TW432031B - Organic compounds as photoactivatable nitrogen-containing bases, a process for preparing said compounds and compositions comprising said compounds - Google Patents

Organic compounds as photoactivatable nitrogen-containing bases, a process for preparing said compounds and compositions comprising said compounds Download PDF

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Publication number
TW432031B
TW432031B TW087101264A TW87101264A TW432031B TW 432031 B TW432031 B TW 432031B TW 087101264 A TW087101264 A TW 087101264A TW 87101264 A TW87101264 A TW 87101264A TW 432031 B TW432031 B TW 432031B
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TW
Taiwan
Prior art keywords
light
wall
direct
integrating sphere
receiving port
Prior art date
Application number
TW087101264A
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English (en)
Chinese (zh)
Inventor
Veronique Hall-Goulle
Sean Colm Turner
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
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Publication of TW432031B publication Critical patent/TW432031B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L91/00Compositions of oils, fats or waxes; Compositions of derivatives thereof
    • C08L91/06Waxes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/17Amines; Quaternary ammonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3462Six-membered rings

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Indole Compounds (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Polymerization Catalysts (AREA)
  • Polyamides (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
TW087101264A 1997-01-22 1998-02-03 Organic compounds as photoactivatable nitrogen-containing bases, a process for preparing said compounds and compositions comprising said compounds TW432031B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH13397 1997-01-22

Publications (1)

Publication Number Publication Date
TW432031B true TW432031B (en) 2001-05-01

Family

ID=4180006

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087101264A TW432031B (en) 1997-01-22 1998-02-03 Organic compounds as photoactivatable nitrogen-containing bases, a process for preparing said compounds and compositions comprising said compounds

Country Status (14)

Country Link
US (3) US20010027253A1 (enExample)
EP (1) EP0971924B1 (enExample)
JP (1) JP4246268B2 (enExample)
KR (1) KR100505529B1 (enExample)
CN (1) CN1138777C (enExample)
AU (1) AU719308B2 (enExample)
BR (1) BR9807502B1 (enExample)
CA (1) CA2276613C (enExample)
DE (1) DE69807322T2 (enExample)
DK (1) DK0971924T3 (enExample)
ES (1) ES2181162T3 (enExample)
TW (1) TW432031B (enExample)
WO (1) WO1998032756A1 (enExample)
ZA (1) ZA98474B (enExample)

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EP1243632A1 (de) * 2001-03-19 2002-09-25 Ciba SC Holding AG Thermisch härtbare Lackzusammensetzung
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CA2459374C (en) * 2001-10-17 2011-02-08 Ciba Specialty Chemicals Holding Inc. Photoactivable nitrogen bases
US6897264B2 (en) * 2001-12-21 2005-05-24 Dainippon Ink And Chemicals, Inc. Curable mixtures
US7048648B2 (en) * 2003-09-05 2006-05-23 Callaway Golf Company Putter-type golf club head with an insert
US7344451B2 (en) * 2004-09-30 2008-03-18 Callaway Golf Company Putter-type club head
US7147569B2 (en) * 2004-10-29 2006-12-12 Callaway Golf Company Putter-type club head
US20060118998A1 (en) * 2004-12-07 2006-06-08 Kenneth Meacham Putter-type club head with an insert and method of manufacturing
US7198834B2 (en) * 2005-03-22 2007-04-03 Hewlett-Packard Development Company, L.P. Imaging media including interference layer for generating human-readable marking on optical media
US7270944B2 (en) * 2005-03-29 2007-09-18 Hewlett-Packard Development Company, L.P. Compositions, systems, and methods for imaging
JP4589809B2 (ja) * 2005-06-06 2010-12-01 パナソニック株式会社 バリア膜形成用材料及びそれを用いたパターン形成方法
US20070065749A1 (en) * 2005-09-21 2007-03-22 Vladek Kasperchik Radiation-markable coatings for printing and imaging
US20070065623A1 (en) * 2005-09-21 2007-03-22 Vladek Kasperchik Laser-imageable coating based on exothermic decomposition
US20070086308A1 (en) * 2005-10-13 2007-04-19 Gore Makarand P Systems and methods for imaging
CN101490155A (zh) * 2006-07-17 2009-07-22 西巴控股有限公司 粘结方法
ATE524765T1 (de) * 2007-04-03 2011-09-15 Basf Se Fotoaktivierbare stickstoffbasen
EP2665788A1 (en) 2010-06-30 2013-11-27 3M Innovative Properties Company Curable composition comprising dual reactive silane functionality
EP2588550A1 (en) 2010-06-30 2013-05-08 3M Innovative Properties Company Curable polysiloxane coating composition
CN102971380B (zh) * 2010-06-30 2015-08-19 3M创新有限公司 包含双反应性硅烷官能团的可按需固化组合物
CN101974112B (zh) * 2010-11-16 2012-05-30 南通新昱化工有限公司 大分子双官能团胺基酮光引发剂及其制备方法
US9006336B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane coating composition
CN104470983A (zh) 2011-12-29 2015-03-25 3M创新有限公司 可固化聚硅氧烷组合物
CN104080838B (zh) 2011-12-29 2016-08-17 3M创新有限公司 可按需固化的聚硅氧烷涂料组合物
KR20140119048A (ko) 2011-12-29 2014-10-08 쓰리엠 이노베이티브 프로퍼티즈 컴파니 경화성 폴리실록산 조성물 및 그로부터 제조된 감압 접착제
JP6073081B2 (ja) * 2012-07-12 2017-02-01 スリーエム イノベイティブ プロパティズ カンパニー 透明粘着シート
EP3023462A4 (en) 2013-07-18 2017-04-12 Cemedine Co., Ltd. Photocurable composition
WO2015019802A1 (ja) * 2013-08-09 2015-02-12 太陽ホールディングス株式会社 感光性樹脂組成物、そのレリーフパターン膜、レリーフパターン膜の製造方法、レリーフパターン膜を含む電子部品又は光学製品、及び感光性樹脂組成物を含む接着剤
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
CN103980181B (zh) * 2014-05-30 2016-01-20 山西大学 含有1-甲基-2-苯基吲哚骨架的三芳基锍盐及其制备方法
CN107075000B (zh) * 2014-09-04 2020-01-31 Igm集团公司 多环光引发剂
JP6812361B2 (ja) 2015-04-29 2021-01-13 ビーエスエヌ メディカル ゲーエムベーハー 医療用入浴機器
AU2016256186B2 (en) 2015-04-29 2020-01-16 Bsn Medical Gmbh Multi-step process for no production
CN107531886B (zh) 2015-04-29 2020-08-07 3M创新有限公司 由多硫醇和聚环氧化合物制备聚合物网络的方法
EP3824893B1 (en) 2016-06-30 2023-11-01 Elementis Specialties, Inc. Crosslinkable coating compositions formulated with dormant carbamate initiator
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
KR20190082219A (ko) 2016-11-03 2019-07-09 쓰리엠 이노베이티브 프로퍼티즈 컴파니 실란트를 항공기 구성요소에 적용하는 방법
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
CA3044541A1 (en) 2016-12-05 2018-06-14 Arkema Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
US11920058B2 (en) * 2018-01-26 2024-03-05 Allnex Netherlands B.V. Powder coating composition
US20210371667A1 (en) 2018-09-27 2021-12-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

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HU176942B (hu) * 1979-05-11 1981-06-28 Chinoin Gyogyszer Es Vegyeszet Sposob poluchenija 2,3- i 3,4-dvuzamehhjonnykh tetragidro-pirrolo!1,2-a!-pirimidinov
ZA852044B (en) * 1984-03-29 1985-11-27 Akzo Nv Liquid coating composition curable at ambient temperature
DE3880868D1 (en) 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
DE4419315A1 (de) * 1994-06-01 1995-12-07 Merckle Gmbh Heteropyrrolizinverbindungen und deren Anwendung in der Pharmazie

Also Published As

Publication number Publication date
BR9807502B1 (pt) 2008-11-18
US20020077503A1 (en) 2002-06-20
US20010027253A1 (en) 2001-10-04
CN1138777C (zh) 2004-02-18
US6277986B1 (en) 2001-08-21
JP4246268B2 (ja) 2009-04-02
EP0971924A1 (en) 2000-01-19
JP2001512421A (ja) 2001-08-21
BR9807502A (pt) 2000-03-21
ES2181162T3 (es) 2003-02-16
ZA98474B (en) 1998-07-22
DK0971924T3 (da) 2002-12-16
CA2276613A1 (en) 1998-07-30
DE69807322T2 (de) 2003-04-17
US6410628B1 (en) 2002-06-25
EP0971924B1 (en) 2002-08-21
KR20000070399A (ko) 2000-11-25
CA2276613C (en) 2008-02-05
AU5987398A (en) 1998-08-18
DE69807322D1 (de) 2002-09-26
KR100505529B1 (ko) 2005-08-04
AU719308B2 (en) 2000-05-04
WO1998032756A1 (en) 1998-07-30
CN1244198A (zh) 2000-02-09

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