TW569361B - Gold wire for semiconductor element connection and semiconductor element connection method - Google Patents
Gold wire for semiconductor element connection and semiconductor element connection method Download PDFInfo
- Publication number
- TW569361B TW569361B TW090113064A TW90113064A TW569361B TW 569361 B TW569361 B TW 569361B TW 090113064 A TW090113064 A TW 090113064A TW 90113064 A TW90113064 A TW 90113064A TW 569361 B TW569361 B TW 569361B
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- Prior art keywords
- gold
- gold wire
- semiconductor element
- weight
- ball
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 91
- 239000004065 semiconductor Substances 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 34
- 229910052737 gold Inorganic materials 0.000 claims abstract description 36
- 239000010931 gold Substances 0.000 claims abstract description 36
- 239000012535 impurity Substances 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 7
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 6
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 4
- 239000011575 calcium Substances 0.000 claims description 34
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 31
- 229910052791 calcium Inorganic materials 0.000 claims description 31
- 239000010409 thin film Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 239000011133 lead Substances 0.000 claims description 9
- 238000003825 pressing Methods 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 5
- 239000011777 magnesium Substances 0.000 claims description 5
- 238000007731 hot pressing Methods 0.000 claims 2
- 238000002844 melting Methods 0.000 claims 2
- 230000008018 melting Effects 0.000 claims 2
- LLHNYODRQOULLH-UHFFFAOYSA-N [Y].[Re] Chemical compound [Y].[Re] LLHNYODRQOULLH-UHFFFAOYSA-N 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 238000005303 weighing Methods 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 abstract description 33
- 238000012360 testing method Methods 0.000 description 71
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 34
- 235000012431 wafers Nutrition 0.000 description 26
- 238000002474 experimental method Methods 0.000 description 25
- 239000000523 sample Substances 0.000 description 17
- 229910001020 Au alloy Inorganic materials 0.000 description 13
- 239000003353 gold alloy Substances 0.000 description 13
- 229910052706 scandium Inorganic materials 0.000 description 12
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 230000002079 cooperative effect Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 238000005336 cracking Methods 0.000 description 8
- 229910052778 Plutonium Inorganic materials 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 6
- 229910052702 rhenium Inorganic materials 0.000 description 6
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 6
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 4
- 229910052776 Thorium Inorganic materials 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 3
- 208000035475 disorder Diseases 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 235000012149 noodles Nutrition 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- DLSQOFCUUWBUSK-UHFFFAOYSA-N [Pb].[Ti].[Mg] Chemical compound [Pb].[Ti].[Mg] DLSQOFCUUWBUSK-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000009864 tensile test Methods 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 241000257303 Hymenoptera Species 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- TUPCTAJFIWLOQC-UHFFFAOYSA-N [Y].[Ca].[Y] Chemical compound [Y].[Ca].[Y] TUPCTAJFIWLOQC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 210000000744 eyelid Anatomy 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- -1 samarium lanthanum samarium Chemical compound 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/002—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
- B23K20/004—Wire welding
- B23K20/005—Capillary welding
- B23K20/007—Ball bonding
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/02—Alloys based on gold
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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- Y10T428/12528—Semiconductor component
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
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- Mechanical Engineering (AREA)
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- Materials Engineering (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Wire Bonding (AREA)
Description
569361 A7
4 569361
將4二球狀物加壓而得之該加壓接合球狀物的外部直徑 大約是該導線直徑的兩倍,所f要之效能的重要性質之一 是改善該加壓接合球的球形或圓。 在過去曾經嘗試在球狀物形成期間,於加壓接合之 前控制該球狀物的球形。不過,近幾年來已經發現,該些 適口用於乍距連接的加壓接合球的圓度,不需要與該些非 加壓接合^的圓度相符。初步的嘗試是改善已經被提出之 該加壓接合球的8]度。舉例來說,日本未審查專利公報hei 第11-163013號揭示添加總量為〇()3_5wt%之銅、麵和把中 至少一種。曰本未審查專利公報HEI第1〇_172998號揭示添 加鈹和鈣,同時日本未審查專利公報HEI第1〇_3〇3239號和 第10-83716號揭示除了猛及纪之外,添加辦或類似物。 經濟部智慧財產局員工消費合作社印製 不過,對於窄距導線而言,用於加壓接合的該些球 比傳統的球用小,而且堆於比較小的加壓接合尺寸而言, 在加壓接合之後它們的圓度應該被維持。在如上所述之技 術中,日本未審查專利公報]^幻第10_172998號有一個缺點 ,其中小球沒有足夠的加壓接合圓度,或者無法達到預定 的導線強度。在導線接合中具有窄距連接,對改善導線強 度以避免因為導線斷裂,而產生連接短路是特別重要的。 其它的技術也有缺點,諸如因為大量的增加元素添 加的量來改善其圓度,結果小球沒有足夠的加壓接合圓度 或高電阻。 除此之外,在半導體元件中需要薄膜鋁電極、且這 些電極要更薄,因為這些凸塊的存在,電極的斷裂特別容 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 569361 A7
經濟部智慧財產局員工消費合作社印製 易出現於凸塊連接的情況中,因而產生半導體元件或積體 電路中,晶片裂解(以下稱為"晶#裂解")的問題。如前述 之添加元素的含量的急遽增加也會發生晶片裂解問題。 此外,當藉由凸塊建立連接時,一種當該球被壓在 該半導體元件之㈣極商之後,該金料線被向上拉的方 法可以被採用,以在接近該球基部處造成破裂。在此處, 需要使黏^在該加壓接合球之剩餘的導線有一致的長度( 以下稱為’,尾部長度”)。 藉由先前技藝中這些情況的見解,本發明的目的提 供一種用於半導體元件連接之金質導線,其中有一具有添 加元素不超過200PPm之特殊的金質合金組成物,以將電 阻的增加降至最小,而且其可改善該些小球在加壓接合之 厚的圓度,其具有高導線強度,並且即便是在半導體元件 上有很小的鋁電極薄膜厚度的情況下,不會因加壓貼合產 生曰曰片裂解的問題,同時對於凸塊連接也可以具有均勻的 尾部長度。 發明的說明 本發明提供下列各項,以完成前述的目的。 (1) 用於半導體元件連接之金質導線是由重量百萬分 之5-100的鈣(Ca)、重量百萬分之5_100的釓(Gd)和重量百 萬分之Μ 〇〇的釔(γ),這些元素的總重量不超過百萬分之 200 ’其餘是金及無可避免的雜質所組成的。 (2) 根據上面第(1)項,該用於半導體元件連接之金質 導線進一步包含重量為百萬分之1-100且由鎂、鈦和鉛中 (請先閱讀背面之注意事項再填寫本頁) Φ 訂 線·
本紙張尺錢时® ®ii?BTs)A4規格(210 X 297公釐) 6 569361 五、發明說明(4 ) =:同時該些添加的元素的總重量不超過重量 ⑽^^半導體元件連接之金質導線是由百萬分之5-:的詞、重量百萬分之5_100的此和重量百萬分之m〇〇 :和至少—種重量為百萬分之M〇〇,由非乱和紀之 兀素中選出’且這些元素的總重量不超過百萬分之· ,八餘是,及無可避免的雜質所組成的。 (4) 根i上面第(3)項’該用於半導體元件連接之金質 導線進-步包含重量為百萬分之M〇〇且由鎂、欽和敍中 至少選出-種,同時該些添加的元素的總重量不超過重量 百萬分之200。 (5) 半導體元件連接方法,其包含 (A) 將金質導線插入毛細管,並且加熱即將該金質導 線的尖端熔融,形成一金質球的步驟, (B) 降低該毛細管並將該金質球壓在該半導體元件的 電極上,以使該金質導線接合在該電極上的步驟, 經濟部智慧財產局員工消費合作社印製 (C) 以含有接合在該電極上之該金質導線的毛細管沿 著預定的路徑移動,使其移動到將被連接之組件上,同時 在該金質導線的一側與將被連接之組件之間形成加壓接合 的步驟, (D) 將已經被加壓接合在該連接組件的金質導線上升 ,同時使用夾子夾住它,以切斷該金質導線,而完成該半 導體元件電極與該連接組件之間的接線的步驟,其中該金 質導線是依據上述第(1)至第(4)項中任一項的金質導線。 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 x 297公釐) 五、發明說明(5 ) ⑹上述第(5)項的方法,其中步驟(A)及[或]步驟(c) 進-步包括將超音波傳輪通過該毛細管而至該金質導線的 大端同時以用於熱壓接合該金質球的加熱器組加熱該半 導體元件或連接組件。 (7) 上述第(5)或第(6)項的方法,其中在半導體件上兩 相鄰電極之間的節距不大於7〇微米。 (8) 上,第(5)或第⑹項的方法,其中在半導體件上兩 相鄰電極之間的節距不大於6〇微米。 (9) 半導體元件連接方法,其包含 (A) 將金質導線插入毛細管’並且加熱即將該金質導 線的尖端熔融,形成一金質球的步驟, (B) 降低該毛細管並將該金質球壓在該半導體元件的 電極上,以形成加壓接合金質球的步驟, (C) 將已經在該半導體元件電極上形成加壓接合金質 球的金質導線上升,同時使用夾子夾住它,並在接近該加 壓接合金質球的基部處割斷該金質導線,以在該電極上形 成一個凸塊,其中該金質導線是依據上述第(1)至第(句項 中任一項的金質導線。 (10) 上述第(9)項的方法,其中進_步包含將形成在該 半導體7L件電極上之該塗快加壓接合在將被連接的組件上 (11) 上述第(9)或第(10)項的方法,其中步驟進一 步包括將超音波傳輸通過該毛細管而至該金質導線的尖端 ,同時以用於熱壓接合該金質球的加熱器組加熱該半導體 本紙張尺度適用中國國家標準(CNS)A4規格(21石 297公釐) 569361 A7 B7 五、發明說明(6 ) 元件或連接組件。 (12) 上述第(9)至第(11)項中任一項的方法,其中該半 導體元件電極是铭薄膜電極,薄膜的厚度不超過〇·5微米 〇 (13) 上述第(9)至第(11)項中任一項的方法其中該半 導體元件電極是鋁薄膜電極,薄膜的厚度不超過〇1微米 〇 圖式概要說明 第1A-1D圖是說明球狀接合之導線接合方法的流程圖 〇 第2 A-2D圖是說明凸塊連接方法的流程圖。 第3Α和3Β圖說明半導體元件和由凸塊連接形成之引 線或導線板之間的連接。 第4圖是凸塊的放大圖式。 發明的詳細說明 (1)組成份 [1] 金質起始物 所使用的金質起始物較好是被純化至至少99.99wt% 的高純度金。更好是至少99.995 wt%,在好是至少99.999 wt%。較高純度的金質是較好的,因為其可以使有害組成 份的效應可以消除更多。 [2] [Ca] 相對於被用於本發明中之金質合金導線中的釓和釔 之預定的量,重量為百萬分之5-100的鈣含量可以達到上 本紙張尺錢中國國家標準(cGs)A4規格⑵〇 x 297公爱) 請. 先 閱 讀 背* 之 注 意 事 項 再 填 本 頁 訂 經濟部智慧財產局員工消費合作社印製 569361
五、發明說明( 述的目的。 >…與鈣含量小於百萬分之5情況相比’如果鈣含量是在 這範圍中,該加壓接合之小球的圓度與斷裂強度可以被改 善,同時在凸塊形成期間尾部長度的均勻性也可以被改善 。與約含量大於百萬分之⑽情況相比,該小球加壓接合 圓度也可以被改善,同時薄膜電極的晶片裂縫也可以被減 少。因此’在相關的釓和釔之預定的量下,該鈣含量是重 量為百萬分之5-100。 [3] [Gd] 相對於被用於本發明中之金質合金導線中的鈣和釔 之預定的量,重量為百萬分之5_1〇〇的釓含量可以達到上 述的目的。 與亂含量小於百萬分之5重量情況相比,如果釓含量 是在這範圍中,該加壓接合之小球的圓度與斷裂強度可以 被改善’同時在凸塊形成期間尾部長度的均勻性也可以被 改善。與釓含量大於百萬分之100重量情況相比,該小球 加壓接合圓度也可以被改善,同時薄膜電極的晶片裂縫也 可以被減少。因此,在相關的鈣和釔之預定的量下,該釓 含量是重量為百萬分之5-100。 [4] [Y] 相對於被用於本發明中之金質合金導線中的鈣和釓 之預定的量,重量為百萬分之1-100的釔含量可以達到上 述的目的。 與紀含量小於百萬分之1重量情況相比,如果紀含量 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 請- 先 閱 讀 背- 面 之 注 意 事 項 再 填 寫 本 頁 Φ I I I I I 訂 經濟部智慧財產局員工消費合作社印製 10 569361 A7
範圍中,該加壓接合之小球的圓度與斷裂強度可以 =善’同時在凸塊形成期間尾部長度的均句性也可以被 改善。與釔含量大於百萬分 刀之100重S情況相比,該小球 加壓接合圓度也可以被改善,同時薄膜電極的晶片裂縫也 可以被減少。因此’在相關的舞和亂之預定的量下,該紀 含Ϊ是重量為百萬分之M〇〇。 [5] [1釓和釔之稀土元素] (以下稱為丨1第一族,,元素) 於被用於本發明中之金質合金導線中的舞、亂和纪 之預定的量中’與沒有添加相比,添加至少一種重量為百 萬分之1.1GG的第-族元素是較好的,以進_步改善凸塊 形成期間該小球加壓接合圓度與尾部長度的均句性。在第 一族元素中較好是使用銪、鑭、鈽和錙。 因此,在該預定鈣、釓和釔之預定的量中,添加至 少一種重|為百萬分之M00的第一族元素是較好的。 [6] [鎂、鈦和鉛](以下稱為,,第二族,,元素) 在用於本發明之金質合金導線中,與沒有添加相比 ,於被用於本發明中之金質合金導線中的鈣、釓和釔之預 定的量,或在該添加之第一族元素的預定量中,添加至少 一種重量為百萬分之1-100的第二族元素是較好的。在第 一方矢元素中較好是使用鎮、鈦和錯。 [7] 總添加量 如果在用於本發明之金質合金導線中的總添加重量 超過百萬分之200,薄膜電極可能會發生晶片裂解。而電 (請、先閱讀背面之注咅?事項再填寫本頁) --------tT---------線. 經濟部智慧財產局員工消費合作社印製
本紙張尺度適用中國國豕標準(CNS)A4規格(21G X 297公髮 11 5的361
經濟部智慧財產局員工消費合作社印製 阻增加也不是所希望得到的。添加元素的總添加重量必須 低於百萬分之200。 (2) 金質導線的製造步驟 依據本發明製造用於半導體元件金質導線的步驟的 實施例,現在將被詳細說明。首先在該預定金屬整成物溶 融並將其洗鑄成狀後,凹槽型滾動機器被用來捲起中間 物進行退专’最後以冷做方式產生直徑大約1(M〇〇微米的 細導線,之後進行退火以拉伸4_6%,而且該導線表面塗 佈一層潤滑防鏽劑。最後,完成這些加工步驟之後,最後 在一預定的張力下,該導線通常被捲繞在外部直徑5〇3公 i的捲軸上,以成預疋的長度而形成該產物。該預定的長 度可能在100-300公尺,更長的長度通常也是合適的。 (3) 用途 本發的金質導線被用於半導體元件電極與外部導線( 或配線板)之間的連接,而且該連接方法一般是藉由球狀 接合進行配線與接合的方法,或者利用金質導線形成凸塊 ,然後透過凸塊建立連接的方法。這些方法說明於第i至 第4圖中。 [1]藉由球狀接合連接的方法 如第1A圖所示,金質導線2通過毛細管1,電喷燈放 於面對它的尖端,並且在它與該金質導線2之間放電,以 加熱金質導線2的尖端、熔融它以形成一個球4。 接著’如第1B圖所示,毛細管1被降低以將該球4加 壓接合在半導體元件6的銘電極5上。此時,超音波震動( 本紙張尺錢财準(CNS)A4規格㈤ 297公釐) --------訂---------線 (氣先閱讀面之注意事項再填寫本頁) 12
569361 五、發明說明(10 ) 未顯示)通過毛細管1並且在那裡應用它,同時以加熱組加 熱該半導體元件6,使得該球4被熱壓接合,變成一個加壓 接合球4’。 接著,如第1C圖所示,沿著預定的路徑移動毛細管j 且降低至外部導線上。超音波震動(未顯示)通過毛細管1 並且在那裡應用它,同時以加熱組加熱該外部導線8,使 得該加熱導線2的一側被熱壓接合在該外部導線8。 U) 最後,如第1D圖所示,定位器7被升起同時灸住該金 質導線2,如此切斷金質導線2同時完成配線。然後該配線 部份以樹脂密封而完成該半導體裝置。該半導體元件可已 疋樹脂後封型式或陶磁封裝型式,同時沒有特別的限制。 因此,各種不同的導線或電極可以在電極上或在該半導體 裝置的配線側。 此處’該些加壓接合球4’的中心之間的距離(以下稱 為’’節距空間”),與大約80微米之傳統的節距相比,其必 須是不大於70微米,特別是不大於60微米的窄節距。 本發明的金質導線有高強度以及改善的加壓接合球 的圓度,因此在半導體元件中,半導體元件電極及導線部 份具有以金質導線形成的配線部份,而且該配線部份被樹 脂密封,該半導體裝置的節距空間較好是不大於7〇微米。 [2]透過凸塊連接的方法 加壓接合球4,是藉由與第1A和第1B圖所示之相同方 法(參見第2A圖和第2B圖),將球加壓並接合在半導體元 件6上的鋁電極5而形成的。 本紙張尺度適用中國國家標準(CNS)A4規格(21G x 297公髮) --—--- -13 - 請- 先 閱 讀 背. Sj 之 注 意 事 項 再 填 本 頁 Φ 訂 經濟部智慧財產局員工消費合作社印製 569361 A7
/^s 請· 先 閱 讀 背· S 之 注 意 事 項 再
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經濟部智慧財產局員工消費合作社印製 569361 A7 _________ B7 五、發明說明(12 ) 壓接合至厚度〇·5微米或更小之薄電極膜,〇.3微米或更小 ’甚至疋0 · 1微米或更小。當球被加壓接合該超薄電極膜 時,容易發生電極斷裂,而導致晶片斷裂。 當使用金質導線形成凸塊時,依據本發明,即便是 加壓接合在超薄電極膜時,尾部長度的變化是最小的,而 且晶片裂解可以被避免,因此其叫適合用於半導體裝置中 ,其中該半導體元件電極與導線透過金質凸塊連接在一起 ’而且該連接被樹脂蜜蜂,同時其中半導體元件紹電極膜 厚度是0.5微米或更小。 實施例 (測試A) 在將預定的量之表1所列元素添加至純度為99.999 % 之高純度金中,而且該混合物在真空熔爐熔融之後,將其 澆鑄而獲得如表1所示之A1至All組成物的金合金旋;以 具有凹槽軋輥以及導線拉伸機械對這些進行冷作,然後以 最後冷作物進行退火以獲得直徑256微米的中間物,將最 後退火至拉伸率為4%之物件的表面塗上潤滑劑,而且每 一條金質合金導線被進行最後加工與測量。 首先進行圓度試驗。型號UTC-200高速自動接合機 (Shinkawa有限公司的產品)首先被用來在金質合金導線的 尖端,使用電喷燈產生電弧放電,而形成一個圓球。用於 電弧放電的電流與時間條件被調整成可以形成兩種型式的 球,一種是直徑55微米(該導線直徑的2.2倍的傳統球)和 一種直徑45微米(該導線直徑1.8倍的小球)。接著,利用 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公髮) (請先閱讀背面之注意事項再填寫本頁) 訂---------線. 15 569361 Α7 Β7 五、發明說明(ί3 ) 加壓接合工具在200t的模溫下,以組合的超音波熱壓接 合使每一個球熱壓接合在半導體元件鋁電極。 測量傳統球和小球在加壓接合之前與之後的圓度。 在加壓接合之前,這些球的直徑在任一垂直的方向上被測 量’較小直徑/較大直徑筆直被視為是圓度。在加壓接合 之後分別測量垂直於超音波的方向之該加壓接合直徑(以 下稱為X)與平行於超音波的方向之該加壓接合直徑(以下 稱為Y)將X/Y比值是作小球的加壓接合圓度來測定圓度。 50個球的圓度的平均值,如表ί所示。 然後進行晶片損害試驗。使用SBB-1凸塊接合機 (Shinkawa有限公司的產品)在金質合金導線的尖端,以相 同的方法,使用電喷燈產生電弧放電,形成一個球。該球 的大小相當於傳統的球(直徑55微米)。然後,利用加壓接 合工具在200°C的模溫下,以組合的超音波熱壓接合使每 一個球熱壓接合在半導體元件紹電極。所用的半導體元件 電極有一般的厚度(1微米)或微厚度(〇」微米)。對於熱壓 接己條件而a ’超音波輸出是在0.5-15瓦範圍中的第4級 ,同時對於全部12種製造類型而言,負載是在〇·4_〇·8牛頓 範圍中的第3級;而且400個凸塊是在每一種條件下進行試 驗;在任一種條件下,沒有晶片裂解的樣品可以被判定是 符合需求的,同時在任一種條件下,具有晶片裂解的樣品 可以被判定是不符合需求的。測量結果列於表丨中,符合 需求的樣品標記為,,0,,,不符合需求的的樣品標記為,,χ” 請· 先 閱 讀 背· 面 之 注
I 經濟部智慧財產局員工消費合作社印製
16 A7
569361 五、發明說明(U ) 然後進行尾部長度均勻性試驗,除了使用一般厚度(1 Μ米)鋁電極外,以與第二種試驗相同的方法進行熱壓接 合。然後,金質合金導線2被向上拉至如第2(:圖所示的區 域,以形成一個凸塊4,。%第3(:圖,其顯示凸塊的放大 圖式,所示之高度a、b*c被測量。對於每一組條件,利 用冶金顯微鏡測量50個凸塊,其中最大直與最小直之間的 差異被視為是尾部長度的均勻性,結果如表1所列。 然後再室溫亞以抗張試驗測量斷裂負載。結果如表J 所歹|J。 (實驗的實施例) 實驗實施例1-45珠直徑25微米的金質合金導線被完成 ,並且除組成份如表2與表3所示以外,以和測試實施例A 相同的方式測量。 對於該些小情的加壓接合圓度試驗而言,除了形成 小圓球(直徑45微米)之外,每一加壓接合球的圓度以與試 驗A相同的方式測量(圓度試驗),其結果如表2和表3所示 在相同的樣品材料上進行抗張試驗,以決定斷裂負 載’結果如表2和表3所示。 對於晶片損壞試驗,除了使用微小薄膜厚度(〇1微米) 作為半導體元件鋁電極薄膜厚度外,以與試驗A相同的方 式(晶片損壞試驗)測量晶片損壞;其結果如表2和表3所示 對於尾部長度均勻性試驗,除了使用微小薄膜厚度 本紙張尺度適財_ >鮮(CNS)A4規格— (請先閱讀背面之注意事項再填寫本頁) 訂---------線· 經濟部智慧財產局員工消費合作社印製 297公釐) 17 569361 A7
經濟部智慧財產局員工消費合作社印製 (〇·1微米)作為半導體元㈣電極薄膜厚度外,以與試驗A 相同的方式(尾部長度均句性試驗)測量尾冑長度均勾性, 結果如表2和表3所示。 (试驗結果)
試驗A 使用表1所列的組成份進行試驗A,用以探討完成本 發明的目的所需要的元素(樣品A1至All)。 (1) 圓度試驗 下列各項結論可以由該些加壓接合小球的測量而被 提出。 [1] 該些加壓接合小球的圓度小於〇·94是不充足的, 樣品A7不含鈣、釓和釔中之鈣,樣品A3、A4和Al 1不含 釓,樣品八5、八6和人10不含釔,同時樣品八8和八9含有〇5 %的銀或鈷。 [2] 樣品A3至A11傳統大小的球在加壓接合之前或或 加壓接合之後,有符合需求的球圓度0.97或更高,但是小 球在加壓接合之後沒有足夠的圓度。 [3] 含有重量為百萬分之20的鈣、釓和釔的樣品A1在 小球加壓接合之後有符合需求的球圓度0.97。 [4] 除了樣品A1的組成份之外,含有重量為百萬分之 20之第一族元素的的銪的樣品A2,在小球加壓接合之後 有更符合需求的球圓度1.00。 (2) 晶片損壞試驗 下列各項結論可以由該些0· 1微米厚度小電極的晶片 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) --------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 18 569361 A7 五、發明說明(16 經濟部智慧財產局員工消費合作社印製 裂解的測試而被提出。 Π]含有0.5%銀或鈷的樣品A8和樣品9呈現出晶片裂 解。 這證實添加元素的量的上限。 (3) 尾部長度變化 下列各項結論可以由尾部長度變化的測試而被提出 〇 Π]樣品A7不含鈣、釓和釔中之鈣,樣品A3、A4*au 不含釓,樣品A5、A6和A10不含釔,具有56微米或更大 ’沒有符合需求之的尾部長度變化。 [2] 含有重量為百萬分之20的鈣、釓和釔的樣品ai, 具有40微米符合需求之尾部長度變化。 [3] 除了樣品A1的組成份之外,含有重量為百萬分之⑼ 之第一族元素的的銪的樣品A2,具有19微米,更符合需 求之尾部長度變化。 (4) 斷裂負載 [1]至少含有重量為百萬分之20之鈣、釓和釔的樣品幻 、樣品A2、樣品A8和樣品A9具有符合斷裂負載需求之 139-140毫牛頓。 m不含有辦但含有重量為百萬分之20之此和紀的樣 品7,且含有鈹和釓的樣品A10有124_12 負載。 牛頓之低斷裂 (5) 結論 對於小球加壓接合之厚的圓度、 日日乃?貝壞和尾部 長 讀- 先 間 讀 背· 面 之 江 意 事 項 存 填 寫 本 頁 Φ I I I I I 訂 線 串 本紙張尺鮮(CNS)A4規格(Ho x挪公髮 569361 A7
經濟部智慧財產局員工消費合作社印製 度變化之參數而言,去昤A 田”、丐、氩1和紀之外含有銷時可以 獲得優異的結果,當這此元 ^ f J 、一 TL素含I較多時,對 接合之後的圓度及晶片損壞的影響較小。 實驗實施例1# 為了要達成本發明的目標,實驗實施例1.45是使用表 2和表3所列的組成份來進行,試驗a後進行該些實驗。 (1)試驗1(試驗A和實驗性實施例卜7) 下列各項結論可以依據表2所列’其中鈣的添加量會 改變,而由試驗I的進行被提出。 [1] 在亂和紀存在情;兄中,㉟添加的重量範圍在百 分之5-100範圍時,對於本發明的目的有優異的效果。, 確地,小球加壓接合之後圓度是0.96-0.97,斷裂負載是 133-145毫牛頓,沒有發現晶片損害而且尾部長度變化是 31-48微米。 [2] 鈣添加的重量小於百萬分之5時,小球加壓接合之 後圓度疋0.93,斷裂負載是127毫牛頓而且尾部長度變化 是78微米,所有結果均不符合要求。 [3] 鈣添加的重量超過百萬分之1〇〇時,結果也不符合 要求’因為小球加壓接合之後圓度是〇 91,且會產生晶 損壞。 [4] 除了鈣、釓和釔之外,當添加銪且鈣添加的重 範圍在百萬分之5-100範圍時,會使本發明有更好的效果 。也就是,小球加壓接合之後圓度是〇.99-1.〇〇 ,尾部長度 變化是13-27微米,其有更優異的結果。 萬 明 片 量 --------------------訂---------線 (tt.先閱讀背面之注意事項再填寫本頁) 本紙張尺&用中關家標準(CNS)A4規格(21G x 297公髮 20 569361
經濟部智慧財產局員工消費合作社印製 (2) 試驗II(試驗A和實驗性實施例8_ i 3) 下列各項結論可以依據表2所列,其中此的添加量會 改變,而由試驗II的進行被提出。 π]在鈣和釔存在情況中,釓添加的重量範圍在百萬 分之5-100範圍時’對於本發明的目的有優異的效果。明 確地’小球加壓接合之後圓度是〇95_〇97,斷裂負載是 138-刚毫牛頓,沒有發現晶片損害而且尾部長度變化是 33-45微米。 [2] 釓添加的重量小於百萬分之5時,小球加壓接合 之後圓度是G.92,尾部長度變化以微米,兩者都不 符合要求。 [3] 釓添加的重量超過百萬分之1〇〇時,結果也不符合 要求,因為小球加壓接合之後圓度是〇·9〇,且會產生晶片 損壞。 θθ [4] 除了鈣、釓和釔之外,當添加銪且釓添加的重量 範圍在百萬分之5-100範圍時,會使本發明有更好的效果 。也就是,小球加壓接合之後圓度是〇·99_1〇(),尾部長度 變化是15-29微米,其有更優異的結果。 (3) 試驗111(試驗a和實驗性實施例14-19) 下列各項結論可以依據表2所列,其中釔的添加量會 改變,而由試驗III的進行被提出。 [1 ]在#5和亂存在情況中,紀添加的重量範圍在百萬 分之1 -100範圍時,對於本發明的目的有優異的效果。明 確地’小球加壓接合之後圓度是〇·95_〇 97,斷裂負載是 本紙張尺度適用中國國豕標準(CNS)A4規格(210 X 297公釐) --------^---------$ (請先閱讀背面之注意事項再填寫本頁) 21 569361 A7 B7 員 製 五、發明說明(19 137 142亳牛頓,沒有發現晶片損害而且尾部長度變化是 35-50微米。 。[2]釔"〖、加的重量小於百萬分之$時,小球加壓接合之 後圓度是0.93,而且尾部長度變化是82微米,兩者都不符 合要求。 [3] 釔添加的重量超過百萬分之1〇〇時,結果也不符合 要求,因為小球加壓接合之後圓度是〇.91 ,且會產生晶片 損壞。 [4] 除了鈣、釓和釔之外,當添加銪且釔添加的重量 範圍在百萬刀之1 _ 1 〇〇範圍時,會使本發明有更好的效果 。也就是,小球加壓接合之後圓度是〇98_1〇(),尾部長度 變化是15-29微米,其有更優異的結果。 (4)試驗IV(試驗A和實驗性實施例2〇-3 1) 下列各項結論可以依據表3所列,其中第一族元素(非 釓或釔的稀土元素)的添加量會改變,而由試驗lv的進行 被提出。 [1] 在鈣、釓和釔存在情況中,當第一族元素添加的 重量範圍在百萬分之1-100範圍時,本發明的目的藉由實 驗性實施例20-31和實施例A2會呈現最優異的效果。明確 地,小球加壓接合之後,它會呈現特別優異的圓度為 0.98-1.00,斷裂負載是136_141毫牛頓,沒有發現晶片損 害而且尾部長度變化是15至29微米。 [2] 實驗性實施例3 1,其中第一族元素添加的重量超 過百萬分之100時,結果也不符合要求,因為小球加塵接 本紙張尺度適用中關家標準(CNS)A4規格(2lG χ 297公爱 訂 線 22 5的361 A7 --—__B7 _ 五、發明說明(2〇 ) 合之後圓度是0.91,且會產生晶片損壞。 (5)試驗V(試驗A和實驗性實施例32_45) (請先閱讀背面之注意事項再填寫本頁) 下列各項結論可以依據表3所列,其中第二族元素(鎮 、鈦或鉛)的添加量會改變,而由試驗v的進行被提出。 [1] 在鈣、釓、釔和第一族元素存在情況中,當至少 一種第二族元素添加的重量範圍在百萬分— 範圍, 如試驗iv時,本發明的目的藉由實驗性實施例32_42呈現 最優異的效果。明確地,小球加壓接合之後,它會呈現特 別優異的圓度為0.98-1.00,斷裂負載是137_141毫牛頓, 沒有發現晶片損害而且尾部長度變化是9至18微米。 [2] 貫驗性貫施例43 ’其中總添加的重量超過百萬分 之200,結果是不符合要求的,因為小球加壓接合之後圓 度是0.96,且會產生晶片損壞。 經濟部智慧財產局員工消費合作社印製 [3] 實驗性實施例44和45,其中含有預定量的第二族 元素,但不含有鈣、釓和釔及中的釓或釔和第一族元素, 在小球加壓接合之後圓度是0.91 -0.92,且尾部長度變化是 37-43微米。那些添加預定量之第二族元素的情況中,實 驗性實施例32-42含有約、亂、紀和第一族元素,會產生 更良好的結果。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 23 - 569361 A7 B7 五、發明說明(2!) 表1 組成物 試驗結果 斷 裂 負 載 (mN) 伸 率 (%) 圓度試驗 晶片損壞 試驗 尾部長 度變化 (//m) 重量 % 重量(百萬分之一,ppm) 傳統球 (直徑55微米) 小球(直徑 45微米) 傳統 薄膜 厚度 (1微 米) 小薄 膜厚 度 (0.1 微米) 銀 鈷 鈣 鈹 釓 釔 銪 金 接觸 接合 前 接觸 接合 後 接觸 接合 前 接觸 接合 後 試 驗 A1 20 20 20 剩餘 部份 140 4 1.00 0.98 0.98 0.97 〇 〇 40 A2 20 20 20 20 剩餘 部份 139 4 1.00 0.99 1.00 1.00 〇 〇 19 A3 20 20 剩餘 部份 134 4 1.00 0.99 0.98 0.92 〇 〇 75 A4 20 20 20 剩餘 部份 132 4 0.99 0.98 0.97 0.91 〇 〇 57 A5 20 20 剩餘 部份 133 4 1.00 0.97 0.98 0.93 〇 〇 82 A6 20 20 20 剩餘 部份 134 4 0.99 0.96 0.98 0.94 〇 〇 56 A7 20 20 剩餘 部份 127 4 0.99 0.94 0.98 0.93 〇 〇 78 A8 0.5 20 20 20 剩餘 部份 140 4 0.99 0.90 0.96 0.90 〇 X 26 A9 0.5 20 20 20 剩餘 部份 140 4 0.99 0.90 0.95 0.89 〇 X 32 A10 20 10 20 剩餘 部份 124 4 1.00 0.98 0.97 0.94 〇 〇 60 All 20 10 20 剩餘 部份 135 4 1.00 0.97 0.98 0.91 〇 〇 65 ------------Φ--------1T---------ΜΨ (tf.先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 24 569361 A7 B7 五、發明說明(22 ) 表2 經濟部智慧財產局員工消費合作社印製 組成物(重量,百萬分之一,ppm) 添加的元素 金& 不可 避免 的雜 質 鈣 釓 在乙 第一元素族 第二元素族 總 和 銪 鑭 鈽 錙 小 計 鎂 鈦 鉛 試 驗 I 試驗A7 - 20 20 40 剩餘 部份 實驗性實 施例1 5 20 20 45 剩餘 部份 試驗A1 20 20 20 60 剩餘 部份 實瞼ϋ實 施例2 100 20 20 140 剩餘 部份 實驗f生實 施例3 150 20 20 190 剩餘 部份 實離實 施例4 - 20 20 20 60 剩餘 部份 實驗f生實 施例5 5 20 20 20 - - - 20 - - - 65 剩餘 部份 試驗A2 20 20 20 20 - - - 20 - 讎 - 80 剩餘 部份 實驗14實 施例6 100 20 20 20 - - - 20 - - - 160 剩餘 部份 實驗H實 施例7 150 20 20 20 - - - 20 - - - 210 剩餘 部份 試 驗 II 試驗A3 20 - 20 40 剩餘 部份 實驗1±實 施例8 20 5 20 45 剩餘 部份 試驗Μ 20 20 20 60 剩餘 部份 --------------------訂---------線 (tf.先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公t ) 25 569361 A7 B7 五、發明說明(23 試驗m 經濟部智慧財產局員工消費合作社印製 實驗n實 施例9 實驗f生實 施例10 試^A4 實驗1*生實 施例11 tmA2 實驗Ά實 施例12 實瞼11實 施例13 試驗A5 實驗H實 施例14 試驗A1 實驗睹 施例15 實齡實 施例16 繼A6 實驗II實 施例17 試驗A2 實驗睹 施例18 實驗1±實 |施例19 20
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繼I
讎I 餘份剩部
繼I --------訂·--------· 26 569361 A7 B7 五、發明說明(24 ) 表2(續) 經濟部智慧財產局員工消費合作社印製 試驗結果 評估 小球加壓接觸 接合厚的圓度 斷裂負載 (mN) 晶片損害 尾部長度 變化(微米) 5式驗I 試驗Α7 X 0.93 127 〇 78 實驗性實施例1 Δ 0.96 133 〇 48 試驗Α1 Δ 0.97 150 〇 40 實驗性實施例2 Δ 0.96 125 〇 31 實驗性實施例3 X 0.91 150 X 25 實驗性實施例4 X 0.94 125 〇 54 實,驗性實施例5 〇 0.99 136 〇 27 試驗Α2 〇 1.00 139 〇 19 實驗〖生實施例6 〇 0.99 146 〇 13 實驗性實施例7 X 0.93 149 X 10 ό式驗II 試驗A3 X 0.92 134 〇 75 實驗性實施例8 Δ 0.95 138 〇 45 試驗Α1 Δ 0.97 140 〇 40 實驗性實施例9 Δ 0.96 140 〇 33 實驗性實施例10 X 0.90 139 X 30 試驗Α4 X 0.91 132 〇 57 實驗性實施例11 〇 1.00 138 〇 29 試驗Α2 〇 1.00 139 〇 19 實驗性實施例Π 〇 0.99 139 〇 15 實驗性實施例13 X 0.93 132 X 13 試驗ΙΠ 試驗Α5 X 0.93 133 〇 82 實驗性實施例14 Δ 0.95 137 〇 50 試驗Α1 Δ 0.97 140 〇 40 實驗性實施例15 Δ 0.95 142 〇 35 實驗性實施例16 X 0.91 143 X 32 試驗Α6 X 0.94 134 〇 56 實驗性實施例17 〇 0.98 138 〇 29 試驗Α2 〇 1.00 139 〇 19 實驗性實施例18 〇 0.99 141 〇 16 實驗性實施例19 X 0.91 141 X 15 --------------------訂---------線 (氣先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 27 569361 A7 B7 五、發明說明(25 ) 表3 經濟部智慧財產局員工消費合作社印製 組成物(重量,百萬分之一,ppm) 添加的元素 金&不可 避免的 雜質 鈣 釓 釔 第一元素族 第二元素族 總 和 銪 鑭 鈽 镏 小 計 鎂 鈦 鉛 試驗A1 20 20 20 60 剩餘部份 實驗性實 施例20 20 20 20 1 _ 細 一 1 - - - 61 剩餘部份 試驗A2 20 20 20 20 - 細 - 20 - - - 80 剩餘部份 實驗性實 施例21 20 20 20 100 - - - 100 - - - 160 剩餘部份 實驗性實 施例22 20 20 20 - 1 - - 1 - - 61 剩餘部份 實驗性實 施例23 20 20 20 - 20 80 剩餘部份 實驗性實1 施例24 5 20 20 - 100 - - 100 - - - 160 剩餘部份 實驗性實 施例25 20 20 20 - - 20 - 20 - - - 80 剩餘部份 實驗性實 施例26 20 20 20 20 - - - 20 - - - 80 剩餘部份 實驗性實 施例27 20 10 10 1 1 痛 - 2 - - - 42 剩餘部份 實驗性實 施例28 20 20 10 1 1 - - 2 腳 - - 52 剩餘部份 實驗性實 施例29 20 40 40 40 40 - - 100 - - - 180 剩餘部份 實驗性實 施例30 20 50 50 20 20 20 20 80 - - - 200 剩餘部份 實驗性實 施例31 20 20 20 150 - - - 150 _ 210 剩餘部份 (請先閱讀背面之注意事項再填寫本頁) Φ 訂---------線_ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 28 569361 A7 B7 五、發明說明(26 經濟部智慧財產局員工消費合作社印製 試驗V 試驗A2 20 20 20 20 - - - 20 - - - 80 剩餘部份 實驗性實 施例32 20 20 20 20 - - 每 20 1 - - 81 剩餘部份 實驗性實 施例33 20 20 20 20 - - - 20 20 - - 100 剩餘部份 實驗性實 施例34 20 20 20 20 - - 20 100 - - 180 剩餘部份 實驗性實 施例35 20 20 20 20 - - - 20 - 1 - 81 剩餘部份 實驗性實 施例36 20 20 20 20 - - 20 - 20 - 100 剩餘部份 實驗性實 施例37 20 20 20 20 - - 20 - 100 - 180 剩餘部份 實驗性實 施例3 8 20 20 20 20 - - - 20 - - - 80 剩餘部份 實驗性實 施例3 9 20 20 20 20 - - - 20 - - 20 100 剩餘部份 實驗性實 施例40 20 20 20 20 - - - 20 - 100 180 剩餘部份 實驗性實 施例41 20 20 20 20 - - - 20 20 20 - 120 剩餘部份 實驗性實 施例42 20 20 20 20 垂 - - 20 20 20 20 140 剩餘部份 實驗性實 施例43 20 20 20 20 20 50 50 30 210 剩餘部份 實驗性實 施例44 20 - 20 10 10 20 - 70 剩餘部份 實驗性實 施例45 20 20 - 10 - - - 10 20 _ 70 剩餘部份 (請先閱讀背面之注意事項再填寫本頁) 訂---------線- 尽紙張尺度週用T國國冢標竿(CNS)A4規格(210 X 297公爱) 29 569361 A7 B7 五、發明說明(27 ) 表3(續) 經濟部智慧財產局員工消費合作社印製 試驗結果 評估 小球加壓接觸 接合厚的圓度 斷裂負載 (mN) 晶片損害 尾部長度變化 (微米) 武驗IV 試驗A1 Δ 0.97 138 〇 40 實驗性實施例20 〇 0.98 140 〇 27 試驗A2 〇 1.00 139 〇 19 實驗性實施例21 〇 0.99 137 〇 13 實驗實施例22 〇 0.99 138 〇 29 實驗时施例23 〇 1.00 141 〇 24 實驗生實施例24 〇 0.99 140 〇 20 實驗性實施例25 〇 0.99 138 〇 26 實驗性實施例26 〇 0.98 141 〇 27 實驗性實施例27 〇 0.99 136 〇 28 實驗性實施例28 〇 0.99 137 〇 25 實驗性實施例29 〇 1.00 138 〇 18 實驗性實施例30 〇 0.99 141 〇 15 實驗性實施例31 X 0.91 135 X 26 试驗V 試驗A2 〇 1.00 140 〇 19 實驗實施例32 〇 0.99 139 〇 17 實驗性實施例33 〇 0.98 141 〇 14 實驗性實施例34 〇 0.99 140 〇 9 實驗性實施例35 〇 0.99 140 〇 18 實驗性實施例36 〇 1.00 140 〇 15 實驗性實施例37 〇 0.99 141 〇 12 實驗r生實施例38 〇 0.99 139 〇 18 實驗14實施例39 〇 0.99 137 〇 14 實驗性實施例40 〇 0.98 138 〇 13 實驗性實施例41 〇 0.99 140 〇 13 實驗('生實施例42 〇 0.98 139 〇 10 實驗r生實施例43 X 0.96 140 X 25 實驗性實施例44 X 0.92 132 〇 37 實驗性實施例45 X 0.91 134 〇 1343 (請•先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 30 569361 A7 B7 五、發明說明(28 ) 1…毛細管 2···金質導線 3…電喷燈 4…金質球 4 ’…加壓接合球 5…電極 6…半導體元件 7…夾子 8···外部導線 元件標號對照 14…凸塊 16…半導體元件 21…配線板 a…由毛細管1的較低外側 至該加壓接合的高度 b…自毛細管内部基座至 該加壓接合的高度 c…是導線尾部區域的高 度 (請·先閱讀t*面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 31
Claims (1)
- 、申請專利範圍 •—種用於半導體元件連接之金f導線,其由重量百萬 :之5]〇〇的約(Ca)、重量百萬分之5·的亂⑽)和重 Ϊ百萬分之1-100的釔⑺’該等元素的總重量不超過 百萬分之200,其餘是金及無可避免的雜質所組成的。 .如申請專利範圍第!項用於半導體元件連接之金質導線 ,其進-步由重量為百萬分之M〇〇且由鎂、鈦和鉛中 之至少-者所構成,同時該等添加的元素的總重量不 超過重量百萬分之2〇〇。 3· 一種用於半導體元件連接之金質導線,其由重量百萬 分之5-100的鈣、重量百萬分之弘丨⑼的釓和重量百萬 分之1-100的在乙,和重量為百萬分之M〇〇的非亂和紀 之稀土兀素中之至少一者,且這些元素的總重量不超 k百萬刀之200,其餘疋金及無可避免的雜質所組成的 4·如申明專利範圍第3項用於半導體元件連接之金質導線 ,其進一步至少包含鎂、鈦和鉛中一種且重量為百萬 分之1-100,該些添加的元素的總重量不超過重量百萬 分之200。 5· —種半導體元件連接方法,其包含 (A) 將金質導線插入毛細管,並且加熱及將該金質 導線的尖端溶融,形成一金質球的步驟, (B) 降低該毛細管並將該金質球壓在該半導體元件 的電極上’以使該金質導線接合在該電極上的步驟, (C) 以含有接合在該電極上之該金質導線的毛細管 本紙張尺度細巾國國家標準(CNS)A4規格(210 x 297公董) 32 A、申請專利範圍 沿著預定的路徑移動,使其移動到將被連接之組件上 ’同時在該金質導線的一側與將被連接之組件之間形 成加壓接合的步驟, (D)將已經被加壓接合在該連接組件的金質導線上 升’同時使用夾子夾住它,以切斷該金質導線,而完 成該半導體元件電極與該連接組件之間的接線的步驟 其中該金質導線是依據申請專利範圍第(1)至第(4) 項中任一項的金質導線。 6·如申請專利範圍第5項的方法,其中步驟(A)及/或步驟 (C)進一步包括使超音波震動傳輸通過該毛細管而至該 金質導線的尖端,同時以加熱器組加熱該半導體元件 或連接組件,以熱壓接合該金質球。 7’如申印專利範圍第5項或第6項的方法,其中在半導體 件上兩相鄰電極之間的節距不大於7〇微米。 8·如申請專利範圍第5或第6項的方法,其中在半導體件 上兩相鄰電極之間的節距不大於6〇微米。 9· 一種半導體元件連接方法,其包含: 、⑷將金質導線插入毛細管,i且加熱及將該金質 導線的尖端熔融,形成一金質球的步驟, (B) 降低該毛細管並將該金質球壓在該半導體元件 的電極上,以形成加壓接合金質球的步驟, (C) 將已經在該半導體元件電極上形成加祕合金 質球的金質導線上升,同時使用夾子夾住它,並在 經濟部智慧財產局員工消費合作社印製本紙張尺度_巾_家鮮(CNS)A4規格(2ϋ 六、申請專利範圍 近違加壓接合金質球的基部處割斷該金質導線,以在 邊電極上形成一個凸塊, 其中該金質導線是依據申請專利範圍第1至第4項 中任一項的金質導線。 10·如申請專利範圍第9項的方法,其中進—步包含將形成 在該半導體元件電極上之該凸塊加壓接合在將被連接 的組件上。 11·如申請專利範圍第9項或第1G項的方法,其中步驟(Α) 進一步包括將超音波震動傳輸通過該毛細管而至該金 質導線的尖端,以加熱器組加熱該半導體元件或連接 組件,以熱壓接合該金質球。 請專利範圍第9項的方法,其中該半導體元件電極 疋鋁薄膜電極,薄膜的厚度不超過〇·5微米。 13.如申請專利範圍上述第9項的方法,其中該半導體元件 電極是鋁薄膜電極,薄膜的厚度不超過〇1微米。 χ 297公釐)
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Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7271497B2 (en) * | 2003-03-10 | 2007-09-18 | Fairchild Semiconductor Corporation | Dual metal stud bumping for flip chip applications |
KR100618052B1 (ko) * | 2003-04-14 | 2006-08-30 | 엠케이전자 주식회사 | 반도체 소자 본딩용 금 합금세선 |
JP4462864B2 (ja) * | 2003-07-18 | 2010-05-12 | フィガロ技研株式会社 | ガスセンサの製造方法 |
JP4513440B2 (ja) * | 2004-07-15 | 2010-07-28 | 住友ベークライト株式会社 | 半導体装置 |
EP1811555A4 (en) * | 2004-09-30 | 2012-06-20 | Tanaka Electronics Ind | AU-ALLOY BOND WIRE |
JP2006324553A (ja) * | 2005-05-20 | 2006-11-30 | Renesas Technology Corp | 半導体装置及びその製造方法 |
JP5166738B2 (ja) | 2006-03-24 | 2013-03-21 | 新日鉄住金マテリアルズ株式会社 | 半導体素子接続用金線 |
CN101332477B (zh) * | 2007-06-28 | 2010-09-29 | 山东华宏微电子材料科技有限公司 | 半导体器件硅铝键合线制造方法 |
JP4134261B1 (ja) * | 2007-10-24 | 2008-08-20 | 田中電子工業株式会社 | ボールボンディング用金合金線 |
JP4195495B1 (ja) * | 2007-11-06 | 2008-12-10 | 田中電子工業株式会社 | ボールボンディング用金合金線 |
JP2010123817A (ja) * | 2008-11-21 | 2010-06-03 | Fujitsu Ltd | ワイヤボンディング方法および電子装置とその製造方法 |
CN101626006B (zh) * | 2009-07-09 | 2012-06-20 | 烟台一诺电子材料有限公司 | 柔性键合铜丝及其制备方法 |
KR20130026805A (ko) * | 2011-09-06 | 2013-03-14 | 삼성전자주식회사 | 반도체 패키지의 와이어 본딩 시스템 |
US8540136B1 (en) | 2012-09-06 | 2013-09-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods for stud bump formation and apparatus for performing the same |
JP6455037B2 (ja) * | 2014-09-12 | 2019-01-23 | 富士電機株式会社 | 半導体装置の製造方法 |
CN110718526A (zh) * | 2019-10-22 | 2020-01-21 | 烟台一诺电子材料有限公司 | 一种超细线距电子封装用稀土铜合金键合丝及其制备方法 |
CN111485131B (zh) * | 2020-04-17 | 2021-12-24 | 烟台招金励福贵金属股份有限公司 | 一种键合金丝及其制备方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5282183A (en) * | 1975-12-29 | 1977-07-09 | Nec Corp | Connecting wires for semiconductor devices |
GB2116208B (en) * | 1981-12-04 | 1985-12-04 | Mitsubishi Metal Corp | Fine gold alloy wire for bonding of a semiconductor device |
GB2201545B (en) * | 1987-01-30 | 1991-09-11 | Tanaka Electronics Ind | Method for connecting semiconductor material |
US4950866A (en) * | 1987-12-08 | 1990-08-21 | Hitachi, Ltd. | Method and apparatus of bonding insulated and coated wire |
JP2778093B2 (ja) * | 1988-09-29 | 1998-07-23 | 三菱マテリアル株式会社 | 金バンプ用金合金細線 |
JPH02205641A (ja) * | 1989-01-31 | 1990-08-15 | Tatsuta Electric Wire & Cable Co Ltd | ボンディング用金合金細線 |
JPH02205651A (ja) | 1989-02-06 | 1990-08-15 | Furukawa Alum Co Ltd | 磁気ディスク基板用アルミニウム合金 |
GB2231336B (en) * | 1989-04-28 | 1993-09-22 | Tanaka Electronics Ind | Gold wire for the bonding of a semiconductor device |
US4970365A (en) * | 1989-09-28 | 1990-11-13 | International Business Machines Corporation | Method and apparatus for bonding components leads to pads located on a non-rigid substrate |
JP2792337B2 (ja) * | 1992-06-04 | 1998-09-03 | 日本電気株式会社 | ワイヤボンディング装置 |
JP2922388B2 (ja) * | 1993-04-22 | 1999-07-19 | 新日本製鐵株式会社 | ボンディング用金合金細線 |
JP2780611B2 (ja) * | 1993-09-06 | 1998-07-30 | 三菱マテリアル株式会社 | 少量成分の合金化で硬質化した金装飾品材 |
US5842628A (en) * | 1995-04-10 | 1998-12-01 | Fujitsu Limited | Wire bonding method, semiconductor device, capillary for wire bonding and ball bump forming method |
JP3328135B2 (ja) * | 1996-05-28 | 2002-09-24 | 田中電子工業株式会社 | バンプ形成用金合金線及びバンプ形成方法 |
US5945065A (en) * | 1996-07-31 | 1999-08-31 | Tanaka Denshi Kogyo | Method for wedge bonding using a gold alloy wire |
JP3126926B2 (ja) | 1996-09-09 | 2001-01-22 | 新日本製鐵株式会社 | 半導体素子用金合金細線および半導体装置 |
JP3573321B2 (ja) * | 1996-12-11 | 2004-10-06 | 住友金属鉱山株式会社 | Auボンディングワイヤー |
JP3673366B2 (ja) | 1997-04-30 | 2005-07-20 | 新日本製鐵株式会社 | 半導体素子 |
JP2990128B2 (ja) * | 1997-10-16 | 1999-12-13 | 九州日本電気株式会社 | 半導体装置内部接続用被覆金属細線 |
JPH11126788A (ja) * | 1997-10-23 | 1999-05-11 | Tanaka Electron Ind Co Ltd | Icチップ接続用金合金線 |
JP3689234B2 (ja) | 1997-11-25 | 2005-08-31 | 新日本製鐵株式会社 | バンプ用微小金ボールおよび半導体装置 |
JP2000040710A (ja) * | 1998-07-24 | 2000-02-08 | Sumitomo Metal Mining Co Ltd | ボンディング用金合金細線 |
JP3356082B2 (ja) * | 1998-11-09 | 2002-12-09 | 三菱マテリアル株式会社 | 半導体装置のボンディング用金合金細線 |
-
2000
- 2000-05-31 JP JP2000166524A patent/JP3382918B2/ja not_active Expired - Fee Related
-
2001
- 2001-05-29 SG SG200103210A patent/SG90251A1/en unknown
- 2001-05-29 EP EP01250190A patent/EP1160344B1/en not_active Expired - Lifetime
- 2001-05-29 DE DE60140778T patent/DE60140778D1/de not_active Expired - Lifetime
- 2001-05-30 TW TW090113064A patent/TW569361B/zh not_active IP Right Cessation
- 2001-05-30 MY MYPI20012572A patent/MY117233A/en unknown
- 2001-05-30 KR KR1020010030074A patent/KR100692495B1/ko not_active IP Right Cessation
- 2001-05-31 CN CNB011213205A patent/CN1169202C/zh not_active Expired - Fee Related
- 2001-05-31 US US09/872,651 patent/US6492593B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
SG90251A1 (en) | 2002-07-23 |
MY117233A (en) | 2004-05-31 |
CN1326224A (zh) | 2001-12-12 |
EP1160344A1 (en) | 2001-12-05 |
DE60140778D1 (de) | 2010-01-28 |
JP3382918B2 (ja) | 2003-03-04 |
KR20010110133A (ko) | 2001-12-12 |
JP2001345342A (ja) | 2001-12-14 |
US6492593B2 (en) | 2002-12-10 |
CN1169202C (zh) | 2004-09-29 |
KR100692495B1 (ko) | 2007-03-09 |
US20020007957A1 (en) | 2002-01-24 |
EP1160344B1 (en) | 2009-12-16 |
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