flowchart of the aforementioned step 304 when it is shown as a semiconductor element. In Fig. 13, step 311 (oxidation step) is to oxidize the surface of the wafer. Step 312 (Chemical Vapor Deposition (CVD) step) is performed on wafer 43. The paper size is applicable to the national standard (CNS) A4 specification (210 X 297 mm). Order --------- line. (Please read the precautions on the back before filling in this page)… B A7 ______B7______ 5. Description of the invention (w) An insulating film is formed on the surface. Step 313 (electrode formation step / forms an electrode by evaporation on a wafer. Step 314 (ion implantation step) implants ions into the wafer. Each of the above steps 311 to 314 constitutes each of the wafer processing steps. The pre-processing process at each stage can be selected and implemented as necessary in each stage. After the pre-processing process is completed in each stage of wafer processing, the post-processing process is performed as follows. In the post-processing process, first, at step 315 ( In the photoresist forming step), a photosensitive agent is coated on the wafer. Then, in step 316 (exposure step), the circuit pattern of the photomask is copied on the wafer using the exposure apparatus 100 and the exposure method thereof. Second, In step 317 (imaging step), the exposed wafer is developed, and in step 318 (etching step), the portion other than the remaining photoresist is removed by etching. Then, in step In 319 (Photoresist Removal Step), the photoresist that is not required for etching is removed. By repeating these pre-processing and post-processing processes, a multilayer circuit pattern is formed on the wafer. The device manufacturing method of this embodiment described above, because the exposure process (step 316) is performed by using the exposure device 1 (30 and the exposure method of the foregoing embodiment) for exposure, it is good because the exposure precision is improved. [Industrial applicability] As described above, the planar motor device and its driving method, and its assembling method of the present invention are suitable for improving the position controllability of a movable member. In addition, the platform device and its driver of the present invention 44 The paper size is suitable for the Chinese National Standard (CNS) A4 specification (210 X 297 mm) < Jing first read the precautions on the back before filling out this page ) Install ------ Order --------- Consumption Cooperation between Employees and Intellectual Property Bureau of the Ministry of Economics Du Duan 43 9116 A7 B7 V. Description of the invention (method, suitable for improving the position control of mobile objects In addition, the exposure device and exposure method of the present invention are suitable for forming a micro-pattern on a substrate of a wafer or the like by superimposing a plurality of fine patterns with good precision in a lithography process for manufacturing micro-devices such as integrated circuits. In addition, the device manufacturing method of the present invention is suitable for manufacturing a device having a fine pattern. ------ ------ 3R ---) 1 --- order ----------- -line (Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs's Consumer Cooperatives 45 This paper size applies to the Chinese Family Standard (CNS) A4 (210 X 297 cm)