TW588072B - Antireflective porogens - Google Patents

Antireflective porogens Download PDF

Info

Publication number
TW588072B
TW588072B TW90124895A TW90124895A TW588072B TW 588072 B TW588072 B TW 588072B TW 90124895 A TW90124895 A TW 90124895A TW 90124895 A TW90124895 A TW 90124895A TW 588072 B TW588072 B TW 588072B
Authority
TW
Taiwan
Prior art keywords
pore former
poly
organic
dielectric material
dielectric
Prior art date
Application number
TW90124895A
Other languages
English (en)
Chinese (zh)
Inventor
Anthony Zampini
Michael K Gallagher
Original Assignee
Shipley Co Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Llc filed Critical Shipley Co Llc
Application granted granted Critical
Publication of TW588072B publication Critical patent/TW588072B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/665—Porous materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
    • H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
    • H10P14/6684—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and oxygen
    • H10P14/6686—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249955—Void-containing component partially impregnated with adjacent component
    • Y10T428/249958—Void-containing component is synthetic resin or natural rubbers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Formation Of Insulating Films (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silicon Polymers (AREA)
TW90124895A 2000-10-10 2001-10-09 Antireflective porogens TW588072B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23902600P 2000-10-10 2000-10-10

Publications (1)

Publication Number Publication Date
TW588072B true TW588072B (en) 2004-05-21

Family

ID=22900292

Family Applications (1)

Application Number Title Priority Date Filing Date
TW90124895A TW588072B (en) 2000-10-10 2001-10-09 Antireflective porogens

Country Status (5)

Country Link
US (3) US6576681B2 (https=)
EP (1) EP1197998A3 (https=)
JP (2) JP2002284997A (https=)
KR (1) KR100816664B1 (https=)
TW (1) TW588072B (https=)

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8352400B2 (en) 1991-12-23 2013-01-08 Hoffberg Steven M Adaptive pattern recognition based controller apparatus and method and human-factored interface therefore
DE19829172A1 (de) * 1998-06-30 2000-01-05 Univ Konstanz Verfahren zur Herstellung von Antireflexschichten
US7966078B2 (en) 1999-02-01 2011-06-21 Steven Hoffberg Network media appliance system and method
US6686035B2 (en) * 1999-02-05 2004-02-03 Waters Investments Limited Porous inorganic/organic hybrid particles for chromatographic separations and process for their preparation
AU2001288954A1 (en) * 2000-09-13 2002-03-26 Shipley Company, L.L.C. Electronic device manufacture
US20020132496A1 (en) * 2001-02-12 2002-09-19 Ball Ian J. Ultra low-k dielectric materials
US6903175B2 (en) * 2001-03-26 2005-06-07 Shipley Company, L.L.C. Polymer synthesis and films therefrom
US7141188B2 (en) * 2001-05-30 2006-11-28 Honeywell International Inc. Organic compositions
US7250214B2 (en) 2001-08-09 2007-07-31 Waters Investments Limited Porous inorganic/organic hybrid monolith materials for chromatographic separations and process for their preparation
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
AU2003210504A1 (en) * 2002-01-15 2003-07-30 Honeywell International Inc. Organic compositions for low dielectric constant materials
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
KR100478982B1 (ko) * 2002-05-02 2005-03-25 금호석유화학 주식회사 신규 산발생제 및 이를 함유한 박막 조성물
US7122880B2 (en) 2002-05-30 2006-10-17 Air Products And Chemicals, Inc. Compositions for preparing low dielectric materials
JP2004165613A (ja) * 2002-06-03 2004-06-10 Shipley Co Llc 電子デバイスの製造
EP1398831A3 (en) 2002-09-13 2008-02-20 Shipley Co. L.L.C. Air gaps formation
JP2004274020A (ja) * 2002-09-24 2004-09-30 Rohm & Haas Electronic Materials Llc 電子デバイス製造
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
WO2004041398A2 (en) 2002-10-30 2004-05-21 Waters Investments Limited Porous inorganic/organic hybrid materials and preparation thereof
US7404990B2 (en) 2002-11-14 2008-07-29 Air Products And Chemicals, Inc. Non-thermal process for forming porous low dielectric constant films
EP1420439B1 (en) * 2002-11-14 2012-08-29 Air Products And Chemicals, Inc. Non-thermal process for forming porous low dielectric constant films
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
TWI240959B (en) * 2003-03-04 2005-10-01 Air Prod & Chem Mechanical enhancement of dense and porous organosilicate materials by UV exposure
US7282241B2 (en) 2003-04-22 2007-10-16 International Business Machines Corporation Patterned, high surface area substrate with hydrophilic/hydrophobic contrast, and method of use
US7112617B2 (en) 2003-04-22 2006-09-26 International Business Machines Corporation Patterned substrate with hydrophilic/hydrophobic contrast, and method of use
PL1625716T3 (pl) 2003-05-06 2008-05-30 Apple Inc System i usługa przesyłania wiadomości
ATE377036T1 (de) * 2003-05-23 2007-11-15 Dow Corning Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
DE10330022A1 (de) * 2003-07-03 2005-01-20 Degussa Ag Verfahren zur Herstellung von Iow-k dielektrischen Filmen
US7361447B2 (en) * 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
KR100554157B1 (ko) * 2003-08-21 2006-02-22 학교법인 포항공과대학교 저유전 특성의 유기 실리케이트 고분자 복합체
JP4563076B2 (ja) * 2004-05-26 2010-10-13 東京応化工業株式会社 反射防止膜形成用組成物、該反射防止膜形成用組成物からなる反射防止膜、および該反射防止膜形成用組成物を用いたレジストパターン形成方法
US7148263B2 (en) * 2004-07-14 2006-12-12 Honeywell International Inc. Hybrid inorganic/organic low k dielectric films with improved mechanical strength
US10773186B2 (en) 2004-07-30 2020-09-15 Waters Technologies Corporation Porous inorganic/organic hybrid materials with ordered domains for chromatographic separations and processes for their preparation
DE112005001838B4 (de) * 2004-07-30 2018-11-29 Waters Technologies Corp. (N.D.Ges.D. Staates Delaware) Poröse anorganische/organische Hybridmaterialien mit geordneten Domänen für chromatographische Auftrennungen, Verfahren für deren Herstellung sowie Auftrennvorrichtung und chromatographische Säule
EP1632956A1 (en) * 2004-09-07 2006-03-08 Rohm and Haas Electronic Materials, L.L.C. Compositions comprising an organic polysilica and an arylgroup-capped polyol, and methods for preparing porous organic polysilica films
WO2006065310A2 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Siloxane resin coating
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
KR101119141B1 (ko) * 2005-01-20 2012-03-19 삼성코닝정밀소재 주식회사 폴리머 나노 입자를 포함하는 저유전 박막 형성용 조성물및 이를 이용한 저유전 박막의 제조방법
US7693887B2 (en) * 2005-02-01 2010-04-06 Strands, Inc. Dynamic identification of a new set of media items responsive to an input mediaset
WO2006084102A2 (en) * 2005-02-03 2006-08-10 Musicstrands, Inc. Recommender system for identifying a new set of media items responsive to an input set of media items and knowledge base metrics
US7797321B2 (en) 2005-02-04 2010-09-14 Strands, Inc. System for browsing through a music catalog using correlation metrics of a knowledge base of mediasets
TWI340296B (en) * 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
US20090070267A9 (en) * 2005-09-30 2009-03-12 Musicstrands, Inc. User programmed media delivery service
US7877387B2 (en) 2005-09-30 2011-01-25 Strands, Inc. Systems and methods for promotional media item selection and promotional program unit generation
JP4955690B2 (ja) * 2005-10-04 2012-06-20 アップル インコーポレイテッド 音楽ライブラリをビジュアル化するための方法および装置
EP1963957A4 (en) 2005-12-19 2009-05-06 Strands Inc USER-TO-USER-RX ERROR
US20070162546A1 (en) * 2005-12-22 2007-07-12 Musicstrands, Inc. Sharing tags among individual user media libraries
US20070244880A1 (en) * 2006-02-03 2007-10-18 Francisco Martin Mediaset generation system
WO2007095272A2 (en) * 2006-02-10 2007-08-23 Strands, Inc. Systems and methods for prioritizing mobile media player files
WO2007092053A1 (en) 2006-02-10 2007-08-16 Strands, Inc. Dynamic interactive entertainment
CN101371196B (zh) * 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
US8521611B2 (en) * 2006-03-06 2013-08-27 Apple Inc. Article trading among members of a community
CN100425630C (zh) * 2006-04-19 2008-10-15 苏州市成技新材料开发有限公司 含硅偶联剂共聚物成膜树脂及其有机防反射涂膜
JP2010515804A (ja) * 2007-01-12 2010-05-13 ウオーターズ・テクノロジーズ・コーポレイシヨン クロマトグラフ分離用多孔質炭素−ヘテロ原子−ケイ素ハイブリッド無機／有機材料およびその調製のための方法
US7736837B2 (en) * 2007-02-20 2010-06-15 Az Electronic Materials Usa Corp. Antireflective coating composition based on silicon polymer
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
KR101523393B1 (ko) 2007-02-27 2015-05-27 이엠디 퍼포먼스 머티리얼스 코프. 규소를 주성분으로 하는 반사 방지 코팅 조성물
US8671000B2 (en) 2007-04-24 2014-03-11 Apple Inc. Method and arrangement for providing content to multimedia devices
US20090026924A1 (en) * 2007-07-23 2009-01-29 Leung Roger Y Methods of making low-refractive index and/or low-k organosilicate coatings
US8318258B2 (en) 2008-01-08 2012-11-27 Dow Corning Toray Co., Ltd. Silsesquioxane resins
JP2011510133A (ja) 2008-01-15 2011-03-31 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
WO2009111122A2 (en) 2008-03-04 2009-09-11 Dow Corning Corporation Silsesquioxane resins
JP5581224B2 (ja) 2008-03-05 2014-08-27 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
EP2304597A4 (en) * 2008-05-31 2012-10-31 Apple Inc ADAPTIVE RECOMMENDATION DEVICE TECHNOLOGY
WO2010011637A1 (en) * 2008-07-21 2010-01-28 Strands, Inc Ambient collage display of digital media content
WO2010040082A1 (en) 2008-10-02 2010-04-08 Strands, Inc. Real-time visualization of user consumption of media items
KR20110096155A (ko) * 2008-12-10 2011-08-29 다우 코닝 코포레이션 습식 에칭가능한 반사방지 코팅
CN102245674B (zh) 2008-12-10 2014-12-10 陶氏康宁公司 倍半硅氧烷树脂
US20100169328A1 (en) * 2008-12-31 2010-07-01 Strands, Inc. Systems and methods for making recommendations using model-based collaborative filtering with user communities and items collections
US11439977B2 (en) 2009-06-01 2022-09-13 Waters Technologies Corporation Hybrid material for chromatographic separations comprising a superficially porous core and a surrounding material
WO2010141426A1 (en) 2009-06-01 2010-12-09 Waters Technologies Corporation Hybrid material for chromatographic separations
US20110060738A1 (en) * 2009-09-08 2011-03-10 Apple Inc. Media item clustering based on similarity data
JP2011097024A (ja) * 2009-09-29 2011-05-12 Jsr Corp 光半導体素子の製造方法、及び、光半導体素子保護層形成用組成物
US9138308B2 (en) 2010-02-03 2015-09-22 Apollo Endosurgery, Inc. Mucosal tissue adhesion via textured surface
US9205577B2 (en) * 2010-02-05 2015-12-08 Allergan, Inc. Porogen compositions, methods of making and uses
HUE031363T2 (hu) * 2010-05-11 2017-07-28 Allergan Inc Porogén készítmények, az elõállításukra szolgáló eljárások és felhasználásuk
US20130112605A1 (en) 2010-07-26 2013-05-09 Waters Technologies Corporation Superficially porous materials comprising a substantially nonporous core having narrow particle size distribution; process for the preparation thereof; and use thereof for chromatographic separations
US8983905B2 (en) 2011-10-03 2015-03-17 Apple Inc. Merging playlists from multiple sources
US8871425B2 (en) * 2012-02-09 2014-10-28 Az Electronic Materials (Luxembourg) S.A.R.L. Low dielectric photoimageable compositions and electronic devices made therefrom
US20190015815A1 (en) 2016-03-06 2019-01-17 Waters Technologies Corporation Superficially porous materials comprising a coated core having narrow particle size distribution; process for the preparation thereof; and use thereof for chromatographic separations
US10936653B2 (en) 2017-06-02 2021-03-02 Apple Inc. Automatically predicting relevant contexts for media items
US20200004495A1 (en) 2018-06-27 2020-01-02 Apple Inc. Generating a Customized Social-Driven Playlist
EP3597710B1 (en) 2018-07-18 2021-08-18 Inkron OY Novel polysiloxane compositions and uses thereof
WO2020198474A1 (en) * 2019-03-26 2020-10-01 Rutgers, The State University Of New Jersey Porous epoxy nanocomposite monoliths
EP4010441B1 (en) * 2019-08-09 2023-09-06 Merck Patent GmbH Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same
JP7579649B2 (ja) * 2020-07-31 2024-11-08 日東電工株式会社 プリント基板用樹脂組成物及び樹脂成形体

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370405A (en) 1981-03-30 1983-01-25 Hewlett-Packard Company Multilayer photoresist process utilizing an absorbant dye
US4362809A (en) 1981-03-30 1982-12-07 Hewlett-Packard Company Multilayer photoresist process utilizing an absorbant dye
US4910122A (en) 1982-09-30 1990-03-20 Brewer Science, Inc. Anti-reflective coating
WO1990003598A1 (en) 1988-09-28 1990-04-05 Brewer Science, Inc. Multifunctional photolithographic compositions
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
JP3274487B2 (ja) 1992-01-30 2002-04-15 東レ・ダウコーニング・シリコーン株式会社 発泡性シリコーンゴム組成物およびシリコーンゴム発泡体の製造方法
NZ242686A (en) 1992-05-11 1994-12-22 Carter Holt Harvey Plastic Pro Milking claw divided into four chambers to reduce likelihood of cross contamination of animal's quarters
US6040619A (en) * 1995-06-07 2000-03-21 Advanced Micro Devices Semiconductor device including antireflective etch stop layer
US5710067A (en) * 1995-06-07 1998-01-20 Advanced Micro Devices, Inc. Silicon oxime film
JPH09143420A (ja) 1995-09-21 1997-06-03 Asahi Glass Co Ltd 低誘電率樹脂組成物
US5700844A (en) 1996-04-09 1997-12-23 International Business Machines Corporation Process for making a foamed polymer
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US5767014A (en) 1996-10-28 1998-06-16 International Business Machines Corporation Integrated circuit and process for its manufacture
US5895263A (en) 1996-12-19 1999-04-20 International Business Machines Corporation Process for manufacture of integrated circuit device
US5883219A (en) * 1997-05-29 1999-03-16 International Business Machines Corporation Integrated circuit device and process for its manufacture
ATE280806T1 (de) 1997-07-15 2004-11-15 Asahi Chemical Ind Zusammensetzungen aus alkoxysilan und organischem polymer zur herstellung von dünnen isolierenden schichten und deren verwendung
JPH11217458A (ja) * 1998-02-04 1999-08-10 Hitachi Chem Co Ltd 多孔質膜、その製造法及び物品
JPH11322992A (ja) * 1998-05-18 1999-11-26 Jsr Corp 多孔質膜
CN1171290C (zh) * 1998-06-05 2004-10-13 佐治亚技术研究公司 多孔性绝缘材料及其制备方法
US6093636A (en) * 1998-07-08 2000-07-25 International Business Machines Corporation Process for manufacture of integrated circuit device using a matrix comprising porous high temperature thermosets
US6143643A (en) 1998-07-08 2000-11-07 International Business Machines Corporation Process for manufacture of integrated circuit device using organosilicate insulative matrices
JP2000188332A (ja) * 1998-12-22 2000-07-04 Seiko Epson Corp 半導体装置及びその製造方法
US6146749A (en) 1999-05-03 2000-11-14 Jsr Corporation Low dielectric composition, insulating material, sealing material, and circuit board
US6214746B1 (en) 1999-05-07 2001-04-10 Honeywell International Inc. Nanoporous material fabricated using a dissolvable reagent
EP1190277B1 (en) 1999-06-10 2009-10-07 AlliedSignal Inc. Semiconductor having spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6420441B1 (en) * 1999-10-01 2002-07-16 Shipley Company, L.L.C. Porous materials
US6271273B1 (en) 2000-07-14 2001-08-07 Shipley Company, L.L.C. Porous materials
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
AU2001292783A1 (en) 2000-09-19 2002-04-02 Shipley Company, L.L.C. Antireflective composition

Also Published As

Publication number Publication date
JP4758949B2 (ja) 2011-08-31
US20030022953A1 (en) 2003-01-30
JP2007238957A (ja) 2007-09-20
JP2002284997A (ja) 2002-10-03
US6599951B2 (en) 2003-07-29
KR100816664B1 (ko) 2008-03-27
US20020065331A1 (en) 2002-05-30
EP1197998A2 (en) 2002-04-17
US20020198269A1 (en) 2002-12-26
US6596405B2 (en) 2003-07-22
US6576681B2 (en) 2003-06-10
EP1197998A3 (en) 2005-12-21
KR20020028848A (ko) 2002-04-17

Similar Documents

Publication Publication Date Title
TW588072B (en) Antireflective porogens
TWI295304B (en) Porous materials
CN1775861A (zh) 含有有机聚硅石材料的组合物及其生产方法
EP1088848B1 (en) Porous materials
US5100503A (en) Silica-based anti-reflective planarizing layer
CN101257002B (zh) 绝缘膜
TW200414413A (en) Air gap formation
JP2003141956A (ja) 多孔性物質
TW200401816A (en) Electronic device manufacture
CN1902546A (zh) 填孔和光刻用的抗反射涂层及其制备方法
JPWO1999052136A1 (ja) 配線構造体の製造方法
EP0315954A2 (en) Pattern-forming material and pattern formation method
JP2006504855A (ja) ガス層形成材料
JP5350276B2 (ja) 集積回路用高シリコン含量シロキサンポリマー
US6737118B2 (en) Low dielectric constant materials and their production and use
JP3883453B2 (ja) 光重合性ポリシラン化合物およびその製造方法
JP2004182490A (ja) 多孔性シリカ膜、それを有する積層基板、それらの製造方法およびエレクトロルミネッセンス素子
JPH0314333B2 (https=)
KR20050044501A (ko) 포토리소그래피용 무반사 코팅 및 이의 제조 방법
JP2004303777A (ja) 多孔質絶縁膜形成材料及びそれを用いた多孔質絶縁膜
JP5153680B2 (ja) ディールス・アルダー反応付加部を有する化合物
TW200426199A (en) Anti-reflective coatings for photolithography and methods of preparation thereof
JPH0458249A (ja) 感光性樹脂
TW200306282A (en) New porogens for porous silica dielectric for integral circuit applications

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees