1231950 (1) 玫、發明說明 【發明所屬之技術領域】 本發明係關於基板處理裝置及洗淨方法。 【先前技術】 在LCD的製造過程，爲了要在LCD用的玻璃基板上 形成ITO ( Indium Tin Oxide )薄膜或電極圖案，利用與 製造半導體裝置時所用者相同的光平版印刷（photo lithography)技術。光平版印刷技術是將光阻劑塗敷在玻 璃基板，對此曝光，再顯像。 光阻劑的塗敷處理是，例如將玻璃基板收容在旋轉的 杯內，對基板上供應光阻劑，蓋上杯蓋，令杯與基板一體 轉動，藉此令光阻劑擴散到基板表面的整個面上。 這種塗敷處理所用的杯內部會附著，因其旋轉的離心 力而飛散的光阻劑，或成霧狀的光阻劑。這種附著物在乾 燥後成爲產生顆粒的原因。爲了解決這個問題，現況是， 在杯內設可吐出洗淨液的噴嘴，將洗淨液吐出在上述附著 物以去除附著物。這種裝置揭示在例如日本國特開平8-25 5 7 8 9號公報的第6圖。 另有提案，配設一種將洗淨液儲存在專用的容器內， •令該容器在杯內旋轉，藉此，令洗淨液從形成在該容器的 孔向外飛散，以洗淨杯子的洗淨工具的裝置。這種裝置是 揭示在，例如日本國特許廳所發行的特開平5-82435號公 報的第2、4、6圖（但在此公報是處理半導體晶圓，而不 (2) 1231950 是處理玻璃基板的裝置）。 然而，專利文獻1所示裝置在例如其第6圖，設有洗 淨蓋子用的蓋體洗淨用噴嘴，但旋轉夾頭（藉由真空作用 保持基板，使基板轉動的構件）阻擋從洗淨蓋體用噴嘴吐 出的洗淨液。因此，本例幾乎無法洗淨蓋體。這種蓋體的 內側特別容易被霧狀的光阻劑污染，這種蓋體的污染必須 去除。 在專利文獻1所示的裝置，如果將旋轉夾頭設計成較 小型，便可以洗淨蓋體。但是，從近來的玻璃基板的大型 化的觀點，將旋轉夾頭設計成較小型會有安全性等的問題 。如果考慮，目前的旋轉夾頭是以跟基板的大小差不多同 大者逐漸成爲主流，則蓋體的洗淨會愈來愈困難。 另一方面，專利文獻2所示的裝置則未配設關閉杯子 上部的開口部的蓋體，但每一次洗淨杯子，均需要裝卸洗 淨工具，作業數增加，十分麻煩。同時，將這種洗淨工具 應用在專利文獻1所示的裝置，也無法洗淨容器的蓋體。 專利文獻1日本國特開平8-2 5 5 789號公報 專利文獻2日本國特開平5-8243 5號公報 【發明內容】 鑑於以上所述的實情，本發明的目的在提供，能夠確 實洗淨杯子等容器或開閉該容器的蓋體’可以節省該洗淨 處理用的作業手續的基板處理裝置及洗淨方法。 爲了達成上述目的，本發明的基板處理裝置具備有： -5- (3) 1231950 將基板保持成可轉動狀的保持構件；具有放進及取出基板 的開口部，收容由上述保持構件保持的基板，同時與上述 保持構件同步轉動的容器；可裝卸狀設在上述開口部，用 以開閉上述容器的蓋體；裝設在上述容器，同時設在上述 保持構件的周圍中的至少一部分，至少可在內部儲存洗淨 上述蓋體用的洗淨液的儲存槽；以及令上述容器轉動，藉 由其離心力使儲存在上述儲存槽的洗淨液向上述蓋體飛散 的旋轉驅動部。 本發明是在，例如在基板上塗敷塗敷液後，以蓋體覆 蓋容器的狀態下令容器旋轉，藉由其離心力使洗淨液從儲 存槽向蓋體飛散。此儲存槽是設在保持構件的周圍，因此 ’不會像傳統方式，飛散的洗淨液被保持構件阻擋，例如 ’也可以使洗淨液飛散到靠近蓋體的中央部，可以洗淨蓋 體。同時，附著於蓋體的洗淨液因離心力而流向轉動的外 側’該流動的洗淨液會到達容器，因此也可以洗淨容器。 而且’本發明不必如傳統方式每次洗淨時裝卸洗淨工具， 可以節省洗淨處理時的作業手續。 在本發明，洗淨液可以使用，例如桂皮酮等，具體上 是 3_甲氧基丙酸甲酯（MMP，沸點：145°C，黏度： Ι-lcps )之外，乳酸乙酯（el，沸點：154°C，黏度： 2.6cpS) 、3·甲氧基丙酸乙酯（EEP，沸點：170。<：，黏度 :1 .3cpS )、丙酮酸乙酯（EP，沸點：144°C，黏度： 1.2cps )、乙酸丙二醇單甲基醚酯（PGMEA，沸點： 146°匚，黏度：1.3(^8)、2-庚酮（沸點：152。(：，黏度： -6 - (4) 1231950 1.1 cps )環己酮（ARC的溶劑）等在這個領域所習用者。 同時，在本發明，「與一…同步」含有，保持構件與 容器以例如一體狀轉動的意思，或者含有，例如藉由個別 獨立的驅動源，分別使保持構件與容器同步轉動的意思。 本發明的一個形態是，在面向該儲存槽的上述蓋體的 一側，形成有用以吐出儲存在上述儲存槽的洗淨液的孔。 藉此，可以確實使洗淨液向蓋體飛散。同時，也可以用線 狀的開縫取代孔。 本發明的一個形態是，上述孔是形成爲，上述洗淨槽 的吐出方向較上述容器旋轉的轉軸方向朝向旋轉中心側。 藉此，可以確實向蓋體中央部吐出洗淨液。同時，也可以 用線狀的開縫取代孔。 本發明的一個形態是，在上述儲存槽的內部進一步備 有供應上述洗淨液的洗淨液供應機構。同時，上述洗淨液 供應機構具備有：向上述儲存槽內部吐出上述洗淨液的噴 嘴；及使上述噴嘴在上述容器外的規定位置與上述保持構 件的直上位置之間移動的移動機構。藉此，可以例如，每 當完成規定片數的基板的的塗敷處理後，自動供應洗淨液 進行洗淨，作業很容易。或者，每當完成一片基板的塗敷 處理後供應洗淨液，便可以恆常保持容器或蓋體沒有受污 染的狀態，可以確實防止發生顆粒。 本發明的一個形態是，進一步具備有：排列在上述儲 存槽內部，在由上述保持構件所保持的基板的周圍方向’ 將該儲存槽內部區分成複數個隔間的複數個分隔構件。藉 小 (5) (5)1231950 此，可以盡力抑制因容器的轉動所產生的洗淨液與容器的 相對移動，可以增大吐出洗淨液的衝力、吐出量。 本發明的一個形態是，上述複數個分隔構件分別具有 與上述儲存槽成面對面的側面，上述側面的一部分與上述 儲存槽分開空隙配置，另一部分是抵接於上述儲存槽。或 者，上述複數個分隔構件中的至少一個分隔構件形成有， 使上述複數個隔間相互連通的連通口。藉此，可以避免洗 淨液滯留在各室，可以使洗淨液通過空隙或連通口到達整 個區域。 本發明的一個形態是，上述空隙是設在靠近上述儲存 槽的上述容器的轉動中心側的部位。或者，上述連通口是 設在靠近上述分隔構件的上述容器的轉動中心側的部位。 藉此，例如，由上述洗淨液供應機構使洗淨液儲存在儲存 槽內部時，洗淨液可以通過空隙或連通口到達整個區域， 且在洗淨處理時，因容器的轉動’洗淨液在儲存槽內部因 離心力而流到外周側。其結果’洗淨液可以不必流通複數 個隔間，可滯留在各室’進行良好的洗淨液的吐出動作。 本發明的一個形態是，上述複數個分隔構件中的至少 一個分隔構件是呈板狀’對排列該複數個分隔構件的排列 方向傾斜配設之。藉此’可以使儲存槽內部的洗淨液配合 容器的轉動方向流通’可望有更好的洗淨液的吐出動作。 本發明的洗淨方法是，在具有可放進取出基板用的開 口部，經由該開口部收容基板的容器內使用洗淨液’至少 洗淨成可裝卸狀配設在上述開口部用以開閉上述容器的蓋 • 8 - (6) 1231950 體的洗淨方法，具備有：向裝設在上述容器，同時設在上 述容器內保持基板的保持構件周圍的至少一部分的儲存上 述洗淨液的儲存槽，供應該洗淨液的過程；及令上述容器 旋轉，而藉由其離心力，使儲存在上述儲存槽的洗淨液向 上述蓋體飛散的過程。 本發明是，例如在基板上塗敷塗敷液後，向儲存槽供 應洗淨液，然後以蓋體覆蓋在容器的狀態下令容器轉動， 藉其離心力使洗淨液從儲存槽向蓋體飛散。因爲此儲存槽 是設在保持構件的周圍，因此，不會如傳統的保持構件阻 擋洗淨液，例如，也可以使洗淨液飛散到靠近蓋體的中央 部，可以洗淨蓋體。 本發明的其他基板處理裝置具備有：將基板保持成可 轉動狀的保持構件；具有放進及取出基板的開口部，收容 由上述保持構件保持的基板，同時能夠與上述保持構件同 步轉動的第1容器；可裝卸狀設在上述開口部，用以開閉 上述第1容器的蓋體；裝設在上述第1容器，同時，設在 上述保持構件周圍的至少一部分，至少在內部儲存用以洗 淨上述蓋體的洗淨液的儲存槽；令上述第1容器轉動，藉 由其離心力使儲存在上述儲存槽的洗淨液向上述蓋體飛散 的旋轉驅動部；收容上述第1容器的第2容器；爲了至少 洗淨上述第1容器的外周部而設在上述第2容器的具有洗 淨用噴嘴的洗淨機構。 本發明是，例如在基板上塗敷塗敷液後，以蓋體覆蓋 在容器的狀態下令容器轉動，藉其離心力使洗淨液從儲存 -9- (7) 1231950 槽向蓋體飛散。因爲此儲存槽是設在保持構件的周圍’因 此，不會如傳統的保持構件阻擋洗淨液，例如，也可以使 洗淨液飛散到靠近蓋體的中央部，可以洗淨蓋體。同時’ 在第2容器設有用以洗淨第1容器的外周部的洗淨用噴嘴 。因此，例如，藉由轉動驅動部使第1容器轉動同時從洗 淨用噴嘴吐出洗淨液，便可以連同蓋體至少可以洗淨第1 容器的外周部。 本發明的一個形態是，上述洗淨機構的上述洗淨噴嘴 具有：可洗淨上述第1容器的側壁外周面的第1噴嘴；及 用以洗淨上述第1容器的外側底面的第2噴嘴。藉此，例 如，可以藉由轉動驅動部使第1容器轉動，同時，分別由 第1噴嘴、第2噴嘴吐出洗淨液，洗淨第1容器的側壁外 周面，第1容器的外側底面。 本發明的一個形態是，上述上述洗淨機構的上述洗淨 噴嘴具有：可洗淨上述第2容器的內部底面的第3噴嘴。 藉此，可由第3噴嘴吐出洗淨液，洗淨第2容器的內部底 面。 本發明的一個形態是’上述基板處理裝置進一步具有 :可經由形成在上述儲存槽的供應口 ’向該儲存槽內部吐 出上述洗淨液的吐出用噴嘴；以及令上述吐出用噴嘴至少 在上述第1容器外部，與上述供應口的直上方之間移動的 移動機構。藉此’例如’可藉由驅動機構將D土出噴嘴對準 儲存槽的供應口’以儲存洗淨液。 本發明的一個形態是，上述基板處理裝置進一步具有 -10· (8) (8)1231950 :可洗淨上述第1容器的內側底面的第4噴嘴；用以洗淨 上述第1容器側壁的內周面及上面的第5噴嘴；以及將上 述吐出用噴嘴、上述第4噴嘴及上述第5噴嘴成一體支持 的支持體。藉此，例如，使第4噴嘴及第5噴嘴分別移動 至第1容器的上方、第1容器的側壁上方時，也可以利用 儲存洗淨液時所利用的移動機構。同時，以第4噴嘴及第 5噴嘴分別移動至第1容器的上方、第1容器的側壁上方 的狀態下，從第4噴嘴、第5噴嘴吐出洗淨液，藉此洗淨 第1容器的內側底面，及第1容器的側壁內周面及上面。 本發明的一個形態是，至少形成有兩個上述供應口。 藉此，例如，在儲存槽儲存洗淨液時，從一個供應口開始 注入，在儲存的途中藉轉動驅動部使第1容器轉動，再從 儲存槽的別的供應口注入。因爲能夠從不同的供應口使洗 淨液流到儲存槽內的各個部位，因此，可以縮短洗淨液的 儲存時間。 本發明的其他基板處理裝置具備有：將基板保持成可 轉動狀的保持構件；具有放進及取出基板的開口部，收容 由上述保持構件保持的基板，同時能夠與上述保持構件同 步轉動的第1容器；可裝卸狀設在上述開口部，用以開閉 上述第1容器的蓋體；裝設在上述第1容器，同時，設在 上述保持構件周圍的至少一部分，至少在內部儲存用以洗 淨上述蓋體的洗淨液的儲存槽；令上述第1容器轉動，藉 由其離心力使儲存在上述儲存槽的洗淨液向上述蓋體飛散 的旋轉驅動部；配設成可在上述第1容器外部，與形成在 -11 - (9) (9)1231950 上述儲存槽的供應口的直上方之間移動，經由上述供應口 向該儲存槽內部吐出上述洗淨液的吐出用噴嘴；可洗淨上 述第1容器的內側底面的底面洗淨用噴嘴；用以洗淨上述 第1容器側壁的內周面及上面的側壁洗淨用噴嘴；以及將 上述吐出用噴嘴、上述底面洗淨用噴嘴及上述側壁洗淨用 噴嘴成一體支持的支持體。 本發明可以藉由移動機構將吐出用噴嘴移動至儲存槽 的供應口直上方以儲存洗淨液。同時，分別將底面洗淨用 噴嘴、側壁洗淨用噴嘴移動至例如第1容器的上方、第1 容器的側壁上方時，也可以利用相同的移動機構。同時， 以底面洗淨用噴嘴、側壁洗淨用噴嘴分別移動至第1容器 的上方、第1容器的側壁上方的狀態下，從底面洗淨用噴 嘴、側壁洗淨用噴嘴吐出洗淨液，則可洗淨第1容器的內 側底面，及第1容器的側壁內周面及上面。 本發明的其他洗淨方法具備有：（a )令用以吐出洗 淨液的吐出用噴嘴，與形成在安裝於經由放進及取出基板 的開口部收容基板的第1容器的儲存槽的第1供應口，對 準位置的過程；（b )在上述過程（a )之後，從上述吐出 用噴嘴，經由上述第1供應口向上述儲存槽內吐出洗淨液 的過程；（c)在上述過程（b)之後，使上述第1容器轉 動，藉此令上述吐出用噴嘴，與形成在跟儲存槽的上述第 1供應口不同的其他部位的第2供應口，對準位置的過程 ;(d )在上述過程（c )之後，從上述吐出用噴嘴經由上 述第2供應口向上述儲存槽內吐出洗淨液的過程；（e ) -12- (10) (10)1231950 令可洗淨上述第1容器的內側底面的底面洗淨用噴嘴，與 用以洗淨上述第1容器側壁的內周面及上面的側壁洗淨用 噴嘴一體移動，對該第1容器的側壁進行對準位置的過程 ；(f)令上述第1容器以第1種旋轉數旋轉，同時從上 述底面洗淨用噴嘴及上述側壁洗淨用噴嘴吐出上述洗淨液 的過程；（g)令上述第1容器以較第1種旋轉數快的第 2種旋轉數旋轉，藉其離心力，使儲存在上述儲存槽的洗 淨液向可裝卸狀安裝在上述開口部用以開閉上述第1容器 的蓋體飛散的過程。 本發明可以在上述過程（a )至過程（d )，從第1供 應口及與第1供應口不同的第2供應口使洗淨液流到儲存 槽內的各個部位，因此，可以縮短洗淨液的儲存時間。同 時，在過程（e )，將底面洗淨用噴嘴及側壁洗淨用噴嘴 與第1容器對準位置。因此，例如，不需要有不同的移動 機構，因此可以達成低成本化及省空間化。同時，在過程 (f)，以第2旋轉數使第1容器轉動同時吐出洗淨液， 因此可以洗淨第1容器的整個周面。而且，在過程（g) ，令第1容器以較第1種旋轉數快的第2種旋轉數旋轉， 藉此可以使儲存在儲存槽的洗淨液向上述蓋體飛散，以洗 淨蓋體。 本發明的一個形態進一步具備有，（h )在上述過程 (g )之後，令上述第1容器以較第2種旋轉數慢的第3 種旋轉數旋轉，藉此從設在收容第1容器的第2容器的洗 淨用噴嘴向上述第1容器的外周部吐出洗淨液的過程。藉 -13- (11) 1231950 此，例如，可以將第1容器的旋轉數抑制在第3種旋轉數 ，同時洗淨第1容器的外周部。 本發明的一個形態進一步具備有，在上述過程（h ) 之後，令上述第1容器以較第3種旋轉數快的第4種旋轉 數旋轉的過程。藉此，例如，可以使從第1噴嘴吐出的洗 淨液在第1容器的側壁外周面反射，以洗淨第2容器內部 的側面。 【實施方式】 茲依據附圖說明本發明的實施形態如下。 第1圖是應用本發明的LCD基板的塗敷顯像處理系 統的平面圖，第2圖是其正面圖，第3圖是其背面圖。 此塗敷顯像處理系統1備有：用以載置收容複數片玻 璃基板G的卡匣C的卡匣站2;備有可對基板G施加包 含塗敷光阻劑及顯像的一連串處理的複數個處理單元的處 理部3;與曝光裝置32之間送受基板G用的介面部4, 分別在處理部3的兩端配置卡匣站2及介面部4。 卡匣站2備有用以在卡匣C與處理部3之間運送 LCD基板的運送機構10。而在卡匣站2運進運出卡匣C 。同時，運送機構1 〇備有可以在沿卡匣的排列方向配設 的運送路12上移動的運送臂11，藉此運送臂11在卡匣C 與處理部3之間運送基板G。 在處理部3設有：延設在垂直（X方向）於卡匣站2 的卡匣C的排列方向（Y方向）的主運送路3 a ;及沿此 -14- (12) 1231950 主運送路3a並排配設，包含光阻劑塗敷處理單元（CT) 的各處理單元的上游部3b;及並排配設包含顯像處理單 元（DEV)的各處理單元的下游部3c。 在主運送路3a設有，X方向延設的運送路31，及可 沿此運送路31移動，用以向X方向運送玻璃基板G的運 送梭23。此運送梭23可以例如藉由支持梢保持基板G加 以運送。同時，在主運送路3 a的介面部4側端部設有， 用以在處理部3與介面部4之間送受基板G的垂直運送 單元7。 在上游部3b，於卡匣站2側端部設有，用以對基板 G施以洗淨處理的洗滌機洗淨單元（SCR) 20，在此洗滌 機洗淨單元（SCR) 20的上層配設有用以去除基板G上 的有機物的激元UV處理單元（e-UV) 19。 在洗滌機洗淨單元（SCR) 20的旁邊，配置有堆疊多 層的用以對玻璃基板G進行熱處理的單元的熱處理系方 塊24及25。在此等熱處理系方塊24、25之間配置垂直 運送單元5，運送臂5a可以向Z方向及水平方向移動， 且可以向Θ方向轉動，因此，可以擷取兩方塊24及25的 各熱處理系統單元，以運送基板G。再者，上述處理部3 的垂直運送單元7也具有與此垂直運送單元5相同的架構 〇 如第2圖所示，在熱處理系方塊24，從下方順序堆 疊兩層用以對基板G實施塗敷光阻劑前的加熱處理的烘 焙單元（BAKE)，及藉HMDS氣體施加疏水化處理的黏 -15- (13) (13)1231950 著單元（AD)。另一方面，在熱處理系方塊25則從下依 序堆疊有兩層用以對基板G施加冷卻處理的冷卻單元（ COL)，及黏著單元（AD)。 鄰接熱處理系方塊25，在X方向延設光阻劑處理方 塊15。此光阻劑處理方塊15成一體配設有：用以在基板 G塗敷光阻劑的光阻劑塗敷處理單元（CT );藉減壓使上 述塗敷的光阻劑乾燥的減壓乾燥單元（VD);用以去除 本發明的基板G周緣部的光阻劑的邊緣去除器（ER)而 成。在此光阻劑處理方塊1 5設有，可以在光阻劑塗敷處 理單元（CT )至邊緣去除器（ER )間移動的未圖示的副 臂，藉此副臂在光阻劑處理方塊15內運送基板G。 鄰接光阻劑處理方塊15配設有多層架構的熱處理系 方塊26，在此熱處理系方塊26，堆疊3層用以進行塗敷 光阻劑後的加熱處理的預烘焙單元（PREBAKE)。 如第3圖所示，在下游部3 c，於介面部4側端部設 有熱處理系方塊29，在此，從下部依序堆疊有：冷卻單 元（COL );及用以進行曝光後顯像處理前的加熱處理的 曝光後烘焙單元（PEBAKE )。 鄰接熱處理系方塊29，在X方向延設顯像處理單元 (DEV)。此顯像處理單元（DEV)的隔鄰設有熱處理系 方塊28及27，此等熱處理系方塊28及27之間設有跟上 述垂直運送單元5相同架構，可擷取兩方塊28及27的垂 直運送單元6。同時，在顯像處理單元（DEV)端部之上 ，設有i線處理單元（i-UV) 33。 -16- (14) (14)1231950 在熱處理系方塊28，從下部依序堆疊有：冷卻單元 (COL );及用以對基板G施加顯像後的加熱處理的後烘 焙單元（POBAKE)。另一方面，熱處理系方塊27也同 樣，從下部依序堆疊有：冷卻單元（COL );及兩層後烘 焙單元（POBAKE )。 在介面部4，於正面側設有標題機及周邊曝光單元（ Tit]er/ EE ) 22，鄰接垂直運送單元7配置延伸冷卻單元 (EXTCOL ) 35，在背面側配置有緩衝卡匣34並配設， 在此等標題機及周邊曝光單元（Ti tier / EE ) 22、延伸冷 卻單元（EXTCOL) 35、及緩衝卡匣34，與鄰接曝光裝置 32之間進行基板G的送受的垂直運送單元8。此垂直運 送單元8的架構也與上述垂直運送單元5相同。 如以上構成的塗敷顯像處理系統1的處理過程是，首 先，將卡匣C運送到基板G的處理部3部的上游部3b。 在上游部3b，於激元UV處理單元（e-UV ) 19進行表面 改質•有機物去除處理，然後在洗滌機洗淨單元（SCR) 20，以大致上成水平方式運送基板G，而進行洗淨處理及 乾燥處理。接著，在熱處理系方塊24的最下層部，藉由 垂直運送單元的運送臂5a取出基板G，在該熱處理系方 塊24的烘焙單元（BAKE )進行加熱處理，在黏著單元（ AD )向基板G噴霧HMDS氣體，以提高玻璃基板G與光 阻劑膜的密接性。此後，藉由熱處理系方塊2 5的冷卻單 元（COL)進行冷卻處理。 接著，基板G從運送臂5a移交到運送梭23。而運送 •17- (15) (15)1231950 到光阻劑塗敷處理單元（CT )，進行光阻劑塗敷處理後 ，依序在減壓乾燥處理單元（VD )進行減壓乾燥處理， 在邊緣去除器（ER)進行基板周緣的光阻劑去除處理。 接著，基板G由運送梭23移交給垂直運送單元7的 運送臂，以熱處理系方塊26的預烘焙單元（PREBAKE) 進行加熱處理後，以熱處理系方塊29的冷卻單元（COL )進行冷卻處理。接著，基板 G在延伸冷卻單元（ EXTCOL) 35接受冷卻處理，同時在曝光裝置進行曝光處 理。 接著，基板G便經由垂直運送單元8及7的運送臂 ，運送到熱處理系方塊29的後曝光烘焙單元（PEBAKE) ，在此進行加熱處理後，在冷卻單元（COL )進行冷卻處 理。而，基板G則經由垂直運送單元7的運送臂，在顯 像處理單元（DEV )，以大体上水平方式運送，同時進行 顯像處理、沖洗處理及乾燥處理。 接著，基板G由熱處理系方塊28的最下層，藉垂直 運送單元6的運送臂6a移交，在熱處理系方塊28及27 的後烘焙單元（POBAKE )進行加熱處理，在冷卻單元（ COL )進行冷卻處理。而基板G則交給運送機構1〇’收 容於卡匣C。 第4圖是表示本發明一實施形態的光阻劑塗敷處理單 元（CT)的截面圖，第5圖是其平面圖。 此光阻劑塗敷處理單元（CT)設有收容基板G的旋 轉杯，此旋轉杯5 0的上部形成有運進運出基板G的開口 -18 - (16) 1231950 部5 0b。此開口部50b設有裝卸自如的蓋體37，可由機器 臂36握持安裝在蓋體37的握持部37a上下移動，便可以 裝卸蓋體。 旋轉杯5 0的旁邊配置有光阻劑液供應機構4 1，與洗 淨液供應機構5 7。 光阻劑液供應機構41係如第5圖所示，具有用以向 收容在旋轉杯5 0內的基板G吐出光阻劑液的光阻劑噴嘴 5 5，此光阻劑噴嘴5 5的前端由保持體3 8加以保持。保持 體38的另一端連接於馬達39，可藉此馬達39在水平面 內向Θ方向轉動。光阻劑噴嘴55連接有未圖示的軟管，可 由未圖示的光阻劑收容槽經由該軟管向光阻劑噴嘴5 5供 應光阻劑。 洗淨液供應機構5 7具有用以向旋轉杯5 0內吐出洗淨 液的洗淨液噴嘴44，此洗淨液噴嘴44是由水平支持體42 所支持。洗淨液可以使用例如稀薄劑。此水平支持體42 連接在馬達43，可藉此馬達43在水平面內向Θ方向轉動 。此洗淨液噴嘴44可由未圖示的洗淨液的收容槽供應洗 淨液。 旋轉杯5 0內配置有，可以藉由例如真空吸著保持基 板G用的旋轉夾頭5 1。此旋轉夾頭5 1安裝在轉軸構件 48，轉軸構件48連接在具有馬達等的驅動部40，可使旋 轉夾頭5 1轉動。在轉軸構件4 8的下部設有，例如連接在 真空幫浦53的真空密封部54，轉軸構件48的內部形成 有未圖示的排氣路。藉此可以利用真空夾持旋轉夾頭5 1 •19- (17) 1231950 同時，轉軸構件4 8可以藉由驅動部4 0所含的氣 而昇降，在從旋轉杯5 0卸下蓋體3 7的狀態下，可以 轉夾頭5 1從旋轉杯5 0的開口部5 0 b出沒。藉此，如 ’在未圖示的副臂與旋轉夾頭5 1之間送受基板G。 夾頭51在第4圖所示狀態時是在最下的位置，在此位 抵接於安裝在旋轉杯50的底部50c的Ο環60。 同時，轉軸構件4 8安裝有輥子基座4 9，此輥子基 49是固定在突起設在旋轉杯50中央的筒體50a。因爲 種架構，可以藉由驅動部4 0的轉動驅動，使轉軸構件 、輥子基座49、旋轉杯50及蓋體37成一體轉動。 參照第6圖，在旋轉杯50的底部50c，配置在上 最下位置的旋轉夾頭51周圍，配置有用以儲存由上述 淨液供應機構5 7供給的洗淨液的儲存槽5 2。此儲存槽 呈，可以在由框體圍繞的內部52d儲存洗淨液的構造。 儲存槽52的上面形成有：向該內部52d供應洗淨液的 應口 52b(參照第5圖），及如後述用以吐出儲存的洗 液的複數個孔52a。此等孔52a是，例如從旋轉杯50 轉軸方向朝轉動中心側斜方向形成。儲存槽5 2是在設 內側的凹部52c螺入複數個螺栓56，藉此固定在旋轉 50的底部50c。 供應口 52b是設在，從第5圖所示的平面方向所視 洗淨液供應機構5 7的洗淨液噴嘴44的前端部移動的軌 上。藉此，在水平支持體42的記號Μ所示的位置，從 等 旋 述 轉 置 座 這 48 述 洗 52 在 供 淨 的 於 杯 的 跡 洗 -20· (18) 1231950 淨液噴嘴44吐出的洗淨液被注入供應口 52b。第 放大該供應口 52b附近的平面圖。供應口 52b是配 孔52a的配置位置爲內側（旋轉杯50的轉動中心 形成這種配置關係的理由是，如後述，轉動旋轉杯 ，防止洗淨液從供應口 52b吐出。亦即，由於有這 關係，轉動旋轉杯5 0時，儲存在內部5 2 d的洗淨 離心力，在其內部52d向外側流，因此只能從配置 應口 52b爲外側的複數個孔52a吐出洗淨液。 旋轉杯下部的筒體50a設有，例如用以噴出氮 氣供應用噴嘴45。此氮氣是經由供氣管46從氮氣 47供應。這種氮氣是在，例如以未圖示的排氣裝 旋轉杯50內的空氣時，要使旋轉杯50內不要成爲 噴出。 其次，說明如上述構成的光阻劑塗敷處理單元 動作。 在蓋體37被機器臂36提上的狀態下，由未圖 臂運送到旋轉杯50的直上方。於是，旋轉夾頭51 開口部50b上昇到較旋轉杯50上端爲高的位置， 臂接受基板。接受到基板的旋轉夾頭5 1經由旋轉和 開口部50b下降到最下的位置，而將基板G收容 杯50內。這時，光阻劑噴嘴55及洗淨液噴嘴44 轉杯5 0外側待機。 接著，光阻劑噴嘴5 5便如第5圖之虛線所示 到基板G上的中央，從光阻劑噴嘴5 5向基板G供 7圖是 置在較 側）。 50時 種配置 液會因 在較供 氣的氮 供應部 置排出 負壓時 CT的 示的副 便經由 從該副 —、50 的 在旋轉 則在旋 ，移動 應規定 -21 · (19) (19)1231950 量的光阻劑液。而，蓋體3 7被覆蓋在旋轉杯5 0上，旋轉 杯5 0連同旋轉夾頭5 1以規定的旋轉速度轉動，藉此以離 心力在基板表面的整面塗敷光阻劑。 接著，蓋體37再度被機器臂36提上，旋轉夾頭51 上昇，由旋轉夾頭5 1保持的基板被未圖示的副臂取上。 基板G被取上後，旋轉夾頭5 1便下降到最下的位置。 接著，洗淨液噴嘴44移動到第5圖的記號Μ所示位 置，洗淨液被注入儲存槽52。儲存洗淨液後，洗淨液噴 嘴44便退到旋轉杯50的外側，再度將蓋體37覆蓋在旋 轉杯5 0。而由於旋轉杯5 0以規定的轉速轉動，如第6圖 所示，儲存在儲存槽52的洗淨液2 1因離心力而流到外側 ，利用其流動力，直接從孔5 2a將洗淨液向上方吐出而飛 散。因爲孔52a是斜向形成，洗淨液的吐出方向也是斜方 向。藉此，可以將洗淨液及於蓋體3 7的基板G外側附近 的領域（以記號A所示領域，亦即虛線的右側領域）。 在旋轉杯5 0內飛散的光阻劑的大部分是A側的領域 。因爲離心力使光阻劑在基板上擴散而從基板的外側飛散 的緣故。跟A相反側的B領域則較少有光阻劑飛散。因 此，只要能洗淨蓋體3 7的A側的領域便可以。 如此，爲了要洗淨蓋體3 7的A側的領域，雖然會因 儲存槽52的寬度（第6圖所示儲存槽52的左右方向的長 度），孔52a的角度等而異，但此等各參數可以適宜變更 進行設計。 如此，從孔52a飛散而附著於蓋體37的洗淨液將因 -22- (20) 1231950 離心力而流向蓋體的轉動外側。藉此可以去除洗 蓋體37的光阻劑液。同時，附著在蓋體37的洗 離心力直接到達旋轉杯5 0，因此也可以洗淨旋轉 本實施形態是將儲存槽5 2設在旋轉夾頭5 1 此，不會如傳統方式，飛散的洗淨液被旋轉夾頭 ’可以去除洗淨附著在蓋體3 7的光阻劑液。同 如傳統方式，每一次洗淨蓋體時均需要裝卸洗淨 殊裝置，可以節省洗淨處理的手續。 其次，參照第8圖說明儲存槽的其他實施形 存槽62與上實施形態所示的儲存槽52不同的地 出洗淨液的手段不是孔，而是開縫62a。此開縫 例如圖示，沿著基板G的各邊形成，與儲存槽 第6圖以記號52d表示）貫通。藉由這種架構時 確實洗淨蓋體3 7的規定領域，同時，不必裝卸 等特殊裝置，可以節省洗淨處理的手續。 第9圖是其他實施形態的旋轉杯內部的放大: 在本圖所示的例子，吐出洗淨液用的孔72a 槽72上面垂直方向形成。而，在此孔72a裝設 出洗淨液21的噴嘴72b。此噴嘴72b的前端是 向旋轉杯5 0的轉軸方向的轉動中心側。藉此， 動中心側吐出洗淨液，可以洗淨蓋體3 7的規定的 其次，參照第10圖、第11圖及第12圖， 槽的其他實施形態。如第1 0圖及第1 1圖所示， 態的儲存槽82內部設有複數個分隔構件89。此 淨附著在 淨液可藉 杯50。 周圍，因 51阻擋 時，不必 器具等特 態。此儲 方是，吐 6 2 a 是， 內部（在 ，也可以 洗淨器具 截面圖。 是在儲存 有用以吐 裝設成朝 可以向轉 領域。 說明儲存 本實施形 等分隔構 -23- (21) 1231950 件8 9是排列在基板G的周圍方向，藉此將儲存槽8 2 部分隔成複數個的隔間83。如第10圖及第12圖所示 各分隔構件8 9呈板狀，對分隔構件8 9的排列方向（本 是基板G的周圍方向）成斜方向傾斜（在第1 2圖以角 Θ表示）配設之。 如第12圖所示，此分隔構件8 9的側面8 9a及8 9b 的上側面89a抵接在儲存槽82的內部上面82e (參照 11圖）。另一方面，橫側面89b並不抵接儲存槽82的 部側面82g，而留有空隙85 (參照第1 1圖）。此空隙 是爲了使洗淨液在儲存槽82的整個內部流動所配設， 以使複數隔間83連通。 再者，本實施形態的儲存槽82之令洗淨液吐出的 82a的數目較上述各實施形態的孔爲多。 如以上所述，由於配設分隔構件8 9，例如藉由洗 液供應機構57(參照第5圖）在儲存槽82內部儲存洗 液時，利用空隙8 5使洗淨液到達整個區域。而在洗淨 理時，係令旋轉杯5 0轉動藉由離心力使洗淨液向外周 流動，因此，洗淨液便可以不必流經複數隔間8 3便能 留在由分隔構件89分隔的各隔間83。藉此，可以儘可 抑制因旋轉杯50的轉動而產生的洗淨液與儲存槽82的 對移動。亦即，儲存在儲存槽82內部的的洗淨液將因 性，對轉動的儲存槽82有欲靜止的性質，但本實施形 可以迴避這種問題，洗淨液的吐出衝力，吐出量增大， 以使洗淨液良好吐出。 內 例 度 中 第 內 85 用 孔 淨 淨 處 側 滯 能 相 慣 態 可 -24- (22) 1231950 同時，因爲分隔構件89是對其排列方向成斜方向配 置，因此，可以使儲存槽82內部的洗淨液對準旋轉杯50 的轉動方向流通。 本發明不限定爲以上所說明的實施形態，可以有各種 變形。 例如，？L 52a的數目不一定是複數個，也可以是1個 。同時，第8圖的4個開縫中的1個開縫62a也可以是複 數個長孔。 而，在光阻劑塗敷處理單元CT的光阻劑的塗敷方法 並不限定爲上述實施形態，也可以是令噴嘴在基板G上 移動同時吐出光阻劑的所謂掃描塗敷。 同時，也可以不設第U圖的空隙8 5，而在分隔構件 8 9讃設流通洗淨液的連通口取代之。 而且，上述實施形態的基板是以液晶顯示裝置用的玻 璃基板爲例子，但只要是在旋轉杯配設有蓋體，則半導體 晶圓基板也可以適用在本發明。 第1 3圖是表示別的實施形態的光阻劑塗敷處理單元 的旋轉杯162的一部分的截面圖。再者，在本實施形態， 跟上述實施形態相同的構成構件標示同一記號，其說明從 略，而以不相同的部分爲中心進行說明。 固定杯1 6 1收容旋轉杯1 62，如後述用以在洗淨時使 內部流通的氣流與洗淨液分流。 固定杯1 6 1在上端部有開口，外周部有氣流控制部 1 80，整體略呈筒狀。氣流控制部1 80備有：例如朝外側 -25- (23) 1231950 向下方傾斜的內壁180a:在成爲內壁180a的高度A反折 朝內側向下方傾斜的內壁1 8 0 b ;以及再反折朝內側向下 方傾斜的內壁1 8 0 c。 氣流控制部1 8 0的上部外面固定有配設吐出洗淨 '液用 的第1噴嘴的洗淨用噴嘴203的噴嘴插入部185。洗淨用 噴嘴2 0 3是連接在經由洗淨液供應管收容洗淨液的收容槽 2 2 0。洗淨時是對洗淨用噴嘴2 0 3供應洗淨液，以洗淨旋 轉杯162的外壁162b等處。再者，也可以在噴嘴插入部 185形成插入洗淨用的噴嘴用的孔’將別的噴嘴插入此孔 以吐出洗淨液進行洗淨，以取代配設洗淨用的洗淨用噴嘴 203 〇 噴嘴插入部185的上面埋設有例如V型密封件102。 在噴嘴插入部185上，經由V型密封件102成裝卸自如 狀配置備有內壁18 6b的圓盤狀的固定杯蓋186。固定杯 蓋186是配置成內壁18 6b與內壁180a差不多在同一面上 〇 固定杯蓋186的上壁186a，在略爲中央處形成有用 以導入外部氣體的導入口 182。再者，形成在固定杯蓋 186的導入口的數目或形狀也可以是，例如形成導入口 182的一半面積的兩個導入口。 圓盤狀的蓋體137是配置在離開固定杯蓋186的上壁 18 6a第1間隔hi (以下，第1間隔hi的空隙簡稱爲「第 1流路」）處。旋轉杯1 62的上部周緣是配置在離開內壁 18 0a較第1間隔hi狹窄的第2間隔h2 (以下，第2間隔 -26- (24) 1231950 h2的空隙簡稱爲「第2流路」）處。旋轉杯1 62的 162b面對內壁180a，同時配設成與內壁180a的間隔 下方愈擴大。在內壁180c的上部，略成水平向外突 環裝突出構件的防護構件197。 高度A是在旋轉杯1 6 2的外側底面1 6 2 a的高度 下方。再者，也可以例如，使高度A較旋轉杯162 低面的水平高度爲低。 固定杯1 6 1的底面向下方突設有例如4個，形成 以排出從導入口 182導入固定杯161內的氣體的排 183a的排氣管183。排氣管183連接在未圖示的排氣 〇 在旋轉杯1 62的側周壁下部，形成有可藉由旋 162的轉動，將光阻劑液排出到固定杯161的內壁 側的排出孔104。 在氣流控制部1 8 0的底部向下方突設有例如4個 有用以排出從排出孔1 04排出的光阻劑液，將其向下 液的廢液口 181d的廢液管181。廢液管181連接在 示的廢液管。 固定杯1 6 1在較廢液口 1 8 1 d爲內側，較排氣口 爲外側，具有形成有用以將光阻劑液廢液的廢液口 的廢液管194。廢液口 194a的直徑設定成較廢液口 的直徑小。 在固定杯161的內底面161b上固定有圓盤狀的 192。隔壁192的外周部形成有沿固定杯161的內 外壁 愈往 設有 B的 的最 有用 氣口 風管 轉杯 180a ，具 方廢 未圖 1 83a 194a 1 8 1 d 隔壁 底面 •27- (25) 1231950 161b的形狀的台階，隔壁192的外周緣部是沿著內壁 180c的傾斜彎折向斜下方。固定杯161的內底面161b與 旋轉杯1 6 2的外側底面1 6 2 a間的空間以隔壁1 9 2分隔成 上下均等的兩部分。排氣口 183a與旋轉杯162的底面之 間配置有，例如形成有1 2個貫穿孔1 96的整流板1 95。 將整流板1 9 5配置成，整流板1 9 5的貫穿孔1 9 6與排氣口 183a錯開不重疊。 在固定杯1 6 1的底面，廢液管1 8 1與廢液管1 94之間 ，在圓周上貫裝複數個第2噴嘴的洗淨噴嘴205及第3噴 嘴的洗淨噴嘴206。洗淨噴嘴205、洗淨噴嘴206分別經 由洗淨液供應管連接在收容洗淨液用的收容槽220。 洗淨噴嘴205用以洗淨旋轉杯162的外側底面162a 。洗淨噴嘴205的前端部貫穿隔壁192向旋轉杯162的外 側底面162a突出。因此，可以從洗淨噴嘴205直接向外 側底面162a吐出洗淨液，洗淨外側底面162a。 洗淨噴嘴206用以洗淨氣流控制部180的內壁180c 。洗淨噴嘴206的前端部位於隔壁192的下方，此前端部 的側面形成有用以吐出洗淨液的未圖示的吐出口。因此， 從洗淨噴嘴206吐出的洗淨液可吐出到內壁180c。因此 可以從洗淨噴嘴206吐出洗淨液洗淨內壁180c。 儲存槽52的內壁的材質，可以使用例如鋁等金屬。 藉此可以防止如使用合成樹脂等時因轉動而變形，可以穩 定供應洗淨液。 由洗淨用噴嘴203、洗淨用噴嘴205、洗淨用噴嘴 -28· (26) (26)1231950 206及收容槽220等構成洗淨機構。 第1 4圖係光阻劑塗敷處理單元（C T )的平面圖。如 第14圖所示，在儲存槽52形成供應口 152b，與供應口 52b挾持旋轉杯162的中心。 洗淨液供應機構1 5 7具有：由當作支持體的水平支持 體142支持的當作吐出噴嘴的洗淨液噴嘴44。在水平支 持體142支持有第5噴嘴的側壁洗淨噴嘴201a。洗淨液 噴嘴44是構成爲，可以藉由馬達43的驅動，在馬達43 軸的周圍，至少在旋轉杯162的‘外部與供應口 52b的直上 方（位置P 1 )之間轉動。因此，當洗淨液噴嘴44位於位 置P 1，亦即，位於供應口 5 2 b的直上方時，可以從洗淨 液噴嘴44向供應口 52b內吐出洗淨液。 可以藉由同樣的馬達43的驅動，使洗淨液噴嘴44與 側壁洗淨用噴嘴201 a及後述的底面洗淨用噴嘴成一體進 一步向位置P2移動。洗淨液噴嘴44位於位置P2時，側 壁洗淨用噴嘴201a的開口端201b位於旋轉杯162的側壁 的內面側上方。 第1 5圖係本實施形態的洗淨液供應機構1 5 7的平面 圖。如第15圖所示，由水平支持體142支持洗淨液噴嘴 44及第4噴嘴的底面洗淨用噴嘴201。底面洗淨用噴嘴 201的前端部形成有用以將洗淨液吐出到下方的開縫201c 。在底面洗淨用噴嘴20 1的長度方向約略中央部連接側壁 洗淨用噴嘴201a。側壁洗淨噴嘴201a用以洗淨旋轉杯 162。側壁洗淨噴嘴201a是彎曲成前端的開口端201b朝 -29- (27) (27)1231950 向例如馬達43側。底面洗淨用噴嘴201及洗淨液噴嘴44 是經由切換供應洗淨液用的切換閥22 1連接在收容洗淨液 用的收容槽222。 因此，供給底面洗淨用噴嘴2 0 1內的洗淨液在側壁洗 淨用噴嘴201a與底面洗淨用噴嘴201的分流點V，分別 分流成側壁洗淨噴嘴201a側與開縫2 0 1 c側兩路，而從開 口端201b、開縫201c吐出。同時，可以藉由馬達43使 洗淨液噴嘴44、底面洗淨用噴嘴20 1及側壁洗淨用噴嘴 201a成一體移動。因此，不需要不相同的移動機構，可 以簡化構造，達成低成本化及省空間化。 再者，本實施形態是表示在水平支持體142的長度方 向約略中央部位固定側壁洗淨用噴嘴20 1 a的例子。但是 ，也可以將側壁洗淨用噴嘴201a偏移連接在馬達43側， 以加長開縫20 1 c的長度。如此便可以將洗淨液供給較大 的領域，有效進行洗淨。 其次，參照第13圖說明在基板塗敷光阻劑時的旋轉 杯162的作用等。 旋轉杯1 62轉動時，流入固定杯1 6 1內的氣體從導入 口 1 82流入第1流路。流入第1流路的氣體便沿著固定杯 蓋1 8 6的內壁1 8 6b (傾斜面）流入第2流路。第2流路 的間隔h2設定成較第1流路的間隔h 1小’因此，第2流 路的流速較第1流路的流速快。 在第2流路加速的氣體便沿著內壁180a、內壁180b 、內壁1 8 0 c的傾斜面流動。亦即，在氣流控制部1 8 0內 -30- (28) 1231950 ’氣體成爲箭頭C方向的渦流。 在氣流控制部180生成的光阻劑霧氣因防護構件197 的作用，被阻擋流入排氣口 1 8 3 a側，而由廢液管1 8 1向 下方流出。 向箭頭C方向流動的渦流中流入隔壁1 92底面側的氣 體，藉由例如整流板1 9 5的貫穿孔1 9 6將其流速均一化， 而從排氣口 183a排氣。 其次，參照第1 6圖所示流程圖說明本實施形態的旋 轉杯162及固定杯161的洗淨程序。 如第17圖所示，令旋轉夾頭151上昇而待機。驅動 第14圖所示的馬達43，將洗淨液噴嘴44定位在位置P1 。定位後，從洗淨液噴嘴44向供應口 52b內吐出洗淨液 ，儲存在儲存槽52 (步驟1 ( S1 ))。 接著，令第14圖所示旋轉杯162轉動180度（S2) 。藉此，供應口 52b定位在洗淨液噴嘴44的直下方。 接著，與步驟1 ( S 1 )同樣，從洗淨液噴嘴44向供 應口 152b吐出洗淨液，將洗淨液儲存在儲存槽52 ( S3 ) 。藉此，可以藉由供應口 52b、152b使洗淨液到達整個儲 存槽52內，因此可以縮短儲存時間。 如第14圖所示，驅動馬達43將洗淨液噴嘴44對準 位置P2。接著，從開口端201b、開縫201c、洗淨用噴嘴 203、洗淨用噴嘴205吐出洗淨液。這時，令旋轉杯162 以例如第1轉數的5rpm轉動（S4 )。亦即，令旋轉杯 1 62轉動，同時從各噴嘴吐出洗淨液而洗淨各部位。具體 -31 - (29) 1231950 上是，如第17圖所示，從開口端201b向旋轉杯162 壁的內周面162η及162t吐出洗淨液。同時，從開縫 向旋轉杯1 6 2的內側底面1 6 2 c吐出洗淨液。同時， 淨用噴嘴203向外壁162b吐出洗淨液。並從洗淨 2 0 5向旋轉杯1 6 2的外側底面1 6 2 a吐出洗淨液。如 淨各面。 接著，令洗淨液噴嘴44在固定杯161外部待機 關閉蓋體137(S5)。 接著，與上述實施形態同樣將例如氮氣噴出在旋 162 內（S6 )。 接著，例如以第2轉數的700rpm使旋轉杯1 62 (s 7 )。藉此，可以例如使旋轉杯1 62轉動，同時從 槽52噴出洗淨液，洗淨蓋體137下面的周緣部137a 於噴出氮氣，可以將洗淨液從排出孔1 04排出到轉杯 外。以下，氮氣要一直噴到結束洗淨。 接著，例如以第3轉數的100rpm使旋轉杯162 ’同時，從洗淨用噴嘴205、洗淨用噴嘴206及洗淨 嘴2 0 3吐出洗淨液（S 8 )。藉此，可以一面抑制旋 162的轉數，同時洗淨旋轉杯162的外側底面i62a、 杯161的內壁180c及旋轉杯162的外壁162b所殘留 染。 如此，首先，在步驟4去除附著在旋轉杯1 62的 劑等的污染。而在步驟7，在洗淨蓋體1 3 7時去除附 旋轉杯1 62或固定杯1 6 1的污染，在步驟8進一步去 的側 20 1c 從洗 噴嘴 此洗 ，而 轉杯 轉動 儲存 。由 162 轉動 用噴 轉杯 固定 的污 光阻 著在 除， -32- (30) 1231950 徹底洗淨處理，而得更確實防止發生顆粒等。 接著，將旋轉杯1 62的轉數提高到例如第4轉數的 3 0 Orpm。同時從洗淨用噴嘴203向外壁162b吐出洗淨液 (S 9 )。藉此，可以藉由旋轉杯1 62的旋轉，使從洗淨用 噴嘴2 03吐出的洗淨液在外壁162b反射，以反射的洗淨 液洗淨內壁180a。 再者，本實施形態是表示在步驟6(S6)之後執行步 驟7 ( S7 )的例子。但此兩個步驟的順序並非一定如此， 例如，也可以在步驟6的開始噴出氮氣的大約同時或之後 ，開始步驟7的旋轉杯1 62的轉動。 如第1 8圖所示，也可以，例如改變儲存槽52的形狀 ，使儲存槽52的角部朝旋轉杯162的中心軸離開旋轉杯 162的側壁，且藉由此等角部形成更多的孔52a。如此構 成時，洗淨時由孔52a噴出的洗淨液因離心力飛散到外周 側時，仍可以確實洗淨第13圖所示的蓋體137的底面周 緣部137a。同時，由於增加孔52a的數目，可以使更多 洗淨液飛散到底面周緣部1 3 7a，有效進行洗淨動作。再 者，取代改變儲存槽52的形狀，使儲存槽52的孔52a的 位置移至旋轉杯1 62的中心側，也可以獲得同樣的效果。 而且，上述實施形態是表示儲存槽52的供應口 52b 、15 2b是形成在儲存槽52的邊的大致上中央的例子。但 是，供應口 52b、152b的位置並非限定如此，例如，也可 以形成在儲存槽5 2的離心力最大的各角部附近。如此構 成時，例如將洗淨液儲存於儲存槽52令旋轉杯1 62轉動 •33- (31) 1231950 ，便可以有效利用離心力，使洗淨液分散到儲存槽5 2內 〇 同時，上述實施形態是表示儲存槽52內壁的材質使 用鋁的例子。但是，儲存槽5 2的內壁不限定使用鋁，也 可以例如在內壁塗敷氟。如此構成便可以使洗淨液的流動 更順暢，可以縮短洗淨液的儲存時間。同時可以使洗淨液 容易飛散。 而且，上述實施形態是表示使洗淨液噴嘴44與供應 口 52b對準位置以吐出洗淨液的姻子。但是，如第19圖 所示，也可以在儲存槽52形成較供應口 52b大的卡合溝 5 2f，並在洗淨液噴嘴44的前端部配設可卡合於卡合溝 52f的例如橡膠製的卡合部44f。而在第16圖所示的步驟 1或步驟3將洗淨液吐出到儲存槽52時，例如令水平支 持體142下降，令卡合部44f卡合於卡合溝52f。如此構 成時，例如在儲存洗淨液時，可以防止洗淨液漏出儲存槽 5 2外，同時可以加速吐出速度，藉此可以在較短時間儲 存洗淨液。 如以上所說明，依據本發明時，可以確實洗淨杯子等 容器或開閉該容器的蓋體，可以節省該項洗淨處理的作業 手續。藉此可以防止在蓋體發生顆粒。 【圖式簡單說明】 第1圖係表示本發明一實施形態的塗敷顯像處理系統 的整體架構的平面圖。 -34- (32) (32)1231950 第2圖係第1圖所示塗敷顯像處理系統的正面圖。 第3圖係第1圖所示塗敷顯像處理系統的背面圖。 第4圖係一實施形態的光阻劑塗敷處理單元的截面圖 〇 第5圖係第4圖所示光阻劑塗敷處理單元的平面圖。 第6圖係爲了說明一實施形態的儲存槽，表示旋轉杯 內部的放大截面圖。 第7圖係儲存槽的洗淨液的供應口附近的放大平面圖 〇 第8 '圖係爲了說明其他實施形態的儲存槽的旋轉杯及 其內部的平面圖。 第9圖係爲了說明其他實施形態的儲存槽，表示旋轉 杯內部的放大截面圖。 第10圖係爲了說明一實施形態的儲存槽，表示旋轉 杯內部的一部分的平面圖。 第11圖係第10圖所示儲存槽的截面圖。 第1 2圖係第1 0圖所示分隔構件的斜視圖。 第1 3圖係表示別的實施形態的旋轉杯的一部分的截 面圖。 第1 4圖係別的實施形態的光阻劑塗敷處理單元的平 面圖。 第1 5圖係別的實施形態的洗淨液供應機構的平面圖 〇 第1 6圖係表示別的實施形態的洗淨液供應方法的流 -35· (33) 123195° 程_ ° 第1 7圖係第1 6圖所示旋轉杯洗淨時的旋轉杯及固定 杯的截面圖。 第1 8圖係表示別的實施形態的儲存槽的變形例子的 平面圖。 第1 9圖係表示別的實施形態的洗淨液供應機構的卡 合部的側面圖。 〔圖號說明〕 G :玻璃基板 CT :光阻劑塗敷處理單元 37 :蓋體 40 :驅動部 4 1 :光阻劑液供應機構 43 :馬達 44 :洗淨液噴嘴 5 〇 :旋轉杯 5〇b :開口部 5 1、1 5 1 :旋轉夾頭 52 、 62 、 72 :儲存槽1231950 (1) Description of the invention [Technical field to which the invention belongs] The present invention relates to a substrate processing apparatus and a cleaning method. [Previous Technology] In the LCD manufacturing process, in order to form an ITO (Indium Tin Oxide) film or electrode pattern on a glass substrate for LCD, the same photolithography technology as used in the manufacture of semiconductor devices is used. In photolithography, a photoresist is applied to a glass substrate, exposed to it, and developed. The photoresist coating process is, for example, accommodating a glass substrate in a rotating cup, supplying the photoresist to the substrate, covering the cup lid, and rotating the cup and the substrate together to diffuse the photoresist onto the surface of the substrate. The entire surface. The photoresist attached to the inside of the cup used for this coating treatment is scattered due to its rotating centrifugal force, or the photoresist is formed into a mist. Such attachments become the cause of particles after drying. In order to solve this problem, the present situation is that a nozzle capable of ejecting the cleaning solution is provided in the cup, and the cleaning solution is discharged onto the adherend to remove the adherend. Such a device is disclosed in, for example, FIG. 6 of Japanese Patent Application Laid-Open No. 8-25 5 7 8 9. Another proposal is to store a cleaning solution in a special container. • Rotate the container in the cup, so that the cleaning solution is scattered outward from the hole formed in the container to clean the cup. Device for washing tools. Such a device is disclosed in, for example, Japanese Patent Application Laid-Open No. 5-82435, Figures 2, 4, and 6 (However, this bulletin deals with semiconductor wafers, and (2) 1231950 deals with glass. Base unit). However, the device shown in Patent Document 1 includes, for example, FIG. 6 thereof, a lid cleaning nozzle for cleaning the lid, but a rotary chuck (a member that holds the substrate by a vacuum and rotates the substrate) blocks the cleaning The cleaning liquid discharged from the nozzle for the cleaning cap. Therefore, it is almost impossible to wash the lid body in this example. The inside of this cover is particularly susceptible to contamination by a misted photoresist, and contamination of this cover must be removed. In the device shown in Patent Document 1, if the rotary chuck is designed to be small, the lid can be washed. However, from the viewpoint of the recent increase in the size of glass substrates, designing the rotary chuck to be small has problems such as safety. If we consider that the current rotating chuck is gradually becoming the mainstream with the same size as the substrate, the cleaning of the cover body will become more and more difficult. On the other hand, the device shown in Patent Document 2 is not provided with a lid that closes the opening at the upper part of the cup, but each time the cup is washed, a washing tool needs to be attached and detached, which increases the number of operations and is very troublesome. At the same time, even when such a cleaning tool is applied to the device shown in Patent Document 1, the lid of the container cannot be cleaned. Patent Document 1 Japanese Patent Application Laid-Open No. 8-2 5 5 789 Patent Document 2 Japanese Patent Application Laid-Open No. 5-8243 5 [Summary of the Invention] In view of the above-mentioned facts, the object of the present invention is to provide and can be reliably cleaned A container such as a cup or a lid body for opening and closing the container can save a substrate processing apparatus and a cleaning method for the cleaning process. In order to achieve the above object, the substrate processing apparatus of the present invention is provided with: -5- (3) 1231950 a holding member that holds the substrate in a rotatable shape; and an opening portion into which the substrate is put in and taken out to receive the substrate held by the holding member A container that rotates synchronously with the holding member; a cover body detachably provided in the opening portion for opening and closing the container; and a container installed in the container and at least a part of the periphery of the holding member, at least A storage tank for internally storing a cleaning solution for cleaning the cover body; and a rotary drive unit for rotating the container to scatter the cleaning solution stored in the storage tank toward the cover body by centrifugal force. In the present invention, for example, after a coating liquid is applied to a substrate, the container is rotated while the container is covered with a lid, and the cleaning liquid is scattered from the storage tank to the lid by the centrifugal force. This storage tank is provided around the holding member, so 'the scattered washing liquid will not be blocked by the holding member like in the conventional way, for example,' the washing liquid can also be scattered near the center of the lid, and the lid can be washed body. At the same time, the washing liquid adhering to the lid flows to the rotating outer side due to the centrifugal force. The flowing washing liquid reaches the container, and the container can be washed. In addition, the present invention does not need to wash and remove the washing tool every time in the conventional manner, and can save the operation procedures during the washing process. In the present invention, the washing liquid can be used, for example, cinnamone and the like, specifically methyl 3-methoxypropionate (MMP, boiling point: 145 ° C, viscosity: 1-lcps), and ethyl lactate (el , Boiling point: 154 ° C, Viscosity: 2.6 cpS), 3 · Ethyl methoxypropionate (EEP, Boiling point: 170). <:, viscosity: 1. 3cpS), ethyl pyruvate (EP, boiling point: 144 ° C, viscosity: 1. 2cps), propylene glycol monomethyl ether acetate (PGMEA, boiling point: 146 ° 匚, viscosity: 1. 3 (^ 8), 2-heptanone (boiling point: 152. (:, viscosity: -6-(4) 1231950 1. 1 cps) Cyclohexanone (solvent of ARC) and others used in this field. Simultaneously, In the present invention, "Sync with one" contains, It means that the holding member and the container rotate integrally, for example, Or contain, For example, with individual independent drive sources, This means that the holding member and the container are rotated in synchronization with each other. According to one aspect of the present invention, On the side of the cover facing the storage tank, A hole is formed to discharge the cleaning solution stored in the storage tank. With this, The cleaning liquid can be surely scattered to the lid body. Simultaneously, It is also possible to replace the holes with linear slits. According to one aspect of the present invention, The holes are formed as The discharge direction of the washing tank is toward the rotation center side with respect to the rotation axis direction of the rotation of the container. With this, The cleaning solution can be surely discharged to the center of the lid. Simultaneously, It is also possible to replace the holes with linear slits. According to one aspect of the present invention, A cleaning liquid supply mechanism for supplying the cleaning liquid is further provided inside the storage tank. Simultaneously, The above-mentioned cleaning liquid supplier has: A nozzle for discharging the cleaning solution into the storage tank; And a moving mechanism for moving the nozzle between a predetermined position outside the container and a position directly above the holding member. With this, Can e.g. Whenever a predetermined number of substrates have been coated, Automatic supply of cleaning solution for cleaning, Homework is easy. or, Whenever a substrate is coated, the cleaning solution is supplied. You can always keep the container or lid uncontaminated, It is possible to surely prevent the occurrence of particles. According to one aspect of the present invention, Further has: Arranged inside the above storage tank, The interior of the storage tank is divided into a plurality of compartments of a plurality of partition members in the peripheral direction of the substrate held by the holding member. Borrow small (5) (5) 1231950 this, Can try to suppress the relative movement of the washing liquid and the container caused by the rotation of the container, Can increase the impulse to spit out the cleaning solution, Spit out. According to one aspect of the present invention, The plurality of partition members each have a side surface facing the storage tank, A part of the side surface is spaced from the storage tank, The other part is in contact with the storage tank. Or At least one of the plurality of partition members is formed, A communication port for connecting the plurality of compartments to each other. With this, Can prevent the washing liquid from staying in each room, It is possible to reach the entire area through the gap or the communication port. According to one aspect of the present invention, The gap is a portion provided on the rotation center side of the container near the storage tank. or, The communication port is provided at a portion near the center of rotation of the container of the partition member. With this, E.g, When the cleaning liquid is stored in the storage tank by the cleaning liquid supply mechanism, The washing liquid can reach the entire area through the gap or the communication port, And during the washing process, Due to the rotation of the container, the cleaning liquid flows to the outer peripheral side due to the centrifugal force inside the storage tank. As a result, it ’s not necessary to circulate a plurality of compartments, It is possible to stay in each of the chambers' and perform a good discharge operation of the cleaning solution. According to one aspect of the present invention, At least one of the plurality of partition members is formed in a plate shape, and is arranged obliquely in an arrangement direction in which the plurality of partition members are arranged. Accordingly, 'the cleaning liquid inside the storage tank can be circulated in accordance with the rotation direction of the container', and a better discharge operation of the cleaning liquid can be expected. The washing method of the present invention is: There is an opening for inserting and removing the substrate. The container containing the substrate through the opening is cleaned at least with a cleaning solution ’, and the lid provided at the opening to open and close the container is detachable. 8-(6) 1231950 Method for cleaning the body Have: To be installed in the above container, A storage tank for storing the cleaning liquid is provided in at least a part of the periphery of the holding member holding the substrate in the container, The process of supplying the cleaning solution; And rotating the container, And with its centrifugal force, The process of scattering the cleaning solution stored in the storage tank toward the cover. The invention is, For example, after applying a coating solution to a substrate, Supply the cleaning solution to the storage tank, Then cover the container with the lid to make the container rotate, By its centrifugal force, the washing liquid is scattered from the storage tank to the cover. Because this storage tank is provided around the holding member, therefore, Does not block the cleaning liquid like traditional retaining members, E.g, The cleaning liquid can also be scattered near the center of the lid. You can wash the lid. The other substrate processing apparatus of the present invention includes: A holding member for holding the substrate in a rotatable shape; Has openings for putting in and taking out the substrate, Housing the substrate held by the holding member, A first container capable of rotating simultaneously with the holding member; Removably provided in the opening, A lid for opening and closing the first container; Installed in the first container, Simultaneously, At least a part provided around the holding member, A storage tank storing at least an internal washing liquid for washing the cover body; Rotate the first container, A rotary drive unit that scatters the cleaning solution stored in the storage tank toward the cover by its centrifugal force; A second container accommodating the first container; A cleaning mechanism having a cleaning nozzle provided in the second container for cleaning at least the outer peripheral portion of the first container. The invention is, For example, after applying a coating solution to a substrate, Cover the container with the container and rotate the container. By its centrifugal force, the cleaning solution is scattered from the storage -9- (7) 1231950 tank to the cover. Because this storage tank is provided around the holding member ’, Does not block the washing liquid like traditional holding members, E.g, The cleaning solution can also be scattered to the center of the cover. You can wash the lid. At the same time, the second container is provided with a cleaning nozzle for cleaning the outer peripheral portion of the first container. therefore, E.g, When the first container is rotated by the rotation driving part, the cleaning liquid is discharged from the cleaning nozzle, With the lid, at least the outer periphery of the first container can be washed. According to one aspect of the present invention, The cleaning nozzle of the cleaning mechanism includes: A first nozzle capable of washing the outer peripheral surface of the side wall of the first container; And a second nozzle for washing the outer bottom surface of the first container. With this, E.g, The first container can be rotated by the rotation driving section, Simultaneously, By the first nozzle, The second nozzle ejects the cleaning solution, Washing the outer peripheral surface of the side wall of the first container, The outer bottom surface of the first container. According to one aspect of the present invention, The cleaning nozzle of the cleaning mechanism includes: A third nozzle that can clean the inner bottom surface of the second container. With this, The cleaning liquid can be discharged from the third nozzle. Wash the bottom surface of the second container. According to an aspect of the present invention, the above-mentioned substrate processing apparatus further includes: The discharge nozzle for discharging the cleaning solution into the storage tank through the supply port ′ formed in the storage tank; And making the discharge nozzle at least outside the first container, A moving mechanism that moves directly above the supply port. Thereby, for example, the D soil outlet nozzle can be aligned with the supply port of the storage tank by the driving mechanism to store the cleaning liquid. According to one aspect of the present invention, The above-mentioned substrate processing apparatus further has -10 · (8) (8) 1231950: A fourth nozzle capable of washing the inner bottom surface of the first container; A fifth nozzle for cleaning the inner peripheral surface of the side wall of the first container and the upper nozzle; And the above-mentioned ejection nozzle, A support body in which the fourth nozzle and the fifth nozzle are integrally supported. With this, E.g, Move the fourth nozzle and the fifth nozzle to the top of the first container, When the first container is above the sidewall, It is also possible to use a moving mechanism for storing the cleaning solution. Simultaneously, Move the fourth nozzle and the fifth nozzle above the first container, In a state above the side wall of the first container, From the 4th nozzle, The fifth nozzle spit out the cleaning solution, In this way, the inner bottom surface of the first container is washed, And the inner peripheral surface and upper surface of the side wall of the first container. According to one aspect of the present invention, At least two of the aforementioned supply ports are formed. With this, E.g, When storing the cleaning solution in the storage tank, From a supply port, During storage, the first container is rotated by the rotation driving unit, It is injected from another supply port of the storage tank. Because the cleaning liquid can be flowed to various parts in the storage tank from different supply ports, therefore, This reduces the storage time of the cleaning solution. The other substrate processing apparatus of the present invention includes: A holding member for holding the substrate in a rotatable shape; Has openings for putting in and taking out the substrate, Housing the substrate held by the holding member, A first container capable of rotating simultaneously with the holding member; Removably provided in the opening, A lid for opening and closing the first container; Installed in the first container, Simultaneously, At least a part provided around the holding member, A storage tank storing at least an internal washing liquid for washing the cover body; Rotate the first container, A rotary drive unit that scatters the cleaning solution stored in the storage tank toward the cover by its centrifugal force; So that it can be placed outside the first container, And directly above the supply opening of the storage tank formed above -11-(9) (9) 1231950, A discharge nozzle for discharging the cleaning solution into the storage tank through the supply port; A bottom surface cleaning nozzle capable of cleaning the inner bottom surface of the first container; A nozzle for cleaning the inner peripheral surface and the upper side wall of the side wall of the first container; And the aforementioned ejection nozzle, The support for the bottom surface cleaning nozzle and the side wall cleaning nozzle are integrally supported. According to the present invention, the discharge nozzle can be moved directly above the supply port of the storage tank by the moving mechanism to store the cleaning liquid. Simultaneously, Nozzles for cleaning the bottom surface, The nozzle for cleaning the side wall is moved, for example, above the first container, Above the side wall of the first container, The same moving mechanism can also be used. Simultaneously, Nozzle for bottom cleaning, The side wall cleaning nozzles are moved above the first container, In a state above the side wall of the first container, Nozzle for cleaning from the bottom, The nozzle for cleaning the side wall spit out the cleaning solution, The inner bottom surface of the first container can be washed, And the inner peripheral surface and upper surface of the side wall of the first container. Other cleaning methods of the present invention include: (A) order a discharge nozzle for discharging the cleaning solution, And a first supply port formed in a storage tank of a first container that is mounted on the first container that receives the substrate through the opening through which Alignment process (B) after the above process (a), From the nozzle for spitting out, The process of discharging the washing liquid into the storage tank through the first supply port; (C) after the above process (b), Rotate the first container, This makes the above-mentioned ejection nozzle, A second supply port different from the first supply port formed in the storage tank, Alignment process; (d) after the above process (c), A process of discharging the cleaning solution into the storage tank from the discharge nozzle through the second supply port; (E) -12- (10) (10) 1231950 Make the bottom surface cleaning nozzle which can wash the inside bottom surface of the first container, It moves integrally with the nozzle for cleaning the inner peripheral surface and the upper surface of the side wall of the first container, A process of aligning the side wall of the first container; (f) rotating the first container with the first rotation number, A process of simultaneously ejecting the cleaning liquid from the nozzle for cleaning the bottom surface and the nozzle for cleaning the sidewall; (G) rotating the first container at a second rotation number faster than the first rotation number, By its centrifugal force, A process in which the cleaning liquid stored in the storage tank is scattered toward a lid that is detachably mounted on the opening to open and close the first container. In the present invention, the process (a) to the process (d) can be performed. The cleaning liquid flows from the first supply port and the second supply port different from the first supply port to various parts in the storage tank. therefore, This can shorten the storage time of the cleaning solution. Simultaneously, In process (e), Align the nozzles for bottom surface cleaning and nozzles for side wall cleaning with the first container. therefore, E.g, No need to have a different mobile mechanism, Therefore, cost reduction and space saving can be achieved. Simultaneously, In process (f), Rotate the first container with the second rotation number and spit out the cleaning solution. Therefore, the entire peripheral surface of the first container can be washed. and, In process (g), Rotate the first container at a second rotation number faster than the first rotation number, Thereby, the cleaning liquid stored in the storage tank can be scattered toward the cover, To clean the lid. According to an aspect of the present invention, (H) after the above process (g), The first container is rotated at a third rotation number which is slower than the second rotation number. This is a process in which the cleaning liquid is discharged from the cleaning nozzle provided in the second container housing the first container to the outer peripheral portion of the first container. Borrow -13- (11) 1231950 So, E.g, The number of rotations of the first container can be suppressed to the third kind of rotations, At the same time, the outer periphery of the first container was washed. According to an aspect of the present invention, After the above process (h), The process of rotating the first container at a fourth rotation number faster than the third rotation number. With this, E.g, The cleaning liquid discharged from the first nozzle can be reflected on the outer peripheral surface of the side wall of the first container, Wash the inside of the second container. [Embodiment] An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view of a coating and developing processing system for an LCD substrate to which the present invention is applied, Figure 2 is its front view, Fig. 3 is a rear view thereof. This coating development processing system 1 is provided with: A cassette station 2 for loading a cassette C containing a plurality of glass substrates G; A processing unit 3 is provided which can apply a plurality of processing units including a series of processes of coating photoresist and development to the substrate G; The interface portion 4 for sending and receiving the substrate G to and from the exposure device 32, The cassette station 2 and the interface part 4 are arranged at both ends of the processing section 3, respectively. The cassette station 2 is provided with a transport mechanism 10 for transporting the LCD substrate between the cassette C and the processing section 3. Cartridge C is carried in and out at cartridge station 2. Simultaneously, The transport mechanism 10 is provided with a transport arm 11 that can move on a transport path 12 arranged in the direction in which the cassettes are arranged, Thereby, the transfer arm 11 transfers the substrate G between the cassette C and the processing unit 3. The processing section 3 is provided with: The main conveying path 3 a extended in the direction (Y direction) of the arrangement of the cassettes C in the cassette station 2 perpendicularly (X direction); And along this -14- (12) 1231950 are arranged side by side on the main transport path 3a, The upstream portion 3b of each processing unit including a photoresist coating processing unit (CT); A downstream portion 3c of each processing unit including a development processing unit (DEV) is arranged side by side. It is provided on the main transportation path 3a, X-direction transport path 31, And can move along this transport path 31, A transport shuttle 23 for transporting the glass substrate G in the X direction. This transfer shuttle 23 can carry the substrate G, for example, by supporting the tip. Simultaneously, It is provided at the end of the mesial surface 4 side of the main transport path 3a, A vertical transfer unit 7 for transferring and receiving the substrate G between the processing unit 3 and the mesas portion 4. In the upstream part 3b, It is provided at the end of the cassette station 2 side, Washer cleaning unit (SCR) 20 for subjecting substrate G to a cleaning process, An exciton UV processing unit (e-UV) 19 for removing organic matter on the substrate G is provided on the upper layer of the washing machine cleaning unit (SCR) 20. Next to the washing machine washing unit (SCR) 20, The heat treatment system blocks 24 and 25 are provided with units for heat treating the glass substrate G stacked in multiple layers. Blocks 24, Vertical transport unit 5 is arranged between 25, The transport arm 5a can move in the Z direction and the horizontal direction. And can be turned in the direction of Θ, therefore, Each heat treatment system unit of the two blocks 24 and 25 can be captured, To transport the substrate G. Furthermore, The vertical transport unit 7 of the processing unit 3 also has the same structure as the vertical transport unit 5. As shown in FIG. 2, In heat treatment block 24, Two layers of baking units (BAKE) for heating the substrate G before applying the photoresist are sequentially stacked from below, And -15- (13) (13) 1231950 adhesion unit (AD) with hydrophobic treatment by HMDS gas. on the other hand, In the heat treatment system block 25, two layers of cooling units (COL) for applying cooling treatment to the substrate G are sequentially stacked from below, And Adhesive Unit (AD). Adjacent to heat treatment block 25, A photoresist processing block 15 is extended in the X direction. This photoresist processing block 15 is integrally provided with: Photoresist coating processing unit (CT) for applying photoresist to the substrate G; A reduced pressure drying unit (VD) for drying the coated photoresist by reducing the pressure; An edge remover (ER) for removing the photoresist at the peripheral edge portion of the substrate G of the present invention. In this photoresist treatment block 15 is provided, A not-shown jib that can be moved from the photoresist coating processing unit (CT) to the edge remover (ER), With this, the jib carries the substrate G in the photoresist processing block 15. Adjacent the photoresist processing block 15 is provided with a heat treatment system block 26 of a multilayer structure, Here the heat treatment is block 26, Three layers of pre-baked units (PREBAKE) for heat treatment after applying photoresist are stacked. As shown in Figure 3, In the downstream 3 c, A heat treatment block 29 is provided at the end of the mesial surface 4 side. here, Stacked in order from the bottom: Cooling unit (COL); And a post-exposure baking unit (PEBAKE) for performing heat treatment before post-exposure development processing. Adjacent to heat treatment system block 29, A development processing unit (DEV) is extended in the X direction. Adjacent to this development processing unit (DEV) are heat treatment blocks 28 and 27, These heat treatments are provided between the blocks 28 and 27 with the same structure as the vertical transport unit 5 described above. The vertical transport unit 6 with two blocks 28 and 27 can be captured. Simultaneously, Above the end of the development processing unit (DEV), An i-ray processing unit (i-UV) 33 is provided. -16- (14) (14) 1231950 in heat treatment block 28, Stacked in order from the bottom: Cooling unit (COL); And a post-baking unit (POBAKE) for applying heat treatment to the substrate G after development. on the other hand, The same applies to heat treatment block 27, Stacked in order from the bottom: Cooling unit (COL); And two-layer post-baking unit (POBAKE). 在 介面 面 4, A title machine and a peripheral exposure unit (Tit) er / EE 22 are provided on the front side. An extension cooling unit (EXTCOL) 35 is arranged adjacent to the vertical transport unit 7, A buffer cassette 34 is arranged and arranged on the back side, Title machines and peripheral exposure units (Ti tier / EE) 22, EXTCOL 35, And buffer cassette 34, A vertical conveyance unit 8 that carries the substrate G to and from the adjacent exposure device 32. The structure of this vertical transport unit 8 is also the same as that of the vertical transport unit 5 described above. The processing procedure of the coating development processing system 1 configured as described above is as follows: First of all, The cassette C is conveyed to the upstream portion 3 b of the processing portion 3 of the substrate G. In the upstream part 3b, Surface modification and organic matter removal treatment in exciton UV treatment unit (e-UV) 19, Then in the washing machine washing unit (SCR) 20, The substrate G is conveyed in a substantially horizontal manner, Washing and drying are performed. then, At the bottom of the heat treatment block 24, The substrate G is taken out by the transfer arm 5a of the vertical transfer unit, Heat treatment is performed in the baking unit (BAKE) of the heat treatment system block 24, HMDS gas is sprayed onto the substrate G in an adhesion unit (AD), In order to improve the adhesion between the glass substrate G and the photoresist film. Since then, The cooling process is performed by the cooling unit (COL) of the heat treatment block 25. then, The substrate G is transferred from the transfer arm 5 a to the transfer shuttle 23. While shipping • 17- (15) (15) 1231950 to the photoresist coating processing unit (CT), After the photoresist coating process, Sequentially perform a reduced-pressure drying process in a reduced-pressure drying processing unit (VD), A photoresist removal process is performed on the periphery of the substrate in an edge remover (ER). then, The substrate G is transferred from the transfer shuttle 23 to the transfer arm of the vertical transfer unit 7, After the heat treatment is performed in the pre-baking unit (PREBAKE) of the heat treatment system block 26, The cooling process is performed in the cooling unit (COL) of the heat treatment system block 29. then, The substrate G is cooled in the extension cooling unit (EXTCOL) 35, At the same time, exposure processing is performed in the exposure device. then, The substrate G passes through the conveying arms of the vertical conveying units 8 and 7, The post-exposure baking unit (PEBAKE) transported to the heat treatment system block 29, After performing heat treatment here, Cooling is performed in the cooling unit (COL). and, The substrate G passes through the transport arm of the vertical transport unit 7, In the development processing unit (DEV), Transported in a substantially horizontal manner, Simultaneous development processing, Rinse and dry. then, The substrate G is formed by the lowermost layer of the heat treatment system block 28, By the transfer arm 6a of the vertical transfer unit 6, Heat treatment in the post-baking unit (POBAKE) of the heat treatment system blocks 28 and 27, Cooling is performed in a cooling unit (COL). The substrate G is delivered to the transport mechanism 10 'and stored in the cassette C. Fig. 4 is a sectional view showing a photoresist coating treatment unit (CT) according to an embodiment of the present invention. Fig. 5 is a plan view thereof. This photoresist coating processing unit (CT) is provided with a rotating cup containing a substrate G, An opening for carrying in and out of the substrate G is formed in the upper part of this rotating cup 50 -18 (16) 1231950 50b. This opening 50b is provided with a detachable cover 37, The grip portion 37a mounted on the cover 37 can be moved up and down by the robot arm 36, Then you can attach and detach the cover. A photoresist liquid supply mechanism 41 is arranged beside the rotating cup 50, With cleaning liquid supply mechanism 5 7. The photoresist liquid supply mechanism 41 is shown in FIG. 5, A photoresist nozzle 5 5 for ejecting a photoresist liquid to a substrate G housed in a rotating cup 50, The front end of this photoresist nozzle 55 is held by a holder 38. The other end of the holding body 38 is connected to the motor 39, By this, the motor 39 can be rotated in the Θ direction in the horizontal plane. A photoresist nozzle 55 is connected to a hose (not shown), A photoresist can be supplied to a photoresist nozzle 55 through a photoresist storage tank (not shown) through the hose. The cleaning liquid supply mechanism 57 has a cleaning liquid nozzle 44 for discharging the cleaning liquid into the rotating cup 50, The cleaning liquid nozzle 44 is supported by a horizontal support 42. As the washing liquid, for example, a thinner can be used. This horizontal support 42 is connected to the motor 43, This allows the motor 43 to rotate in the direction of Θ in the horizontal plane. The cleaning liquid nozzle 44 can supply cleaning liquid from a storage tank for a cleaning liquid (not shown). Inside the rotating cup 50, The rotary chuck 51 for holding the substrate G can be held by vacuum suction, for example. This rotary chuck 51 is mounted on a shaft member 48, The rotating shaft member 48 is connected to a driving section 40 having a motor or the like, The rotary chuck 51 can be turned. The lower part of the shaft member 48 is provided, For example, the vacuum seal 54 connected to the vacuum pump 53, An exhaust passage (not shown) is formed inside the rotating shaft member 48. This can be used to clamp the rotary chuck 5 1 • 19- (17) 1231950 at the same time, The shaft member 48 can be lifted and lowered by the air contained in the driving section 40, With the lid 37 removed from the spin cup 50, The chuck 51 can be seen from the opening 50 b of the rotation cup 50. With this, For example, the substrate G is sent and received between a jib (not shown) and the rotary chuck 51. The chuck 51 is in the lowest position in the state shown in FIG. 4, In this position, it abuts the O-ring 60 attached to the bottom 50c of the rotating cup 50. Simultaneously, The shaft member 4 8 is equipped with a roller base 4 9, This roller base 49 is fixed to a cylindrical body 50a protrudingly provided in the center of the rotary cup 50. Because of this architecture, It can be driven by the rotation of the driving part 40, Make the shaft member, Roller base 49, The rotating cup 50 and the lid body 37 rotate integrally. Referring to Figure 6, At the bottom 50c of the rotating cup 50, Arranged around the chuck 51 at the upper and lower positions, A storage tank 52 is provided to store the cleaning liquid supplied from the cleaning liquid supply mechanism 57. This storage tank is, The structure in which the washing liquid can be stored in the interior 52d surrounded by the frame. The upper surface of the storage tank 52 is formed with: A port 52b (refer to FIG. 5) for supplying a cleaning solution to the inside 52d, And a plurality of holes 52a for discharging the stored washing liquid as described later. These holes 52a are, For example, it is formed obliquely from the rotation axis direction of the rotation cup 50 toward the rotation center side. The storage tank 52 is a plurality of bolts 56 screwed into the recessed portion 52c provided inside, Thereby, it is fixed to the bottom 50c of the rotation 50. The supply port 52b is located at, The front end portion of the cleaning liquid nozzle 44 of the cleaning liquid supply mechanism 57 is moved on a rail as viewed from the plane direction shown in FIG. 5. With this, At the position indicated by the mark M of the horizontal support 42, From the rotary table, the 48 wash 52 is cleaned in the cup. -20 · (18) 1231950 The cleaning liquid discharged from the cleaning nozzle 44 is injected into the supply port 52b. The enlarged plan view near the supply port 52b. The supply port 52b has the arrangement position of the matching hole 52a inside (the reason why the rotation center of the rotary cup 50 forms such an arrangement relationship is that As described later, Turn the rotating cup, The cleaning solution is prevented from being discharged from the supply port 52b. that is, Because of this relationship, When turning the rotating cup 50, Stored inside for 5 2 d of washing centrifugal force, 52d flows outward in its interior, Therefore, the cleaning solution can only be discharged from the plurality of holes 52a on the outside of the placement opening 52b. The cylinder 50a at the bottom of the rotating cup is provided, For example, the nozzle 45 for supplying nitrogen gas is ejected. This nitrogen gas is supplied from a nitrogen gas 47 via a gas supply pipe 46. This nitrogen is in, For example, when the air in the cup 50 is rotated by an exhaust gas (not shown), The inside of the rotating cup 50 should not be spouted. Secondly, The operation of the photoresist coating processing unit configured as described above will be described. In a state where the cover 37 is lifted by the robot arm 36, It is carried by the arm (not shown) directly above the rotary cup 50. then, The opening 50b of the rotary chuck 51 rises to a position higher than the upper end of the rotary cup 50, The arm receives the substrate. After receiving the rotation chuck 51 of the substrate, it is lowered to the lowest position through the rotation and the opening portion 50b. The substrate G is contained in the cup 50. At this time, The photoresist nozzle 55 and the cleaning liquid nozzle 44 rotate outside the cup 50 and wait. then, The photoresist nozzle 5 5 is shown in the dotted line in FIG. 5 to the center on the substrate G. (Figure 7 is provided from the photoresist nozzle 5 5 to the substrate G). At 50 o'clock, the liquid shown in the CT will pass through the vice- 50's are spinning while spinning, Movement The amount of -21 · (19) (19) 1231950 photoresist solution should be specified. and, The cover 37 is covered on the rotating cup 50, The rotating cup 50, together with the rotating chuck 51, rotates at a predetermined rotation speed, Thereby, a photoresist is applied on the entire surface of the substrate surface with a centrifugal force. then, The cover 37 is lifted again by the robot arm 36, The spin chuck 51 rises, The substrate held by the rotary chuck 51 is taken up by a jib (not shown). After the substrate G is taken out, The rotary chuck 51 is lowered to the lowest position. then, The cleaning liquid nozzle 44 is moved to a position shown by a mark M in FIG. 5, The washing liquid is injected into the storage tank 52. After storing the cleaning solution, The cleaning liquid nozzle 44 is retracted to the outside of the rotating cup 50, The lid 37 was covered with the rotary cup 50 again. And because the rotating cup 50 rotates at a specified speed, As shown in Figure 6, The washing solution 2 1 stored in the storage tank 52 flows to the outside due to centrifugal force, Utilizing its fluidity, The washing liquid was directly ejected upward from the hole 5 2a and scattered. Because the hole 52a is formed obliquely, The discharge direction of the cleaning solution is also oblique. With this, The cleaning solution can be applied to the area near the outside of the substrate G of the cover 37 (the area shown by the symbol A, (That is, the dotted right-hand area). Most of the photoresist scattered in the rotating cup 50 is the area on the A side. The centrifugal force diffuses the photoresist on the substrate and scatters from the outside of the substrate. On the opposite side of A, there is less photoresist scattering. Therefore, It suffices if the area on the A side of the lid body 37 can be cleaned. in this way, In order to clean the area on the A side of the cover 37, Although it depends on the width of the storage tank 52 (the length of the storage tank 52 in the left-right direction shown in FIG. 6), The angle of the hole 52a varies, etc. However, these parameters can be changed and designed appropriately. in this way, The cleaning liquid scattered from the hole 52a and adhered to the lid body 37 will flow to the outside of the lid body due to the centrifugal force of -22- (20) 1231950. This makes it possible to remove the photoresist liquid for washing the lid body 37. Simultaneously, The centrifugal force attached to the lid 37 directly reaches the rotating cup 50, Therefore, it is also possible to wash and rotate. In this embodiment, the storage tank 5 2 is provided on the rotation chuck 5 1. Not as traditional The scattered cleaning liquid is rotated by the chuck ′, and the photoresist liquid adhering to the cover body 37 can be removed and washed. Just like the traditional way, Each time the cover is cleaned, special cleaning devices need to be installed and removed. It can save the procedure of washing treatment. Secondly, Referring to FIG. 8, another embodiment of the storage tank will be described. The storage tank 62 is different from the storage tank 52 shown in the above embodiment in that the means for discharging the cleaning liquid is not a hole. It is slit 62a. This slit, for example, Formed along each side of the substrate G, It is connected to the storage tank (Fig. 6 by 52d). With this structure, the specified area of the cover body 37 is cleaned. Simultaneously, No special equipment such as loading and unloading, It can save the procedure of washing treatment. Fig. 9 is an enlargement of the inside of the rotating cup of another embodiment: In the example shown in this figure, The hole 72a for discharging the cleaning solution is formed on the upper surface of the groove 72 in a vertical direction. and, A nozzle 72b for the cleaning liquid 21 is attached to this hole 72a. The tip of this nozzle 72b is on the rotation center side in the direction of the rotation axis of the rotary cup 50. With this, Spit out the cleaning solution on the moving center side, You can clean the lid 37. Second, Refer to Figure 10, Figure 11 and Figure 12, Other embodiments of the groove. As shown in Figure 10 and Figure 11, A plurality of partition members 89 are provided inside the storage tank 82 in the state. This net adheres to the clean solution and can be borrowed from the cup 50. around, When blocked by 51, No special features such as appliances are required. This bank is, Spit 6 2 a Yes, Internal (in You can also wash the cross-section of the appliance. It is stored in the area where it is used to spit and is set to face the direction. Explanation Storage This embodiment Equal partition structure -23- (21) 1231950 pieces 8 9 are arranged in the direction around the substrate G, Thereby, the storage tank 8 2 is partitioned into a plurality of compartments 83. As shown in FIG. 10 and FIG. 12, each partition member 89 is formed in a plate shape, The arrangement direction of the partition members 89 (originally the peripheral direction of the substrate G) is arranged obliquely (indicated by the angle Θ in Fig. 12). As shown in Figure 12, The upper surfaces 89a of the side surfaces 89a and 89b of the partition member 89 are abutted on the inner upper surface 82e of the storage tank 82 (see FIG. 11). on the other hand, The lateral side surface 89b does not abut the partial side surface 82g of the storage tank 82, A gap 85 is left (see Fig. 11). This gap is provided to allow the cleaning liquid to flow throughout the entire interior of the storage tank 82. So that the plurality of compartments 83 communicate. Furthermore, The storage tank 82 of this embodiment has a larger number of 82a for discharging the cleaning solution than the holes of the above-mentioned embodiments. As mentioned above, Since the partition member 8 9 is provided, For example, when the washing liquid is stored in the storage tank 82 by the washing liquid supply mechanism 57 (see FIG. 5), The clearance 85 allows the cleaning solution to reach the entire area. And when washing, The rotation of the rotating cup 50 causes the washing liquid to flow to the outside by centrifugal force. therefore, The washing liquid can be left in each of the compartments 83 partitioned by the partition member 89 without flowing through the plurality of compartments 83. With this, As far as possible, it is possible to suppress the pairing of the cleaning liquid and the storage tank 82 caused by the rotation of the spin cup 50. that is, The cleaning solution stored inside the storage tank 82 will The stationary nature of the rotating storage tank 82, However, this embodiment can avoid this problem. The spitting momentum of the washing liquid, Spit out increased, In order to make the washing liquid spit out well. The inertia phase of the side hysteresis phase of the hole in the inner 85th hole of the inner case is -24- (22) 1231950 At the same time, Since the partition member 89 is arranged obliquely to the arrangement direction thereof, therefore, The cleaning liquid inside the storage tank 82 can be circulated in the rotation direction of the spin cup 50. The present invention is not limited to the embodiments described above, There can be various deformations. E.g, ? The number of L 52a is not necessarily plural, Can also be one. Simultaneously, One of the four slits 62a in Fig. 8 may be a plurality of long holes. and, The photoresist coating method in the photoresist coating processing unit CT is not limited to the above embodiment, It may be so-called scan coating in which the nozzle is moved on the substrate G and the photoresist is discharged. Simultaneously, The gap 8 5 in the U figure may not be provided. Instead, a communication port through which the cleaning liquid is passed is provided in the partition member 89. and, The substrate of the above embodiment is an example of a glass substrate for a liquid crystal display device. But as long as a lid is provided in the rotating cup, The semiconductor wafer substrate can also be applied to the present invention. Fig. 13 is a cross-sectional view showing a part of a rotary cup 162 of a photoresist coating processing unit according to another embodiment. Furthermore, In this embodiment, The same components as those in the above embodiment are marked with the same symbols, Its description is omitted, The description will focus on the different parts. Fixed cup 1 6 1 accommodates rotating cup 1 62, As described later, it is used to separate the air flow and the washing liquid flowing inside during the washing. The fixed cup 1 6 1 has an opening at the upper end, There is a flow control unit 1 80 on the outer periphery, The whole is slightly cylindrical. The air flow control unit 1 80 is equipped with: For example, the inner wall 180a, which slopes downward toward -25- (23) 1231950: At the height A that becomes the inner wall 180a, the inner wall 1 8 0 b that is bent downward toward the inner side is folded back; And then, the inner wall 1 8 0 c which is inclined downward toward the inside is reversely folded. A nozzle insertion portion 185 of a cleaning nozzle 203 in which a first nozzle for discharging a cleaning liquid is fixed is fixed to the outer surface of the upper portion of the airflow control unit 180. The cleaning nozzle 2 0 3 is a storage tank 2 2 0 connected to a cleaning liquid via a cleaning liquid supply pipe. When cleaning, a cleaning liquid is supplied to the cleaning nozzle 2 0 3, The outer wall 162b and the like of the rotating cup 162 are washed. Furthermore, The nozzle insertion portion 185 may be formed with a hole for inserting a nozzle for cleaning ', and another nozzle may be inserted into this hole to spit out the cleaning solution for cleaning. Instead of the cleaning nozzle 203 for cleaning, the V-shaped seal 102 is embedded in the upper surface of the nozzle insertion part 185, for example. On the nozzle insertion portion 185, A disc-shaped fixed cup lid 186 provided with an inner wall 18 6b is detachably disposed via a V-shaped seal 102. The fixed cup cover 186 is configured such that the inner wall 18 6b is almost on the same surface as the inner wall 180a. The upper wall 186a of the fixed cup cover 186, An introduction port 182 is formed at a slightly central position to introduce external air. Furthermore, The number or shape of the introduction openings formed in the fixed cup lid 186 may be, For example, two introduction ports having half the area of the introduction port 182 are formed. The disc-shaped cover 137 is arranged at a first interval hi (hereinafter, The gap of the first interval hi is referred to as "the first flow path"). The upper periphery of the rotating cup 1 62 is disposed at a second interval h2 (hereinafter, The second interval -26- (24) 1231950 h2 is referred to as the "second flow path"). 162b of the rotating cup 1 62 faces the inner wall 180a, At the same time, it is arranged so that the distance below the inner wall 180a becomes wider. On the upper part of the inner wall 180c, A protective member 197 is attached to the protruding member slightly horizontally outwardly. The height A is below the height of the outer bottom surface 16 2 a of the rotating cup 16 2. Furthermore, Or for example, The height A is made lower than the horizontal height of the lower surface of the rotating cup 162. The bottom surface of the fixed cup 1 6 1 is provided with, for example, four protruding downwards, An exhaust pipe 183 is formed to discharge the gas 183a introduced into the fixed cup 161 from the introduction port 182. The exhaust pipe 183 is connected to an exhaust gas (not shown). Is formed by the rotation of the spin 162, The photoresist solution is discharged to a discharge hole 104 on the inner wall side of the fixing cup 161. On the bottom of the air flow control section 180, for example, four photoresist liquids for discharging the photoresist liquid discharged from the discharge hole 104 are protruded downward. It is lowered to the waste liquid pipe 181 of the waste liquid outlet 181d. The waste liquid pipe 181 is connected to the waste liquid pipe shown. The fixed cup 1 6 1 is inside of the waste liquid port 1 8 1 d. It is outside from the exhaust port, A waste liquid pipe 194 is formed to form a waste liquid port for draining the photoresist liquid waste liquid. The diameter of the waste liquid port 194a is set smaller than the diameter of the waste liquid port. A disk-shaped 192 is fixed to the inner bottom surface 161b of the fixing cup 161. The outer wall of the partition wall 192 is formed along the inner and outer walls of the fixed cup 161. The most useful port is provided with B. The most useful port is the duct 180a. With square waste not shown 1 83a 194a 1 8 1 d The outer peripheral edge portion of the partition wall 192 is bent obliquely downward along the slant of the inner wall 180c. The space between the inner bottom surface 161b of the fixed cup 161 and the outer bottom surface 16 2 a of the rotating cup 16 2 is partitioned by partition walls 19 2 into two equal parts. The exhaust port 183a is disposed between the bottom surface of the rotating cup 162, For example, a rectifier plate 195 is formed with 12 through holes 196. Configure the rectifier plate 1 9 5 to The through holes 196 of the rectifying plate 195 and the exhaust port 183a are staggered and do not overlap. On the bottom surface of the fixed cup 1 6 1 Between the waste pipe 1 8 1 and the waste pipe 1 94, A plurality of cleaning nozzles 205 for the second nozzle and cleaning nozzles 206 for the third nozzle are mounted on the circumference. Cleaning nozzle 205, The cleaning nozzle 206 is connected to a storage tank 220 for storing a cleaning liquid through a cleaning liquid supply pipe, respectively. The cleaning nozzle 205 is used to clean the outer bottom surface 162 a of the rotating cup 162. The front end portion of the cleaning nozzle 205 penetrates the partition wall 192 and protrudes toward the outer bottom surface 162a of the rotary cup 162. therefore, The cleaning liquid can be directly discharged from the cleaning nozzle 205 to the outer bottom surface 162a. Wash the outer bottom surface 162a. The cleaning nozzle 206 is used to clean the inner wall 180c of the airflow control unit 180. The front end of the cleaning nozzle 206 is located below the partition wall 192, A discharge port (not shown) for discharging the cleaning liquid is formed on the side surface of the front end portion. therefore, The cleaning liquid discharged from the cleaning nozzle 206 can be discharged to the inner wall 180c. Therefore, the cleaning liquid can be discharged from the cleaning nozzle 206 to clean the inner wall 180c. The material of the inner wall of the storage tank 52, Metals such as aluminum can be used. This can prevent deformation due to rotation when using synthetic resin, etc. Provides a stable supply of cleaning solution. Cleaning nozzle 203, Washing nozzle 205, Cleaning nozzle -28 · (26) (26) 1231950 206, and storage tank 220 constitute a cleaning mechanism. Fig. 14 is a plan view of a photoresist coating processing unit (C T). As shown in Figure 14, A supply port 152b is formed in the storage tank 52, The center of the rotating cup 162 is held with the supply port 52b. The cleaning liquid supply mechanism 1 5 7 has: A cleaning liquid nozzle 44 as a discharge nozzle supported by a horizontal support 142 as a support. The horizontal cleaning body 142 supports the side wall cleaning nozzle 201a of the fifth nozzle. The cleaning liquid nozzle 44 is configured so that Can be driven by the motor 43, Around the motor 43 shaft, Rotate at least between the 'outside of the rotating cup 162 and the straight upper position (position P1) of the supply port 52b. therefore, When the cleaning liquid nozzle 44 is located at the position P 1, that is, When directly above the supply port 5 2 b, The cleaning liquid can be discharged from the cleaning liquid nozzle 44 into the supply port 52b. Can be driven by the same motor 43, The cleaning liquid nozzle 44 is further integrated with the side wall cleaning nozzle 201a and the bottom surface cleaning nozzle to be described later and moved to the position P2. When the cleaning liquid nozzle 44 is positioned at the position P2, The open end 201b of the side wall cleaning nozzle 201a is located above the inner surface side of the side wall of the rotary cup 162. Fig. 15 is a plan view of the cleaning liquid supply mechanism 157 of this embodiment. As shown in Figure 15, The cleaning liquid nozzle 44 and the bottom cleaning nozzle 201 of the fourth nozzle are supported by a horizontal support 142. The front end portion of the bottom surface cleaning nozzle 201 is formed with an opening 201c for discharging the cleaning liquid to the lower side. A side wall cleaning nozzle 201a is connected to a substantially central portion of the bottom surface cleaning nozzle 201 in the longitudinal direction. The side wall cleaning nozzle 201a is used to clean the rotating cup 162. The side wall cleaning nozzle 201a is an open end 201b which is bent at the front end toward -29- (27) (27) 1231950 toward, for example, the motor 43 side. The bottom surface cleaning nozzle 201 and the cleaning liquid nozzle 44 are connected to a storage tank 222 for storing a cleaning liquid through a switching valve 22 1 for switching the supply of the cleaning liquid. therefore, The cleaning liquid supplied to the bottom surface cleaning nozzle 201 is divided at the branch point V of the side wall cleaning nozzle 201a and the bottom surface cleaning nozzle 201, Divided into two ways: side wall cleaning nozzle 201a side and slot 2 0 1 c side, And from the opening end 201b, The slit 201c is spit out. Simultaneously, The cleaning liquid nozzle 44, The bottom surface cleaning nozzle 201 and the side wall cleaning nozzle 201a move integrally. therefore, No need for different moving mechanisms, Can simplify construction, Achieve cost reduction and space saving. Furthermore, This embodiment shows an example in which the side wall cleaning nozzle 20 1 a is fixed to a substantially central portion in the longitudinal direction of the horizontal support 142. But, The side wall cleaning nozzle 201a may be offset-connected to the motor 43 side. To lengthen the slit 20 1 c. In this way, the cleaning liquid can be supplied to a larger area, Effectively cleans. Secondly, The function and the like of the rotating cup 162 when the photoresist is applied to the substrate will be described with reference to FIG. When the spin cup 1 62 rotates, The gas flowing into the fixed cup 1 6 1 flows into the first flow path from the introduction port 1 82. The gas flowing into the first flow path flows into the second flow path along the inner wall 1 8 6b (inclined surface) of the fixed cup cover 1 8 6. The interval h2 of the second flow path is set to be smaller than the interval h 1 of the first flow path. Therefore, The flow velocity of the second flow path is faster than that of the first flow path. The gas accelerated in the second flow path is along the inner wall 180a, Inner wall 180b The inclined surface of the inner wall 1 8 0 c flows. that is, In the air flow control unit 180, -30- (28) 1231950 'is a vortex in the direction of arrow C. The photoresist mist generated in the airflow control unit 180 is caused by the protection member 197. Blocked into the exhaust port 1 8 3 a side, On the other hand, the waste pipe 1 8 1 flows downward. The gas flowing in the direction of arrow C flows into the bottom side of the partition wall 192, The flow velocity is uniformized by, for example, the through holes 1 9 6 of the rectifying plate 1 9 5, Exhaust from the exhaust port 183a. Secondly, The washing procedure of the rotating cup 162 and the fixed cup 161 according to this embodiment will be described with reference to the flowchart shown in FIG. As shown in Figure 17, The rotary chuck 151 is raised to stand by. Driving the motor 43 shown in Fig. 14, The cleaning liquid nozzle 44 is positioned at the position P1. After positioning, The cleaning liquid is discharged from the cleaning liquid nozzle 44 into the supply port 52b. Stored in the storage tank 52 (step 1 (S1)). then, The rotating cup 162 shown in FIG. 14 is rotated 180 degrees (S2). With this, The supply port 52b is positioned directly below the cleaning liquid nozzle 44. then, As in step 1 (S 1), The cleaning liquid is discharged from the cleaning liquid nozzle 44 to the supply port 152b. The cleaning solution is stored in the storage tank 52 (S3). With this, Through the supply port 52b, 152b allows the cleaning solution to reach the entire storage tank 52, Therefore, storage time can be shortened. As shown in Figure 14, The driving motor 43 aligns the cleaning liquid nozzle 44 with the position P2. then, From the open end 201b, Slit 201c, Washing nozzle 203, The cleaning nozzle 205 discharges a cleaning solution. At this time, The rotary cup 162 is rotated at, for example, 5 rpm at the first revolution (S4). that is, Rotate the spin cup 1 62, At the same time, the cleaning liquid is discharged from each nozzle to wash each part. Specifically -31-(29) 1231950 Yes, As shown in Figure 17, The cleaning liquid is discharged from the open end 201b to the inner peripheral surfaces 162n and 162t of the wall of the rotating cup 162. Simultaneously, Spit out the cleaning solution from the slit to the inside bottom surface 1 6 2 c of the rotating cup 1 6 2. Simultaneously, The cleaning nozzle 203 discharges the cleaning liquid to the outer wall 162b. Then, the washing liquid is discharged from the washing 2 5 to the outer bottom surface 16 2 a of the rotating cup 1 6 2. Such as clean all sides. then, The cleaning liquid nozzle 44 is left to stand outside the fixed cup 161 and the lid 137 is closed (S5). then, Similarly to the above-mentioned embodiment, for example, nitrogen is sprayed into the spinner 162 (S6). then, For example, the rotation cup 1 62 (s 7) is rotated at 700 rpm at the second revolution. With this, The rotating cup 162 can be rotated, for example, At the same time, the cleaning liquid is sprayed from the tank 52, Wash the peripheral edge part 137a under the cover 137 and spray nitrogen gas, The cleaning solution can be discharged from the discharge hole 104 to the outside of the rotor. the following, Nitrogen should be sprayed until the end of cleaning. then, For example, at the same time, the rotating cup 162 ′ is rotated at 100 rpm at the third revolution. From the cleaning nozzle 205, The cleaning nozzle 206 and the cleaning nozzle 203 discharge the cleaning liquid (S 8). With this, You can suppress the rotation of 162. Simultaneously clean the outer bottom surface i62a of the rotating cup 162, The stain remains on the inner wall 180c of the cup 161 and the outer wall 162b of the rotating cup 162. in this way, First of all, In step 4, the contamination of the agent and the like attached to the rotating cup 162 is removed. And in step 7, Remove the contamination with the rotating cup 1 62 or the fixed cup 1 6 1 when cleaning the lid 1 3 7 Go further to the side 20 1c in step 8 from the wash nozzle to this wash, The rotating cup rotates to store. Rotated by 162, the dirt fixed by the spray cup is removed, -32- (30) 1231950 Wash thoroughly, It is more sure to prevent the occurrence of particles and the like. then, The number of revolutions of the spin cup 162 is increased to, for example, 30 Orpm at the fourth number of revolutions. At the same time, the cleaning liquid is discharged from the cleaning nozzle 203 to the outer wall 162b (S 9). With this, Can be rotated by rotating the cup 162, Reflecting the cleaning liquid discharged from the cleaning nozzle 203 on the outer wall 162b, The inner wall 180a is washed with a reflecting washing liquid. Furthermore, This embodiment shows an example in which step 7 (S7) is executed after step 6 (S6). But the order of these two steps is not necessarily the same, E.g, It is also possible to spray nitrogen at the same time or after the start of step 6, The rotation of the spin cup 162 of step 7 is started. As shown in Figure 18, Also, For example, changing the shape of the storage tank 52, The corner of the storage tank 52 is separated from the side wall of the rotating cup 162 toward the central axis of the rotating cup 162, Further, more holes 52a are formed by the equiangular portions. When so constructed, When the cleaning solution sprayed from the hole 52a is scattered to the outer peripheral side by centrifugal force during cleaning, The bottom peripheral edge portion 137a of the cover body 137 shown in Fig. 13 can still be cleaned. Simultaneously, Since the number of holes 52a is increased, Can spread more cleaning liquid to the peripheral part of the bottom surface 1 3 7a, Effectively perform washing action. Furthermore, Instead of changing the shape of the storage tank 52, Move the position of the hole 52a of the storage tank 52 to the center side of the rotating cup 162, The same effect can be obtained. and, The above embodiment shows the supply port 52b of the storage tank 52, 15 2b is an example formed at the substantially center of the side of the storage tank 52. But yes Supply port 52b, The position of 152b is not limited to this, E.g, It may be formed in the vicinity of each corner where the centrifugal force of the storage tank 52 is greatest. When so constructed, For example, storing the cleaning solution in the storage tank 52 and rotating the rotating cup 1 62 • 33- (31) 1231950, Can effectively use centrifugal force, Disperse the washing liquid in the storage tank 52. At the same time, The above embodiment is an example in which aluminum is used as the material of the inner wall of the storage tank 52. but, The inner wall of the storage tank 5 2 is not limited to aluminum, It is also possible to apply fluorine to the inner wall, for example. This structure can make the flow of the washing liquid smoother, This can shorten the storage time of the cleaning solution. At the same time, the cleaning liquid can be easily scattered. and, The above-mentioned embodiment shows that the cleaning liquid nozzle 44 and the supply port 52b are aligned to discharge the cleaning liquid. but, As shown in Figure 19, An engagement groove 5 2f larger than the supply port 52b may be formed in the storage tank 52. A distal end portion of the cleaning liquid nozzle 44 is provided with, for example, a rubber engaging portion 44f that can be engaged with the engaging groove 52f. When the cleaning solution is discharged to the storage tank 52 in step 1 or step 3 shown in FIG. 16, For example, the horizontal support 142 is lowered, The engaging portion 44f is engaged with the engaging groove 52f. When so constructed, For example, when storing cleaning solutions, Can prevent the washing liquid from leaking out of the storage tank 5 2 At the same time, it can speed up the discharge speed, This allows the cleaning solution to be stored for a short period of time. As explained above, When in accordance with the invention, Can clean containers such as cups or open and close the lid of the container. It can save the operation procedures of the cleaning process. This can prevent particles from occurring in the cover. [Brief Description of the Drawings] Fig. 1 is a plan view showing the overall structure of a coating development processing system according to an embodiment of the present invention. -34- (32) (32) 1231950 Figure 2 is a front view of the coating development processing system shown in Figure 1. FIG. 3 is a rear view of the coating development processing system shown in FIG. 1. FIG. FIG. 4 is a cross-sectional view of a photoresist coating processing unit according to an embodiment. FIG. 5 is a plan view of the photoresist coating processing unit shown in FIG. 4. FIG. 6 is a diagram illustrating a storage tank according to an embodiment. An enlarged sectional view showing the inside of the rotating cup. Fig. 7 is an enlarged plan view of the vicinity of the supply port of the cleaning solution in the storage tank. Fig. 8 'is a plan view for explaining the rotating cup and the interior of the storage tank in another embodiment. Fig. 9 is a storage tank for explaining another embodiment, An enlarged sectional view showing the inside of the rotating cup. Fig. 10 is a diagram illustrating a storage tank according to an embodiment, A plan view showing a part of the inside of the rotating cup. Fig. 11 is a sectional view of the storage tank shown in Fig. 10. FIG. 12 is a perspective view of the partition member shown in FIG. 10. Fig. 13 is a sectional view showing a part of a rotary cup according to another embodiment. Fig. 14 is a plan view of a photoresist coating processing unit according to another embodiment. Fig. 15 is a plan view of a cleaning liquid supply mechanism of another embodiment. Fig. 16 is a flow showing a cleaning liquid supply method of another embodiment. -35 · (33) 123195 ° Course _ ° The figure is a sectional view of the rotating cup and the fixed cup when the rotating cup is cleaned as shown in FIG. 16. Fig. 18 is a plan view showing a modified example of the storage tank of another embodiment. Fig. 19 is a side view showing an engaging portion of a cleaning liquid supply mechanism according to another embodiment. [Illustration of drawing number] G: Glass substrate CT: Photoresist coating processing unit 37: Cover 40: Drive 4 1: Photoresist liquid supply mechanism 43: Motor 44: Washing liquid nozzle 5 〇: Spin Cup 5〇b: Opening 5 1. 1 5 1: Rotating chuck 52, 62, 72: Storage tank
52a 、 72a ：孑L 52b 、 152b :供應口 57、157 :洗淨液供應機構 62a :開縫 -36- (34) (34)1231950 1 6 1 :固定杯 162 :旋轉杯 201 :底面洗淨用噴嘴 201a :側壁洗淨用噴嘴 203、205、206:洗淨用噴嘴52a, 72a: 孑 L 52b, 152b: supply ports 57, 157: cleaning liquid supply mechanism 62a: slot-36- (34) (34) 1231950 1 6 1: fixed cup 162: rotating cup 201: bottom surface cleaning Nozzle 201a: Nozzles for side wall cleaning 203, 205, 206: Nozzles for cleaning
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