TWD217778S - 基板處理裝置用置頂式加熱器 - Google Patents

基板處理裝置用置頂式加熱器 Download PDF

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Publication number
TWD217778S
TWD217778S TW110301195F TW110301195F TWD217778S TW D217778 S TWD217778 S TW D217778S TW 110301195 F TW110301195 F TW 110301195F TW 110301195 F TW110301195 F TW 110301195F TW D217778 S TWD217778 S TW D217778S
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TW
Taiwan
Prior art keywords
substrate processing
processing equipment
overhead
overhead heaters
heaters
Prior art date
Application number
TW110301195F
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English (en)
Inventor
杉浦忍
小杉哲也
吉村祐哉
庄司拓人
Original Assignee
日商國際電氣股份有限公司
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Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD217778S publication Critical patent/TWD217778S/zh

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Abstract

【物品用途】;本設計的物品是基板處理裝置用置頂式加熱器，為一種在用來處理基板的基板處理裝置中，設置在用來加熱基板處理裝置之處理室之加熱單元中的頂棚部的置頂式加熱器。;【設計說明】;(無)

Description

基板處理裝置用置頂式加熱器
本設計的物品是基板處理裝置用置頂式加熱器，為一種在用來處理基板的基板處理裝置中，設置在用來加熱基板處理裝置之處理室之加熱單元中的頂棚部的置頂式加熱器。
(無)
TW110301195F 2020-09-24 2021-03-09 基板處理裝置用置頂式加熱器 TWD217778S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-020257 2020-09-24
JP2020020257F JP1684469S (ja) 2020-09-24 2020-09-24 基板処理装置用天井ヒータ

Publications (1)

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TWD217778S true TWD217778S (zh) 2022-03-21

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TW110301195F TWD217778S (zh) 2020-09-24 2021-03-09 基板處理裝置用置頂式加熱器

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US (1) USD959393S1 (zh)
JP (1) JP1684469S (zh)
TW (1) TWD217778S (zh)

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JP1684468S (ja) * 2020-09-24 2021-05-10 基板処理装置用天井ヒータ
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USD1118552S1 (en) * 2023-10-24 2026-03-17 Applied Materials, Inc. Substrate carrier
USD1113882S1 (en) 2024-07-03 2026-02-17 Advanide Holdings Pte. Ltd. RFID antenna for a biometric card

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JP1684469S (ja) 2021-05-10
USD959393S1 (en) 2022-08-02

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