200425224 (1) 玖、發明說明 【發明所屬之技術領域】 本發明係關於基板處理裝置及洗淨方法。 【先前技術】 在LCD的製造過程，爲了要在LCD用的玻璃基板上 形成ITO( Indium Tin Oxide)薄膜或電極圖案，利用與 製造半導體裝置時所用者相同的光平版印刷（photo lithography )技術。光平版印刷技術是將光阻劑塗敷在玻 璃基板，對此曝光，再顯像。 光阻劑的塗敷處理是，例如將玻璃基板收容在旋轉的 杯內，對基板上供應光阻劑，蓋上杯蓋，令杯與基板一體 轉動，藉此令光阻劑擴散到基板表面的整個面上。 這種塗敷處理所用的杯內部會附著，因其旋轉的離心 力而飛散的光阻劑，或成霧狀的光阻劑。這種附著物在乾 燥後成爲產生顆粒的原因。爲了解決這個問題，現況是， 在杯內設可吐出洗淨液的噴嘴，將洗淨液吐出在上述附著 物以去除附著物。這種裝置揭示在例如日本國特開平8-255789號公報的第6圖。 另有提案，配設一種將洗淨液儲存在專用的容器內， 令該容器在杯內旋轉，藉此，令洗淨液從形成在該容器的 孔向外飛散，以洗淨杯子的洗淨工具的裝置。這種裝置是 揭示在，例如日本國特許廳所發行的特開平5-8243 5號公 報的第2、4、6圖（但在此公報是處理半導體晶圓，而不 -4- (2) (2)200425224 是處理玻璃基板的裝置）。 然而，專利文獻1所示裝置在例如其第6圖，設有洗 淨蓋子用的蓋體洗淨用噴嘴，但旋轉夾頭（藉由真空作用 保持基板，使基板轉動的構件）阻擋從洗淨蓋體用噴嘴吐 出的洗淨液。因此，本例幾乎無法洗淨蓋體。這種蓋體的 內側特別容易被霧狀的光阻劑污染，這種蓋體的污染必須 去除。 在專利文獻1所示的裝置，如果將旋轉夾頭設計成較 小型，便可以洗淨蓋體。但是，從近來的玻璃基板的大型 化的觀點，將旋轉夾頭設計成較小型會有安全性等的問題 。如果考慮，目前的旋轉夾頭是以跟基板的大小差不多同 大者逐漸成爲主流，則蓋體的洗淨會愈來愈困難。 另一方面，專利文獻2所示的裝置則未配設關閉杯子 上部的開口部的蓋體，但每一次洗淨杯子，均需要裝卸洗 淨工具，作業數增加，十分麻煩。同時，將這種洗淨工具 應用在專利文獻1所示的裝置，也無法洗淨容器的蓋體。 專利文獻1日本國特開平8-25 5 7 89號公報 專利文獻2日本國特開平5-8243 5號公報 【發明內容】 鑑於以上所述的實情，本發明的目的在提供，能夠確 實洗淨杯子等容器或開閉該容器的蓋體，可以節省該洗淨 處理用的作業手續的基板處理裝置及洗淨方法。 爲了達成上述目的，本發明的基板處理裝置具備有： -5· (3) (3)200425224 將基板保持成可轉動狀的保持構件；具有放進及取出基板 的開口部，收容由上述保持構件保持的基板，同時與上述 保持構件同步轉動的容器；可裝卸狀設在上述開口部，用 以開閉上述容器的蓋體；裝設在上述容器，同時設在上述 保持構件的周圍中的至少一部分，至少可在內部儲存洗淨 上述蓋體用的洗淨液的儲存槽；以及令上述容器轉動，藉 由其離心力使儲存在上述儲存槽的洗淨液向上述蓋體飛散 的旋轉驅動部。 本發明是在，例如在基板上塗敷塗敷液後，以蓋體覆 蓋容器的狀態下令容器旋轉，藉由其離心力使洗淨液從儲 存槽向蓋體飛散。此儲存槽是設在保持構件的周圍，因此 ，不會像傳統方式，飛散的洗淨液被保持構件阻擋，例如 ，也可以使洗淨液飛散到靠近蓋體的中央部，可以洗淨蓋 體。同時，附著於蓋體的洗淨液因離心力而流向轉動的外 側，該流動的洗淨液會到達容器，因此也可以洗淨容器。 而且，本發明不必如傳統方式每次洗淨時裝卸洗淨工具， 可以節省洗淨處理時的作業手續。 在本發明，洗淨液可以使用，例如桂皮酮等，具體上 晏 3 -甲氧基丙酸甲酯（MMP，沸點：145°C，黏度： l.lcps )之外，乳酸乙酯（EL，沸點：154°C，黏度： 2.6cps) 、3-甲氧基丙酸乙酯（EEP，沸點：170。(：，黏度 :1 .3cps )、丙酮酸乙酯（EP，沸點：144°C，黏度： 1.2cps )、乙酸丙二醇單甲基醚酯（PGMEA，沸點： 146°C’ 黏度：1.3cps) 、2-庚酮（沸點：152°C，黏度： -6- (4) (4)200425224 1.1 cps )環己酮（arc的溶劑）等在這個領域所習用者。 同時，在本發明，「與……同步」含有，保持構件與 容器以例如一體狀轉動的意思，或者含有，例如藉由個別 獨立的驅動源，分別使保持構件與容器同步轉動的意思。 本發明的一個形態是，在面向該儲存槽的上述蓋體的 一側’形成有用以吐出儲存在上述儲存槽的洗淨液的孔。 藉此’可以確實使洗淨液向蓋體飛散。同時，也可以用線 狀的開縫取代孔。 本發明的一個形態是，上述孔是形成爲，上述洗淨槽 的吐出方向較上述容器旋轉的轉軸方向朝向旋轉中心側。 藉此，可以確實向蓋體中央部吐出洗淨液。同時，也可以 用線狀的開縫取代孔。 本發明的一個形態是，在上述儲存槽的內部進一步備 有供應上述洗淨液的洗淨液供應機構。同時，上述洗淨液 供應機構具備有：向上述儲存槽內部吐出上述洗淨液的噴 嘴；及使上述噴嘴在上述容器外的規定位置與上述保持構 件的直上位置之間移動的移動機構。藉此，可以例如，每 當完成規定片數的基板的的塗敷處理後，自動供應洗淨液 進行洗淨，作業很容易。或者，每當完成一片基板的塗敷 處理後供應洗淨液，便可以恆常保持容器或蓋體沒有受污 染的狀態，可以確實防止發生顆粒。 本發明的一個形態是，進一步具備有：排列在上述儲 存槽內部，在由上述保持構件所保持的基板的周圍方向’ 將該儲存槽內部區分成複數個隔間的複數個分隔構件°藉 (5) (5)200425224 此，可以盡力抑制因容器的轉動所產生的洗淨液與容器的 相對移動，可以增大吐出洗淨液的衝力、吐出量。 本發明的一個形態是’上述複數個分隔構件分別具有 與上述儲存槽成面對面的側面’上述側面的一部分與上述 儲存槽分開空隙配置’另一部分是抵接於上述儲存槽。或 者，上述複數個分隔構件中的至少一個分隔構件形成有， 使上述複數個隔間相互連通的連通口。藉此’可以避免洗 淨液滯留在各室’可以使洗淨液通過空隙或連通口到達整 個區域。 本發明的一個形態是，上述空隙是設在靠近上述儲存 槽的上述容器的轉動中心側的部位。或者，上述連通口是 設在靠近上述分隔構件的上述容器的轉動中心側的部位。 藉此，例如，由上述洗淨液供應機構使洗淨液儲存在儲存 槽內部時，洗淨液可以通過空隙或連通口到達整個區域， 且在洗淨處理時，因容器的轉動，洗淨液在儲存槽內部因 離心力而流到外周側。其結果，洗淨液可以不必流通複數 個隔間，可滯留在各室，進行良好的洗淨液的吐出動作。 本發明的一個形態是，上述複數個分隔構件中的至少 一個分隔構件是呈板狀，對排列該複數個分隔構件的排列 方向傾斜配設之。藉此，可以使儲存槽內部的洗淨液配合 容器的轉動方向流通，可望有更好的洗淨液的吐出動作。 本發明的洗淨方法是，在具有可放進取出基板用的開 口部，經由該開口部收容基板的容器內使用洗淨液，至少 洗淨成可裝卸狀配設在上述開口部用以開閉上述容器的蓋 -8 - (6) (6)200425224 體的洗淨方法，具備有：向裝設在上述容器，同時設在上 述容器內保持基板的保持構件周圍的至少一部分的儲存上 述洗淨液的儲存槽，供應該洗淨液的過程；及令上述容器 旋轉，而藉由其離心力，使儲存在上述儲存槽的洗淨液向 上述蓋體飛散的過程。 本發明是，例如在基板上塗敷塗敷液後，向儲存槽供 應洗淨液，然後以蓋體覆蓋在容器的狀態下令容器轉動， 藉其離心力使洗淨液從儲存槽向蓋體飛散。因爲此儲存槽 是設在保持構件的周圍，因此，不會如傳統的保持構件阻 擋洗淨液，例如，也可以使洗淨液飛散到靠近蓋體的中央 部，可以洗淨蓋體。 本發明的其他基板處理裝置具備有：將基板保持成可 轉動狀的保持構件；具有放進及取出基板的開口部，收容 由上述保持構件保持的基板，同時能夠與上述保持構件同 步轉動的第1容器；可裝卸狀設在上述開口部，用以開閉 上述第1容器的蓋體；裝設在上述第1容器，同時，設在 上述保持構件周圍的至少一部分，至少在內部儲存用以洗 淨上述蓋體的洗淨液的儲存槽；令上述第1容器轉動，藉 由其離心力使儲存在上述儲存槽的洗淨液向上述蓋體飛散 的旋轉驅動部；收容上述第1容器的第2容器；爲了至少 洗淨上述第1容器的外周部而設在上述第2容器的具有洗 淨用噴嘴的洗淨機構。 本發明是，例如在基板上塗敷塗敷液後，以蓋體覆蓋 在容器的狀態下令容器轉動，藉其離心力使洗淨液從儲存 (7) (7)200425224 槽向蓋體飛散。因爲此儲存槽是設在保持構件的周圍，因 此，不會如傳統的保持構件阻擋洗淨液，例如，也可以使 洗淨液飛散到靠近蓋體的中央部，可以洗淨蓋體。同時’ 在第2容器設有用以洗淨第1容器的外周部的洗淨用噴嘴 。因此，例如，藉由轉動驅動部使第1容器轉動同時從洗 淨用噴嘴吐出洗淨液，便可以連同蓋體至少可以洗淨第1 容器的外周部。 本發明的一個形態是，上述洗淨機構的上述洗淨噴嘴 具有：可洗淨上述第1容器的側壁外周面的第1噴嘴；及 用以洗淨上述第1容器的外側底面的第2噴嘴。藉此，例 如，可以藉由轉動驅動部使第1容器轉動，同時，分別由 第1噴嘴、第2噴嘴吐出洗淨液，洗淨第1容器的側壁外 周面，第1容器的外側底面。 本發明的一個形態是，上述上述洗淨機構的上述洗淨 噴嘴具有：可洗淨上述第2容器的內部底面的第3噴嘴。 藉此，可由第3噴嘴吐出洗淨液，洗淨第2容器的內部底 面。 本發明的一個形態是’上述基板處理裝置進一步具有 :可經由形成在上述儲存槽的供應口 ’向該儲存槽內部吐 出上述洗淨液的吐出用噴嘴；以及令上述吐出用噴嘴至少 在上述第1容器外部’與上述供應口的直上方之間移動的 移動機構。藉此’例如’可藉由驅動機構將吐出噴嘴對準 儲存槽的供應口’以儲存洗淨液。 本發明的一個形態是，上述基板處理裝置進一步具有 -10- (8) (8)200425224 :可洗淨上述第1容器的內側底面的第4噴嘴；用以洗淨 上述第1容器側壁的內周面及上面的第5噴嘴；以及將上 述吐出用噴嘴、上述第4噴嘴及上述第5噴嘴成一體支持 的支持體。藉此，例如，使第4噴嘴及第5噴嘴分別移動 至第1容器的上方、第1容器的側壁上方時，也可以利用 儲存洗淨液時所利用的移動機構。同時’以第4噴嘴及第 5噴嘴分別移動至第1容器的上方、第1容器的側壁上方 的狀態下，從第4噴嘴、第5噴嘴吐出洗淨液，藉此洗淨 第1容器的內側底面，及第1容器的側壁內周面及上面。 本發明的一個形態是，至少形成有兩個上述供應口。 藉此，例如，在儲存槽儲存洗淨液時，從一個供應口開始 注入，在儲存的途中藉轉動驅動部使第1容器轉動，再從 儲存槽的別的供應口注入。因爲能夠從不同的供應口使洗 淨液流到儲存槽內的各個部位，因此，可以縮短洗淨液的 儲存時間。 本發明的其他基板處理裝置具備有：將基板保持成可 轉動狀的保持構件；具有放進及取出基板的開口部，收容 由上述保持構件保持的基板，同時能夠與上述保持構件同 步轉動的第1容器；可裝卸狀設在上述開口部，用以開閉 上述第1容器的蓋體；裝設在上述第1容器，同時，設在 上述保持構件周圍的至少一部分，至少在內部儲存用以洗 淨上述蓋體的洗淨液的儲存槽；令上述第1容器轉動，藉 由其離心力使儲存在上述儲存槽的洗淨液向上述蓋體飛散 的旋轉驅動部；配設成可在上述第1容器外部，與形成在 -11 . (9) (9)200425224 上述儲存槽的供應口的直上方之間移動’經由上述供應口 向該儲存槽內部吐出上述洗淨液的吐出用噴嘴；可洗 '淨上 述第1容器的內側底面的底面洗淨用噴嘴；用以洗淨上述 第1容器側壁的內周面及上面的側壁洗淨用噴嘴；以及將 上述吐出用噴嘴、上述底面洗淨用噴嘴及上述側壁洗淨用 噴嘴成一體支持的支持體。 本發明可以藉由移動機構將吐出用噴嘴移動至儲存槽 的供應口直上方以儲存洗淨液。同時’分別將底面洗淨用 噴嘴、側壁洗淨用噴嘴移動至例如第1容器的上方、第1 容器的側壁上方時’也可以利用相同的移動機構。同時’ 以底面洗淨用噴嘴 '側壁洗淨用噴嘴分別移動至第1容器 的上方、第1容器的側壁上方的狀態下，從底面洗淨用噴 嘴、側壁洗淨用噴嘴吐出洗淨液’則可洗淨第1容器的內 側底面，及第1容器的側壁內周面及上面。 本發明的其他洗淨方法具備有：（a)令用以吐出洗 淨液的吐出用噴嘴，與形成在安裝於經由放進及取出基板 的開口部收容基板的第1容器的儲存槽的第1供應口，對 準位置的過程；（b )在上述過程（a )之後，從上述吐出 用噴嘴，經由上述第1供應口向上述儲存槽內吐出洗淨液 的過程；（c)在上述過程（b)之後，使上述第1容器轉 動，藉此令上述吐出用噴嘴，與形成在跟儲存槽的上述第 1供應口不同的其他部位的第2供應口，對準位置的過程 ;(d )在上述過程（c )之後，從上述吐出用噴嘴經由上 述第2供應口向上述儲存槽內吐出洗淨液的過程；（e) -12- (10) (10)200425224 令可洗淨上述第1容器的內側底面的底面洗淨用噴嘴，與 用以洗淨上述第1容器側壁的內周面及上面的側壁洗淨用 噴嘴一體移動，對該第1容器的側壁進行對準位置的過程 ;(f)令上述第1容器以第1種旋轉數旋轉，同時從上 述底面洗淨用噴嘴及上述側壁洗淨用噴嘴吐出上述洗淨液 的過程；（g )令上述第1容器以較第1種旋轉數快的第 2種旋轉數旋轉，藉其離心力，使儲存在上述儲存槽的洗 淨液向可裝卸狀安裝在上述開口部用以開閉上述第1容器 的蓋體飛散的過程。 本發明可以在上述過程（a )至過程（d )，從第1供 應口及與第1供應口不同的第2供應口使洗淨液流到儲存 槽內的各個部位，因此，可以縮短洗淨液的儲存時間。同 時，在過程（e )，將底面洗淨用噴嘴及側壁洗淨用噴嘴 與第1容器對準位置。因此，例如，不需要有不同的移動 機構，因此可以達成低成本化及省空間化。同時，在過程 (f)，以第2旋轉數使第1容器轉動同時吐出洗淨液， 因此可以洗淨第1容器的整個周面。而且，在過程（g) ，令第1容器以較第1種旋轉數快的第2種旋轉數旋轉， 藉此可以使儲存在儲存槽的洗淨液向上述蓋體飛散，以洗 淨蓋體。 本發明的一個形態進一步具備有，（h)在上述過程 (g )之後，令上述第1容器以較第2種旋轉數慢的第3 種旋轉數旋轉，藉此從設在收容第1容器的第2容器的洗 淨用噴嘴向上述第1容器的外周部吐出洗淨液的過程。藉 -13- (11) (11)200425224 此，例如，可以將第1容器的旋轉數抑制在第3種旋轉數 ，同時洗淨第1容器的外周部。 本發明的一個形態進一步具備有’在上述過程（h) 之後，令上述第1容器以較第3種旋轉數快的第4種旋轉 數旋轉的過程。藉此，例如，可以使從第1噴嘴吐出的洗 淨液在第1容器的側壁外周面反射，以洗淨第2容器內部 的側面。 【實施方式】 茲依據附圖說明本發明的實施形態如下。 第1圖是應用本發明的LCD基板的塗敷顯像處理系 統的平面圖，第2圖是其正面圖，第3圖是其背面圖。 此塗敷顯像處理系統1備有：用以載置收容複數片玻 璃基板G的卡匣C的卡匣站2;備有可對基板G施加包 含塗敷光阻劑及顯像的一連串處理的複數個處理單元的處 理部3;與曝光裝置32之間送受基板G用的介面部4, 分別在處理部3的兩端配置卡匣站2及介面部4。 卡匣站2備有用以在卡匣C與處理部3之間運送 LCD基板的運送機構10。而在卡匣站2運進運出卡匣C 。同時，運送機構1〇備有可以在沿卡匣的排列方向配設 的運送路12上移動的運送臂11，藉此運送臂11在卡匣c 與處理部3之間運送基板G。 在處理部3設有··延設在垂直（X方向）於卡匣站2 的卡匣C的排列方向（Y方向）的主運送路3a;及沿此 •14- (12) 200425224 主運送路3a並排配設，包含光阻劑塗敷處理單元 的各處理單元的上游部3b;及並排配設包含顯信 元（DEV )的各處理單元的下游部3c。 在主運送路3a設有，X方向延設的運送路3 沿此運送路3 1移動，用以向X方向運送玻璃基板 送梭23。此運送梭23可以例如藉由支持梢保持基 以運送。同時，在主運送路3 a的介面部4側端窗 用以在處理部3與介面部4之間送受基板〇的_ 單元7。 在上游部3b，於卡匣站2側端部設有，用. G施以洗淨處理的洗滌機洗淨單元（SCR) 20，： 機洗淨單元（SCR) 20的上層配設有用以去除基 的有機物的激元UV處理單元（e-UV) 19。 在洗滌機洗淨單元（SCR) 20的旁邊，配置： 層的用以對玻璃基板G進行熱處理的單元的熱處 塊24及25。在此等熱處理系方塊24、25之間 運送單元5，運送臂5a可以向Z方向及水平方 且可以向Θ方向轉動，因此，可以擷取兩方塊24 各熱處理系統單元，以運送基板G。再者，上述 的垂直運送單元7也具有與此垂直運送單元5相 如第2圖所示，在熱處理系方塊24，從下方 疊兩層用以對基板G實施塗敷光阻劑前的加熱處 焙單元（BAKE )，及藉HMDS氣體施加疏水化處 ,(CT) 〖處理單 1，及可 G的運 板G加 〖設有， ί直運送 >對基板 :此洗滌 反G上 堆疊多 理系方 置垂直 移動， L 25的 理部3 的架構 順序堆 理的烘 理的黏 •15- (13) (13)200425224 著單元（AD)。另一方面，在熱處理系方塊25則從下依 序堆疊有兩層用以對基板G施加冷卻處理的冷卻單元（ COL )，及黏著單元（AD )。 鄰接熱處理系方塊25，在X方向延設光阻劑處理方 塊15。此光阻劑處理方塊15成一體配設有：用以在基板 G塗敷光阻劑的光阻劑塗敷處理單元（CT );藉減壓使上 述塗敷的光阻劑乾燥的減壓乾燥單元（VD );用以去除 本發明的基板G周緣部的光阻劑的邊緣去除器（ER)而 成。在此光阻劑處理方塊15設有，可以在光阻劑塗敷處 理單元（CT )至邊緣去除器（ER )間移動的未圖示的副 臂，藉此副臂在光阻劑處理方塊15內運送基板G。 鄰接光阻劑處理方塊15配設有多層架構的熱處理系 方塊26，在此熱處理系方塊26，堆疊3層用以進行塗敷 光阻劑後的加熱處理的預烘焙單元（PREBAKE )。 如第3圖所示，在下游部3c，於介面部4側端部設 有熱處理系方塊29，在此，從下部依序堆疊有：冷卻單 元（COL ):及用以進行曝光後顯像處理前的加熱處理的 曝光後烘焙單元（PEBAKE)。 鄰接熱處理系方塊29，在X方向延設顯像處理單元 (DEV )。此顯像處理單元（DEV )的隔鄰設有熱處理系 方塊28及27，此等熱處理系方塊28及27之間設有跟上 述垂直運送單元5相同架構，可擷取兩方塊28及27的垂 直運送單元6。同時，在顯像處理單元（DEV)端部之上 ，設有i線處理單元（i-UV) 33。 -16· (14) (14)200425224 在熱處理系方塊28，從下部依序堆疊有：冷卻單元 (COL);及用以對基板G施加顯像後的加熱處理的後烘 焙單元（POBAKE)。另一方面，熱處理系方塊27也同 樣，從下部依序堆疊有：冷卻單元（COL );及兩層後烘 焙單元（POBAKE )。 在介面部4，於正面側設有標題機及周邊曝光單元（ Titler/ EE) 22，鄰接垂直運送單元7配置延伸冷卻單元 (EXTCOL ) 35，在背面側配置有緩衝卡匣34並配設， 在此等標題機及周邊曝光單元（Titler / EE ) 22、延伸冷 卻單元（EXTCOL) 35、及緩衝卡匣34，與鄰接曝光裝置 32之間進行基板G的送受的垂直運送單元8。此垂直運 送單元8的架構也與上述垂直運送單元5相同。 如以上構成的塗敷顯像處理系統1的處理過程是，首 先，將卡匣C運送到基板G的處理部3部的上游部3b。 在上游部3b，於激元UV處理單元（e-UV) 19進行表面 改質•有機物去除處理，然後在洗滌機洗淨單元（SCR) 20,以大致上成水平方式運送基板G，而進行洗淨處理及 乾燥處理。接著，在熱處理系方塊24的最下層部，藉由 垂直運送單元的運送臂5a取出基板G，在該熱處理系方 塊24的烘焙單元（BAKE )進行加熱處理，在黏著單元（ AD )向基板G噴霧HMDS氣體，以提高玻璃基板G與光 阻劑膜的密接性。此後，藉由熱處理系方塊2 5的冷卻單 元（COL)進行冷卻處理。 接著，基板G從運送臂5a移交到運送梭23。而運送 -17- (15) (15)200425224 到光阻劑塗敷處理單元（CT )，進行光阻劑塗敷處理後 ，依序在減壓乾燥處理單元（VD)進行減壓乾燥處理， 在邊緣去除器（ER)進行基板周緣的光阻劑去除處理。 接著，基板G由運送梭23移交給垂直運送單元7的 運送臂，以熱處理系方塊26的預烘焙單元（PREBAKE ) 進行加熱處理後，以熱處理系方塊29的冷卻單元（COL )進行冷卻處理。接著，基板 G在延伸冷卻單元（ EXTCOL) 35接受冷卻處理，同時在曝光裝置進行曝光處 理。 接著，基板G便經由垂直運送單元8及7的運送臂 ，運送到熱處理系方塊29的後曝光烘焙單元（PEBAKE ) ，在此進行加熱處理後，在冷卻單元（COL )進行冷卻處 理。而，基板G則經由垂直運送單元7的運送臂，在顯 像處理單元（DEV )，以大体上水平方式運送，同時進行 顯像處理、沖洗處理及乾燥處理。 接著，基板G由熱處理系方塊28的最下層，藉垂直 運送單元6的運送臂6a移交，在熱處理系方塊28及27 的後烘焙單元（POBAKE )進行加熱處理，在冷卻單元（ COL)進行冷卻處理。而基板G則交給運送機構10，收 容於卡匣C。 第4圖是表示本發明一實施形態的光阻劑塗敷處理單 元（CT)的截面圖，第5圖是其平面圖。 此光阻劑塗敷處理單元（CT )設有收容基板G的旋 轉杯，此旋轉杯50的上部形成有運進運出基板G的開口 -18- (16) (16)200425224 部5 0b。此開口部50b設有裝卸自如的蓋體37 ’可由機器 臂36握持安裝在蓋體37的握持部37a上下移動’便可以 裝卸蓋體。 旋轉杯5 0的旁邊配置有光阻劑液供應機構4 1 ’與洗 淨液供應機構5 7。 光阻劑液供應機構4 1係如第5圖所示，具有用以向 收容在旋轉杯5 0內的基板G吐出光阻劑液的光阻劑噴嘴 5 5，此光阻劑噴嘴5 5的前端由保持體3 8加以保持。保持 體38的另一端連接於馬達39，可藉此馬達39在水平面 內向Θ方向轉動。光阻劑噴嘴55連接有未圖示的軟管，可 由未圖示的光阻劑收容槽經由該軟管向光阻劑噴嘴5 5供 應光阻劑。 洗淨液供應機構5 7具有用以向旋轉杯5 0內吐出洗淨 液的洗淨液噴嘴44，此洗淨液噴嘴44是由水平支持體42 所支持。洗淨液可以使用例如稀薄劑。此水平支持體42 連接在馬達43，可藉此馬達43在水平面內向Θ方向轉動 。此洗淨液噴嘴44可由未圖示的洗淨液的收容槽供應洗 淨液。 旋轉杯5 0內配置有，可以藉由例如真空吸著保持基 板G用的旋轉夾頭51。此旋轉夾頭51安裝在轉軸構件 48，轉軸構件48連接在具有馬達等的驅動部40，可使旋 轉夾頭5 1轉動。在轉軸構件48的下部設有，例如連接在 真空幫浦53的真空密封部54，轉軸構件48的內部形成 有未圖示的排氣路。藉此可以利用真空夾持旋轉夾頭51 -19- (17) 200425224 同時’轉軸構件48可以藉由驅動部40所含的氣 而昇降’在從旋轉杯5 0卸下蓋體3 7的狀態下，可以 轉夾頭5 1從旋轉杯5 0的開口部5 0 b出沒。藉此，如 ，在未圖示的副臂與旋轉夾頭51之間送受基板G。 夾頭51在第4圖所示狀態時是在最下的位置，在此 抵接於安裝在旋轉杯50的底部50c的Ο環60。 同時，轉軸構件48安裝有輥子基座49，此輥子基 49是固定在突起設在旋轉杯50中央的筒體50a。因爲 種架構，可以藉由驅動部40的轉動驅動，使轉軸構件 、輥子基座49、旋轉杯50及蓋體37成一體轉動。 參照第6圖，在旋轉杯50的底部50c，配置在上 最下位置的旋轉夾頭51周圍，配置有用以儲存由上述 淨液供應機構57供給的洗淨液的儲存槽52。此儲存槽 呈，可以在由框體圍繞的內部5 2d儲存洗淨液的構造。 儲存槽52的上面形成有：向該內部52d供應洗淨液的 應口 52b (參照第5圖），及如後述用以吐出儲存的洗 液的複數個孔52a。此等孔52a是，例如從旋轉杯50 轉軸方向朝轉動中心側斜方向形成。儲存槽52是在設 內側的凹部52c螺入複數個螺栓56，藉此固定在旋轉 50的底部50c。 供應口 5 2 b是設在，從第5圖所示的平面方向.所視 洗淨液供應機構57的洗淨液噴嘴44的前端部移動的軌 上。藉此，在水平支持體42的記號Μ所示的位置’從 等 旋 述 轉 置 座 這 48 述 洗 52 在 供 淨 的 於 杯 的 跡 洗 -20- (18) 200425224 淨液噴嘴4 4吐出的洗淨液被注入供應口 5 2 b。第 放大該供應口 52b附近的平面圖。供應口 52b是配 孔52a的配置位置爲內側（旋轉杯50的轉動中心 形成這種配置關係的理由是’如後述’轉動旋轉杯 ，防止洗淨液從供應口 52b吐出。亦即，由於有這 關係，轉動旋轉杯50時，儲存在內部52d的洗淨 離心力，在其內部52d向外側流’因此只能從配置 應口 5 2 b爲外側的複數個孔5 2 a吐出洗淨液。 旋轉杯下部的筒體5 0a設有，例如用以噴出氮 氣供應用噴嘴45。此氮氣是經由供氣管46從氮氣 4 7供應。這種氮氣是在’例如以未圖示的排氣裝 旋轉杯5 0內的空氣時’要使旋轉杯5 0內不要成爲 噴出。 其次，說明如上述構成的光阻劑塗敷處理單元 動作。 在蓋體37被機器臂36提上的狀態下，由未圖 臂運送到旋轉杯5 0的直上方。於是，旋轉夾頭5 1 開口部50b上昇到較旋轉杯50上端爲高的位置， 臂接受基板。接受到基板的旋轉夾頭5 1經由旋轉杯 開口部5 Ob下降到最下的位置，而將基板G收容 杯50內。這時，光阻劑噴嘴55及洗淨液噴嘴44 轉杯5 0外側待機。 接著，光阻劑噴嘴5 5便如第5圖之虛線所示 到基板G上的中央，從光阻劑噴嘴5 5向基板G供 7圖是 置在較 側）。 50時 種配置 液會因 在較供 氣的氮 供應部 置排出 負壓時 CT的 示的副 便經由 從該副 ;50的 在旋轉 則在旋 ，移動 應規定 -21 · (19) 200425224 量的光阻劑液。而，蓋體3 7被覆蓋在旋轉杯5 0 杯50連同旋轉夾頭51以規定的旋轉速度轉動， 心力在基板表面的整面塗敷光阻劑。 接著，蓋體37再度被機器臂36提上，旋i 上昇，由旋轉夾頭5 1保持的基板被未圖示的副 基板G被取上後，旋轉夾頭5 1便下降到最下的（ 接著，洗淨液噴嘴44移動到第5圖的記號 置，洗淨液被注入儲存槽52。儲存洗淨液後， 嘴44便退到旋轉杯50的外側，再度將蓋體37 轉杯5 0。而由於旋轉杯5 0以規定的轉速轉動， 所示，儲存在儲存槽52的洗淨液21因離心力而 ，利用其流動力，直接從孔52a將洗淨液向上方 散。因爲孔52a是斜向形成，洗淨液的吐出方向 向。藉此，可以將洗淨液及於蓋體3 7的基板G 的領域（以記號A所示領域，亦即虛線的右側領 在旋轉杯50內飛散的光阻劑的大部分是A 。因爲離心力使光阻劑在基板上擴散而從基板的 的緣故。跟A相反側的B領域則較少有光阻劑 此，只要能洗淨蓋體3 7的A側的領域便可以。 如此，爲了要洗淨蓋體3 7的A側的領域， 儲存槽52的寬度（第6圖所示儲存槽52的左右 度），孔52a的角度等而異，但此等各參數可以 進行設計。 如此，從孔52a飛散而附著於蓋體37的洗 上，旋轉 藉此以離 _夾頭5 1 臂取上。 JL· txja 置。 Μ所示位 洗淨液噴 覆蓋在旋 如第6圖 流到外側 吐出而飛 也是斜方 外側附近 域）。 側的領域 外側飛散 飛散◊因 雖然會因 方向的長 適宜變更 淨液將因 -22- (20) 200425224 離心力而流向蓋體的轉動外側。藉此可以去除洗 蓋體3 7的光阻劑液。同時，附著在蓋體3 7的洗 離心力直接到達旋轉杯5 0，因此也可以洗淨旋轉 本實施形態是將儲存槽52設在旋轉夾頭5 1 此’不會如傳統方式，飛散的洗淨液被旋轉夾頭 ’可以去除洗淨附著在蓋體3 7的光阻劑液。同 如傳統方式，每一次洗淨蓋體時均需要裝卸洗淨 殊裝置，可以節省洗淨處理的手續。 其次，參照第8圖說明儲存槽的其他實施形 存槽62與上實施形態所示的儲存槽52不同的地 出洗淨液的手段不是孔，而是開縫62a。此開縫 例如圖示，沿著基板G的各邊形成，與儲存槽 第6圖以記號52d表示）貫通。藉由這種架構時 確實洗淨蓋體3 7的規定領域，同時，不必裝卸 等特殊裝置，可以節省洗淨處理的手續。 第9圖是其他實施形態的旋轉杯內部的放大: 在本圖所示的例子，吐出洗淨液用的孔72a 槽72上面垂直方向形成。而，在此孔72a裝設 出洗淨液21的噴嘴72b。此噴嘴72b的前端是 向旋轉杯5 0的轉軸方向的轉動中心側。藉此， 動中心側吐出洗淨液，可以洗淨蓋體3 7的規定K 其次，參照第10圖、第11圖及第12圖， 槽的其他實施形態。如第1 0圖及第1 1圖所示， 態的儲存槽82內部設有複數個分隔構件89。此 淨附著在 淨液可藉 杯50。 周圍，因 51阻擋 時，不必 器具等特 態。此儲 方是，吐 6 2 a 是， 內部（在 ，也可以 洗淨器具 _面圖。 是在儲存 有用以吐 裝設成朝 可以向轉 領域。 說明儲存 本實施形 等分隔構 -23- (21) 200425224 件89是排列在基板G的周圍方向，藉此將儲存槽82 部分隔成複數個的隔間8 3。如第1 0圖及第1 2圖所示 各分隔構件89呈板狀，對分隔構件89的排列方向（本 是基板G的周圍方向）成斜方向傾斜（在第1 2圖以角 ㊀表示）配設之。 如第12圖所示，此分隔構件89的側面89a及89b 的上側面89a抵接在儲存槽82的內部上面82e (參照 1 1圖）。另一方面，橫側面89b並不抵接儲存槽82的 部側面8 2 g，而留有空隙8 5 (參照第1 1圖）。此空隙 是爲了使洗淨液在儲存槽8 2的整個內部流動所配設， 以使複數隔間8 3連通。 再者，本實施形態的儲存槽82之令洗淨液吐出的 8 2a的數目較上述各實施形態的孔爲多。 如以上所述，由於配設分隔構件89，例如藉由洗 液供應機構5 7 (參照第5圖）在儲存槽82內部儲存洗 液時，利用空隙8 5使洗淨液到達整個區域。而在洗淨 理時，係令旋轉杯5 0轉動藉由離心力使洗淨液向外周 流動，因此，洗淨液便可以不必流經複數隔間83便能 留在由分隔構件89分隔的各隔間83。藉此，可以儘可 抑制因旋轉杯50的轉動而產生的洗淨液與儲存槽82的 對移動。亦即，儲存在儲存槽82內部的的洗淨液將因 性，對轉動的儲存槽82有欲靜止的性質，但本實施形 可以迴避這種問題，洗淨液的吐出衝力，吐出量增大， 以使洗淨液良好吐出。 內 例 度 中 第 內 85 用 孔 淨 淨 處 側 滯 能 相 慣 態 可 -24- (22) (22)200425224 同時，因爲分隔構件8 9是對其排列方向成斜方向配 置，因此，可以使儲存槽82內部的洗淨液對準旋轉杯50 的轉動方向流通。 本發明不限定爲以上所說明的實施形態，可以有各種 變形。 例如，孔52a的數目不一定是複數個，也可以是1個 。同時，第8圖的4個開縫中的1個開縫62a也可以是複 數個長孔。 而，在光阻劑塗敷處理單元CT的光阻劑的塗敷方法 並不限定爲上述實施形態，也可以是令噴嘴在基板G上 移動同時吐出光阻劑的所謂掃描塗敷。 同時，也可以不設第11圖的空隙85，而在分隔構件 89讃設流通洗淨液的連通口取代之。 而且，上述實施形態的基板是以液晶顯示裝置用的玻 璃基板爲例子，但只要是在旋轉杯配設有蓋體，則半導體 晶圓基板也可以適用在本發明。 第1 3圖是表示別的實施形態的光阻劑塗敷處理單元 的旋轉杯162的一部分的截面圖。再者，在本實施形態， 跟上述實施形態相同的構成構件標示同一記號，其說明從 略，而以不相同的部分爲中心進行說明。 固定杯161收容旋轉杯162,如後述用以在洗淨時使 內部流通的氣流與洗淨液分流。 固定杯1 6 1在上端部有開口，外周部有氣流控制部 1 80，整體略呈筒狀。氣流控制部1 80備有：例如朝外側 -25- (23) (23)200425224 向下方傾斜的內壁180a :在成爲內壁180a的高度A反折 朝內側向下方傾斜的內壁1 8 0 b ;以及再反折朝內側向下 方傾斜的內壁1 8 0 c。 氣流控制部1 8 0的上部外面固定有配設吐出洗淨液用 的第1噴嘴的洗淨用噴嘴203的噴嘴插入部185。洗淨用 噴嘴2 0 3是連接在經由洗淨液供應管收容洗淨液的收容槽 220。洗淨時是對洗淨用噴嘴203供應洗淨液，以洗淨旋 轉杯162的外壁162b等處。再者，也可以在噴嘴插入部 1 8 5形成插入洗淨用的噴嘴用的孔，將別的噴嘴插入此孔 以吐出洗淨液進行洗淨，以取代配設洗淨用的洗淨用噴嘴 203 ° 噴嘴插入部185的上面埋設有例如V型密封件102。 在噴嘴插入部185上，經由V型密封件102成裝卸自如 狀配置備有內壁186b的圓盤狀的固定杯蓋186。固定杯 蓋186是配置成內壁186b與內壁180a差不多在同一面上 〇 固定杯蓋186的上壁186a，在略爲中央處形成有用 以導入外部氣體的導入口 182。再者，形成在固定杯蓋 186的導入口的數目或形狀也可以是’例如形成導入口 182的一半面積的兩個導入口。 圓盤狀的蓋體137是配置在離開固定杯蓋186的上壁 186a第1間隔hi (以下，第1間隔hi的空隙簡稱爲「第 1流路」）處。旋轉杯1 62的上部周緣是配置在離開內壁 18 0a較第1間隔hi狹窄的第2間隔h2 (以下，第2間隔 -26 - (24) 200425224 h2的空β京簡稱爲「弟2流路」）處。旋轉杯162的 162b面對內壁180a，同時配設成與內壁180a的間隔 下方愈擴大。在內壁180c的上部，略成水平向外突 環裝突出構件的防護構件1 9 7。 高度A是在旋轉杯162的外側底面162a的高度 下方。再者，也可以例如，使高度A較旋轉杯162 低面的水平高度爲低。 固定杯1 6 1的底面向下方突設有例如4個，形成 以排出從導入口 182導入固定杯161內的氣體的排 183a的排氣管183。排氣管183連接在未圖示的排氣 〇 在旋轉杯1 62的側周壁下部，形成有可藉由旋 162的轉動，將光阻劑液排出到固定杯161的內壁 側的排出孔104。 在氣流控制部1 8 0的底部向下方突設有例如4個 有用以排出從排出孔1 04排出的光阻劑液，將其向下 液的廢液口 181d的廢液管181。廢液管181連接在 示的廢液管。 固定杯1 6 1在較廢液口 1 8 1 d爲內側，較排氣口 爲外側，具有形成有用以將光阻劑液廢液的廢液口 的廢液管194。廢液口 194a的直徑設定成較廢液口 的直徑小。 在固定杯161的內底面161b上固定有圓盤狀的 192。隔壁192的外周部形成有沿固定杯161的內 外壁 愈往 設有 B的 的最 有用 氣口 風管 轉杯 180a ，具 方廢 未圖 183a 194a 1 8 1 d 隔壁 底面 -27- (25) (25)200425224 1 6 1 b的形狀的台階，隔壁1 92的外周緣部是沿著內壁 180c的傾斜彎折向斜下方。固定杯161的內底面161b與 旋轉杯162的外側底面162a間的空間以隔壁192分隔成 上下均等的兩部分。排氣口 183a與旋轉杯162的底面之 間配置有，例如形成有1 2個貫穿孔1 96的整流板1 95。 將整流板195配置成，整流板195的貫穿孔196與排氣口 1 8 3 a錯開不重疊。 在固定杯161的底面，廢液管181與廢液管194之間 ，在圓周上貫裝複數個第2噴嘴的洗淨噴嘴205及第3噴 嘴的洗淨噴嘴206。洗淨噴嘴205、洗淨噴嘴206分別經 由洗淨液供應管連接在收容洗淨液用的收容槽220。 洗淨噴嘴205用以洗淨旋轉杯162的外側底面162a 。洗淨噴嘴205的前端部貫穿隔壁192向旋轉杯162的外 側底面162a突出。因此，可以從洗淨噴嘴205直接向外 側底面162a吐出洗淨液，洗淨外側底面162a。 洗淨噴嘴206用以洗淨氣流控制部180的內壁180c 。洗淨噴嘴206的前端部位於隔壁192的下方，此前端部 的側面形成有用以吐出洗淨液的未圖示的吐出口。因此， 從洗淨噴嘴206吐出的洗淨液可吐出到內壁180c。因此 可以從洗淨噴嘴206吐出洗淨液洗淨內壁180c。 儲存槽52的內壁的材質，可以使用例如鋁等金屬。 藉此可以防止如使用合成樹脂等時因轉動而變形，可以穩 定供應洗淨液。 由洗淨用噴嘴203、洗淨用噴嘴205、洗淨用噴嘴 -28- (26) (26)200425224 2 06及收容槽220等構成洗淨機構。 第1 4圖係光阻劑塗敷處理單元（C T )的平面圖。如 第14圖所示，在儲存槽52形成供應口 152b，與供應口 5 2 b挾持旋轉杯1 6 2的中心。 洗淨液供應機構1 5 7具有：由當作支持體的水平支持 體1 42支持的當作吐出噴嘴的洗淨液噴嘴44。在水平支 持體142支持有第5噴嘴的側壁洗淨噴嘴201a。洗淨液 噴嘴44是構成爲，可以藉由馬達43的驅動，在馬達43 軸的周圍，至少在旋轉杯162的外部與供應口 52b的直上 方（位置P 1 )之間轉動。因此，當洗淨液噴嘴44位於位 置P1，亦即，位於供應口 52b的直上方時，可以從洗淨 液噴嘴44向供應口 52b內吐出洗淨液。 可以藉由同樣的馬達43的驅動，使洗淨液噴嘴44與 側壁洗淨用噴嘴201a及後述的底面洗淨用噴嘴成一體進 一步向位置P2移動。洗淨液噴嘴44位於位置P2時，側 壁洗淨用噴嘴201a的開口端201b位於旋轉杯162的側壁 的內面側上方。 第1 5圖係本實施形態的洗淨液供應機構1 5 7的平面 圖。如第15圖所示，由水平支持體142支持洗淨液噴嘴 44及第4噴嘴的底面洗淨用噴嘴201。底面洗淨用噴嘴 20 1的前端部形成有用以將洗淨液吐出到下方的開縫20 1 c 。在底面洗淨用噴嘴201的長度方向約略中央部連接側壁 洗淨用噴嘴201a。側壁洗淨噴嘴201a用以洗淨旋轉杯 162。側壁洗淨噴嘴201a是彎曲成前端的開口端201b朝 -29- (27) (27)200425224 向例如馬達43側。底面洗淨用噴嘴201及洗淨液噴嘴44 是經由切換供應洗淨液用的切換閥22 1連接在收容洗淨液 用的收容槽222。 因此，供給底面洗淨用噴嘴2 0 1內的洗淨液在側壁洗 淨用噴嘴201a與底面洗淨用噴嘴201的分流點V，分別 分流成側壁洗淨噴嘴2 0 1 a側與開縫2 0 1 c側兩路，而從開 口端201b、開縫201c吐出。同時，可以藉由馬達43使 洗淨液噴嘴44、底面洗淨用噴嘴20 1及側壁洗淨用噴嘴 2〇la成一體移動。因此，不需要不相同的移動機構’可 以簡化構造，達成低成本化及省空間化。 再者，本實施形態是表示在水平支持體142的長度方 向約略中央部位固定側壁洗淨用噴嘴20 1 a的例子。但是 ，也可以將側壁洗淨用噴嘴201a偏移連接在馬達43側， 以加長開縫20 1 c的長度。如此便可以將洗淨液供給較大 的領域，有效進行洗淨。 其次，參照第1 3圖說明在基板塗敷光阻劑時的旋轉 杯162的作用等。 旋轉杯1 62轉動時，流入固定杯1 6 1內的氣體從導入 口 1 82流入第1流路。流入第1流路的氣體便沿著固定杯 蓋186的內壁186b (傾斜面）流入第2流路。第2流路 的間隔h2設定成較第1流路的間隔h 1小，因此，第2流 路的流速較第1流路的流速快。 在第2流路加速的氣體便沿著內壁i80a、內壁180b 、內壁180c的傾斜面流動。亦即，在氣流控制部18〇內 -30- (28) (28)200425224 ’氣體成爲箭頭C方向的渦流。 在氣流控制部180生成的光阻劑霧氣因防護構件197 的作用，被阻擋流入排氣口 1 8 3 a側，而由廢液管1 8 1向 下方流出。 向箭頭C方向流動的渦流中流入隔壁1 9 2底面側的氣 體，藉由例如整流板1 9 5的貫穿孔1 9 6將其流速均一化， 而從排氣口 1 8 3 a排氣。 其次，參照第1 6圖所示流程圖說明本實施形態的旋 轉杯1 62及固定杯1 6 1的洗淨程序。 如第1 7圖所示，令旋轉夾頭1 5 1上昇而待機。驅動 第14圖所示的馬達43，將洗淨液噴嘴44定位在位置P1 。定位後，從洗淨液噴嘴44向供應口 52b內吐出洗淨液 ，儲存在儲存槽52(步驟1(S1))。 接著，令第14圖所示旋轉杯162轉動180度（S2) 。藉此，供應口 52b定位在洗淨液噴嘴44的直下方。 接著，與步驟1 ( S1 )同樣，從洗淨液噴嘴44向供 應口 152b吐出洗淨液，將洗淨液儲存在儲存槽52 ( S3 ) 。藉此，可以藉由供應口 52b、152b使洗淨液到達整個儲 存槽5 2內，因此可以縮短儲存時間。 如第14圖所示，驅動馬達43將洗淨液噴嘴44對準 位置P2。接著，從開口端201b、開縫201c、洗淨用噴嘴 203、洗淨用噴嘴205吐出洗淨液。這時，令旋轉杯162 以例如第1轉數的5rpm轉動（S4)。亦即，令旋轉杯 1 62轉動，同時從各噴嘴吐出洗淨液而洗淨各部位。具體 -31 - (29) 200425224 上是，如第17圖所示，從開口端201b向旋轉杯162 壁的內周面162η及162t吐出洗淨液。同時，從開縫 向旋轉杯162的內側底面162c吐出洗淨液。同時， 淨用噴嘴203向外壁162b吐出洗淨液。並從洗淨 2〇5向旋轉杯162的外側底面162a吐出洗淨液。如 淨各面。 接著，令洗淨液噴嘴44在固定杯161外部待機 關閉蓋體137(S5)。 接著，與上述實施形態同樣將例如氮氣噴出在旋 162 內（S6 )。 接著，例如以第2轉數的700rpm使旋轉杯162 (S 7 )。藉此，可以例如使旋轉杯1 62轉動，同時從 槽52噴出洗淨液，洗淨蓋體137下面的周緣部13 7a 於噴出氮氣，可以將洗淨液從排出孔1 04排出到轉杯 外。以下，氮氣要一直噴到結束洗淨。 接著，例如以第3轉數的100rpm使旋轉杯162 ，同時，從洗淨用噴嘴205、洗淨用噴嘴206及洗淨 嘴2 03吐出洗淨液（S8 )。藉此，可以一面抑制旋 162的轉數，同時洗淨旋轉杯162的外側底面162a、 杯161的內壁180c及旋轉杯162的外壁162b所殘留 染。 如此，首先，在步驟4去除附著在旋轉杯162的 劑等的污染。而在步驟7，在洗淨蓋體1 3 7時去除附 旋轉杯162或固定杯161的污染，在步驟8進一步去 的側 20 1c 從洗 噴嘴 此洗 ，而 轉杯 轉動 儲存 。由 162 轉動 用噴 轉杯 固定 的污 光阻 著在 除， -32- (30) (30)200425224 徹底洗淨處理，而得更確實防止發生顆粒等。 接著，將旋轉杯1 6 2的轉數提高到例如第4轉數的 3 OOrpm。同時從洗淨用噴嘴203向外壁〗62b吐出洗淨液 (S 9 )。藉此，可以藉由旋轉杯1 6 2的旋轉，使從洗淨用 噴嘴2 03吐出的洗淨液在外壁162b反射，以反射的洗淨 液洗淨內壁1 8 0 a。 再者’本貫施形態是表不在步驟6 (S6)之後執行步 驟7 ( S7 )的例子。但此兩個步驟的順序並非一定如此， 例如，也可以在步驟6的開始噴出氮氣的大約同時或之後 ，開始步驟7的旋轉杯1 62的轉動。 如第1 8圖所示，也可以，例如改變儲存槽52的形狀 ，使儲存槽52的角部朝旋轉杯162的中心軸離開旋轉杯 162的側壁，且藉由此等角部形成更多的孔52a。如此構 成時，洗淨時由孔52a噴出的洗淨液因離心力飛散到外周 側時，仍可以確實洗淨第1 3圖所示的蓋體1 3 7的底面周 緣部137a。同時，由於增加孔52a的數目，可以使更多 洗淨液飛散到底面周緣部1 3 7a，有效進行洗淨動作。再 者，取代改變儲存槽52的形狀，使儲存槽52的孔52a的 位置移至旋轉杯1 62的中心側，也可以獲得同樣的效果。 而且，上述實施形態是表示儲存槽52的供應口 52b 、152b是形成在儲存槽52的邊的大致上中央的例子。但 是，供應口 52b、152b的位置並非限定如此，例如，也可 以形成在儲存槽52的離心力最大的各角部附近。如此構 成時，例如將洗淨液儲存於儲存槽52令旋轉杯162轉動 -33- (31) (31)200425224 ’便可以有效利用離心力’使洗淨液分散到儲存槽5 2內 〇 同時，上述實施形態是表示儲存槽52內壁的材質使 用鋁的例子。但是’儲存槽52的內壁不限定使用鋁，也 可以例如在內壁塗敷氟。如此構成便可以使洗淨液的流動 更順暢’可以縮短洗淨液的儲存時間。同時可以使洗淨液 容易飛散。 而且，上述實施形態是表示使洗淨液噴嘴4 4與供應 口 5 2b對準位置以吐出洗淨液的例子。但是，如第1 9圖 所示，也可以在儲存槽52形成較供應口 52b大的卡合溝 5 2f，並在洗淨液噴嘴44的前端部配設可卡合於卡合溝 52f的例如橡膠製的卡合部44f。而在第16圖所示的步驟 1或步驟3將洗淨液吐出到儲存槽52時，例如令水平支 持體142下降，令卡合部44f卡合於卡合溝52f。如此構 成時，例如在儲存洗淨液時，可以防止洗淨液漏出儲存槽 52外，同時可以加速吐出速度，藉此可以在較短時間儲 存洗淨液。 如以上所說明，依據本發明時，可以確實洗淨杯子等 容器或開閉該容器的蓋體，可以節省該項洗淨處理的作業 手續。藉此可以防止在蓋體發生顆粒。 【圖式簡單說明】 第1圖係表示本發明一實施形態的塗敷顯像處理系統 的整體架構的平面圖。 -34- (32) (32)200425224 第2圖係第1圖所示塗敷顯像處理系統的正面圖。 第3圖係第1圖所示塗敷顯像處理系統的背面圖。 第4圖係一實施形態的光阻劑塗敷處理單元的截面圖 〇 第5圖係第4圖所示光阻劑塗敷處理單元的平面圖。 第6圖係爲了說明一實施形態的儲存槽，表示旋轉杯 內部的放大截面圖。 第7圖係儲存槽的洗淨液的供應口附近的放大平面圖 〇 第8'圖係爲了說明其他實施形態的儲存槽的旋轉杯及 其內部的平面圖。 第9圖係爲了說明其他實施形態的儲存槽，表示旋轉 杯內部的放大截面圖。 第10圖係爲了說明一實施形態的儲存槽，表示旋轉 杯內部的一部分的平面圖。 第11圖係第10圖所示儲存槽的截面圖。 第1 2圖係第1 0圖所示分隔構件的斜視圖。 第1 3圖係表示別的實施形態的旋轉杯的一部分的截 面圖。 第1 4圖係別的實施形態的光阻劑塗敷處理單元的平 面圖。 第1 5圖係別的實施形態的洗淨液供應機構的平面圖 〇 第1 6圖係表示別的實施形態的洗淨液供應方法的流 -35- (33) (33)200425224 程圖。 第1 7圖係第1 6圖所示旋轉杯洗淨時的旋轉杯及固定 杯的截面圖。 第1 8圖係表示別的實施形態的儲存槽的變形例子的 平面圖。 第1 9圖係表示別的實施形態的洗淨液供應機構的卡 合部的側面圖。 〔圖號說明〕 G :玻璃基板 CT :光阻劑塗敷處理單元 37 :蓋體 4〇 :驅動部 4 1 :光阻劑液供應機構 43 :馬達 44 :洗淨液噴嘴 5 〇 :旋轉杯 5〇b :開口部 5 1、1 5 1 :旋轉夾頭 52、62、72 :儲存槽200425224 (1) (ii) Description of the invention [Technical field to which the invention belongs] The present invention relates to a substrate processing apparatus and a cleaning method. [Previous Technology] In the LCD manufacturing process, in order to form an ITO (Indium Tin Oxide) film or electrode pattern on a glass substrate for LCD, the same photolithography technology as used in the manufacture of semiconductor devices is used. In photolithography, a photoresist is applied to a glass substrate, exposed to it, and developed. The photoresist coating process is, for example, accommodating a glass substrate in a rotating cup, supplying the photoresist to the substrate, covering the cup lid, and rotating the cup and the substrate together to diffuse the photoresist onto the surface of the substrate. The entire surface. The photoresist attached to the inside of the cup used for this coating treatment is scattered due to its rotating centrifugal force, or the photoresist is formed into a mist. Such attachments become the cause of particles after drying. In order to solve this problem, the present situation is that a nozzle capable of ejecting the cleaning solution is provided in the cup, and the cleaning solution is discharged onto the adherend to remove the adherend. Such a device is disclosed in, for example, FIG. 6 of Japanese Patent Application Laid-Open No. 8-255789. Another proposal is to store a cleaning solution in a special container, and rotate the container in the cup, thereby scattering the cleaning solution from the holes formed in the container to wash the cup. Net tool fixture. Such a device is disclosed in, for example, Japanese Patent Application Laid-Open No. 5-8243 No. 5 published in Japanese Patent Publication No. 5-8243 No. 5 (however, this publication deals with semiconductor wafers, not -4- (2) (2) 200425224 is a device for processing glass substrates). However, the device shown in Patent Document 1 includes, for example, FIG. 6 thereof, a lid cleaning nozzle for cleaning the lid, but a rotary chuck (a member that holds the substrate by a vacuum and rotates the substrate) blocks the cleaning The cleaning liquid discharged from the nozzle for the cleaning cap. Therefore, it is almost impossible to wash the lid body in this example. The inside of this cover is particularly susceptible to contamination by a misted photoresist, and contamination of this cover must be removed. In the device shown in Patent Document 1, if the rotary chuck is designed to be small, the lid can be washed. However, from the viewpoint of the recent increase in the size of glass substrates, designing the rotary chuck to be small has problems such as safety. If we consider that the current rotating chuck is gradually becoming the mainstream with the same size as the substrate, the cleaning of the cover body will become more and more difficult. On the other hand, the device shown in Patent Document 2 is not provided with a lid that closes the opening at the upper part of the cup, but each time the cup is washed, a washing tool needs to be attached and detached, which increases the number of operations and is very troublesome. At the same time, even when such a cleaning tool is applied to the device shown in Patent Document 1, the lid of the container cannot be cleaned. Patent Document 1 Japanese Patent Application Laid-Open No. 8-25 5 7 89 Patent Document 2 Japanese Patent Application Laid-Open No. 5-8243 5 [Summary of the Invention] In view of the above-mentioned facts, the object of the present invention is to provide and can be reliably cleaned A container such as a cup or a lid for opening and closing the container can save a substrate processing apparatus and a cleaning method for the cleaning process. In order to achieve the above object, the substrate processing apparatus of the present invention is provided with: -5 · (3) (3) 200425224 a holding member that holds the substrate in a rotatable shape; and has an opening portion into and out of the substrate to accommodate the holding member. A container holding the substrate and rotating synchronously with the holding member; a cover body detachably provided in the opening portion for opening and closing the container; installed in the container and at least a part of the periphery of the holding member A storage drive tank capable of storing at least an internal washing liquid for washing the cover body; and a rotary drive unit that rotates the container and scatters the cleaning liquid stored in the storage tank toward the cover body by its centrifugal force. In the present invention, for example, after a coating liquid is applied to a substrate, the container is rotated while the container is covered with a lid, and the cleaning liquid is scattered from the storage tank to the lid by the centrifugal force. This storage tank is provided around the holding member. Therefore, unlike conventional methods, scattered cleaning liquid is not blocked by the holding member. For example, the cleaning liquid can be scattered close to the center of the cover, and the cover can be washed. body. At the same time, the washing liquid adhering to the lid body flows outward due to the centrifugal force, and the flowing washing liquid reaches the container, so the container can be washed. In addition, the present invention does not need to wash and remove the washing tool every time as in the conventional manner, and can save the operation procedures during the washing process. In the present invention, a washing liquid can be used, such as cinnamon, etc., specifically, 3-methyl methoxypropionate (MMP, boiling point: 145 ° C, viscosity: l. lcps), ethyl lactate (EL, boiling point: 154 ° C, viscosity: 2. 6cps), ethyl 3-methoxypropionate (EEP, boiling point: 170. (:, viscosity: 1. 3cps), ethyl pyruvate (EP, boiling point: 144 ° C, viscosity: 1. 2cps), propylene glycol monomethyl ether acetate (PGMEA, boiling point: 146 ° C ’viscosity: 1. 3cps), 2-heptanone (boiling point: 152 ° C, viscosity: -6- (4) (4) 200425224 1. 1 cps) cyclohexanone (arc's solvent) and others used in this field. Meanwhile, in the present invention, "synchronized with" means that the holding member and the container are rotated, for example, integrally, or includes, for example, that the holding member and the container are rotated in synchronization with each other by an independent drive source, respectively. According to an aspect of the present invention, a hole for discharging the cleaning solution stored in the storage tank is formed on a side 'of the cover body facing the storage tank. Thereby, the washing liquid can be reliably scattered to the lid body. It is also possible to replace the holes with linear slits. According to an aspect of the present invention, the hole is formed so that a discharge direction of the washing tank is toward a rotation center side with respect to a rotation axis direction in which the container is rotated. Thereby, the washing liquid can be surely discharged to the center of the lid body. It is also possible to replace the holes with linear slits. According to an aspect of the present invention, a cleaning liquid supply mechanism for supplying the cleaning liquid is further provided inside the storage tank. At the same time, the cleaning liquid supply mechanism includes a nozzle that discharges the cleaning liquid into the storage tank, and a moving mechanism that moves the nozzle between a predetermined position outside the container and a position directly above the holding member. Thereby, for example, it is possible to automatically supply a cleaning solution for cleaning each time a coating process for a predetermined number of substrates is completed, and the operation is easy. Alternatively, each time a substrate is coated and supplied with a cleaning solution, the container or lid can be constantly kept free from contamination, and particles can be reliably prevented from occurring. According to an aspect of the present invention, there is further provided a plurality of partition members arranged inside the storage tank and partitioning the interior of the storage tank into a plurality of compartments in the peripheral direction of the substrate held by the holding member. 5) (5) 200425224 In this way, the relative movement of the washing liquid and the container caused by the rotation of the container can be suppressed as much as possible, and the momentum and the amount of the discharged washing liquid can be increased. According to one aspect of the present invention, the above-mentioned plurality of partition members each have a side surface facing the storage tank, and a part of the side surface is spaced from the storage tank, and the other part is in contact with the storage tank. Or, at least one of the plurality of partition members is formed with a communication port for allowing the plurality of compartments to communicate with each other. Thereby, 'the washing liquid can be prevented from staying in each chamber', and the washing liquid can reach the entire area through the gap or the communication port. According to an aspect of the present invention, the gap is provided at a portion on the rotation center side of the container near the storage tank. Alternatively, the communication port is provided at a portion near the center of rotation of the container of the partition member. By this, for example, when the cleaning liquid is stored in the storage tank by the cleaning liquid supply mechanism, the cleaning liquid can reach the entire area through the gap or the communication port, and during the cleaning process, due to the rotation of the container, the cleaning liquid is washed. The liquid flows to the outer peripheral side by the centrifugal force inside the storage tank. As a result, it is not necessary to circulate the plurality of compartments to the cleaning solution, and the liquid can be retained in each of the chambers to perform a good operation of discharging the cleaning solution. According to an aspect of the present invention, at least one of the plurality of partition members has a plate shape, and is arranged obliquely to an arrangement direction in which the plurality of partition members are arranged. Thereby, the cleaning liquid inside the storage tank can be circulated in accordance with the rotation direction of the container, and a better discharge operation of the cleaning liquid can be expected. According to the cleaning method of the present invention, a cleaning liquid is used in a container having an opening for placing and taking out a substrate, and the substrate is accommodated through the opening, and at least it is detachably cleaned and disposed in the opening for opening and closing. Lid of the container-8-(6) (6) 200425224 A method for cleaning a body, comprising: storing the cleaning in at least a part of a holding member provided in the container and simultaneously holding a substrate in the container; A process for supplying the cleaning liquid in the liquid storage tank; and a process for rotating the container to scatter the cleaning liquid stored in the storage tank toward the cover body by its centrifugal force. In the present invention, for example, after a coating liquid is coated on a substrate, a cleaning liquid is supplied to a storage tank, and then the container is rotated with the cover covered with the container, and the cleaning liquid is scattered from the storage tank to the cover by its centrifugal force. Since this storage tank is provided around the holding member, it does not block the cleaning liquid as in the conventional holding member. For example, the cleaning liquid can be scattered to the center of the cover, and the cover can be washed. Another substrate processing apparatus according to the present invention includes a holding member that holds the substrate in a rotatable shape, and an opening portion for taking in and taking out the substrate, and receiving a substrate that is held by the holding member and capable of rotating in synchronization with the holding member. 1 container; detachably provided in the opening portion to open and close the lid of the first container; installed in the first container and at least a part of the periphery of the holding member, and stored at least internally for washing A storage tank for cleaning the cleaning liquid of the lid body; a rotary drive unit for rotating the first container to scatter the cleaning liquid stored in the storage tank toward the lid body by its centrifugal force; 2 containers; a cleaning mechanism having a cleaning nozzle provided in the second container in order to wash at least the outer peripheral portion of the first container. In the present invention, for example, after a coating liquid is coated on a substrate, the container is rotated with the cover covered and the container is rotated, and the cleaning liquid is scattered from the storage (7) (7) 200425224 tank to the cover by its centrifugal force. Since this storage tank is provided around the holding member, the washing liquid is not blocked by the conventional holding member. For example, the washing liquid can be scattered to the center of the lid body, and the lid body can be washed. At the same time, the second container is provided with a cleaning nozzle for cleaning the outer peripheral portion of the first container. Therefore, for example, at least the outer periphery of the first container can be cleaned together with the lid by rotating the first container while the cleaning liquid is discharged from the cleaning nozzle by the rotation driving unit. According to an aspect of the present invention, the cleaning nozzle of the cleaning mechanism includes a first nozzle capable of cleaning an outer peripheral surface of a side wall of the first container, and a second nozzle for cleaning an outer bottom surface of the first container. . Thereby, for example, the first container can be rotated by the rotation driving unit, and at the same time, the cleaning liquid is discharged from the first nozzle and the second nozzle, thereby washing the outer peripheral surface of the side wall of the first container and the outer bottom surface of the first container. According to an aspect of the present invention, the cleaning nozzle of the cleaning mechanism includes a third nozzle capable of cleaning the inner bottom surface of the second container. Thereby, the cleaning liquid can be discharged from the third nozzle, and the inner bottom surface of the second container can be washed. According to one aspect of the present invention, the above-mentioned substrate processing apparatus further includes: a discharge nozzle capable of discharging the cleaning solution into the storage tank through a supply port formed in the storage tank; and the discharge nozzle being at least the first 1 is a moving mechanism that moves between the outside of the container 'and directly above the supply port. Thereby, for example, the ejection nozzle can be aligned with the supply port of the storage tank by the driving mechanism to store the cleaning liquid. According to an aspect of the present invention, the substrate processing apparatus further includes -10- (8) (8) 200425224: a fourth nozzle capable of cleaning an inner bottom surface of the first container; and an inner surface of the side wall of the first container. A fifth nozzle on the peripheral surface and the upper surface; and a support that integrally supports the discharge nozzle, the fourth nozzle, and the fifth nozzle. Thus, for example, when the fourth nozzle and the fifth nozzle are respectively moved above the first container and above the side wall of the first container, the moving mechanism used for storing the cleaning liquid may be used. At the same time, in a state where the fourth nozzle and the fifth nozzle are moved above the first container and above the sidewall of the first container, the cleaning liquid is discharged from the fourth nozzle and the fifth nozzle, thereby washing the first container. The inner bottom surface, and the inner peripheral surface and upper surface of the side wall of the first container. According to one aspect of the present invention, at least two of the supply ports are formed. Thus, for example, when the cleaning liquid is stored in the storage tank, the injection is started from one supply port, and the first container is rotated by the rotation driving part during storage, and then the liquid is injected from another supply port of the storage tank. Since the cleaning liquid can be flowed to various parts in the storage tank from different supply ports, the storage time of the cleaning liquid can be shortened. Another substrate processing apparatus according to the present invention includes a holding member that holds the substrate in a rotatable shape, and an opening portion for taking in and taking out the substrate, and receiving a substrate that is held by the holding member and capable of rotating in synchronization with the holding member. 1 container; detachably provided in the opening portion to open and close the lid of the first container; installed in the first container and at least a part of the periphery of the holding member, and stored at least internally for washing A storage tank for cleaning the cleaning liquid of the cover body; a rotary drive unit for rotating the first container to scatter the cleaning liquid stored in the storage tank toward the cover body by its centrifugal force; 1 container exterior, with formation at -11. (9) (9) 200425224 Moving the supply port of the storage tank directly above the nozzle for ejecting the cleaning solution into the storage tank through the supply port; the bottom surface of the inside of the first container can be washed A nozzle for cleaning the bottom surface of the first container, a nozzle for cleaning the inner peripheral surface of the side wall of the first container, and a nozzle for cleaning the upper wall; and a nozzle for discharging, a nozzle for cleaning the bottom, and a nozzle for cleaning the sidewall Integrated support. According to the present invention, the discharge nozzle can be moved directly above the supply port of the storage tank by the moving mechanism to store the cleaning liquid. At the same time, the same moving mechanism can be used when "the bottom cleaning nozzle and the side wall cleaning nozzle are respectively moved above the first container and above the side wall of the first container". At the same time, with the "bottom cleaning nozzle", the side wall cleaning nozzle is moved above the first container and the first container side wall, and the cleaning liquid is discharged from the bottom surface cleaning nozzle and the side wall cleaning nozzle. Then, the inner bottom surface of the first container and the inner peripheral surface and upper surface of the side wall of the first container can be washed. Another cleaning method of the present invention includes: (a) a discharge nozzle for discharging a cleaning solution; 1 supply port, the process of alignment; (b) after the above process (a), the process of discharging cleaning liquid from the discharge nozzle into the storage tank through the first supply port; (c) in the above After the process (b), the first container is rotated so that the ejection nozzle is aligned with the second supply port formed at a position different from the first supply port of the storage tank; d) after the above process (c), the process of discharging the cleaning liquid from the discharge nozzle through the second supply port into the storage tank; (e) -12- (10) (10) 200425224 order washable The bottom surface cleaning nozzle for the inner bottom surface of the first container moves integrally with the side wall cleaning nozzle for cleaning the inner peripheral surface of the first container side wall and the upper surface, and aligns the side wall of the first container. (F) Make the first container above spin with the first kind (G) rotating the first container at a second number of rotations faster than the first number of rotations, and simultaneously ejecting the cleaning liquid from the bottom surface cleaning nozzle and the side wall cleaning nozzles; The centrifugal force scatters the cleaning solution stored in the storage tank toward the lid of the first container that is removably mounted on the opening to open and close the first container. According to the present invention, in the above processes (a) to (d), the cleaning liquid can be flowed to various parts in the storage tank from the first supply port and the second supply port different from the first supply port. Therefore, the washing can be shortened. Storage time of neat liquid. At the same time, in the process (e), the bottom surface cleaning nozzle and the side wall cleaning nozzle are aligned with the first container. Therefore, for example, there is no need to have a different moving mechanism, so that cost reduction and space saving can be achieved. At the same time, in the process (f), the first container is rotated by the second rotation number and the cleaning liquid is discharged, so that the entire peripheral surface of the first container can be washed. Then, in the process (g), the first container is rotated at a second rotation number faster than the first rotation number, so that the cleaning liquid stored in the storage tank can be scattered toward the above-mentioned cover body to clean the cover. body. According to an aspect of the present invention, (h) after the step (g), the first container is rotated by a third number of rotations which is slower than the second number of rotations. A process in which the cleaning nozzle of the second container discharges the cleaning solution to the outer peripheral portion of the first container. By -13- (11) (11) 200425224 Therefore, for example, the number of rotations of the first container can be suppressed to the third number of rotations, and the outer periphery of the first container can be washed at the same time. One aspect of the present invention further includes a process of 'rotating the first container at a fourth rotation number faster than the third rotation number after the above process (h). Thereby, for example, the cleaning liquid discharged from the first nozzle can be reflected on the outer peripheral surface of the side wall of the first container to wash the side surface inside the second container. [Embodiment] An embodiment of the present invention will be described below with reference to the drawings. Fig. 1 is a plan view of a coating and developing processing system for an LCD substrate to which the present invention is applied, Fig. 2 is a front view thereof, and Fig. 3 is a back view thereof. This coating development processing system 1 is provided with a cassette station 2 for mounting a cassette C containing a plurality of glass substrates G, and a series of processes including applying a photoresist and developing the substrate G. The processing unit 3 of the plurality of processing units; the mesial surface portion 4 for sending and receiving the substrate G between the processing unit 3 and the exposure unit 32, and the cassette station 2 and the mesial surface portion 4 are arranged at both ends of the processing portion 3, respectively. The cassette station 2 is provided with a transport mechanism 10 for transporting the LCD substrate between the cassette C and the processing section 3. Cartridge C is carried in and out at cartridge station 2. At the same time, the transport mechanism 10 is provided with a transport arm 11 that can move on a transport path 12 arranged in the direction in which the cassettes are arranged, whereby the transport arm 11 transports the substrate G between the cassette c and the processing unit 3. The processing section 3 is provided with a main transport path 3a extending in the direction (Y direction) of the cassette C arranged vertically (X direction) at the cassette station 2; and along this • 14- (12) 200425224 main transport The channel 3a is arranged side by side, and includes an upstream portion 3b of each processing unit including a photoresist coating processing unit; and the downstream portion 3c of each processing unit including a display cell (DEV) is arranged side by side. A main conveyance path 3a is provided, and the conveyance path 3 extended in the X direction is moved along this conveyance path 31 to convey the glass substrate shuttle 23 in the X direction. This transport shuttle 23 can be transported, for example, by supporting the tip holding base. At the same time, an end window on the mesa portion 4 side of the main conveyance path 3 a is used to transport the substrate unit _ unit 7 between the processing portion 3 and the mesa portion 4. The upstream part 3b is provided at the end of the cassette station 2 side, for use. G. The washing machine washing unit (SCR) 20 to which a washing process is applied: The upper layer of the machine washing unit (SCR) 20 is provided with an exciton UV treatment unit (e-UV) 19 for removing organic matter. Next to the washing machine cleaning unit (SCR) 20, heat-blocks 24 and 25 of a unit for heat-treating the glass substrate G are arranged. Between these heat-treatment blocks 24 and 25, the transport unit 5 and the transport arm 5a can be rotated in the Z direction and horizontally and can be rotated in the direction Θ. Therefore, each heat treatment system unit of the two blocks 24 can be picked up to transport the substrate G. In addition, the above-mentioned vertical conveying unit 7 also has two layers stacked from below on the heat treatment block 24 as shown in FIG. 2 for the vertical conveying unit 5 to heat the substrate G before applying the photoresist. Bake unit (BAKE), and the application of hydrophobicity by HMDS gas, (CT) [Processing sheet 1, and G can be transported on board G plus [set, Straight transport]> For the substrate: This washing is stacked on G The multi-system system moves vertically, and the structure of the management unit 3 of L 25 is stacked in order. • 15- (13) (13) 200425224 The unit (AD). On the other hand, in the heat treatment system block 25, two layers of cooling units (COL) and an adhesion unit (AD) for applying a cooling process to the substrate G are sequentially stacked from below. Adjacent to the heat treatment system block 25, a photoresist treatment block 15 is extended in the X direction. This photoresist processing block 15 is integrally provided with: a photoresist coating processing unit (CT) for applying a photoresist to the substrate G; and reduced pressure to dry the coated photoresist by decompression. A drying unit (VD); an edge remover (ER) for removing the photoresist on the peripheral edge portion of the substrate G of the present invention. The photoresist processing block 15 is provided with a not-shown jib that can be moved between the photoresist coating processing unit (CT) and the edge remover (ER). Board G is transported within 15 seconds. Adjacent the photoresist processing block 15 is provided a heat treatment system block 26 of a multilayer structure. Here, the heat treatment system block 26 is a stack of 3 pre-baked units (PREBAKE) for performing a heat treatment after the photoresist is applied. As shown in FIG. 3, in the downstream portion 3c, a heat treatment block 29 is provided at the end of the mesial surface portion 4 side, and here, a cooling unit (COL) is sequentially stacked from the lower portion: Heat-treated post-exposure baking unit (PEBAKE) before processing. Adjacent to the heat treatment system block 29, a development processing unit (DEV) is extended in the X direction. Adjacent to this development processing unit (DEV) are heat treatment blocks 28 and 27. The heat treatment blocks 28 and 27 are provided with the same structure as the vertical transport unit 5 described above. The two blocks 28 and 27 can be captured. Vertical transport unit 6. At the same time, an i-ray processing unit (i-UV) 33 is provided above the end of the development processing unit (DEV). -16 · (14) (14) 200425224 In the heat treatment system block 28, a cooling unit (COL) and a post-baking unit (POBAKE) for applying heat treatment to the substrate G are sequentially stacked from the bottom. On the other hand, the heat treatment block 27 is also the same, and the cooling unit (COL) and the two-layer post-baking unit (POBAKE) are sequentially stacked from the bottom. On the interface part 4, a title machine and a peripheral exposure unit (Titler / EE) 22 are provided on the front side, an extension cooling unit (EXTCOL) 35 is arranged adjacent to the vertical conveying unit 7, and a buffer cassette 34 is arranged on the back side and arranged. The vertical conveying unit 8 that carries the substrate G between the title machine and the peripheral exposure unit (Titler / EE) 22, the extension cooling unit (EXTCOL) 35, and the buffer cassette 34 and the adjacent exposure device 32. The structure of this vertical transport unit 8 is also the same as that of the vertical transport unit 5 described above. The processing procedure of the coating development processing system 1 configured as described above is to first transport the cassette C to the upstream section 3b of the processing section 3 of the substrate G. In the upstream part 3b, the surface modification and organic matter removal processing is performed in the exciton UV processing unit (e-UV) 19, and then the substrate G is transported in a substantially horizontal manner in a washing machine cleaning unit (SCR) 20 to perform Washing and drying. Next, in the lowermost part of the heat treatment block 24, the substrate G is taken out by the transfer arm 5a of the vertical transfer unit, and the bake unit (BAKE) of the heat treatment block 24 is subjected to heat treatment, and the adhesion unit (AD) is applied to the substrate G. HMDS gas is sprayed to improve the adhesion between the glass substrate G and the photoresist film. Thereafter, the cooling process is performed by the cooling unit (COL) of the heat treatment system block 25. Then, the substrate G is transferred from the transfer arm 5 a to the transfer shuttle 23. And -17- (15) (15) 200425224 is delivered to the photoresist coating processing unit (CT), and after the photoresist coating processing, the vacuum drying processing is sequentially performed in the vacuum drying processing unit (VD). A photoresist removal process is performed on the periphery of the substrate in an edge remover (ER). Next, the substrate G is transferred from the transfer shuttle 23 to the transfer arm of the vertical transfer unit 7, and is subjected to a heat treatment in a pre-baking unit (PREBAKE) of the heat treatment system block 26, followed by a cooling process (COL) in the heat treatment system block 29. Next, the substrate G is subjected to a cooling process in an extension cooling unit (EXTCOL) 35, and at the same time, an exposure process is performed in an exposure apparatus. Next, the substrate G is transported to the post-exposure baking unit (PEBAKE) of the heat treatment block 29 through the transport arms of the vertical transport units 8 and 7, and then subjected to heat treatment and then cooled in the cooling unit (COL). On the other hand, the substrate G is conveyed in a development processing unit (DEV) in a substantially horizontal manner via a conveying arm of the vertical conveying unit 7, and is subjected to development processing, washing processing, and drying processing. Next, the substrate G is transferred from the lowermost layer of the heat treatment system block 28 by the conveying arm 6a of the vertical transportation unit 6, and is heated in the post-baking unit (POBAKE) of the heat treatment system blocks 28 and 27, and cooled in the cooling unit (COL). deal with. The substrate G is delivered to the transport mechanism 10 and stored in the cassette C. Fig. 4 is a sectional view showing a photoresist coating treatment unit (CT) according to an embodiment of the present invention, and Fig. 5 is a plan view thereof. This photoresist coating processing unit (CT) is provided with a rotating cup for accommodating the substrate G, and an opening for carrying in and out of the substrate G is formed in the upper part of the rotating cup 50 -18- (16) (16) 200425224 part 50b. This opening portion 50b is provided with a detachable cover 37 'which can be moved up and down by the robot arm 36 holding the holding portion 37a mounted on the cover 37, and the cover can be attached and detached. A photoresist liquid supply mechanism 4 1 ′ and a cleaning liquid supply mechanism 57 are arranged beside the rotating cup 50. The photoresist liquid supply mechanism 41, as shown in FIG. 5, has a photoresist nozzle 5 5 for ejecting a photoresist liquid to the substrate G accommodated in the rotating cup 50, and the photoresist nozzle 5 5 The front end is held by the holding body 38. The other end of the holding body 38 is connected to a motor 39, whereby the motor 39 can be rotated in the direction Θ in the horizontal plane. A photoresist nozzle 55 is connected to a hose (not shown), and a photoresist can be supplied to the photoresist nozzle 55 through a hose (not shown) through the hose. The cleaning liquid supply mechanism 57 has a cleaning liquid nozzle 44 for discharging the cleaning liquid into the rotating cup 50, and the cleaning liquid nozzle 44 is supported by a horizontal support 42. As the washing liquid, for example, a thinner can be used. The horizontal support 42 is connected to the motor 43, so that the motor 43 can be rotated in the direction Θ in the horizontal plane. The cleaning liquid nozzle 44 can supply cleaning liquid from a storage tank for a cleaning liquid (not shown). The rotary cup 50 is provided with a rotary chuck 51 for holding the substrate G by vacuum suction, for example. The rotary chuck 51 is attached to a rotating shaft member 48, and the rotating shaft member 48 is connected to a driving portion 40 having a motor or the like, so that the rotating chuck 51 can be rotated. A vacuum seal portion 54 connected to, for example, a vacuum pump 53 is provided below the rotary shaft member 48. An exhaust path (not shown) is formed inside the rotary shaft member 48. In this way, the rotary chuck 51 can be clamped by a vacuum 51 -19- (17) 200425224 At the same time, the 'rotating shaft member 48 can be lifted and lowered by the gas contained in the driving part 40' in a state in which the cover 3 7 is removed from the rotary cup 50 Next, the chuck 51 can be seen from the opening portion 50 b of the rotating cup 50. Thereby, the substrate G is sent and received between the jib and the rotary chuck 51 (not shown), for example. The chuck 51 is at the lowermost position in the state shown in FIG. 4, and abuts on the O-ring 60 attached to the bottom 50c of the rotary cup 50 here. At the same time, a roller base 49 is mounted on the rotating shaft member 48, and the roller base 49 is fixed to a cylinder 50a protrudingly provided in the center of the rotary cup 50. Because of this structure, the rotating shaft member, the roller base 49, the rotating cup 50, and the cover 37 can be rotated as a whole by the rotational driving of the driving portion 40. Referring to Fig. 6, a storage tank 52 for storing the cleaning liquid supplied from the cleaning liquid supply mechanism 57 is arranged around the spin chuck 51 of the bottom 50c of the spin cup 50 at the upper and lower positions. This storage tank has a structure in which the cleaning liquid can be stored in the interior 5 2d surrounded by the frame. The upper surface of the storage tank 52 is formed with a mouth 52b (refer to FIG. 5) for supplying washing liquid to the inside 52d, and a plurality of holes 52a for discharging the stored washing liquid as described later. These holes 52a are formed obliquely from the rotation axis direction of the rotating cup 50 toward the rotation center side, for example. The storage tank 52 is fixed to the bottom 50c of the rotary 50 by screwing a plurality of bolts 56 into a recessed portion 52c provided inside. The supply port 5 2 b is located in a plane direction as shown in FIG. 5. The front end of the cleaning liquid nozzle 44 of the cleaning liquid supply mechanism 57 is viewed on a rail. Thereby, at the position indicated by the symbol M of the horizontal support 42 'from the isorotation transposition seat, the 48 wash, and the 52 wash in the traces of the cup to be cleaned -20- (18) 200425224 cleansing nozzle 4 4 The cleaning solution is injected into the supply port 5 2 b. The enlarged plan view near the supply port 52b. The supply port 52b has the arrangement position of the distribution hole 52a inside (the reason why the rotation center of the rotation cup 50 forms such an arrangement relationship is that the rotation cup is rotated as described later to prevent the washing liquid from being discharged from the supply port 52b. That is, because there is In this connection, when the rotating cup 50 is rotated, the washing centrifugal force stored in the inner portion 52d flows outward in the inner portion 52d. Therefore, the washing liquid can only be discharged from the plurality of holes 5 2a arranged at the outer opening 5 2 b. The cylinder 50a at the lower part of the rotating cup is provided with, for example, a nozzle 45 for supplying nitrogen gas. This nitrogen gas is supplied from the nitrogen gas 4 7 through a gas supply pipe 46. This nitrogen gas is rotated by, for example, an exhaust device not shown In the case of the air in the cup 50, the inside of the rotating cup 50 should not be ejected. Next, the operation of the photoresist coating processing unit configured as described above will be described. In the state where the cover 37 is lifted by the robot arm 36, The arm (not shown) is carried directly above the rotary cup 50. Therefore, the opening 50b of the rotary chuck 5 1 rises to a position higher than the upper end of the rotary cup 50, and the arm receives the substrate. The rotary chuck 51 that receives the substrate is rotated Cup opening 5 Ob down The substrate G is contained in the cup 50. At this time, the photoresist nozzle 55 and the cleaning liquid nozzle 44 are turned to the outside of the cup 50. Then, the photoresist nozzle 55 is shown as a dotted line in FIG. The center on the substrate G is provided from the photoresist nozzle 55 to the substrate G (the figure is on the side). At 50 o'clock, the auxiliary fluid of CT will pass from the auxiliary side when the negative pressure is discharged in the nitrogen supply part which is more than the gas supply. When it is rotating, it will rotate, and the movement shall be specified as -21 · (19) 200425224 Photoresist liquid. The lid 37 is covered with the rotating cup 50 and the cup 50 together with the rotating chuck 51 to rotate at a predetermined rotation speed, and the entire surface of the substrate surface is coated with a photoresist by a cardiac force. Next, the lid body 37 is lifted up by the robot arm 36 again, and the screw i is raised. After the substrate held by the rotary chuck 51 is taken up by the sub-board G (not shown), the rotary chuck 51 is lowered to the bottom. (Next, the cleaning liquid nozzle 44 is moved to the position shown in FIG. 5 and the cleaning liquid is injected into the storage tank 52. After the cleaning liquid is stored, the nozzle 44 is retracted to the outside of the rotating cup 50, and the lid 37 is rotated again. 50. As the rotating cup 50 rotates at a predetermined speed, it is shown that the washing liquid 21 stored in the storage tank 52 uses the flow force to spread the washing liquid directly from the hole 52a due to the centrifugal force. Because The hole 52a is formed obliquely, and the discharge direction of the cleaning liquid is oriented. As a result, the cleaning liquid and the area of the substrate G of the cover 37 (the area shown by the symbol A, that is, the right side of the dotted line is rotated) The majority of the photoresist scattered in the cup 50 is A. The centrifugal force causes the photoresist to diffuse on the substrate and is removed from the substrate. There is less photoresist in the B area on the opposite side of A, as long as it can be washed It is sufficient to clean the area on the A side of the lid body 37. Thus, in order to clean the area on the A side of the lid body 37, the storage tank 52 The width (left and right degrees of the storage tank 52 shown in FIG. 6), the angle of the hole 52a and the like are different, but these parameters can be designed. In this way, it is scattered from the hole 52a and adheres to the cover 37, and rotates Take this with the arm from the chuck 5 1 to take it. JL txja set. The cleaning liquid spray sprayed in the position shown in Figure 6 flows to the outside and flows out as shown in Figure 6, and the fly is also near the outer side of the oblique square.) The side area The external scatter scatters, although the direction may be appropriately changed due to the length of the liquid. The liquid will flow to the outside of the lid due to the centrifugal force of -22- (20) 200425224. This can remove the photoresist solution for washing the lid 37. At the same time, The washing centrifugal force attached to the lid 37 directly reaches the rotating cup 50, so it can also be washed and rotated. In this embodiment, the storage tank 52 is provided on the rotating chuck 5 1. This will not scatter the washing liquid as in the traditional way. The chuck being rotated can remove and clean the photoresist liquid attached to the cover 37. As in the traditional method, each time the cover is cleaned, a cleaning device must be installed and removed, which can save the cleaning process. Second With reference to FIG. 8, another embodiment of the storage tank will be described. The storage tank 62 is different from the storage tank 52 shown in the above embodiment in that the means for discharging the cleaning liquid is not a hole, but a slit 62a. This slit is formed along each side of the substrate G, for example, Fig. 6 is indicated by the symbol 52d). With this structure, the specified area of the cover body 37 can be cleaned without special equipment such as attachment and detachment, and the procedure of cleaning treatment can be saved. Fig. 9 is an enlarged view of the inside of the spin cup of another embodiment: in the example shown in this figure, the hole 72a for discharging the cleaning liquid is formed on the upper surface of the groove 72 in a vertical direction. A nozzle 72b for the cleaning liquid 21 is installed in this hole 72a. The tip of this nozzle 72b is on the rotation center side in the direction of the rotation axis of the rotary cup 50. Thereby, the cleaning liquid is discharged from the movable center side, and the predetermined K of the cover 37 can be washed. Next, referring to FIG. 10, FIG. 11 and FIG. 12, other embodiments of the tank are described. As shown in FIGS. 10 and 11, a plurality of partition members 89 are provided inside the storage tank 82 in the state. This net adheres to the clean solution and can be borrowed from the cup 50. There is no need for appliances and other features when blocked by 51. The storage side is, spit 6 2 a is, the inside (in, you can also clean the appliance _ side view. It is useful for storage and spit installation is set to the direction that can be turned. The storage structure of this embodiment is described. (21) 200425224 pieces 89 are arranged in the direction of the periphery of the substrate G, thereby partitioning the storage tank 82 into a plurality of compartments 83. Each partition member 89 is shown in a plate as shown in Figs. 10 and 12 It is arranged obliquely to the arrangement direction of the partition member 89 (which is originally the peripheral direction of the substrate G) (indicated by the angle ㊀ in FIG. 12). As shown in FIG. 12, the side surface of the partition member 89 is arranged. The upper sides 89a of 89a and 89b are in contact with the inner upper surface 82e of the storage tank 82 (see FIG. 11). On the other hand, the lateral side 89b does not contact the side surface 8g of the storage tank 82, leaving a gap 8 5 (refer to FIG. 11). This gap is provided to allow the cleaning liquid to flow throughout the entire interior of the storage tank 8 2 so that the plurality of compartments 8 3 communicate. Furthermore, the storage tank 82 of this embodiment The number of 8 2a discharged from the cleaning solution is greater than the number of holes in each of the embodiments described above. The member 89, for example, stores the washing liquid in the storage tank 82 by the washing liquid supply mechanism 57 (see FIG. 5), and uses the gap 85 to make the washing liquid reach the entire area. During washing, it is rotated. The cup 50 is rotated to cause the washing liquid to flow to the outer periphery by centrifugal force. Therefore, the washing liquid can be left in each of the compartments 83 partitioned by the partition member 89 without passing through the plurality of compartments 83. As a result, as much The paired movement of the cleaning liquid generated by the rotation of the rotating cup 50 and the storage tank 82 is suppressed. That is, the cleaning liquid stored inside the storage tank 82 will have a property of being stationary for the rotating storage tank 82 due to its nature. However, this embodiment can avoid such a problem, and the discharge force of the cleaning solution is increased, so that the discharge amount is increased, so that the cleaning solution can be discharged well. -24- (22) (22) 200425224 At the same time, because the partition members 89 are arranged obliquely to the arrangement direction, the cleaning liquid inside the storage tank 82 can be aligned with the rotation direction of the rotating cup 50 to circulate. The invention is not limited to the embodiments described above, but may be There are various modifications. For example, the number of holes 52a may not be plural, and may be one. Meanwhile, one of the four slits 62a in FIG. 8 may be plural long holes. However, in The photoresist coating method of the photoresist coating processing unit CT is not limited to the above-mentioned embodiment, and may be a so-called scan coating in which the nozzle is moved on the substrate G and the photoresist is discharged at the same time. A gap 85 in FIG. 11 is provided, and a communication port through which a cleaning liquid is passed is provided in the partition member 89. The substrate in the above embodiment is a glass substrate for a liquid crystal display device as an example. If a cover is provided, the semiconductor wafer substrate can also be applied to the present invention. Fig. 13 is a cross-sectional view showing a part of a rotary cup 162 of a photoresist coating processing unit according to another embodiment. It should be noted that in this embodiment, the same components as those in the above embodiment are denoted by the same reference numerals, and descriptions thereof will be omitted, and description will be given focusing on the different parts. The fixed cup 161 accommodates the rotating cup 162, which is used to separate the airflow flowing inside and the cleaning liquid during cleaning as described later. The fixed cup 1 6 1 has an opening at an upper end portion and an air flow control portion 1 80 at an outer peripheral portion, and the entire shape is slightly cylindrical. The air flow control unit 1 80 is provided with, for example, an inner wall 180a inclined downward toward the outer side -25- (23) (23) 200425224: an inner wall inclined downward and turned downward at the height A that becomes the inner wall 180a 1 8 0 b; and the inner wall 1 8 0 c which is slanted inwardly and downwardly. A nozzle insertion portion 185 of a cleaning nozzle 203 in which a first nozzle for discharging the cleaning liquid is disposed is fixed to the outer surface of the upper portion of the airflow control portion 180. The cleaning nozzle 203 is connected to a storage tank 220 that stores a cleaning liquid through a cleaning liquid supply pipe. In the cleaning, a cleaning liquid is supplied to the cleaning nozzle 203 to wash the outer wall 162b and the like of the rotating cup 162. In addition, a hole for inserting a cleaning nozzle may be formed in the nozzle insertion portion 18.5, and another nozzle may be inserted into this hole to spit out a cleaning solution for cleaning, instead of the cleaning device provided with the cleaning Nozzle 203 ° The V-shaped seal 102 is embedded in the upper surface of the nozzle insertion portion 185, for example. A disc-shaped fixed cup lid 186 provided with an inner wall 186b is detachably disposed on the nozzle insertion portion 185 via a V-shaped seal 102. The fixed cup lid 186 is arranged such that the inner wall 186b and the inner wall 180a are almost on the same surface. The upper wall 186a of the fixed cup lid 186 is formed at an approximately central portion with an inlet 182 for introducing external air. The number or shape of the introduction ports formed in the fixed cup lid 186 may be, for example, two introduction ports forming half the area of the introduction port 182. The disc-shaped cover 137 is disposed at a first interval hi (hereinafter, a gap of the first interval hi is simply referred to as a "first flow path") away from the upper wall 186a of the fixed cup lid 186. The upper periphery of the rotating cup 162 is a second interval h2 (hereinafter, the second interval -26-(24) 200425224 h2) which is located at a distance from the inner wall 18 0a which is narrower than the first interval hi. Road "). 162b of the rotary cup 162 faces the inner wall 180a, and at the same time, it is arranged so that the distance from the inner wall 180a becomes wider. At the upper part of the inner wall 180c, a protective member 1 9 7 which protrudes outwards slightly horizontally is attached to the protruding member. The height A is below the height of the outer bottom surface 162a of the rotary cup 162. Furthermore, for example, the height A may be made lower than the horizontal height of the lower surface of the rotating cup 162. The bottom surface of the fixed cup 1 6 1 is provided with, for example, four exhaust pipes 183 formed in a row to discharge the gas 183a introduced from the introduction port 182 into the fixed cup 161. The exhaust pipe 183 is connected to an exhaust gas (not shown). A discharge hole is formed on the inner wall side of the fixed cup 161 by turning the rotary 162 to the lower part of the side peripheral wall of the rotary cup 162. 104. A waste liquid pipe 181 having, for example, four waste liquid ports 181d for discharging the photoresist liquid discharged from the discharge hole 104 downwardly is projected downward from the bottom of the air flow control part 180. The waste liquid pipe 181 is connected to the waste liquid pipe shown. The fixed cup 1 6 1 has a waste liquid pipe 194 on the inside of the waste liquid port 1 8 1 d and the outside of the exhaust port, and forms a waste liquid port for draining the photoresist liquid. The diameter of the waste liquid port 194a is set smaller than the diameter of the waste liquid port. A disk-shaped 192 is fixed to the inner bottom surface 161b of the fixing cup 161. The most useful air outlet duct rotating cup 180a provided with B is formed along the inner and outer walls of the fixed cup 161 on the outer peripheral portion of the partition wall 192, and the waste is not shown in the figure. 183a 194a 1 8 1 d The bottom surface of the partition -27- (25) ( 25) A step having the shape of 200425224 1 6 1 b, the outer peripheral edge portion of the partition wall 192 is bent downward along the inclination of the inner wall 180c. The space between the inner bottom surface 161b of the fixed cup 161 and the outer bottom surface 162a of the rotary cup 162 is partitioned by the partition wall 192 into two equal parts. Between the exhaust port 183a and the bottom surface of the rotating cup 162, for example, a fairing plate 195 is formed with 12 through holes 196. The rectifying plate 195 is arranged so that the through hole 196 of the rectifying plate 195 and the exhaust port 1 8 3 a are staggered and do not overlap. A plurality of second nozzle cleaning nozzles 205 and a third nozzle cleaning nozzle 206 are continuously mounted on the bottom surface of the fixed cup 161 between the waste liquid pipe 181 and the waste liquid pipe 194. The cleaning nozzle 205 and the cleaning nozzle 206 are connected to a storage tank 220 for storing a cleaning liquid through a cleaning liquid supply pipe, respectively. The cleaning nozzle 205 is used to clean the outer bottom surface 162 a of the rotating cup 162. The front end portion of the cleaning nozzle 205 penetrates the partition wall 192 and protrudes toward the outer bottom surface 162a of the rotary cup 162. Therefore, the washing liquid can be directly discharged from the washing nozzle 205 to the outer bottom surface 162a, and the outer bottom surface 162a can be washed. The cleaning nozzle 206 is used to clean the inner wall 180c of the airflow control unit 180. A front end portion of the cleaning nozzle 206 is located below the partition wall 192, and a side surface of the front end portion forms a discharge port (not shown) for discharging the cleaning liquid. Therefore, the cleaning liquid discharged from the cleaning nozzle 206 can be discharged to the inner wall 180c. Therefore, the cleaning liquid can be discharged from the cleaning nozzle 206 to clean the inner wall 180c. As the material of the inner wall of the storage tank 52, for example, a metal such as aluminum can be used. This can prevent deformation due to rotation when using synthetic resin, etc., and can supply the cleaning liquid stably. The cleaning mechanism includes a cleaning nozzle 203, a cleaning nozzle 205, a cleaning nozzle -28- (26) (26) 200425224 2 06, and a storage tank 220. Fig. 14 is a plan view of a photoresist coating processing unit (C T). As shown in Fig. 14, a supply port 152b is formed in the storage tank 52, and the center of the rotary cup 162 is held by the supply port 5 2b. The cleaning liquid supply mechanism 1 5 7 includes a cleaning liquid nozzle 44 as a discharge nozzle supported by a horizontal support 1 42 as a support. The horizontal cleaning body 142 supports the side wall cleaning nozzle 201a of the fifth nozzle. The cleaning liquid nozzle 44 is configured to be driven by the motor 43 to rotate around the shaft of the motor 43 at least between the outside of the rotary cup 162 and a position directly above the supply port 52b (position P 1). Therefore, when the cleaning liquid nozzle 44 is located at the position P1, that is, directly above the supply port 52b, the cleaning liquid can be discharged from the cleaning liquid nozzle 44 into the supply port 52b. By the drive of the same motor 43, the cleaning liquid nozzle 44 can be moved further to the position P2 as a whole with the side wall cleaning nozzle 201a and the bottom surface cleaning nozzle described later. When the cleaning liquid nozzle 44 is positioned at the position P2, the open end 201b of the side wall cleaning nozzle 201a is positioned above the inner surface side of the side wall of the rotary cup 162. Fig. 15 is a plan view of the cleaning liquid supply mechanism 157 of this embodiment. As shown in FIG. 15, the cleaning liquid nozzle 44 and the bottom cleaning nozzle 201 for the fourth nozzle are supported by the horizontal support 142. The front end portion of the bottom surface cleaning nozzle 20 1 is formed with an opening 20 1 c for discharging the cleaning liquid to the lower side. The side wall cleaning nozzle 201a is connected to the central portion of the bottom surface cleaning nozzle 201 in the longitudinal direction approximately at the center. The side wall cleaning nozzle 201a is used to clean the rotating cup 162. The side wall cleaning nozzle 201a is an open end 201b which is bent at the front end toward -29- (27) (27) 200425224 toward, for example, the motor 43 side. The bottom surface cleaning nozzle 201 and the cleaning liquid nozzle 44 are connected to a storage tank 222 for storing a cleaning liquid through a switching valve 22 1 for switching the supply of the cleaning liquid. Therefore, the cleaning liquid supplied in the bottom surface cleaning nozzle 201 is divided at the branch point V of the side wall cleaning nozzle 201a and the bottom surface cleaning nozzle 201 into the side wall cleaning nozzle 2 0 1 a side and the slit. 2 0 1 c side, and spit out from the open end 201b and the slit 201c. At the same time, the cleaning liquid nozzle 44, the bottom surface cleaning nozzle 201, and the side wall cleaning nozzle 201a can be moved integrally by the motor 43. Therefore, a different moving mechanism is not required, and the structure can be simplified, and cost reduction and space saving can be achieved. It should be noted that the present embodiment shows an example in which the side wall cleaning nozzle 20 1 a is fixed to a substantially central portion in the longitudinal direction of the horizontal support 142. However, the side wall cleaning nozzle 201a may be offset-connected to the motor 43 side to increase the length of the slit 20 1 c. In this way, the cleaning liquid can be supplied to a large area, and the cleaning can be effectively performed. Next, the function and the like of the rotating cup 162 when the photoresist is applied to the substrate will be described with reference to Figs. When the rotating cup 162 is rotated, the gas flowing into the fixed cup 161 flows into the first flow path from the introduction port 182. The gas flowing into the first flow path flows into the second flow path along the inner wall 186b (inclined surface) of the fixed cup lid 186. Since the interval h2 of the second flow path is set smaller than the interval h1 of the first flow path, the flow velocity of the second flow path is faster than the flow velocity of the first flow path. The gas accelerated in the second flow path flows along the inclined surfaces of the inner wall i80a, the inner wall 180b, and the inner wall 180c. That is, within the airflow control unit 180, the -30- (28) (28) 200425224 'gas becomes a vortex in the direction of the arrow C. The photoresist mist generated in the airflow control unit 180 is blocked by the protective member 197 from flowing into the exhaust port 1 8 3 a side, and flows out from the waste liquid pipe 1 8 1 downward. The vortex flowing in the direction of the arrow C flows into the bottom surface of the partition wall 192, and the flow velocity is uniformized by, for example, the through-holes 196 of the rectifying plate 195, and is exhausted from the exhaust port 1 8 3a. Next, a washing procedure of the rotating cup 162 and the fixed cup 161 according to this embodiment will be described with reference to a flowchart shown in FIG. As shown in FIG. 17, the rotary chuck 1 5 1 is raised to wait. The motor 43 shown in Fig. 14 is driven to position the cleaning liquid nozzle 44 at the position P1. After positioning, the cleaning solution is discharged from the cleaning solution nozzle 44 into the supply port 52b and stored in the storage tank 52 (step 1 (S1)). Next, the rotating cup 162 shown in FIG. 14 is rotated 180 degrees (S2). Thereby, the supply port 52b is positioned directly below the cleaning liquid nozzle 44. Next, as in step 1 (S1), the cleaning liquid is discharged from the cleaning liquid nozzle 44 to the supply port 152b, and the cleaning liquid is stored in the storage tank 52 (S3). This allows the cleaning solution to reach the entire storage tank 52 through the supply ports 52b and 152b, thereby reducing the storage time. As shown in Fig. 14, the driving motor 43 aligns the cleaning liquid nozzle 44 with the position P2. Next, the cleaning liquid is discharged from the open end 201b, the slit 201c, the cleaning nozzle 203, and the cleaning nozzle 205. At this time, the rotary cup 162 is rotated at, for example, 5 rpm at the first revolution (S4). That is, the rotating cup 162 is rotated, and at the same time, the washing liquid is discharged from each nozzle to wash each part. Specifically -31-(29) 200425224 As shown in Fig. 17, the cleaning liquid is discharged from the open end 201b to the inner peripheral surfaces 162η and 162t of the wall of the rotating cup 162. At the same time, the cleaning liquid is discharged from the slit to the inner bottom surface 162c of the rotating cup 162. At the same time, the cleaning nozzle 203 discharges the cleaning liquid to the outer wall 162b. Then, the washing liquid is discharged from the washing 205 to the outer bottom surface 162a of the spin cup 162. Such as clean all sides. Next, the cleaning liquid nozzle 44 is allowed to stand outside the fixed cup 161 to close the lid 137 (S5). Next, like the above-mentioned embodiment, for example, nitrogen gas is ejected into the spinner 162 (S6). Next, for example, the rotating cup 162 is rotated at 700 rpm at the second revolution (S 7). Thereby, for example, the rotating cup 1 62 can be rotated, and the cleaning liquid can be sprayed from the groove 52, and the peripheral portion 13 7a under the cover 137 can be sprayed with nitrogen, and the cleaning liquid can be discharged from the discharge hole 104 to the rotating cup. outer. In the following, nitrogen is sprayed until the end of cleaning. Next, for example, the rotating cup 162 is rotated at 100 rpm at the third revolution, and at the same time, the cleaning liquid is discharged from the cleaning nozzle 205, the cleaning nozzle 206, and the cleaning nozzle 203 (S8). Thereby, while the number of revolutions of the spin cup 162 can be suppressed, the outer bottom surface 162a of the spin cup 162, the inner wall 180c of the cup 161, and the residual stain on the outer wall 162b of the spin cup 162 can be cleaned at the same time. In this way, first, at step 4, the contamination of the agent or the like attached to the rotating cup 162 is removed. In step 7, when the lid body 1 3 7 is cleaned, the contamination with the rotating cup 162 or the fixed cup 161 is removed, and the side further removed in step 8 20 1c is washed from the washing nozzle, and the rotating cup is rotated and stored. Rotate by 162 and use a rotating cup to fix the dirt. The photoresist is removed, and -32- (30) (30) 200425224 is thoroughly cleaned and treated to prevent particles from occurring. Next, the number of revolutions of the spin cup 162 is increased to, for example, 300 rpm at the fourth number of revolutions. At the same time, the cleaning liquid is discharged from the cleaning nozzle 203 to the outer wall 62b (S 9). Thereby, by rotating the spin cup 16 2, the washing liquid discharged from the washing nozzle 20 03 can be reflected on the outer wall 162 b, and the inner wall 1 8 0 a can be washed with the reflected washing liquid. In addition, the 'native embodiment' is an example in which step 7 (S7) is not executed after step 6 (S6). However, the order of the two steps is not necessarily the same. For example, it is also possible to start the rotation of the rotating cup 162 of step 7 at about the same time or after the start of the nitrogen injection in step 6. As shown in FIG. 18, for example, the shape of the storage tank 52 may be changed so that the corner of the storage tank 52 is separated from the side wall of the rotating cup 162 toward the central axis of the rotating cup 162, and more is formed by the equal corners. Hole 52a. In such a configuration, when the cleaning liquid sprayed from the hole 52a is scattered to the outer peripheral side due to centrifugal force during cleaning, the bottom peripheral portion 137a of the cover body 1 37 shown in Fig. 13 can be reliably cleaned. At the same time, by increasing the number of the holes 52a, more washing liquid can be scattered to the peripheral edge portion 137a of the bottom surface, and the cleaning operation can be effectively performed. Further, instead of changing the shape of the storage tank 52, the position of the hole 52a of the storage tank 52 is moved to the center side of the rotary cup 162, and the same effect can be obtained. The above-mentioned embodiment is an example in which the supply ports 52b and 152b of the storage tank 52 are formed at substantially the center of the side of the storage tank 52. However, the positions of the supply ports 52b and 152b are not limited to this. For example, they may be formed near the corners where the centrifugal force of the storage tank 52 is greatest. In such a configuration, for example, the cleaning solution is stored in the storage tank 52 and the rotating cup 162 is rotated -33- (31) (31) 200425224 'The centrifugal force can be effectively used' to disperse the cleaning solution into the storage tank 522. The embodiment described above is an example in which aluminum is used as the material of the inner wall of the storage tank 52. However, the inner wall of the 'storage tank 52 is not limited to aluminum, and fluorine may be applied to the inner wall, for example. This structure can make the flow of the washing liquid smoother, and can shorten the storage time of the washing liquid. At the same time, the cleaning liquid can be easily scattered. The above embodiment shows an example in which the cleaning liquid nozzle 44 and the supply port 5 2b are aligned with each other to discharge the cleaning liquid. However, as shown in FIG. 19, an engagement groove 5 2f larger than the supply port 52b may be formed in the storage tank 52, and a front end of the cleaning liquid nozzle 44 may be provided with an engagement groove 52f. For example, the engagement portion 44f made of rubber. When the cleaning solution is discharged to the storage tank 52 in step 1 or step 3 shown in Fig. 16, for example, the horizontal support 142 is lowered, and the engagement portion 44f is engaged with the engagement groove 52f. In this configuration, for example, when the cleaning liquid is stored, the cleaning liquid can be prevented from leaking out of the storage tank 52, and the discharge speed can be accelerated, thereby allowing the cleaning liquid to be stored in a short time. As described above, according to the present invention, it is possible to reliably clean a container such as a cup or to open and close the lid of the container, and it is possible to save the operation procedure of the cleaning process. This can prevent particles from occurring in the cover. [Brief Description of the Drawings] Fig. 1 is a plan view showing the overall structure of a coating development processing system according to an embodiment of the present invention. -34- (32) (32) 200425224 Figure 2 is a front view of the coating development processing system shown in Figure 1. FIG. 3 is a rear view of the coating development processing system shown in FIG. 1. FIG. FIG. 4 is a cross-sectional view of a photoresist coating processing unit according to an embodiment. FIG. 5 is a plan view of the photoresist coating processing unit shown in FIG. 4. Fig. 6 is an enlarged cross-sectional view showing the inside of the rotary cup for explaining a storage tank according to an embodiment. Fig. 7 is an enlarged plan view of the vicinity of the supply port of the cleaning solution in the storage tank. Fig. 8 'is a plan view for explaining the rotating cup and the interior of the storage tank in another embodiment. Fig. 9 is an enlarged cross-sectional view showing the inside of the rotating cup for explaining a storage tank according to another embodiment. Fig. 10 is a plan view showing a part of the inside of the rotary cup for explaining a storage tank according to an embodiment. Fig. 11 is a sectional view of the storage tank shown in Fig. 10. FIG. 12 is a perspective view of the partition member shown in FIG. 10. Fig. 13 is a sectional view showing a part of a rotary cup according to another embodiment. Fig. 14 is a plan view of a photoresist coating processing unit according to another embodiment. Fig. 15 is a plan view of a cleaning liquid supply mechanism of another embodiment. Fig. 16 is a flow chart showing a method of supplying a cleaning liquid of another embodiment. -35- (33) (33) 200425224. FIG. 17 is a cross-sectional view of the rotating cup and the fixed cup shown in FIG. 16 when the rotating cup is cleaned. Fig. 18 is a plan view showing a modified example of the storage tank of another embodiment. Fig. 19 is a side view showing an engaging portion of a cleaning liquid supply mechanism according to another embodiment. [Illustration of drawing number] G: Glass substrate CT: Photoresist coating processing unit 37: Cover body 4: Drive unit 4 1: Photoresist liquid supply mechanism 43: Motor 44: Washing liquid nozzle 5 0: Rotating cup 50〇b: Openings 5 1, 1 5 1: Rotating chucks 52, 62, 72: Storage tank
52a 、 72a ：孑L 52b 、 152b :供應口 5 7、1 5 7 :洗淨液供應機構 62a :開縫 -36- (34) (34)200425224 1 6 1 :固定杯 1 6 2 :旋轉杯 201 :底面洗淨用噴嘴 201a :側壁洗淨用噴嘴 203、205、206 ：洗淨用噴嘴52a, 72a: 孑 L 52b, 152b: supply port 5 7, 1, 5 7: cleaning liquid supply mechanism 62a: slit-36- (34) (34) 200425224 1 6 1: fixed cup 1 6 2: rotating cup 201: Bottom surface cleaning nozzle 201a: Side wall cleaning nozzle 203, 205, 206: Cleaning nozzle
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