TWD230585S - 反應管 - Google Patents
反應管 Download PDFInfo
- Publication number
- TWD230585S TWD230585S TW111302868F TW111302868F TWD230585S TW D230585 S TWD230585 S TW D230585S TW 111302868 F TW111302868 F TW 111302868F TW 111302868 F TW111302868 F TW 111302868F TW D230585 S TWD230585 S TW D230585S
- Authority
- TW
- Taiwan
- Prior art keywords
- reaction tube
- design
- express
- views
- processing device
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022004139F JP1731877S (cs) | 2022-03-01 | 2022-03-01 | |
| JP2022-004139 | 2022-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD230585S true TWD230585S (zh) | 2024-04-01 |
Family
ID=84322401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111302868F TWD230585S (zh) | 2022-03-01 | 2022-06-15 | 反應管 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1022906S1 (cs) |
| JP (1) | JP1731877S (cs) |
| TW (1) | TWD230585S (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1042340S1 (en) * | 2021-09-15 | 2024-09-17 | Kokusai Electric Corporation | Tubular reactor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD166710S (zh) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | 反應管 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| JP3985899B2 (ja) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | 基板処理装置 |
| TWD118408S1 (zh) * | 2006-02-20 | 2007-08-01 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| TWD127410S1 (zh) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | 半導體製造用製程管 |
| TWD125601S (zh) * | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| TWD133943S1 (zh) | 2008-05-09 | 2010-03-21 | 日立國際電氣股份有限公司 | 反應管 |
| USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| JP1534828S (cs) * | 2015-02-23 | 2015-10-13 | ||
| JP1535455S (cs) * | 2015-02-25 | 2015-10-19 | ||
| JP1546345S (cs) * | 2015-09-04 | 2016-03-22 | ||
| JP1546512S (cs) * | 2015-09-04 | 2016-03-22 |
-
2022
- 2022-03-01 JP JP2022004139F patent/JP1731877S/ja active Active
- 2022-06-15 TW TW111302868F patent/TWD230585S/zh unknown
- 2022-06-22 US US29/843,542 patent/USD1022906S1/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD166710S (zh) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | 反應管 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1042340S1 (en) * | 2021-09-15 | 2024-09-17 | Kokusai Electric Corporation | Tubular reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1731877S (cs) | 2022-12-09 |
| USD1022906S1 (en) | 2024-04-16 |
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