TWI231950B - Substrate processing apparatus and cleaning method - Google Patents

Substrate processing apparatus and cleaning method Download PDF

Info

Publication number
TWI231950B
TWI231950B TW092131289A TW92131289A TWI231950B TW I231950 B TWI231950 B TW I231950B TW 092131289 A TW092131289 A TW 092131289A TW 92131289 A TW92131289 A TW 92131289A TW I231950 B TWI231950 B TW I231950B
Authority
TW
Taiwan
Prior art keywords
container
cleaning
nozzle
storage tank
substrate
Prior art date
Application number
TW092131289A
Other languages
English (en)
Chinese (zh)
Other versions
TW200425224A (en
Inventor
Tsuyoshi Yamasaki
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200425224A publication Critical patent/TW200425224A/zh
Application granted granted Critical
Publication of TWI231950B publication Critical patent/TWI231950B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW092131289A 2002-11-28 2003-11-07 Substrate processing apparatus and cleaning method TWI231950B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002345418 2002-11-28

Publications (2)

Publication Number Publication Date
TW200425224A TW200425224A (en) 2004-11-16
TWI231950B true TWI231950B (en) 2005-05-01

Family

ID=34260206

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092131289A TWI231950B (en) 2002-11-28 2003-11-07 Substrate processing apparatus and cleaning method

Country Status (3)

Country Link
KR (1) KR101018963B1 (ko)
CN (1) CN100392799C (ko)
TW (1) TWI231950B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5132108B2 (ja) 2006-02-02 2013-01-30 株式会社Ｓｏｋｕｄｏ 基板処理装置
KR101258002B1 (ko) * 2010-03-31 2013-04-24 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법
JP6762824B2 (ja) 2016-09-26 2020-09-30 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
JP6759279B2 (ja) * 2018-05-31 2020-09-23 株式会社Ｓｃｒｅｅｎホールディングス 減圧乾燥装置および減圧乾燥方法
JP7034880B2 (ja) * 2018-10-05 2022-03-14 株式会社荏原製作所 洗浄装置、これを備えためっき装置、及び洗浄方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2893149B2 (ja) * 1991-12-05 1999-05-17 東京エレクトロン株式会社 塗布装置
TW285779B (ko) * 1994-08-08 1996-09-11 Tokyo Electron Co Ltd
JP3518953B2 (ja) 1996-06-28 2004-04-12 大日本スクリーン製造株式会社 回転式基板処理装置
US5947136A (en) * 1996-09-10 1999-09-07 Silicon Valley Group Inc. Catch cup cleaning system
JP3250095B2 (ja) 1996-11-15 2002-01-28 東京エレクトロン株式会社 洗浄装置及び洗浄方法
JP3276601B2 (ja) 1997-01-22 2002-04-22 東京エレクトロン株式会社 洗浄処理方法及び洗浄処理装置
JP3395696B2 (ja) * 1999-03-15 2003-04-14 日本電気株式会社 ウェハ処理装置およびウェハ処理方法
KR100434485B1 (ko) * 1999-10-08 2004-06-05 삼성전자주식회사 포토레지스트 스트립퍼 조성물 및 이를 이용한 포토레지스트 스트립 방법
JP2002028586A (ja) * 2000-07-17 2002-01-29 Central Conveyor Kk パレット洗浄乾燥方法とその装置

Also Published As

Publication number Publication date
TW200425224A (en) 2004-11-16
KR101018963B1 (ko) 2011-03-03
CN100392799C (zh) 2008-06-04
KR20040047602A (ko) 2004-06-05
CN1505099A (zh) 2004-06-16

Similar Documents

Publication Publication Date Title
KR100284559B1 (ko) 처리방법 및 처리장치
TWI244131B (en) Liquid processing apparatus and liquid processing method
US10857570B2 (en) Substrate processing apparatus
KR100430461B1 (ko) 액막형성장치및액막형성방법
US7543593B2 (en) Substrate processing apparatus
JP3587723B2 (ja) 基板処理装置および基板処理方法
KR100549879B1 (ko) 도포장치용 캡의 세정 처리 방법
KR100588110B1 (ko) 도포막형성장치및방법
JP5454407B2 (ja) 液処理装置及び液処理方法
KR20090085547A (ko) 기판 처리 장치
JP3177728B2 (ja) 処理装置及び処理方法
KR100508575B1 (ko) 세정처리방법및장치와기판처리용장치
JP2886382B2 (ja) 塗布装置
KR19980018527A (ko) 처리장치
TWI231950B (en) Substrate processing apparatus and cleaning method
JP3958572B2 (ja) 基板処理装置及び基板処理方法
JP2893146B2 (ja) 塗布装置
JP2004193568A (ja) 基板処理装置及び洗浄方法
JPH07326571A (ja) 処理方法及び処理装置
JP4029066B2 (ja) 基板処理装置
JP2001113217A (ja) レジスト塗布処理装置およびレジスト塗布処理方法
JP3289208B2 (ja) 洗浄処理方法及び洗浄処理装置
JP2936505B2 (ja) 塗布装置
JP4286822B2 (ja) 洗浄処理装置
JP3782298B2 (ja) 洗浄処理装置

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees