TWD228601S - 用於基板處理腔室的抗旋轉處理套件的擋板 - Google Patents
用於基板處理腔室的抗旋轉處理套件的擋板 Download PDFInfo
- Publication number
- TWD228601S TWD228601S TW112302955D01F TW112302955D01F TWD228601S TW D228601 S TWD228601 S TW D228601S TW 112302955D01 F TW112302955D01 F TW 112302955D01F TW 112302955D01 F TW112302955D01 F TW 112302955D01F TW D228601 S TWD228601 S TW D228601S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- baffle
- substrate processing
- processing chamber
- rotation process
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract description 3
- 238000010586 diagram Methods 0.000 abstract description 2
- 230000000007 visual effect Effects 0.000 abstract 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202229833394 | 2022-04-04 | ||
US29/833,394 | 2022-04-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD228601S true TWD228601S (zh) | 2023-11-11 |
Family
ID=86055241
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112302955D01F TWD228601S (zh) | 2022-04-04 | 2022-10-03 | 用於基板處理腔室的抗旋轉處理套件的擋板 |
TW112302955F TWD228600S (zh) | 2022-04-04 | 2022-10-03 | 用於基板處理腔室的抗旋轉處理套件的擋板 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112302955F TWD228600S (zh) | 2022-04-04 | 2022-10-03 | 用於基板處理腔室的抗旋轉處理套件的擋板 |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP1742743S (ja) |
TW (2) | TWD228601S (ja) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD933726S1 (en) | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
-
2022
- 2022-10-03 JP JP2022021305F patent/JP1742743S/ja active Active
- 2022-10-03 TW TW112302955D01F patent/TWD228601S/zh unknown
- 2022-10-03 JP JP2022021304F patent/JP1742710S/ja active Active
- 2022-10-03 TW TW112302955F patent/TWD228600S/zh unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD933726S1 (en) | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
Also Published As
Publication number | Publication date |
---|---|
JP1742743S (ja) | 2023-04-24 |
TWD228600S (zh) | 2023-11-11 |
JP1742710S (ja) | 2023-04-24 |
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