TWD230584S - 反應管 - Google Patents
反應管 Download PDFInfo
- Publication number
- TWD230584S TWD230584S TW111302867F TW111302867F TWD230584S TW D230584 S TWD230584 S TW D230584S TW 111302867 F TW111302867 F TW 111302867F TW 111302867 F TW111302867 F TW 111302867F TW D230584 S TWD230584 S TW D230584S
- Authority
- TW
- Taiwan
- Prior art keywords
- reaction tube
- design
- express
- views
- processing device
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract 1
Abstract
【物品用途】;本設計之物品是反應管，係在基板處理裝置中，將排列成複數層的基板收容在內部，且在既定的氣體氛圍下進行處理的反應管。;【設計說明】;立體圖中，未呈現在其他六視圖中的細線，皆為用表現立體表面之形狀的線條。
Description
本設計之物品是反應管，係在基板處理裝置中，將排列成複數層的基板收容在內部，且在既定的氣體氛圍下進行處理的反應管。
立體圖中，未呈現在其他六視圖中的細線，皆為用表現立體表面之形狀的線條。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-004138 | 2022-03-01 | ||
| JP2022004138F JP1731789S (zh) | 2022-03-01 | 2022-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD230584S true TWD230584S (zh) | 2024-04-01 |
Family
ID=84322450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111302867F TWD230584S (zh) | 2022-03-01 | 2022-06-15 | 反應管 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1022907S1 (zh) |
| JP (1) | JP1731789S (zh) |
| TW (1) | TWD230584S (zh) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD166710S (zh) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | 反應管 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| JP3985899B2 (ja) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | 基板処理装置 |
| USD590359S1 (en) * | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD618638S1 (en) | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| JP1534828S (zh) * | 2015-02-23 | 2015-10-13 | ||
| JP1535455S (zh) * | 2015-02-25 | 2015-10-19 | ||
| JP1546345S (zh) * | 2015-09-04 | 2016-03-22 | ||
| JP1546512S (zh) * | 2015-09-04 | 2016-03-22 |
-
2022
- 2022-03-01 JP JP2022004138F patent/JP1731789S/ja active Active
- 2022-06-15 TW TW111302867F patent/TWD230584S/zh unknown
- 2022-06-22 US US29/843,558 patent/USD1022907S1/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD166710S (zh) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | 反應管 |
Also Published As
| Publication number | Publication date |
|---|---|
| USD1022907S1 (en) | 2024-04-16 |
| JP1731789S (zh) | 2022-12-09 |
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