SG90251A1 - Gold wire for semiconductor element connection and semiconductor element connection method - Google Patents

Gold wire for semiconductor element connection and semiconductor element connection method

Info

Publication number
SG90251A1
SG90251A1 SG200103210A SG200103210A SG90251A1 SG 90251 A1 SG90251 A1 SG 90251A1 SG 200103210 A SG200103210 A SG 200103210A SG 200103210 A SG200103210 A SG 200103210A SG 90251 A1 SG90251 A1 SG 90251A1
Authority
SG
Singapore
Prior art keywords
semiconductor element
element connection
gold wire
connection method
gold
Prior art date
Application number
SG200103210A
Other languages
English (en)
Inventor
Murai Hiroshi
Mitoma Shuichi
Tokuyama Takeshi
Motomura Mitutomo
Original Assignee
Tanaka Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Electronics Ind filed Critical Tanaka Electronics Ind
Publication of SG90251A1 publication Critical patent/SG90251A1/en

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    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/002Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
    • B23K20/004Wire welding
    • B23K20/005Capillary welding
    • B23K20/007Ball bonding
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/02Alloys based on gold
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
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SG200103210A 2000-05-31 2001-05-29 Gold wire for semiconductor element connection and semiconductor element connection method SG90251A1 (en)

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JP2000166524A JP3382918B2 (ja) 2000-05-31 2000-05-31 半導体素子接続用金線

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US7271497B2 (en) * 2003-03-10 2007-09-18 Fairchild Semiconductor Corporation Dual metal stud bumping for flip chip applications
KR100618052B1 (ko) * 2003-04-14 2006-08-30 엠케이전자 주식회사 반도체 소자 본딩용 금 합금세선
JP4462864B2 (ja) * 2003-07-18 2010-05-12 フィガロ技研株式会社 ガスセンサの製造方法
JP4513440B2 (ja) * 2004-07-15 2010-07-28 住友ベークライト株式会社 半導体装置
EP1811555A4 (en) * 2004-09-30 2012-06-20 Tanaka Electronics Ind AU-ALLOY BOND WIRE
JP2006324553A (ja) * 2005-05-20 2006-11-30 Renesas Technology Corp 半導体装置及びその製造方法
JP5166738B2 (ja) 2006-03-24 2013-03-21 新日鉄住金マテリアルズ株式会社 半導体素子接続用金線
CN101332477B (zh) * 2007-06-28 2010-09-29 山东华宏微电子材料科技有限公司 半导体器件硅铝键合线制造方法
JP4134261B1 (ja) * 2007-10-24 2008-08-20 田中電子工業株式会社 ボールボンディング用金合金線
JP4195495B1 (ja) * 2007-11-06 2008-12-10 田中電子工業株式会社 ボールボンディング用金合金線
JP2010123817A (ja) * 2008-11-21 2010-06-03 Fujitsu Ltd ワイヤボンディング方法および電子装置とその製造方法
CN101626006B (zh) * 2009-07-09 2012-06-20 烟台一诺电子材料有限公司 柔性键合铜丝及其制备方法
KR20130026805A (ko) * 2011-09-06 2013-03-14 삼성전자주식회사 반도체 패키지의 와이어 본딩 시스템
US8540136B1 (en) * 2012-09-06 2013-09-24 Taiwan Semiconductor Manufacturing Company, Ltd. Methods for stud bump formation and apparatus for performing the same
JP6455037B2 (ja) * 2014-09-12 2019-01-23 富士電機株式会社 半導体装置の製造方法
CN110718526A (zh) * 2019-10-22 2020-01-21 烟台一诺电子材料有限公司 一种超细线距电子封装用稀土铜合金键合丝及其制备方法
CN111485131B (zh) * 2020-04-17 2021-12-24 烟台招金励福贵金属股份有限公司 一种键合金丝及其制备方法

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JPH02205641A (ja) * 1989-01-31 1990-08-15 Tatsuta Electric Wire & Cable Co Ltd ボンディング用金合金細線
GB2262944A (en) * 1989-04-28 1993-07-07 Tanaka Electronics Ind Gold wire
EP0685565B1 (en) * 1993-09-06 1999-03-24 Mitsubishi Materials Corporation Golden ornament material hardened by alloying with minor components
EP0810293B1 (en) * 1996-05-28 2001-10-24 Tanaka Denshi Kogyo Kabushiki Kaisha Gold alloy wire and method for making a bump
JP2000040710A (ja) * 1998-07-24 2000-02-08 Sumitomo Metal Mining Co Ltd ボンディング用金合金細線
JP2000144282A (ja) * 1998-11-09 2000-05-26 Mitsubishi Materials Corp 半導体装置のボンディング用金合金細線

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EP1160344B1 (en) 2009-12-16
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JP3382918B2 (ja) 2003-03-04
EP1160344A1 (en) 2001-12-05
KR100692495B1 (ko) 2007-03-09
KR20010110133A (ko) 2001-12-12
CN1326224A (zh) 2001-12-12
US6492593B2 (en) 2002-12-10
US20020007957A1 (en) 2002-01-24
MY117233A (en) 2004-05-31
DE60140778D1 (de) 2010-01-28

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