TWI229581B - Method and apparatus for configuring an aperture edge - Google Patents
Method and apparatus for configuring an aperture edge Download PDFInfo
- Publication number
- TWI229581B TWI229581B TW092102131A TW92102131A TWI229581B TW I229581 B TWI229581 B TW I229581B TW 092102131 A TW092102131 A TW 092102131A TW 92102131 A TW92102131 A TW 92102131A TW I229581 B TWI229581 B TW I229581B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- photoresist material
- material layer
- edge
- radiation
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 90
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 54
- 230000005855 radiation Effects 0.000 claims abstract description 28
- 230000001154 acute effect Effects 0.000 claims abstract description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 13
- 239000011800 void material Substances 0.000 claims description 2
- 238000000059 patterning Methods 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 54
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 229910052804 chromium Inorganic materials 0.000 description 43
- 239000011651 chromium Substances 0.000 description 43
- 239000011521 glass Substances 0.000 description 31
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 14
- 229910000423 chromium oxide Inorganic materials 0.000 description 14
- 239000007789 gas Substances 0.000 description 6
- 238000009434 installation Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910001041 brightray Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0067—Packages or encapsulation for controlling the passage of optical signals through the package
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/066,139 US6667837B1 (en) | 2002-01-30 | 2002-01-30 | Method and apparatus for configuring an aperture edge |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200408334A TW200408334A (en) | 2004-05-16 |
| TWI229581B true TWI229581B (en) | 2005-03-11 |
Family
ID=27658644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092102131A TWI229581B (en) | 2002-01-30 | 2003-01-29 | Method and apparatus for configuring an aperture edge |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6667837B1 (enExample) |
| EP (1) | EP1470444A1 (enExample) |
| JP (1) | JP4308666B2 (enExample) |
| KR (1) | KR100612172B1 (enExample) |
| CN (1) | CN1602439A (enExample) |
| TW (1) | TWI229581B (enExample) |
| WO (1) | WO2003065104A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6974517B2 (en) * | 2001-06-13 | 2005-12-13 | Raytheon Company | Lid with window hermetically sealed to frame, and a method of making it |
| US6745449B2 (en) * | 2001-11-06 | 2004-06-08 | Raytheon Company | Method and apparatus for making a lid with an optically transmissive window |
| US6988338B1 (en) | 2002-10-10 | 2006-01-24 | Raytheon Company | Lid with a thermally protected window |
| US7161727B2 (en) * | 2003-03-24 | 2007-01-09 | Memphis Eye & Cataract Associates Ambulatory Surgery Center | Digital micromirror device having a window transparent to ultraviolet (UV) light |
| US7046419B2 (en) * | 2004-08-13 | 2006-05-16 | Hewlett-Packard Development Company, L.P. | External aperturing for digital micromirror devices |
| US7459095B2 (en) * | 2004-10-21 | 2008-12-02 | Corning Incorporated | Opaque chrome coating suitable for etching |
| JP5324784B2 (ja) * | 2004-10-21 | 2013-10-23 | コーニング インコーポレイテッド | 開口部を有する不透明クロム被膜を備えた光学素子およびその作成方法 |
| US7184201B2 (en) * | 2004-11-02 | 2007-02-27 | Texas Instruments Incorporated | Digital micro-mirror device having improved contrast and method for the same |
| KR100772039B1 (ko) * | 2004-12-24 | 2007-10-31 | 엘지전자 주식회사 | 스캐닝 마이크로미러 패키지 및 그 제조 방법과, 이를사용한 광 스캐닝 장치 |
| KR100713132B1 (ko) * | 2005-05-27 | 2007-05-02 | 삼성전자주식회사 | 프로젝터 |
| US7348193B2 (en) | 2005-06-30 | 2008-03-25 | Corning Incorporated | Hermetic seals for micro-electromechanical system devices |
| KR100667291B1 (ko) * | 2005-07-27 | 2007-01-12 | 삼성전자주식회사 | 마이크로 미러 소자 패키지 및 그 제조방법 |
| US8064122B2 (en) * | 2007-03-15 | 2011-11-22 | Asml Holding N.V. | Apertured window for enabling flexible illumination overfill of patterning devices |
| US20140097913A1 (en) | 2012-10-09 | 2014-04-10 | Mesaplexx Pty Ltd | Multi-mode filter |
| US11522107B2 (en) * | 2015-03-05 | 2022-12-06 | Xiamen Sanan Optoelectronics Technology Co., Ltd. | Light emitting diode and fabrication method thereof |
| US11111133B1 (en) | 2017-01-30 | 2021-09-07 | Mirrorcle Technologies, Inc. | MEMS actuators with improved performance and cooling |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5061049A (en) | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
| US5392155A (en) * | 1988-06-17 | 1995-02-21 | Tamari; Vladimir F. | De-diffraction methods |
| US5264393A (en) | 1988-11-25 | 1993-11-23 | Fuji Photo Film Co., Ltd. | Solid state image pickup device and method of manufacturing the same |
| US5095664A (en) | 1990-01-30 | 1992-03-17 | Massachusetts Institute Of Technology | Optical surface polishing method |
| US5326426A (en) * | 1991-11-14 | 1994-07-05 | Tam Andrew C | Undercut membrane mask for high energy photon patterning |
| US5458716A (en) | 1994-05-25 | 1995-10-17 | Texas Instruments Incorporated | Methods for manufacturing a thermally enhanced molded cavity package having a parallel lid |
| US5907425A (en) * | 1995-12-19 | 1999-05-25 | The Board Of Trustees Of The Leland Stanford Junior University | Miniature scanning confocal microscope |
| US5939785A (en) * | 1996-04-12 | 1999-08-17 | Texas Instruments Incorporated | Micromechanical device including time-release passivant |
| DE19816230C2 (de) * | 1997-04-11 | 2001-11-29 | Advantest Corp | Abschirmgehäuse |
| JP3849527B2 (ja) | 1999-12-22 | 2006-11-22 | 松下電工株式会社 | 焦電性材料の薄板から複数の素子チップを製造する方法 |
| US6583921B2 (en) | 1999-12-28 | 2003-06-24 | Texas Instruments Incorporated | Micromechanical device and method for non-contacting edge-coupled operation |
-
2002
- 2002-01-30 US US10/066,139 patent/US6667837B1/en not_active Expired - Lifetime
-
2003
- 2003-01-28 CN CNA038017067A patent/CN1602439A/zh active Pending
- 2003-01-28 JP JP2003564639A patent/JP4308666B2/ja not_active Expired - Fee Related
- 2003-01-28 EP EP03705957A patent/EP1470444A1/en not_active Withdrawn
- 2003-01-28 KR KR1020047011686A patent/KR100612172B1/ko not_active Expired - Fee Related
- 2003-01-28 WO PCT/US2003/002567 patent/WO2003065104A1/en not_active Ceased
- 2003-01-29 TW TW092102131A patent/TWI229581B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003065104A1 (en) | 2003-08-07 |
| JP2005516256A (ja) | 2005-06-02 |
| KR20040079961A (ko) | 2004-09-16 |
| TW200408334A (en) | 2004-05-16 |
| US6667837B1 (en) | 2003-12-23 |
| KR100612172B1 (ko) | 2006-08-14 |
| EP1470444A1 (en) | 2004-10-27 |
| CN1602439A (zh) | 2005-03-30 |
| JP4308666B2 (ja) | 2009-08-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |