TW457362B - Measurement of film thickness by inelastic electron scattering - Google Patents
Measurement of film thickness by inelastic electron scattering Download PDFInfo
- Publication number
- TW457362B TW457362B TW089112792A TW89112792A TW457362B TW 457362 B TW457362 B TW 457362B TW 089112792 A TW089112792 A TW 089112792A TW 89112792 A TW89112792 A TW 89112792A TW 457362 B TW457362 B TW 457362B
- Authority
- TW
- Taiwan
- Prior art keywords
- energy
- patent application
- thickness
- scope
- item
- Prior art date
Links
- 238000005259 measurement Methods 0.000 title claims description 17
- 238000001803 electron scattering Methods 0.000 title 1
- 238000001228 spectrum Methods 0.000 claims abstract description 53
- 238000012360 testing method Methods 0.000 claims abstract description 37
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 34
- 230000005855 radiation Effects 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 238000004458 analytical method Methods 0.000 claims abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims description 55
- 239000000523 sample Substances 0.000 claims description 32
- 239000013074 reference sample Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 7
- 230000002079 cooperative effect Effects 0.000 claims description 6
- 239000003302 ferromagnetic material Substances 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 2
- 239000008186 active pharmaceutical agent Substances 0.000 claims 1
- 238000013507 mapping Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 3
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 26
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 230000001066 destructive effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002265 electronic spectrum Methods 0.000 description 4
- 230000005291 magnetic effect Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001493 electron microscopy Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 235000015170 shellfish Nutrition 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 240000005979 Hordeum vulgare Species 0.000 description 1
- 235000007340 Hordeum vulgare Nutrition 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000009429 distress Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000000562 secondary electron spectroscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
- Extrusion Moulding Of Plastics Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/350,701 US6399944B1 (en) | 1999-07-09 | 1999-07-09 | Measurement of film thickness by inelastic electron scattering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW457362B true TW457362B (en) | 2001-10-01 |
Family
ID=23377837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089112792A TW457362B (en) | 1999-07-09 | 2000-06-28 | Measurement of film thickness by inelastic electron scattering |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6399944B1 (https=) |
| EP (1) | EP1192416B1 (https=) |
| JP (1) | JP2003504609A (https=) |
| AT (1) | ATE291731T1 (https=) |
| AU (1) | AU5759400A (https=) |
| DE (1) | DE60018932T2 (https=) |
| TW (1) | TW457362B (https=) |
| WO (1) | WO2001004574A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111566472A (zh) * | 2018-01-06 | 2020-08-21 | 科磊股份有限公司 | 用于组合的x射线反射测量术与光电子光谱术的系统及方法 |
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|---|---|---|---|---|
| US6635869B2 (en) * | 2001-02-26 | 2003-10-21 | Fei Company | Step function determination of Auger peak intensity |
| US6781126B2 (en) * | 2002-02-04 | 2004-08-24 | Applied Materials, Inc. | Auger-based thin film metrology |
| US6891158B2 (en) * | 2002-12-27 | 2005-05-10 | Revera Incorporated | Nondestructive characterization of thin films based on acquired spectrum |
| AU2003299965A1 (en) * | 2002-12-27 | 2004-07-29 | Physical Electronics, Inc. | Nondestructive characterization of thin films using measured basis spectra and/or based on acquired spectrum |
| JP4344197B2 (ja) * | 2003-08-26 | 2009-10-14 | パナソニック株式会社 | 絶縁膜測定装置、絶縁膜測定方法及び絶縁膜評価装置 |
| WO2006069469A1 (en) * | 2004-12-27 | 2006-07-06 | Sae Magnetics (H.K.) Ltd. | Method of nano thin film thickness measurement by auger electron spectrscopy |
| JP4987486B2 (ja) * | 2005-01-07 | 2012-07-25 | エスアイアイ・ナノテクノロジー株式会社 | 薄膜試料測定方法および装置ならびに薄膜試料作製方法および装置 |
| US7420163B2 (en) * | 2005-04-29 | 2008-09-02 | Revera Incorporated | Determining layer thickness using photoelectron spectroscopy |
| US7231324B2 (en) * | 2005-04-29 | 2007-06-12 | Revera Incorporated | Techniques for analyzing data generated by instruments |
| US7411188B2 (en) | 2005-07-11 | 2008-08-12 | Revera Incorporated | Method and system for non-destructive distribution profiling of an element in a film |
| US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
| PT2251454E (pt) | 2009-05-13 | 2014-10-01 | Sio2 Medical Products Inc | Revestimento e inspeção de vaso |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| US8581602B2 (en) * | 2009-09-02 | 2013-11-12 | Systems And Materials Research Corporation | Method and apparatus for nondestructive measuring of a coating thickness on a curved surface |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| WO2011162411A1 (ja) * | 2010-06-25 | 2011-12-29 | 日本電気株式会社 | ２次元薄膜原子構造の層数決定方法および２次元薄膜原子構造の層数決定装置 |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US8853078B2 (en) | 2011-01-30 | 2014-10-07 | Fei Company | Method of depositing material |
| US9090973B2 (en) | 2011-01-31 | 2015-07-28 | Fei Company | Beam-induced deposition of low-resistivity material |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| CA2855353C (en) | 2011-11-11 | 2021-01-19 | Sio2 Medical Products, Inc. | Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus |
| EP2846755A1 (en) | 2012-05-09 | 2015-03-18 | SiO2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US8658973B2 (en) * | 2012-06-12 | 2014-02-25 | Kla-Tencor Corporation | Auger elemental identification algorithm |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| KR101241007B1 (ko) * | 2012-10-26 | 2013-03-11 | 나노씨엠에스(주) | 엑스선을 이용한 박막층의 두께 측정 방법 및 장치 |
| US9664626B2 (en) | 2012-11-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| AU2013352436B2 (en) | 2012-11-30 | 2018-10-25 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| CN105392916B (zh) | 2013-03-11 | 2019-03-08 | Sio2医药产品公司 | 涂布包装材料 |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| EP2971227B1 (en) | 2013-03-15 | 2017-11-15 | Si02 Medical Products, Inc. | Coating method. |
| CN103713002B (zh) * | 2013-12-27 | 2016-04-27 | 昆明贵研催化剂有限责任公司 | 一种测定汽车尾气催化剂涂层厚度的方法 |
| WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| EP3104155A1 (en) | 2015-06-09 | 2016-12-14 | FEI Company | Method of analyzing surface modification of a specimen in a charged-particle microscope |
| KR102786617B1 (ko) | 2015-08-18 | 2025-03-26 | 에스아이오2 메디컬 프로덕츠, 엘엘씨 | 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기 |
| US9837246B1 (en) | 2016-07-22 | 2017-12-05 | Fei Company | Reinforced sample for transmission electron microscope |
| DE112017007508T5 (de) * | 2017-06-13 | 2020-03-19 | Hitachi High-Technologies Corporation | Ladungsteilchenstrahlvorrichtung und Verfahren zur Messung der Probendicke |
| DE102018202985A1 (de) | 2018-02-28 | 2018-04-12 | Carl Zeiss Smt Gmbh | Verfahren zum Bestimmen einer Ablösewahrscheinlichkeit einer Schicht |
| CN114046736B (zh) * | 2021-11-09 | 2023-02-28 | 北京理工大学 | 一种基于泵浦探测分析确定金属电子弹道深度的方法 |
| CN114923938B (zh) * | 2022-05-24 | 2025-04-29 | 长江存储科技有限责任公司 | 样品的表征方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2611411C3 (de) | 1976-03-18 | 1980-07-17 | Helmut Fischer Gmbh & Co Institut Fuer Elektronik Und Messtechnik, 7032 Sindelfingen | Vorrichtung zum Messen der Dicke von Schichten mit einem die Schicht bestrahlenden Radionuklid |
| JPS52127292A (en) * | 1976-04-16 | 1977-10-25 | Hitachi Ltd | Analyzer |
| GB2054136B (en) | 1979-07-19 | 1983-06-29 | Fischer H | Apparatus for measuring the thickness of thin layers |
| JPS60128306A (ja) * | 1983-12-16 | 1985-07-09 | Nippon Telegr & Teleph Corp <Ntt> | 磁気デイスク媒体の潤滑剤膜厚測定方法 |
| JPH0766507B2 (ja) * | 1984-02-16 | 1995-07-19 | コニカ株式会社 | 磁気記録媒体 |
| EP0189498B1 (en) * | 1985-01-29 | 1989-05-03 | International Business Machines Corporation | Field-emission scanning auger electron microscope |
| JPS639807A (ja) * | 1986-06-30 | 1988-01-16 | Nec Corp | 膜厚測定方法およびその装置 |
| US5594245A (en) * | 1990-10-12 | 1997-01-14 | Hitachi, Ltd. | Scanning electron microscope and method for dimension measuring by using the same |
| US5280176A (en) | 1992-11-06 | 1994-01-18 | The United States Of America As Represented By The Secretary Of Commerce | X-ray photoelectron emission spectrometry system |
| JP2930866B2 (ja) * | 1994-05-25 | 1999-08-09 | 理学電機工業株式会社 | Ｘ線分析方法およびこれに用いる装置 |
| JPH0914947A (ja) * | 1995-06-29 | 1997-01-17 | Sony Corp | カーボン膜の膜厚測定方法 |
| US5924058A (en) * | 1997-02-14 | 1999-07-13 | Applied Materials, Inc. | Permanently mounted reference sample for a substrate measurement tool |
| US6067154A (en) * | 1998-10-23 | 2000-05-23 | Advanced Micro Devices, Inc. | Method and apparatus for the molecular identification of defects in semiconductor manufacturing using a radiation scattering technique such as raman spectroscopy |
-
1999
- 1999-07-09 US US09/350,701 patent/US6399944B1/en not_active Expired - Lifetime
-
2000
- 2000-06-22 AT AT00943069T patent/ATE291731T1/de not_active IP Right Cessation
- 2000-06-22 WO PCT/US2000/017234 patent/WO2001004574A1/en not_active Ceased
- 2000-06-22 JP JP2001509941A patent/JP2003504609A/ja active Pending
- 2000-06-22 AU AU57594/00A patent/AU5759400A/en not_active Abandoned
- 2000-06-22 DE DE60018932T patent/DE60018932T2/de not_active Expired - Lifetime
- 2000-06-22 EP EP00943069A patent/EP1192416B1/en not_active Expired - Lifetime
- 2000-06-28 TW TW089112792A patent/TW457362B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111566472A (zh) * | 2018-01-06 | 2020-08-21 | 科磊股份有限公司 | 用于组合的x射线反射测量术与光电子光谱术的系统及方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE60018932D1 (de) | 2005-04-28 |
| EP1192416A1 (en) | 2002-04-03 |
| AU5759400A (en) | 2001-01-30 |
| US6399944B1 (en) | 2002-06-04 |
| WO2001004574A1 (en) | 2001-01-18 |
| DE60018932T2 (de) | 2006-03-30 |
| EP1192416B1 (en) | 2005-03-23 |
| JP2003504609A (ja) | 2003-02-04 |
| ATE291731T1 (de) | 2005-04-15 |
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Legal Events
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| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |