TW417168B - Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices - Google Patents

Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices Download PDF

Info

Publication number
TW417168B
TW417168B TW086107075A TW86107075A TW417168B TW 417168 B TW417168 B TW 417168B TW 086107075 A TW086107075 A TW 086107075A TW 86107075 A TW86107075 A TW 86107075A TW 417168 B TW417168 B TW 417168B
Authority
TW
Taiwan
Prior art keywords
lens
group
lens group
positive
aforementioned
Prior art date
Application number
TW086107075A
Other languages
English (en)
Chinese (zh)
Inventor
Yutaka Suenaga
Kotaro Yamaguchi
Original Assignee
Nippon Kogaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku Kk filed Critical Nippon Kogaku Kk
Application granted granted Critical
Publication of TW417168B publication Critical patent/TW417168B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW086107075A 1996-10-01 1997-05-26 Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices TW417168B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP26100096 1996-10-01
JP10974697A JP3757536B2 (ja) 1996-10-01 1997-04-25 投影光学系及びそれを備えた露光装置並びにデバイス製造方法

Publications (1)

Publication Number Publication Date
TW417168B true TW417168B (en) 2001-01-01

Family

ID=26449456

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086107075A TW417168B (en) 1996-10-01 1997-05-26 Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices

Country Status (4)

Country Link
US (1) US5930049A (https=)
JP (1) JP3757536B2 (https=)
KR (1) KR100485376B1 (https=)
TW (1) TW417168B (https=)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
US6600550B1 (en) * 1999-06-03 2003-07-29 Nikon Corporation Exposure apparatus, a photolithography method, and a device manufactured by the same
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
DE10221386A1 (de) * 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
US7317582B2 (en) * 2002-10-15 2008-01-08 Matsushita Electric Industrial Co., Ltd. Zoom lens, video enlarging/projecting system, video projector, rear projector, and multivision system
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7791851B1 (en) 2006-01-24 2010-09-07 Cypress Semiconductor Corporation Cascode combination of low and high voltage transistors for electrostatic discharge circuit
US7385793B1 (en) * 2006-01-24 2008-06-10 Cypress Semiconductor Corporation Cascode active shunt gate oxide project during electrostatic discharge event
DE102007043896A1 (de) 2007-09-14 2009-04-02 Carl Zeiss Smt Ag Mikrooptik zur Messung der Position eines Luftbildes
RU2433433C1 (ru) * 2010-04-26 2011-11-10 Закрытое Акционерное Общество "Импульс" Проекционный объектив
JP2011237588A (ja) * 2010-05-10 2011-11-24 Sony Corp ズームレンズ及び撮像装置
JP2011252962A (ja) * 2010-05-31 2011-12-15 Olympus Imaging Corp 結像光学系及びそれを備えた撮像装置
KR101407076B1 (ko) * 2012-05-24 2014-06-13 주식회사 비엘시스템 근적외선을 이용한 인쇄판 프린터용 고해상도 노광장치
DE102022201001A1 (de) 2022-01-31 2023-08-03 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
KR20240032536A (ko) * 2022-09-02 2024-03-12 현대모비스 주식회사 렌즈 광학계

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3504961A (en) * 1968-04-01 1970-04-07 Perkin Elmer Corp Modified double gauss objective
US3897138A (en) * 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
JPS5336326B2 (https=) * 1972-12-26 1978-10-02
JPS581763B2 (ja) * 1978-06-19 1983-01-12 旭光学工業株式会社 回折限界の解像力を有する等倍複写用レンズ
JPS58147708A (ja) * 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
US4666273A (en) * 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4811055A (en) * 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
US4772107A (en) * 1986-11-05 1988-09-20 The Perkin-Elmer Corporation Wide angle lens with improved flat field characteristics
JPH0812329B2 (ja) * 1986-11-06 1996-02-07 株式会社シグマ 投影レンズ
US4770477A (en) * 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
US5105075A (en) * 1988-09-19 1992-04-14 Canon Kabushiki Kaisha Projection exposure apparatus
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
US5420417A (en) * 1991-10-08 1995-05-30 Nikon Corporation Projection exposure apparatus with light distribution adjustment
JP3298131B2 (ja) * 1991-10-24 2002-07-02 株式会社ニコン 縮小投影レンズ
US5335044A (en) * 1992-02-26 1994-08-02 Nikon Corporation Projection type exposure apparatus and method of exposure
JPH06313845A (ja) * 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
JP3396935B2 (ja) * 1993-11-15 2003-04-14 株式会社ニコン 投影光学系及び投影露光装置
JP3360387B2 (ja) * 1993-11-15 2002-12-24 株式会社ニコン 投影光学系及び投影露光装置
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3819048B2 (ja) * 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法

Also Published As

Publication number Publication date
KR19980032235A (ko) 1998-07-25
JP3757536B2 (ja) 2006-03-22
KR100485376B1 (ko) 2005-09-12
US5930049A (en) 1999-07-27
JPH10161021A (ja) 1998-06-19

Similar Documents

Publication Publication Date Title
TW417168B (en) Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices
US7385764B2 (en) Objectives as a microlithography projection objective with at least one liquid lens
JP5106858B2 (ja) 高開口数と平面状端面とを有する投影対物レンズ
US6717746B2 (en) Catadioptric reduction lens
CA2045944C (en) Field compensated lens
US6366410B1 (en) Reticular objective for microlithography-projection exposure installations
TW451076B (en) Optical projection lens system
JP3454390B2 (ja) 投影光学系、投影露光装置及び投影露光方法
EP0465882A2 (en) High resolution reduction catadioptric relay lens
JP3396935B2 (ja) 投影光学系及び投影露光装置
JP3750123B2 (ja) 投影光学系
JPH1079345A (ja) 投影光学系及び露光装置
JPH116957A (ja) 投影光学系および投影露光装置並びに投影露光方法
EP0869382B1 (en) Projection optical system
JPH1054936A (ja) 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
JPH10115779A (ja) 投影光学系
JP2007515660A (ja) 浸漬リソグラフィー用屈折性投影対物レンズ
KR20070093380A (ko) 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이렌즈
US6208473B1 (en) Catadioptric projection lens
JP3026648B2 (ja) 等倍投影レンズ
JPH08179199A (ja) 紫外線用コリメートレンズ
JPH08179200A (ja) 紫外線用コリメートレンズ
EP0877271B1 (en) A projection optical system and method of using such system for manufacturing devices
SU1539716A1 (ru) Проекционный объектив с увеличением - 1/30 @
JPH02220015A (ja) 精密投影光学系

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees