JP6455037B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP6455037B2 JP6455037B2 JP2014185801A JP2014185801A JP6455037B2 JP 6455037 B2 JP6455037 B2 JP 6455037B2 JP 2014185801 A JP2014185801 A JP 2014185801A JP 2014185801 A JP2014185801 A JP 2014185801A JP 6455037 B2 JP6455037 B2 JP 6455037B2
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- 239000004065 semiconductor Substances 0.000 title claims description 96
- 238000004519 manufacturing process Methods 0.000 title claims description 31
- 238000005520 cutting process Methods 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 27
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- 229910052782 aluminium Inorganic materials 0.000 claims description 4
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- 229910000679 solder Inorganic materials 0.000 description 10
- 238000003825 pressing Methods 0.000 description 9
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- 238000010586 diagram Methods 0.000 description 7
- 230000017525 heat dissipation Effects 0.000 description 6
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
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- 229910044991 metal oxide Inorganic materials 0.000 description 1
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Description
[第1の実施の形態]
半導体装置の製造方法に含まれるワイヤボンディング工程について、図1を用いて説明する。
なお、図1(A)〜図1(D)は、ワイヤボンディング工程を時系列的に示すものである。
ワイヤ2は、その接合領域3にて導電性部材1に接合される。また、導電性部材1は、金属等で構成されており、例えば、半導体装置に含まれる半導体素子の電極、リードフレーム、半導体素子が配置される絶縁基板に形成された回路パターン等である。
次いで、切れ込み5を振動させて、切断位置4でワイヤ2を切断する(図1(C))。
ここで、このような半導体装置の製造方法に含まれるワイヤボンディング工程に対する参考例として、別のワイヤボンディング工程について図2を用いて説明する。
なお、図2(A)〜図2(C)は、半導体装置の製造方法で実行される図1とは別のワイヤボンディング工程を時系列的に示すものである。また、図1と同じ構成には同じ符号を付して、その説明については省略する。
次いで、導電性部材1に接合されたワイヤ2の接合領域3外の切断位置4を、例えば、カッター6aを矢印方向(図2中上方から導電性部材1側)に移動させてカットして、ワイヤ2を切断する(図2(B))。
切断面2aに尖り2bが生じたワイヤ2でワイヤボンディング工程を行うと、尖り2bにより、ワイヤ2と、導電性部材1との間に隙間が生じるため、ワイヤ2と導電性部材1との接合性が低下してしまうおそれがある。また、導電性部材1が半導体素子の電極である場合には、当該電極が尖り2bによりストレスを受けると、電極下部の半導体層が損傷することで、半導体素子の特性が劣化してしまう。
第2の実施の形態では、第1の実施の形態の半導体装置の製造方法で実行されるワイヤボンディング工程についてより詳細に説明する。
図3は、第2の実施の形態のワイヤボンディング装置の一例の要部を示す図である。
カッター13は、ボンディングツール11とは独立して、矢印Y2に沿って上下方向(図3中)に移動して、接続対象物のワイヤWによる接続終了後、余分なワイヤWに切れ込みを形成する。また、カッター13は、切れ込み形成後、超音波振動子15に接触して、超音波振動子15からの超音波を受けて超音波振動しつつ、カッター13の先端部を切れ込みに接触させる。
図4は、第2の実施の形態の半導体装置の製造方法の一例を説明するための図である。
まず、金属等で構成された放熱ベース110の上面にはんだ120aを配置する。はんだ120aの上に、表裏面に、例えば、銅箔等で構成された導電性パターン122,123がそれぞれ形成されたセラミックス121により構成される絶縁基板120を搭載する。当該絶縁基板120の表面の導電性パターン123にはんだ131a,132aを介して半導体素子131,132をそれぞれ搭載する。
なお、上記ワイヤボンディング工程の詳細については後述する。
なお、封止樹脂170を充填してその上面に蓋をかぶせるようにすることも可能である。
まず、半導体素子131とリードフレーム端子151との間のワイヤ161による接続について図5を用いて説明する。
なお、図5(A)は、半導体素子131にワイヤ161の一端を接合させている時を、図5(B)は、リードフレーム端子151にワイヤ161を接合させている時を、また、図5(C)は、図5(A),(B)の接合を矢印Sから見たボンディングツール11の先端部についてそれぞれ示している。
ワイヤボンディング装置10では、ワイヤガイド12からワイヤ161の一端部が延びた状態でクランプ機構14により保持されている。ワイヤボンディング装置10は、その先端部を移動させて、ワイヤ161の一端部を半導体素子131のボンディング位置に位置合わせする。ワイヤボンディング装置10は、ボンディングツール11を矢印Y方向(半導体素子131側)に移動させる(図5(A))。
次に、半導体素子131とリードフレーム端子151とを接続したワイヤ161の切断について図6を用いて説明する。
なお、図6(A)は、ワイヤボンディング装置10のカッター13にワイヤ161の切断位置をハーフカットさせている時を、図6(B)は、カッター13によりハーフカットした箇所を振動させている時をそれぞれ示している。また、図6(C)は、図6(A),(B)の時を矢印Sから見たボンディングツール11の先端部についてそれぞれ示している。
このため、ワイヤボンディング装置10が、例えば、再び、別の半導体装置100の半導体素子131とリードフレーム端子151との間の接続を行う場合(再び、図5(A))、切断面に尖りがないワイヤ161であれば、半導体素子131に適切に接合することができる。この際、半導体素子131にストレスを与えることはなく、半導体素子131の特性の劣化が抑制される。
第3の実施の形態では、ダイパッドを備えたリードフレームを用いた半導体装置の製造方法で実行されるワイヤボンディング工程について説明する。
図7は、第3の実施の形態の半導体装置の製造方法の一例を説明するための図である。
なお、ワイヤ185は、例えば、アルミニウムを主成分とし、径が100μm〜500μmとする。
2 ワイヤ
2a 切断面
3 接合領域
4 切断位置
5 切れ込み
6 振動部材
Claims (8)
- 半導体装置に含まれる導電性部材にワイヤを接合する接合工程と、
前記導電性部材に接合された前記ワイヤの接合領域外の切断位置をハーフカットして、前記ワイヤに切れ込みを形成する切れ込み形成工程と、
第1の振動数で振動する振動部材を前記切れ込み内に接触させ、前記切れ込みを振動させて、前記切断位置で前記ワイヤを切断する切断工程と、
を有することを特徴とする半導体装置の製造方法。 - 前記接合工程では、ボンディングツールにより、前記接合領域が前記導電性部材側に押圧されつつ第2の振動数で振動させられることで接合し、
前記切れ込み形成工程及び前記切断工程では、前記ワイヤは、前記ボンティングツールと前記導電性部材とにより押さえられている、
ことを特徴とする請求項1に記載の半導体装置の製造方法。 - 前記振動部材は、カッターであって、
前記切れ込み形成工程では、前記カッターにより、前記ワイヤは前記切断位置でハーフカットされ、
前記切断工程では、前記カッターが、前記切れ込みに入り込んだ状態で、前記ボンディングツールの振動により振動する、
ことを特徴とする請求項2に記載の半導体装置の製造方法。 - 前記ボンディングツールは、前記接合工程での前記第2の振動数よりも前記切断工程での前記第1の振動数の方が小さいことを特徴とする請求項3に記載の半導体装置の製造方法。
- 前記切れ込みの深さは、前記ワイヤの厚さに対して50%〜95%であることを特徴とする請求項1乃至4のいずれかに記載の半導体装置の製造方法。
- 前記切断位置は、前記接合領域から所定長さ以上離れていることを特徴とする請求項1乃至5のいずれかに記載の半導体装置の製造方法。
- 前記ワイヤは、アルミニウムを主成分とすることを特徴とする請求項1乃至6のいずれかに記載の半導体装置の製造方法。
- 前記ワイヤは、線状またはリボン状であることを特徴とする請求項1乃至7のいずれかに記載の半導体装置の製造方法。
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